JP2001232160A - Membrane filter - Google Patents
Membrane filterInfo
- Publication number
- JP2001232160A JP2001232160A JP2000042753A JP2000042753A JP2001232160A JP 2001232160 A JP2001232160 A JP 2001232160A JP 2000042753 A JP2000042753 A JP 2000042753A JP 2000042753 A JP2000042753 A JP 2000042753A JP 2001232160 A JP2001232160 A JP 2001232160A
- Authority
- JP
- Japan
- Prior art keywords
- hypochlorite
- membrane
- residual chlorine
- chlorine concentration
- sensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Separation Using Semi-Permeable Membranes (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、河川水、井水、湖
沼水等を原水とし、これを膜モジュールを用いてろ過す
ることによって公共の上水を製造し、その膜モジュール
を定期的に物理洗浄する膜ろ過装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing public water by filtering river water, well water, lake water and the like as raw water and filtering the raw water using a membrane module. The present invention relates to a membrane filter for performing physical cleaning.
【0002】[0002]
【従来の技術】従来、膜モジュールを用いてろ過を行う
膜ろ過装置においては、一定時間ろ過を継続した後、膜
面に付着した濁質による汚れを洗浄除去するため、物理
洗浄を行う。物理洗浄においては、処理水を逆洗ポンプ
によって膜の裏面から透過させる(以下、逆洗とい
う。)ことによって膜の汚れを剥離させる。このとき、
逆洗水に膜面の生物ファウリングを防止するため、次亜
塩素酸ナトリウム等の次亜塩素酸塩を一定濃度(通常、
3〜5ppm程度)、一定時間(20〜30秒程度)添
加していた。また、通常、逆洗頻度や次亜塩素酸塩の注
入時間は、タイマーによって決めて一定条件として洗浄
を行っている。このように、逆洗頻度や次亜塩素酸塩の
注入時間を一定とした場合、原水の性状が悪化(例え
ば、大雨による濁質急上昇、藻類の大量発生など)した
ことによって膜面での濁質の負荷が増大し、それまでの
逆洗条件では充分に生物ファウリングの発生を抑制しき
れず、膜の運転圧力が上昇してしまい、膜ろ過設備全体
の運転に支障をきたす恐れがあった。また、生物ファウ
リングが発生する要因として前記の原水性状の悪化の他
に、逆洗時に注入する次亜塩素酸塩の注入管の一部に次
亜塩素酸のガス化又は空気の混入によるガス滞留部が発
生し、これにより次亜塩素酸塩の注入不良が起こり、塩
素が膜面に達しないことがある。2. Description of the Related Art Conventionally, in a membrane filtration apparatus for performing filtration using a membrane module, after performing filtration for a certain period of time, physical cleaning is performed in order to wash and remove stains due to turbidity adhering to the membrane surface. In the physical cleaning, dirt on the membrane is removed by allowing treated water to permeate from the back surface of the membrane by a backwash pump (hereinafter, referred to as backwashing). At this time,
To prevent biological fouling of the membrane surface in the backwash water, a certain concentration of hypochlorite such as sodium hypochlorite (usually,
(About 3 to 5 ppm) for a certain period of time (about 20 to 30 seconds). Further, usually, the frequency of back washing and the injection time of hypochlorite are determined by a timer, and the washing is performed under constant conditions. As described above, when the frequency of backwashing and the injection time of hypochlorite are constant, the quality of raw water deteriorates (for example, a sudden increase in turbidity due to heavy rain, a large amount of algae, etc.), and turbidity on the membrane surface is caused. The quality load increases, and under the previous backwash conditions, the generation of biological fouling cannot be sufficiently suppressed, and the operating pressure of the membrane increases, which may hinder the operation of the entire membrane filtration facility. . In addition, in addition to the deterioration of the raw water condition as a factor that causes biological fouling, gas generated by gasification of hypochlorous acid or mixing of air into a part of a hypochlorite injection pipe to be injected at the time of backwashing. A stagnation portion is generated, which causes poor injection of hypochlorite, and chlorine may not reach the membrane surface.
【0003】[0003]
【発明が解決しようとする課題】本発明は、原水の性状
の変動及び/又は次亜塩素酸塩の注入状態の良否に容易
に対処でき、長期間にわたって効率のよい膜ろ過を行い
うる膜ろ過装置を提供することを目的とする。DISCLOSURE OF THE INVENTION The present invention relates to a membrane filter which can easily deal with fluctuations in the properties of raw water and / or the quality of hypochlorite injection, and can carry out efficient membrane filtration over a long period of time. It is intended to provide a device.
