JP2001354619A - Method for producing highly pure adamantyl (meth) acrylates - Google Patents

Method for producing highly pure adamantyl (meth) acrylates

Info

Publication number
JP2001354619A
JP2001354619A JP2000173205A JP2000173205A JP2001354619A JP 2001354619 A JP2001354619 A JP 2001354619A JP 2000173205 A JP2000173205 A JP 2000173205A JP 2000173205 A JP2000173205 A JP 2000173205A JP 2001354619 A JP2001354619 A JP 2001354619A
Authority
JP
Japan
Prior art keywords
acid
meth
washing
adamantyl
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000173205A
Other languages
Japanese (ja)
Other versions
JP4609611B2 (en
Inventor
Minoru Tsunoda
稔 角田
Takashi Onozawa
隆 小野澤
Hiroshi Kurata
浩志 倉田
Kikuo Furukawa
喜久夫 古川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc
Priority to JP2000173205A priority Critical patent/JP4609611B2/en
Publication of JP2001354619A publication Critical patent/JP2001354619A/en
Application granted granted Critical
Publication of JP4609611B2 publication Critical patent/JP4609611B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a method for producing highly pure adamantyl (meth) acrylate useful as a raw material for a highly functional polymer, a synthetic lubricant oil, a plasticizer, an electronic part or the like. SOLUTION: Adamantanols are reacted with a (meth)acrylic acid (ester), and the reaction liquid is subjected to an alkali cleaning and an acid cleaning to produce the objective highly pure adamantyl (meth)acrylates.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、高機能性ポリマ
ー、合成潤滑油、可塑剤や電子部品等の原料として有用
な高純度アダマンチル(メタ)アクリレート類の製造方
法に関する。
The present invention relates to a method for producing high-purity adamantyl (meth) acrylates useful as raw materials for high-performance polymers, synthetic lubricating oils, plasticizers, electronic components and the like.

【0002】[0002]

【従来の技術】アダマンチル(メタ)アクリレート類の
製造方法として、クレゾールスルホン酸等を触媒兼重合
禁止剤に用い、(メタ)アクリル酸と1−アダマンタノ
ールを反応させる方法(特開平8−310995号公
報)、p−トルエンスルホン酸触媒存在下、トルエン溶
媒中アダマンタノール類を(メタ)アクリル酸と反応さ
せてアダマンチルモノ(メタ)アクリレート類を製造す
る方法(特公平7−61980号公報)、および周期律
表第3族元素化合物で構成される触媒下、アダマンタノ
ール類と(メタ)アクリル酸エステルを反応させる方法
(特開平11−35522号公報)が提案されている。
しかし、高純度のアダマンチル(メタ)アクリレート類
を製造することは困難であった。
2. Description of the Related Art As a method for producing adamantyl (meth) acrylates, a method of reacting (meth) acrylic acid with 1-adamantanol using cresol sulfonic acid or the like as a catalyst and a polymerization inhibitor (JP-A-8-310995) Publication), a method of producing adamantyl mono (meth) acrylates by reacting adamantanol with (meth) acrylic acid in a toluene solvent in the presence of a p-toluenesulfonic acid catalyst (Japanese Patent Publication No. 7-61980), and A method has been proposed in which an adamantanol is reacted with a (meth) acrylic acid ester in the presence of a catalyst composed of a Group 3 element compound of the periodic table (JP-A-11-35522).
However, it has been difficult to produce high-purity adamantyl (meth) acrylates.

【0003】[0003]

【発明が解決しようとする課題】本発明の目的は、高純
度のアダマンチル(メタ)アクリレート類の製造方法を
提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a method for producing adamantyl (meth) acrylate having high purity.

【0004】[0004]

【課題を解決するための手段】本発明者らは、上記課題
について鋭意検討した結果、エステル化触媒の存在下、
有機溶媒中でアダマンタノール類を(メタ)アクリル酸
(エステル)と反応した後、反応液をアルカリ洗浄、水
洗、酸洗浄、水洗の順で洗浄した後、濃縮、晶析するこ
とにより、金属不純物が100ppb以下でかつハロゲ
ンイオンが1000ppb以下の高純度アダマンチル
(メタ)アクリレート類を製造できることを見出し、本
発明に到達した。
Means for Solving the Problems The present inventors have conducted intensive studies on the above-mentioned problems, and as a result, in the presence of an esterification catalyst,
After reacting adamantanols with (meth) acrylic acid (ester) in an organic solvent, the reaction solution is washed in the order of alkali washing, water washing, acid washing, and water washing, and then concentrated and crystallized to remove metal impurities. Of 100 ppb or less and high-purity adamantyl (meth) acrylates having a halogen ion of 1000 ppb or less, and reached the present invention.

