JP2001226147A - Electrically conductive antireflection film and glass panel for cathode ray tube on which the film is deposited - Google Patents

Electrically conductive antireflection film and glass panel for cathode ray tube on which the film is deposited

Info

Publication number
JP2001226147A
JP2001226147A JP36161599A JP36161599A JP2001226147A JP 2001226147 A JP2001226147 A JP 2001226147A JP 36161599 A JP36161599 A JP 36161599A JP 36161599 A JP36161599 A JP 36161599A JP 2001226147 A JP2001226147 A JP 2001226147A
Authority
JP
Japan
Prior art keywords
layer
refractive index
thickness
film
geometric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP36161599A
Other languages
Japanese (ja)
Inventor
Yoshiharu Miwa
義治 三和
Tsutomu Imamura
努 今村
Toshimasa Kanai
敏正 金井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Electric Glass Co Ltd
Original Assignee
Nippon Electric Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Glass Co Ltd filed Critical Nippon Electric Glass Co Ltd
Priority to JP36161599A priority Critical patent/JP2001226147A/en
Publication of JP2001226147A publication Critical patent/JP2001226147A/en
Pending legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3668Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties
    • C03C17/3676Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties specially adapted for use as electromagnetic shield
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3435Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/70Properties of coatings
    • C03C2217/73Anti-reflective coatings with specific characteristics

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Electromagnetism (AREA)
  • Physics & Mathematics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Surface Treatment Of Glass (AREA)
  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PROBLEM TO BE SOLVED: To prepare an electrically conductive antireflection film which can attain reduction of reflected light and improvement of contrast, has excellent ability of antistatic effect and electromagnetic wave shielding and further is excellent in heat resistance and to provide a glass panel for a cathode ray tube on an outer surface of a face part of which the electrically conductive antireflection film is deposited. SOLUTION: The electrically conductive antireflection film contains four layers formed on a base body and is constituted by providing (in order starting from the base body side), a first layer which is a transparent layer having 1.4 to 2.3 refractive index and 0.5 to 250 nm geometrical thickness, a second layer which is a colored electrically conductive layer consisting essentially of a transition metal nitride and has 1.1 to 3.0 refractive index and 0.5 to 40 nm geometrical thickness, a third layer which is a transparent layer of 1.4 to 2.3 refractive index and has 0.5 to 100 nm geometrical thickness and further an external layer which is a transparent layer of 1.4 to 1.6 refractive index and has 50 to 140 nm geometrical thickness outside the third layer.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、導電性反射防止膜と、
この導電性反射防止膜がフェース部分の外表面に被覆形
成された陰極線管用ガラスパネルに関するものである。
BACKGROUND OF THE INVENTION The present invention relates to a conductive anti-reflection film,
The present invention relates to a glass panel for a cathode ray tube in which the conductive antireflection film is formed on the outer surface of the face portion.

【0002】[0002]

【従来の技術】従来、陰極線管には、反射光の低減やコ
ントラストの向上が要求されており、最近では、帯電を
防止すること、および人体に悪影響を及ぼす電磁波を遮
蔽することも求められるようになってきている。
2. Description of the Related Art Conventionally, a cathode ray tube has been required to reduce reflected light and to improve contrast. Recently, it has been required to prevent charging and to shield electromagnetic waves which have an adverse effect on the human body. It is becoming.

【0003】そのため、陰極線管の画像表示面であるガ
ラスパネルのフェース部分の外表面に導電性反射防止膜
を被覆形成することによって、反射光を低減し、コント
ラストを向上し、さらに帯電防止および電磁波遮蔽の機
能を付与することが提案されている。
[0003] Therefore, by forming a conductive anti-reflection coating on the outer surface of the face portion of the glass panel which is the image display surface of the cathode ray tube, the reflected light is reduced, the contrast is improved, and the antistatic and electromagnetic wave are prevented. It has been proposed to provide a shielding function.

【0004】例えば、特表平6−510382号公報に
は、基体側から順に、NbNを含む層、TiO2を含む
層、SiO2を含む層からなる導電性反射防止膜が提案
されている。
For example, Japanese Patent Publication No. Hei 6-510382 proposes a conductive antireflection film comprising a layer containing NbN, a layer containing TiO 2, and a layer containing SiO 2 in order from the substrate side.

【0005】また特開平9−156964号公報には、
基体側から順に、Ti、ZrおよびHfから選択された
金属の窒化物を主成分とする層、Si又はSiの窒化物
を主成分とする層、SiO2層からなる導電性反射防止
膜が提案されている。
Japanese Patent Application Laid-Open No. 9-156964 discloses that
In order from the substrate side, a conductive antireflection film comprising a layer mainly composed of a metal nitride selected from Ti, Zr and Hf, a layer mainly composed of Si or Si nitride, and a SiO 2 layer is proposed. Have been.

【0006】[0006]

【発明が解決しようとする課題】ところで、陰極線管を
生産する場合、基体となるガラスパネル上に、各種の機
能膜を形成した後で、ファンネルをフリットシールし、
さらに内部を排気するが、これらのシール工程や排気工
程では、400℃以上の熱処理が施される。
By the way, when producing a cathode ray tube, after forming various functional films on a glass panel as a base, the funnel is frit-sealed.
The inside is further evacuated. In these sealing and evacuation steps, a heat treatment at 400 ° C. or higher is performed.

【0007】しかしながら特表平6−510382号公
報や特開平9−156964号公報に開示された導電性
反射防止膜は、フェース部分の外表面の反射光を大幅に
低減しているうえ、更に着色層を有しているため、陰極
線管のコントラストを向上させることはできるが、耐熱
性が不十分であり、熱処理すると反射率や抵抗値が上昇
しやすく、所期の反射率や電磁波遮蔽能力が得られ難
い。
However, the conductive anti-reflection film disclosed in Japanese Patent Application Laid-Open No. 6-510382 and Japanese Patent Application Laid-Open No. 9-156964 greatly reduces the reflected light on the outer surface of the face portion, and furthermore, is colored. With the layer, the contrast of the cathode ray tube can be improved, but the heat resistance is insufficient, and the reflectance and the resistance value are easily increased by heat treatment, and the expected reflectance and the electromagnetic wave shielding ability are improved. It is hard to obtain.