【0004】[0004]
【課題を解決するための手段】本発明は、膜モジュール
を定期的に物理洗浄する際に排水可能なドレン管を備え
た膜ろ過装置において、このドレン管から排水を採取
し、排水中の残留塩素濃度を測定する残留塩素濃度セン
サーを備え、そのセンサー値に応じて膜モジュールの洗
浄頻度及び/又は逆洗時における次亜塩素酸塩の注入時
間が自動的に制御されることを特徴とする膜ろ過装置を
提供するものである。また、本発明は、次亜塩素酸塩の
注入管を備えた膜ろ過装置において、この注入管の途中
に圧力センサーを備えたことを特徴とする膜ろ過装置を
提供するものである。SUMMARY OF THE INVENTION The present invention relates to a membrane filtration apparatus provided with a drain pipe capable of draining when periodically performing physical cleaning of a membrane module. It is equipped with a residual chlorine concentration sensor that measures chlorine concentration, and the cleaning frequency of the membrane module and / or the injection time of hypochlorite during backwashing are automatically controlled according to the sensor value. It is intended to provide a membrane filtration device. The present invention also provides a membrane filtration device provided with a hypochlorite injection tube, wherein a pressure sensor is provided in the middle of the injection tube.
【0005】本発明は、さらに、膜モジュールを定期的
に物理洗浄する際に排水可能なドレン管と次亜塩素酸塩
の注入管とを備えた膜ろ過装置において、このドレン管
から排水を採取し、排水中の残留塩素濃度を測定する残
留塩素濃度センサーを備え、さらに次亜塩素酸塩の注入
管の途中に圧力センサーを備え、この圧力センサーが次
亜塩素酸塩注入状態を良好と判定したときに、残留塩素
濃度センサー値に応じて膜モジュールの洗浄頻度及び/
又は逆洗時における次亜塩素酸塩の注入時間が自動的に
制御されることを特徴とする膜ろ過装置を提供するもの
である。[0005] The present invention further provides a membrane filtration device provided with a drain pipe and a hypochlorite injection pipe capable of draining when periodically performing physical cleaning of the membrane module. Equipped with a residual chlorine concentration sensor that measures the residual chlorine concentration in the wastewater, and a pressure sensor in the middle of the hypochlorite injection pipe, which determines that the hypochlorite injection state is good. The cleaning frequency of the membrane module and / or according to the residual chlorine concentration sensor value.
Another object of the present invention is to provide a membrane filtration device wherein the injection time of hypochlorite during backwashing is automatically controlled.
【0006】[0006]
【発明の実施の形態】次に、図面を参照して本発明をさ
らに具体的に説明する。図1は、本発明の一実施例を示
す膜ろ過装置の系統図である。図1に示した膜ろ過装置
は、主として原水槽1、膜モジュール2、逆洗水槽3及
び次亜塩素酸塩槽4から成り、原水はポンプ5により弁
6を介して膜モジュール2に送水され、ここでろ過され
たろ過水は、ろ過水流出管7から流出する。膜ろ過装置
を運転する際、一定頻度で膜モジュール2の逆洗が行わ
れ、逆洗水槽3の水を逆洗ポンプ8によって膜モジュー
ル2の裏面から透過させる。このとき、逆洗水に次亜塩
素酸塩槽4から次亜塩素酸塩注入ポンプ18により次亜
塩素酸塩、例えば次亜塩素酸ナトリウムが添加される。
次亜塩素酸塩を添加した逆洗水の塩素濃度は、3〜5p
pm程度が一般的である。逆洗排水は、膜モジュール2
から排水弁10を介してドレン管9から排出される。Next, the present invention will be described more specifically with reference to the drawings. FIG. 1 is a system diagram of a membrane filtration device showing one embodiment of the present invention. The membrane filtration device shown in FIG. 1 mainly includes a raw water tank 1, a membrane module 2, a backwash water tank 3, and a hypochlorite tank 4. Raw water is sent to the membrane module 2 by a pump 5 via a valve 6. The filtered water filtered here flows out from the filtered water outflow pipe 7. When the membrane filtration device is operated, backwashing of the membrane module 2 is performed at a constant frequency, and water in the backwash water tank 3 is permeated from the back surface of the membrane module 2 by the backwash pump 8. At this time, hypochlorite, for example, sodium hypochlorite is added to the backwash water from the hypochlorite tank 4 by the hypochlorite injection pump 18.
