JP2001286833A - Cleaning device and method of producing color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a cleaning device capable of removing resist residues without causing change in the sectional form of a pattern and to provide a method of producing a color filter. SOLUTION: The cleaning device 1 is used for removing resist residues on a substrate and has at least an ozone water cleaning means 2 for supplying ozone water capable of substantially lowering adhesiveness of the resist residues, only onto the substrate, a hydrogen water cleaning means 3 for supplying hydrogen water onto the substrate and a substrate conveying means 4 for conveying the substrate to the ozone water cleaning means 2 and the hydrogen water cleaning means 3. A color filter is produced using the cleaning deice 1 mentioned above.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus capable of removing a resist residue outside a colored pattern existing on a developed substrate and a method of manufacturing a color filter used for a liquid crystal display or the like.

[0002]

2. Description of the Related Art A color filter used in a liquid crystal display or the like is an optical element having a pattern of fine red, green, blue and the like (hereinafter referred to as a colored pattern). And
The production is performed by repeating a process of applying a photosensitive resist on a substrate such as glass, exposing (curing), developing, washing with water (hereinafter referred to as a colored pattern forming process) a plurality of times.
FIG. 3 is a plan view showing a state in which a first colored pattern 11 is formed on the substrate 10.

Incidentally, the developing step is mainly performed for the purpose of removing uncured resist (hereinafter referred to as resist residue 12), but it is difficult to completely remove them in this step. Then, the resist residue becomes defective on the product and lowers the yield.

[0004] The water washing step is cleaning using ultrapure water. However, since the purpose is to replace water with a developing solution used during development, it cannot be expected to remove resist residues. .

[0005] The resist residue can be removed to some extent by increasing the developing time or increasing the injection pressure of the developing solution. However, this results in over-development and consequently changes the pattern cross-sectional shape. This was a major obstacle for the final product.

[0006]

SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems, and is intended to manufacture a cleaning apparatus and a color filter capable of removing a resist residue without changing a pattern sectional shape. It is to provide a method.

[0007]

A cleaning apparatus according to claim 1 is a cleaning apparatus for removing a resist residue on a substrate, wherein the ozone water is capable of substantially reducing the adhesion of only the resist residue to the substrate. And ozone water cleaning means for supplying hydrogen water to the substrate, and substrate transport means for transporting the substrate to the ozone water cleaning means and the hydrogen water cleaning means. Things. A cleaning device according to a second aspect is based on the cleaning device according to the first aspect, wherein the ozone water cleaning means adheres ozone water by nozzle injection. A cleaning device according to a third aspect is based on the cleaning device according to the first aspect, wherein the ozone water cleaning unit includes an ozone water injection pressure adjusting unit. A cleaning device according to a fourth aspect is based on the cleaning device according to the first aspect, wherein the ozone water cleaning unit includes a concentration adjusting unit for ozone water. A cleaning apparatus according to a fifth aspect is based on the cleaning apparatus according to the first aspect, wherein the hydrogen water cleaning means includes an ultrasonic wave applying means for applying ultrasonic waves to the hydrogen water. . A cleaning apparatus according to a sixth aspect is based on the cleaning apparatus according to the first aspect, wherein the substrate is immersed and conveyed in a hydrogen water bath by the hydrogen water cleaning means while applying an ultrasonic wave provided below the hydrogen water bath. The ultrasonic wave is oscillated by the means. The method for producing a color filter according to claim 7, wherein in the method for producing a color filter using a resist on a substrate to form a colored pattern, after the colored pattern forming step, an ozone water cleaning step and a hydrogen water cleaning step are performed. It is characterized in that the resist residue is selectively removed.

[0008]

BEST MODE FOR CARRYING OUT THE INVENTION The present invention selectively removes only the resist residue other than the colored pattern by supplying relatively low-concentration ozone water to the substrate after pattern printing, that is, the resist residue and the substrate The purpose of the present invention is to provide an effect of lowering the adhesiveness of the film.