【0008】本発明の目的は、反射光の低減とコントラ
ストの向上を図ることができ、優れた帯電防止性と電磁
波遮蔽との能力を有し、しかも耐熱性に優れた導電性反
射防止膜と、この導電性反射防止膜がフェース部分の外
表面に被覆形成された陰極線管用ガラスパネルを提供す
ることである。
It is an object of the present invention to provide a conductive antireflection film which can reduce reflected light and improve contrast, has excellent antistatic properties and electromagnetic wave shielding properties, and has excellent heat resistance. Another object of the present invention is to provide a glass panel for a cathode ray tube in which the conductive antireflection film is formed on the outer surface of the face portion.

【0009】[0009]

【課題を解決するための手段】本発明による第1の導電
性反射防止膜は、基体上に形成される4つの層を含み、
基体側から順に、屈折率が1.4〜2.3の透明層で、
0.5〜250nmの幾何学的厚みを有する第1の層
と、遷移金属窒化物を主成分とする屈折率が1.1〜
3.0の着色導電層で、0.5〜40nmの幾何学的厚
みを有する第2の層と、屈折率が1.4〜2.3の透明
層で、0.5〜100nmの幾何学的厚みを有する第3
の層とを備え、さらに第3の層の外側に、屈折率が1.
4〜1.6の透明層で、50〜140nmの幾何学的厚
みを有する外層を備えてなることを特徴とする。
SUMMARY OF THE INVENTION A first conductive anti-reflective coating according to the present invention includes four layers formed on a substrate,
In order from the substrate side, a transparent layer having a refractive index of 1.4 to 2.3,
A first layer having a geometric thickness of 0.5 to 250 nm;
A colored conductive layer of 3.0, a second layer having a geometric thickness of 0.5 to 40 nm, and a transparent layer having a refractive index of 1.4 to 2.3, a geometric layer of 0.5 to 100 nm. The third with the target thickness
And a third layer having a refractive index of 1.
It is characterized by comprising an outer layer having a geometrical thickness of 50 to 140 nm, which is a transparent layer of 4 to 1.6.

【0010】また本発明による第2の導電性反射防止膜
は、基体上に形成される5つの層を含み、基体側から順
に、屈折率が1.4〜2.3の透明層で、0.5〜25
0nmの幾何学的厚みを有する第1の層と、遷移金属窒
化物を主成分とする屈折率が1.1〜3.0の着色導電
層で、0.5〜40nmの幾何学的厚みを有する第2の
層と、屈折率が1.4〜2.3の透明層で、0.5〜1
00nmの幾何学的厚みを有する第3の層と、遷移金属
窒化物を主成分とする屈折率が1.1〜3.5の着色導
電層で、0.5〜40nmの幾何学的厚みを有する第4
の層とを備え、さらに第4の層の外側に、屈折率が1.
4〜1.6の透明層で、50〜140nmの幾何学的厚
みを有する外層を備えてなることを特徴とする。
The second conductive anti-reflection film according to the present invention includes five layers formed on a substrate, and is a transparent layer having a refractive index of 1.4 to 2.3 in order from the substrate side. .5-25
A first layer having a geometric thickness of 0 nm and a colored conductive layer having a refractive index of 1.1 to 3.0 and containing a transition metal nitride as a main component have a geometric thickness of 0.5 to 40 nm. And a transparent layer having a refractive index of 1.4 to 2.3.
A third layer having a geometric thickness of 00 nm and a colored conductive layer having a refractive index of 1.1 to 3.5 and containing a transition metal nitride as a main component, and having a geometric thickness of 0.5 to 40 nm. Fourth
And a refractive index of 1. outside the fourth layer.
It is characterized by comprising an outer layer having a geometrical thickness of 50 to 140 nm, which is a transparent layer of 4 to 1.6.

【0011】さらに本発明による第3の導電性反射防止
膜は、基体上に形成される6つの層を含み、基体側から
順に、屈折率が1.4〜2.3の透明層で、0.5〜2
50nmの幾何学的厚みを有する第1の層と、遷移金属
窒化物を主成分とする屈折率が1.1〜3.0の着色導
電層で、0.5〜40nmの幾何学的厚みを有する第2
の層と、屈折率が1.4〜2.3の透明層で、0.5〜
100nmの幾何学的厚みを有する第3の層と、遷移金
属窒化物を主成分とする屈折率が1.1〜3.5の着色
導電層で、0.5〜40nmの幾何学的厚みを有する第
4の層と、屈折率が1.4〜3.0の透明層で、0.5
〜40nmの幾何学的厚みを有する第5の層とを備え、
さらに第5の層の外側に、屈折率が1.4〜1.6の透
明層で、50〜140nmの幾何学的厚みを有する外層
を備えてなることを特徴とする。
Further, the third conductive anti-reflection film according to the present invention includes six layers formed on the substrate, and is a transparent layer having a refractive index of 1.4 to 2.3 in order from the substrate side. 0.5-2
A first layer having a geometric thickness of 50 nm and a colored conductive layer having a refractive index of 1.1 to 3.0 and containing a transition metal nitride as a main component have a geometric thickness of 0.5 to 40 nm. Having a second
And a transparent layer having a refractive index of 1.4 to 2.3.
A third layer having a geometric thickness of 100 nm and a colored conductive layer having a refractive index of 1.1 to 3.5 and containing a transition metal nitride as a main component have a geometric thickness of 0.5 to 40 nm. And a transparent layer having a refractive index of 1.4 to 3.0,
A fifth layer having a geometric thickness of 4040 nm;
Further, a transparent layer having a refractive index of 1.4 to 1.6 and an outer layer having a geometric thickness of 50 to 140 nm are provided outside the fifth layer.

【0012】また本発明の陰極線管用ガラスパネルは、
上記した5つの層、又は6つの層を含む導電性反射防止
膜がフェース部分の外表面に被覆形成され、フェース部
分の外表面の平均曲率半径がフェース部分の中央を通る
全放射方向において10000mm以上であり、肉厚を
10.16mmに換算した場合の波長550nmにおけ
る光透過率が70%以上のガラスからなることを特徴と
する。
Further, the glass panel for a cathode ray tube of the present invention comprises:
The conductive antireflection film including the above five layers or six layers is formed on the outer surface of the face portion, and the average radius of curvature of the outer surface of the face portion is 10,000 mm or more in all radial directions passing through the center of the face portion. , And is characterized by being made of glass having a light transmittance of 70% or more at a wavelength of 550 nm when the thickness is converted to 10.16 mm.

