JP2001244313A - Transportation method and transportation apparatus, and exposure method and aligner - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method and an apparatus for stably transporting each mask (substrate) of various sizes, and to provide an exposure method and an aligner employing such method and apparatus. SOLUTION: The aligner S comprises a dimension detecting system R for detecting the size of a mask M in a mask case 11, a transportation apparatus H for transporting this mask M to a discrimination part A, and a control part 9 for instructing to transport the M to a projection exposure part E after positioning the mask M in the discrimination part A based on the size of the mask M and carrying out the predetermined treatment. A transportation apparatus H transports stably in response to the dimension of the mask M, because the dimension of the mask M is detected before transportation.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transfer method and a transfer apparatus for transferring a substrate (mask) used in the manufacture of a device for liquid crystal display, and to an exposure method and an exposure apparatus.

[0002]

2. Description of the Related Art Various types of exposure apparatuses have been used for manufacturing a liquid crystal display element, a semiconductor element, a thin film magnetic head, and the like by a photolithography process. An exposure apparatus that projects an image of the formed pattern onto each exposure area (shot area) on a substrate having a surface coated with a photosensitive agent such as a photoresist through a projection optical system is generally used.

[0003] Such an exposure apparatus is usually designed to correspond to a mask of a certain size (dimension). That is, the size of the mask to be used is determined for each exposure apparatus.

[0004]

In this case, workability and productivity are improved by making one exposure apparatus compatible with masks of various sizes. For example, as an example, as shown in FIG. 15A, when the exposure apparatus supports only one mask M, one substrate W
In order to form a predetermined pattern, the number of exposures is four. However, as shown in FIG. 15B, by making the exposure apparatus compatible with masks M of a plurality of sizes,
The number of exposures can be suppressed to two.

However, the conventional exposure apparatus, the conventional mask case for accommodating the mask M, or the transport apparatus for transporting the mask M from the mask case to the exposure apparatus do not support a plurality of masks M having different sizes. Predetermined processing cannot be performed stably.

The present invention has been made in view of such circumstances, and has a transfer method and a transfer device capable of stably transferring respective masks (substrates) having various sizes, and a transfer device and a transfer method. An exposure method and an exposure apparatus are provided.

[0007]

In order to solve the above-mentioned problems, the present invention employs the following configuration corresponding to FIGS. 1 to 16 shown in the embodiment. The transport method of the present invention,
Plural substrates (M) stored in storage containers (11, 12)
At least one substrate (M) is positioned at a predetermined position (A, 1
7) In the transport method for transporting the container (11,
12), the size of the substrate (M) accommodated in the substrate (M) is detected, and based on the detection result, it is determined whether or not the substrate (M) is the specified size. ) Is taken out of the storage containers (11, 12),
7) is transported.

According to the present invention, since the substrate (M) is conveyed after its size is detected in the storage containers (11, 12), a plurality of substrates (M) stored in the storage containers (11, 12) are transported. Even if (M) has various sizes, a desired substrate (W) can be reliably taken out of the storage containers (11, 12), and the size of the substrate (M) can be reduced. Can be performed in accordance with the transfer operation.

In this case, according to the size of the substrate (M),
By performing positioning at the predetermined position (A), processing at the predetermined position (A) is performed accurately and stably.

The transfer device of the present invention comprises a storage container (11, 1).
At least one of the plurality of substrates (M) accommodated in 2)
In a transfer device (H) for transferring one substrate (M) to a predetermined position (A), a dimension detection system (R) for detecting the size of the substrate (W) in the storage containers (11, 12); M) is determined based on the transport system (H, 13) that takes out the storage container (11, 12) from the storage container (11, 12) and the detection result of the dimension detection system (R), and determines whether the substrate (M) is the specified size. The control system (C, C) instructs the transport system (H, 13) to transport the substrate (M) determined to have the size from the storage container (11, 12) to the predetermined position (A, 17). 9).

According to the present invention, the size of the substrate (M) is detected by the dimension detection system (R) before being transported by the transport system (H, 13).
Even if the plurality of substrates (M) housed in the (1, 12) have various sizes, the transfer system (H, 1)
3) a desired substrate (W) from the container (11, 12)
Can be reliably taken out. Further, by detecting the size of the substrate (M) before the transfer, the transfer system (H, 13) performs setting according to the size of the substrate (M) by the control system (C, 9). Therefore, the substrate (M) is stably transported.

In this case, since the control system (C, 9) positions the substrate (M) at the predetermined position (A) according to the size of the substrate (M), the processing at the predetermined position (A) is accurate. And it is performed stably.

According to the exposure method of the present invention, the container (11, 1)
The mask (M) housed in 2) is transported on the optical path of the exposure light (EL), and the image of the pattern (PA) formed on the mask (M) by the exposure light (EL) is placed on the substrate (W). In the exposure method for transferring, the size of the mask (M) stored in the storage container (11, 12) is detected, and the mask (M) is placed in the storage container (11) according to the detected size of the mask (M). , 12), is transported to a predetermined position (A), is positioned at a predetermined position (A) according to the size of the mask (M), and is subjected to predetermined processing at the predetermined position (A). It is characterized in that the mask (M) is transported on the optical path and exposed.

According to the present invention, since the size of the mask (M) is detected before the transfer, the transfer operation according to the size of the mask (M) can be performed. Then, by performing positioning at the predetermined position (A) according to the size of the mask (M), processing at the predetermined position (A) is performed accurately and stably. The mask (M) is stably exposed after being subjected to a predetermined process, so that productivity and workability are improved.

Further, it is determined whether or not the mask (M) is of a specified size based on the detection result, and the mask (M) determined to be of the specified size is taken out of the storage containers (11, 12). Since only the mask (M) having a desired size can be reliably taken out of the storage containers (11, 12), efficient processing can be performed.

The exposure apparatus of the present invention comprises a container (11, 1).
The mask (M) housed in 2) is transported on the optical path of the exposure light (EL), and the image of the pattern (PA) formed on the mask (M) by the exposure light (EL) is placed on the substrate (W). In the exposure apparatus (E, S) for transferring, the storage containers (11, 1
2) A dimension detection system (R) for detecting the size of the mask (M) in the container, and a transport system (H, 1) for removing the mask (M) from the storage containers (11, 12) and transporting the mask (M) to a predetermined position (A).
3) and positioning of the mask (M) at the predetermined position (A) based on the detection result of the dimension detection system (R), and after performing predetermined processing at the predetermined position (A), the mask (M) And a control system (C, 9) for instructing the conveyance system (H) to convey the light onto the optical path.

According to the present invention, since the size of the mask (M) is detected by the dimension detection system (R) before transport, the transport system (H, 13) determines the size of the mask (M). Is set by the control system (C, 9), and then the mask (M) is transported. And the control system (C, 9)
By performing positioning at the predetermined position (A) according to the size of the mask (M), processing at the predetermined position (A) is performed accurately and stably. Since the mask (M) is subjected to an exposure process after being stably subjected to a predetermined process,
Exposure processing is performed stably, and productivity and workability are improved.

A positioning member (20) for positioning the mask (M) at a predetermined position is provided in the storage container (11) in a predetermined positional relationship.
0) can be attached to any position,
Storage container (11) for masks (M) having various sizes
Can be stably accommodated.

[0019]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a transport method and a transport apparatus, an exposure method and an exposure apparatus according to a first embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a schematic configuration diagram for explaining an entire exposure apparatus provided with the transport device of the present invention. FIG. 2 is a configuration diagram illustrating a storage container (mask case) that stores the mask M, and FIG. 3 is a plan view illustrating a processing unit (identification unit). further,
FIG. 4 is a configuration diagram for explaining an exposure apparatus (projection exposure unit), and FIG. 5 is a diagram for explaining a control system for controlling the entire exposure apparatus S. The exposure apparatus S illuminates a mask M with illumination light for exposure (exposure light) EL, and transfers an image of a pattern of the mask M onto a substrate (wafer) W via a projection optical system 120. .

