JP2001349817A - Surface-measuring instrument integrated scanning probe microscope - Google Patents
Surface-measuring instrument integrated scanning probe microscopeInfo
- Publication number
- JP2001349817A JP2001349817A JP2000175629A JP2000175629A JP2001349817A JP 2001349817 A JP2001349817 A JP 2001349817A JP 2000175629 A JP2000175629 A JP 2000175629A JP 2000175629 A JP2000175629 A JP 2000175629A JP 2001349817 A JP2001349817 A JP 2001349817A
- Authority
- JP
- Japan
- Prior art keywords
- probe microscope
- microscope
- scanning probe
- optical microscope
- measuring instrument
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
- G01Q30/02—Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope
- G01Q30/025—Optical microscopes coupled with SPM
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
- G01Q30/18—Means for protecting or isolating the interior of a sample chamber from external environmental conditions or influences, e.g. vibrations or electromagnetic fields
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Radiology & Medical Imaging (AREA)
- Electromagnetism (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Microscoopes, Condenser (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、走査型プローブ顕
微鏡に関する。特に、プローブ以外の手段により試料の
表面を測定する表面測定器(例えば光学顕微鏡)を備えた
走査型プローブ顕微鏡に関する。[0001] The present invention relates to a scanning probe microscope. In particular, the present invention relates to a scanning probe microscope provided with a surface measuring device (for example, an optical microscope) for measuring the surface of a sample by means other than a probe.
【０００２】[0002]
【従来の技術】試料のプローブによる測定の前の測定個
所の特定等のために、試料の表面を測定する光学顕微鏡
を備えている表面測定器一体型走査型プローブ顕微鏡は
既に知られている。2. Description of the Related Art A scanning probe microscope integrated with a surface measuring instrument equipped with an optical microscope for measuring the surface of a sample for specifying a measurement point before measurement of the sample by a probe is already known.
【０００３】特開平３−４０３５６号は、このような光
学顕微鏡一体型走査型プローブ顕微鏡のひとつを開示し
ている。この装置では、トンネル顕微鏡と光学顕微鏡は
共通の支持アームによって支持されている。JP-A-3-40356 discloses one such scanning probe microscope integrated with an optical microscope. In this device, the tunnel microscope and the optical microscope are supported by a common support arm.
【０００４】また、特開平２−１６３６０１号は、別の
光学顕微鏡一体型走査型プローブ顕微鏡を開示してい
る。この装置は、光学顕微鏡が、倍率の変更のために複
数の対物レンズを観察光路上に選択的に配置し得るレボ
ルバを備えている。Japanese Patent Laid-Open Publication No. Hei 2-163601 discloses another scanning probe microscope integrated with an optical microscope. This apparatus includes a revolver that allows an optical microscope to selectively arrange a plurality of objective lenses on an observation optical path for changing a magnification.
【０００５】[0005]
【発明が解決しようとする課題】従来技術には以下のよ
うな問題点がある。The prior art has the following problems.
【０００６】通常、プローブ顕微鏡は、原子オーダーの
高分解能な測定を行なっている。装置を床に直に置く
と、床に載っている微小な機械振動が装置に伝わる。そ
の機械振動は、装置各部を微小に振動させる。そのとき
装置の各部が持ついくつかの固有振動数で装置が振動す
る。その振動は、プローブ顕微鏡の探針と試料の間の相
対的な変位を生じさせ、高分解能測定時の弊害となる。Normally, a probe microscope performs high-resolution measurement on the order of atoms. When the device is placed directly on the floor, small mechanical vibrations on the floor are transmitted to the device. The mechanical vibration causes each part of the device to vibrate minutely. At that time, the device vibrates at several natural frequencies of each part of the device. The vibration causes a relative displacement between the probe of the probe microscope and the sample, which is an adverse effect at the time of high-resolution measurement.
【０００７】従って、プローブ顕微鏡は、床振動が装置
に伝わらないように、通常は除振台の上に載せられる。
しかし、通常、除振台の除振性能は、床振動を１/１０
０に減衰させる程度でしかない。一方、通常の床には、
１×１０-5(ｍ/ｓ2)程度の振動がのっている。従って、
１×１０-7(ｍ/ｓ2)程度の振動は、除振台上に載せられ
たプローブ顕微鏡に伝わる。この振動は、上述したよう
に、装置各部を振動させる。[0007] Therefore, the probe microscope is usually mounted on an anti-vibration table so that floor vibration is not transmitted to the apparatus.
