JP2001350117A - Laser beam intensity distribution flattening mask, and device and method for laser plating using the same - Google Patents

Laser beam intensity distribution flattening mask, and device and method for laser plating using the same

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Publication number
JP2001350117A
JP2001350117A JP2000173468A JP2000173468A JP2001350117A JP 2001350117 A JP2001350117 A JP 2001350117A JP 2000173468 A JP2000173468 A JP 2000173468A JP 2000173468 A JP2000173468 A JP 2000173468A JP 2001350117 A JP2001350117 A JP 2001350117A
Authority
JP
Japan
Prior art keywords
laser
intensity distribution
plating
mask
output beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000173468A
Other languages
Japanese (ja)
Inventor
Naomichi Okamoto
尚道 岡本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hamamatsu Foundation for Science and Technology Promotion
Original Assignee
Hamamatsu Foundation for Science and Technology Promotion
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hamamatsu Foundation for Science and Technology Promotion filed Critical Hamamatsu Foundation for Science and Technology Promotion
Priority to JP2000173468A priority Critical patent/JP2001350117A/en
Publication of JP2001350117A publication Critical patent/JP2001350117A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a laser plating method which makes the light intensity distribution of a laser beam constant and improves the flatness of a plating deposit surface. SOLUTION: The output beam from a laser oscillator 1 is passed through a condenser lens 4 and a mask 3 having a prescribed amplitude transmittivity and a prescribed phase shift to make the light intensity distribution on a light convergence surface 5 constant in a specific figure. ON the light convergence surface 5, a plated surface which is brought into contact with electroless planting liquid liquid is arranged to improve the flatness of the planting deposit surface. Laser plating wherein the output beam from the laser oscillator 1 is expanded through a beam expander and guided in the mentioned device is adaptive to cases wherein a large-output laser is needed.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、レーザ光の強度分
布を平坦化するマスクと、それを用いたレーザメッキ装
置ならびにレーザメッキ方法に関する。
[0001] 1. Field of the Invention [0002] The present invention relates to a mask for flattening the intensity distribution of laser light, a laser plating apparatus and a laser plating method using the same.

【0002】[0002]

【従来の技術】近年、無電解メッキにおいてレーザ光を
照射し、必要な部位のみに金属をメッキする研究が進ん
でいる。しかし、数十ミクロン程度の小スポットにレー
ザ光を集光してメッキを行うと、レーザ光の強度分布は
中央部ほど大きいためスポットの中央部が過度に加熱さ
れて、メッキ表面の中央部が凹むとか、荒れるという問
題が指摘されている。
2. Description of the Related Art In recent years, studies have been made on irradiating a laser beam in electroless plating and plating metal only on necessary portions. However, if laser light is focused on a small spot of about several tens of microns and plating is performed, the central part of the spot is excessively heated because the intensity distribution of the laser light is large near the center, and the central part of the plating surface is Problems such as denting and roughening have been pointed out.

【0003】これは、レーザメッキを携帯電話や携帯端
末などの小型軽量電子機器のプリント基板製造に適用し
ていく場合に、克服されなければならない重要な課題で
ある。
This is an important problem that must be overcome when laser plating is applied to the manufacture of printed circuit boards for small and light electronic devices such as mobile phones and mobile terminals.

【0004】この技術分野の最近の公知例として「レー
ザ照射による銅の無電解めっき」(第13回エレクトロ
ニクス実装学術講演大会講演番号19A−08、平成1
1年3月)がある。この場合、アルゴンレーザ光をレン
ズで単に集光するのみであり、ニッケル面へメッキした
銅のスポット中央部に凹みが生じている。
As a recent known example of this technical field, "electroless plating of copper by laser irradiation" (lecture number 19A-08 of the 13th Annual Meeting of the Japan Institute of Electronics Packaging, Heisei 1)
March of the year). In this case, the argon laser light is simply condensed by the lens, and a depression is formed at the center of the copper spot plated on the nickel surface.