In these figures, an exposure apparatus S includes a storage container (mask case) 11 for individually storing a plurality of masks M used at the time of exposure, and a plurality of masks M stored in the mask case 11. A library (storage section) 12 for storing, a transfer arm 13 for taking out the mask M from the mask case 11 in the library 12, and a mask M taken out by the transfer arm 13 are received from the transfer arm 13 at a position CA1. The carrier M is provided movably between the position CA1 and the position CA2, and the mask M is received from the carrier 14 moved to the position CA2 and transported to the mask stage 17 provided in the exposure apparatus main body (projection exposure unit) E. Load arm 15 and the mask M after the exposure process
The exposure apparatus S includes an unload arm 16 for taking out the exposure apparatus 7 and a control unit 9 for controlling the operation of the entire exposure apparatus S.

The transfer arm 13, the carrier 14, the load arm 15 and the unload arm 16 move the mask M from the mask case 11 to the projection exposure section E.
A transport device (transport path) H for transporting to the mask stage 17 is formed. The exposure apparatus S is housed inside an air conditioning chamber set at a predetermined temperature.

The mask M is formed of a plane quadrangular glass substrate. A pattern PA formed in the center of the glass substrate and a bar code (bar code) formed at a predetermined position on a part of the surface of the glass substrate are formed. Identifier B). The bar code B stores various information related to the exposure process such as information on the pattern PA formed on each mask M.

The pattern PA is formed so as to occupy most of the area in the center of the mask M, and the bar code B is formed in a margin at the periphery of the pattern PA. The barcode B and the pattern PA are formed of the same material such as chrome.

At a predetermined position of the transport path H, a processing section A for performing a predetermined process on the mask M is provided.
The processing unit A in the present embodiment serves as an identification unit A for reading a barcode B provided on the mask M and identifying each mask M based on the information of the barcode B.

The library 12 stores a plurality of masks M individually stored in the mask case 11.
At this time, the masks M are individually housed in the mask case 11 in FIG. 1 (or in FIG. 2) so as to be parallel to the XY plane, and the plurality of mask cases 11 individually housing the masks M are provided. Are arranged in the library 12 so as to be stacked in a plurality of stages in the Z direction. That is, the mask M used at the time of exposure is stored in the library 12 while being stored in the mask case 11. The mask case 11 containing the mask M is opened by opening a front door T provided in a part of the air conditioning chamber.
In each slot.

In this case, the mask case 11 is transported by the operator and loaded from the front door T.
It is also possible to convey by another conveyance mechanism, an automatic conveyance vehicle (AGV), or the like.

An operation display unit having a keyboard and a monitor is provided outside the air-conditioning chamber. The operation display unit allows the operation of the control unit 9 and the desired mask M
Can be selected and registered. By operating this operation display unit, one of the masks M to be used at the time of exposure is set in advance among the masks M individually stored in the mask case 11 and filled in the library 12.
Are specified.

The transfer arm 13 which is a part of the transfer device H
Takes out a mask M to be used at the time of exposure from a predetermined mask case 11 out of a plurality of mask cases 11 arranged in a library 12 and a mask to be used in an exposure step and returned to the mask case 11. M is accommodated in the mask case 11, and is provided so as to be movable in the Y and Z directions in FIG. That is, the transfer arm 13 is
Movably supported by the Y-axis guide portion 13a so as to approach / separate from the mask case 11, and movably supported by the Z-axis guide portion 13b along the arrangement direction of the mask cases 11, and designated in advance. The mask case 11 can be entered.

The transfer arm 13 has a vacuum suction hole, and can hold and release masks M having various sizes by turning on and off a connected vacuum pump (not shown). I have. Therefore, the transfer arm 13 can take out the desired mask M by entering the designated mask case 11 and can accommodate the mask M to be returned to the mask case 11 in the designated mask case 11. I have.

When the mask M used at the time of exposure is transported to the projection exposure section E, the transport arm 13 sucks the mask M in the reticle case 11 and takes it out in the Y direction. The sheet is conveyed to CA1 and transferred to the carrier 14 at this position CA1. The carrier 14 is provided movably between the position CA1 and the position CA2 while being supported by the carrier guide portion 14a.
It is provided movably in the Z direction together with 4a. That is, the carrier 14 is provided so as to be movable in the X and Z directions in FIG. The carrier 14 has a vacuum suction hole on the lower surface, and is connected to a ON / OFF of a connected vacuum pump (not shown).
Holds masks M of various sizes by turning OFF
It can be released. And carrier 14
Is configured to receive the mask M from the transfer arm 13 at the position CA1, and then transfer the mask M to the position CA2.

The carrier 14 is provided with a mechanism (not shown) for pre-aligning the mask M by sandwiching the mask M from two directions on the basis of the four sides. To be transported. The carrier 14 receives from the unload arm 16 the mask M to be used in the exposure process and to be returned to the mask case 11, and receives the position CA1.
At the transfer arm 13.

Load arm 15 and unload arm 1
Reference numeral 6 is provided so as to be movable in the Y direction and the Z direction in FIG. The load arm 15 and the unload arm 16 are provided so as to be individually movable in the Y direction between the position CA2 and the mask stage 17, and are integrally supported in the Z direction while being supported by the Z-axis guide portion 15a. It is movable. The load arm 15 receives the mask M used at the time of exposure at the position CA2 from the carrier 14. On the other hand, unload arm 16
Receives from the mask stage 17 a mask M to be used in the exposure step and to be returned to the mask case 11,
The data is transferred to the carrier 14 at the position CA2. These load arm 15 and unload arm 16
Is provided with a vacuum suction hole for holding the mask M in the same manner as the transfer arm 13, and the ON / OFF of the connected vacuum pump
By turning off, the mask M having various sizes can be freely held and released by suction.

The mask M used at the time of exposure is
In the middle of the transfer device H for transferring the mask M to the mask stage 17, the bar code B provided on a part of the surface of the mask M is read while the mask M is held, whereby the individual masks are read. An identification unit (processing unit) A for identifying M is provided at a predetermined position.

The discriminating section A is provided at a position where the load arm 15 that has received the mask M used at the time of exposure at the position CA2 is on the way to the mask stage 17, and the bar of the mask M held by the load arm 15 is A bar code reader 3 for reading the code B is provided. That is, the transport device H transports at least one of the plurality of masks M stored in the mask case 11 stored in the library 12 to the identification unit A provided at a predetermined position.

The bar code reader 3 is constituted by a laser bar code reader having a light projecting part and a light receiving part.

Next, the exposure apparatus main body (projection exposure section) E will be described with reference to FIG. As shown in FIG. 4, the projection exposure unit E includes an illumination optical system 150 that illuminates a light beam from a light source 153 onto a mask M held by a mask stage 17, and an illumination light for exposure that is arranged in the illumination optical system 150. (Exposure light) A blind portion 140 that regulates the area of the opening K through which the EL passes and defines the illumination range of the mask M by the exposure light EL, and the mask M illuminated by the exposure light EL
Optical system 120 that projects the image of the pattern on substrate W
, A substrate holder 132 for holding the substrate W, and a substrate stage 19 for supporting the substrate holder 132.

The illumination optical system 150 includes, for example, a light source 153 such as a mercury lamp, an elliptical mirror 154 that collects exposure light emitted from the light source 153, and converts the collected exposure light into a substantially parallel light flux. Input lens 155, a light beam output from the input lens 155, a fly-eye lens 156 for forming a large number of two-dimensional light sources on the rear (mask M side) focal plane upon incidence, and emitted from these two-dimensional light sources. And a condenser lens system for condensing the exposure light and illuminating the mask M with uniform illuminance.