However, the vibration isolation performance of the vibration isolation table is usually 1/10 of the floor vibration.
It only attenuates to zero. On the other hand, on a normal floor,
Vibration of about 1 × 10 −5 (m / s 2 ) is present. Therefore,
The vibration of about 1 × 10 −7 (m / s 2 ) is transmitted to the probe microscope placed on the vibration isolation table. This vibration causes each part of the device to vibrate as described above.
【０００８】特に、特開平３−４０３５６号の装置のよ
うに、プローブ顕微鏡の近くに、光学顕微鏡等が配置さ
れている装置では、光学顕微鏡とその支持部周辺部に起
因する振動が、ほとんど減衰することなく、その近くに
配置されているプローブ顕微鏡に伝わってしまう。この
ような振動の伝達は、プローブ顕微鏡を震わせ、高分解
能測定の妨げとなる。Particularly, in an apparatus in which an optical microscope or the like is disposed near a probe microscope, such as the apparatus disclosed in JP-A-3-40356, the vibration caused by the optical microscope and the periphery of its support is almost attenuated. Without being transmitted to the probe microscope located nearby. Such vibration transmission shakes the probe microscope and hinders high-resolution measurement.
【０００９】また、特開平２−１６３６０１号の装置の
ように、倍率可変のためのレボルバを備える光学顕微鏡
は、そのために比較的大きな質量を有しているため、一
般に光学顕微鏡まわりの共振周波数が小さい。除振台
は、その基本的な性質として、低い周波数の振動ほど減
衰させ難いので、このような光学顕微鏡まわりの振動は
比較的大きなものとなる。従って、プローブ顕微鏡に更
に悪影響を及ぼす。Further, an optical microscope having a revolver for changing the magnification, such as the apparatus disclosed in Japanese Patent Application Laid-Open No. Hei 2-163601, has a relatively large mass for that purpose. small. As a vibration-damping table, as its basic property, it is difficult to attenuate the vibration at a lower frequency, so that the vibration around the optical microscope becomes relatively large. Therefore, the probe microscope is further adversely affected.
【００１０】検顕法を増やすために暗視野や微分干渉等
の機能が追加された光学顕微鏡は、そのために比較的大
きな質量を有するために、レボルバを備える光学顕微鏡
と同様に、光学顕微鏡まわりの振動が比較的大きくなる
傾向があり、プローブ顕微鏡に更に悪影響を及ぼす。[0010] An optical microscope to which functions such as dark field and differential interference are added to increase the number of microscopic examinations has a relatively large mass. Tend to be relatively large, further adversely affecting the probe microscope.
【００１１】本発明の目的は、表面測定器に起因する振
動の悪影響を受け難い表面測定器一体型走査型プローブ
顕微鏡を提供することである。An object of the present invention is to provide a scanning probe microscope integrated with a surface measuring instrument which is hardly affected by vibrations caused by the surface measuring instrument.