【0013】[0013]

【作用】以下、本発明の導電性反射防止膜について詳述
する。
The conductive antireflection film of the present invention will be described below in detail.

【0014】まず本発明による第1の導電性反射防止膜
について説明する。第1の導電性反射防止膜は4つの層
により形成されている。
First, the first conductive anti-reflection film according to the present invention will be described. The first conductive antireflection film is formed by four layers.

【0015】最も基体側に形成される第1の層は、屈折
率が1.4〜2.3の透明層で、0.5〜250nm
(好ましくは0.5〜100nm)の幾何学的厚みを有
しており、他の層との干渉効果により表面反射光を低減
する作用を有している。この第1の層の材料は、成膜
性、生産コスト等を考慮すると、SiO2、Si34
SiON、Si2ON2、Al23及びAlONの群から
選ばれた1種が適している。また、これらの膜材料から
なる第1の層が、直接基体上に成膜されると、膜と基体
との密着強度が向上し、膜剥がれが起こり難いという利
点もある。
The first layer formed closest to the substrate is a transparent layer having a refractive index of 1.4 to 2.3 and a refractive index of 0.5 to 250 nm.
(Preferably 0.5 to 100 nm) and has an effect of reducing surface reflected light by an interference effect with other layers. The material of the first layer is SiO 2 , Si 3 N 4 ,
One selected from the group consisting of SiON, Si 2 ON 2 , Al 2 O 3 and AlON is suitable. Further, when the first layer made of such a film material is formed directly on the substrate, there is an advantage that the adhesion strength between the film and the substrate is improved and the film is hardly peeled off.

【0016】また第2の層は、遷移金属窒化物を主成分
とする屈折率が1.1〜3.0の着色導電層で、0.5
〜40nmの幾何学的厚みを有しており、膜に導電性を
付与すると共に、他の層との干渉効果により、表面反射
光を低減し、可視光領域での低反射領域を広くする作用
を有する。さらに400℃以上の熱処理を施した後の抵
抗値の上昇を抑え、かつ光吸収膜としてコントラストを
向上させる作用も有している。この第2の層としては、
Ti、Zr、Hf、Nbから選択される金属の窒化物を
主成分とする膜が適しており、特にTiの窒化物を主成
分とする膜を使用すると、可視光領域での低反射領域が
広くなるため好ましい。尚、Tiの窒化物を主成分とす
る膜を使用する場合には、反射防止の点から、層中にお
けるTiに対するNの原子割合が0.75〜1.30と
することが望ましい。また、この層中に、Tiに対する
原子割合が0.5以下となるようにO(酸素)を含ませ
ると、導電性がより向上するため好ましい。
The second layer is a colored conductive layer containing a transition metal nitride as a main component and having a refractive index of 1.1 to 3.0.
It has a geometric thickness of 4040 nm, imparts conductivity to the film, reduces the surface reflected light by the interference effect with other layers, and widens the low-reflection region in the visible light region. Having. Further, it has an effect of suppressing an increase in resistance value after heat treatment at 400 ° C. or more and improving contrast as a light absorbing film. As this second layer,
A film mainly composed of a nitride of a metal selected from Ti, Zr, Hf and Nb is suitable. In particular, when a film mainly composed of a nitride of Ti is used, a low reflection region in a visible light region is reduced. It is preferable because it becomes wider. When a film containing Ti nitride as a main component is used, the atomic ratio of N to Ti in the layer is desirably 0.75 to 1.30 from the viewpoint of preventing reflection. It is preferable that O (oxygen) be contained in this layer so that the atomic ratio to Ti is 0.5 or less, since the conductivity is further improved.

【0017】さらに第3の層は、屈折率が1.4〜2.
3の透明層で、0.5〜100nm(好ましくは10〜
100nm)の幾何学的厚みを有しており、他の層との
干渉効果により表面反射光を低減する作用を有してい
る。この第3の層の材料は、成膜性、生産コスト等を考
慮すると、SiO2、Si34、SiON、Al23
びAlONの群から選ばれた1種が適している。特に第
1の層と第3の層の材料として、Si34を使用する
と、非常に優れた耐熱性が得られるため好ましい。
Further, the third layer has a refractive index of 1.4 to 2.
3 to 0.5 to 100 nm (preferably 10 to 100 nm).
100 nm), and has the effect of reducing surface reflected light due to the effect of interference with other layers. As the material of the third layer, one selected from the group consisting of SiO 2 , Si 3 N 4 , SiON, Al 2 O 3 and AlON is suitable in consideration of film forming properties, production costs, and the like. In particular, it is preferable to use Si 3 N 4 as a material for the first layer and the third layer, since extremely excellent heat resistance can be obtained.

【0018】また外層は、屈折率が1.4〜1.6の透
明層で、50〜140nmの幾何学的厚みを有してお
り、他の層との干渉効果により表面反射光を低減する作
用を有している。この外層は、成膜性、生産コストを考
慮すると、SiO2の層であることが好ましい。
The outer layer is a transparent layer having a refractive index of 1.4 to 1.6 and has a geometric thickness of 50 to 140 nm, and reduces surface reflected light by an interference effect with other layers. Has an action. This outer layer is preferably a SiO 2 layer in consideration of film forming properties and production costs.

【0019】ところで陰極線管用ガラスパネルの光透過
率は、陰極線管に映像を映し出した際の輝度とコントラ
ストに影響する。すなわち、陰極線管用ガラスパネルの
光透過率が高くなるほど、輝度は高くなるが、コントラ
ストが低下し、逆にガラスパネルの光透過率が低くなる
ほど、コントラストは向上するが、輝度が低下する。
Meanwhile, the light transmittance of the glass panel for a cathode ray tube affects the brightness and contrast when an image is projected on the cathode ray tube. That is, the higher the light transmittance of the glass panel for a cathode ray tube, the higher the brightness, but the lower the contrast, and conversely, the lower the light transmittance of the glass panel, the higher the contrast, but the lower the brightness.