The light source 153 has, for example, an oscillation wavelength of 1
It is also possible to use a 57 nm fluorine laser (F2 laser), a krypton dimer laser (Kr2 laser) having an oscillation wavelength of 146 nm, and an argon dimer laser (Ar2 laser) having an oscillation wavelength of 126 nm. The light source 153 has an oscillation wavelength of 193 nm.
It is also possible to use an ArF laser excimer laser or the like.

The blind part 140 includes, for example, a pair of blades 145A and 145B which are bent into a plane L shape and are combined in a plane orthogonal to the optical axis AX of the exposure light EL to form a rectangular opening K. These blades 1
45A and 145B are controlled by the optical axis
Light-shielding unit displacement device 143A for displacing in a plane orthogonal to
143B. This movable blade 145A,
A fixed blind 146 having a fixed opening shape is arranged near 145B. Fixed blind 146
Is a field stop that surrounds a rectangular opening with, for example, four knife edges, and the width of the rectangular opening in the vertical direction is defined by the blades 145A and 145B. At this time, the size of the opening K is
The aperture K changes with the displacement of A and 145B, and the aperture K sends only the passed exposure light EL out of the exposure light EL incident from the fly-eye lens 156 to the main condenser lens 152 via the reflection mirror 151. The exposure light EL defined by the opening K illuminates a specific area (pattern area) PA of the mask M held on the mask stage 17 via the main condenser lens 152 with substantially uniform illuminance.
These optical members and the blind portion 140 are arranged in a predetermined positional relationship, and the blind portion 140 is arranged on a surface conjugate to the pattern surface of the mask M.

The mask stage 17 provided in the projection exposure section E is for mounting a mask M used at the time of exposure, and is provided with a pattern PA formed on the mask M.
Is transferred to the substrate W mounted on the substrate stage 19 through the projection optical system 120.

The mask stage 17 has vacuum suction portions 112 at four corners on the upper surface thereof, and the mask M is held on the mask stage 17 via the vacuum suction portions 112. The mask stage 17 can hold a mask M having a different size, has an opening (not shown) corresponding to a pattern area PA in which a pattern on the mask M is formed, and The drive mechanism enables fine movement in the X direction, the Y direction, and the θ direction (rotation direction around the Z axis). The drive mechanism of the mask stage 17 is composed of, for example, two sets of voice coil motors, and is driven based on an instruction from the control unit 9. Control unit 9
The center of the pattern area PA (mask center) is moved by moving the mask stage 17 so that the projection optical system 1
The mask M is positioned so as to pass through the 20 optical axes AX.

The projection optical system 120 forms an image of the pattern PA existing in the illumination range of the mask M defined by the opening K by the exposure light EL on the substrate W, and forms the pattern PA in a specific area (shot area) of the substrate W. The PA image is exposed. The projection optical system 120 is obtained by sealing a plurality of optical members such as a lens and a reflector made of a fluoride crystal such as fluorite or lithium fluoride with a projection system housing.

The substrate stage 19 comprises a substrate table 131 on which a substrate holder 132 is mounted,
XY supporting movably in the two-dimensional direction of the XY plane
A stage device 133 is provided. In this case, the optical axis AX of the projection optical system 120 coincides with the Z direction orthogonal to the XY plane. That is, the XY plane is orthogonal to the optical axis AX of the projection optical system 120. Substrate stage 19
The substrate W transferred to the upper substrate holder 132 is vacuum-sucked by the substrate holder 132.

The substrate holder 132 holds the substrate stage 19
It is supported by. The substrate stage 19 is a stack of a pair of blocks movable in directions orthogonal to each other, and is movable in a horizontal direction along the XY plane. Alternatively, a wafer drive system (not shown) including, for example, a magnetic levitation type two-dimensional linear motor (plane motor) or the like is provided along the upper surface of the base and in a non-contact XY manner.
It is designed to be driven freely in the plane. That is,
The substrate W fixed to the substrate stage 19 is movably supported in the horizontal direction along the XY plane (in the direction perpendicular to the optical axis AX of the projection optical system 120). The substrate W is coated on the surface (exposure processing surface) by a coater.
Is applied onto the substrate stage 19 by a transport mechanism (not shown).

The position of the substrate stage 19 in the X and Y directions is adjusted by a laser interference system. The X position of the substrate W is determined by the X moving mirror 136X and the X-axis laser interferometer 137X. Similarly, although not shown, the Y position of the substrate W is determined by the Y moving mirror and the Y-axis laser interferometer.
The position is detected. The position information of the substrate W in the XY directions based on the detected values (measured values) of the laser interferometers of the X axis and the Y axis are sent to the control unit 9.

On the other hand, the position in the Z direction of the substrate W arranged in the projection area of the projection optical system 120 is a multi-point focus position detection system (not shown) which is one of the oblique incidence type focus detection systems.
Is detected by This detection value, that is, Z of the substrate W
The position information of the direction is sent to the control unit 9.

The controller 9 monitors the positional information of the substrate W in the XY and Z directions obtained by the laser interference system and the multi-point focus position detecting system, and via the substrate stage driving device 121 as a driving system. The XY stage device 133 and the substrate table 131 are driven so that the mask M
The XY direction, the Z direction, and the tilt direction of the substrate W such that the pattern surface of the substrate W and the surface of the substrate W are conjugate with respect to the projection optical system 120, and the imaging plane of the projection optical system 120 coincides with the substrate W. Is performed. When the pattern area PA of the mask M is illuminated by the exposure light EL emitted from the illumination optical system 150 with substantially uniform illuminance in the state where the positioning is performed in this manner, the image of the pattern PA of the mask M is projected. An image is formed on a substrate W having a surface coated with a photoresist through 120.

Next, the storage container (mask case) 11 will be described with reference to FIG. A plurality of masks M having different sizes (areas) are individually stored in the respective mask cases 11 stored in the library 12. These masks M have dimensions set in advance according to the size of the substrate W to be exposed and the pattern to be formed.

As shown in FIG. 6, inside the mask case 11, there are provided positioning members (positioning pins) 20 which are arranged in a predetermined positional relationship and position the mask M to be processed at the reference position J. I have. This positioning pin 2
0 is installed so as to extend upward (Z direction) from the bottom of the mask case 11 by fitting into a hole 20a provided at a predetermined position in the bottom of the mask case 11.

At this time, the positioning pins 20 are installed so as to come into contact with respective corners of the mask M housed in the mask case 11, and in this embodiment,
A total of eight are provided, two at each corner. The movement of the mask M in the horizontal direction (X-Y direction) is restricted by the positioning pins 20.

As shown in FIG. 7, the positioning pin 20 can be attached to an arbitrary position according to the size of the mask M to be housed. That is, the positioning pin 2
A plurality of holes 20a for fitting 0 are provided in advance. Depending on the size of the mask M to be accommodated, the holes 20a to be used are so positioned that the positioning pins 20 abut the ends of the mask M. Selected. The positioning pins 20 are attached according to the size of the mask M when the mask M is accommodated in the mask case 11.

It should be noted that the size of the mask M is not changed steplessly and is preset in plural types (for example, about three types).
Can be determined by the holes 20a provided in advance.

Thus, the mounting position of the positioning pin 20 is set according to the size of the mask M, and the mask M in the mask case 11 is positioned with respect to the reference position J by the positioning pin 20.

At this time, the reference position J for positioning is determined by referring to FIG.
As shown in (a), each mask M can be set at the center position (centroid) in plan view. Alternatively, FIG.
As shown in (b), it can be set to the outer shape reference position (the position of a certain side) of the mask M. Thus, the mask M to be processed is positioned with respect to the reference position J by the positioning pins 20.

On the other hand, a detecting portion (displacement sensor) 21 for detecting at least one position N of the end of the mask M housed in the mask case 11 is provided at the tip of the transfer arm 13.
Is provided. The displacement sensor 21 is provided at a position facing the end of the mask M when the transfer arm 13 takes out the mask M from the mask case 11, and can detect the distance to the end position N of the mask M. ing.