【0005】すなわち、本発明は、エステル化触媒の存
在下、アダマンタノール類を(メタ)アクリル酸(エス
テル)と反応させた後、反応液をアルカリ洗浄および酸
洗浄することを特徴とするアダマンチル(メタ)アクリ
レート類の製造方法に関するものである。
That is, the present invention provides an adamantyl (Adamanthin) comprising reacting an adamantanol with a (meth) acrylic acid (ester) in the presence of an esterification catalyst, and then washing the reaction solution with an alkali and an acid. The present invention relates to a method for producing (meth) acrylates.

【0006】[0006]

【発明の実施の形態】本発明のアダマンタノール類は下
記一般式で表されるものである。
BEST MODE FOR CARRYING OUT THE INVENTION The adamantanols of the present invention are represented by the following general formula.

【0007】[0007]

【化1】 (式中、R1〜R3は、同一または異なって、水素原子、
水酸基、炭素数1〜10のアルキル基、アリール基、シ
クロアルキル基、炭素数1〜10のアルコキシ基、アリ
ールオキシ基、炭素数2〜6のアシルオキシ基、ハロゲ
ン基を示す。)
Embedded image (Wherein, R 1 to R 3 are the same or different and are each a hydrogen atom,
A hydroxyl group, an alkyl group having 1 to 10 carbon atoms, an aryl group, a cycloalkyl group, an alkoxy group having 1 to 10 carbon atoms, an aryloxy group, an acyloxy group having 2 to 6 carbon atoms, and a halogen group. )

【0008】ここでアリール基として、フェニル基、ナ
フチル基等が挙げられ、シクロアルキル基として、シク
ロヘキシル、シクロオクチル基等が挙げられ、アリール
オキシ基として、フェノキシ基等が挙げられる。
Here, the aryl group includes a phenyl group, a naphthyl group and the like, the cycloalkyl group includes a cyclohexyl and cyclooctyl group, and the aryloxy group includes a phenoxy group.

【0009】本発明で使用する有機溶媒は、水との相溶
性が低く、アダマンタン(メタ)アクリレート類の溶解
性が高く、反応に対し不活性な溶媒を用いる。また、反
応中に副生する水を除去するため、水と共沸する溶媒を
用いることが好ましい。具体例として、ヘキサン、ヘプ
タン、オクタン、ノナン等の炭素数6〜10の脂肪族炭
化水素、シクロヘキサン、メチルシクロヘキサン、ジメ
チルシクロヘキサン、エチルシクロヘキサン等の炭素数
6〜10の脂環族炭化水素、ベンゼン、トルエン、キシ
レン等の芳香族炭化水素が挙げられる。これらの溶媒
は、単独でも2種以上を混合してもよい。溶媒量は、原
料として用いるアダマンタノール類1重量部に対して、
0.1〜20重量部好ましくは1〜10重量部の割合で
ある。
The organic solvent used in the present invention has low compatibility with water, high solubility of adamantane (meth) acrylates, and is inert to the reaction. In order to remove water produced as a by-product during the reaction, it is preferable to use a solvent azeotropic with water. As specific examples, hexane, heptane, octane, aliphatic hydrocarbons having 6 to 10 carbon atoms such as nonane, cyclohexane, methylcyclohexane, dimethylcyclohexane, alicyclic hydrocarbons having 6 to 10 carbon atoms such as ethylcyclohexane, benzene, And aromatic hydrocarbons such as toluene and xylene. These solvents may be used alone or in combination of two or more. The amount of the solvent is based on 1 part by weight of adamantanol used as a raw material.
The proportion is 0.1 to 20 parts by weight, preferably 1 to 10 parts by weight.

