JP2001331908A - Method for manufacturing thin-film magnetic head - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent the corrosion of a magnetic metal on an ABS surface during lapping or washing in the manufacturing process of a thin-film magnetic head. SOLUTION: In the method for manufacturing a thin-film magnetic head including two or more layers of magnetic metal films having different oxidation- reduction potentials in a head sliding surface with respect to a magnetic recording medium, before lapping, a local battery 16 is constructed in a slider cutting margin 23 or an ABS machining margin by using at least one of the magnetic metal films and a thin film 15 having ionization tendency larger than that of the magnetic metal film.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is applied to an apparatus for performing high-density recording / reproduction on a magnetic recording medium such as a magnetic disk apparatus (HDD apparatus). And a method for manufacturing a thin film magnetic head having a structure with a high production yield.

[0002]

2. Description of the Related Art In recent years, magnetic disk devices (HDD devices)
In recording on a magnetic recording medium such as the one described above, the necessity of improving the processing speed and increasing the recording capacity is increasing, and efforts to increase the recording density are being strengthened. For this reason, the recording tracks are becoming narrower and the thin-film magnetic heads themselves are becoming smaller.

Hereinafter, a conventional shield type thin film magnetic head (hereinafter simply referred to as a thin film magnetic head) will be described with reference to the drawings.

FIGS. 10 and 11 show a conventional magnetic head, and FIG. 12 shows a part of a processing step of the magnetic head.

A thin-film magnetic head used for recording and reproducing signals on a magnetic recording medium in a magnetic disk drive is often called, for example, an MR / inductive composite head as shown in FIG.

In FIG. 10, a lower gap insulating layer 102 is formed on a lower shield layer 101, and a magnetoresistive effect element (hereinafter referred to as an MR element) 1
No. 03 is formed as a laminated film. Lower shield layer 101
Is a permalloy such as Fe ₂₀ -Ni ₈₀ , Fe ₅₀ -Ni ₅₀ , CoNbZr etc.
It is made of a soft magnetic material such as an Fe-based alloy magnetic film such as a Co-based amorphous magnetic film, a sendust, and a granular iron-based microcrystalline film. The lower gap insulating layer 102 is made of Al ₂ O ₃ , AlN or
It is made of a non-magnetic insulating material such as SiO ₂ . As the MR element 103, an AMR (Anisotropic Magnetic Resistance) element, a GMR (Giant Magnetic Resistance) element, a TMR (T
unneling Magnetic Resistance) element or CMR (Co
rrosive Magnetic Resistance) element is used.

The left and right ends of the MR element 103 are made of CoPt.
A vertical bias layer (PM layer) 104 is formed using a material such as an alloy. Upper surface of PM layer 104 and MR element 10
3 so that it is in contact with the ridgeline that is the intersection line between the upper surface and both side surfaces,
The electrode lead layer 105 is formed using a material such as Cr or Ta which has low resistance and does not easily cause smear or the like. here,
The electrode lead layer 105 may be formed so as to cover the upper surface of the PM layer 104 and part of the upper surface of the MR element 103. Next, on the exposed portions of the electrode lead layer 105 and the MR element 103, the upper gap insulating layer 106 (in the drawing, considering the ease of understanding, using the same non-magnetic insulating material as the lower gap insulating layer 102). (Not shown, transparent). Further, a common shield layer 107 is formed on the upper gap insulating layer 106 using the same soft magnetic material as the lower shield layer 101. As described above, the reproducing magnetoresistive thin film magnetic head 10
0 is configured.

Next, a recording gap layer 111 is formed on the upper surface of the common shield layer 107 using the same non-magnetic insulating material as the lower gap insulating layer 102. Further, it faces the common shield layer 107 via the recording gap layer 111, and
An upper core (upper magnetic pole) 112 which is in contact with the common shield layer 107 in other portions is formed by using a soft magnetic material similar to that of the lower shield layer 101. Recording gap layer 1
11, a winding made of a low-resistance metal such as Cu is provided between a portion where the common shield layer 107 and the upper core 112 face each other and a portion where the upper core 112 is in contact with the common shield layer 107. The coil 113 is arranged. The winding coil 113 is insulated from the common shield layer 107 and the upper magnetic pole 112 via an insulating material (not shown). The above elements constitute the inductive thin film magnetic head unit 110 for recording. Here, the common shield layer 107 has a function having both the shield function of the magnetoresistive thin film magnetic head section 100 for reproduction and the lower magnetic pole function of the inductive thin film magnetic head section 110 for recording.