The displacement sensor 21 may be any sensor that can detect the distance between the position of the transfer arm 13 (position where the displacement sensor is attached) and the position N to be detected (the end position of the mask M). Sensors and eddy current sensors can be used. In this case, since the laser displacement sensor can measure from the position where the end position N of the mask M is separated, the detection time can be short, and the detection can be performed while moving the transfer arm 13. It is suitable.

The detection signal of the displacement sensor 21 is sent to the control unit 9. That is, at least one position N at the end of the mask M positioned at the reference position N
Is transmitted to the control unit 9.

The control unit 9 has a mask case 1 in advance.
The information on the reference position J of the mask M accommodated in 1 is stored. That is, the control unit 9 stores information on the arrangement of the positioning pins 20 in advance.

Next, the transfer device H having the above-described configuration
The operation of the exposure apparatus S provided with is described. In performing the exposure processing, first, a mask case 11 containing a mask M having a predetermined size (dimension) is loaded into each slot of the library 12 from the front door T. Each mask case 11 accommodates a substrate W and masks M having various sizes according to a pattern to be formed on the substrate W. The size of the mask M is set in advance, and information on the size of the mask M is stored in the control unit 9 in advance. That is, the type of the mask M to be used (the type of the mask M loaded in the library 12) is known in advance, and the control unit 9 previously stores a plurality of data relating to the size of the mask M.

The control unit 9 instructs the transfer arm 13 of the transfer device H to take out the mask M from the predetermined mask case 11 based on the operation of the operation display unit described above. The transfer arm 13 approaches the designated mask case 11. In this case, the order in which the transfer arms 13 access the plurality of mask cases 11 can be set based on data on the order stored in the control unit 9 in advance, without operating the operation display unit. is there.

When the transfer arm 13 approaches the mask M,
The control unit 9 detects the position N of the end of the mask M by the displacement sensor 21 provided at the tip of the transfer arm 13.
In this case, the end position N of the mask M may be detected when the transfer arm 13 and the mask M have reached a predetermined distance, or the position may be detected while moving the transfer arm 13.

The detection signal of the displacement sensor 21 is sent to the control unit 9. The control unit 9 stores information about the reference position J of the mask M housed in the mask case 11 in advance, and the control unit 9 stores the information about the reference position J, the detection result of the displacement sensor 21, Based on the mask M
Is calculated. That is, the control unit 9 sets the mask M
Of the mask M is obtained by calculating the end position N and the reference position J, and calculating the distance between the end position and the reference position.

As described above, the positioning member (positioning pin) 20 which is arranged in the mask case 11 in a predetermined positional relationship and positions the mask M at the reference position J, and detects at least one position of the end of the mask M Detection system (displacement sensor) 21 and a calculation system (control unit) 9 for calculating the size of the mask M based on the detection result of the displacement sensor 21, a dimension detection system for detecting the size (dimension) of the mask M R
Is composed.

At this time, the control unit 9 sets the detected mask M
The center position (centroid) of the mask M can also be obtained based on the size of the mask M and the reference position J.

The control section 9 determines whether or not the detected mask M has a specified size. If it determines that the detected size is the specified size, the control section 9 determines that the mask M is a mask M to be conveyed. The transfer arm 13 is instructed to take out the mask M from the mask case 11. The transfer arm 13 further approaches the mask case 11 along the Y-axis guide portion 13a and is inserted on the lower surface side of the mask M, and enters the mask case 11 by a predetermined distance based on an instruction from the control portion 9. At this time, a pellicle frame PW having a pellicle for preventing foreign matter from adhering to the pattern PA is mounted on the mask M. Therefore, the transfer arm 13 supports the portion other than the pellicle frame PW so as to scoop from below.

In this case, the predetermined distance at which the transfer arm 13 enters the mask case 11 is instructed by the control section 9 according to the size of the mask M, and the transfer arm 13 stabilizes the mask M. It is set to be supportable.

That is, the transfer arm 13 enters the mask case 11 so as not to interfere with each member including the mask case 11 and so as to stably support the mask M. For example, when the mask M is large, the transfer arm 13 enters the back so as not to interfere with the case 11. When the mask M is small, the mask M enters only a short distance enough to stably support the mask M. Transfer arm 1 when mask M is small
By setting the moving distance of 3 short, the work time for carrying (moving time of the transfer arm 13) can be shortened, and the workability is improved.

In this case, the control section 9 previously stores information on the moving distance of the transfer arm 13 for stably supporting the mask M having each size.
That is, since the type of the mask M loaded in the library 12 is known in advance, the optimum approach distance of the transfer arm 13 according to the size of the mask M can be set in advance.

As described above, the control unit 9 controls the mask case 1 of the transfer arm 13 based on the detection result of the dimension detection system R.
A distance (moving distance) into the inside of the vehicle 1 is obtained, and an instruction is given to the transfer arm 13 based on the obtained value.

The transfer arm 13 supporting the mask M is moved away from the mask case 11 so as to be separated from the Y-axis guide portion 13a.
And the mask M is taken out of the mask case 11. Next, in order to transfer the mask M to the carrier 14, the transfer arm 13a moves along the Z-axis guide portion 13b.
It moves (rises) in the Z direction, and passes the mask M to the carrier 14 at the position CA1. The mask M held by the carrier 14 is transported from the position CA1 to the position CA2, and is transferred to the load arm 15 at the position CA2.

The load arm 15 holding the mask M is
The mask M is transported to the identification unit A. Load arm 15
Performs the positioning of the mask M based on the instruction of the control unit 9 such that the barcode B is arranged at a position where the barcode reader 3 can read the barcode B. This positioning is performed based on information on the size of the mask M detected by the dimension detection system R.

At this time, in addition to adjusting the position of the load arm 15, a drive mechanism (not shown) may be provided in the bar code reader 3 to perform positioning by moving the bar code reader 3. That is, the transport device H
The positioning is performed by relatively moving the load arm 15 and the barcode reader 3.

When the mask M is arranged at a predetermined position by the load arm 15, the control unit 9 causes the light projecting unit of the bar code reader 3 to emit light toward the area where the bar code B of the mask M is formed. Instruct to emit. The projected light irradiates a region including the bar code B in the mask M, and the reflected light from the bar code B is received by a light receiving unit of the bar code reader 3. When taking out the mask M from the mask case 11, by detecting the size of the mask M in advance, the reading operation of the barcode B is performed stably.

That is, masks M having various sizes
Is transported by the transport device H, but the position at which the barcode B is formed changes due to the difference in the size of the mask M. At this time, if the identification unit A does not perform positioning according to the size of the mask M, the barcode reader 3 may not be able to stably emit the projected light to the barcode B portion. However, the size of the mask M is detected in advance, and based on the detection result, the control unit 9 loads the barcode B formed on the mask M so that the barcode B is arranged at a position where the barcode reader 3 can read the barcode. Arm 1
By controlling 5, the bar code B can be read stably.

The bar code information read by the bar code reader 3 is analyzed by the analysis unit 90, and the result of the analysis is sent to the control unit 9. The control unit 9 controls the bar code B
Then, it is determined whether or not the mask M is specified in advance.

When determining that the mask M is the designated one, the control unit 9 instructs the load arm 15 to transfer the mask M to the mask stage 17. The mask M is pre-aligned with the mask stage 17 before being transferred to the mask stage 17.

The load arm 15 also performs positioning based on the size of the mask M detected by the dimension detection system R when loading the mask M onto the mask stage 17 of the projection exposure section E. Then, after the mask M placed on the mask stage 17 is aligned, the mask M is illuminated with exposure light EL, and the image of the pattern PA is transferred to the substrate W of the substrate stage 19 placed on the mask M. Although the embodiment in which the load arm 15 is used to load the mask stage 17 has been described, the position of CA2 may be above the mask stage 17 and the carrier M may be further vertically moved to place the mask M thereon. Good.