【００１２】[0012]
【課題を解決するための手段】本発明の表面測定器一体
型走査型プローブ顕微鏡は、光学顕微鏡等の表面測定器
と、表面測定器のための第一のｚ粗動機構と、第一のｚ
粗動機構を介して表面測定器を支持する表面測定器用の
第一の支持部材と、走査型プローブ顕微鏡と、走査型プ
ローブ顕微鏡のための第二のｚ粗動機構と、第二のｚ粗
動機構を介して走査型プローブ顕微鏡を支持する走査型
プローブ顕微鏡用の第二の支持部材と、試料が載置され
るとともに載置された試料をｘｙ方向に移動させるため
のｘｙステージと、第一の支持部材と第二の支持部材と
ｘｙステージとを固定するためのべースとを備えてお
り、表面測定器と走査型プローブ顕微鏡を結ぶ最短のメ
カニカルパスが、ｘｙステージより下方に位置する部材
を通っている。このため、表面測定器に起因する振動が
走査型プローブ顕微鏡に伝わり難く、走査型プローブ顕
微鏡の分解能の低下が抑えられる。SUMMARY OF THE INVENTION A scanning probe microscope integrated with a surface measuring instrument according to the present invention comprises a surface measuring instrument such as an optical microscope, a first z-coarse mechanism for the surface measuring instrument, and a first z coarse movement mechanism. z
A first support member for the surface measuring instrument supporting the surface measuring instrument via the coarse movement mechanism, a scanning probe microscope, a second z coarse movement mechanism for the scanning probe microscope, and a second z coarse movement mechanism. A second support member for the scanning probe microscope that supports the scanning probe microscope via the moving mechanism, an xy stage on which the sample is mounted and which moves the mounted sample in the xy directions, A base for fixing the first support member, the second support member, and the xy stage is provided, and the shortest mechanical path connecting the surface measuring instrument and the scanning probe microscope is located below the xy stage. It passes through the member that does. For this reason, the vibration caused by the surface measuring device is not easily transmitted to the scanning probe microscope, and the reduction in the resolution of the scanning probe microscope is suppressed.
【００１３】同装置は、より好ましくは、表面測定器と
走査型プローブ顕微鏡を結ぶ最短のメカニカルパスの途
中に配置された振動減衰部材、例えば防振ゴムを更に備
えている。振動減衰部材が、表面測定器に伝わる振動を
減衰させるとともに、表面測定器から走査型プローブ顕
微鏡に伝わる振動を減衰させるので、走査型プローブ顕
微鏡の分解能の低下が更に抑えられる。[0013] More preferably, the apparatus further comprises a vibration damping member, for example, a vibration-proof rubber, disposed in the middle of the shortest mechanical path connecting the surface measuring device and the scanning probe microscope. Since the vibration attenuating member attenuates the vibration transmitted to the surface measuring device and the vibration transmitted from the surface measuring device to the scanning probe microscope, a decrease in the resolution of the scanning probe microscope can be further suppressed.
【００１４】[0014]
【発明の実施の形態】［第一の実施の形態］まず、第一
の実施の形態について図１〜図４を用いて説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS [First Embodiment] First, a first embodiment will be described with reference to FIGS.
【００１５】本実施形態の表面測定器一体型走査型プロ
ーブ顕微鏡は、表面測定器である光学顕微鏡７と、プロ
ーブ顕微鏡８とを備えている。The scanning probe microscope integrated with a surface measuring device according to the present embodiment includes an optical microscope 7 as a surface measuring device and a probe microscope 8.
【００１６】光学顕微鏡７は、これを上下に移動させる
ための光学顕微鏡ｚステージ３を介して、床振動を減衰
させるための除振台べース１に固定された光学顕微鏡支
持部材２によって支持されている。The optical microscope 7 is supported by an optical microscope supporting member 2 fixed to a vibration isolation table base 1 for attenuating floor vibration via an optical microscope z stage 3 for moving the optical microscope up and down. Have been.
【００１７】光学顕微鏡７は、試料１２を観察するため
の対物レンズ４を有している。また、光学顕微鏡７に
は、試料１２を照明するための照明用ファイバ５と、光
学像を映像信号にするためのＣＣＤカメラ６とが取り付
けられている。図示されていないが、照明用ファイバ５
は、照明用光源に接続され、ＣＣＤカメラ６は光学像を
表示するための表示装置に接続されている。The optical microscope 7 has an objective lens 4 for observing the sample 12. The optical microscope 7 is provided with an illumination fiber 5 for illuminating the sample 12 and a CCD camera 6 for converting an optical image into a video signal. Although not shown, the illumination fiber 5
Is connected to a light source for illumination, and the CCD camera 6 is connected to a display device for displaying an optical image.
【００１８】プローブ顕微鏡８は、これを上下に移動さ
せるためのプローブ顕微鏡ｚステージ９を介して、除振
台べース１に固定されたプローブ顕微鏡支持部材１０に
よって支持されている。The probe microscope 8 is supported by a probe microscope supporting member 10 fixed to the anti-vibration base 1 via a probe microscope z-stage 9 for moving the probe microscope 8 up and down.
