JP2002287325A5 - - Google Patents
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- JP2002287325A5 JP2002287325A5 JP2001091340A JP2001091340A JP2002287325A5 JP 2002287325 A5 JP2002287325 A5 JP 2002287325A5 JP 2001091340 A JP2001091340 A JP 2001091340A JP 2001091340 A JP2001091340 A JP 2001091340A JP 2002287325 A5 JP2002287325 A5 JP 2002287325A5
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- 230000005540 biological transmission Effects 0.000 claims 12
- 238000004519 manufacturing process Methods 0.000 claims 9
- 230000000694 effects Effects 0.000 claims 8
- 239000004973 liquid crystal related substance Substances 0.000 claims 6
- 238000002834 transmittance Methods 0.000 claims 4
- 238000000034 method Methods 0.000 claims 3
- 238000009792 diffusion process Methods 0.000 claims 1
- 238000003384 imaging method Methods 0.000 claims 1
Claims (14)
第一の透過率を有する第一の層と第二の透過率を有する第二の層より構成され、前記第一の層及び第二の層のパターンの組み合わせにより３段階に前記加工媒体の透過量を制御可能な３値マスクであって、
前記第一の層及び第二の層には、前記加工装置、前記被加工体および前記加工媒体の少なくとも何れかによって定まる最小分解能より小さい面積単位のドットのオン・オフの面積比率で前記加工媒体の透過量を制御するような異なるパターンが形成されていることを特徴とする３値マスク。In a mask that is set in a processing apparatus and can control the transmission amount of a processing medium in which processing effects on a workpiece are accumulated,
A first layer having a first transmittance and a second layer having a second transmittance are transmitted through the processing medium in three stages by a combination of the patterns of the first layer and the second layer. A ternary mask with controllable quantity,
In the first layer and the second layer, the processing medium has an on / off area ratio of dots in an area unit smaller than a minimum resolution determined by at least one of the processing apparatus, the workpiece, and the processing medium. A ternary mask characterized in that a different pattern is formed so as to control the amount of transmission.
第一の透過率を有する第一の層から、同様に第ｎの透過率を有する第ｎの層までの複数の層より構成され、前記第一の層から第ｎの層のパターンの組み合わせによりｎ以上の段階に前記加工媒体の透過量を制御可能な多値マスクであって、
前記第一から第ｎまでの各層には、前記加工装置、前記被加工体および前記加工媒体の少なくとも何れかによって定まる最小分解能より小さい面積単位のドットのオン・オフの面積比率で前記加工媒体の透過量を制御するような異なるパターンが形成されていることを特徴とする多値マスク。In a mask that is set in a processing apparatus and can control the transmission amount of a processing medium in which processing effects on a workpiece are accumulated,
It is composed of a plurality of layers from the first layer having the first transmittance to the nth layer having the nth transmittance, and by a combination of patterns of the first layer to the nth layer. a multi-value mask capable of controlling the transmission amount of the processing medium in stages of n or more,
In each of the first to nth layers, the processing medium has a dot on / off area ratio of an area unit smaller than a minimum resolution determined by at least one of the processing apparatus, the workpiece, and the processing medium. A multi-value mask in which different patterns for controlling the amount of transmission are formed.
離散的な複数の段階をもって、あるいは段階なく連続して前記加工媒体の透過量を微小な領域ごとに制御可能な多値マスクであって、
前記加工媒体の透過量をある値Ａからある値Ｂまでの第一の範囲で制御する第一の領域と、ある値Ｃからある値Ｄまでの第二の範囲で制御する第二の領域とより構成される多値マスク。In a mask that is set in a processing apparatus and can control the transmission amount of a processing medium in which processing effects on a workpiece are accumulated,
A multi-value mask capable of controlling the transmission amount of the processing medium for each minute region with a plurality of discrete steps or continuously without steps,
A first region for controlling the permeation amount of the processing medium in a first range from a certain value A to a certain value B, and a second region for controlling in a second range from a certain value C to a certain value D; A multi-value mask composed of
前記加工装置、前記被加工体および前記加工媒体の少なくとも何れかによって定まる最小分解能より小さい面積単位のドットのオン・オフの面積比率で前記加工媒体の透過量を制御するようなパターンである第一の領域と、
前記加工媒体を一様に透過または遮蔽するようなパターンである第二の領域より構成される２値マスク。A binary mask that is set in a processing apparatus and that can control the transmission amount of a processing medium in which processing effects on a workpiece are accumulated in two stages,
The pattern is such that the transmission amount of the processing medium is controlled by the on / off area ratio of dots in an area unit smaller than the minimum resolution determined by at least one of the processing apparatus, the workpiece, and the processing medium. Area of
A binary mask composed of a second region having a pattern that uniformly transmits or shields the processing medium.
