JP2001223369A - End face incident waveguide type semiconductor photodetector and light receiving module using the same - Google Patents
End face incident waveguide type semiconductor photodetector and light receiving module using the sameInfo
- Publication number
- JP2001223369A JP2001223369A JP2000038039A JP2000038039A JP2001223369A JP 2001223369 A JP2001223369 A JP 2001223369A JP 2000038039 A JP2000038039 A JP 2000038039A JP 2000038039 A JP2000038039 A JP 2000038039A JP 2001223369 A JP2001223369 A JP 2001223369A
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- Prior art keywords
- light
- light receiving
- semiconductor
- receiving element
- waveguide type
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Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は光通信分野等に用い
られる端面入射型の半導体受光素子、光モジュール、お
よび光伝送装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an edge-illuminated semiconductor light receiving element, an optical module, and an optical transmission device used in the field of optical communication and the like.
【0002】[0002]
【従来の技術】近年、一般家庭への情報サービスの拡充
を図るため、加入者系光伝送システムの開発が進められ
ている。各家庭への設置という観点から、本システムに
使用される光モジュールには低価格化が要求されてい
る。これには同一基板上に簡易な実装方式で集積化可能
な発光素子、受光素子が必須である。半導体レーザダイ
オード、光変調器、あるいは光スイッチ等に代表される
光デバイスは導波路構造を有し、光を基板面内平行方向
に入出射するものである。一方、半導体受光素子は一般
に基板面内に垂直な方向から光信号を受光する面受光型
である。面受光型の半導体受光素子は他の光デバイスと
光信号の入出射方向が異なるため、同一基板上への集積
化が困難である。2. Description of the Related Art In recent years, a subscriber optical transmission system has been developed in order to expand an information service to general households. From the viewpoint of installation in each home, the optical module used in the present system is required to be reduced in price. For this, a light emitting element and a light receiving element that can be integrated on the same substrate by a simple mounting method are essential. 2. Description of the Related Art An optical device typified by a semiconductor laser diode, an optical modulator, an optical switch, or the like has a waveguide structure and emits light in and out of a substrate in a parallel direction. On the other hand, a semiconductor light receiving element is generally a surface light receiving type that receives an optical signal from a direction perpendicular to the substrate surface. Since the surface light receiving type semiconductor light receiving element has a different optical signal input / output direction from other optical devices, it is difficult to integrate them on the same substrate.
【0003】上記問題を解決するために、端面入射型の
半導体受光素子の開発が進められている。信号光との高
い光結合効率と低電圧動作化の両立が課題となるが、電
子情報通信学会エレクトロニクスソサエティ大会、C−
334、「表面実装向けInGaAlAs導波路型PI
N−PDの高効率、高信頼化」、1996年にて、幅4
0μm、長さ100μmの受光部を有し、外部量子効率
0.92A/Wの導波路型受光素子が報告されている。In order to solve the above problem, development of an edge-illuminated type semiconductor light receiving element has been advanced. The challenge is to achieve both high optical coupling efficiency with signal light and low voltage operation. However, the IEICE Electronics Society Conference, C-
334, "InGaAlAs waveguide type PI for surface mounting
N-PD with High Efficiency and High Reliability ”, 1996, width 4
A waveguide type light receiving element having a light receiving portion of 0 μm and a length of 100 μm and having an external quantum efficiency of 0.92 A / W has been reported.
【0004】[0004]
【発明が解決しようとする課題】上記従来技術の一例を
図8に示す。図8において、受光部メサ82の幅をW、
長さをLとする。受光部メサの静電容量Cは、受光部メ
サ面積をS、動作時の空乏層幅をd、光吸収層の誘電率
をεとすると、C=εS/dである。上記従来技術で
は、Wが入射光の進行方向に対し一定であり、S=W
L、C=εWL/dであった。このため、水平方向光結
合トレランス幅、受光感度を増大させるためにW,Lを
増大させると静電容量Cが大きくなり高速動作が困難に
なるという問題があった。FIG. 8 shows an example of the above prior art. In FIG. 8, the width of the light receiving unit mesa 82 is W,
Let L be the length. The capacitance C of the light receiving portion mesa is C = εS / d, where S is the light receiving portion mesa area, d is the depletion layer width during operation, and ε is the dielectric constant of the light absorbing layer. In the above prior art, W is constant with respect to the traveling direction of the incident light, and S = W
L and C = εWL / d. Therefore, when W and L are increased in order to increase the horizontal optical coupling tolerance width and the light receiving sensitivity, there is a problem that the capacitance C increases and high-speed operation becomes difficult.