The chlorine concentration of the backwash water to which hypochlorite is added is 3-5p
pm is common. Backwash wastewater is supplied to the membrane module 2
From the drain pipe 9 through a drain valve 10.
【0007】図示した膜ろ過装置においては、ドレン管
9にサンプリング弁11が設けられており、さらに残留
塩素濃度センサー12が接続されている。排水弁10が
開となると同時にサンプリング弁11を開として残留塩
素濃度センサー12に排水サンプルを供給する。膜モジ
ュール2の運転が正常に行われ、膜面に生物ファウリン
グが発生していない場合には、逆洗排水の残留塩素が正
常値(0.5〜1.5ppm)で検出されるが、生物フ
ァウリングが発生した場合には、逆洗排水の残留塩素は
著しく低下する(0〜0.3ppm)。In the illustrated membrane filtration device, a sampling valve 11 is provided on a drain pipe 9, and a residual chlorine concentration sensor 12 is connected to the drain valve 9. At the same time as the drain valve 10 is opened, the sampling valve 11 is opened to supply a drain sample to the residual chlorine concentration sensor 12. When the operation of the membrane module 2 is performed normally and no biological fouling occurs on the membrane surface, the residual chlorine in the backwash wastewater is detected at a normal value (0.5 to 1.5 ppm). If biological fouling occurs, the residual chlorine in the backwash effluent drops significantly (0-0.3 ppm).
【0008】残留塩素濃度センサー12によって測定さ
れた値が、ある設定値以下を示した場合、膜モジュール
が生物ファウリングを発生したと判断し、生物ファウリ
ングを解消又は改善することを目的として膜ろ過装置の
逆洗頻度を上げる(一般的に20〜60分に1回逆洗す
る)か、あるいは次亜塩素酸塩の注入時間を延長する
(一般的には20〜30秒間)。これらの動作は、残留
塩素濃度センサー12の低下信号を制御盤で受け、予め
設定した逆洗頻度、次亜塩素酸塩注入時間に切り替える
ことによって行うことができる。また、上記動作により
生物ファウリングの発生が抑制され、残留塩素濃度セン
サー12の値が正常な値に戻った時点で、再び逆洗頻
度、次亜塩素酸塩注入時間を初期の設定値に戻す。If the value measured by the residual chlorine concentration sensor 12 is below a certain set value, it is determined that the membrane module has caused biological fouling, and the membrane module is used for eliminating or improving biological fouling. Increase the frequency of backwashing of the filtration device (typically once every 20-60 minutes) or extend the hypochlorite injection time (typically 20-30 seconds). These operations can be performed by receiving a decrease signal of the residual chlorine concentration sensor 12 in the control panel and switching to a preset backwash frequency and hypochlorite injection time. Further, the occurrence of biological fouling is suppressed by the above operation, and when the value of the residual chlorine concentration sensor 12 returns to a normal value, the backwash frequency and the hypochlorite injection time are returned to the initial set values again. .
【0009】膜モジュールの逆洗時には、前記のよう
に、次亜塩素酸塩注入ポンプ18を介して注入管16に
より逆洗水に次亜塩素酸塩が注入されるが、このとき、
注入管16の一部分に次亜塩素酸のガス化や空気の混入
によってガス滞留部ができ、これにより次亜塩素酸塩の
注入不良が起こり、塩素が膜面に達しないことがある。
これを防止するため、注入管16に圧力センサー17を
備え、これによって注入圧力を測定する。この値が正常
な圧力(2kg/cm2 以下)以上になった場合は、注
入管16にガス滞留等により異常昇圧したものと判断
し、制御盤に警告を表示する。仮に、残留塩素濃度セン
サー値が低下しても、この圧力センサー値が高ければ、
逆洗頻度、次亜塩素酸塩の注入時間の変更は行わない。
逆洗頻度、次亜塩素酸塩注入時間の変更は、圧力センサ
ー17の値が正常で、かつ残留塩素濃度センサー12の
値が低下した場合にのみ行う。When the membrane module is backwashed, hypochlorite is injected into the backwash water by the injection pipe 16 through the hypochlorite injection pump 18 as described above.