【0005】[0005]

【発明が解決しようとする課題】本発明は、以上で述べ
たような従来技術の欠点を除くために行われたものであ
り、レーザからの出力ビームを集光するレンズの近傍に
マスクを配置することにより、集光面での光強度分布を
一定とし、レーザメッキ析出面の平坦度を改善すること
を目的とする。
SUMMARY OF THE INVENTION The present invention has been made in order to eliminate the above-mentioned drawbacks of the prior art, and has a mask disposed near a lens for condensing an output beam from a laser. By doing so, it is an object to make the light intensity distribution on the condensing surface constant and improve the flatness of the laser plating deposition surface.

【0006】また、レーザからの出力ビームの口径をビ
ームエキスパンダで拡大して、マスクとレンズを通して
集光することにより、マスク面の光強度レベルを低下さ
せ、より大出力のレーザを用いたレーザメッキを可能と
することを目的とする。
[0006] Further, the diameter of the output beam from the laser is enlarged by a beam expander and condensed through a mask and a lens, so that the light intensity level on the mask surface is reduced, and a laser using a higher output laser is used. The purpose is to enable plating.

【0007】[0007]

【課題を解決するための手段】本発明者は、上記のよう
な技術の現状を考慮しつつ、研究を重ねた結果、集光用
レンズの近傍で所定の透過率分布と位相シフト分布をレ
ーザ光に与えることにより、集光面で光強度分布が一定
のスポット形状を生ぜしむることを見出した。
Means for Solving the Problems The present inventor has conducted various studies in consideration of the current state of the art as described above, and as a result, has determined that a predetermined transmittance distribution and a phase shift distribution can be obtained in the vicinity of a converging lens. It has been found that by giving light, the light intensity distribution produces a constant spot shape on the condensing surface.

【0008】すなわち、本発明は、レーザ光を一定光強
度のスポットに変換しうるマスクを提供し、該マスクを
用いたレーザメッキ方法によって、メッキ面の平坦度を
改善することが可能である。
That is, the present invention provides a mask capable of converting a laser beam into a spot having a constant light intensity, and it is possible to improve the flatness of a plating surface by a laser plating method using the mask.

【0009】[0009]

【発明の実施の形態】本発明は、レーザからの出力ビー
ムを集光するレンズの近傍に、所定の振幅透過率と位相
シフトを与えるマスクを配置し、集光面上の所定の範囲
内における光強度分布を一定とせしめることを特徴とす
るものである。
According to the present invention, a mask for giving a predetermined amplitude transmittance and a phase shift is arranged in the vicinity of a lens for collecting an output beam from a laser, and a mask is provided within a predetermined range on a light collecting surface. It is characterized in that the light intensity distribution is kept constant.

【0010】マスクおよび集光用レンズに入射した基本
ガウシアンビームのレーザ光のスポットサイズをw、波
面の曲率半径をR、波長をλとし、レンズの焦点距離を
fとすると、レンズの後方d=(1/f−1/R)-1の集光
面において、たとえば半径aの円内を一定光強度とする
ためには、回折公式の計算によって、マスクの振幅透過
率Tが、 T=exp[(r/w)2]│J1(2πar/λd) │λd/(πar) (式1) と求められる。ただし、rは集光面における中心からの
半径、J1は1次のベッセル関数、││は絶対値を示
す。さらに、マスクの位相シフト量は、上記ベッセル関
数の値が正の範囲で0、負の範囲でπラジアンとする。
If the spot size of the laser beam of the basic Gaussian beam incident on the mask and the condenser lens is w, the radius of curvature of the wavefront is R, the wavelength is λ, and the focal length of the lens is f, then d = On the (1 / f-1 / R) -1 light-converging surface, for example, in order to obtain a constant light intensity within a circle having a radius a, the diffraction formula calculates the amplitude transmittance T of the mask as T = exp [(r / w) 2 ] │J 1 (2πar / λd) │λd / (πar) (Equation 1) Here, r is the radius from the center on the light-converging surface, J 1 is a first-order Bessel function, and | │ indicates an absolute value. Further, the amount of phase shift of the mask is 0 when the value of the Bessel function is positive and π radian when the value is negative.