Ｐ＜λ／ＮＡ8. The dot pitch P is binary, ternary, or multivalue satisfying the following equation, where the wavelength λ of the light source of the exposure apparatus and the aperture NA of the lens of the imaging system of the exposure apparatus are defined in claim 7. mask.
P <λ / NA
所望の第一の加工を行う前記加工媒体の透過量を、前記加工装置、前記被加工体および前記加工媒体の少なくとも何れかによって定まる最小分解能より小さい面積単位のドットのオン・オフの面積比率に変換し、それらのドットを当該３値マスクの第一の層に形成する工程と、
所望の第二の加工を行う前記加工媒体の透過量を、前記加工装置、前記被加工体および前記加工媒体の少なくとも何れかによって定まる最小分解能より小さい面積単位のドットのオン・オフの面積比率に変換し、それらのドットを当該３値マスクの第二の層に形成する工程とを有する３値マスクの製造方法。A method of manufacturing a ternary mask, which is set in a processing apparatus and capable of controlling the transmission amount of a processing medium in which processing effects on a workpiece are accumulated in three stages,
The permeation amount of the processing medium for performing the desired first processing is set to an on / off area ratio of dots in an area unit smaller than the minimum resolution determined by at least one of the processing apparatus, the workpiece, and the processing medium. Converting and forming the dots in the first layer of the ternary mask;
The permeation amount of the processing medium for performing the desired second processing is set to an on / off area ratio of dots in an area unit smaller than the minimum resolution determined by at least one of the processing apparatus, the workpiece, and the processing medium. Converting and forming the dots in the second layer of the ternary mask.
所望の第ｎの微細加工を行う前記加工媒体の透過量を、前記加工装置、前記被加工体および前記加工媒体の少なくとも何れかによって定まる最小分解能より小さい面積単位のドットのオン・オフの面積比率に変換し、それらのドットを当該多値マスクの第ｎの層に形成する工程を有する多値マスクの製造方法。A manufacturing method of a multi-value mask set in a processing apparatus and capable of controlling the permeation amount of a processing medium in which processing effects on a workpiece are accumulated in multiple stages with discrete steps of n or more,
An on / off area ratio of dots in an area unit smaller than a minimum resolution determined by a permeation amount of the processing medium for performing desired n-th fine processing is determined by at least one of the processing apparatus, the workpiece, and the processing medium. And a method of manufacturing the multi-value mask, which includes the step of forming the dots in the n-th layer of the multi-value mask.
所望の第一の微細加工を行う前記加工媒体の透過量を、 前記加工媒体の透過量をある値Ａからある値Ｂまでの第一の範囲の値に変換し、当該多値マスクに形成する工程と、
所望の第二の微細加工を行う前記加工媒体の透過量を、 前記加工媒体の透過量をある値Ｃからある値Ｄまでの第二の範囲の値に変換し、当該多値マスクに形成する工程に形成する工程とを有する多値マスクの製造方法。Manufacture of a multi-value mask that can be set in a processing apparatus and can control the permeation amount of the processing medium for each minute region continuously in multiple steps or without any step in which the processing effect on the workpiece is accumulated A method,
The permeation amount of the processing medium for performing the desired first fine processing is converted into a value in a first range from a certain value A to a certain value B, and formed on the multi-value mask. Process,
The permeation amount of the processing medium for performing a desired second fine processing is converted into a second range of values from a certain value C to a certain value D to form the multi-value mask. The manufacturing method of a multi-value mask which has the process formed in a process.