Therefore, the idea is different from the technique of completely removing the colored pattern with high-concentration ozone water for the purpose of reusing the substrate.

[0010] The resist residue having reduced adhesion to the substrate by ozone water is preferably removed by immersing the resist residue in hydrogen water having an enhanced peeling effect by applying ultrasonic waves.

Since both ozone water and hydrogen water are obtained by dissolving gas in ultrapure water, they return to ordinary water with the passage of time. Therefore, it is possible to remove the resist residue which also has the water replacement ability of the conventional developer.

Hereinafter, an overall configuration of the cleaning apparatus according to the first aspect will be described. As shown in FIG. 1, the cleaning device according to the present invention requires an ozone gas and hydrogen gas generator as ancillary equipment. Both devices have a function of dissolving ozone gas and hydrogen gas in ultrapure water, thereby generating ozone water and hydrogen water. The concentration is variable in the apparatus, and is changed depending on the degree of the resist pattern residue or the degree of the pattern film thickness.

As shown in FIG. 1, ozone water and hydrogen water are connected to a cleaning device. The flow rate (pressure) of each is variable by providing a valve in the course of the cleaning. Alternatively, it is changed according to the degree of the pattern film thickness.

Ozone water has the effect of lowering the adhesion between the resist residue and the substrate, and hydrogen water removes the resist residue having a reduced adhesion. Therefore, the ozone water cleaning step and then the hydrogen water cleaning step are performed in this order. In addition,
The concentration of ozone gas and hydrogen gas and the pressure of ozone water and hydrogen water are adjusted so that substantially only the resist residue lowers the adhesion and does not affect the coloring pattern.

Hereinafter, the cleaning apparatus will be described in detail with reference to FIG. First, the configuration of the apparatus will be briefly described. A developing machine is provided on the left side of FIG. 2, and the substrate 10 after development is conveyed. Although the transport method is not particularly limited, a transport roller is used as the transport means 4 in this example.
Note that it is preferable to use a material with low dust generation in order to avoid generation and adhesion of particles due to the transport rollers.

Reference numeral 2 in FIG. 2 denotes an ozone water cleaning means. The means for supplying ozone water is not particularly limited, but the nozzle 5 is used in this example. This nozzle injects high pressure ozone water to the substrate. The spray is a fan-shaped spray, and can uniformly spray ozone water on the substrate. Since the ozone water attenuates with time, it is preferable to adjust the concentration and flow rate (injection pressure) of the ozone water using a valve (not shown). Since ozone water is also attenuated by the gap between the nozzle and the substrate, it is preferable to have a variable gap mechanism.

Reference numeral 3 in FIG. 2 denotes hydrogen water cleaning means. The means for supplying hydrogen water is not particularly limited, but in this example, two water baths (first hydrogen water bus 6 and second hydrogen water bus 7) were used. An ultrasonic vibration element (not shown) serving as an ultrasonic wave applying means is provided below each water bath, and a slit-like opening through which a substrate passes is provided in a pass line of the bath. The hydrogen water injected into the bath is discharged by overflow from the bath and also discharged from the slit for passing the substrate, so that new hydrogen water is always supplied.

The two buses are used because the frequency applied to the ultrasonic vibrating element (in this example, one is connected to the vibrating element in the kHz frequency band and the other is connected to the vibrating element in the MHz frequency band) is reduced. This is for removing all the resist residue from the particle size to the large particle size.

The upper end of the ultrasonic irradiation bath, that is, the liquid level is kHz
This is an important parameter for sufficiently exhibiting the effect of the ultrasonic wave in the frequency band, and the design is performed at a height relative to the pass line suitable for the irradiation frequency.

The flow rate of the hydrogen water (the amount supplied to the bath) is adjusted by a valve, and an appropriate amount is maintained so that the removed resist does not adhere again, and / or the pH is adjusted.

