JP2001230172A5 - - Google Patents

Download PDF

Info

Publication number
JP2001230172A5
JP2001230172A5 JP2000039158A JP2000039158A JP2001230172A5 JP 2001230172 A5 JP2001230172 A5 JP 2001230172A5 JP 2000039158 A JP2000039158 A JP 2000039158A JP 2000039158 A JP2000039158 A JP 2000039158A JP 2001230172 A5 JP2001230172 A5 JP 2001230172A5
Authority
JP
Japan
Prior art keywords
plate
substrate
heat
processing apparatus
substrate processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000039158A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001230172A (ja
JP3998389B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2000039158A priority Critical patent/JP3998389B2/ja
Priority claimed from JP2000039158A external-priority patent/JP3998389B2/ja
Publication of JP2001230172A publication Critical patent/JP2001230172A/ja
Publication of JP2001230172A5 publication Critical patent/JP2001230172A5/ja
Application granted granted Critical
Publication of JP3998389B2 publication Critical patent/JP3998389B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2000039158A 2000-02-17 2000-02-17 基板処理装置 Expired - Fee Related JP3998389B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000039158A JP3998389B2 (ja) 2000-02-17 2000-02-17 基板処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000039158A JP3998389B2 (ja) 2000-02-17 2000-02-17 基板処理装置

Publications (3)

Publication Number Publication Date
JP2001230172A JP2001230172A (ja) 2001-08-24
JP2001230172A5 true JP2001230172A5 (https=) 2005-09-02
JP3998389B2 JP3998389B2 (ja) 2007-10-24

Family

ID=18562769

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000039158A Expired - Fee Related JP3998389B2 (ja) 2000-02-17 2000-02-17 基板処理装置

Country Status (1)

Country Link
JP (1) JP3998389B2 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3996845B2 (ja) * 2002-12-27 2007-10-24 大日本スクリーン製造株式会社 基板処理装置
JP4410147B2 (ja) 2005-05-09 2010-02-03 東京エレクトロン株式会社 加熱装置、塗布、現像装置及び加熱方法
JP4606355B2 (ja) 2006-03-14 2011-01-05 東京エレクトロン株式会社 熱処理装置、熱処理方法及び記憶媒体
CN110997974A (zh) * 2017-08-21 2020-04-10 堺显示器制品株式会社 蒸镀装置、蒸镀方法以及有机el显示装置的制造方法

Similar Documents

Publication Publication Date Title
JP4454638B2 (ja) ブロー成形用金型装置
JP6388041B2 (ja) 加熱装置および加熱方法
DE60114618D1 (de) Thermische ummantelung eines metallurgischen gefässes
JP2007515781A5 (https=)
NO992811D0 (no) Uavhengig benyttbar og flyttbar radiator og fremgangsmÕte til dens fremstilling
TWI275466B (en) Heating and cooling system for hot press mold and method for heating and cooling hot press mold
JP2001230172A5 (https=)
JP6406883B2 (ja) 真空熱処理システム
KR101492230B1 (ko) 유전자 증폭 시스템
TWI422483B (zh) 衝壓設備
KR102168837B1 (ko) 열전발전장치
JP5925550B2 (ja) 加熱装置
JP4735367B2 (ja) 射出成形装置
JP6037462B2 (ja) 加熱システム
RU2007120929A (ru) Способ охлаждения кристаллизатора при получении непрерывнолитых заготовок и кристаллизатор для получения непрерывнолитых заготовок
KR101051677B1 (ko) 진공 처리 장치용 냉각 장치
JP2005201606A (ja) 加熱装置
JP2010510649A (ja) 基層の熱処理方法及び熱処理装置
KR101699234B1 (ko) 연속소둔로의 스트립 냉각 장치 및 냉각 방법
JP3998389B2 (ja) 基板処理装置
JP2007050324A (ja) 加熱冷却装置
WO2013170495A1 (zh) 吹风装置及吹风装置的使用方法
CN210602842U (zh) 一种可利用工业热水余热的保温箱
KR200392484Y1 (ko) 열교환기
JP6459193B2 (ja) 蒸発器