As shown in a schematic front view of the magnetic recording medium viewed from the sliding surface side in FIG.
On the lower gap insulating layer 102 formed on the upper surface of
An MR element 103 is formed. A pair of left and right PM layers 104 are formed in contact with the left and right sides of the MR element 103, and a pair of left and right electrode lead layers 105 are formed thereon. Further, an upper gap insulating layer 106 is formed thereon, and a common shield layer 107 is further formed thereon. Further, a recording gap layer 111 is formed thereon, and an upper core 112 having a track width 114 (shown in FIG. 11) is formed thereon.

When a recording current is supplied to the winding coil 113, a recording magnetic field is generated in the upper core 112 and the common shield layer 107 of the recording induction type thin film magnetic head section 110, and the recording magnetic field is generated via the recording gap layer 111. Upper core 1
A leakage magnetic flux is generated between the magnetic recording medium 12 and the common shield layer 107, and a recording signal is recorded on the magnetic recording medium. Further, the magnetic field of the signal recorded on the magnetic recording medium on which the signal is recorded is reproduced by the reproducing magnetoresistive thin film magnetic head unit 100,
A reproduction signal corresponding to a resistance change by the R element 103 is detected from a terminal of the electrode lead layer 105.

FIG. 12 shows a part of a normal magnetic head manufacturing process. (A) shows a bar 1 which is generally cut out in a strip shape by arranging several head elements from a wafer state.
21 is shown. In this state, lapping is performed so that the stripe height of the predetermined MR element is obtained, and a predetermined shape is formed as shown in FIG. Thereafter, the exposed lower shield layer, the common shield, the upper core, and the magnetic metal surface of the magnetoresistive element are protected and the desired CSS (Contact Start Strategies) is protected.
op) In order to obtain characteristics, a protective film 122 made of DLC, sputtered carbon, CN or the like is provided. Further, in order to obtain desired flying characteristics, a complicated ABS surface shape is produced from the ABS surface 123 by machining or etching.

In recent years, strong efforts have been made to reduce the size of the apparatus and the thin-film magnetic head associated therewith, and efforts have been made to narrow the recording track width 114 in response to higher recording densities. Conventionally used Fe ₂₀ -Ni ₈₀ permalloy has relatively good corrosion resistance and low magnetostriction, but has disadvantages such as low saturation magnetic flux density or high eddy current loss at high frequency due to low conductivity. . In order to improve recording efficiency, iron-based microcrystalline materials such as Fe ₅₀ -Ni ₅₀ high Bs permalloy and FeN are being used as silo materials and recording core materials in addition to Fe ₂₀ -Ni ₈₀ permalloy. .

Since these magnetic metals are susceptible to corrosion themselves, it has been proposed to provide a metal having a high ionization tendency, such as Al or Zr, on the sliding surface in the vicinity of the magnetic head (for example, see Japanese Patent Application Laid-Open (JP-A) no. Japanese Patent Application Laid-Open No. 62-89210,
-102710, JP-A-3-37810).

When two types of magnetic metals are joined to form a single layer, the exposed surface of the joint becomes a local battery. To avoid corrosion at the joint, the magnetic metal on the base metal side is removed. A method that does not expose the magnetic surface has also been proposed.
(For example, JP-A-3-95714, JP-A-7-37)
003 publication)

[0015]

However, if a variety of magnetic metal materials are used in the above-described conventional magnetic head, two types of metals having different oxidation-reduction potentials are used in a lapping process for obtaining a desired stripe height. Is exposed. Even if these metals are insulated, a certain amount of contact is inevitably generated due to smear and ESD destruction during processing, lapping liquid, cleaning liquid, adsorbed water and the like. As a result, a local battery is formed, and a metal having a low oxidation-reduction potential or a high ionization tendency is easily ionized. Oxidative corrosion occurs due to the catalysis of acid-alkali, deterioration of the magnetic properties of the shield film or the MR film, surface There is a problem that the roughness increases.

