JPS58203444A - Developing device - Google Patents

Abstract

PURPOSE:To perform efficiently the development processing of a mask for screen printing, by providing the first nozzle from which a liquid swelling a part of a photosensitive material layer is jetted and the second nozzle from which a liquid developing the photosensitive material layer is jetted. CONSTITUTION:Water is jetted mistily from nozzles 13a, 13b... and 17a, 17b... arranged on the first and the third nozzle supporting materials to swell the unexposed part of the photosensitive material layer of a mask 11 to be subjected to the development processing. The water is jetted mistily for about one minute. When the unexposed part of the photosensitive material layer is swelled, jetting of misty water from nozzles 13a, 13b... and 17a, 17b... is stopped. Next, the second nozzle supporting material 14 is driven vertically, and the water is jetted showerily from nozzles 15a, 15b... to remove the unexposed part of said photosensitive material layer, namely perform the development processing. Though the duration of jetting of showery water is related to the driving speed of the nozzle supporting material 14 and the quantity of jetted water, the development processing is possible even if it is about 30sec.

Description

Detailed Description of the Invention (1) Technical Field of the Invention The present invention relates to a developing device, particularly for screen printing (plate making).
The present invention relates to a developing device that is effective when applied to pattern development of masks.

(2) Background of the Technology In electronic devices such as electronic computers, printed wiring boards are used to mount all electronic components such as semiconductor integrated circuit devices and configure desired electronic circuits.

Such a printed wiring board is constructed by forming a conductive layer in a desired pattern on an insulating substrate such as a glass fiber woven cloth impregnated with an epoxy resin or a ceramic substrate.

A screen printing method is used as a means for forming a conductive layer in a desired pattern on the insulating substrate, or as a means for forming an insulating film called a solder resist on the formed conductive layer.

The mask used when carrying out such a screen printing method is such that the surface of a base material made of, for example, Tetoron cloth is coated with, for example, a diazo-based photosensitive material, the photosensitive material layer is subjected to a desired exposure treatment, and then exposed to vaginal light. The material layer is developed and formed.

(3) Prior Art and Problems In the production of the above-mentioned screen printing mask, the exposed photosensitive material layer is brought into contact with water to swell the exposed areas, and then the unexposed areas are completely washed out by washing with water in the shower. It is developed by removing it.

Conventionally, as a means for bringing the exposed photosensitive material layer into contact with water, a batch process has been used in which the mask base material provided with the photosensitive material layer is individually immersed in a water tank.

However, such batch processing cannot improve work efficiency and cannot manufacture such screen printing masks with high mass productivity.

(4) Purpose of the Invention The present invention provides a highly efficient method for developing masks for screen printing in place of such conventional methods. The present invention is intended to provide a complete developing device that can be implemented with the present invention.

(5) Structure of the Invention Accordingly, according to the invention, a first process is performed that sprays a liquid that swells a part of the photosensitive material layer onto an object to be developed having a photosensitive material layer that has been subjected to a desired exposure process. It is possible to provide a developing device comprising: a nozzle; and a second nozzle from which a liquid for developing the photosensitive material layer is ejected.

The present invention will be explained in detail below with reference to examples.

(6) Embodiment of the Invention FIGS. 1 and 2 show the structure of a developing device according to the present invention.

In the figure, reference numeral 11 indicates a mask to be developed, 12 indicates a first nozzle support body, 13a, 13b, which is disposed to face one face (surface) of the mask to be developed.

... is a nozzle group arranged on the first nozzle support 12, and 14 is the object to be developed 11 and the first nozzle support 12.
a second nozzle support, 15a, 15', disposed between the
b', . . . are nozzle groups arranged on the second nozzle support. Although only the nozzles 15a are shown in the figure, the nozzles 15 are arranged in parallel in the longitudinal direction of the nozzle support 14.

Further, 16 is the other surface (
a third nozzle support disposed opposite to the rear surface), l laminate, l '7 b, -- and 18a, 18b.

... is a nozzle group arranged on the third nozzle support 16. 1.Furthermore, 19 is a rail that supports the mask 11 to be developed, and 20 is a box-shaped surface cover.

A developing process using such a developing device is performed, for example, using the following procedure.

That is, when the mask 11 to be developed is introduced into the developing device while being supported by the rail 19, the nozzles A/13 disposed on the first and third nozzle supports first
a, 13 b, -- and l'i'a.

Water is ejected in the form of a mist from 17b, . The spraying time of such mist water is about 1 minute.

The nozzles 13a, 13b, . . . and 1'7a are in a state where the unexposed portions of the photosensitive material layer are in a swollen state.

1'i't), ... is stopped.

Next, the second nozzle support 14 is driven under E, and water is ejected in a shower form from the nozzles 15a, ljb, . The ejection time of the shower-like water is determined by the driving speed of the nozzle support 14.

Although it depends on the amount of water ejected, the development process can be carried out in as little as 30 seconds. After that, the ejection of water from the nozzles of the second nozzle support 14 is stopped, and the ejection of water from the nozzles of the third nozzle support 16 is stopped. Nozzle 1
8a, 181), . . . water is ejected like a shower to clean the back surface of the mask 11 to be developed.

As a result of the above processing, we received 1! The development process of the image processing mask 11 is completed. The mask 11 that has been subjected to such development processing is supported by the rails 19 and is transported to the next step as required.

In such a developing device, accommodation and ejection of the mask to be developed, opening and closing of each nozzle, and driving of the nozzle support 14 can be performed using a suitable control device f' such as an electronic computer.

(7) Effects of the Invention As described above, according to the present invention, the swelling treatment and the development treatment of the unexposed portion of the photosensitive material layer can be continuously performed on the mask to be developed.

Therefore, manufacturing of a screen printing mask can be made easier.

It should be noted that the developing device according to the present invention is not limited to the developing process for such screen printing masks, but can of course be applied to members that undergo similar developing processes.

[Brief explanation of drawings]

FIG. 1 is a partially cutaway perspective view showing the structure of a developing device according to the present invention, and FIG. 2 is a sectional view taken along line xx' in FIG. In the figure, 11... development processing mask 13.17.
...Nozzle 15 for swelling treatment of photosensitive material layer...
...Nozzle 273- for developing the photosensitive material layer

Claims (1)

[Claims] A first nozzle that sprays a liquid that swells a portion of the photosensitive material layer onto an object to be developed that has a photosensitive material layer that has been subjected to a desired exposure process, and a liquid that develops the photosensitive material layer. A developing device comprising: a second nozzle that ejects water.