【００１９】プローブ顕微鏡８は、試料１２を観察する
ためのプローブ１１をその下端に備えている。ここには
図示されていないが、プローブ顕微鏡８には、その制御
装置や測定像の表示装置が接続されている。The probe microscope 8 has a probe 11 for observing the sample 12 at a lower end thereof. Although not shown here, the probe microscope 8 is connected to its control device and a display device for a measured image.
【００２０】光学顕微鏡７とプローブ顕微鏡８は、対物
レンズ４の光軸とプローブ１１の先端が距離Ｌを離れ
て、配置されている。The optical microscope 7 and the probe microscope 8 are arranged such that the optical axis of the objective lens 4 and the tip of the probe 11 are separated by a distance L.
【００２１】試料１２は、除振台べース１に固定された
ｘｙステージ１３の上に載置される。試料１２は、観察
の種類に応じて、対物レンズ４またはプローブ１１と対
向するように位置に配置される。図１では、試料１２上
の測定所望点Ｐは、対物レンズ４の真下に位置してい
る。この状態では、測定所望点Ｐが光学顕微鏡の視野内
に見えている。The sample 12 is placed on an xy stage 13 fixed to the vibration isolation base 1. The sample 12 is arranged at a position facing the objective lens 4 or the probe 11 according to the type of observation. In FIG. 1, the desired measurement point P on the sample 12 is located immediately below the objective lens 4. In this state, the desired measurement point P is visible in the field of view of the optical microscope.
【００２２】試料１２の観察は例えば以下のようにして
行なわれる。The observation of the sample 12 is performed, for example, as follows.
【００２３】まず、光学顕微鏡ｚステージ３を用いて光
学顕微鏡７を上下させて、光学顕微鏡７の焦点が試料４
に合わせられる。この状態で、ｘｙステージ１３を用い
て試料１２をｘｙ方向に移動させ、光学顕微鏡７の視野
中心に測定所望点Ｐが配置される。その後、測定所望点
Ｐに対して、光学顕微鏡７による測定が行なわれる。First, the optical microscope 7 is moved up and down using the optical microscope z-stage 3 so that the focal point of the optical microscope 7 is
Can be adjusted to In this state, the sample 12 is moved in the xy directions using the xy stage 13, and the desired measurement point P is arranged at the center of the visual field of the optical microscope 7. Thereafter, the measurement by the optical microscope 7 is performed on the measurement desired point P.
【００２４】次に、ｘｙステージ１３を用いて試料１２
を距離Ｌだけ移動させ、測定所望点Ｐがプローブ顕微鏡
１０のプローブ１１の直下に配置される。このあと、プ
ローブ顕微鏡ｚステージ９を用いて、プローブ１１が試
料１２付近まで下降される。その後、測定所望点Ｐに対
して、プローブ顕微鏡８による測定が行なわれる。Next, using the xy stage 13, the sample 12
Is moved by the distance L, and the desired measurement point P is arranged immediately below the probe 11 of the probe microscope 10. Thereafter, the probe 11 is lowered to the vicinity of the sample 12 using the probe microscope z-stage 9. Thereafter, the measurement is performed on the desired measurement point P by the probe microscope 8.
【００２５】光学顕微鏡７と光学顕微鏡ｚステージ３を
含むユニットは、通常数ｋｇ程度の質量を有している。
さらに、標準的な明視野観察だけではなく、微小な段差
を観察するための暗視野観察や微分干渉観察を可能にす
る光学系が付加されたユニットや、対物の倍率切換えの
レボルバーを備えるユニットでは、その質量は１０ｋｇ
近くになる。The unit including the optical microscope 7 and the optical microscope z-stage 3 usually has a mass of about several kg.
In addition to standard bright-field observation, units with an optical system that enables dark-field observation and differential interference observation for observing minute steps, and units with a revolver that switches the magnification of the objective , Its mass is 10kg
Get closer.
【００２６】このような質量を持つユニットは、図１に
示されるように、片持ちに支持されるので、光学顕微鏡
まわりは、低い固有振動数を持つことが多い。除振台で
取り切れなかった低周波の床振動は、この光学顕微鏡ま
わりを振動させる。As shown in FIG. 1, the unit having such a mass is supported in a cantilever manner, so that the unit around the optical microscope often has a low natural frequency. Low-frequency floor vibrations that cannot be removed by the vibration isolation table vibrate around the optical microscope.