【0010】エステル化触媒は、硫酸、塩酸等の鉱酸、
メタンスルホン酸、p−トルエンスルホン酸、シュウ酸
等の有機酸、およびSc、Ti、V、W等の3〜8族金
属元素の化合物からなる群から選ばれる化合物であり、
好ましくは、硫酸を用いる。硫酸を用いる場合、原料で
あるアダマンタノール類1モルに対して、0.005〜
1.0モル、好ましくは0.01〜0.1モルの割合で
使用する。使用量がこの範囲より少なければ反応速度が
低下し、逆に多ければアダマンタン(メタ)アクリレー
ト類の選択率が低下する。
[0010] Esterification catalysts include mineral acids such as sulfuric acid and hydrochloric acid;
A compound selected from the group consisting of organic acids such as methanesulfonic acid, p-toluenesulfonic acid, and oxalic acid, and compounds of Group 3 to 8 metal elements such as Sc, Ti, V, and W;
Preferably, sulfuric acid is used. When sulfuric acid is used, 0.005 to 1 mol of adamantanol as a raw material is used.
It is used in a ratio of 1.0 mol, preferably 0.01 to 0.1 mol. If the amount used is less than this range, the reaction rate decreases, and if it is too large, the selectivity for adamantane (meth) acrylates decreases.

【0011】(メタ)アクリル酸類は、アダマンタノー
ル類中の水酸基1当量に対して1.0〜10倍当量、好
ましくは1.2〜5倍当量を使用する。使用量がこの範
囲より少ないと未反応のアダマンタノール類が残り、逆
に多いと釜効率が低下する。
The (meth) acrylic acid is used in an amount of 1.0 to 10 equivalents, preferably 1.2 to 5 equivalents, per equivalent of the hydroxyl group in the adamantanols. If the amount is less than this range, unreacted adamantanol remains, and if it is too large, the kettle efficiency decreases.

【0012】反応中の(メタ)アクリル酸の重合を抑制
するため、重合禁止剤を使用する。重合禁止剤は一般に
市販されているものを用いることができ、p−メトキシ
フェノール、メチルヒドロキノン等を挙げることができ
る。重合禁止剤は、(メタ)アクリル酸類1モルに対し
て0.005〜1.5モル%、好ましくは0.01〜
0.5モル%を使用する。使用量がこの範囲より少ない
と反応中に重合が起こり、逆に多いと重合禁止剤に由来
する副生成物によりアダマンタン(メタ)アクリレート
類の選択率が低下する。
In order to suppress the polymerization of (meth) acrylic acid during the reaction, a polymerization inhibitor is used. As the polymerization inhibitor, those generally commercially available can be used, and examples thereof include p-methoxyphenol and methylhydroquinone. The polymerization inhibitor is used in an amount of 0.005 to 1.5 mol%, preferably 0.01 to 1.5 mol% per 1 mol of the (meth) acrylic acid.
Use 0.5 mol%. If the amount is less than this range, polymerization occurs during the reaction, while if it is too large, the selectivity for adamantane (meth) acrylates is reduced by a by-product derived from the polymerization inhibitor.

【0013】反応温度は、50〜180℃、好ましくは
60〜150℃の範囲である。反応温度がこの範囲より
も低い場合は反応速度が著しく低下し、逆に高い場合
は、アダマンタン(メタ)アクリレート類の選択率が低
下する。
[0013] The reaction temperature is in the range of 50 to 180 ° C, preferably 60 to 150 ° C. When the reaction temperature is lower than this range, the reaction rate is significantly reduced, and when the reaction temperature is higher, the selectivity of adamantane (meth) acrylates is reduced.

【0014】本発明のアダマンチル(メタ)アクリレー
ト類は、アダマンチルモノ(メタ)アクリレート、アダ
マンチルジ(メタ)アクリレート、アダマンチルトリ
(メタ)アクリレート、アダマンチルテトラ(メタ)ア
クリレート等が含まれる。
The adamantyl (meth) acrylates of the present invention include adamantyl mono (meth) acrylate, adamantyl di (meth) acrylate, adamantyl tri (meth) acrylate, adamantyl tetra (meth) acrylate and the like.

【0015】本発明では、アダマンタノール類と(メ
タ)アクリル酸(エステル)を反応させた後、反応液を
アルカリ洗浄、水洗、酸洗浄、水洗の順で洗浄すること
により金属不純物やハロゲンイオンを除去する。
In the present invention, after reacting adamantanols with (meth) acrylic acid (ester), the reaction solution is washed in the order of alkali washing, water washing, acid washing and water washing to remove metal impurities and halogen ions. Remove.