【0020】近年、陰極線管用ガラスパネルのフェース
部分で外表面のフラット化が図られているが、フェース
部分の外表面がフラット化すればするほど、所望の機械
的強度を得る目的で、フェース部分の内表面の曲率半径
が小さくなるように設計される。その結果、フェース部
分の中央部の肉厚に比べて、周辺部の肉厚が非常に大き
くなる。
In recent years, the outer surface of the face portion of the glass panel for a cathode ray tube has been flattened. However, the flatter the outer surface of the face portion is, the more the face portion is required to obtain a desired mechanical strength. Are designed such that the radius of curvature of the inner surface of the is reduced. As a result, the thickness of the peripheral portion is much larger than the thickness of the central portion of the face portion.

【0021】従って、このようなフラットガラスパネル
を、光透過率の低いガラスから作製すると、フェース部
分の中央部と周辺部の肉厚差による光の透過量の違いが
大きくなり、中央部と周辺部の映像に輝度差が生じるこ
とになる。そのため、ガラスパネルを光透過率の高いガ
ラスから作製することによって、フェース部分の中央部
に比べて、周辺部の輝度が極端に低下することを防止
し、さらにフェース部分の外表面に着色膜を被覆形成す
ることによってコントラストを向上することが試みられ
ている。
Therefore, when such a flat glass panel is made of glass having a low light transmittance, the difference in the amount of transmitted light due to the difference in thickness between the central portion and the peripheral portion of the face portion becomes large, and the central portion and the peripheral portion become large. This causes a luminance difference in the video of the part. Therefore, by making the glass panel from a glass with high light transmittance, the brightness of the peripheral portion is prevented from being extremely reduced compared to the central portion of the face portion, and a colored film is formed on the outer surface of the face portion. Attempts have been made to improve contrast by coating.

【0022】しかしながら、上記した特表平6−510
382号公報や特開平9−156964号公報に開示さ
れた導電性反射防止膜は、フェース部分の裏面の反射光
を低減する効果が小さいという問題もある。この裏面反
射率は、光透過率の高いガラスほど高くなるため、上記
のような従来の導電性反射防止膜を光透過率の高いガラ
スから作製されたフラットガラスパネルのフェース部分
の外表面に被覆形成しても、裏面反射率の低減が図れ
ず、陰極線管に映し出された映像が二重に見えるという
致命的欠陥を招きやすい。
However, the above-mentioned Japanese Patent Application Laid-Open No. Hei 6-510 has been disclosed.
The conductive anti-reflection film disclosed in Japanese Patent Application Laid-Open No. 382 and Japanese Patent Application Laid-Open No. 9-156964 has a problem that the effect of reducing the reflected light on the back surface of the face portion is small. The higher the light transmittance of the glass, the higher the reflectance of the back surface. Therefore, the conventional conductive anti-reflection film as described above is coated on the outer surface of the face portion of the flat glass panel made of the glass having a high light transmittance. Even if it is formed, it is not possible to reduce the back surface reflectance, and it is likely to cause a fatal defect that the image projected on the cathode ray tube appears double.

【0023】そこで本発明においては、第2の導電性反
射防止膜として、第3の層と外層との間に、さらに遷移
金属酸化物を主成分とする屈折率が1.1〜3.5(好
ましくは1.1〜3.0)の着色導電層で、0.5〜4
0nmの幾何学的厚みを有する層(第4の層)を形成し
た。この層を加えることによって、他の層との干渉効果
により表面反射光と裏面反射光を低減することが可能で
ある。さらにこの層は、可視光領域での低反射領域を広
くする作用を有し、しかも光吸収膜としてコントラスト
を向上させる作用も有している。この第4の層として
は、Ti、Zr、Hf、Nbから選択される金属の窒化
物を主成分とする膜が使用でき、特にTiの窒化物を主
成分とする膜を使用すると、可視光領域での低反射領域
が広くなるため好ましい。尚、Tiの窒化物を主成分と
する膜を使用する場合には、反射防止の点から、層中に
おけるTiに対するNの原子割合が0.75〜1.30
であることが望ましい。また、第2の層と同様に、この
層中にTiに対する原子割合が0.5以下となるように
O(酸素)を含ませると、導電性がより向上するため好
ましい。
Therefore, in the present invention, as the second conductive anti-reflection film, between the third layer and the outer layer, a transition metal oxide as a main component and a refractive index of 1.1 to 3.5 are used. (Preferably 1.1 to 3.0) colored conductive layer, and 0.5 to 4
A layer (fourth layer) having a geometric thickness of 0 nm was formed. By adding this layer, it is possible to reduce the front surface reflected light and the back surface reflected light by an interference effect with other layers. Further, this layer has a function of widening a low reflection region in a visible light region, and also has a function of improving contrast as a light absorbing film. As the fourth layer, a film mainly composed of a nitride of a metal selected from Ti, Zr, Hf, and Nb can be used. This is preferable because the low reflection region in the region becomes wider. When a film containing a nitride of Ti as a main component is used, the atomic ratio of N to Ti in the layer is 0.75 to 1.30 from the viewpoint of preventing reflection.
It is desirable that Similarly to the second layer, it is preferable that O (oxygen) be contained in this layer so that the atomic ratio to Ti is 0.5 or less, since conductivity is further improved.