A gas stagnant part is formed in a part of the injection pipe 16 by gasification of hypochlorous acid or mixing of air, which may cause hypochlorite injection failure and chlorine may not reach the membrane surface.
To prevent this, the injection pipe 16 is provided with a pressure sensor 17, which measures the injection pressure. If this value exceeds a normal pressure (2 kg / cm 2 or less), it is determined that the pressure in the injection pipe 16 has been abnormally increased due to gas stagnation or the like, and a warning is displayed on the control panel. Even if the residual chlorine concentration sensor value drops, if this pressure sensor value is high,
The frequency of backwashing and the injection time of hypochlorite are not changed.
The backwash frequency and the hypochlorite injection time are changed only when the value of the pressure sensor 17 is normal and the value of the residual chlorine concentration sensor 12 decreases.
【0010】逆洗排水の残留塩素濃度を測定する方法と
して、前記のドレン管9から排水をサンプリングし、残
留塩素濃度センサー12で測定する代わりに、排水を一
度排水ピット13に受け、ここからサンプリングポンプ
14で残留塩素濃度センサー15に排水を送って測定す
ることもできる。また、排水の残留塩素濃度が低下した
場合、逆洗頻度、塩素注入時間の設定を変更する代わり
に、次亜塩素酸塩注入ポンプ1の出力を上げ、塩素添加
濃度を上げることにより、生物ファウリング抑制効果を
持たせることもできる。As a method of measuring the residual chlorine concentration of the backwash wastewater, instead of sampling the wastewater from the drain pipe 9 and measuring the residual chlorine concentration with the residual chlorine concentration sensor 12, the wastewater is once received in the drainage pit 13 and sampled therefrom. The wastewater can be sent to the residual chlorine concentration sensor 15 by the pump 14 for measurement. When the residual chlorine concentration in the wastewater decreases, the output of the hypochlorite injection pump 1 is increased instead of changing the backwashing frequency and the setting of the chlorine injection time, thereby increasing the concentration of biological fouling. A ring suppressing effect can be provided.
【0011】[0011]
【発明の効果】本発明の膜ろ過装置によれば、膜モジュ
ールに生物ファウリングが発生したことを自動的に検知
し、適切な時期に生物ファウリングを抑制する手段(逆
洗頻度の増加や次亜塩素酸塩の注入時間の延長)を講じ
ることができる。また、本発明の膜ろ過装置によれば、
生物ファウリングによる排水の残留塩素濃度の低下現
象、次亜塩素酸塩の注入ポンプの運転不良による残留塩
素濃度の低下現象あるいはその両方の現象の惹起を区別
することができ、それぞれ適切な改善手段を講じること
ができ、長期間にわたって効率のよい膜ろ過を行うこと
ができる。According to the membrane filtration apparatus of the present invention, the means for automatically detecting the occurrence of biological fouling in the membrane module and suppressing the biological fouling at an appropriate time (such as an increase in the frequency of backwashing and Extension of hypochlorite injection time). According to the membrane filtration device of the present invention,
It is possible to distinguish between the phenomenon of lowering the residual chlorine concentration in wastewater due to biological fouling, the phenomenon of lowering the residual chlorine concentration due to malfunction of the hypochlorite injection pump, or the occurrence of both phenomena. And efficient membrane filtration can be performed over a long period of time.
【図1】本発明の一実施例を示す膜ろ過装置の系統図で
ある。FIG. 1 is a system diagram of a membrane filtration device showing one embodiment of the present invention.
1 原水槽 2 膜モジュール 3 逆洗水槽 4 次亜塩素酸塩槽 7 ろ過水流出管 9 ドレン管 11 サンプリング弁 12 残留塩素濃度センサー 13 排水ピット 14 サンプリングポンプ 15 残留塩素濃度センサー 16 注入管 17 圧力センサー DESCRIPTION OF SYMBOLS 1 Raw water tank 2 Membrane module 3 Backwash water tank 4 Hypochlorite tank 7 Filtration water outflow pipe 9 Drain pipe 11 Sampling valve 12 Residual chlorine concentration sensor 13 Drain pit 14 Sampling pump 15 Residual chlorine concentration sensor 16 Injection pipe 17 Pressure sensor
Claims (3)
に排水可能なドレン管を備えた膜ろ過装置において、こ
のドレン管から排水を採取し、排水中の残留塩素濃度を
測定する残留塩素濃度センサーを備え、そのセンサー値
に応じて膜モジュールの洗浄頻度及び/又は逆洗時にお
ける次亜塩素酸塩の注入時間が自動的に制御されること
を特徴とする膜ろ過装置。1. A membrane filtration device provided with a drain pipe capable of draining when a membrane module is periodically physically cleaned, wherein drain water is collected from the drain pipe and the residual chlorine concentration in the drain water is measured. A membrane filtration device comprising a sensor, wherein the washing frequency of the membrane module and / or the injection time of hypochlorite during backwashing are automatically controlled according to the sensor value.