【0016】アルカリ洗浄は、水酸化ナトリウム、水酸
化カリウムおよび水酸化アンモニウムからなる群から選
ばれる水溶液で洗浄する。アルカリの量は、未反応の
(メタ)アクリル酸を中和して除去するに十分過剰な量
を使用する。過剰量は、未反応(メタ)アクリル酸1重
量部に対して0〜100重量部、好ましくは0.01〜
10重量部の割合で使用する。それより少ないと、有機
層中のハロゲンイオンを除去できず、またそれより多い
とアダマンチル(メタ)アクリレート類が加水分解す
る。
[0016] The alkali washing is carried out with an aqueous solution selected from the group consisting of sodium hydroxide, potassium hydroxide and ammonium hydroxide. The amount of alkali is used in an amount sufficient to neutralize and remove unreacted (meth) acrylic acid. The excess amount is 0 to 100 parts by weight, preferably 0.01 to 100 parts by weight, based on 1 part by weight of unreacted (meth) acrylic acid.
Used in a proportion of 10 parts by weight. If the amount is less than this, halogen ions in the organic layer cannot be removed, and if it is more than that, adamantyl (meth) acrylates are hydrolyzed.

【0017】酸洗浄は、酸洗浄が硫酸、塩酸、硝酸、リ
ン酸、シュウ酸およびメタンスルホン酸からなる群から
選ばれる水溶液で洗浄する。好ましくは、硫酸を用い
る。酸の量は、有機層1重量部に対して0.01〜10
0重量部、好ましくは0.1〜5重量部の割合で使用す
る。洗浄回数は1〜20回、好ましくは2〜10回行
う。
In the acid washing, the acid washing is performed with an aqueous solution selected from the group consisting of sulfuric acid, hydrochloric acid, nitric acid, phosphoric acid, oxalic acid and methanesulfonic acid. Preferably, sulfuric acid is used. The amount of the acid is 0.01 to 10 parts by weight based on 1 part by weight of the organic layer.
0 parts by weight, preferably 0.1 to 5 parts by weight. Washing is performed 1 to 20 times, preferably 2 to 10 times.

【0018】水洗浄は、純水が好ましい。純水は、有機
層1重量部に対して0.01〜100重量部、好ましく
は0.1〜5重量部の割合で使用する。洗浄回数は1〜
20回、好ましくは2〜10回行う。
For the water washing, pure water is preferable. Pure water is used in an amount of 0.01 to 100 parts by weight, preferably 0.1 to 5 parts by weight, based on 1 part by weight of the organic layer. The washing frequency is 1
This is performed 20 times, preferably 2 to 10 times.

【0019】アルカリ洗浄、酸洗浄および純水洗浄の温
度は、0℃〜95℃、好ましくは10℃〜60℃であ
る。これより低温の場合には洗浄効果が低下し、高温の
場合にはアダマンチル(メタ)アクリレートが加水分解
する。
The temperature of the alkali washing, acid washing and pure water washing is 0 ° C. to 95 ° C., preferably 10 ° C. to 60 ° C. If the temperature is lower than this, the washing effect is reduced, and if the temperature is higher, adamantyl (meth) acrylate is hydrolyzed.

【0020】洗浄効果の判定は、洗浄後の有機層や水洗
水を比色法や原子吸光法等の分析法で分析し金属不純物
やハロゲンイオンの濃度を管理する。簡便な方法とし
て、水洗廃水の電気伝導度が10mS/m以下になれ
ば、アダマンチル(メタ)アクリレート類の含まれる金
属不純物が100ppb以下でかつハロゲンイオンが1
000ppb以下にすることができる。洗浄後、得られ
た有機層から濃縮、晶析することにより高純度アダマン
チル(メタ)アクリレート類が得られる。
The determination of the cleaning effect is performed by analyzing the organic layer after washing and the washing water by an analytical method such as a colorimetric method or an atomic absorption method to control the concentrations of metal impurities and halogen ions. As a simple method, when the electric conductivity of the washing wastewater becomes 10 mS / m or less, metal impurities including adamantyl (meth) acrylates are 100 ppb or less and halogen ions are 1
000 ppb or less. After washing, the resulting organic layer is concentrated and crystallized to obtain high-purity adamantyl (meth) acrylates.