【0024】さらに本発明においては、第3の導電性反
射防止膜として上記した第4の層と外層との間に、屈折
率が1.4〜3.0の透明層で、0.5〜40nmの幾
何学的厚みを有する層(第5の層)を形成した。この層
を加えることによって、他の層との干渉効果により表面
反射光と裏面反射光を低減すると共に、400℃以上の
熱処理を施した後の反射率や抵抗値の上昇を抑えやすく
なる。この第5の層は、成膜性、生産コスト等を考慮す
ると、Si34、AlN、SiON、AlON、Ti
O、Ti23、TiO2、Ta25、CeO2、ZnO、
Nb25、Nd23、Sb23、HfO2、In23
びSnO2の群から選ばれた1種からなる層であること
が好ましい。特に窒化物であるSi34やAlNの層を
使用すると、この層が空気中の酸素のバリア層となり、
熱処理時におけるTiN層の酸化を完全に防止し、熱処
理後の膜の反射率や抵抗値をより一層低減しやすいため
好ましい。
Furthermore, in the present invention, a transparent layer having a refractive index of 1.4 to 3.0 and a refractive index of 0.5 to 3.0 is provided between the above-mentioned fourth layer as the third conductive antireflection film and the outer layer. A layer (fifth layer) having a geometric thickness of 40 nm was formed. By adding this layer, the front surface reflected light and the back surface reflected light are reduced by the interference effect with other layers, and the increase in the reflectance and the resistance after the heat treatment at 400 ° C. or more is easily suppressed. This fifth layer is made of Si 3 N 4 , AlN, SiON, AlON, Ti
O, Ti 2 O 3 , TiO 2 , Ta 2 O 5 , CeO 2 , ZnO,
It is preferably a layer composed of one selected from the group consisting of Nb 2 O 5 , Nd 2 O 3 , Sb 2 O 3 , HfO 2 , In 2 O 3 and SnO 2 . In particular, when a layer of nitride such as Si 3 N 4 or AlN is used, this layer becomes a barrier layer for oxygen in air,
This is preferable because the oxidation of the TiN layer during the heat treatment is completely prevented, and the reflectance and the resistance value of the film after the heat treatment are more easily reduced.

【0025】尚、本発明における幾何学的厚みとは、λ
/4等の光学的厚みと区別されるものであり、波長に依
存しない厚みを意味する。また本発明においては、上記
したような各膜層以外にも、膜の密着性をより向上させ
たり、色調を調整する目的で、付加的な薄膜層を適宜設
けることも可能である。
The geometric thickness in the present invention is λ
/ 4, etc., which means a thickness independent of wavelength. Further, in the present invention, in addition to the above-mentioned respective film layers, an additional thin film layer may be appropriately provided for the purpose of further improving the adhesion of the film or adjusting the color tone.

【0026】本発明の導電性反射防止膜の成膜方法とし
ては、一般的な薄膜形成手段が使用できる。例えばスパ
ッタリング法、真空蒸着法、CVD法、スピンコート
法、ゾルゲル法等が適用できるが、大面積化が容易であ
ることや膜厚を制御しやすいことを考慮すると、スパッ
タリング法が最も好ましい。
As a method for forming the conductive antireflection film of the present invention, a general thin film forming means can be used. For example, a sputtering method, a vacuum evaporation method, a CVD method, a spin coating method, a sol-gel method, or the like can be applied, but the sputtering method is most preferable in consideration of easy area enlargement and easy control of the film thickness.

【0027】次に、本発明による陰極線管用ガラスパネ
ルについて説明する。
Next, the glass panel for a cathode ray tube according to the present invention will be described.

【0028】本発明における陰極線管用ガラスパネル
は、フェース部分の外表面の平均曲率半径を、フェース
部分の中央を通る全放射方向において10000mm以
上に限定した、所謂フラットパネルタイプのものであ
り、ガラスパネルの強度の点から内表面の曲率半径を小
さくし、その外表面に上述した本発明による第2、第3
の導電性反射防止膜を被覆している。
The glass panel for a cathode ray tube according to the present invention is of a so-called flat panel type in which the average radius of curvature of the outer surface of the face portion is limited to 10,000 mm or more in all radial directions passing through the center of the face portion. The radius of curvature of the inner surface is reduced in view of the strength of the second and third surfaces according to the present invention described above.
Of a conductive anti-reflection film.

【0029】一方、外表面の平均曲率半径の値が100
00mm未満のガラスパネルでは、フェース部分の外表
面が若干湾曲面となり、内表面の曲率半径を大きくする
ことができるため、上述した裏面反射率の低減を図るこ
とが可能な第2、第3の導電性反射防止膜は不要であ
る。すなわち、このような陰極線管用ガラスパネルは、
フェース部分の中央部と周辺部の肉厚差を小さくするこ
とができるため、敢えて光透過率の高いガラス、つまり
裏面反射の起こりやすいガラスを使用する必要がないか
らである。
On the other hand, when the value of the average radius of curvature of the outer surface is 100
In a glass panel of less than 00 mm, the outer surface of the face portion becomes a slightly curved surface, and the radius of curvature of the inner surface can be increased. No conductive anti-reflection film is required. That is, such a glass panel for a cathode ray tube,
This is because the difference in thickness between the central portion and the peripheral portion of the face portion can be reduced, so that it is not necessary to use a glass having a high light transmittance, that is, a glass that easily reflects on the back surface.

【0030】さらに本発明における陰極線管用ガラスパ
ネルは、肉厚を10.16mmに換算した場合の波長5
50nmにおけるガラスの光透過率を70%以上に限定
している。その理由は、光透過率が70%未満のガラス
から上記のようなフラットパネルガラスを作製した場
合、フェース部分の中央部と周辺部の映像に輝度差が生
じるので、これを避けるためである。
Further, the glass panel for a cathode ray tube according to the present invention has a wavelength of 5 when converted to a thickness of 10.16 mm.
The light transmittance of the glass at 50 nm is limited to 70% or more. The reason is that when the flat panel glass as described above is manufactured from glass having a light transmittance of less than 70%, a luminance difference occurs between the center portion and the peripheral portion of the face portion, and this is avoided.

【0031】[0031]

【実施例】以下、本発明を実施例及び比較例に基づいて
詳細に説明する。
The present invention will be described below in detail based on examples and comparative examples.

【0032】表1〜5は、実施例の導電性反射防止膜
(試料No.1〜17)と比較例の導電性反射防止膜
(試料No.18)を示すものである。各表には、各試
料の膜構成、熱処理前後の表面反射率と抵抗値を示し
た。また表2〜5には、各試料の熱処理後の裏面反射率
も示した。
Tables 1 to 5 show the conductive anti-reflection coatings of the examples (Sample Nos. 1 to 17) and the conductive anti-reflection coatings of Comparative Examples (Sample No. 18). In each table, the film configuration of each sample, the surface reflectance before and after the heat treatment, and the resistance value are shown. Tables 2 to 5 also show the back surface reflectance of each sample after the heat treatment.