置において、この注入管の途中に圧力センサーを備えた
ことを特徴とする膜ろ過装置。2. A membrane filtration device having a hypochlorite injection tube, wherein a pressure sensor is provided in the middle of the injection tube.
に排水可能なドレン管と次亜塩素酸塩の注入管とを備え
た膜ろ過装置において、このドレン管から排水を採取
し、排水中の残留塩素濃度を測定する残留塩素濃度セン
サーを備え、さらに次亜塩素酸塩の注入管の途中に圧力
センサーを備え、この圧力センサーが次亜塩素酸塩注入
状態を良好と判定したときに、残留塩素濃度センサー値
に応じて膜モジュールの洗浄頻度及び/又は逆洗時にお
ける次亜塩素酸塩の注入時間が自動的に制御されること
を特徴とする膜ろ過装置。3. A membrane filtration device provided with a drain pipe capable of draining when periodically performing physical cleaning of a membrane module, and a hypochlorite injection pipe. Equipped with a residual chlorine concentration sensor for measuring the residual chlorine concentration of, further equipped with a pressure sensor in the middle of the hypochlorite injection pipe, when this pressure sensor determines that the hypochlorite injection state is good, A membrane filtration device wherein the frequency of washing the membrane module and / or the injection time of hypochlorite during backwashing are automatically controlled according to the residual chlorine concentration sensor value.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000042753A JP2001232160A (en) | 2000-02-21 | 2000-02-21 | Membrane filter |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000042753A JP2001232160A (en) | 2000-02-21 | 2000-02-21 | Membrane filter |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2001232160A true JP2001232160A (en) | 2001-08-28 |
Family
ID=18565785
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000042753A Pending JP2001232160A (en) | 2000-02-21 | 2000-02-21 | Membrane filter |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2001232160A (en) |
Cited By (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007275870A (en) * | 2006-03-16 | 2007-10-25 | Ngk Insulators Ltd | Separative membrane-cleaning method/device |
JP2007289899A (en) * | 2006-04-27 | 2007-11-08 | Meidensha Corp | Membrane washing method for membrane separation means, and water treatment apparatus |
JP2008126223A (en) * | 2006-11-27 | 2008-06-05 | Meidensha Corp | Membrane treatment system |
JP2009538733A (en) * | 2006-05-31 | 2009-11-12 | エックス−フロー ベー.フェー. | Apparatus for treatment of incoming fluid with bioreactor and membrane filtration module |
JP2010058120A (en) * | 2004-12-24 | 2010-03-18 | Siemens Water Technologies Corp | Cleaning in membrane filtration system |
KR101050418B1 (en) | 2009-04-23 | 2011-07-19 | 주식회사 대우엔텍 | Intelligent High Efficiency Membrane Maintenance Cleaning System and Method |
WO2011122175A1 (en) * | 2010-03-30 | 2011-10-06 | 株式会社神鋼環境ソリューション | Water treatment device and water treatment method |
JP4825933B1 (en) * | 2010-03-30 | 2011-11-30 | 株式会社神鋼環境ソリューション | Water treatment method |
CN102712507A (en) * | 2010-03-30 | 2012-10-03 | 株式会社神钢环境舒立净 | Water treatment device and water treatment method |
US8318020B2 (en) | 2006-03-16 | 2012-11-27 | Metawater Co., Ltd. | Washing method and apparatus of separation membrane |
US8506806B2 (en) | 2004-09-14 | 2013-08-13 | Siemens Industry, Inc. | Methods and apparatus for removing solids from a membrane module |
US8512568B2 (en) | 2001-08-09 | 2013-08-20 | Siemens Industry, Inc. | Method of cleaning membrane modules |
US8518256B2 (en) | 2001-04-04 | 2013-08-27 | Siemens Industry, Inc. | Membrane module |
US8622222B2 (en) | 2007-05-29 | 2014-01-07 | Siemens Water Technologies Llc | Membrane cleaning with pulsed airlift pump |
US8623202B2 (en) | 2007-04-02 | 2014-01-07 | Siemens Water Technologies Llc | Infiltration/inflow control for membrane bioreactor |