【0021】本発明では、反応、洗浄、分離や乾燥等で
使用する装置及び器具、容器等には不純物が溶出しない
材質、例えばグラスライニング、チタン、ハステロイ、
合成石英やテフロン(登録商標)で構成されたものを使
用するのが好ましい。これらの装置等も表面の金属不純
物やハロゲンイオンを洗浄により除去するのが好まし
い。簡便な方法として、これらの装置等の洗浄廃水の電
気伝導度が5mS/m以下になるまで洗浄すればよい。
According to the present invention, materials that do not elute impurities, such as glass lining, titanium, Hastelloy,
It is preferable to use one made of synthetic quartz or Teflon (registered trademark). It is preferable that these devices and the like also remove metal impurities and halogen ions on the surface by washing. As a simple method, washing may be performed until the electric conductivity of the washing wastewater of these devices and the like becomes 5 mS / m or less.

【0022】[0022]

【実施例】以下、実施例により本発明をさらに具体的に
説明する。但し、本発明はこれらの実施例により限定さ
れるものではない。
The present invention will be described more specifically with reference to the following examples. However, the present invention is not limited by these examples.

【0023】実施例1 撹拌機、温度計、Dean−Stark水分離器、ジム
ロート冷却器及び空気導入管をつけた2000ml容量
のガラス製4つ口フラスコに1,3−アダマンタンジオ
ール84g、n−オクタン400ml、トルエン400
ml、メタクリル酸129g、濃硫酸1.2g、p−メ
トキシフェノール0.37gを仕込んだ。使用したガラ
ス器具は1重量%塩酸水溶液で洗浄し、さらに純水で洗
浄廃水の電気伝導度が5mS/mになるまで洗浄した。
そして、少量の空気を吹き込みながら還流状態(115
℃)で5時間反応した。この間、水抜き管より副生する
水を除去した。反応液を室温まで冷却後、5重量%水酸
化ナトリウム水溶液840gを加えて洗浄した。その
後、純水800mlを加えて2回洗浄した。反応液をよ
く洗浄したガラス製フラスコに移し、5重量%硫酸水溶
液400gで2回洗浄し、さらに純水800mlを加え
て2回洗浄した。有機層を濃縮して析出した固体をガラ
スフィルターで濾取、乾燥し、3−ヒドロキシ−1−ア
ダマンチルモノメタクリレート90gを得た。
Example 1 In a 2000 ml glass four-necked flask equipped with a stirrer, thermometer, Dean-Stark water separator, Dimroth condenser and air inlet tube, 84 g of 1,3-adamantanediol, n-octane 400 ml, toluene 400
ml, 129 g of methacrylic acid, 1.2 g of concentrated sulfuric acid, and 0.37 g of p-methoxyphenol. The used glassware was washed with a 1% by weight aqueous hydrochloric acid solution, and further washed with pure water until the electrical conductivity of the washing wastewater became 5 mS / m.
Then, while blowing a small amount of air, the reflux state (115
C) for 5 hours. During this time, by-product water was removed from the drain tube. After cooling the reaction solution to room temperature, 840 g of a 5% by weight aqueous sodium hydroxide solution was added thereto for washing. Thereafter, 800 ml of pure water was added to wash twice. The reaction solution was transferred to a well-washed glass flask, washed twice with 400 g of a 5% by weight aqueous sulfuric acid solution, and further washed twice with 800 ml of pure water. The organic layer was concentrated, and the precipitated solid was collected by filtration with a glass filter and dried to obtain 90 g of 3-hydroxy-1-adamantyl monomethacrylate.

【0024】原料の1,3−アダマンタンジオール中の
金属不純物は、Na:355ppb、Ca:236pp
b、Mg:98ppb、Fe:1800ppbであった
が、3−ヒドロキシ−1−アダマンチルモノメタクリレ
ート中の金属不純物は、Na:34ppb、Ca:18
ppb、Mg:6ppb、Fe:94ppb、Zn:1
2ppbであり、K、Al、Cr、Cu、Ni、Pbに
ついては20ppb以下、遊離塩素112ppbであっ
た。
The metal impurities in the raw material 1,3-adamantanediol are Na: 355 ppb and Ca: 236 ppb.
b, Mg: 98 ppb and Fe: 1800 ppb, but the metal impurities in 3-hydroxy-1-adamantyl monomethacrylate were Na: 34 ppb and Ca: 18
ppb, Mg: 6 ppb, Fe: 94 ppb, Zn: 1
It was 2 ppb, K, Al, Cr, Cu, Ni and Pb were 20 ppb or less and free chlorine was 112 ppb.