所望の第一の微細加工を行う前記加工媒体の透過量を、前記加工装置、前記被加工体および前記加工媒体の少なくとも何れかによって定まる最小分解能より小さい面積単位のドットのオン・オフの面積比率に変換し、それらのドットを当該２値マスクの第一の領域に形成する工程と、
所望の第二の微細加工を行う前記加工媒体の透過量を、 前記加工媒体を一様に透過または遮蔽するようなパターンに変換し、それらのパターンを当該２値マスクの第二の領域に形成する工程とを有する２値マスクの製造方法。A method of manufacturing a binary mask, which is set in a processing apparatus and can control the transmission amount of a processing medium in which processing effects on a workpiece are accumulated in two stages,
The on / off area ratio of dots in an area unit smaller than the minimum resolution determined by at least one of the processing apparatus, the workpiece, and the processing medium, the permeation amount of the processing medium for performing a desired first fine processing And forming the dots in the first region of the binary mask;
The transmission amount of the processing medium for performing desired second fine processing is converted into a pattern that uniformly transmits or shields the processing medium, and these patterns are formed in the second region of the binary mask. A method for manufacturing a binary mask.
請求項１または請求項２または請求項３または請求項４の前記マスクを前記加工装置にセットして前記反射層及びコンタクトホールを形成することを特徴とする液晶ディスプレイの製造方法。A polarizing plate, a liquid crystal layer for turning on / off light in cooperation with the polarizing plate, an electrode for driving the liquid crystal layer, a driving circuit for driving the liquid crystal layer by applying a voltage to the electrode, and incident light from outside In a reflective liquid crystal display having a reflective layer that reflects and illuminates the liquid crystal layer from the inner surface with the reflected light, and a contact hole that penetrates the reflective layer and connects the electrode and the drive circuit,
5. A method of manufacturing a liquid crystal display, comprising: setting the mask according to claim 1 or claim 2 or claim 3 or claim 4 to the processing apparatus to form the reflective layer and the contact hole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001091340A JP3921953B2 (en) | 2001-03-27 | 2001-03-27 | Mask, mask manufacturing method, microstructure manufacturing method, and liquid crystal display manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001091340A JP3921953B2 (en) | 2001-03-27 | 2001-03-27 | Mask, mask manufacturing method, microstructure manufacturing method, and liquid crystal display manufacturing method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002287325A JP2002287325A (en) | 2002-10-03 |
| JP2002287325A5 true JP2002287325A5 (en) | 2005-03-03 |
| JP3921953B2 JP3921953B2 (en) | 2007-05-30 |
Family
ID=18945970
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001091340A Expired - Fee Related JP3921953B2 (en) | 2001-03-27 | 2001-03-27 | Mask, mask manufacturing method, microstructure manufacturing method, and liquid crystal display manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3921953B2 (en) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4515012B2 (en) * | 2002-08-07 | 2010-07-28 | 大日本印刷株式会社 | Pattern data production method and photomask |
| JP5031173B2 (en) * | 2003-03-26 | 2012-09-19 | 大日本印刷株式会社 | IMAGING DEVICE AND METHOD FOR FORMING MICRO LENS IN IMAGING DEVICE |
| JP5200439B2 (en) * | 2006-07-21 | 2013-06-05 | 大日本印刷株式会社 | Manufacturing method of color filter |
| JP5228390B2 (en) * | 2006-07-21 | 2013-07-03 | 大日本印刷株式会社 | Gradation mask |
| JP5673718B2 (en) * | 2006-07-21 | 2015-02-18 | 大日本印刷株式会社 | Gradation mask |
| JP2009237419A (en) * | 2008-03-28 | 2009-10-15 | Hoya Corp | Multi-gradation photomask, manufacturing method thereof, and pattern transfer method |
| JP2010020146A (en) * | 2008-07-11 | 2010-01-28 | Fujifilm Corp | Color filter, manufacturing method therefor, and liquid crystal display device |
| JP5510865B2 (en) * | 2009-03-25 | 2014-06-04 | 住友化学株式会社 | Anti-glare treatment method, anti-glare film manufacturing method and mold manufacturing method |
| JP5671788B2 (en) * | 2009-07-13 | 2015-02-18 | 凸版印刷株式会社 | Photomask for color filter substrate and color filter substrate |
| CN102054279A (en) * | 2009-11-02 | 2011-05-11 | 住友化学株式会社 | Generating method of random patterns |
| JP2011118328A (en) * | 2009-11-02 | 2011-06-16 | Sumitomo Chemical Co Ltd | Method for forming random pattern |
-
2001
- 2001-03-27 JP JP2001091340A patent/JP3921953B2/en not_active Expired - Fee Related
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