【0011】一般的には、マスクの振幅透過率と位相の
パターンは、目的とするメッキスポット形状のフーリエ
変換を出力レーザビームの光強度分布関数で除したもの
であればよい。以上のような振幅透過率と位相シフトを
与えるマスクは、1枚に限らず複数枚で構成されても良
い。
In general, the pattern of the amplitude transmittance and the phase of the mask may be any pattern obtained by dividing the Fourier transform of the target plating spot shape by the light intensity distribution function of the output laser beam. The number of masks giving the amplitude transmittance and the phase shift as described above is not limited to one, but may be plural.

【0012】さらに、該マスクを用いたレーザメッキ方
法は、メッキ析出面の平坦度を改善せしめ、微細なメッ
キパターンを描画する性能を向上させうることに特徴が
ある。
Further, the laser plating method using the mask is characterized in that the flatness of a plating deposition surface can be improved and the performance of drawing a fine plating pattern can be improved.

【0013】レーザメッキに用いるレーザとしては、従
来水冷アルゴンレーザを用いた報告が多いが、半導体レ
ーザ励起の小型固体レーザ、あるいはその第2高調波
が、被メッキ物の材料に応じて用いられうることを実験
で確認している。
As a laser used for laser plating, there have been many reports using a water-cooled argon laser in the past. A small solid-state laser pumped by a semiconductor laser or its second harmonic can be used depending on the material of the object to be plated. This has been confirmed by experiments.

【0014】実施の形態1 図1は本発明の一実施の形態を示すものであり、1はレ
ーザ発振器、2はレーザビーム、3はマスク、4は集光
用レンズ、5は集光面である。レーザメッキを行う場合
には、この集光面5に無電解メッキ液に接触させた被メ
ッキ面が配置される。マスク3は、集光用レンズ4の直
前または直後に配置される。
Embodiment 1 FIG. 1 shows an embodiment of the present invention, wherein 1 is a laser oscillator, 2 is a laser beam, 3 is a mask, 4 is a condenser lens, and 5 is a condenser surface. is there. When laser plating is performed, a surface to be plated that is brought into contact with the electroless plating solution is disposed on the light-collecting surface 5. The mask 3 is arranged immediately before or immediately after the condenser lens 4.

【0015】図1に示す構成によって、図2に示す基本
ガウシアンビームの光強度分布をもつレーザビーム2
は、所定の振幅透過率と位相シフトを与えるマスク3に
よって、図3に示すように集光面で所定の半径の円内が
一定の光強度となる。前述のとおり、図3に示す光強度
分布を得るためにマスク3によって与えられる振幅透過
率は、式1により表わされる。振幅透過率と位相シフト
を図4に図示した。図4はマスク3の振幅透過率と位相
シフトの半径方向の変化を示している。
The laser beam 2 having the light intensity distribution of the basic Gaussian beam shown in FIG.
As shown in FIG. 3, a constant light intensity is obtained within a circle having a predetermined radius on the light-converging surface by the mask 3 that provides a predetermined amplitude transmittance and a phase shift. As described above, the amplitude transmittance provided by the mask 3 to obtain the light intensity distribution shown in FIG. FIG. 4 shows the amplitude transmittance and the phase shift. FIG. 4 shows changes in the amplitude transmittance and the phase shift of the mask 3 in the radial direction.

【0016】このようなマスク3を使用して、集光面5
におけるレーザビーム2を図3に示す光強度分布とてレ
ーザメッキを行えば、レーザ光のスポットの中央部が過
度に加熱されることはなく、メッキ面の凹みや荒れなど
の問題が改善され、平坦度が向上する。
Using such a mask 3, a light-collecting surface 5
If the laser beam 2 is subjected to laser plating with the light intensity distribution shown in FIG. 3, the central portion of the laser beam spot is not excessively heated, and problems such as dents and roughness of the plating surface are improved. The flatness is improved.