【0005】本発明の目的は、高い水平方向光結合トレ
ランス幅、高い受光感度を得ると同時に、静電容量の低
減が可能な、端面入射型受光素子を提供することであ
る。さらに、これを受光素子として用いる発光素子モジ
ュールあるいは光受信モジュールを提供することであ
る。An object of the present invention is to provide an edge-illuminated light-receiving element which can obtain a high horizontal optical coupling tolerance width and a high light-receiving sensitivity, and at the same time, reduce the capacitance. Still another object of the present invention is to provide a light emitting element module or a light receiving module using the same as a light receiving element.
【0006】[0006]
【課題を解決するための手段】本発明では、上記課題を
解決するために、半導体基板の一方の面上に、光を吸収
する光吸収層とそれをはさんでその光吸収層より屈折率
が低い半導体層から構成されているコア層とを備えた半
導体メサ部を有し、半導体メサ部側面の一部を受光端面
とする端面入射導波路型受光素子であって、半導体メサ
部の幅が、上記受光端面から入射光の進行方向に沿って
減少していることを特徴とする。According to the present invention, in order to solve the above-mentioned problems, a light-absorbing layer for absorbing light and a refractive index higher than the light-absorbing layer with the light-absorbing layer interposed therebetween are provided on one surface of the semiconductor substrate. A light receiving element having a semiconductor mesa portion having a core layer composed of a low semiconductor layer, and having a part of the side surface of the semiconductor mesa portion as a light receiving end surface, wherein the width of the semiconductor mesa portion is Is reduced along the traveling direction of incident light from the light receiving end face.
【0007】[0007]
【発明の実施の形態】以下に本発明を実施例により説明
する。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to embodiments.
【0008】図1にInGaAlAs系化合物半導体を
用いた本発明の一実施例の斜視構造を示す。p−InP
基板11上に分子線エピタキシ(MBE)法により、p
−InAlAsバッファ層19(厚さ0.7μm)、p
−InAlGaAs下部第2コア層18(厚さ2μm、
バンドギャップ波長1.1μm)、アンドープInAl
GaAs光吸収層13(厚さ2μm、バンドギャップ波
長1.4μm)、n−InAlGaAs上部第2コア層
22(厚さ2μm、バンドギャップ波長1.1μm)、
n−InAlAs上部クラッド層21(厚さ1μm)、
n−InGaAsコンタクト層20(厚さ0.1μm)
を順次結晶成長させ、化学エッチングにより受光部メサ
12、スタッド部メサ15を形成する。その後、SiN
絶縁膜14により結晶表面をパッシベーションし、受光
部メサ12の上部のみ、開口部を形成する。次にTi/
Pt/Auよりなるn型電極16およびp型電極17を
蒸着形成する。劈開により受光端面を形成し、反射防止
膜を形成し、素子単位に分割し、本発明の導波路型受光
素子が得られる。受光部メサの幅は、受光端面側ではW
a=40μm、反対側ではWb=5μm、受光部メサの
長さはL=100μmである。FIG. 1 shows a perspective view of an embodiment of the present invention using an InGaAlAs-based compound semiconductor. p-InP
On the substrate 11, p is applied by molecular beam epitaxy (MBE).
-InAlAs buffer layer 19 (0.7 μm thickness), p
-InAlGaAs lower second core layer 18 (2 μm in thickness,
Band gap wavelength 1.1 μm), undoped InAl
A GaAs light absorption layer 13 (thickness 2 μm, band gap wavelength 1.4 μm), an n-InAlGaAs upper second core layer 22 (thickness 2 μm, band gap wavelength 1.1 μm),
n-InAlAs upper cladding layer 21 (1 μm thickness),
n-InGaAs contact layer 20 (0.1 μm thickness)
Are sequentially grown, and a light-receiving portion mesa 12 and a stud portion mesa 15 are formed by chemical etching. After that, SiN
The crystal surface is passivated by the insulating film 14 to form an opening only above the light-receiving portion mesa 12. Next, Ti /
An n-type electrode 16 and a p-type electrode 17 made of Pt / Au are formed by vapor deposition. A light-receiving end face is formed by cleavage, an antireflection film is formed, and the light-receiving end face is divided into element units to obtain a waveguide type light-receiving element of the present invention. The width of the light receiving part mesa is W on the light receiving end face side.
a = 40 μm, Wb = 5 μm on the opposite side, and the length of the light receiving part mesa is L = 100 μm.