In this way, the positioning in the processing section A is performed in accordance with the size of the mask M, and after reading the bar code B, which is a predetermined processing in the processing section A,
The mask M is transported on the optical path of the exposure light EL, and exposure processing is performed.

On the other hand, when it is determined that the mask M is not the specified size based on the detection result of the dimension detection system R at the time of removing the mask M from the mask case 11, the control unit 9
Instructs the transfer arm 13 to access another mask case 11 without taking out the mask M from the mask case 11 accessed at this time. Then, it instructs the dimension detection system R to detect the size of the mask M accommodated in the mask case 11. When it is determined that the mask M has the specified size, the control unit 9 instructs the transfer arm 13 to remove the mask M from the mask case 11. Then, in a process similar to the above-described process, the mask M is transported to the identification unit A by the transport device H, and a predetermined process is performed. The order in which the transfer arm 13 accesses the plurality of mask cases 11 can be arbitrarily set, for example, from the top of the mask cases 11 housed in the library 12 in FIG. 1 (FIG. 2). it can.

Alternatively, for example, a display device provided outside the apparatus is driven without allowing the transfer arm 13 to access another mask case 11, and an operator is notified that the mask M is not the designated size. It is also possible.

If the discriminating section A determines that the mask M is not the desired one, the control section 9 sends the discrimination information to the unload arm 16 to return the mask M to the mask case 11 of the library 12. From part A to mask M
To receive The mask M held by the unload arm 16 moves the carrier 14 at the position CA2.
Is transferred to the position CA1 and the transfer arm 1
3 and stored in the mask case 11. When it is determined that the mask M is not the desired one,
A transport path for returning the mask M to the mask case 11 is configured by, for example, a transport mechanism provided in a separate system without using the transport apparatus H (that is, regardless of the transport path used at the time of loading). Is also good. Further, the mask M that has not been identified as a desired one can of course be stored in another storage unit without being returned to the mask case 11 of the library 12.

The mask M, which has been subjected to the exposure process in the projection exposure section E, is sucked and held by the unload arm 16 on the mask stage 17, and is moved to the position CA2 by being moved in the Y direction. The mask M transported to the position CA2 is the carrier 1 waiting at this position CA2.
4 and is transported by this carrier 14 to the position CA1. Then, the mask M transported to the position CA1
Is transferred to the transfer arm 13 waiting at the position CA1, and is stored in the mask case 11 designated by the transfer arm 13.

Note that, even when the mask M after the exposure step is returned to the mask case 11 of the library 12, it can be transported by a transport mechanism of another system without using the transport device H. Further, the mask M can of course be stored in another storage portion without being returned to the mask case 11. Further, the identification unit A may be provided at a position adjacent to the transfer arm 13 so as to be read when the identification unit A is taken out of the mask case 11.

As described above, the provision of the dimension detection system R for detecting the size of the mask M in the transfer device H allows the mask M to be accurately positioned at the identification section A before the bar code B is transferred. Read. At this time, since the barcode B contains various information on the mask M, the mask M is transported to the projection exposure unit E after the mask M is correctly identified by the identification unit A. That is, by detecting the size of the mask M before transporting the mask M, the predetermined processing in the processing unit can be stably performed.

Then, since the mask M is subjected to a predetermined process in the identification unit A and then conveyed to the projection exposure unit E, the exposure process is performed stably, and the productivity is improved.

Further, various information on the position such as the center position (center of gravity) of the mask M can be obtained, and the positioning with respect to the mask stage 17 can be stably performed.
Stable exposure processing can be performed.

Since the sizes (dimensions) of the masks M having various sizes are detected before the transfer, the transfer device H stabilizes the transfer operation according to the size of the mask M. You can do it.

Further, since the dimension detection of the mask M is performed in a non-contact manner using an optical sensor, it is possible to prevent the generation of dust in the dimension detection step.

The predetermined processing in the processing section A is not limited to the identification of the bar code B. For example, a dust detection device that detects foreign matter (dust) attached to the mask M can be installed in the processing unit A. At this time, the mask M
By detecting the size in advance, it is possible to perform an efficient process such that the start position of dust detection can be accurately set. Also in this case, for example, when it is determined that the mask M cannot perform an appropriate exposure process, the control unit 9 returns the mask M to the mask case 11 by the transport device H, or removes the dust by the dust removing device. Or work to remove it.

By the way, as shown in FIG. 8, the transfer arm 13 is a telescopic robot arm 130 having joints.
May be configured. The robot arm (transfer arm) 130 is provided with a vacuum suction hole for sucking and holding the mask M, and is provided so as to suck and hold and release the mask M by driving and stopping a connected vacuum pump. . Further, the transfer arm 130 is supported so as to be pivotable with respect to the base end 130a. And the mask M
According to the detection result of the size of the mask M, the mask M may enter the mask case 11 so as to maintain the substantially center position (centroid). At this time, the transfer arm 1
An encoder 24 for generating a pulse according to the movement of the arm (or expansion and contraction of the arm) is provided at 30, and a counter 25 for counting the encoder pulse output from the encoder 24 is connected to the encoder 24 to count the encoder pulse. Thus, the amount of expansion and contraction of the transfer arm 130 can be recognized as a count value. The count value, that is, information on the position of the mask M in the moving direction can be sent to the control unit 9. Similarly, the load arm 15 and the unload arm 16 can have the same configuration as the robot arm 130.

As shown in FIG. 9, the identification section A is provided independently of the transfer device H, and includes a holding portion 31 of the transfer device H for holding the mask M passed by the load arm 15; The bar code reader 3 that reads the bar code B of the mask M held by the holding unit 31 can also be used. The holding portion 31 includes a base portion 34 formed in a plate shape, and a support portion 35 evenly arranged at a corner of the base portion 34, and the support portion 35 directly supports the lower surface of the corner of the mask M. Configuration. At this time,
The load arm 15 transfers the mask M to the identification unit A in the transport path H between the position CA2 and the mask stage 17 and receives the mask M from the identification unit A. A transfer mechanism other than the load arm 15 such as a robot arm 130 as shown in FIG. 8, for example, is provided for receiving and delivering the mask M from the load arm 15 to the identification unit A. You may.

Then, it is possible to provide a structure in which the holding unit 31 is provided with the moving device 30 and the mask M is positioned at a predetermined position while the mask M is held by the holding unit 31. The moving device 30 is driven based on an instruction from the control unit 9, and the mask M is moved to a position where the barcode B can be read by the barcode reader 3 by the substrate moving device 30. You. As shown in FIG. 9, the moving device 30 moves the base 34 of the holding unit 31 holding the mask M in the horizontal direction.
-Y stage 36, base part 34, and XY stage 36
And a θ stage that is interposed between them and rotates the base part 34 around a vertical axis. Each of these stages is driven by a stage driving unit 37, and a mask M whose size is detected in advance is used.
Is positioned with respect to the barcode reader 3. Alternatively, as the moving device 30, the plane 4
It is also possible to use an alignment pin that mechanically aligns the mask M by sandwiching the mask M from the two sides with reference to the four sides of the rectangular mask M. Further, the barcode reader 3 can be a moving device for moving.

In this case, if the mask M is not stably placed on the column 35 or the bar code B is placed at a position where the bar code reader 3 cannot read it, the load arm 15 will be It is possible to enter the space between the mask M and the base portion 34, hold the mask M again, and perform the replacement operation.

In this embodiment, the displacement sensor 21 directly detects the end position N of the mask M. For example, the displacement sensor 21 detects the position of the positioning pin 20 and detects this position. It is also possible to detect the size of the mask M based on the result. In this case, the mask M
Is supported so that the end thereof abuts on the positioning pin 20, so that the size of the mask M can be detected by detecting the position of the positioning pin 20.

