JP2001255603A5 - - Google Patents

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JP2001255603A5
JP2001255603A5 JP2000064713A JP2000064713A JP2001255603A5 JP 2001255603 A5 JP2001255603 A5 JP 2001255603A5 JP 2000064713 A JP2000064713 A JP 2000064713A JP 2000064713 A JP2000064713 A JP 2000064713A JP 2001255603 A5 JP2001255603 A5 JP 2001255603A5
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laser beam
exposure apparatus
laser
beam exposure
transmissive
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JP2000064713A
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Japanese (ja)
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JP2001255603A (en
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Priority to JP2000064713A priority Critical patent/JP2001255603A/en
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Publication of JP2001255603A5 publication Critical patent/JP2001255603A5/ja
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使用する波長に対して透過性または半透過性である支持体層または感光層を少なくとも１つ有する感光材料に対しレーザ光源からレーザビームを照射し露光するレーザビーム露光装置であって、
前記レーザビームにより照射される１本の走査線または連続した複数本の走査線からなるビーム照射域を１つの線状領域と定義し、隣接する前記線状領域間で、照射するレーザビームの光量分配比率を変えることを特徴とするレーザビーム露光装置。A laser beam exposure apparatus that irradiates a photosensitive material having at least one support layer or photosensitive layer that is transmissive or semi-transmissive to a wavelength to be used by irradiating a laser beam from a laser light source.
A beam irradiation area composed of one scanning line irradiated with the laser beam or a plurality of continuous scanning lines is defined as one linear area, and the amount of laser beam irradiated between the adjacent linear areas A laser beam exposure apparatus characterized by changing a distribution ratio. 前記レーザビームの光量分配比率のパターンが規則的であることを特徴とする請求項１に記載のレーザビーム露光装置。  2. The laser beam exposure apparatus according to claim 1, wherein a pattern of the light amount distribution ratio of the laser beam is regular. 前記レーザビームの光量分配比率のパターンがランダムであることを特徴とする請求項１に記載のレーザビーム露光装置。  2. The laser beam exposure apparatus according to claim 1, wherein a pattern of a light amount distribution ratio of the laser beam is random. 前記レーザ光源は１つであることを特徴とする請求項１，２，３に記載のレーザビーム露光装置。4. The laser beam exposure apparatus according to claim 1, wherein the number of the laser light sources is one. 前記１つのレーザ光源で前記隣接する線状領域間毎に光量分配比率を切り替えて前記感光材料に照射することを特徴とする請求項４に記載のレーザビーム露光装置。5. The laser beam exposure apparatus according to claim 4, wherein the photosensitive material is irradiated with the light quantity distribution ratio switched between the adjacent linear regions with the one laser light source. 前記レーザ光源は複数であることを特徴とする請求項１，２，３に記載のレーザビーム露光装置。4. The laser beam exposure apparatus according to claim 1, wherein a plurality of the laser light sources are provided. 光量分配比率の異なる前記複数のレーザ光源を、前記隣接する線状領域間毎に切り替えて前記感光材料に照射することを特徴とする請求項６に記載のレーザビーム露光装置。7. The laser beam exposure apparatus according to claim 6, wherein the plurality of laser light sources having different light quantity distribution ratios are irradiated to the photosensitive material while switching between the adjacent linear regions. 前記レーザ光源が複数である場合、前記光量分配比率は前記レーザビームが所定の光量以下のときに変えることを特徴とする請求項６に記載のレーザビーム露光装置。The laser beam exposure apparatus according to claim 6, wherein when there are a plurality of laser light sources, the light amount distribution ratio is changed when the laser beam is equal to or smaller than a predetermined light amount. 前記所定光量以下とは、干渉による濃度ムラが視認できる光量レベル以下であることを特徴とする請求項８に記載のレーザビーム露光装置。9. The laser beam exposure apparatus according to claim 8, wherein the predetermined light amount or less is a light amount level or less at which density unevenness due to interference can be visually recognized. 使用する波長に対して透過性または半透過性である支持体層または感光層を少なくとも１つ有する感光材料に対しレーザ光源からレーザビームを照射し露光するレーザビーム露光装置であって、A laser beam exposure apparatus for irradiating a photosensitive material having at least one support layer or a photosensitive layer that is transmissive or semi-transmissive to a wavelength to be used by irradiating a laser beam from a laser light source,