In particular, at the time of lapping or cleaning, in the presence of a trace amount of acid or alkali contained in the processing liquid or cleaning liquid, the vicinity of the joint of the metal becomes a local battery and promotes oxidation of the base metal, particularly iron. Yield was poor.

The method of providing a metal having a high ionization tendency, such as Cu, Al, or Zr, on the sliding surface is provided in such a manner that smear (short-circuit caused by plastic flow due to lap) is likely to occur at that portion, Floating characteristics and CSS with uneven parts
Practical use is difficult in that the characteristics are deteriorated, or oxide desorbed powders of these metals are easily generated in corroded portions.

In addition, the method of not projecting the joint portion on the sliding surface is as follows.
It cannot be put to practical use for the following reasons. That is, in order to obtain a metal having a high saturation magnetic flux, an element containing a lot of free electrons, such as Fe, is generally used. Therefore, in order to improve the recording characteristics, the magnetic metal which is susceptible to corrosion is exposed on the sliding surface. It is extremely difficult to use such a head that exposes only the corrosive magnetic metal on the sliding surface in a combination of the inductive recording head and the read-only magnetoresistive head as described above.

The present invention solves the above-mentioned problems, and in the process of forming a thin-film magnetic head element, a local battery is provided on the exposed surface of the ABS during processing, thereby preventing corrosion of the magnetic recording element section and preventing the element section from being corroded. It is an object of the present invention to provide a method of manufacturing a thin-film magnetic head in which a magnetic layer is protected by a protective film and a corroded portion caused by a local battery is not finally left on a magnetic head slider.

[0020]

In order to achieve this object, a method of manufacturing a thin-film magnetic head according to the present invention comprises:
A method of manufacturing a thin-film magnetic head having at least one magnetic metal film comprising at least one of said magnetic metal films and a thin film having a greater ionization tendency than said magnetic metal film before a step of performing lapping, by cutting off a slider. Are used to form a local battery.

Another method of manufacturing a thin-film magnetic head according to the present invention is a method of manufacturing a thin-film magnetic head having two or more magnetic metal films having different oxidation-reduction potentials on a head sliding surface with respect to a magnetic recording medium. Prior to the lapping process, at least a portion of the magnetic metal film and a thin film having a higher ionization tendency than the magnetic metal film are locally applied to a portion to be processed deeper than the magnetic recording element during the ABS surface processing. It is characterized by constituting a battery.

[0022]

Embodiments of the present invention will be described below with reference to the drawings.

(Embodiment 1) FIG. 1 is a schematic front view showing a thin film magnetic head according to Embodiment 1 of the present invention, viewed from a head sliding surface (ABS surface) facing a magnetic recording medium. FIG. 2 is a schematic perspective view showing one procedure of processing the thin film magnetic head shown in FIG.

FIG. 1A shows a main part 17 of one of the thin film magnetic heads formed on the bar 22 shown in FIG. 1B. In FIG. 1A, on the upper surface of a thin film magnetic head slider substrate 1 made of AlTiC or the like,
An insulating layer 2 made of Al ₂ O ₃ or the like is formed, and F
A lower shield layer 3 made of e ₂₀ -Ni ₈₀ permalloy magnetic film is formed, and a lower gap insulating portion 4 is formed thereon using a non-magnetic insulating material such as Al ₂ O ₃ , AlN or SiO _2. ing. Although not shown in detail, a free magnetic layer made of a NiFe-based alloy film, Co, CoFe alloy film, or the like, a nonmagnetic conductive layer made of a material such as Cu, or a ferromagnetic material similar to the free magnetic layer is formed thereon. A magnetoresistive element composed of a fixed magnetic layer used and an antiferromagnetic layer made of an α-Fe ₂ O ₃ or NiO-based oxide, such as an IrMn-based alloy film, a FeMn-based alloy film, and a PtMn-based alloy film. 5
(Hereinafter, referred to as a GMR element). GM
A pair of left and right vertical bias layers 6 is formed on the lower gap insulating portion 4 using a hard magnetic material such as a CoPt alloy so as to be in contact with the respective side surfaces on both sides of the R element 5. A pair of left and right electrode lead layers 7 made of a material such as Cr or Ta is formed on the GMR element 5 at least in line contact with the GMR element 5. On the upper surface of the GMR element 5 and on the upper surfaces of the pair of left and right electrode lead layers 7, an upper gap insulating portion 8 is formed of the same material as the lower gap insulating portion 4. GMR element 5 via upper gap insulator 8
A common shield layer 9 made of Fe ₂₀ -Ni ₈₀ permalloy is formed so as to face. An extra gap layer 14 is provided on the upper or end portion of the electrode lead layer 7 to ensure sufficient insulation between the electrode lead layer 7 and the shield layer. The read head section 10 of the thin-film magnetic head is formed by the above elements.