Further, a second bar code containing information on the size of the mask M is displayed, for example, at the end position N of the mask M.
It is also possible to detect the size of the mask M by providing a bar code reader at the tip of the transfer arm 13 and reading the second bar code by using the bar code reader. It is.

In the present embodiment, the positioning pin 20 is configured to fit into the hole 20a formed in advance. For example, the bottom of the mask case 11 is made of a magnetic material.
By using the positioning pin 20 as a magnet, the mounting position of the positioning pin 20 can be set arbitrarily.

Further, as the positioning member 20, besides being constituted by a plurality of pin members as in this embodiment, for example, as shown in FIG. 10, a plurality of steps on which masks M of different sizes can be placed are provided. Positioning member 40 having portion 40a
It is also possible to use In this case, one side on the far side in the takeout direction is set as the reference position J.

On the mask stage 17, it is possible to install mask holders corresponding to masks M having different sizes. That is, it is possible to provide a plurality of mask holders for the large mask and the small mask on the mask stage 17. Transfer device H (load arm 15)
Transports the mask M to a corresponding mask holder (mask stage) according to the size of the mask M to be transported. The mask stage 17 is configured such that the mask M is
In the XY direction or θ
Driven in the direction.

Next, a second embodiment of the exposure apparatus provided with the transport device of the present invention will be described with reference to FIG. Here, the same reference numerals are used for the same or equivalent components as those in the first embodiment, and
The description is simplified or omitted.

In FIG. 11, inside the mask case 11, a plurality of detection sensors 22 for detecting an end of the mask M are provided. In the present embodiment, the detection sensor 22
Are provided in the direction in which the mask M is taken out. The detection sensor 22 is a presence / absence sensor capable of detecting whether or not an end of the mask M exists from below the mask M in the mask case 11 and above, and is, for example, an optical sensor such as a laser displacement sensor. It is configured. The detection sensor 22 includes a light emitting unit and a light receiving unit, and light emitted from the light emitting unit is reflected to an end of the mask M,
Whether or not the mask M is present above each detection sensor 22 is detected depending on whether or not the reflected light is received by the light receiving unit. These detection sensors 22 are connected to the control unit 9, and a detection signal from the detection sensor 22 is sent to the control unit 9. Control unit 9
Performs a predetermined process based on this detection signal.

The operation of the transport device H having such a configuration will be described. The plurality of masks M individually accommodated in the respective mask cases 11 have different sizes. Then, when one mask M is taken out of the mask case 11 by the transfer arm 13, the control unit 9 detects the size of the mask M by the detection sensor 22.

For example, only the detection sensor 22a provided on the center side (inside in the take-out direction) of the mask case 11 detects the end of the mask M, and is provided on the outlet side (outside in the take-out direction) of the mask case 11. Detection sensor 22
When b does not detect the end of the mask M, the control unit 9 determines that the mask M is a small mask M as indicated by a solid line in FIG. On the other hand, when the detection sensor 22b or both of the detection sensors 22a and 22b detect the end of the mask M, the control unit 9 replaces the mask M with FIG.
It is determined that the mask is a large mask M as indicated by the middle and broken lines.

That is, the control section 9 determines the size of the mask M based on the detection results of the detection sensors 22a and 22b. If the size of the mask M is determined to be the specified size, the control unit 9
The mask M is taken out of the mask case 11 and the transfer device H is instructed to transfer the mask M to a predetermined position (for example, the identification unit A). Then, in the identification section A, the mask M that has been subjected to the predetermined processing is transported by the transport device H to the mask stage 17 of the projection exposure section E, where the exposure processing is performed.

As described above, the size (dimension) of the mask M can also be detected by providing a plurality of the detection sensors 22 in the mask case 11 along the plate surface direction of the mask M. In addition, by installing many detection sensors 22, it is possible to cope with a plurality of types of masks M. Further, the size of the mask M can be detected with a relatively simple configuration.

In this case, the detection sensor 22 is configured to detect only the size of the mask M set in advance. That is, the detection of the size of the mask M is performed digitally by the two detection sensors 22a and 22b.
However, since the size of the mask M is not changed steplessly in reality, it is possible to sufficiently cope with the configuration of the present embodiment.

Further, in the above-described embodiment, the detection sensor 22 is arranged along the direction in which the mask M is taken out, and the detection sensor 22 is moved in a direction perpendicular to the direction in which the mask M is taken out (Y direction). It is also possible to arrange in. That is, as shown in FIG.
Even when the size of the mask M also changes in the X direction, the size (dimension) of the mask M in the X direction can be detected by arranging a plurality of the detection sensors 22 along the X direction. .

In this case, the distance between the arms of the transfer device H including the transfer arm 13 is made variable by a driving mechanism provided on this arm, and the distance between the arms in accordance with the size of the mask M in the X direction is changed. Is changed, masks M having various sizes can be stably conveyed. In this case, the control unit 9 drives the driving mechanism based on the detection result of the detection sensor 22 arranged in the X direction.

Next, a third embodiment of the exposure apparatus provided with the transport device of the present invention will be described with reference to FIG. Here, the same reference numerals are used for the same or equivalent components as those of the above-described first and second embodiments, and the description thereof will be simplified or omitted.

In FIG. 13, a dimension detection system R provided in the transfer device H for detecting the size of the mask M includes a detection sensor 23 for detecting the position information of the mask M passing through the measurement position by the transfer device H, The control unit (calculation system) 9 for obtaining the size of the mask M based on the detection result of the detection sensor 23 and information on the transport of the transport device H is provided.

The detection sensor 23 is provided at the upper part of the library 12 on the side of the take-out opening of the mask M.
And a light receiving portion 23b provided at a lower portion. The light projected from the light projecting portion 23a is
Irradiation is performed toward the light receiving portion 23b so as to be orthogonal to the direction in which the mask M taken out of the mask 1 is taken out. The timing at which the light emitting unit 23a emits light is instructed by the control unit 9, and a detection signal of the light receiving unit 23b is sent to the control unit 9.

On the other hand, in the transfer device H, the mask case 1
Information on the movement of the transport arm 13 for taking out the mask M from 1 is provided to the control unit 9. That is, for example, when the transfer arm 13 is configured by a robot arm 130 as shown in FIG. 8, the information on the movement of the transfer arm 13 (or the expansion and contraction of the arm) includes the encoder 24 that generates a pulse corresponding to the movement of the arm. The moving speed detecting system includes a counter 25 that counts encoder pulses output from the encoder 24 and a control unit 9 that obtains information on the position of the mask M in the moving direction based on the count value. Thus, the control unit 9 controls the transfer arm 1
The information about the position and the moving speed of the mask M conveyed by 3 is detected.

The operation of the transport device H having such a configuration will be described. First, in order to take out the mask M from the mask case 11, the control unit 9 enters the transfer arm 13 into the mask case 11, and holds the mask M on the transfer arm 13. When the mask M is taken out of the mask case 11 by the transfer arm 13, the detection sensor 2
The light projecting unit 23a emits light toward the light receiving unit 23b.

The mask M is taken out of the mask case 11 by the transfer arm 13 so that
The light passes through the projected light emitted from 3a. At this time, the projected light is blocked by the passing mask M and does not reach the light receiving portion 23b. The light receiving section 23b receives or blocks the light emitted from the mask M as it passes through the mask M, and
Is detected on the optical path of the projected light. Thus, the detection sensor 23 detects the position information of the mask M passing on the optical path (measurement position) of the projected light. Light receiving section 23b
Is sent to the control unit 9.

On the other hand, information on the movement of the transfer arm 13 is sent to the control unit 9 from the encoder 24 provided on the transfer arm 13. The control unit 9 obtains position information of the transfer arm 13 based on a signal from the encoder 24.