【0017】実施の形態2 図5は、本発明の第2の実施の形態を示すものであり、
1は大出力のレーザ発振器、2はレーザビーム、3はマ
スク、4は集光用レンズ、5は集光面、6はビームエキ
スパンダである。レーザメッキを行う場合には、この集
光面5に無電解メッキ液に接触させた被メッキ面が配置
される。
Embodiment 2 FIG. 5 shows a second embodiment of the present invention.
1 is a high-power laser oscillator, 2 is a laser beam, 3 is a mask, 4 is a condenser lens, 5 is a condenser surface, and 6 is a beam expander. When laser plating is performed, a surface to be plated that is brought into contact with the electroless plating solution is disposed on the light-collecting surface 5.

【0018】図5に示す構成によって、大出力レーザ発
振器1からのレーザビーム2は、ビームエキスパンダ6
でスポットサイズを拡大され、実施の形態1よりも低い
光強度レベルでマスク3に入射し、図3に示すように集
光面で所定の半径の円内が一定の光強度となる。第2の
実施の形態によって、レーザービーム2によるマスク3
の温度上昇が緩和され、大出力のレーザの使用が可能と
なる。金属面のレーザメッキは、熱伝導が良いために高
分子面に対するメッキに比べてより大きな出力のレーザ
が必要であり、本実施の形態の適用が有用である。
With the configuration shown in FIG. 5, the laser beam 2 from the high-power laser oscillator 1
The spot size is enlarged, and the light is incident on the mask 3 at a light intensity level lower than that of the first embodiment. As shown in FIG. 3, the inside of a circle having a predetermined radius on the light collecting surface has a constant light intensity. According to the second embodiment, the mask 3 by the laser beam 2
Temperature rise is alleviated, and a high-power laser can be used. Laser plating of a metal surface requires a laser with a higher output than plating of a polymer surface because of good heat conduction, and the application of this embodiment is useful.

【0019】[0019]

【発明の効果】本発明のマスクによって、レーザからの
出力ビームが中心部ほど大きい光強度分布であるもの
を、集光面における所定メッキスポット図形内で一定の
光強度に変換できる。したがって、メッキスポットの中
央部が過度に加熱されることがなくなる。
According to the mask of the present invention, an output beam from a laser having a larger light intensity distribution toward the center can be converted into a constant light intensity within a predetermined plating spot pattern on the light-collecting surface. Therefore, the central portion of the plating spot is not excessively heated.

【0020】本発明のマスクを用いたレーザメッキ方式
では、メッキ析出面の中央部が凹むとか荒れるなどの従
来の課題が改善されて平坦度が向上し、より微細なパタ
ーンのメッキが可能となる。
In the laser plating method using the mask of the present invention, the conventional problems such as the depression or roughening of the center of the plating deposition surface are improved, the flatness is improved, and a finer pattern can be plated. .

【0021】ビームエキスパンダと本発明のマスクを用
いたレーザメッキ方法では、大出力レーザが必要なメッ
キに対応できる。
The laser plating method using the beam expander and the mask of the present invention can cope with plating requiring a high-output laser.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明のレーザビームの光強度分布平坦化マス
クを用いたレーザメッキ方法の第1の実施の形態の構成
を示す図である。
FIG. 1 is a diagram showing a configuration of a first embodiment of a laser plating method using a laser beam light intensity distribution flattening mask of the present invention.

【図2】レーザからの出力ビームの光強度分布を示す図
である。
FIG. 2 is a diagram showing a light intensity distribution of an output beam from a laser.

【図3】マスクの使用によって集光面で光強度分布が円
内で一定となることを示す図である。
FIG. 3 is a diagram showing that a light intensity distribution on a condensing surface becomes constant within a circle by using a mask.

【図4】マスクの振幅透過率と位相シフトの半径方向の
変化を示す図である。
FIG. 4 is a diagram showing changes in the amplitude transmittance and the phase shift of a mask in the radial direction.