【0033】[0033]

【表1】 [Table 1]

【0034】[0034]

【表2】 [Table 2]

【0035】[0035]

【表3】 [Table 3]

【0036】[0036]

【表4】 [Table 4]

【0037】[0037]

【表5】 [Table 5]

【0038】表1〜5の各導電性反射防止膜は、次のよ
うにして作製した。
Each of the conductive antireflection films shown in Tables 1 to 5 was prepared as follows.

【0039】まず、図1に示すように、フェース部分の
外表面における平均曲率半径の最小値(フェース部分の
中央を通る全放射方向において)が50000mmで、
肉厚を10.16mmに換算した場合の波長550nm
における光透過率が80%のガラスからなる陰極線管用
ガラスパネル(17インチサイズ)10を準備し、その
フェース部分の外表面にマグネトロンスパッタコート装
置を用いて、各表に示すような3層乃至6層構造の導電
性反射防止膜11を形成した。表中の膜構成の欄には、
各膜層の材料と、幾何学的厚みを示した。尚、No.2
の試料の第2層は、Ti:N:O=1:0.93:0.
19の原子比とした。
First, as shown in FIG. 1, the minimum value of the average radius of curvature on the outer surface of the face portion (in all radial directions passing through the center of the face portion) is 50,000 mm.
Wavelength 550 nm when the thickness is converted to 10.16 mm
A glass panel (17-inch size) 10 for a cathode ray tube made of glass having a light transmittance of 80% is prepared. A conductive antireflection film 11 having a layer structure was formed. In the column of membrane composition in the table,
The material of each film layer and the geometric thickness are shown. In addition, No. 2
The sample had a second layer of Ti: N: O = 1: 0.93: 0.
The atomic ratio was 19.

【0040】こうして得られた各試料を箱型電気炉に入
れ、450℃、60分間の熱処理を行い、熱処理前後の
表面反射率と抵抗値、及び熱処理後の裏面反射率を測定
すると共に、密着強度を判定した。
Each sample thus obtained was placed in a box-type electric furnace, and heat-treated at 450 ° C. for 60 minutes. The surface reflectance and resistance before and after the heat treatment, and the back surface reflectance after the heat treatment were measured. The strength was determined.

【0041】その結果、実施例であるNo.1〜17の
各試料は、比較例であるNo.18の試料に比べて、熱
処理を施した後の波長550nmと620nmにおける
表面反射率と抵抗値が大幅に低く、また膜とガラスパネ
ルとの密着強度にも優れていた。しかも実施例のNo.
5〜17の各試料は、裏面反射率も低いため、陰極線管
の映像の二重映りを防止できると推定される。また各試
料とも、着色層を有しているため、高いコントラストが
得られることが理解できる。
As a result, in Example No. Each sample of Nos. 1 to 17 was No. 1 as a comparative example. As compared with the sample No. 18, the surface reflectance and the resistance at wavelengths of 550 nm and 620 nm after the heat treatment were significantly lower, and the adhesion strength between the film and the glass panel was excellent. Moreover, in the example No.
Since each of the samples Nos. 5 to 17 also has a low back surface reflectance, it is presumed that double reflection of an image of a cathode ray tube can be prevented. In addition, since each sample has a colored layer, it can be understood that high contrast can be obtained.

【0042】尚、各表中の表面反射率は、瞬間マルチ反
射率測定器を用いて15゜正反射を測定したものであ
る。
The surface reflectance in each table is obtained by measuring 15 ° regular reflection using an instantaneous multi-reflectometer.

【0043】また抵抗値は、ガラスパネルのフェース部
分の短辺側の中央部に超音波ハンダで電極を取り付け、
電極間の抵抗をテスターで測定したものである。
The resistance value is determined by attaching an electrode to the center of the face portion of the glass panel on the short side with an ultrasonic solder.
The resistance between the electrodes was measured with a tester.

【0044】さらに裏面反射率は、瞬間マルチ反射率測
定器を用い、ガラスの反射率と吸収率を考慮して求めた
ものである。
Further, the back surface reflectivity was determined by using an instantaneous multi-reflectance measuring device in consideration of the reflectivity and the absorptivity of the glass.

【0045】また密着強度は、消しゴムによる耐擦傷テ
スト(9.8N荷重、200往復)を行うことによって
求めたものであり、テスト後に膜剥がれが確認されない
場合は○、一部でも膜剥がれが確認された場合は×で表
した。
The adhesion strength was determined by performing a scratch resistance test with an eraser (9.8 N load, 200 reciprocations). When no peeling was observed after the test, ○ was observed. When it was done, it was represented by x.

【0046】[0046]

【発明の効果】以上説明したように本発明の導電性反射
防止膜は、反射光の低減、コントラストの向上、帯電防
止及び電磁波遮蔽について優れた能力を有し、耐熱性に
優れ、400℃以上の熱処理を施した後の表面反射率や
抵抗値が低いため、陰極線管のガラスパネル上に成膜さ
れる導電性反射防止膜として好適である。
As described above, the conductive anti-reflection film of the present invention has excellent ability to reduce reflected light, improve contrast, prevent electrostatic charge and shield electromagnetic waves, has excellent heat resistance, and is 400 ° C. or more. Since the surface reflectance and the resistance value after the heat treatment are low, it is suitable as a conductive antireflection film formed on a glass panel of a cathode ray tube.

【0047】また、この導電性反射防止膜は、陰極線管
以外にも、成膜後に高温の熱処理が施される液晶ディス
プレイ基板やプラズマディスプレイ基板等の各種ディス
プレイ基板にも適用可能である。
The conductive antireflection film can be applied to various display substrates such as a liquid crystal display substrate and a plasma display substrate, which are subjected to a high-temperature heat treatment after film formation, in addition to the cathode ray tube.

【0048】さらに本発明の5つ、又は6つの層を含む
導電性反射防止膜は、光透過率の高い陰極線管用ガラス
パネルのフェース部分の外表面に被覆形成しても、裏面
反射率が低く、陰極線管の映像が二重に見えるのを防止
できるため、フェース部分の外表面が平坦な陰極線管用
フラットガラスパネルに成膜される導電性反射防止膜と
して好適である。
Further, even if the conductive anti-reflection film of the present invention including five or six layers is coated on the outer surface of the face portion of the glass panel for a cathode ray tube having high light transmittance, the back surface reflectance is low. Since the image of the cathode ray tube can be prevented from being seen double, it is suitable as a conductive antireflection film formed on a flat glass panel for a cathode ray tube having a flat outer surface of a face portion.