【００２７】本実施形態では、光学顕微鏡７と光学顕微
鏡ｚステージ３を含むユニットは、光学顕微鏡支持部材
２によって、プローブ顕微鏡８とプローブ顕微鏡ｚステ
ージ９を含むユニットとは別に支持されている。言い換
えれば、光学顕微鏡７とプローブ顕微鏡８を結ぶ最短の
メカニカルパスは、光学顕微鏡ｚステージ３、光学顕微
鏡支持部材２、除振台べース１、プローブ顕微鏡支持部
材１０、プローブ顕微鏡ｚステージ９を通っている。In the present embodiment, the unit including the optical microscope 7 and the optical microscope z-stage 3 is supported by the optical microscope support member 2 separately from the unit including the probe microscope 8 and the probe microscope z-stage 9. In other words, the shortest mechanical path connecting the optical microscope 7 and the probe microscope 8 includes the optical microscope z-stage 3, the optical microscope support member 2, the anti-vibration table base 1, the probe microscope support member 10, and the probe microscope z-stage 9. Passing through.
【００２８】従って、光学顕微鏡７まわりの振動は、光
学顕微鏡ｚステージ３、光学顕微鏡支持部材２、除振台
べース１、プローブ顕微鏡支持部材１０、プローブ顕微
鏡ｚステージ９と伝達するにつれて減衰するため、プロ
ーブ顕微鏡８を振動させることは実質的にない。Therefore, the vibration around the optical microscope 7 is attenuated as it is transmitted to the optical microscope z-stage 3, the optical microscope supporting member 2, the vibration isolator base 1, the probe microscope supporting member 10, and the probe microscope z-stage 9. Therefore, the probe microscope 8 does not substantially vibrate.
【００２９】つまり、本実施形態の表面測定器一体型走
査型プローブ顕微鏡は、床振動等の外乱の影響を受けず
に、つまり、表面測定器に起因する有害な振動の影響を
受けずに、原子分解能レベルのプローブ顕微鏡測定を安
定に行なえる。この利点は、表面測定器が複雑かつ巨大
な場合にも成り立つ。That is, the scanning probe microscope integrated with the surface measuring device of the present embodiment is not affected by disturbance such as floor vibration, that is, without being affected by harmful vibration caused by the surface measuring device. Probe microscope measurement at the atomic resolution level can be performed stably. This advantage also applies when the surface measuring instrument is complex and huge.
【００３０】本発明者が行なった簡単な実験では、光学
顕微鏡とプローブ顕微鏡が別のフレームで支持された装
置では、光学顕微鏡とプローブ顕微鏡が同じフレームで
支持された装置に比べて、光学顕微鏡に起因する振動が
１/３以下に減少した。In a simple experiment conducted by the present inventors, it was found that an apparatus in which an optical microscope and a probe microscope are supported by different frames has a smaller optical microscope than an apparatus in which an optical microscope and a probe microscope are supported by the same frame. The resulting vibration was reduced to less than 1/3.
【００３１】また、本実施形態では、対物レンズ４とプ
ローブ１１の間の距離Ｌと、ｘｙステージ１３の移動量
を調整して、光学顕微鏡の観察ポイントＰ点がプローブ
１１の下に位置するようにするのは、容易である。In this embodiment, the distance L between the objective lens 4 and the probe 11 and the amount of movement of the xy stage 13 are adjusted so that the observation point P of the optical microscope is located below the probe 11. It's easy to do.
【００３２】例えば、各部品の精度を厳密に規定して、
高精度の組立を行ない、光学顕微鏡の視野中心とプロー
ブとの距離Ｌを決め、ｘｙステージ１３の移動量を距離
Ｌに合わせてもよい。ｘｙステージ１３の移動量は、様
々な手法によって測定され得る。例えば、ステージモー
タの回転角度をエンコーダーで計ることによって、ある
いは、移動量を計るためのスケールをステージに設けて
おき、これを利用することによって測定してもよい。For example, the precision of each part is strictly defined,
High-precision assembly may be performed, the distance L between the center of the visual field of the optical microscope and the probe may be determined, and the moving amount of the xy stage 13 may be adjusted to the distance L. The movement amount of the xy stage 13 can be measured by various methods. For example, the measurement may be performed by measuring the rotation angle of a stage motor with an encoder, or by providing a scale for measuring the amount of movement provided on a stage.
