JP2001265253A5 - - Google Patents

Download PDF

Info

Publication number
JP2001265253A5
JP2001265253A5 JP2000077177A JP2000077177A JP2001265253A5 JP 2001265253 A5 JP2001265253 A5 JP 2001265253A5 JP 2000077177 A JP2000077177 A JP 2000077177A JP 2000077177 A JP2000077177 A JP 2000077177A JP 2001265253 A5 JP2001265253 A5 JP 2001265253A5
Authority
JP
Japan
Prior art keywords
electro
optical device
capacitance
line
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000077177A
Other languages
Japanese (ja)
Other versions
JP3799943B2 (en
JP2001265253A (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2000077177A priority Critical patent/JP3799943B2/en
Priority claimed from JP2000077177A external-priority patent/JP3799943B2/en
Publication of JP2001265253A publication Critical patent/JP2001265253A/en
Publication of JP2001265253A5 publication Critical patent/JP2001265253A5/ja
Application granted granted Critical
Publication of JP3799943B2 publication Critical patent/JP3799943B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の名称】電気光学装置およびプロジェクタPatent application title: ELECTRO-OPTICAL DEVICE AND PROJECTOR

Claims (16)

基板上に、
薄膜トランジスタと、
画素電極と、
該画素電極と前記薄膜トランジスタを構成する半導体層とを中継接続する中間導電層と、
前記薄膜トランジスタに接続された走査線と、
該走査線と交差すると共に前記薄膜トランジスタに接続されたデータ線と、
前記半導体層と同層からなる第1容量電極に絶縁薄膜を介して対向配置された
第2容量電極と、
前記中間導電層と同一膜からなり、前記第2容量電極と接続された第1容量線と
を備えたことを特徴とする電気光学装置。
On the substrate,
A thin film transistor;
A pixel electrode;
An intermediate conductive layer that relay-connects the pixel electrode and a semiconductor layer forming the thin film transistor;
A scanning line connected to the thin film transistor;
A data line crossing the scanning line and connected to the thin film transistor;
A second capacitor electrode opposed to a first capacitor electrode made of the same layer as the semiconductor layer via an insulating thin film;
An electro-optical device, comprising: a first capacitor line formed of the same film as the intermediate conductive layer and connected to the second capacitor electrode.
前記第2容量電極と前記走査線とは、同一導電膜からなることを特徴とする請求項1に記載の電気光学装置。The electro-optical device according to claim 1, wherein the second capacitance electrode and the scanning line are made of the same conductive film. 前記第1容量線と前記第2容量電極との間には、第1層間絶縁膜が形成されており、
前記第1容量線と前記第2容量電極とは、前記画素電極毎に前記第1層間絶縁膜に開孔されたコンタクトホールを介して接続されていることを特徴とする請求項1又は2に記載の電気光学装置。
A first interlayer insulating film is formed between the first capacitance line and the second capacitance electrode,
3. The device according to claim 1, wherein the first capacitance line and the second capacitance electrode are connected to each other through a contact hole formed in the first interlayer insulating film for each of the pixel electrodes. 4. An electro-optical device according to claim 1.
前記第1容量線と前記第2容量電極との間には、第1層間絶縁膜が形成されており、
前記第1容量線と前記第2容量電極とは、複数の画素電極毎に前記第1層間絶縁膜に開孔されたコンタクトホールを介して接続されていることを特徴とする請求項1又は2に記載の電気光学装置。
A first interlayer insulating film is formed between the first capacitance line and the second capacitance electrode,
3. The device according to claim 1, wherein the first capacitance line and the second capacitance electrode are connected to each other through a contact hole formed in the first interlayer insulating film for each of a plurality of pixel electrodes. An electro-optical device according to claim 1.