【0049】また、本発明の陰極線管用ガラスパネル
は、フェース部分の中央を通る全放射方向におけるフェ
ース部分の外表面の平均曲率半径が10000mm以上
のフラットガラスパネルであるが、肉厚を10.16m
mに換算した場合の波長550nmにおける光透過率が
70%以上のガラスから形成されている。そのため、こ
のガラスパネルは、フェース部の中央部と周辺部の輝度
差が小さい。しかもフェース部分の外表面に上記した5
つ、又は6つの層を含む導電性反射防止膜が被覆形成さ
れてなるため、表面反射率が低く、コントラストが高
く、優れた帯電防止性と電磁波遮蔽性を有し、さらに裏
面反射率が低いため、映像が二重に見えることのない陰
極線管を得ることが可能となる。
Further, the glass panel for a cathode ray tube of the present invention is a flat glass panel having an outer surface of the face portion having an average radius of curvature of 10,000 mm or more in all radial directions passing through the center of the face portion, but having a thickness of 10.16 m.
It is formed of glass having a light transmittance of 70% or more at a wavelength of 550 nm when converted to m. Therefore, in this glass panel, the difference in luminance between the central portion and the peripheral portion of the face portion is small. Moreover, the above-mentioned 5 is provided on the outer surface of the face portion.
Or a conductive anti-reflection film containing six layers is formed by coating, so that the surface reflectance is low, the contrast is high, the anti-static property and the electromagnetic wave shielding property are excellent, and the back face reflectance is low. Therefore, it is possible to obtain a cathode ray tube in which an image does not look double.

【図面の簡単な説明】[Brief description of the drawings]

【図1】陰極線管用ガラスパネルを示す縦断面図であ
る。
FIG. 1 is a longitudinal sectional view showing a glass panel for a cathode ray tube.

【符号の説明】[Explanation of symbols]

10 陰極線管用ガラスパネル 11 導電性反射防止膜 10 Glass panel for cathode ray tube 11 Conductive anti-reflective coating

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H01J 29/88 G02B 1/10 A (31)優先権主張番号 特願平11−350096 (32)優先日 平成11年12月9日(1999.12.9) (33)優先権主張国 日本(JP) Fターム(参考) 2K009 AA07 AA08 BB02 CC02 CC03 DD03 DD04 EE01 EE03 4G059 AA06 AC04 AC08 AC11 EA01 EA05 EA12 GA02 GA04 GA12 5C032 AA02 DD02 DE01 DF01 DF03 DF05 DG01 DG02 5G435 AA02 BB02 FF14 GG11 GG33 HH03 HH12 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme court ゛ (Reference) H01J 29/88 G02B 1/10 A (31) Priority claim number Japanese Patent Application No. 11-350096 (32) Priority date December 9, 1999 (12.9 December 1999) (33) Countries claiming priority Japan (JP) F-term (reference) 2K009 AA07 AA08 BB02 CC02 CC03 DD03 DD04 EE01 EE03 4G059 AA06 AC04 AC08 AC11 EA01 EA05 EA12 GA02 GA04 GA12 5C032 AA02 DD02 DE01 DF01 DF03 DF05 DG01 DG02 5G435 AA02 BB02 FF14 GG11 GG33 HH03 HH12

