JP2001259990A - Wire for wire saw - Google Patents

Wire for wire saw

Info

Publication number
JP2001259990A
JP2001259990A JP2000072018A JP2000072018A JP2001259990A JP 2001259990 A JP2001259990 A JP 2001259990A JP 2000072018 A JP2000072018 A JP 2000072018A JP 2000072018 A JP2000072018 A JP 2000072018A JP 2001259990 A JP2001259990 A JP 2001259990A
Authority
JP
Japan
Prior art keywords
wire
saw
cutting
residual stress
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000072018A
Other languages
Japanese (ja)
Inventor
Yukihiro Oishi
幸広 大石
Nozomi Kawabe
望 河部
Kenichi Shimizu
健一 清水
Akito Hoshima
昭人 星間
Yoshihiro Akaha
良啓 赤羽
Kojiro Shirabe
公二郎 調
Makoto Mizuhara
誠 水原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP2000072018A priority Critical patent/JP2001259990A/en
Publication of JP2001259990A publication Critical patent/JP2001259990A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a wire for a wire saw capable of retaining a good wire form even after cutting. SOLUTION: The wire for the wire saw is used for cutting or slicing a hard material such as silicon and a solar buttery. A longitudinal residual stress of a wire surface is defined such that a difference of the maximum value and the minimum value in the case where it is measured at four points where a circumferential direction of the wire is different by every 90 deg. is made to 20 kgf/mm2 or less.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、シリコン、太陽
電池等の硬質材料の切断、スライスに用いられるワイヤ
ソー用のワイヤに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wire for a wire saw used for cutting and slicing hard materials such as silicon and solar cells.

【0002】[0002]

【従来の技術とその課題】ワイヤソーは、複数の溝ロー
ラに所定のピッチでワイヤを巻き掛けたワイヤ列を走行
させ、このワイヤ列に被切断材(ワーク)を押し付けな
がら、ワイヤ列とワークとの間に砥液を注ぎつつ、砥粒
の研削作用により、ワークを多数のウエハに切断する装
置である。
2. Description of the Related Art In a wire saw, a wire row in which a wire is wound around a plurality of groove rollers at a predetermined pitch is run, and while a material to be cut (work) is pressed against the wire row, the wire row and the work are joined together. This is an apparatus that cuts a work into a large number of wafers by a grinding action of abrasive grains while pouring an abrasive liquid during the process.

【0003】ところで、このようなワイヤソーに使用さ
れるワイヤに求められる特性としては、切断工程におい
てワイヤのフリーコイル径やねじれ、うねりといった線
癖が変化しないということが重要である。
Meanwhile, as a characteristic required for a wire used in such a wire saw, it is important that a wire habit such as a free coil diameter, twist, and undulation does not change in the cutting process.

【0004】切断後、フリーコイル径が初期よりも小さ
くなったり、ワイヤに微小な波(うねり)といった悪い
線癖が付くと、スライス面の精度を著しく低下させると
いう問題が生じる。
[0004] After cutting, if the free coil diameter becomes smaller than the initial one, or if the wire has a bad line habit such as a minute wave (undulation), there arises a problem that the accuracy of the slice surface is significantly reduced.

【0005】そこで、この発明は、切断後においても、
良好な線癖を保持するワイヤソー用ワイヤを提供しよう
とするものである。
[0005] Therefore, the present invention is to provide a
An object of the present invention is to provide a wire for a wire saw that maintains a good wire habit.

【0006】[0006]

【課題を解決するための手段】この発明は、シリコン、
太陽電池等の硬質材料の切断、スライスに使用されるワ
イヤソー用ワイヤにおいて、ワイヤ表面の長手方向の残
留応力が、ワイヤの円周方向に90度づつ異なる4点に
て測定した場合の最大値と最小値の差が20kgf/m
以下の範囲に規定されていることを特徴とするもの
である。
SUMMARY OF THE INVENTION The present invention is directed to silicon,
In wires for wire saws used for cutting and slicing hard materials such as solar cells, the residual stress in the longitudinal direction of the wire surface is the maximum value measured at four different points at 90 degrees in the circumferential direction of the wire. The difference between the minimum values is 20kgf / m
and it is characterized in that it is defined in m 2 or less.

【0007】残留応力の値が円周方向でばらついている
と、切断後のワイヤの線癖が大きく変化し、うねりを生
じる原因になるが、この発明のように、ワイヤ表面の長
手方向の残留応力を、ワイヤの円周方向に90度づつ異
なる4点にて測定した場合の最大値と最小値の差が20
kgf/mm以下の範囲に規定すると、切断後もワイ
ヤの線癖を良好に保持することができる。
[0007] If the value of the residual stress varies in the circumferential direction, the wire habit of the wire after cutting greatly changes, causing undulation. However, as in the present invention, the residual strength in the longitudinal direction of the wire surface is reduced. When the stress is measured at four different points in the circumferential direction of the wire at 90 degrees each, the difference between the maximum value and the minimum value is 20.
When the weight is specified in the range of kgf / mm 2 or less, the wire habit can be favorably maintained even after cutting.