The substrate is transported. In the ozone water cleaning means, the substrate may flap because ozone water is jetted from above and below. In the hydrogen water cleaning means, the substrate is immersed and transported in an ultrasonic irradiation bath. There is a possibility that the substrate floats from the transport roller. In order to avoid this, it is preferable to transport the substrate while sandwiching the upper and lower portions of the substrate with rollers.

At this time, what needs to be considered is the position of the presser (upper) roller. That is, if the pressing roller comes into contact with the colored pattern on the upper surface (pattern forming surface) of the substrate, it may cause damage. Therefore, it is preferable to set the position of the pressing roller at the outer corner of the substrate as much as possible.

The substrate after the hydrogen water cleaning step is carried out from the carry-out port on the right side of FIG. An unillustrated aqua knife and / or an air knife are provided at the carry-out port, and the cleaned substrate is dried by blowing air from above and below. Then, the substrate having no dried resist residue is accumulated in the stacker.

[0024]

According to the cleaning apparatus of the present invention, the use of ozone water and hydrogen water makes it possible to selectively remove the resist residue even if a small amount of the resist residue remains in the developing step. Become. Further, both the ozone water and the hydrogen water are obtained by dissolving gas in ultrapure water, and return to normal water with the passage of time. Therefore, the conventional washing step after development can be omitted.

Further, according to the method of manufacturing a color filter according to the present invention, it is possible to provide a color filter having a small resist residue and a good pattern sectional shape. Further, both the ozone water and the hydrogen water are obtained by dissolving gas in ultrapure water, and return to normal water with the passage of time. Therefore, the conventional washing step after development can be omitted.

[0026]

[Brief description of the drawings]

FIG. 1 is a schematic explanatory view showing a system including auxiliary equipment of a cleaning device according to the present invention.

FIG. 2 is a schematic explanatory view of a cleaning device according to the present invention.

FIG. 3 is a plan view of a substrate.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Cleaning apparatus 2 ... Ozone water cleaning means 3 ... Hydrogen water cleaning means 4 ... Substrate transfer means 5 ... Nozzle 6 ... First hydrogen water bath 7 ... Second hydrogen water bath

 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Yasuhiro Mitsui 1-5-1, Taito, Taito-ku, Tokyo Letterpress Printing Co., Ltd. F-term (reference) 2H048 BA02 BA11 BA45 BB02 BB14 BB42 2H096 AA28 LA02 LA03 3B201 AA02 AA03 AB14 AB42 BB02 BB04 BB24 BB32 BB85 BB93 CD43

Claims (7)

[Claims] 1. A cleaning apparatus for removing a resist residue on a substrate, comprising: an ozone water cleaning means for supplying ozone water capable of substantially reducing the adhesion of only the resist residue to the substrate; A cleaning apparatus comprising: at least a hydrogen water cleaning unit to be supplied; and a substrate transport unit that transports a substrate to the ozone water cleaning unit and the hydrogen water cleaning unit. 2. The cleaning apparatus according to claim 1, wherein the ozone water cleaning means adheres ozone water by nozzle injection. 3. The ozone water washing means includes an ozone water injection pressure adjusting means.
The cleaning device according to the above. 4. The cleaning apparatus according to claim 1, wherein said ozone water cleaning means has ozone water concentration adjusting means. 5. The cleaning apparatus according to claim 1, wherein said hydrogen water cleaning means includes ultrasonic wave applying means for applying ultrasonic waves to the hydrogen water. 6. An ultrasonic wave oscillating means provided under a hydrogen water bath while immersing and transporting a substrate in the hydrogen water bath in the hydrogen water cleaning means. Cleaning equipment. 7. A method for manufacturing a color filter, wherein a colored pattern is formed on a substrate by using a resist, after the colored pattern forming step, only the resist residue is selectively removed by an ozone water cleaning step and a hydrogen water cleaning step. A method of manufacturing a color filter.