JP2001284237A - 照明装置及びそれを用いた露光装置 - Google Patents

照明装置及びそれを用いた露光装置

Info

Publication number
JP2001284237A
JP2001284237A JP2000099074A JP2000099074A JP2001284237A JP 2001284237 A JP2001284237 A JP 2001284237A JP 2000099074 A JP2000099074 A JP 2000099074A JP 2000099074 A JP2000099074 A JP 2000099074A JP 2001284237 A JP2001284237 A JP 2001284237A
Authority
JP
Japan
Prior art keywords
light
optical element
optical system
generating means
diffractive optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000099074A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001284237A5 (enExample
Inventor
Toshihiko Tsuji
俊彦 辻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2000099074A priority Critical patent/JP2001284237A/ja
Publication of JP2001284237A publication Critical patent/JP2001284237A/ja
Publication of JP2001284237A5 publication Critical patent/JP2001284237A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
JP2000099074A 2000-03-31 2000-03-31 照明装置及びそれを用いた露光装置 Withdrawn JP2001284237A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000099074A JP2001284237A (ja) 2000-03-31 2000-03-31 照明装置及びそれを用いた露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000099074A JP2001284237A (ja) 2000-03-31 2000-03-31 照明装置及びそれを用いた露光装置

Publications (2)

Publication Number Publication Date
JP2001284237A true JP2001284237A (ja) 2001-10-12
JP2001284237A5 JP2001284237A5 (enExample) 2007-05-17

Family

ID=18613472

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000099074A Withdrawn JP2001284237A (ja) 2000-03-31 2000-03-31 照明装置及びそれを用いた露光装置

Country Status (1)

Country Link
JP (1) JP2001284237A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6816234B2 (en) 2000-03-30 2004-11-09 Canon Kabushiki Kaisha Illumination optical system in exposure apparatus
JP2005302998A (ja) * 2004-04-12 2005-10-27 Canon Inc Ｅｕｖ光を用いた露光装置および露光方法
US7265816B2 (en) 2004-06-21 2007-09-04 Canon Kabushiki Kaisha Illumination optical system, exposure apparatus, and device manufacturing method with modified illumination generator
JP2010165886A (ja) * 2009-01-16 2010-07-29 Nikon Corp 補正ユニット、照明光学系、露光装置、およびデバイス製造方法
CN108333856A (zh) * 2017-01-19 2018-07-27 深圳奥比中光科技有限公司 光学投影装置及应用其的深度相机
KR20250156612A (ko) 2024-04-25 2025-11-03 레자 텍쿠 가부시키가이샤 광학 장치 및 조정 방법

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6816234B2 (en) 2000-03-30 2004-11-09 Canon Kabushiki Kaisha Illumination optical system in exposure apparatus
US7050154B2 (en) 2000-03-30 2006-05-23 Canon Kabushiki Kaisha Illumination optical system in exposure apparatus
JP2005302998A (ja) * 2004-04-12 2005-10-27 Canon Inc Ｅｕｖ光を用いた露光装置および露光方法
US7265816B2 (en) 2004-06-21 2007-09-04 Canon Kabushiki Kaisha Illumination optical system, exposure apparatus, and device manufacturing method with modified illumination generator
JP2010165886A (ja) * 2009-01-16 2010-07-29 Nikon Corp 補正ユニット、照明光学系、露光装置、およびデバイス製造方法
CN108333856A (zh) * 2017-01-19 2018-07-27 深圳奥比中光科技有限公司 光学投影装置及应用其的深度相机
CN108333856B (zh) * 2017-01-19 2023-07-07 奥比中光科技集团股份有限公司 光学投影装置及应用其的深度相机
KR20250156612A (ko) 2024-04-25 2025-11-03 레자 텍쿠 가부시키가이샤 광학 장치 및 조정 방법

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