前記中間導電層及び前記第1容量線は、前記第1層間絶縁膜を介して前記走査線の上方且つ第2層間絶縁膜を介して前記データ線の下方の積層位置に形成されていることを特徴とする請求項1から4のいずれか一項に記載の電気光学装置。The intermediate conductive layer and the first capacitance line are formed at a stacked position above the scanning line via the first interlayer insulating film and below the data line via a second interlayer insulating film. The electro-optical device according to any one of claims 1 to 4, wherein: 前記第1容量線は、平面的に見て少なくとも部分的に前記走査線に重ねられており、前記走査線に沿って前記画素電極が配置された画像表示領域からその周囲に延設されていることを特徴とする請求項1からのいずれか一項に記載の電気光学装置。The first capacitance line is at least partially overlapped with the scanning line when viewed in plan, and extends from the image display area where the pixel electrode is arranged along the scanning line to the periphery thereof. The electro-optical device according to any one of claims 1 to 5 , wherein: 前記第1容量線は、平面的に見て少なくとも部分的に前記第2容量電極に重ねられており、前記走査線方向に沿って前記画像表示領域からその周囲に延設されていることを特徴とする請求項1からのいずれか一項に記載の電気光学装置。The first capacitance line is at least partially overlapped with the second capacitance electrode when seen in a plan view, and extends from the image display area to the periphery thereof along the scanning line direction. The electro-optical device according to any one of claims 1 to 6 , wherein 前記中間導電層及び前記第1容量線は、遮光性の導電膜からなり、
前記第1容量線は、平面的に見て前記半導体層の少なくともチャネル領域を覆うことを特徴とする請求項1からのいずれか一項に記載の電気光学装置。
The intermediate conductive layer and the first capacitance line are formed of a light-shielding conductive film,
Wherein the first capacitor line, an electro-optical device according to any one of claims 1 to 7, characterized in that in plan view to cover at least the channel region of the semiconductor layer.
前記中間導電層は、多層膜からなることを特徴とする請求項1からのいずれか一項に記載の電気光学装置。The intermediate conductive layer, an electro-optical device according to any one of claims 1, characterized in that a multilayer film 8. 前記第1層間絶縁膜の膜厚は、500nm以上であることを特徴とする請求項1からのいずれか一項に記載の電気光学装置。The electro-optical device according to any one of claims 1 to 9 , wherein the first interlayer insulating film has a thickness of 500 nm or more. 前記第1層間絶縁膜の膜厚は、500nm以下であり、平面的に見て少なくとも前記半導体層のチャネル領域及びその隣接領域には、前記第1容量線は重ねられていないことを特徴とする請求項1からのいずれか一項に記載の電気光学装置。The first interlayer insulating film has a thickness of 500 nm or less, and the first capacitance line does not overlap at least a channel region of the semiconductor layer and a region adjacent to the channel region in plan view. the electro-optical device according to any one of claims 1 to 9. 前記基板上に、前記中間導電層及び前記第1容量線と同一膜からなり前記第1層間絶縁膜を介して前記容量線と対向配置された第3容量電極を更に備えたことを特徴とする請求項1から11のいずれか一項に記載の電気光学装置。And a third capacitance electrode formed of the same film as the intermediate conductive layer and the first capacitance line and opposed to the capacitance line via the first interlayer insulating film on the substrate. the electro-optical device according to any one of claims 1 to 11. 前記第2容量電極は、前記走査線に沿って前記画像表示領域からその周囲に延設されてなる第2容量線からなり、前記第2容量線は前記第1容量線と接続されてなることを特徴とする請求項1から12のいずれか一項に記載の電気光学装置。The second capacitance electrode includes a second capacitance line extending from the image display area to a periphery thereof along the scanning line, and the second capacitance line is connected to the first capacitance line. the electro-optical device according to claim 1, any one of 12, wherein the. 前記基板上に、少なくとも前記半導体層のチャネル領域を前記基板側から見て覆う遮光膜を更に備えたことを特徴とする請求項1から13のいずれか一項に記載の電気光学装置。On the substrate, at least an electro-optical device according to the channel region of the semiconductor layer in any one of claims 1 to 13, further comprising a light shielding film covering viewed from the substrate side. 前記遮光膜は、前記画素電極毎に前記第1容量線と接続され、前記画像表示領域からその周囲に延設されて定電位源に接続されてなることを特徴とする請求項1から14のいずれか一項に記載の電気光学装置。The light shielding film, which is connected to the first capacitor line for each pixel electrode, said extending therearound from the image display area from claim 1 characterized by comprising connected to the constant potential source 14 The electro-optical device according to claim 1. 請求項1から15のいずれか一項に記載の電気光学装置を内臓したことを特徴とするプロジェクタ。A projector comprising the electro-optical device according to claim 1.
JP2000077177A 2000-03-17 2000-03-17 Electro-optical device and projector Expired - Fee Related JP3799943B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000077177A JP3799943B2 (en) 2000-03-17 2000-03-17 Electro-optical device and projector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000077177A JP3799943B2 (en) 2000-03-17 2000-03-17 Electro-optical device and projector