【0009】図1に示すような受光部メサ12を有する
端面入射型の導波路型受光素子において、受光部メサ1
2の幅Wが、受光端面で最大Waであり、入射光の進行
方向に沿ってWbまで減少している。受光部メサ面積S
=(Wa+Wb)L/2であり、上記従来技術における
受光部メサ面積S=WLより小さいことが特徴である。
このため、水平方向光結合トレランス幅を増大させるた
めWaを増大し、受光感度を増大させるためにLを増大
した場合においても、受光部メサ面積Sを低減し、静電
容量の低減が可能である。In an end-surface incident type waveguide light receiving device having a light receiving portion mesa 12 as shown in FIG.
2 is the maximum Wa at the light receiving end face, and decreases to Wb along the traveling direction of the incident light. Light receiving part mesa area S
= (Wa + Wb) L / 2, which is characterized in that it is smaller than the mesa area S = WL of the light receiving portion in the above-mentioned conventional technology.
For this reason, even when Wa is increased to increase the horizontal optical coupling tolerance width and L is increased to increase the light receiving sensitivity, the light receiving part mesa area S can be reduced, and the capacitance can be reduced. is there.
【0010】図2にWa=40μm、L=100μmの
場合、Wbと静電容量Cの関係を示す。Wが入射光の進
行方向に対し一定であり、Wb=Wa=40μmである
従来構造の場合、静電容量が0.3pF以上になるのに
対し、本発明によりWbを低減させることにより静電容
量が減少する。Wb=5μmとすることにより、静電容
量を0.2pF以下に低減可能である。FIG. 2 shows the relationship between Wb and capacitance C when Wa = 40 μm and L = 100 μm. In the case of the conventional structure in which W is constant with respect to the traveling direction of the incident light and Wb = Wa = 40 μm, the capacitance becomes 0.3 pF or more. The capacity is reduced. By setting Wb = 5 μm, the capacitance can be reduced to 0.2 pF or less.
【0011】図7は本発明の素子に単一モードファイバ
からの信号光を入射した場合の説明図である。同図よ
り、単一モードファイバ71からの波長1.3μmの信
号光を入射した場合の効果を説明する。単一モードファ
イバ71からの拡がり角(光出力強度がピーク値の1/
e2となる角度で定義)は、θ0=5.6°であり、受
光部メサ12内に入射した後、メサ側面に入射する角度
はθe=78.4°である。これは全反射する臨界角θc
=sin−1(nb/ne)=37.3°より十分大き
いため、受光部メサ12内で全反射し導波される。ここ
でnbはSiN絶縁膜14の屈折率、neは受光部メサ
12の等価屈折率である。なお、半導体メサ部の側面
に、誘電体多層膜による高反射膜を形成してもよい。こ
の結果、バイアス電圧1.2Vで0.92A/Wと高い
受光感度が得られ、単一モードファイバ71との位置ず
れトレランスも、0.5dB劣化時で、垂直方向が±
2.0μm、水平方向が±15.0μmと大きく、パッ
シブアライメント法(受光感度をモニタせず、各部品の
搭載位置の調整のみにより、光学的結合を得る方法)を
用いた表面実装が可能となる。さらに受光部メサ面積S
=(Wa+Wb)L/2=2250μm2であり、受光
部の静電容量を0.18pFに低減可能となり、バイア
ス電圧1.2Vにおいて、10GHz以上の遮断周波数
が得られる。FIG. 7 is an explanatory diagram in the case where signal light from a single mode fiber is incident on the element of the present invention. The effect when the signal light having a wavelength of 1.3 μm from the single mode fiber 71 is incident will be described with reference to FIG. The divergence angle from the single mode fiber 71 (the light output intensity is 1 /
defined at an angle a e 2) is θ 0 = 5.6 °, after entering the light receiving mesa 12, the angle of incident on the mesa side surface is θe = 78.4 °. This is the critical angle θc for total reflection
= Sin -1 (n b / n e) = 37.3 for sufficiently larger than °, is totally reflected guided by the light receiving mesa 12. Where n b is the refractive index of the SiN insulating film 14, n e is an equivalent refractive index of the light receiving mesa 12. Note that a high-reflection film made of a dielectric multilayer film may be formed on the side surface of the semiconductor mesa. As a result, a high light receiving sensitivity as high as 0.92 A / W is obtained at a bias voltage of 1.2 V, and the tolerance for positional deviation with respect to the single mode fiber 71 is ± 0.5 dB in the vertical direction when degraded by 0.5 dB.