【0025】実施例2 メタクリル酸の代わりにアクリル酸108gを仕込んで
実施例1と同様の操作を行ったところ、3−ヒドロキシ
−1−アダマンチルモノアクリレート70gを得た。3
−ヒドロキシ−1−アダマンチルモノメタクリレート中
の金属不純物は、Na:65ppb、Ca:28pb、
Mg:9ppb、Fe:97ppb、Zn:11ppb
であり、K、Al、Cr、Cu、Ni、Pbについては
20ppb以下、遊離塩素118ppbであった。
Example 2 The same operation as in Example 1 was carried out except that 108 g of acrylic acid was charged instead of methacrylic acid, to obtain 70 g of 3-hydroxy-1-adamantyl monoacrylate. Three
Metal impurities in -hydroxy-1-adamantyl monomethacrylate are as follows: Na: 65 ppb, Ca: 28 ppb,
Mg: 9 ppb, Fe: 97 ppb, Zn: 11 ppb
K, Al, Cr, Cu, Ni, and Pb were 20 ppb or less and free chlorine was 118 ppb.

【0026】比較例1 反応液をアルカリ洗浄として水酸化ナトリウム水溶液8
40gで1回洗浄した後、イオン交換水375gで5回
洗浄した以外は、実施例1と同様の操作を行った。得ら
れた3−ヒドロキシ−1−アダマンチルモノメタクリレ
ート中の金属不純物はNa:150ppbであった。
Comparative Example 1 A sodium hydroxide aqueous solution 8
After washing once with 40 g, the same operation as in Example 1 was performed, except that washing was performed five times with 375 g of ion-exchanged water. The metal impurity in the obtained 3-hydroxy-1-adamantyl monomethacrylate was Na: 150 ppb.

【0027】[0027]

【発明の効果】本発明により、金属不純物をほとんど含
まないアダマンチル(メタ)アクリレート類を得ること
ができる。
According to the present invention, adamantyl (meth) acrylates containing almost no metal impurities can be obtained.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 古川 喜久夫 茨城県つくば市和台22番地 三菱瓦斯化学 株式会社総合研究所内 Fターム(参考) 4H006 AA02 AC48 AD16 BA08 BA10 BA12 BA14 BA66 BA67 BC50 KA03 KA06 KD10 KE20 4H039 CA66 CD10 CD30  ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Kikuo Furukawa 22nd Wadai, Tsukuba-shi, Ibaraki F-term (reference) in Mitsubishi Gas Chemical Company, Ltd. 4H006 AA02 AC48 AD16 BA08 BA10 BA12 BA14 BA66 BA67 BC50 KA03 KA06 KD10 KE20 4H039 CA66 CD10 CD30

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 エステル化触媒の存在下、アダマンタノ
ール類を(メタ)アクリル酸(エステル)と反応させた
後、反応液をアルカリ洗浄および酸洗浄することを特徴
とするアダマンチル(メタ)アクリレート類の製造方
法。
An adamantyl (meth) acrylate comprising reacting an adamantanol with a (meth) acrylic acid (ester) in the presence of an esterification catalyst, and then washing the reaction solution with an alkali and an acid. Manufacturing method.
【請求項2】 エステル化触媒が硫酸、塩酸等の鉱酸、
メタンスルホン酸、p−トルエンスルホン酸、シュウ酸
等の有機酸、および3〜8族金属元素の化合物からなる
群から選ばれる化合物である請求項1記載の製造方法。
2. The esterification catalyst is a mineral acid such as sulfuric acid or hydrochloric acid,
The production method according to claim 1, wherein the production method is a compound selected from the group consisting of organic acids such as methanesulfonic acid, p-toluenesulfonic acid, and oxalic acid, and compounds of Group 3 to 8 metal elements.
【請求項3】 アルカリ洗浄が水酸化ナトリウム、水酸
化カリウムおよび水酸化アンモニウムからなる群から選
ばれる水溶液で洗浄する請求項1記載の製造方法。
3. The method according to claim 1, wherein the alkali washing is carried out with an aqueous solution selected from the group consisting of sodium hydroxide, potassium hydroxide and ammonium hydroxide.
【請求項4】 酸洗浄が硫酸、塩酸、硝酸、リン酸、シ
ュウ酸およびメタンスルホン酸からなる群から選ばれる
水溶液で洗浄する請求項1記載の製造方法。
4. The method according to claim 1, wherein the acid washing is carried out with an aqueous solution selected from the group consisting of sulfuric acid, hydrochloric acid, nitric acid, phosphoric acid, oxalic acid and methanesulfonic acid.
【請求項5】 酸洗浄後に水洗を行い、水洗廃水の電気
伝導度が10mS/m以下になるまで水洗を繰り返す請
求項1記載の製造方法。
5. The production method according to claim 1, wherein water washing is performed after the acid washing, and the water washing is repeated until the electric conductivity of the washing wastewater becomes 10 mS / m or less.
【請求項6】 水洗廃水の電気伝導度が5mS/m以下
になるまで洗浄した反応器を反応に用いる請求項1記載
の製造方法。
6. The method according to claim 1, wherein a reactor washed until the electric conductivity of the washing wastewater becomes 5 mS / m or less is used for the reaction.
JP2000173205A 2000-06-09 2000-06-09 Method for producing high-purity adamantyl (meth) acrylates Expired - Lifetime JP4609611B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000173205A JP4609611B2 (en) 2000-06-09 2000-06-09 Method for producing high-purity adamantyl (meth) acrylates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000173205A JP4609611B2 (en) 2000-06-09 2000-06-09 Method for producing high-purity adamantyl (meth) acrylates