Publications (3)

Publication Number Publication Date
JP2001265253A JP2001265253A (en) 2001-09-28
JP2001265253A5 true JP2001265253A5 (en) 2004-12-16
JP3799943B2 JP3799943B2 (en) 2006-07-19

Family

ID=18594786

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000077177A Expired - Fee Related JP3799943B2 (en) 2000-03-17 2000-03-17 Electro-optical device and projector

Country Status (1)

Country Link
JP (1) JP3799943B2 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030062592A (en) * 2002-01-17 2003-07-28 일진다이아몬드(주) Thin film transistor substrate for liquid crystal display (LCD) and Method of manufacturing the same
JP3788387B2 (en) 2002-05-10 2006-06-21 セイコーエプソン株式会社 Electro-optical device and method of manufacturing electro-optical device
JP3850364B2 (en) 2002-10-25 2006-11-29 株式会社ミツトヨ Measuring point drive mechanism of displacement measuring instrument
JP4021392B2 (en) * 2002-10-31 2007-12-12 セイコーエプソン株式会社 Electro-optical device and electronic apparatus
JP3791517B2 (en) 2002-10-31 2006-06-28 セイコーエプソン株式会社 Electro-optical device and electronic apparatus
JP4045226B2 (en) 2002-10-31 2008-02-13 セイコーエプソン株式会社 Electro-optical device and electronic apparatus
JP3925549B2 (en) * 2002-11-26 2007-06-06 セイコーエプソン株式会社 Electro-optical device and electronic apparatus
JP3767590B2 (en) * 2002-11-26 2006-04-19 セイコーエプソン株式会社 ELECTRO-OPTICAL DEVICE, MANUFACTURING METHOD THEREOF, AND ELECTRONIC DEVICE
TWI227031B (en) 2003-06-20 2005-01-21 Au Optronics Corp A capacitor structure
CN1307479C (en) * 2003-07-10 2007-03-28 友达光电股份有限公司 Capacitor arrangement

Similar Documents

Publication Publication Date Title
JP2024112897A5 (en)
US9012273B2 (en) Method of manufacturing a flat panel display device
JP2001356709A5 (en)
TW200618309A (en) Active-matrix substrate and display device including the substrate
EP2477064A1 (en) Liquid crystal display device and method for manufacturing same
TWI361329B (en) Array substrate and method for manufacturing the same
US11385732B2 (en) Array substrate, manufacturing method thereof, touch display panel and touch display device
TW578123B (en) Pixel having transparent structure and reflective structure
KR970071090A (en) Active Matrix Substrate and Manufacturing Method Thereof
JP2009063994A5 (en)
JP2002156653A5 (en)
TWI356263B (en) Liquid crystal display with high aperture ratio
JP2001265253A5 (en)
JP2003229578A5 (en)
JP2009122256A5 (en)
JP2002311424A5 (en)
TW201417187A (en) Thin film transistor array panel and manufacturing method thereof
JP2001013522A5 (en)
JP6605146B2 (en) Display device with touch panel
JP2009053479A5 (en)
JP2002107763A5 (en)
JP2003115593A5 (en)
KR19990017660A (en) Liquid Crystal Display and Manufacturing Method Thereof
JP2005234514A (en) Display device
JP2001249361A5 (en)