US8758621B2 (en) | 2004-03-26 | 2014-06-24 | Evoqua Water Technologies Llc | Process and apparatus for purifying impure water using microfiltration or ultrafiltration in combination with reverse osmosis |
US8758622B2 (en) | 2004-12-24 | 2014-06-24 | Evoqua Water Technologies Llc | Simple gas scouring method and apparatus |
US8790515B2 (en) | 2004-09-07 | 2014-07-29 | Evoqua Water Technologies Llc | Reduction of backwash liquid waste |
US8808540B2 (en) | 2003-11-14 | 2014-08-19 | Evoqua Water Technologies Llc | Module cleaning method |
JP2014171926A (en) * | 2013-03-06 | 2014-09-22 | Swing Corp | Desalination method and desalination apparatus |
US8858796B2 (en) | 2005-08-22 | 2014-10-14 | Evoqua Water Technologies Llc | Assembly for water filtration using a tube manifold to minimise backwash |
US8956464B2 (en) | 2009-06-11 | 2015-02-17 | Evoqua Water Technologies Llc | Method of cleaning membranes |
US9023206B2 (en) | 2008-07-24 | 2015-05-05 | Evoqua Water Technologies Llc | Frame system for membrane filtration modules |
US9022224B2 (en) | 2010-09-24 | 2015-05-05 | Evoqua Water Technologies Llc | Fluid control manifold for membrane filtration system |
US9533261B2 (en) | 2012-06-28 | 2017-01-03 | Evoqua Water Technologies Llc | Potting method |
US9604166B2 (en) | 2011-09-30 | 2017-03-28 | Evoqua Water Technologies Llc | Manifold arrangement |
CN106731864A (en) * | 2016-12-27 | 2017-05-31 | 贵阳时代沃顿科技有限公司 | A kind of device for the detection of dense net resistance tocrocking |
US9675938B2 (en) | 2005-04-29 | 2017-06-13 | Evoqua Water Technologies Llc | Chemical clean for membrane filter |
US9764288B2 (en) | 2007-04-04 | 2017-09-19 | Evoqua Water Technologies Llc | Membrane module protection |
US9764289B2 (en) | 2012-09-26 | 2017-09-19 | Evoqua Water Technologies Llc | Membrane securement device |
US9815027B2 (en) | 2012-09-27 | 2017-11-14 | Evoqua Water Technologies Llc | Gas scouring apparatus for immersed membranes |
US9914097B2 (en) | 2010-04-30 | 2018-03-13 | Evoqua Water Technologies Llc | Fluid flow distribution device |
US9925499B2 (en) | 2011-09-30 | 2018-03-27 | Evoqua Water Technologies Llc | Isolation valve with seal for end cap of a filtration system |
US9962865B2 (en) | 2012-09-26 | 2018-05-08 | Evoqua Water Technologies Llc | Membrane potting methods |
JP2018069169A (en) * | 2016-10-31 | 2018-05-10 | 株式会社清水合金製作所 | Portable water purifying treatment device capable of connecting with ro membrane unit |
US10322375B2 (en) | 2015-07-14 | 2019-06-18 | Evoqua Water Technologies Llc | Aeration device for filtration system |
US10427102B2 (en) | 2013-10-02 | 2019-10-01 | Evoqua Water Technologies Llc | Method and device for repairing a membrane filtration module |
-
2000
- 2000-02-21 JP JP2000042753A patent/JP2001232160A/en active Pending
Cited By (48)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8518256B2 (en) | 2001-04-04 | 2013-08-27 | Siemens Industry, Inc. | Membrane module |
US8512568B2 (en) | 2001-08-09 | 2013-08-20 | Siemens Industry, Inc. | Method of cleaning membrane modules |
US8808540B2 (en) | 2003-11-14 | 2014-08-19 | Evoqua Water Technologies Llc | Module cleaning method |
US8758621B2 (en) | 2004-03-26 | 2014-06-24 | Evoqua Water Technologies Llc | Process and apparatus for purifying impure water using microfiltration or ultrafiltration in combination with reverse osmosis |
US8790515B2 (en) | 2004-09-07 | 2014-07-29 | Evoqua Water Technologies Llc | Reduction of backwash liquid waste |
US8506806B2 (en) | 2004-09-14 | 2013-08-13 | Siemens Industry, Inc. | Methods and apparatus for removing solids from a membrane module |