The control unit 9 determines the position of the transfer arm 13,
That is, the distance (dimension in the Y direction of the mask M) in the taking-out direction of the mask M is detected based on the position where the light receiving unit 23b is shielded from light and the position where light is incident again when the mask M moves.

The mask M whose size is thus detected
Is transported by the transport device H to the processing section A, subjected to predetermined processing in the processing section A, and then transported to the projection exposure section E to perform exposure processing.

As described above, the position information of the mask M passing through the measurement position is detected by the transfer device H, and the control unit (calculation system) 9 can obtain the size of the mask M based on the detection result. .

The dimensions of the mask M may be obtained using the moving speed of the transfer arm 13 and the time during which the light receiving section 23b is shielded from light. In this case, by setting the moving speed of the transfer arm 13 to a predetermined speed in advance, the size of the mask M can be detected with a simple configuration without providing a moving speed detection system in the transfer arm 13. . On the other hand, by providing the moving speed detection system, when taking out the masks M from the respective mask cases 11, the size of the masks M can be accurately obtained even if the take-out speed is set according to the respective masks M. it can. Then, the take-out speed can be changed according to the size of the mask M, such as taking out the mask at a low speed in the case of a large mask M and taking it out at a high speed in the case of a small mask M.

Next, a fourth embodiment of the exposure apparatus provided with the transport device of the present invention will be described with reference to FIG. Here, the same reference numerals are used for the same or equivalent components as those of the above-described first, second, and third embodiments, and the description thereof will be simplified or omitted.

In this embodiment, a plurality of detection sensors 23 described in the third embodiment are installed in parallel in the X direction. In this embodiment, a detection sensor having a light projecting unit 230a and a light receiving unit 230b is provided. Two 230 are provided. Then, from each of the light projecting units 230a toward the light receiving unit 230b, a direction (Z
Direction) is emitted. In this manner, the positions of a plurality of (two) positions of the mask M taken out of the mask case 11 are detected.

The operation of the transport device having such a configuration will be described. The control unit 9 controls the transfer arm 13 to take out the mask M from the mask case 11.
1 and the transfer arm 13 holds the mask M. The mask M is taken out by the transfer arm 13.

The control unit 9 detects two positions of the mask M passing therethrough by the detection sensors 230 provided at two positions. Each detection sensor 230 (light receiving unit 230
The detection signal of b) is sent to the control unit 9. The control unit 9 detects the size of the mask M and the inclination (rotation component) in the take-out direction (Y direction) of the mask M based on the detection result.

That is, the rotational component of the mask M can be detected based on the time difference between the light shielding times of the respective detection sensors 230. The control unit 9 transports the mask M by the transport device H after detecting the size (dimension) and the rotation component in the take-out direction (Y direction) of the mask M.

At this time, if it is determined that the rotational component of the mask M is smaller than the predetermined value, the control unit 9 sets the mask M
Is determined to be stably taken out of the mask case 11,
The mask M is transported by the transport device H. At the same time, the control unit 9 determines, for example, the size (dimension) of the mask M calculated based on the detection signal of each detection sensor 230.
Is the size of the mask M.

On the other hand, when it is determined that the rotation component of the mask M is larger than the predetermined value, the control unit 9 determines whether the mask M is not correctly set in the mask case 11 or the mask case 11 It is determined that the mask M has not been correctly installed, and a display device installed outside the apparatus is driven to notify the operator of this fact, or the mask M is replaced using the transfer arm 13 or another transfer mechanism. Or Alternatively, when the rotation component is out of the allowable range but the size of the mask M can be detected, the control unit 9 conveys the mask M to a predetermined position by the conveyance device H, and sets the mask provided at the predetermined position. The mask M can be corrected to a predetermined angle by the M replacement mechanism (rotational component correction mechanism). The replacement operation in this case is also performed stably because the size of the mask M is detected in advance.

Further, by installing more detection sensors 230 in the X direction (for example, four places) at a predetermined distance, the size of the mask M in the X direction can be determined.
This can be performed together with the detection of the rotation component. in this case,
As described in the second embodiment, since the size of the mask M is not infinite, such a method can be used sufficiently.

In each of the above-described embodiments, the target of dimension detection and transport is the mask M, but it is of course possible to apply the present invention to the substrate W which is a glass plate.
That is, when a plurality of the substrates W are stored in a substrate storage unit (not shown) and at least one substrate W among the plurality of substrates W stored in the substrate storage unit is transferred to the substrate stage 19, The size of the accommodated substrate W is detected, and based on the detection result, it is determined whether or not the substrate W is the specified size, and the substrate W determined to be the specified size is determined.
Can be taken out of the substrate storage unit and transported to the substrate stage 19.

The substrate W according to the present invention is not limited to a glass plate for a liquid crystal display device, but may be a semiconductor wafer for a semiconductor device or a ceramic wafer for a thin-film magnetic head.

The exposure apparatus is not limited to a step-and-repeat type exposure apparatus (stepper) that exposes the pattern of the mask M while the mask M and the substrate W are stationary and sequentially moves the substrate W step by step. A step-and-scan type scanning exposure apparatus (scanning stepper) for exposing the pattern of the mask M to the substrate W by synchronously moving the mask M and the substrate W, or a large multi-lens type having a plurality of projection lenses. The present invention can also be applied to a substrate exposure apparatus.

As the type of the exposure apparatus, not only the above-described liquid crystal display device manufacturing, but also an exposure apparatus for manufacturing a semiconductor wafer, an exposure apparatus for manufacturing a thin film magnetic head, an image pickup device (CCD) or a mask M are manufactured. Can be widely applied to an exposing apparatus and the like.

As a light source 153 of the illumination optical system 150, a bright line (g line (436 nm), h line (404.7 nm), i line (365 nm)) generated from a mercury lamp, a KrF excimer laser (248 nm), or the like is used. Can be.

The magnification of the projection optical system 120 may be not only a reduction system but also an equal magnification system or an enlargement system.

Further, as the projection optical system 120, when far ultraviolet rays such as an excimer laser are used, a material that transmits far ultraviolet rays such as quartz or fluorite is used as a glass material, and when an F2 laser or X-ray is used, catadioptric refraction is used. It is sufficient to use a system or a refraction type optical system (a mask M is of a reflection type).

The outside of the substrate chamber, that is, the optical path portion of the length measurement beam outside the light transmission window is covered with a container provided with light transmission windows at both ends, and the temperature, pressure, etc. of the gas inside the container are controlled. You may make it. Alternatively, the inside of the container may be evacuated. As a result, it is possible to reduce a length measurement error caused by air fluctuation on the external optical path. Such details are disclosed, for example, in Japanese Patent Application Laid-Open No. 10-105241.

It is to be noted that the reference mirror (fixed mirror) for the laser interferometer is fixed to the projection optical system, and the positions of the X-moving mirror and the Y-moving mirror are measured on the basis of the reference mirror. In this case, an optical element ahead of the polarizing beam splitter (prism) for separating the reference beam and the measurement beam may be housed inside the substrate chamber, and a laser light source, a detector, and the like may be arranged outside the substrate chamber.

As described above, the exposure apparatus according to the embodiment of the present invention converts various subsystems including the components described in the claims of the present application into predetermined mechanical accuracy, electrical accuracy,
It is manufactured by assembling to maintain optical accuracy. Before and after this assembly, adjustments to achieve optical accuracy for various optical systems, adjustments to achieve mechanical accuracy for various mechanical systems, and various electric systems to ensure these various accuracy Are adjusted to achieve electrical accuracy. The process of assembling the exposure apparatus from various subsystems includes mechanical connections, wiring connections of electric circuits, and piping connections of pneumatic circuits among the various subsystems. It goes without saying that there is an assembling process for each subsystem before the assembling process from these various subsystems to the exposure apparatus. When the process of assembling the various subsystems into the exposure apparatus is completed, comprehensive adjustment is performed, and various precisions of the entire exposure apparatus are secured. It is desirable that the manufacture of the exposure apparatus be performed in a clean room in which the temperature, cleanliness, and the like are controlled.