2.0 μm, ± 15.0 μm in the horizontal direction, enabling surface mounting using the passive alignment method (a method of obtaining optical coupling only by adjusting the mounting position of each component without monitoring the light receiving sensitivity) Become. Further, the light receiving part mesa area S
= (Wa + Wb) L / 2 = 2250 μm 2 , the capacitance of the light receiving section can be reduced to 0.18 pF, and a cutoff frequency of 10 GHz or more can be obtained at a bias voltage of 1.2 V.
【0012】また、上記の構造をInGaAsP系の半
導体層で構成しても同様の効果が得られる。The same effect can be obtained even if the above-mentioned structure is constituted by an InGaAsP-based semiconductor layer.
【0013】また、光吸収層13を、波長1.55μm
の信号光に受光感度を有する半導体層を用いても同様の
効果が得られる。The light absorbing layer 13 has a wavelength of 1.55 μm.
The same effect can be obtained by using a semiconductor layer having light receiving sensitivity for the signal light.
【0014】図3に本発明の導波路型受光素子を用いた
応用例の斜視構造を示す。光導波路を埋め込んだ光カプ
ラや光合分波器等の石英系光回路35、絶縁膜34、電
気配線32、33を有する光導波路基板36上に、本発
明の導波路型受光素子31を、光学レンズなしでパッシ
ブアライメント法を用いて実装する。導波路型受光素子
31のn型電極はAuSnはんだにより電気配線32に
接続し、p型電極はAu線のワイヤボンディングにより
電気配線33に接続する。FIG. 3 shows a perspective structure of an application example using the waveguide type light receiving element of the present invention. The waveguide type light receiving element 31 of the present invention is optically mounted on an optical waveguide substrate 36 having a quartz optical circuit 35 such as an optical coupler or an optical multiplexer / demultiplexer in which an optical waveguide is embedded, an insulating film 34, and electric wirings 32 and 33. It is mounted using a passive alignment method without a lens. The n-type electrode of the waveguide type light receiving element 31 is connected to the electric wiring 32 by AuSn solder, and the p-type electrode is connected to the electric wiring 33 by Au wire bonding.
【0015】素子搭載時の、基板に水平方向の位置ずれ
は±1μm以内であり、これに伴う結合損失は0.2d
B以下に低減可能となる。この結果、1.3μm信号光
に対し、バイアス電圧1.2Vにおいて、0.87A/
W以上の高い受光感度が得られる。さらに、受光部の静
電容量を0.18pFに低減可能となり、10GHz以
上の遮断周波数が得られる。When the device is mounted, the displacement of the substrate in the horizontal direction is within ± 1 μm, and the coupling loss accompanying this is 0.2 d.
B or less. As a result, for a 1.3 μm signal light, 0.87 A /
High light receiving sensitivity of W or more can be obtained. Further, the capacitance of the light receiving unit can be reduced to 0.18 pF, and a cutoff frequency of 10 GHz or more can be obtained.