JP2010058120A (en) * | 2004-12-24 | 2010-03-18 | Siemens Water Technologies Corp | Cleaning in membrane filtration system |
US8758622B2 (en) | 2004-12-24 | 2014-06-24 | Evoqua Water Technologies Llc | Simple gas scouring method and apparatus |
US9675938B2 (en) | 2005-04-29 | 2017-06-13 | Evoqua Water Technologies Llc | Chemical clean for membrane filter |
US8894858B1 (en) | 2005-08-22 | 2014-11-25 | Evoqua Water Technologies Llc | Method and assembly for water filtration using a tube manifold to minimize backwash |
US8858796B2 (en) | 2005-08-22 | 2014-10-14 | Evoqua Water Technologies Llc | Assembly for water filtration using a tube manifold to minimise backwash |
US8318020B2 (en) | 2006-03-16 | 2012-11-27 | Metawater Co., Ltd. | Washing method and apparatus of separation membrane |
JP2007275870A (en) * | 2006-03-16 | 2007-10-25 | Ngk Insulators Ltd | Separative membrane-cleaning method/device |
JP2007289899A (en) * | 2006-04-27 | 2007-11-08 | Meidensha Corp | Membrane washing method for membrane separation means, and water treatment apparatus |
US10266439B2 (en) | 2006-05-31 | 2019-04-23 | X-Flow B.V. | Method for cleaning membranes and an inlet side of a membrane filtration module of an apparatus having a bioreactor and membrane filtration module for treatment of an incoming fluid |
JP2009538733A (en) * | 2006-05-31 | 2009-11-12 | エックス−フロー ベー.フェー. | Apparatus for treatment of incoming fluid with bioreactor and membrane filtration module |
JP2008126223A (en) * | 2006-11-27 | 2008-06-05 | Meidensha Corp | Membrane treatment system |
US8623202B2 (en) | 2007-04-02 | 2014-01-07 | Siemens Water Technologies Llc | Infiltration/inflow control for membrane bioreactor |
US9764288B2 (en) | 2007-04-04 | 2017-09-19 | Evoqua Water Technologies Llc | Membrane module protection |
US10507431B2 (en) | 2007-05-29 | 2019-12-17 | Evoqua Water Technologies Llc | Membrane cleaning with pulsed airlift pump |
US8622222B2 (en) | 2007-05-29 | 2014-01-07 | Siemens Water Technologies Llc | Membrane cleaning with pulsed airlift pump |
US9573824B2 (en) | 2007-05-29 | 2017-02-21 | Evoqua Water Technologies Llc | Membrane cleaning with pulsed airlift pump |
US8840783B2 (en) | 2007-05-29 | 2014-09-23 | Evoqua Water Technologies Llc | Water treatment membrane cleaning with pulsed airlift pump |
US9206057B2 (en) | 2007-05-29 | 2015-12-08 | Evoqua Water Technologies Llc | Membrane cleaning with pulsed airlift pump |
US9023206B2 (en) | 2008-07-24 | 2015-05-05 | Evoqua Water Technologies Llc | Frame system for membrane filtration modules |
KR101050418B1 (en) | 2009-04-23 | 2011-07-19 | 주식회사 대우엔텍 | Intelligent High Efficiency Membrane Maintenance Cleaning System and Method |
US8956464B2 (en) | 2009-06-11 | 2015-02-17 | Evoqua Water Technologies Llc | Method of cleaning membranes |
CN102712507A (en) * | 2010-03-30 | 2012-10-03 | 株式会社神钢环境舒立净 | Water treatment device and water treatment method |
WO2011122175A1 (en) * | 2010-03-30 | 2011-10-06 | 株式会社神鋼環境ソリューション | Water treatment device and water treatment method |
JP4825933B1 (en) * | 2010-03-30 | 2011-11-30 | 株式会社神鋼環境ソリューション | Water treatment method |
US10441920B2 (en) | 2010-04-30 | 2019-10-15 | Evoqua Water Technologies Llc | Fluid flow distribution device |
US9914097B2 (en) | 2010-04-30 | 2018-03-13 | Evoqua Water Technologies Llc | Fluid flow distribution device |
US9630147B2 (en) | 2010-09-24 | 2017-04-25 | Evoqua Water Technologies Llc | Fluid control manifold for membrane filtration system |
US9022224B2 (en) | 2010-09-24 | 2015-05-05 | Evoqua Water Technologies Llc | Fluid control manifold for membrane filtration system |
US10391432B2 (en) | 2011-09-30 | 2019-08-27 | Evoqua Water Technologies Llc | Manifold arrangement |