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 基体上に形成される4つの層を含み、基
体側から順に、屈折率が1.4〜2.3の透明層で、
0.5〜250nmの幾何学的厚みを有する第1の層
と、遷移金属窒化物を主成分とする屈折率が1.1〜
3.0の着色導電層で、0.5〜40nmの幾何学的厚
みを有する第2の層と、屈折率が1.4〜2.3の透明
層で、0.5〜100nmの幾何学的厚みを有する第3
の層とを備え、さらに第3の層の外側に、屈折率が1.
4〜1.6の透明層で、50〜140nmの幾何学的厚
みを有する外層を備えてなることを特徴とする導電性反
射防止膜。
1. A transparent layer comprising four layers formed on a substrate and having a refractive index of 1.4 to 2.3 in order from the substrate side.
A first layer having a geometric thickness of 0.5 to 250 nm;
A colored conductive layer of 3.0, a second layer having a geometric thickness of 0.5 to 40 nm, and a transparent layer having a refractive index of 1.4 to 2.3, a geometric layer of 0.5 to 100 nm. The third with the target thickness
And a third layer having a refractive index of 1.
A conductive anti-reflection film comprising a transparent layer having a thickness of 4 to 1.6 and an outer layer having a geometric thickness of 50 to 140 nm.
【請求項2】 基体上に形成される5つの層を含み、基
体側から順に、屈折率が1.4〜2.3の透明層で、
0.5〜250nmの幾何学的厚みを有する第1の層
と、遷移金属窒化物を主成分とする屈折率が1.1〜
3.0の着色導電層で、0.5〜40nmの幾何学的厚
みを有する第2の層と、屈折率が1.4〜2.3の透明
層で、0.5〜100nmの幾何学的厚みを有する第3
の層と、遷移金属窒化物を主成分とする屈折率が1.1
〜3.5の着色導電層で、0.5〜40nmの幾何学的
厚みを有する第4の層とを備え、さらに第4の層の外側
に、屈折率が1.4〜1.6の透明層で、50〜140
nmの幾何学的厚みを有する外層を備えてなることを特
徴とする導電性反射防止膜。
2. A transparent layer including five layers formed on a substrate and having a refractive index of 1.4 to 2.3 in order from the substrate side.
A first layer having a geometric thickness of 0.5 to 250 nm;
A colored conductive layer of 3.0, a second layer having a geometric thickness of 0.5 to 40 nm, and a transparent layer having a refractive index of 1.4 to 2.3, a geometric layer of 0.5 to 100 nm. The third with the target thickness
Layer having a refractive index of 1.1 mainly containing a transition metal nitride.
And a fourth layer having a geometric thickness of 0.5 to 40 nm, and further having a refractive index of 1.4 to 1.6 outside the fourth layer. 50-140 with transparent layer
A conductive anti-reflection film comprising an outer layer having a geometric thickness of nm.
【請求項3】 基体上に形成される6つの層を含み、基
体側から順に、屈折率が1.4〜2.3の透明層で、
0.5〜250nmの幾何学的厚みを有する第1の層
と、遷移金属窒化物を主成分とする屈折率が1.1〜
3.0の着色導電層で、0.5〜40nmの幾何学的厚
みを有する第2の層と、屈折率が1.4〜2.3の透明
層で、0.5〜100nmの幾何学的厚みを有する第3
の層と、遷移金属窒化物を主成分とする屈折率が1.1
〜3.5の着色導電層で、0.5〜40nmの幾何学的
厚みを有する第4の層と、屈折率が1.4〜3.0の透
明層で、0.5〜40nmの幾何学的厚みを有する第5
の層とを備え、さらに第5の層の外側に、屈折率が1.
4〜1.6の透明層で、50〜140nmの幾何学的厚
みを有する外層を備えてなることを特徴とする導電性反
射防止膜。
3. A transparent layer having six layers formed on a substrate and having a refractive index of 1.4 to 2.3 in order from the substrate side.
A first layer having a geometric thickness of 0.5 to 250 nm;
A colored conductive layer of 3.0, a second layer having a geometric thickness of 0.5 to 40 nm, and a transparent layer having a refractive index of 1.4 to 2.3, a geometric layer of 0.5 to 100 nm. The third with the target thickness
And a layer having a refractive index of 1.1 containing a transition metal nitride as a main component.
A colored conductive layer having a geometrical thickness of 0.5 to 40 nm; a transparent layer having a refractive index of 1.4 to 3.0; Fifth with geometric thickness
And a refractive index of 1. outside the fifth layer.
A conductive anti-reflection film comprising a transparent layer of 4-1.6 and an outer layer having a geometric thickness of 50-140 nm.
【請求項4】 請求項2および請求項3のいずれか一つ
に記載される導電性反射防止膜がフェース部分の外表面
に被覆形成され、フェース部分の外表面の平均曲率半径
がフェース部分の中央を通る全放射方向において100
00mm以上であり、肉厚を10.16mmに換算した
場合の波長550nmにおける光透過率が70%以上の
ガラスからなることを特徴とする陰極線管用ガラスパネ
ル。
4. The conductive antireflection film according to claim 2 is formed on the outer surface of the face portion, and the average radius of curvature of the outer surface of the face portion is equal to that of the face portion. 100 in all radial directions through the center
A glass panel for a cathode ray tube, wherein the glass panel has a light transmittance of 70% or more at a wavelength of 550 nm when converted to a thickness of not less than 00 mm and 10.16 mm.
JP36161599A 1998-12-28 1999-12-20 Electrically conductive antireflection film and glass panel for cathode ray tube on which the film is deposited Pending JP2001226147A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP36161599A JP2001226147A (en) 1998-12-28 1999-12-20 Electrically conductive antireflection film and glass panel for cathode ray tube on which the film is deposited

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
JP37351098 1998-12-28
JP10248599 1999-04-09
JP23470799 1999-08-20
JP11-350096 1999-12-09
JP11-102485 1999-12-09
JP11-234707 1999-12-09
JP10-373510 1999-12-09
JP35009699 1999-12-09
JP36161599A JP2001226147A (en) 1998-12-28 1999-12-20 Electrically conductive antireflection film and glass panel for cathode ray tube on which the film is deposited

Publications (1)

Publication Number Publication Date
JP2001226147A true JP2001226147A (en) 2001-08-21

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ID=27526090

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
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Cited By (6)

* Cited by examiner, † Cited by third party
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WO2005059602A1 (en) * 2003-12-18 2005-06-30 Asahi Glass Company, Limited Light absorptive antireflector
FR3068031A1 (en) * 2017-06-26 2018-12-28 Saint-Gobain Glass France GLAZING WITH ANTISOLAR PROPERTIES COMPRISING A TITANIUM OXYNITRIDE LAYER
FR3090622A1 (en) * 2018-12-21 2020-06-26 Saint-Gobain Glass France Solar control glazing comprising two layers based on titanium nitride
WO2021123618A1 (en) * 2019-12-18 2021-06-24 Saint-Gobain Glass France Photocatalytic glazing comprising a titanium nitride-based layer
EP3925938A1 (en) * 2020-06-19 2021-12-22 Saint-Gobain Glass France Heatable low-e glazing comprising two layers based on titanium nitride
WO2023047069A1 (en) * 2021-09-27 2023-03-30 Saint-Gobain Glass France Solar-control glazing comprising a titanium nitride-based layer

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005059602A1 (en) * 2003-12-18 2005-06-30 Asahi Glass Company, Limited Light absorptive antireflector
JPWO2005059602A1 (en) * 2003-12-18 2007-12-13 旭硝子株式会社 Light-absorbing antireflection
FR3068031A1 (en) * 2017-06-26 2018-12-28 Saint-Gobain Glass France GLAZING WITH ANTISOLAR PROPERTIES COMPRISING A TITANIUM OXYNITRIDE LAYER
FR3090622A1 (en) * 2018-12-21 2020-06-26 Saint-Gobain Glass France Solar control glazing comprising two layers based on titanium nitride
WO2021123618A1 (en) * 2019-12-18 2021-06-24 Saint-Gobain Glass France Photocatalytic glazing comprising a titanium nitride-based layer
FR3105211A1 (en) * 2019-12-18 2021-06-25 Saint-Gobain Glass France Photocatalytic glazing comprising a layer based on titanium nitride
EP3925938A1 (en) * 2020-06-19 2021-12-22 Saint-Gobain Glass France Heatable low-e glazing comprising two layers based on titanium nitride
WO2021255079A1 (en) * 2020-06-19 2021-12-23 Saint-Gobain Glass France Heatable low-e glazing comprising two layers based on titanium nitride
WO2023047069A1 (en) * 2021-09-27 2023-03-30 Saint-Gobain Glass France Solar-control glazing comprising a titanium nitride-based layer
FR3127490A1 (en) * 2021-09-27 2023-03-31 Saint-Gobain Glass France SOLAR CONTROL GLAZING COMPRISING A TITANIUM NITRIDE-BASED LAYER

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