【0016】図4に本発明の導波路型受光素子を用いた
別の応用例の斜視構造を示す。絶縁膜34、電気配線3
2、33を有するV溝基板41上に、本発明の導波路型
受光素子31を、光学レンズなしで、パッシブアライメ
ント法を用いてフリップチップ実装する。導波路型受光
素子31のn型電極はAuSnはんだにより電気配線3
2に接続し、p型電極はAu線のワイヤボンディングに
より電気配線33に接続する。その後、フラットエンド
の光ファイバ42をV溝に固定する。FIG. 4 shows a perspective structure of another application example using the waveguide type light receiving element of the present invention. Insulating film 34, electric wiring 3
The waveguide type light receiving element 31 of the present invention is flip-chip mounted on the V-groove substrate 41 having the elements 2 and 33 by using a passive alignment method without an optical lens. The n-type electrode of the waveguide type light receiving element 31 is an electric wiring 3 made of AuSn solder.
2 and the p-type electrode is connected to the electric wiring 33 by Au wire bonding. After that, the flat end optical fiber 42 is fixed to the V groove.
【0017】素子搭載時及び光ファイバ固定時の位置ず
れは±1μm以内であり、これに伴う結合損失は0.2
dB以下に低減可能となる。この結果、1.3μm信号
光に対し、バイアス電圧1.2Vにおいて、0.87A
/W以上の高い受光感度が得られる。さらに、受光部の
静電容量を0.18pFに低減可能となり、10GHz
以上の遮断周波数が得られる。The positional deviation when mounting the element and fixing the optical fiber is within ± 1 μm, and the coupling loss accompanying this is 0.2 μm.
It can be reduced to dB or less. As a result, for a 1.3 μm signal light, 0.87 A at a bias voltage of 1.2 V.
/ W or higher light receiving sensitivity is obtained. Furthermore, the capacitance of the light receiving section can be reduced to 0.18 pF, and the
The above cutoff frequency is obtained.
【0018】図5に本発明の導波路型受光素子を用い、
パッケージングされた受光素子モジュールの一実施例の
斜視構造を示す。V溝基板54上に本発明の導波路型受
光素子55、受信用前置増幅器(プリアンプ)IC56
を表面実装する。ここで導波路型受光素子55の実装に
はパッシブアライメント法を用いることが可能である。
その後、信号光入射用の光ファイバ52をV溝内に固定
する。このV溝基板54をセラミック製のベース53に
固定し、金属製のキャップ51にてレーザ溶接等により
気密封止しパッケージングする。FIG. 5 shows a waveguide type light receiving element of the present invention.
1 shows a perspective structure of one embodiment of a packaged light receiving element module. A waveguide type light receiving element 55 of the present invention, a receiving preamplifier (preamplifier) IC 56 on a V-groove substrate 54
Is surface mounted. Here, the passive alignment method can be used for mounting the waveguide type light receiving element 55.
After that, the optical fiber 52 for signal light incidence is fixed in the V-groove. The V-groove substrate 54 is fixed to a ceramic base 53, and hermetically sealed by laser welding or the like with a metal cap 51 and packaged.
【0019】する。ベースとキャップの代わりに樹脂に
てトランスファモールドを用いても同様である。[0019] The same applies even when a transfer mold is made of resin instead of the base and the cap.
【0020】作製した光モジュールを伝送評価した。信
号光波長1.3μm、伝送速度50Mbit/sのバー
スト伝送において、10の−8乗の誤り率で、−38d
Bmの最小受信感度が得られた。The produced optical module was evaluated for transmission. In burst transmission with a signal light wavelength of 1.3 μm and a transmission speed of 50 Mbit / s, an error rate of 10 −8 and −38 d
A minimum receiving sensitivity of Bm was obtained.
【0021】セラミック製のベース53の代わりに樹脂
製、あるいは金属製も考えられる。また、セラミック製
のベース53と金属製のキャップ51の代わりに樹脂の
トランスファモールドを用いても同様である。さらにV
溝基板54の代わりに光回路を有する光導波路基板を用
いても同様である。In place of the ceramic base 53, resin or metal may be used. The same applies to the case where a resin transfer mold is used instead of the ceramic base 53 and the metal cap 51. Further V
The same applies to the case where an optical waveguide substrate having an optical circuit is used instead of the groove substrate 54.