前記レーザビームにより照射される１画素または連続した複数の画素からなるビーム照射域を１つの画素域と定義し、隣接する前記画素域間で、照射するレーザビームの光量分配比率を変えることを特徴とするレーザビーム露光装置。A beam irradiation area composed of one pixel or a plurality of continuous pixels irradiated with the laser beam is defined as one pixel area, and a light quantity distribution ratio of the irradiated laser beam is changed between the adjacent pixel areas. A laser beam exposure apparatus. 使用する波長に対して透過性または半透過性である支持体層または感光層を少なくとも１つ有する感光材料に対しレーザ光源からレーザビームを照射し露光するレーザビーム露光装置であって、A laser beam exposure apparatus for irradiating a photosensitive material having at least one support layer or a photosensitive layer that is transmissive or semi-transmissive to a wavelength to be used by irradiating a laser beam from a laser light source,
前記レーザビームにより照射される１本の走査線または連続した複数本の走査線からなるビーム照射域を１つの線状領域と定義し、隣接する前記線状領域間で、照射を行う前記レーザ光源のレーザ素子の温度を変えることを特徴とするレーザビーム露光装置。The laser light source that defines a beam irradiation area composed of one scanning line irradiated with the laser beam or a plurality of continuous scanning lines as one linear area, and performs irradiation between the adjacent linear areas A laser beam exposure apparatus characterized by changing the temperature of the laser element. 使用する波長に対して透過性または半透過性である支持体層または感光層を少なくとも１つ有する感光材料に対しレーザ光源からレーザビームを照射し露光するレーザビーム露光装置であって、A laser beam exposure apparatus for irradiating a photosensitive material having at least one support layer or a photosensitive layer that is transmissive or semi-transmissive to a wavelength to be used by irradiating a laser beam from a laser light source,
前記レーザビームにより照射される１画素または連続した複数の画素からなるビーム照射域を１つの画素域と定義し、隣接する前記画素域間で、照射を行う前記レーザ光源のレーザ素子の温度を変えることを特徴とするレーザビーム露光装置。A beam irradiation area composed of one pixel or a plurality of continuous pixels irradiated with the laser beam is defined as one pixel area, and the temperature of the laser element of the laser light source that performs irradiation is changed between the adjacent pixel areas. A laser beam exposure apparatus. 使用する波長に対して透過性または半透過性である支持体層または感光層を少なくとも１つ有する感光材料に対しレーザ光源からレーザビームを照射し露光するレーザビーム露光装置であって、A laser beam exposure apparatus for irradiating a photosensitive material having at least one support layer or a photosensitive layer that is transmissive or semi-transmissive to a wavelength to be used by irradiating a laser beam from a laser light source,
前記感光材料が光学的異方性を有する場合、その光学的異方性に応じて、照射レーザビームの偏光状態を制御することを特徴とするレーザビーム露光装置。When the photosensitive material has optical anisotropy, the laser beam exposure apparatus controls the polarization state of the irradiation laser beam according to the optical anisotropy.
JP2000064713A 2000-03-09 2000-03-09 Laser beam exposure device, and method and device for modulating wavelength of laser beam Pending JP2001255603A (en)

Priority Applications (1)

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JP2000064713A JP2001255603A (en) 2000-03-09 2000-03-09 Laser beam exposure device, and method and device for modulating wavelength of laser beam

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JP2000064713A JP2001255603A (en) 2000-03-09 2000-03-09 Laser beam exposure device, and method and device for modulating wavelength of laser beam

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JP2001255603A JP2001255603A (en) 2001-09-21
JP2001255603A5 true JP2001255603A5 (en) 2005-06-16

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JP4500715B2 (en) * 2005-03-16 2010-07-14 富士フイルム株式会社 Method for producing translucent conductive film, translucent conductive film, translucent electromagnetic wave shielding film, and optical filter
JP4862270B2 (en) * 2005-03-24 2012-01-25 富士ゼロックス株式会社 Multi-beam laser emitting unit and image forming apparatus

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