【００３３】また、特徴のある試料を利用して、距離Ｌ
を求めてもよい。図４(Ａ)と図４(Ｂ)に示されるよう
に、試料は、Ｄ−Ｄ線よりも左側には、規則的に並んだ
ラインアンドスペースのパターンを有しているが、Ｄ−
Ｄ線よりも右側には、このようなパターンを有していな
い。ラインアンドスペースのピッチは、数μｍ程度が好
ましく、段差の高さは、数百ｎｍ程度が適当である。The distance L is calculated using a characteristic sample.
May be required. As shown in FIGS. 4A and 4B, the sample has a regularly arranged line and space pattern on the left side of the line D-D.
On the right side of the line D, there is no such pattern. The line and space pitch is preferably about several μm, and the height of the step is suitably about several hundred nm.
【００３４】光学顕微鏡７の視野中心とプローブ１１の
間の距離Ｌは、以下のようにして求められる。まず、光
学顕微鏡７の視野中心をＤ−Ｄ線に合わせる。次に、ｘ
ｙステージ１３により、試料１２を、プローブ１１の少
し手前まで移動させる。そのあと、プローブ顕微鏡８に
よる測定と、ｘｙステージ１３の微小移動を繰り返し、
Ｄ−Ｄ線がプローブ顕微鏡８の像として現れたときの、
ｘｙステージ１３の移動量を読み取る。このときのｘｙ
ステージ１３の移動量が距離Ｌである。The distance L between the center of the visual field of the optical microscope 7 and the probe 11 is obtained as follows. First, the center of the visual field of the optical microscope 7 is adjusted to the DD line. Then, x
The sample 12 is moved slightly before the probe 11 by the y-stage 13. After that, the measurement by the probe microscope 8 and the minute movement of the xy stage 13 are repeated,
When the DD line appears as an image of the probe microscope 8,
The movement amount of the xy stage 13 is read. Xy at this time
The movement amount of the stage 13 is the distance L.
【００３５】プローブ１１を保持するプローブ保持機構
は、プローブの位置が常に同じ位置に来るようにする位
置決め機構を備えているとよい。これにより、プローブ
交換の際に位置すれが生じない。本実施形態に適用可能
な位置決め機構の一例は、例えば、特開平９−１５２５
０号に開示されている。The probe holding mechanism for holding the probe 11 preferably has a positioning mechanism for keeping the position of the probe always at the same position. Thus, no displacement occurs when exchanging the probe. An example of a positioning mechanism applicable to this embodiment is described in, for example, Japanese Patent Application Laid-Open No. 9-1525.
No. 0.
【００３６】［第二の実施の形態］次に、第二の実施の
形態について図５を用いて説明する。図中、第一の実施
の形態の部材と実質的に同じ部材は同一の参照符号で示
されており、その説明は省略する。[Second Embodiment] Next, a second embodiment will be described with reference to FIG. In the figure, members that are substantially the same as the members of the first embodiment are denoted by the same reference numerals, and description thereof is omitted.
【００３７】図５に示されるように、本実施形態の表面
測定器一体型走査型プローブ顕微鏡では、光学顕微鏡７
を支持する光学顕微鏡支持部材２は、振動を減衰させる
防振材２１を介して、除振台べース１に固定されてい
る。防振材２１は、損失係数の大きい(大きいほど振動
を伝え難い)物質が好ましく、例えば、内外ゴム株式会
社製のハネナイト等の防振ゴムがあげられる。As shown in FIG. 5, in the scanning probe microscope integrated with a surface measuring device according to the present embodiment, the optical microscope 7 is used.
The optical microscope supporting member 2 for supporting the base is fixed to the anti-vibration base 1 via a vibration isolator 21 for attenuating vibration. The anti-vibration material 21 is preferably a substance having a large loss coefficient (a vibration is difficult to transmit as the loss coefficient is large).