【図5】本発明のレーザビームの光強度分布平坦化マス
クを用いたレーザメッキ方法の第2の実施の形態の構成
を示す図である。
FIG. 5 is a diagram showing a configuration of a second embodiment of a laser plating method using a laser beam light intensity distribution flattening mask according to the present invention.

【符号の説明】[Explanation of symbols]

1 レーザ発振器 2 レーザビーム 3 マスク 4 集光用レンズ 5 集光面またはレーザメッキ面 6 ビームエキスパンダ DESCRIPTION OF SYMBOLS 1 Laser oscillator 2 Laser beam 3 Mask 4 Focusing lens 5 Focusing surface or laser plating surface 6 Beam expander

フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C23C 18/16 B23K 101:42 // B23K 101:42 G02B 27/00 E Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat II (reference) C23C 18/16 B23K 101: 42 // B23K 101: 42 G02B 27/00 E

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 レーザビームを集光する集光用レンズの
近傍かつレーザビームの光軸上に配置され、レーザビー
ムに所定の振幅および位相の変化を与えることにより、
レーザビームの波面の曲率半径Rおよび集光用レンズの
焦点距離fを用いて d=(1/f−1/R)-1 で表わされる距離dだけ集光用レンズから離れて位置す
る集光面におけるレーザービームの強度の分布を一定値
にするレーザ光強度分布平坦化マスク。
1. A method according to claim 1, wherein the laser beam is arranged in the vicinity of a focusing lens for focusing the laser beam and on the optical axis of the laser beam so as to give the laser beam a predetermined change in amplitude and phase.
Using the radius of curvature R of the wavefront of the laser beam and the focal length f of the condensing lens, the condensing light is located away from the condensing lens by a distance d represented by d = (1 / f−1 / R) −1. A laser light intensity distribution flattening mask for making the intensity distribution of the laser beam on the surface constant.
【請求項2】 集光用レンズからの距離がdである集光
面において、半径aの円領域内のビーム強度分布を一定
とするために、入射するビームのスポットサイズ半径
w、入射するビームの波長λ、および集光面の前記円領
域内における中心からの距離rに対し T=exp[(r/w)2]│J1(2πar/λd) │λd/(πar) で表わされる振幅透過率Tを有し、かつ上記1次のベッ
セル関数J1の値が負となるrの範囲でπラジアンの相
対位相シフトを与える請求項1記載のレーザ光強度分布
平坦化マスク。
2. In order to maintain a constant beam intensity distribution in a circular area having a radius a on a converging surface whose distance from the converging lens is d, a spot size radius w of an incident beam and an incident beam T = exp [(r / w) 2 ] │J 1 (2πar / λd) │λd / (πar) with respect to the wavelength λ of the light-condensing surface and the distance r from the center of the light-collecting surface within the circular region. has a transmittance T, and the laser light intensity distribution flattened mask according to claim 1, wherein the value of the first-order Bessel function J 1 gives a relative phase shift of π radians in the range of the negative r.
【請求項3】 レーザ発振器からの出力ビームを集光用
レンズで集光し、集光された出力ビームを被メッキ面に
投射することによりメッキを行なうレーザメッキ装置に
おいて、集光用レンズの直前または直後に配置され、出
力ビームに所定の振幅および位相の変化を与えることに
より、被メッキ面に投射される出力ビームの強度の分布
を被メッキ面上の被投射範囲内で一定値にするレーザ光
強度分布平坦化マスク。
3. A laser plating apparatus for performing plating by condensing an output beam from a laser oscillator with a condensing lens and projecting the converged output beam onto a surface to be plated. Or a laser that is disposed immediately after the output beam to give a predetermined amplitude and phase change so that the intensity distribution of the output beam projected on the surface to be plated is kept constant within the projection range on the surface to be plated. Light intensity distribution flattening mask.
【請求項4】 被メッキ面が、集光用レンズの焦点距離
fおよび出力ビームの集光用レンズ位置における波面の
曲率半径Rを用いて d=(1/f−1/R)-1 で表わされる距離dだけ集光用レンズから離れた位置に
配置される請求項3記載のレーザ光強度分布平坦化マス
ク。
4. The surface to be plated is d = (1 / f−1 / R) −1 using the focal length f of the condenser lens and the radius of curvature R of the wavefront at the position of the condenser lens of the output beam. 4. The laser light intensity distribution flattening mask according to claim 3, wherein the laser light intensity distribution flattening mask is disposed at a position apart from the focusing lens by a distance d represented by the distance.
【請求項5】 レーザ発振器からの出力ビームの径をビ
ームエキスパンダで変化させて、請求項3または4記載
のレーザ光強度分布平坦化マスクおよび集光用レンズに
入射させることにより、該レーザ光強度分布平坦化マス
クの表面における出力ビームの強度を変化させ、被メッ
キ面に投射される出力ビームの強度の分布を一定値にす
るとともに、被メッキ面に投射される出力ビームの強度
を変化させるレーザメッキ装置。
5. The laser beam by changing the diameter of an output beam from a laser oscillator with a beam expander and causing the beam to enter a laser beam intensity distribution flattening mask and a condenser lens according to claim 3 or 4. By changing the intensity of the output beam on the surface of the intensity distribution flattening mask to make the intensity distribution of the output beam projected on the surface to be plated constant, and changing the intensity of the output beam projected on the surface to be plated Laser plating equipment.
【請求項6】 請求項3または4記載のレーザ光強度分
布平坦化マスクを使用して、レーザ発振器からの出力ビ
ームを、無電解メッキ液に接触させた金属または高分子
表面に集光させ、形成されるメッキ層の平坦度を改善す
るレーザメッキ方法。
6. An output beam from a laser oscillator is focused on a metal or polymer surface brought into contact with an electroless plating solution by using the laser light intensity distribution flattening mask according to claim 3 or 4, A laser plating method for improving the flatness of a formed plating layer.
【請求項7】 請求項5記載のレーザメッキ装置を使用
し、レーザ発振器からの出力ビームを、無電解メッキ液
に接触させた金属または高分子表面に集光させ、形成さ
れるメッキ層の平坦度を改善するレーザメッキ方法。
7. Using a laser plating apparatus according to claim 5, an output beam from a laser oscillator is focused on a metal or polymer surface brought into contact with an electroless plating solution to flatten a plating layer to be formed. Laser plating method to improve the degree.
JP2000173468A 2000-06-09 2000-06-09 Laser beam intensity distribution flattening mask, and device and method for laser plating using the same Pending JP2001350117A (en)