Further, on the common shield layer 9, Al ₂ O ₃ ,
A recording gap layer 11 is formed by using an insulating material such as AlN or SiO ₂ , on which the recording gap layer 11 faces the common shield layer 9 via the recording gap layer 11 and contacts the common shield layer 9 at other portions. The upper core 12 is made of Fe ₅₀ -Ni
It is formed using ₅₀ high Bs permalloy. Although not shown, a winding coil is provided so as to circumnavigate the upper core 12 in a portion in contact with the common shield layer 9, and the above-described elements form a recording head section 13 of the thin-film magnetic head.

In the method of manufacturing the magnetic head of the present embodiment, the lower shield layer 3 and Cu, Al, which have a higher ionization tendency than the magnetic layer, are provided further outside the extra gap 14.
A local battery upper layer 15 made of a metal film containing at least one selected from Zn and Fe is formed, and a large-area local battery 16 is provided. The distance 18 between the local battery 16 and the common shield 9 is at least 10 times the recording or reproducing track width,
Desirably, it is provided in the cutting margin 23 by taking 100 times or more. The butting width viewed from the ABS is desirably ten times or more the track width. Further, the local battery 16 on the cutting margin 23 is deleted in the following steps.

First, a wafer 2 as shown in FIG.
From FIG. 1, as shown in FIG. 2A, a prism called a bar 22 in which several or more head chips are connected is cut out. While monitoring the optical width, electric resistance or inductance of the bar 22, the ABS 29 shown in FIG.
Is processed to obtain a bar 25 having a desired stripe height. This stripe height processing is performed by combining methods such as cutting, grinding, lapping, polishing, buffing, milling, and etching. As shown in FIG. 2C, the surface of the bar 25 thus obtained is subjected to a protective film manufacturing process 24 for covering with a protective film such as DLC or sputtered carbon, and then the cutting margin 23 is cut. As shown in FIG. 2D, a single slider 26 is obtained.

With this configuration, the oxidation-reduction potential difference is Fe ₂₀ -N
i ₈₀ permalloy and Fe ₅₀ -Ni ₅₀ higher Bs permalloy than Fe permalloy
_20- Ni ₈₀ permalloy and Cu, Al, Zn, and Fe metal films are larger. Corrosion occurs first in the local battery unit 16 and prevents corrosion near the recording head unit 13 and the reproducing head unit 10. Can be. Originally, such defects due to corrosion should be avoided as much as possible in the production process of magnetic heads.However, impurities coming from materials used, water, grinding fluid, cleaning fluid, sweat, dander and breath of workers, and trace amounts in the atmosphere It is difficult to completely remove the gas and the like so as not to cause corrosion, and it is necessary to find the optimum point of the cost for corrosion prevention and the loss cost due to a decrease in yield. According to the method of the present embodiment, even if the corrosion suddenly occurs for the above-described reason, the characteristics of the magnetic recording / reproducing element are not affected, so that there is a great effect in reducing the loss cost due to the defect.
Furthermore, the local battery section 16 is provided on the slider 26 with the ABS 2
9 does not affect final characteristics even if corrosion occurs in the local battery unit 16. Here, the final characteristics are the CS values indicating the flying characteristics and sliding characteristics of the magnetic head.
Means S (contact start / stop) characteristics, electromagnetic conversion characteristics, and the like.