Publications (2)

Publication Number Publication Date
JP2001354619A true JP2001354619A (en) 2001-12-25
JP4609611B2 JP4609611B2 (en) 2011-01-12

Family

ID=18675485

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000173205A Expired - Lifetime JP4609611B2 (en) 2000-06-09 2000-06-09 Method for producing high-purity adamantyl (meth) acrylates

Country Status (1)

Country Link
JP (1) JP4609611B2 (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002226436A (en) * 2001-02-01 2002-08-14 Daicel Chem Ind Ltd (meth)acrylate having cyclic skeleton
JP2006036732A (en) * 2004-07-30 2006-02-09 Osaka Organic Chem Ind Ltd Production method for adamantyl (meth)acrylate compound
JP2007223932A (en) * 2006-02-22 2007-09-06 Mitsubishi Gas Chem Co Inc Method for producing highly pure adamanthyl (meth)acrylate compounds
JP2009007304A (en) * 2007-06-28 2009-01-15 Mitsubishi Gas Chem Co Inc Method for preparing adamantyl(meth)acrylates
JP2009029728A (en) * 2007-07-25 2009-02-12 Mitsubishi Gas Chem Co Inc Method for producing adamantyl (meth)acrylate
JP2009091334A (en) * 2007-10-11 2009-04-30 Mitsubishi Gas Chem Co Inc Method for producing an adamantyl (meth)acrylate
JP2010229160A (en) * 2010-07-14 2010-10-14 Mitsubishi Gas Chemical Co Inc Method for producing adamantyl (meth)acrylates
CN104418735A (en) * 2013-08-29 2015-03-18 傅志伟 Preparation method of adamantine monoester
JP2018104360A (en) * 2016-12-27 2018-07-05 株式会社クラレ Process for producing ester

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6333350A (en) * 1986-07-25 1988-02-13 Naade Kenkyusho:Kk Adamantyl mono (meth)acrylate derivative and polymer including the derivative
JPS63126502A (en) * 1986-11-18 1988-05-30 Nippon Zeon Co Ltd Method for refining polymer for material to be coated on semiconductor substrate
JPH05234876A (en) * 1991-09-03 1993-09-10 Ocg Microelectron Materials Inc Method for removing metal impurity from resist component
JPH08310995A (en) * 1995-05-22 1996-11-26 Dainippon Ink & Chem Inc Production of ester of (meth)acrylic acid and t-alcohol
JPH10165933A (en) * 1996-12-16 1998-06-23 Japan Organo Co Ltd Apparatus for recovery treatment of tetraalkylammonium hydroxide solution from photoresist developing waste solution
JPH1135522A (en) * 1997-05-23 1999-02-09 Daicel Chem Ind Ltd Polymerizable adamantane derivative and its production