【0022】図6に本発明の導波路型受光素子を用いた
光受信モジュールの一実施例の鳥瞰図を示す。本発明の
導波路型受光素子が搭載され、信号光入射用の光ファイ
バ63が付いた受光素子モジュール64と受信IC61
およびその他の電子部品をボード62上に搭載する。な
お、受信回路を構成する受信IC61とは、前置増幅器
(プリアンプ)出力を入力とし増幅して出力する主増幅
回路と、主増幅回路出力を入力としタイミングを抽出し
クロックを出力するタイミング抽出回路と、主増幅器出
力とクロックを入力とし識別再生する識別再生回路と、
無信号時の警報回路と、全体の電源回路等で構成されて
いる。本光受信モジュールを伝送評価した。信号光波長
1.3μm、伝送速度50Mbit/sのバースト伝送
において、10−8の誤り率で、−38dBm以下の最
小受信感度が得られ、長距離伝送システムの要求に対応
可能となった。また受信IC等に、10Gbit/s伝
送用回路を使用することにより、伝送速度10Gbit
/sにおいて、10−12の誤り率で、−16dBm以
下の最小受信感度が得られ、高帯域伝送に対応可能とな
った。FIG. 6 is a bird's-eye view of one embodiment of an optical receiving module using the waveguide type light receiving element of the present invention. A light receiving element module 64 equipped with the waveguide type light receiving element of the present invention and having an optical fiber 63 for signal light incidence and a receiving IC 61
And other electronic components are mounted on the board 62. The receiving IC 61 constituting the receiving circuit includes a main amplifier circuit which receives and amplifies an output of a preamplifier (preamplifier) as an input, and a timing extracting circuit which receives the output of the main amplifier circuit as an input, extracts timing, and outputs a clock. An identification reproduction circuit that receives and outputs a main amplifier output and a clock and performs identification reproduction;
It is composed of an alarm circuit when there is no signal, an entire power supply circuit and the like. This optical receiving module was evaluated for transmission. In burst transmission with a signal light wavelength of 1.3 μm and a transmission speed of 50 Mbit / s, a minimum receiving sensitivity of −38 dBm or less was obtained at an error rate of 10 −8 , and it was possible to meet the requirements of long-distance transmission systems. In addition, by using a 10 Gbit / s transmission circuit for a receiving IC, etc., the transmission speed is 10 Gbit / s.
/ S, an error rate of 10 −12 , a minimum receiving sensitivity of −16 dBm or less was obtained, and high-bandwidth transmission could be supported.
【0023】[0023]
【発明の効果】本発明の導波路型受光素子を用いれば、
低電圧動作で、高い受光感度が得られ、信号光に対する
水平方向位置ずれトレランス幅を広げることができ、且
つ受光部の静電容量を低減することが可能となる。これ
により、実装マージンを大きくとれ、光学レンズなし
に、容易に光結合を得ると同時に、高帯域の受信特性が
得られる。従って、低コスト、且つ伝送速度の速い受光
素子、受光素子モジュール、光受信モジュールおよび光
伝送装置を作製することが可能となる。By using the waveguide type light receiving element of the present invention,
With the low-voltage operation, high light-receiving sensitivity can be obtained, the horizontal positional deviation tolerance width for the signal light can be increased, and the capacitance of the light-receiving unit can be reduced. As a result, a large mounting margin can be obtained, optical coupling can be easily obtained without an optical lens, and high-band receiving characteristics can be obtained. Therefore, it is possible to manufacture a light receiving element, a light receiving element module, an optical receiving module, and an optical transmission device with low cost and high transmission speed.
【図1】本発明の端面入射導波路型受光素子の斜視構造
図を示す。FIG. 1 is a perspective view showing a structure of an edge-incident waveguide type light receiving element of the present invention.
【図2】受光部メサ12の長さLと受光部メサ面積Sの
相関を示す。FIG. 2 shows a correlation between the length L of the light receiving part mesa 12 and the mesa area S of the light receiving part.
【図3】本発明の端面入射導波路型受光素子の応用例の
斜視構造を示す。FIG. 3 shows a perspective structure of an application example of the edge-incident waveguide type light receiving element of the present invention.
【図4】本発明の別の端面入射導波路型受光素子の応用
例の斜視構造を示す。FIG. 4 shows a perspective structure of another application example of the end face incidence waveguide type light receiving element of the present invention.
【図5】本発明の受光素子モジュールの斜視構造を示
す。FIG. 5 shows a perspective structure of a light receiving element module of the present invention.