In particular, in the structure using a Cu metal film for the local battery upper layer 15, since the Cu metal film is frequently used in the subsequent recording coil and the stud conducting portion (wiring connecting the element and the external pad), the local battery upper layer is formed. The number of man-hours for independent production can be reduced, which is effective. Conventionally, such a Cu metal film is not exposed on the sliding surface because of the occurrence of smear or the like,
By using the present invention, the local battery section 16 in which smear has occurred is removed in the subsequent step of cutting the cutting margin 23, which is effective in improving the yield.

(Embodiment 2) FIG. 3 is a schematic perspective view showing a state in a manufacturing process of a magnetic head according to Embodiment 2 viewed from the ABS, and FIG. 4 is a perspective view showing a schematic process of processing.

[0031] Similarly to the first embodiment, as shown in FIG. 3 (a), the lower shield layer 35 made of Fe ₂₀ -Ni ₈₀ permalloy, upper core consisting of a common shield 36, Fe ₅₀ -Ni ₅₀ high Bs permalloy The magnetic head 31 is composed of a surface 3 to be subjected to ABS trimming shown in FIG.
On top of that, Cu, Al, which have a higher ionization tendency than Permalloy,
A local battery upper layer 30 made of a metal film containing at least one of Zn and Fe is provided, and a local battery unit 33 is manufactured.

In the manufacturing process, first, as shown in FIG. 4B, a bar 42 formed by connecting several head chips forming the magnetic head 31 is cut from the wafer 41 shown in FIG. 4A. Stripe height processing 44 for obtaining a bar 43 having a desired stripe height shown in FIG. 4C is performed on the bar 42 in the same manner as in the first embodiment. FIG. 4 (c) shows the surface of the bar 42 thus obtained.
As shown in FIG. 4, after performing a protective film manufacturing process 45 for covering with a protective film of DLC, sputtered carbon, SiO ₂ , Cr, etc., FIG.
As shown in (d), AB for obtaining desired floating characteristics
The S surface processing 46 is performed. This ABS surface processing 46 is performed by a method such as machining, milling, etching, or the like, and a desired shape and depth are obtained by repeating processing several times. The magnetic head 31
The normal processing depth of the cavity (shaved portion) 32a, which remains on the highest protrusion or the rail portion 38 shown in FIG. 3B, is several tens nm to 10 μm. This processing may be performed in either the bar state or the slider state. This processing may be performed in two or more steps. A local battery unit 33 is formed in a portion that is cut off by the cavity 32a. The depth of the local battery in the depth direction is desirably smaller than the ABS surface processing depth in order not to leave a erodable portion on the slider in the final processing. Considering the processing accuracy, it is desirably from 0.2 μm to 5 μm. Further, a protective film may be provided on the ABS. The ABS surface processing 46 may be performed in a bar state or after cutting the slider.

Since the local battery section 33 does not remain in the slider 39 manufactured in this manner, for example, the local battery section 3
Even if corrosion occurs in 3, the final characteristics are not affected.

(Embodiment 3) FIGS. 5 to 9 are schematic front views, viewed from the ABS, for explaining a manufacturing process of a magnetic head according to Embodiment 3 of the present invention. In the description of the present embodiment, various modes for forming a local battery will be exemplified. In each of the drawings, only the essential parts will be described with reference numerals, but the other parts are the same as those shown in FIG.

In the first and second embodiments, the examples in which the lower shield layers 3 and 35 are extended to form the local batteries 16 and 33 have been described. On the other hand, in the present embodiment, as shown in FIG.
The lower shield layer 51 and the local battery lower layer 52 are separated by a sliding surface, and Cu, Al, which have a greater ionization tendency than Permalloy,
A local battery 54 is formed between the local battery 54 and a local battery upper layer 53 formed of a metal film containing at least one of Zn and Fe.
In the local battery, since current flows through the surface conductive liquid, the common shield 51 and the local battery upper layer 52 may be either conductive or insulated. As shown in the first and second embodiments, the local battery unit 54 is provided in the cutting margin or the ABS processing margin 55, so that even if corrosion occurs, the final characteristics are not affected.