【0008】ワイヤ表面の残留応力の分布は、伸線加工
時の諸条件(ダイス形状、1パスの減面率等)によって
変化する。したがって、適切な伸線加工条件により、ワ
イヤ表面の残留応力の分布を、最大値と最小値の差が2
0kgf/mm以下になるようにすることが可能であ
る。
The distribution of the residual stress on the wire surface varies depending on various conditions (die shape, reduction rate of one pass, etc.) during wire drawing. Therefore, the distribution of the residual stress on the wire surface is set to be less than 2 by the appropriate wire drawing conditions.
It is possible to make it equal to or less than 0 kgf / mm 2 .

【0009】また、ワイヤソー用ワイヤとして、好まし
い引張り強さは、3200MPa以上である。
[0009] Further, as a wire for a wire saw, a preferable tensile strength is 3200 MPa or more.

【0010】[0010]

【発明の実施の形態】φ0.16mmのワイヤソー用ワ
イヤを、異なる伸線加工条件で、残留応力の異なる6種
のワイヤを作製した。この6種のワイヤを使用して、シ
リコンインゴットの切断を行い、使用後のワイヤの線癖
を評価した。表1に、残留応力の分布(円周4点の残留
応力の最大値―最小値:軸方向残留応力)、使用後のワ
イヤの線癖を示す。
BEST MODE FOR CARRYING OUT THE INVENTION Six types of wires having different residual stresses were produced from wire for a wire saw having a diameter of 0.16 mm under different drawing conditions. Using these six types of wires, a silicon ingot was cut, and the wire habit after use was evaluated. Table 1 shows the distribution of residual stress (maximum value-minimum value of residual stress at four circumferential points: residual stress in the axial direction) and the wire habit after use.

【0011】[0011]

【表1】 [Table 1]

【0012】表1の通り、残留応力の最大最小差が20
kgf/mm以上である試料A、B、Cのワイヤは、
使用後の線癖が悪い。一方、残留応力の最大最小差が2
0kgf/mm以下であるD、E、Fのワイヤは、使
用後も300mm以上のフリーコイル径を保持し、うね
りも存在しない。以上のことから、残留応力の最大最小
差が20kgf/mm以下であるこの発明のワイヤ
は、使用後において良好な線癖を有することが確認でき
た。
As shown in Table 1, the difference between the maximum and the minimum of the residual stress is 20.
The wires of samples A, B and C having a weight of not less than kgf / mm 2
Bad wire habit after use. On the other hand, the maximum and minimum difference of the residual stress is 2
D, E, and F wires of 0 kgf / mm 2 or less maintain a free coil diameter of 300 mm or more even after use, and have no undulation. From the above, it was confirmed that the wire of the present invention having a maximum and minimum difference in residual stress of 20 kgf / mm 2 or less had a good wire habit after use.

【0013】[0013]

【発明の効果】この発明に係るワイヤソー用ワイヤは、
使用後においても良好な線癖を保持するので、スライス
面の精度を低下させることがない。
The wire for a wire saw according to the present invention comprises:
Since a good line habit is maintained even after use, the accuracy of the slice plane does not decrease.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 清水 健一 伊丹市昆陽北一丁目1番1号 住友電気工 業株式会社伊丹製作所内 (72)発明者 星間 昭人 伊丹市昆陽北一丁目1番1号 住友電気工 業株式会社伊丹製作所内 (72)発明者 赤羽 良啓 伊丹市昆陽北一丁目1番1号 住友電気工 業株式会社伊丹製作所内 (72)発明者 調 公二郎 伊丹市昆陽北一丁目1番1号 住友電気工 業株式会社伊丹製作所内 (72)発明者 水原 誠 伊丹市昆陽北一丁目1番1号 住友電気工 業株式会社伊丹製作所内 Fターム(参考) 3C058 AA05 AA09 CA05 CB01 DA03 DA17 3C069 AA01 BA06 BB03 CA03 EA02 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Kenichi Shimizu 1-1-1 Kunyokita, Itami City Inside Itami Works, Sumitomo Electric Industries, Ltd. (72) Inventor Akito Hoshima 1-1-1 Kunyokita, Itami City No. 1 Sumitomo Electric Industries, Ltd. Itami Works (72) Inventor Yoshihiro Akabane 1-1-1, Koyo Kita, Itami-shi Sumitomo Electric Industries, Ltd. Itami Works (72) Inventor Koujiro Tono, Itami City Kitaichi Kitaichi Sumitomo Electric Industries, Ltd. Itami Works (72) Inventor Makoto Mizuhara 1-1-1, Kunyokita, Itami City Itami Works Sumitomo Electric Industries, Ltd. Itami Works F-term (reference) 3C058 AA05 AA09 CA05 CB01 DA03 DA17 3C069 AA01 BA06 BB03 CA03 EA02