【図6】本発明の受信モジュールの全体構造鳥瞰図を示
す。FIG. 6 shows a bird's-eye view of the entire structure of the receiving module of the present invention.
【図7】本発明の受光素子への入射光が全反射すること
を示す。FIG. 7 shows that light incident on the light receiving element of the present invention is totally reflected.
【図8】従来の端面入射導波路型受光素子の斜視構造を
示す。FIG. 8 shows a perspective structure of a conventional edge-incident waveguide type light receiving element.
11…p−InP基板、 12…受光部メサ、 13…アンドープInAlGaAs光吸収層、 14…SiN絶縁膜、 15…スタッド部メサ、 16…n型電極、 17…p型電極、 18…p−InAlGaAs下部第2コア層、 19…p−InAlAsバッファ層、 20…n−InGaAsコンタクト層、 21…n−InAlAs上部クラッド層、 22…n−InAlGaAs上部第2コア層、 31…本発明の導波路型受光素子、 32…電気配線、 33…電気配線、 34…絶縁膜、 35…石英系光回路、 36…光導波路基板、 41…V溝基板、 42…光ファイバ、 51…キャップ、 52…光ファイバ、 53…ベース、 54…V溝基板、 55…導波路型受光素子、 56…受信用前置増幅器(プリアンプ)IC、 61…受信IC、 62…ボード、 63…光ファイバ、 64…受光素子モジュール、 71…単一モードファイバ、 81…p−InP基板、 82…受光部メサ、 83…アンドープInAlGaAs光吸収層、 84…SiN絶縁膜、 85…スタッド部メサ、 86…n型電極、 87…p型電極。 DESCRIPTION OF SYMBOLS 11 ... p-InP substrate, 12 ... light receiving part mesa, 13 ... undoped InAlGaAs light absorption layer, 14 ... SiN insulating film, 15 ... stud part mesa, 16 ... n-type electrode, 17 ... p-type electrode, 18 ... p-InAlGaAs Lower second core layer, 19 p-InAlAs buffer layer, 20 n-InGaAs contact layer, 21 n-InAlAs upper cladding layer, 22 n-InAlGaAs upper second core layer, 31 waveguide type of the present invention Light receiving element, 32: electric wiring, 33: electric wiring, 34: insulating film, 35: quartz optical circuit, 36: optical waveguide substrate, 41: V-groove substrate, 42: optical fiber, 51: cap, 52: optical fiber Reference numeral 53: base, 54: V-groove substrate, 55: waveguide type light receiving element, 56: reception preamplifier (preamplifier) IC, 61: reception IC, 6 ... Board, 63 ... Optical fiber, 64 ... Light receiving element module, 71 ... Single mode fiber, 81 ... P-InP substrate, 82 ... Light receiving part mesa, 83 ... Undoped InAlGaAs light absorbing layer, 84 ... SiN insulating film, 85 ... Stud mesa, 86 ... n-type electrode, 87 ... p-type electrode.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 宍倉 正人 東京都国分寺市東恋ケ窪一丁目280番地 株式会社日立製作所中央研究所内 Fターム(参考) 2H037 AA01 BA11 CA39 DA03 DA04 DA12 5F073 AB18 AB28 BA01 FA07 FA16 5F088 AA03 AB07 BA01 BA02 BA16 BB01 DA17 EA07 EA09 FA09 GA03 GA07 GA10 JA20 KA02 KA08 KA10 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Masato Shishikura 1-280 Higashi Koigakubo, Kokubunji-shi, Tokyo F-term in Central Research Laboratory, Hitachi, Ltd. 2H037 AA01 BA11 CA39 DA03 DA04 DA12 5F073 AB18 AB28 BA01 FA07 FA16 5F088 AA03 AB07 BA01 BA02 BA16 BB01 DA17 EA07 EA09 FA09 GA03 GA07 GA10 JA20 KA02 KA08 KA10
Claims (5)
光吸収層と該光吸収層をはさみ該光吸収層より屈折率が
低い半導体層から構成されているコア層とを備えた台形
状に突起した半導体メサ部を有し、上記半導体メサ部側
面の一部を受光端面とする端面入射導波路型受光素子で
あって、 上記半導体メサ部の幅が、上記受光端面から入射光の進
行方向に沿って減少していることを特徴とする端面入射
導波路型半導体受光素子。1. A semiconductor substrate comprising, on one surface of a semiconductor substrate, a light absorbing layer for absorbing light and a core layer sandwiching the light absorbing layer and comprising a semiconductor layer having a lower refractive index than the light absorbing layer. An end face incident waveguide type light receiving element having a semiconductor mesa portion protruding in a trapezoid shape and having a part of the side surface of the semiconductor mesa portion as a light receiving end surface, wherein the width of the semiconductor mesa portion is incident light from the light receiving end surface. Characterized in that it decreases along the direction of travel of the end facet waveguide type semiconductor light receiving element.
