JP2001330821A5 - - Google Patents

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JP2001330821A5
JP2001330821A5 JP2001070366A JP2001070366A JP2001330821A5 JP 2001330821 A5 JP2001330821 A5 JP 2001330821A5 JP 2001070366 A JP2001070366 A JP 2001070366A JP 2001070366 A JP2001070366 A JP 2001070366A JP 2001330821 A5 JP2001330821 A5 JP 2001330821A5
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electro
light
optical device
film
reflectance
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JP2001330821A (en
JP3956630B2 (en
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【発明の名称】電気光学装置及び投射型表示装置Patent application title: ELECTRO-OPTICAL DEVICE AND PROJECTION DISPLAY

Claims (15)

一対の第1及び第2基板と、
前記第1基板上における各画素の非開口領域内に設けられた所定パターンと、 前記第2基板上における前記所定パターンを平面的に見て少なくとも部分的に覆う領域に設けられた遮光膜と
を備えており、
前記遮光膜は、前記第1基板に対面しない側に位置する第1反射率の高反射膜と、前記第1基板に対面する側に位置する前記第1反射率よりも低い第2反射率の低反射膜とを含む多層膜からなり、前記第1基板の側から見て前記高反射膜は、前記低反射膜により覆われていることを特徴とする電気光学装置。
A pair of first and second substrates,
A predetermined pattern provided in a non-opening region of each pixel on the first substrate; and a light-shielding film provided in a region at least partially covering the predetermined pattern on the second substrate in plan view. Equipped,
The light-shielding film has a first reflectance high-reflection film located on a side not facing the first substrate, and a second reflectance lower than the first reflectance located on a side facing the first substrate. An electro-optical device, comprising a multilayer film including a low reflection film, wherein the high reflection film is covered with the low reflection film when viewed from the first substrate side.
前記所定パターンは、各画素に設けられた画素電極に接続された薄膜トランジスタ及び該薄膜トランジスタに接続された配線からなり、
前記遮光膜は、前記第2基板側から見て、少なくとも前記薄膜トランジスタのチャネル領域を覆うことを特徴とする請求項1に記載の電気光学装置。
The predetermined pattern includes a thin film transistor connected to a pixel electrode provided in each pixel and a wiring connected to the thin film transistor,
The electro-optical device according to claim 1, wherein the light-shielding film covers at least a channel region of the thin film transistor when viewed from the second substrate side.
前記低反射膜は、前記各画素の非開口領域に沿って格子状又は縞状に形成されており、
前記高反射膜は、島状に形成されていることを特徴とする請求項1又は2に記載の電気光学装置。
The low reflection film is formed in a lattice shape or a stripe shape along the non-opening region of each pixel,
The electro-optical device according to claim 1, wherein the high reflection film is formed in an island shape.
前記第1反射率は、可視光領域で80%以上であることを特徴とする請求項1から3のいずれか一項に記載の電気光学装置。4. The electro-optical device according to claim 1, wherein the first reflectance is 80% or more in a visible light region. 5. 前記第2反射率は、可視光領域で10%以下であることを特徴とする請求項1から4のいずれか一項に記載の電気光学装置。The electro-optical device according to claim 1, wherein the second reflectance is equal to or less than 10% in a visible light region. 前記低反射膜は、酸化クロムを含有する膜からなることを特徴とする請求項1から5のいずれか一項に記載の電気光学装置。The electro-optical device according to claim 1, wherein the low reflection film is formed of a film containing chromium oxide. 前記高反射膜は、窒素化合物を含有するアルミニウム膜からなることを特徴とする請求項1から6のいずれか一項に記載の電気光学装置。The electro-optical device according to claim 1, wherein the high reflection film is formed of an aluminum film containing a nitrogen compound. 前記高反射膜は、高融点金属を含有するアルミニウム膜からなることを特徴とする請求項1から6のいずれか一項に記載の電気光学装置。The electro-optical device according to claim 1, wherein the high reflection film is made of an aluminum film containing a high melting point metal. 前記第1基板に、前記所定パターンを平面的に見て少なくとも部分的に覆う領域に設けられた他の遮光膜を更に備えており、
該他の遮光膜の反射率は、前記第1反射率よりも低いことを特徴とする請求項1から8のいずれか一項に記載の電気光学装置。
The first substrate further includes another light-shielding film provided in a region that at least partially covers the predetermined pattern when viewed in plan,
The electro-optical device according to claim 1, wherein a reflectance of the other light-shielding film is lower than the first reflectance.
前記所定パターンは、他の低反射膜からなるパターンを含み、
該他の遮光膜の反射率は、前記第1反射率よりも低いことを特徴とする請求項1から8のいずれか一項に記載の電気光学装置。
The predetermined pattern includes a pattern made of another low reflection film,
The electro-optical device according to claim 1, wherein a reflectance of the other light-shielding film is lower than the first reflectance.
前記第1基板上に、前記第1基板の側から見て前記所定パターンを少なくとも部分的に覆う他の遮光膜を更に備え、
該他の遮光膜の反射率は、前記第1反射率よりも低いことを特徴とする請求項1から8のいずれか一項に記載の電気光学装置。
Further comprising another light-shielding film on the first substrate, the light-shielding film covering at least partially the predetermined pattern when viewed from the first substrate side;
The electro-optical device according to claim 1, wherein a reflectance of the other light-shielding film is lower than the first reflectance.
前記第2基板の前記第1基板に対面しない側に、前記遮光膜が形成されていることを特徴とする請求項1から11のいずれか一項に記載の電気光学装置。The electro-optical device according to claim 1, wherein the light-shielding film is formed on a side of the second substrate that does not face the first substrate. 前記第2基板上における画像表示領域の外側に設けられる遮光性の額縁は、前記遮光膜と同一工程により形成される事を特徴とする請求項1から12のいずれか一項に記載の電気光学装置。13. The electro-optic device according to claim 1, wherein the light-shielding frame provided outside the image display area on the second substrate is formed by the same process as the light-shielding film. apparatus. 前記遮光性の額縁は、前記低反射膜からなる事を特徴とする請求項1から13のいずれか一項に記載の電気光学装置。14. The electro-optical device according to claim 1, wherein the light-shielding frame is made of the low reflection film. 請求項1から14のいずれか一項に記載の電気光学装置をライトバルブとして用いることを特徴とする投射型表示装置。A projection display device, wherein the electro-optical device according to any one of claims 1 to 14 is used as a light valve.
JP2001070366A 2000-03-13 2001-03-13 Electro-optical device and projection display device Expired - Fee Related JP3956630B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001070366A JP3956630B2 (en) 2000-03-13 2001-03-13 Electro-optical device and projection display device