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 シリコン、太陽電池等の硬質材料の切
断、スライスに使用されるワイヤソー用ワイヤにおい
て、ワイヤ表面の長手方向の残留応力が、ワイヤの円周
方向に90度づつ異なる4点にて測定した場合の最大値
と最小値の差が20kgf/mm以下の範囲に規定さ
れていることを特徴とするワイヤソー用ワイヤ。
1. In a wire saw wire used for cutting and slicing hard materials such as silicon and solar cells, the residual stress in the longitudinal direction of the wire surface differs at four points by 90 degrees in the circumferential direction of the wire. A wire for a wire saw, wherein a difference between a maximum value and a minimum value when measured is defined in a range of 20 kgf / mm 2 or less.
【請求項2】 3200MPa以上の引張り強さを有す
る請求項1記載のワイヤソー用ワイヤ。
2. The wire for a wire saw according to claim 1, which has a tensile strength of 3200 MPa or more.
JP2000072018A 2000-03-15 2000-03-15 Wire for wire saw Pending JP2001259990A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000072018A JP2001259990A (en) 2000-03-15 2000-03-15 Wire for wire saw

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000072018A JP2001259990A (en) 2000-03-15 2000-03-15 Wire for wire saw

Publications (1)

Publication Number Publication Date
JP2001259990A true JP2001259990A (en) 2001-09-25

Family

ID=18590493

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000072018A Pending JP2001259990A (en) 2000-03-15 2000-03-15 Wire for wire saw

Country Status (1)

Country Link
JP (1) JP2001259990A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010023224A (en) * 2008-07-15 2010-02-04 Hongduk Fine Cord Co Ltd Saw wire
EP2906382B1 (en) 2012-09-07 2018-11-07 Bekaert Binjiang Steel Cord Co., Ltd. A shaped sawing wire with subsurface tensile residual stresses

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010023224A (en) * 2008-07-15 2010-02-04 Hongduk Fine Cord Co Ltd Saw wire
EP2906382B1 (en) 2012-09-07 2018-11-07 Bekaert Binjiang Steel Cord Co., Ltd. A shaped sawing wire with subsurface tensile residual stresses
EP2906382B2 (en) 2012-09-07 2023-11-01 Bekaert Binjiang Steel Cord Co., Ltd. A shaped sawing wire with subsurface tensile residual stresses

Similar Documents

Publication Publication Date Title
EP1371467B1 (en) Wire saw and method of slicing a cylindrical workpiece
US9876078B2 (en) Method for slicing semiconductor single crystal ingot
CN108687981B (en) Wire sawing and cutting device
CN101138869A (en) Monocrystalline silicon high-efficient composite cutting method and cutting system thereof
JP7113365B2 (en) Saw wire and cutting equipment
TW201511909A (en) Method for simultaneously cutting a multiplicity of wafers from a workpiece
CN102514109A (en) Fixed and aligned cutting method of silicon carbide crystal
KR101764529B1 (en) Corrugated monowire for cutting
CN103507173B (en) Cut the method for multiple wafer from cylindrical workpiece simultaneously
JP2005347712A (en) Processing method of silicon wafer
US5845630A (en) Process and apparatus for fabricating a semiconductor wafer
JP2005238377A (en) Saw wire
JP2001259990A (en) Wire for wire saw
JP2000071160A (en) Wire for saw wire
JP5530946B2 (en) Method for cutting multiple wafers from crystals of semiconductor material
JP3283113B2 (en) Wafer manufacturing method
EP2919936B1 (en) Saw wire having asymmetrical crimps
JP2002075923A (en) Machining method of silicon single-crystal ingot
US11717930B2 (en) Method for simultaneously cutting a plurality of disks from a workpiece
JP2018167390A (en) Saw wire and cut-off device
JP2001259991A (en) Wire for wire saw
JP2004017216A (en) Diamond blade and mirror surface machining method
JP2005059354A (en) Manufacturing method of single crystal lump for use in slicing semiconductor wafer
JP2001262229A (en) Method for producing wire for wire saw
JP2006212958A (en) Band saw-type cutter and semiconductor ingot cutting method using the cutter