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US7952819B2 (en) 2005-04-12 2011-05-31 Sony Corporation Optical device, light irradiation apparatus and light irradiation method
JP2012514688A (en) * 2009-01-06 2012-06-28 ソルマテス・ベスローテン・フェンノートシャップ Apparatus for projecting an image on a surface and apparatus for moving the image
DE102010005774B4 (en) 2009-08-17 2018-08-23 Topag Lasertechnik Gmbh Device for beam shaping of a laser beam, laser systems with such a device and method for beam shaping of a laser beam
CN112799236A (en) * 2014-11-19 2021-05-14 通快激光与系统工程有限公司 Diffractive optical beam shaping element

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US7952819B2 (en) 2005-04-12 2011-05-31 Sony Corporation Optical device, light irradiation apparatus and light irradiation method
JP2012514688A (en) * 2009-01-06 2012-06-28 ソルマテス・ベスローテン・フェンノートシャップ Apparatus for projecting an image on a surface and apparatus for moving the image
DE102010005774B4 (en) 2009-08-17 2018-08-23 Topag Lasertechnik Gmbh Device for beam shaping of a laser beam, laser systems with such a device and method for beam shaping of a laser beam
CN112799236A (en) * 2014-11-19 2021-05-14 通快激光与系统工程有限公司 Diffractive optical beam shaping element

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