JP2001332173A5 - - Google Patents
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- JP2001332173A5 JP2001332173A5 JP2001075430A JP2001075430A JP2001332173A5 JP 2001332173 A5 JP2001332173 A5 JP 2001332173A5 JP 2001075430 A JP2001075430 A JP 2001075430A JP 2001075430 A JP2001075430 A JP 2001075430A JP 2001332173 A5 JP2001332173 A5 JP 2001332173A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- manufacturing
- electron source
- chamber
- phosphor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000758 substrate Substances 0.000 claims 30
- 238000004519 manufacturing process Methods 0.000 claims 16
- OAICVXFJPJFONN-UHFFFAOYSA-N phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 12
- 239000004020 conductor Substances 0.000 claims 8
- 238000007789 sealing Methods 0.000 claims 7
- 230000003213 activating Effects 0.000 claims 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N precursor Substances N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 claims 2
- 238000005247 gettering Methods 0.000 claims 1
Claims (11)
a:導電体と該導電体に接続された配線とが形成された基板を支持体上に配置し、該配線の一部分を除き、基板上の導電体を容器で覆い、該容器内を所望の雰囲気とし、該一部分の配線を通じて該導電体に電圧を印加し、これによって該導電体の一部に電子放出素子を形成し、これによって電子源基板を作成する工程、
b:電子放出素子により発光する蛍光体を配置した蛍光体基板を用意し、上記電子源基板と該蛍光体基板とを真空雰囲気下に配置する工程、
c:上記電子源基板と蛍光体基板のうちの一方又は両方の基板を、真空雰囲気のゲッタ処理室に真空雰囲気下で搬入し、搬入した一方の基板又は搬入した両方の基板のうちの一方又は両方の基板をゲッタ処理する工程、並びに
d:上記電子源基板と蛍光体基板を真空雰囲気の封着処理室に真空雰囲気下で搬入して対向状態で加熱封着する工程
を有することを特徴とする画像表示装置の製造法。In the manufacturing method of the image display device,
a: A substrate on which a conductor and wiring connected to the conductor are formed is placed on a support, a portion of the wiring is removed, the conductor on the substrate is covered with a container, and the inside of the container is Applying a voltage to the conductor through the part of the wiring, thereby forming an electron-emitting device on a part of the conductor, thereby creating an electron source substrate;
b: a step of preparing a phosphor substrate on which a phosphor that emits light by an electron-emitting device is arranged, and arranging the electron source substrate and the phosphor substrate in a vacuum atmosphere;
c: One or both of the electron source substrate and the phosphor substrate are loaded into a getter processing chamber in a vacuum atmosphere under a vacuum atmosphere, and one of the loaded substrates or both loaded substrates or A step of gettering both substrates, and d: a step of carrying the electron source substrate and the phosphor substrate into a sealing treatment chamber in a vacuum atmosphere in a vacuum atmosphere and heat-sealing in an opposing state. Of manufacturing an image display device.
a:導電体が形成された基板を支持する支持体と、気体導入口及び気体排気口を有し、該基板面の一部の領域を覆う容器と、該気体導入口に接続された、該容器内に気体を導入する手段と、該気体排気口に接続された、該容器内を排気する手段と、該導電体に電圧を印加し、該導電体の一部に電子放出素子を形成し、これによって電子源基板を製造する電子源基板製造装置、
b:上記電子源基板製造装置によって得た電子源基板及び蛍光体を設けた蛍光体基板を搬送する搬送手段、
c:上記搬送手段によって、上記電子源基板と蛍光体基板のうちの一方又は両方の基板を真空雰囲気下で搬入可能な第1の真空室、
d:上記第1の真空室内に配置したゲッタ前駆体及び該ゲッタ前駆体を活性化させるゲッタ活性化手段を有するゲッタ付与手段、
e:上記搬送手段によって、上記電子源基板と蛍光体基板を真空雰囲気下で搬入可能な第2の真空室、
f:上記第2の真空室内に配置した、上記電子放出素子と上記蛍光体とをそれぞれ内側に向けて、電子源基板と蛍光体基板とを互いに対向配置させる基板配置手段、並びに
g:上記第2の真空室内に配置した、上記基板配置手段によって対向配置させた電子源基板と蛍光体基板とを所定温度で加熱封着する封着手段
を有する画像表示装置の製造装置。In an apparatus for manufacturing an image display device,
a: a support that supports the substrate on which the conductor is formed, a gas inlet and a gas outlet, a container that covers a partial region of the substrate surface, and the gas inlet that is connected to the gas inlet Means for introducing gas into the container; means for exhausting the interior of the container connected to the gas exhaust port; and applying a voltage to the conductor to form an electron-emitting device on a part of the conductor. An electron source substrate manufacturing apparatus for manufacturing an electron source substrate thereby,
b: transport means for transporting the phosphor substrate provided with the electron source substrate and the phosphor obtained by the electron source substrate manufacturing apparatus ;
c: a first vacuum chamber in which one or both of the electron source substrate and the phosphor substrate can be carried in a vacuum atmosphere by the transport means;
d: a getter applying means having a getter precursor disposed in the first vacuum chamber and a getter activating means for activating the getter precursor;
e: a second vacuum chamber in which the electron source substrate and the phosphor substrate can be carried in a vacuum atmosphere by the transfer means;
f: a substrate arrangement means arranged in the second vacuum chamber, the electron-emitting device and the phosphor facing each other inward, and an electron source substrate and a phosphor substrate facing each other; and g: the first 2. An apparatus for manufacturing an image display device, comprising sealing means for heat-sealing an electron source substrate and a phosphor substrate, which are arranged in the vacuum chamber of 2 and faced by the substrate arranging means, at a predetermined temperature.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001075430A JP3728213B2 (en) | 2000-03-16 | 2001-03-16 | Manufacturing method and manufacturing apparatus for image display device |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000-73646 | 2000-03-16 | ||
JP2000073646 | 2000-03-16 | ||
JP2001075430A JP3728213B2 (en) | 2000-03-16 | 2001-03-16 | Manufacturing method and manufacturing apparatus for image display device |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2001332173A JP2001332173A (en) | 2001-11-30 |
JP2001332173A5 true JP2001332173A5 (en) | 2005-03-17 |
JP3728213B2 JP3728213B2 (en) | 2005-12-21 |
Family
ID=26587656
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001075430A Expired - Lifetime JP3728213B2 (en) | 2000-03-16 | 2001-03-16 | Manufacturing method and manufacturing apparatus for image display device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3728213B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4428722B2 (en) * | 2008-06-27 | 2010-03-10 | キヤノンアネルバ株式会社 | Manufacturing method of electron-emitting device and storage medium or recording medium therefor |
WO2009157088A1 (en) * | 2008-06-27 | 2009-12-30 | キヤノンアネルバ株式会社 | Method for manufacturing electron emission device and storage medium or recording medium therefor |
-
2001
- 2001-03-16 JP JP2001075430A patent/JP3728213B2/en not_active Expired - Lifetime
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