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6333350A (en) * 1986-07-25 1988-02-13 Naade Kenkyusho:Kk Adamantyl mono (meth)acrylate derivative and polymer including the derivative
JPS63126502A (en) * 1986-11-18 1988-05-30 Nippon Zeon Co Ltd Method for refining polymer for material to be coated on semiconductor substrate
JPH05234876A (en) * 1991-09-03 1993-09-10 Ocg Microelectron Materials Inc Method for removing metal impurity from resist component
JPH08310995A (en) * 1995-05-22 1996-11-26 Dainippon Ink & Chem Inc Production of ester of (meth)acrylic acid and t-alcohol
JPH10165933A (en) * 1996-12-16 1998-06-23 Japan Organo Co Ltd Apparatus for recovery treatment of tetraalkylammonium hydroxide solution from photoresist developing waste solution
JPH1135522A (en) * 1997-05-23 1999-02-09 Daicel Chem Ind Ltd Polymerizable adamantane derivative and its production

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002226436A (en) * 2001-02-01 2002-08-14 Daicel Chem Ind Ltd (meth)acrylate having cyclic skeleton
JP2006036732A (en) * 2004-07-30 2006-02-09 Osaka Organic Chem Ind Ltd Production method for adamantyl (meth)acrylate compound
JP4576173B2 (en) * 2004-07-30 2010-11-04 大阪有機化学工業株式会社 Method for producing adamantyl (meth) acrylate compound
JP2007223932A (en) * 2006-02-22 2007-09-06 Mitsubishi Gas Chem Co Inc Method for producing highly pure adamanthyl (meth)acrylate compounds
JP2009007304A (en) * 2007-06-28 2009-01-15 Mitsubishi Gas Chem Co Inc Method for preparing adamantyl(meth)acrylates
JP2009029728A (en) * 2007-07-25 2009-02-12 Mitsubishi Gas Chem Co Inc Method for producing adamantyl (meth)acrylate
JP2009091334A (en) * 2007-10-11 2009-04-30 Mitsubishi Gas Chem Co Inc Method for producing an adamantyl (meth)acrylate
JP2010229160A (en) * 2010-07-14 2010-10-14 Mitsubishi Gas Chemical Co Inc Method for producing adamantyl (meth)acrylates
CN104418735A (en) * 2013-08-29 2015-03-18 傅志伟 Preparation method of adamantine monoester
JP2018104360A (en) * 2016-12-27 2018-07-05 株式会社クラレ Process for producing ester

Also Published As

Publication number Publication date
JP4609611B2 (en) 2011-01-12

Similar Documents

Publication Publication Date Title
JP5064614B2 (en) Method for producing (meth) acrylic acid ester having cyclic skeleton
JP2001354619A (en) Method for producing highly pure adamantyl (meth) acrylates
KR100738302B1 (en) Process for Producing 2-alkyl-2-adamantyl ester
JP2005314383A (en) Adamantane derivative and its preparation method
JP5219319B2 (en) Method for producing adamantyl (meth) acrylates
JP4790290B2 (en) Adamantane derivative and method for producing the same
JP2000309558A (en) Production of 2-adamanthyl(meth)acrylate compound
JP4860069B2 (en) Method for producing methacrylic acid ester having cyclic skeleton
JP4862323B2 (en) Method for producing high purity adamantyl (meth) acrylates
JP3885249B2 (en) Purification method of glycidyl (meth) acrylate
JP5206183B2 (en) Method for producing adamantyl (meth) acrylates
JP4171635B2 (en) Method for producing 2-alkyl-2-adamantyl (meth) acrylate
JP2002241342A (en) Method for producing 2-hydrocarbyl-2-adamantyl acrylates
JP4667593B2 (en) Process for producing 2-alkyl-2-adamantyl (meth) acrylates
JP2001335519A (en) Method for producing adamantanepolyol
JP2007106749A (en) Method for producing hydroquinone mono(meth)acrylate
JP5040120B2 (en) Method for producing high purity adamantyl (meth) acrylates
JP4815951B2 (en) New adamantyl ester compounds
JP2626336B2 (en) Method for producing hexamethylcyclotrisilazane
JPH11158130A (en) Production of aminopolycarboxylic acid
JP4118653B2 (en) Method for producing 2-alkyl-2-adamantyl (meth) acrylate
JP5299369B2 (en) Method for producing adamantyl (meth) acrylates
CN101891570A (en) Process for producing adamantanol
JP6685367B2 (en) Method for producing adamantyl (meth) acrylate compound
JP2004315464A (en) Method for producing adamantyl acrylate compound

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070508

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100630

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100826

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100915

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100928

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131022

Year of fee payment: 3

R151 Written notification of patent or utility model registration

Ref document number: 4609611

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131022

Year of fee payment: 3

EXPY Cancellation because of completion of term