半導体メサ部の側面で全反射されることを特徴とする請
求項1に記載の端面入射導波路型半導体受光素子。2. The end face incident waveguide type semiconductor light receiving element according to claim 1, wherein incident light incident from said light receiving end face is totally reflected by a side face of said semiconductor mesa portion.
メサ部とほぼ同じ高さの第2の半導体メサ部を有し、前
記半導体メサ部と第2の半導体メサ部にn型電極を設
け、上記半導体基板の他方の面上にp型電極を設けるこ
とを特徴とする請求項1ないし請求項2のいずれかに記
載の端面入射導波路型半導体受光素子。A second semiconductor mesa portion having substantially the same height as the semiconductor mesa portion on one surface of the semiconductor substrate; and an n-type electrode provided on the semiconductor mesa portion and the second semiconductor mesa portion. 3. The end face incident waveguide type semiconductor light receiving device according to claim 1, wherein a p-type electrode is provided on the other surface of the semiconductor substrate.
変換し電気信号を出力する請求項1ないし請求項3いず
れかに記載の端面入射導波路型半導体受光素子と、 上記電気信号を増幅する前置増幅器と、 上記前置増幅器出力を伝える端子とを有し、 上記光ファイバと上記V溝基板と上記受光素子と上記前
置増幅器とをベースとキャップとで気密封止し一体化す
ることを特徴とする受光素子モジュール。4. An optical fiber for transmitting a signal light, a V-groove substrate having a V-groove for holding the optical fiber, optically coupled to the optical fiber, photoelectrically converting the signal light and outputting an electric signal. 4. An optical fiber comprising: an end facet waveguide type semiconductor light receiving element according to claim 1; a preamplifier for amplifying the electric signal; and a terminal for transmitting an output of the preamplifier; And a V-groove substrate, the light-receiving element, and the preamplifier are hermetically sealed and integrated with a base and a cap.
る主増幅器と、 上記主増幅器出力を入力としタイミングを抽出しクロッ
クを出力するタイミング抽出器と、 上記主増幅器出力と該クロックを入力とし識別再生し信
号データを出力する識別再生器とで構成した受信回路
と、 上記受光素子モジュールと上記受信回路を搭載するプリ
ント配線基板とを有することを特徴とする光受信モジュ
ール。5. A light-receiving element module according to claim 4, a main amplifier for amplifying the output of the preamplifier of the light-receiving element module, and a timing extraction for receiving the main amplifier output as an input, extracting a timing, and outputting a clock. A receiving circuit composed of a main amplifier output and the clock, and an identification regenerator that performs identification and reproduction by using the clock as input and outputs signal data; and a printed wiring board on which the light receiving element module and the receiving circuit are mounted. An optical receiving module characterized by the above-mentioned.
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JP2000038039A JP2001223369A (en) | 2000-02-09 | 2000-02-09 | End face incident waveguide type semiconductor photodetector and light receiving module using the same |
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JP2000038039A JP2001223369A (en) | 2000-02-09 | 2000-02-09 | End face incident waveguide type semiconductor photodetector and light receiving module using the same |
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Cited By (3)
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JP2002151728A (en) * | 2000-11-09 | 2002-05-24 | Nec Corp | Semiconductor photodetector |
JP2005534178A (en) * | 2002-07-23 | 2005-11-10 | インテル・コーポレーション | Tapered waveguide photodetector device and method |
JP2007318180A (en) * | 2007-08-20 | 2007-12-06 | Nec Corp | Semiconductor light receiving element |
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JP2007318180A (en) * | 2007-08-20 | 2007-12-06 | Nec Corp | Semiconductor light receiving element |
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