The semiconductor device is, as shown in FIG.
Step 201 for designing the function and performance of the device, Step 20 for manufacturing a mask based on this design step
2. Step 203 of manufacturing a substrate (glass plate, wafer) serving as a base material of a device; substrate processing step 204 of exposing a mask pattern to the substrate by the exposure apparatus of the above-described embodiment; device assembling step (dicing step, bonding) (Including a process and a package process) 205, an inspection step 206, and the like.

[0138]

The transport method and the transport apparatus, the exposure method and the exposure apparatus of the present invention have the following effects.

According to the first aspect of the present invention, the substrate is
Since the substrate is transported after its size is detected in the storage container, even when a plurality of substrates stored in the storage container have various sizes, a desired substrate can be reliably removed from the storage container. The substrate can be taken out, and a transport operation according to the size of the substrate can be performed.

According to the second aspect of the present invention, by performing positioning at a predetermined position according to the detected size of the substrate, processing at the predetermined position is performed accurately and stably.

According to the third aspect of the present invention, the substrate comprises:
Before being transported by the transport system, the size is detected by the dimension detection system, so even if a plurality of substrates housed in the storage container have various sizes, the transport system is Thus, the desired substrate can be reliably taken out of the storage container. Further, by detecting the size of the substrate before the transfer, the transfer system is set by the control system in accordance with the size of the substrate, so that the substrate is stably transferred.

According to the fourth aspect of the present invention, since the control system positions the substrate at a predetermined position according to the size of the substrate, the processing at the predetermined position is performed accurately and stably.

According to the fifth aspect of the present invention, since the size of the mask is detected before the transfer, the transfer operation according to the size of the mask can be performed. Then, by performing positioning at a predetermined position according to the size of the mask, processing at the predetermined position is performed accurately and stably. Since the mask is subjected to stable exposure processing after being subjected to predetermined processing, productivity and workability are improved.

According to the sixth aspect of the present invention, it is determined whether or not the mask is of a specified size based on the detection result, and the mask determined to be of the specified size is taken out of the storage container. Since only the mask having the size of can be reliably taken out of the storage container, efficient processing can be performed.

According to the seventh aspect of the present invention, the size of the mask is detected by the dimension detecting system before the transfer, so that the transfer system sets by the control system according to the size of the mask. Then, the mask is transported. Then, the control system performs positioning at a predetermined position according to the size of the mask, so that processing at the predetermined position is performed accurately and stably. Since the mask is subjected to the exposure processing after the predetermined processing is stably performed, the exposure processing is performed stably, and the productivity and workability are improved.

According to the eighth aspect of the present invention, the storage container is provided with a positioning member which is arranged in a predetermined positional relationship and positions the mask at a predetermined position.
By being able to be attached to an arbitrary position, masks having various sizes can be stably stored in the storage container.

[Brief description of the drawings]

FIG. 1 is a first view of an entire exposure apparatus including a transport device according to the present invention.
It is a lineblock diagram showing an embodiment.

FIG. 2 is a side view for explaining a storage container.

FIG. 3 is a configuration diagram for explaining an identification unit (processing unit).

FIG. 4 is a configuration diagram for explaining a projection exposure section (exposure apparatus).

FIG. 5 is a diagram for explaining a control system.

FIG. 6 is a configuration diagram for explaining a first embodiment of the transport device of the present invention.

FIG. 7 is a diagram for explaining another embodiment of FIG. 6;

FIG. 8 is a diagram for explaining another embodiment of the transport device.

FIG. 9 is a diagram for explaining another mode of the identification unit (processing unit).

FIG. 10 is a view for explaining another embodiment of the storage container.

FIG. 11 is a configuration diagram for explaining a second embodiment of the transport device of the present invention.

FIG. 12 is a diagram for explaining another embodiment of FIG. 11;

FIG. 13 is a configuration diagram for explaining a third embodiment of the transport device of the present invention.

FIG. 14 is a configuration diagram for explaining a fourth embodiment of the transport device of the present invention.

FIG. 15 is a diagram for explaining a state in which exposure processing is performed using masks having different sizes.

FIG. 16 is a flowchart illustrating an example of a manufacturing process of a semiconductor device.

[Explanation of symbols]

 Reference Signs List 3 Bar code reader 9 Control unit (control system) 11 Mask case (storage container) 12 Library (storage unit) 13 Transfer arm (transfer device) 15 Load arm (transfer device) 17 Mask stage 19 Substrate stage 20 Positioning pin (positioning member) ) 153 light source 120 projection optical system 150 illumination optical system A identification unit (processing unit) B barcode (identifier) C control system E projection exposure unit (control device) EL exposure light H transport device (transport system) J reference position M mask (Substrate) PA pattern R Dimension detection system S Exposure device W Substrate (glass plate)

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) H01L 21/30 516Z F-term (Reference) 5F031 CA07 DA12 DA17 EA19 FA04 FA07 FA11 FA14 GA08 GA25 GA36 GA38 GA45 GA48 GA49 GA50 HA13 HA53 HA57 HA58 HA59 JA01 JA02 JA06 JA12 JA17 JA23 JA29 JA30 JA32 JA49 KA06 KA07 KA08 KA20 LA08 MA13 MA27 PA16 5F046 AA17 AA21 BA03 CC01 CC02 CC03 CC09 CD02 CD04 CD06 DA06 DA29 DB05 DB14 DC14 DD04

Claims (8)

[Claims] 1. A transport method for transporting at least one substrate among a plurality of substrates stored in a storage container to a predetermined position, wherein a size of the substrate stored in the storage container is detected, and based on the detection result. Determining whether the substrate is of a specified size, and taking out the substrate determined to be of the specified size from the storage container and transferring the substrate to the predetermined position. 2. The transfer method according to claim 1, wherein the positioning at the predetermined position is performed according to a size of the substrate. 3. A transport device for transporting at least one substrate among a plurality of substrates accommodated in a storage container to a predetermined position, wherein: a size detection system for detecting a size of the substrate in the storage container; A transport system to be taken out of the storage container, and based on the detection result of the size detection system, determine whether the substrate is a specified size or not. And a control system for instructing the transport system to transport the paper to the predetermined position. 4. The transfer device according to claim 3, wherein the control system performs positioning of the substrate at the predetermined position according to a size of the substrate. 5. An exposure method in which a mask stored in a storage container is conveyed on an optical path of exposure light, and an image of a pattern formed on the mask is transferred onto a substrate by the exposure light. The size of the mask to be detected is detected, the mask is taken out of the storage container according to the detected size of the mask, and is transported to a predetermined position. According to the size of the mask, positioning at the predetermined position is performed. An exposure method, wherein after performing a predetermined process at the predetermined position, the mask is transported on the optical path and exposed. 6. The exposure method according to claim 5, wherein it is determined whether or not the mask has a specified size based on the detection result, and the mask determined to have the specified size is taken out of the storage container. An exposure method comprising: 7. An exposure apparatus for transporting a mask stored in a storage container on an optical path of exposure light and transferring an image of a pattern formed on the mask by the exposure light onto a substrate, wherein the mask in the storage container is provided. A dimension detection system that detects the size of the mask, a transport system that removes the mask from the storage container and transports the mask to a predetermined position, based on a detection result of the dimension detection system, performs positioning of the mask at the predetermined position, An exposure apparatus, comprising: a control system that instructs the transport system to transport the mask onto the optical path after performing a predetermined process at the predetermined position. 8. The exposure apparatus according to claim 7, wherein the storage container is arranged in a predetermined positional relationship, and includes a positioning member for positioning the mask at a predetermined position, wherein the positioning member is located at an arbitrary position. An exposure apparatus characterized by being attachable.