Further, as shown in FIG.
A local battery unit 67 formed by bonding a local battery upper layer 66 made of a metal film containing at least one of Zn and Fe having a higher ionization tendency than that of permalloy may be provided on 3.
The local battery section 67 is also provided in the cutting margin or the ABS processing margin 68 as described in the first and second embodiments, so that even if corrosion occurs, the final characteristics are not affected.

Further, as shown in FIG. 7, the common shield 71 and the local battery lower layer 72 are separated by a sliding surface and include at least one of Cu, Al, Zn, and Fe which has a higher ionization tendency than permalloy. The local battery 74 may be formed by being joined to the local battery upper layer 73 made of a metal film. Since current flows through the surface layer of the conductive liquid in the local battery 74, the conduction between the common shield 71 and the local battery upper layer 72 may be either released or insulated.
Since the local battery unit 73 is also provided in the cutting margin or the ABS machining margin 75 as described in the first and second embodiments, even if corrosion occurs, the final characteristics are not affected.

Further, as shown in FIG.
A local battery lower layer 82 made of the same material as the upper core is provided on the outside of the base, and a local layer formed of a metal film containing at least one of Cu, Al, Zn, and Fe having a higher ionization tendency than permalloy is provided thereon. The battery upper layer 83 is joined to form a local battery 84.
May be configured. The local battery section 84 is cut or ABS processed as described in the first and second embodiments.
5, the final characteristics are not affected even if corrosion occurs.

As shown in FIG. 9, in order to prevent saturation of the recording head, the common shield layer 91 and the upper core 92 are each made into two layers, and the common shield layer upper part 93 and the upper core lower part 94 are provided with a high saturation magnetic flux density. It is known to make with a magnetic layer. In this case, the common shield layer lower part 96 and the upper core upper part 95 are made of Fe ₂₀ -Ni ₈₀ permalloy having small magnetostriction, and the common shield layer upper part 93 and the upper core lower part 94 are made of Fe _50.
-Ni ₅₀ Permalloy or FeN, it is desirable to produce a high saturation magnetic flux density such as iron-based microcrystalline film such as Fe-based granular film. A slider cutting margin or A outside the magnetic element portion
A local battery lower layer 98 made of a Cu metal film formed in the same process as the Cu recording coil layer and a local battery upper layer 97 made of the same material as the upper core lower portion 94 on the BS processed surface. 99 may be provided. This local battery unit 9
9 is the same as in the first and second embodiments,
Since it is provided in the working margin 90, even if corrosion occurs, it does not affect the final characteristics.

In the above description, the configuration using the magnetic layer mainly made of Fe ₂₀ -Ni ₈₀ permalloy has been described.
Co-based amorphous alloys such as CoZrCr, CoTaZr, and CoTaHf; sendust-based magnetic films; permalloy magnetic films such as Fe ₂₀ -Ni ₈₀ and Fe ₅₀ -Ni ₅₀ ; It goes without saying that the same effect can be obtained even with any combination of magnetic metals having different oxidation-reduction potentials.

According to the method described in the first to third embodiments, it is possible to stably produce a magnetic head using a magnetic metal film having a high saturation magnetic flux density but having a problem in corrosion resistance, for example, pure iron or iron-nitrogen alloy. This makes it possible to manufacture a magnetic recording device having high recording characteristics, that is, high recording density.

In the above description, the shield type thin film magnetic head has been described, but the yoke type, bulk type magnetic head,
It goes without saying that the present invention is also effective for a single pole type magnetic head. Also, the GMR type reproducing head has been illustrated, but the AMR type reproducing head, the TMR type reproducing head,
It goes without saying that the present invention is also effective for an inductive reproducing head.

[0043]

According to the present invention, a local battery is provided at a position different from the thin-film magnetic head element in the same process as the formation of the lower shield layer, the common shield layer, and the upper magnetic pole constituting the thin-film magnetic head element. After the stripe height of the read element is formed, the metal magnetic film is protected with a protective film, and the local battery part that may have been corroded is removed, thereby achieving stable production of thin film magnetic heads and improving yield, etc. A magnetic head can be manufactured.

[Brief description of the drawings]

FIG. 1 is a schematic front view of a main part of a thin-film magnetic head according to a first embodiment of the present invention.