US9925499B2 (en) | 2011-09-30 | 2018-03-27 | Evoqua Water Technologies Llc | Isolation valve with seal for end cap of a filtration system |
US11065569B2 (en) | 2011-09-30 | 2021-07-20 | Rohm And Haas Electronic Materials Singapore Pte. Ltd. | Manifold arrangement |
US9604166B2 (en) | 2011-09-30 | 2017-03-28 | Evoqua Water Technologies Llc | Manifold arrangement |
US9533261B2 (en) | 2012-06-28 | 2017-01-03 | Evoqua Water Technologies Llc | Potting method |
US9764289B2 (en) | 2012-09-26 | 2017-09-19 | Evoqua Water Technologies Llc | Membrane securement device |
US9962865B2 (en) | 2012-09-26 | 2018-05-08 | Evoqua Water Technologies Llc | Membrane potting methods |
US9815027B2 (en) | 2012-09-27 | 2017-11-14 | Evoqua Water Technologies Llc | Gas scouring apparatus for immersed membranes |
JP2014171926A (en) * | 2013-03-06 | 2014-09-22 | Swing Corp | Desalination method and desalination apparatus |
US10427102B2 (en) | 2013-10-02 | 2019-10-01 | Evoqua Water Technologies Llc | Method and device for repairing a membrane filtration module |
US11173453B2 (en) | 2013-10-02 | 2021-11-16 | Rohm And Haas Electronic Materials Singapores | Method and device for repairing a membrane filtration module |
US10322375B2 (en) | 2015-07-14 | 2019-06-18 | Evoqua Water Technologies Llc | Aeration device for filtration system |
JP2018069169A (en) * | 2016-10-31 | 2018-05-10 | 株式会社清水合金製作所 | Portable water purifying treatment device capable of connecting with ro membrane unit |
CN106731864A (en) * | 2016-12-27 | 2017-05-31 | 贵阳时代沃顿科技有限公司 | A kind of device for the detection of dense net resistance tocrocking |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2001232160A (en) | Membrane filter | |
US20090218285A1 (en) | Controls of a filtration system | |
JP2004249168A (en) | Operation method for water treatment device | |
JP3924919B2 (en) | Water filtration equipment | |
JP5866808B2 (en) | Water treatment system and cleaning control method for water treatment system | |
JP2006263501A (en) | System and method for cleaning membrane | |
JP5151009B2 (en) | Membrane separation device and membrane separation method | |
KR100235682B1 (en) | Reverse osmosis filtering type pure water system | |
JP2008126223A (en) | Membrane treatment system | |
TW202042897A (en) | Membrane separation active sludge system and membrane cleaning device | |
JPH11169851A (en) | Water filter and its operation | |
JP2006255708A (en) | Method for backwashing of hollow fiber membrane and hollow fiber membrane water treatment apparatus | |
JP5230074B2 (en) | Flow control method for water treatment equipment | |
JP2007245060A (en) | Method for detecting and testing membrane damage of filtration membrane | |
JPH081158A (en) | Method for operating water purification system and water purifier | |
JP4058867B2 (en) | Water purification system and method | |
JP3856376B2 (en) | Water treatment device and its operation method | |
CN209940634U (en) | Water dispenser capable of automatically flushing | |
JP2007245051A (en) | Method of cleaning filter membrane | |
JP4834435B2 (en) | Automatic cleaning method of strainer for water treatment equipment by membrane filtration | |
JP5230075B2 (en) | Filtration membrane cleaning method in water treatment equipment using filtration membrane | |
JP2006043655A (en) | Water treating apparatus and operation method therefor | |
JP4872391B2 (en) | Membrane separation device and membrane separation method | |
JP4829875B2 (en) | Membrane damage detection method and membrane filtration device | |
JP2009000585A (en) | Membrane filtration apparatus |