【００３８】除振台によって取り切れなかった床振動
は、防振材２１で減衰されてから、光学顕微鏡支持部材
２に伝わるので、光学顕微鏡７は第一の実施の形態より
も更に振動し難い。また、光学顕微鏡７が振動したとし
ても、その振動は、伝播していく過程で、防振材２１に
よってもう一度減衰されるので、第一の実施の形態より
も更に、プローブ顕微鏡８に伝わり難く、ほとんど悪影
響を及ぼすことがない。The floor vibration that cannot be removed by the vibration isolation table is transmitted to the optical microscope supporting member 2 after being attenuated by the vibration isolator 21, so that the optical microscope 7 is more difficult to vibrate than in the first embodiment. . Further, even if the optical microscope 7 vibrates, the vibration is attenuated again by the vibration isolator 21 in the process of propagating, so that it is harder to transmit to the probe microscope 8 than in the first embodiment. Has almost no adverse effect.
【００３９】本実施形態の表面測定器一体型走査型プロ
ーブ顕微鏡は、第一の実施の形態よりも更に、高分解能
なプローブ顕微鏡測定を安定に行なえる。The scanning probe microscope integrated with a surface measuring instrument according to the present embodiment can more stably perform a high-resolution probe microscope measurement than the first embodiment.
【００４０】これまで、いくつかの実施の形態について
図面を参照しながら具体的に説明したが、本発明は、上
述した実施の形態に限定されるものではなく、その要旨
を逸脱しない範囲で行なわれるすべての実施を含む。Although some embodiments have been described in detail with reference to the drawings, the present invention is not limited to the above-described embodiments, and may be performed within a scope not departing from the gist thereof. Including all implementations.
【００４１】[0041]
【発明の効果】本発明によれば、表面測定器に起因する
振動の悪影響を受け難い表面測定器一体型走査型プロー
ブ顕微鏡が提供される。この装置によれば、床振動等の
外乱の影響を受けずに、原子分解能レベルのプローブ顕
微鏡測定を安定に行なえる。According to the present invention, there is provided a scanning probe microscope integrated with a surface measuring instrument which is hardly affected by vibrations caused by the surface measuring instrument. According to this apparatus, probe microscope measurement at the atomic resolution level can be performed stably without being affected by disturbance such as floor vibration.
【図１】本発明の第一の実施の形態の表面測定器一体型
走査型プローブ顕微鏡の正面側面図である。FIG. 1 is a front side view of a scanning probe microscope integrated with a surface measuring device according to a first embodiment of the present invention.
【図２】図１に示される表面測定器一体型走査型プロー
ブ顕微鏡の平面図である。FIG. 2 is a plan view of the scanning probe microscope integrated with a surface measuring device shown in FIG. 1;
【図３】図１に示される表面測定器一体型走査型プロー
ブ顕微鏡の矢印Ａの方向から見た部分的な側方側面図で
ある。FIG. 3 is a partial side view of the scanning probe microscope integrated with a surface measuring instrument shown in FIG. 1 as viewed from the direction of arrow A;
【図４】(Ａ)は、距離Ｌの計測に利用される特徴的な試
料の平面図、(Ｂ)は、(Ａ)のＢ−Ｂ線に沿って破断され
た試料の断面図である。4A is a plan view of a characteristic sample used for measuring a distance L, and FIG. 4B is a cross-sectional view of the sample taken along line BB of FIG. 4A. .
【図５】本発明の第二の実施の形態の表面測定器一体型
走査型プローブ顕微鏡の部分的な側面図である。FIG. 5 is a partial side view of a scanning probe microscope integrated with a surface measuring device according to a second embodiment of the present invention.