FIG. 2 is a perspective view showing a manufacturing process of the thin-film magnetic head according to the first embodiment of the present invention.

FIG. 3 is a schematic diagram showing a state of a thin-film magnetic head in a manufacturing process according to a second embodiment of the present invention.

FIG. 4 is a perspective view showing a manufacturing process of the thin-film magnetic head according to the second embodiment of the present invention.

FIG. 5 is a schematic front view showing a method for manufacturing a thin-film magnetic head according to Embodiment 3 of the present invention.

FIG. 6 is a schematic front view showing another example of the method of manufacturing the thin-film magnetic head according to the third embodiment.

FIG. 7 is a schematic front view showing another example of the method of manufacturing the thin-film magnetic head according to the third embodiment.

FIG. 8 is a schematic front view showing another example of the method of manufacturing the thin-film magnetic head according to the third embodiment.

FIG. 9 is a schematic front view showing another example of the method of manufacturing the thin-film magnetic head according to the third embodiment.

FIG. 10 is a schematic perspective view showing a conventional thin-film magnetic head element.

FIG. 11 is a schematic front view showing a conventional thin film magnetic head element.

FIG. 12 is a schematic front view showing a method for manufacturing a conventional thin-film magnetic head element.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 Substrate 2 Insulating layer 3, 35, 161, 51, 61, 91, 101 Lower shield layer 4, 102 Lower gap insulating part 5, 103 Magnetoresistance effect element (MR element, GMR element) 6, 104 Vertical bias layer 7, 105 electrode lead layer 8, 106 upper gap insulating part 9, 36, 63, 71, 92, 107 common shield layer 10, 62, 100 reproducing head part 11, 64, 111 recording gap layer 12, 37, 65, 81, 112 Upper core 13, 110 Recording head section 14 Extra gap 15, 53, 66, 73, 83, 97 Local battery upper layer 16, 33, 54, 67, 74, 84, 99 Local battery section 17, 31 Magnetic head main part 20 Cutting margin 21, 41 Wafer 22, 25, 42, 43, 121 Bar 23, 44 Stripe height processing 24, 5 Protective film manufacturing process 26, 39 Slider 29, 123 ABS surface 32 Surface to be ABS trimmed 38 Slider rail 46 ABS surface process 52, 72, 82, 98 Local battery lower layer 55, 68, 75, 85, 90 Cut off Or ABS processing 93 Common shield upper layer 94 Upper core lower layer 95 Upper core upper layer 96 Common shield lower layer 113 Recording coil 114 Recording width 122 Protective film

Claims (6)

[Claims] In a method of manufacturing a thin film magnetic head having two or more magnetic metal films having different oxidation-reduction potentials on a head sliding surface with respect to a magnetic recording medium, a slider cutting is performed before a lapping process. A method of manufacturing a thin film magnetic head, comprising forming a local battery using at least one of the magnetic metal films and a thin film having a higher ionization tendency than the magnetic metal film. 2. A lapping process for obtaining a desired stripe height is completed, a protective film is formed on the sliding surface, and the slider cutting margin is cut.
3. The method for manufacturing a thin-film magnetic head according to item 1. 3. A method of manufacturing a thin-film magnetic head having two or more magnetic metal films having different oxidation-reduction potentials in a head sliding surface with respect to a magnetic recording medium, wherein an ABS surface is formed before a lapping process. A thin-film magnetic head is characterized in that a local battery is formed by using at least one of the magnetic metal films and a thin film having a higher ionization tendency than the magnetic metal film in a portion to be processed deeper than the magnetic recording element during processing. Production method. 4. After finishing a surface lapping process or the like for obtaining a desired stripe height, a protective film is formed on the sliding surface, and an ABS surface shape forming process is performed to remove a surface layer of the local battery portion. The method for manufacturing a thin-film magnetic head according to claim 3. 5. A thin film having a higher ionization tendency than a magnetic metal film is a Cu metal film.
3. The method for manufacturing a thin-film magnetic head according to item 1. 6. The thin-film magnetic head according to claim 1, wherein the thin film having a higher ionization tendency than the magnetic metal film is a metal film containing at least one selected from Al, Zn, and Fe. Manufacturing method.