JP2001257245A - 製造システム - Google Patents
製造システムInfo
- Publication number
- JP2001257245A JP2001257245A JP2000067429A JP2000067429A JP2001257245A JP 2001257245 A JP2001257245 A JP 2001257245A JP 2000067429 A JP2000067429 A JP 2000067429A JP 2000067429 A JP2000067429 A JP 2000067429A JP 2001257245 A JP2001257245 A JP 2001257245A
- Authority
- JP
- Japan
- Prior art keywords
- spectrum
- wafer
- evaluation value
- plasma
- manufacturing system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 32
- 238000001228 spectrum Methods 0.000 claims abstract description 84
- 238000011156 evaluation Methods 0.000 claims abstract description 42
- 239000000463 material Substances 0.000 claims abstract description 29
- 238000012545 processing Methods 0.000 claims description 71
- 238000000034 method Methods 0.000 claims description 38
- 238000007689 inspection Methods 0.000 claims description 37
- 239000004065 semiconductor Substances 0.000 claims description 34
- 238000001514 detection method Methods 0.000 claims description 6
- 238000012360 testing method Methods 0.000 claims description 4
- 238000000295 emission spectrum Methods 0.000 abstract description 27
- 238000006243 chemical reaction Methods 0.000 abstract description 10
- 230000003287 optical effect Effects 0.000 abstract description 3
- 230000002401 inhibitory effect Effects 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 76
- 230000002950 deficient Effects 0.000 description 14
- 239000007789 gas Substances 0.000 description 12
- 230000005856 abnormality Effects 0.000 description 8
- 238000003860 storage Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 238000005530 etching Methods 0.000 description 5
- 230000003595 spectral effect Effects 0.000 description 5
- 230000002159 abnormal effect Effects 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000001499 laser induced fluorescence spectroscopy Methods 0.000 description 3
- 238000012544 monitoring process Methods 0.000 description 3
- 238000004611 spectroscopical analysis Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 101100040225 Arabidopsis thaliana RS40 gene Proteins 0.000 description 1
- 102100032566 Carbonic anhydrase-related protein 10 Human genes 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- 101000867836 Homo sapiens Carbonic anhydrase-related protein 10 Proteins 0.000 description 1
- 101000650817 Homo sapiens Semaphorin-4D Proteins 0.000 description 1
- 102100027744 Semaphorin-4D Human genes 0.000 description 1
- 101500019086 Ustilago maydis P6 virus KP6 killer toxin subunit alpha Proteins 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000010606 normalization Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000067429A JP2001257245A (ja) | 2000-03-10 | 2000-03-10 | 製造システム |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000067429A JP2001257245A (ja) | 2000-03-10 | 2000-03-10 | 製造システム |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001257245A true JP2001257245A (ja) | 2001-09-21 |
| JP2001257245A5 JP2001257245A5 (https=) | 2007-05-10 |
Family
ID=18586625
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000067429A Pending JP2001257245A (ja) | 2000-03-10 | 2000-03-10 | 製造システム |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001257245A (https=) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006501611A (ja) * | 2002-09-26 | 2006-01-12 | ラム リサーチ コーポレイション | プラズマ処理システムをツールマッチングしかつトラブルシュートする方法 |
| JP2006093633A (ja) * | 2004-09-27 | 2006-04-06 | Horiba Ltd | 製膜条件特定方法、製膜方法、及び膜体製造方法 |
-
2000
- 2000-03-10 JP JP2000067429A patent/JP2001257245A/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006501611A (ja) * | 2002-09-26 | 2006-01-12 | ラム リサーチ コーポレイション | プラズマ処理システムをツールマッチングしかつトラブルシュートする方法 |
| JP2010062579A (ja) * | 2002-09-26 | 2010-03-18 | Lam Res Corp | プラズマ処理システムをツールマッチングしかつトラブルシュートする方法 |
| KR101022993B1 (ko) * | 2002-09-26 | 2011-03-22 | 램 리써치 코포레이션 | 플라즈마 처리 시스템을 툴정합시키고 장애를 해결하는방법 |
| JP2006093633A (ja) * | 2004-09-27 | 2006-04-06 | Horiba Ltd | 製膜条件特定方法、製膜方法、及び膜体製造方法 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070309 |
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| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20070309 |
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| A977 | Report on retrieval |
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| A131 | Notification of reasons for refusal |
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| A521 | Written amendment |
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