１ 除振台べース ２ 光学顕微鏡支持部材 ３ 光学顕微鏡ｚステージ ７ 光学顕微鏡 ８ プローブ顕微鏡 ９ プローブ顕微鏡ｚステージ １０ プローブ顕微鏡支持部材 DESCRIPTION OF SYMBOLS 1 Vibration isolation base 2 Optical microscope support member 3 Optical microscope z stage 7 Optical microscope 8 Probe microscope 9 Probe microscope z stage 10 Probe microscope support member
Claims (4)
定器用の第一の支持部材と、 走査型プローブ顕微鏡と、 走査型プローブ顕微鏡のための第二のｚ粗動機構と、 第二のｚ粗動機構を介して走査型プローブ顕微鏡を支持
する走査型プローブ顕微鏡用の第二の支持部材と、 試料が載置されるとともに載置された試料をｘｙ方向に
移動させるためのｘｙステージと、 第一の支持部材と第二の支持部材とｘｙステージとを固
定するためのべースとを備えており、 表面測定器と走査型プローブ顕微鏡を結ぶ最短のメカニ
カルパスが、ｘｙステージより下方に位置する部材を通
っている、表面測定器一体型走査型プローブ顕微鏡。1. A surface measuring instrument, a first z-coarse mechanism for the surface measuring instrument, and a first support member for the surface measuring instrument supporting the surface measuring instrument via the first z-coarse mechanism. A scanning probe microscope; a second z-coarse mechanism for the scanning probe microscope; and a second z-coarse mechanism for the scanning probe microscope supporting the scanning probe microscope via the second z-coarse mechanism. A support member, an xy stage for mounting the sample and moving the mounted sample in the xy directions, and a base for fixing the first support member, the second support member, and the xy stage. A scanning probe microscope integrated with a surface measuring instrument, wherein a shortest mechanical path connecting the surface measuring instrument and the scanning probe microscope passes through a member located below the xy stage.
に記載の表面測定器一体型走査型プローブ顕微鏡。2. The method according to claim 1, wherein the surface measuring device is an optical microscope.
4. A scanning probe microscope integrated with a surface measuring device according to item 1.
最短のメカニカルパスの途中に配置された振動減衰部材
を更に備えている、請求項１に記載の表面測定器一体型
走査型プローブ顕微鏡。3. The scanning probe microscope integrated with a surface measuring device according to claim 1, further comprising a vibration damping member arranged in the middle of a shortest mechanical path connecting the surface measuring device and the scanning probe microscope.
に記載の表面測定器一体型走査型プローブ顕微鏡。4. The vibration damping member is a vibration-proof rubber.
4. A scanning probe microscope integrated with a surface measuring device according to item 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000175629A JP2001349817A (en) | 2000-06-12 | 2000-06-12 | Surface-measuring instrument integrated scanning probe microscope |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000175629A JP2001349817A (en) | 2000-06-12 | 2000-06-12 | Surface-measuring instrument integrated scanning probe microscope |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001349817A true JP2001349817A (en) | 2001-12-21 |
| JP2001349817A5 JP2001349817A5 (en) | 2007-06-14 |
Family
ID=18677481
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000175629A Pending JP2001349817A (en) | 2000-06-12 | 2000-06-12 | Surface-measuring instrument integrated scanning probe microscope |
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| Country | Link |
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| JP (1) | JP2001349817A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006023443A (en) * | 2004-07-07 | 2006-01-26 | Keyence Corp | Microscope system |
| JP2006349617A (en) * | 2005-06-20 | 2006-12-28 | Sii Nanotechnology Inc | Scanning probe microscope with optical microscope |
| CN102621064A (en) * | 2012-03-16 | 2012-08-01 | 无锡正慈机电科技有限公司 | Damping platform and optical detection system based on same |
| CN102854617A (en) * | 2012-09-17 | 2013-01-02 | 攀钢集团攀枝花钢铁研究院有限公司 | Vibration-proof worktable for adjusting levelness of microscope and mounting method of vibration-proof worktable |
-
2000
- 2000-06-12 JP JP2000175629A patent/JP2001349817A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006023443A (en) * | 2004-07-07 | 2006-01-26 | Keyence Corp | Microscope system |
| JP2006349617A (en) * | 2005-06-20 | 2006-12-28 | Sii Nanotechnology Inc | Scanning probe microscope with optical microscope |
| CN102621064A (en) * | 2012-03-16 | 2012-08-01 | 无锡正慈机电科技有限公司 | Damping platform and optical detection system based on same |
| CN102854617A (en) * | 2012-09-17 | 2013-01-02 | 攀钢集团攀枝花钢铁研究院有限公司 | Vibration-proof worktable for adjusting levelness of microscope and mounting method of vibration-proof worktable |
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