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-69402 2000-03-13
JP2000069402 2000-03-13
JP2001070366A JP3956630B2 (en) 2000-03-13 2001-03-13 Electro-optical device and projection display device

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JP2001330821A JP2001330821A (en) 2001-11-30
JP2001330821A5 true JP2001330821A5 (en) 2004-12-24
JP3956630B2 JP3956630B2 (en) 2007-08-08

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Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003107459A (en) * 2001-09-28 2003-04-09 Hoya Corp Opposed substrates for liquid crystal display panel, and liquid crystal display panel
JP2004037874A (en) * 2002-07-03 2004-02-05 Seiko Epson Corp Electro-optic apparatus housed in packaging case and projection display apparatus
JP2005241910A (en) * 2004-02-26 2005-09-08 Nec Corp Thin film transistor array substrate, liquid crystal panel using the same and liquid crystal projector
JP5016850B2 (en) * 2006-05-30 2012-09-05 キヤノン株式会社 Liquid crystal display device and liquid crystal projector device
JP2008096966A (en) 2006-09-12 2008-04-24 Seiko Epson Corp Electro-optical device and electronic equipment
JP5298627B2 (en) * 2008-05-12 2013-09-25 ソニー株式会社 Liquid crystal display element and projection display device
JP5392702B2 (en) * 2009-01-08 2014-01-22 株式会社ジャパンディスプレイ Liquid crystal display device and electronic device
JP5278129B2 (en) * 2009-04-14 2013-09-04 セイコーエプソン株式会社 Electro-optical device and electronic apparatus
JP2013251284A (en) 2010-09-21 2013-12-12 Sharp Corp Semiconductor device and manufacturing method of the same
JP5808944B2 (en) 2011-05-11 2015-11-10 ピクストロニクス,インコーポレイテッド Display device and manufacturing method of display device
JP2017067999A (en) 2015-09-30 2017-04-06 セイコーエプソン株式会社 Substrate for electro-optic device, electro-optic device and electronic apparatus

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