JP2001220269A - Composite of ceramic material and metal coating - Google Patents

Composite of ceramic material and metal coating

Info

Publication number
JP2001220269A
JP2001220269A JP2000372155A JP2000372155A JP2001220269A JP 2001220269 A JP2001220269 A JP 2001220269A JP 2000372155 A JP2000372155 A JP 2000372155A JP 2000372155 A JP2000372155 A JP 2000372155A JP 2001220269 A JP2001220269 A JP 2001220269A
Authority
JP
Japan
Prior art keywords
ceramic
coating
composite
fused
aluminum nitride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000372155A
Other languages
Japanese (ja)
Other versions
JP4031615B2 (en
Inventor
Seiichiro Miyata
征一郎 宮田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ZAIKEN KK
Original Assignee
ZAIKEN KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ZAIKEN KK filed Critical ZAIKEN KK
Priority to JP2000372155A priority Critical patent/JP4031615B2/en
Publication of JP2001220269A publication Critical patent/JP2001220269A/en
Application granted granted Critical
Publication of JP4031615B2 publication Critical patent/JP4031615B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5093Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with elements other than metals or carbon
    • C04B41/5096Silicon
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/51Metallising, e.g. infiltration of sintered ceramic preforms with molten metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Heating Bodies (AREA)
  • Resistance Heating (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a composite of a ceramic material and a metal coating, having a new structure capable of preventing an alloy from wetting and effusing from a patterned section, while the composite is composed of an aluminum nitride ceramic base material and a Si or Si alloy coating and has the structure where the Si or Si alloy coating is selectively patterned and fused on the aluminum nitride ceramic base material. SOLUTION: This composite of the ceramic material and the metal coating has the structure where the Si or Si alloy coating is subjected to selective patterning so as to form a pattered surface and fused on the aluminum nitride ceramic base material containing a rare earth element compound as a sintering additive, wherein the content of the sintering additive component in an area of the above patterned surface on which the metal coating is not fused and the ceramic base material is exposed is not more than 0.5% when converted into an amount of the rare earth metal oxide.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、セラミックと金属
被膜の複合体に係り、さらに詳しくは、窒化アルミセラ
ミック基材にSiあるいはSi合金の被膜が選択的にパ
ターンニングされて融着した構造のセラミックと金属被
膜の複合体に係るものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a composite of a ceramic and a metal coating, and more particularly, to a composite having a structure in which a coating of Si or a Si alloy is selectively patterned and fused to an aluminum nitride ceramic substrate. It relates to a composite of a ceramic and a metal coating.

【0002】[0002]

【従来の技術】窒化アルミ基材に、SiあるいはSi合
金の被膜(抵抗回路)を融着した構造の電気抵抗体の発
明は、本発明者の発明に係り、既に開示されている(特
開平10−144459)。この発明の問題点は、パタ
ーンニングした回路から合金のしみだし(濡れの広が
り)が起こり、これがパターンニングした回路の周囲に
はみ出して広がり、回路間の短絡が発生しやすいことで
ある。特に回路間の間隔が狭い微細回路のときは電気的
短絡が発生しやすいことである。合金のしみだしの原因
は不明で、発生したりしなかったり、再現性に乏しく、
原因が未だ不明で、解決が困難な問題になっている。
2. Description of the Related Art The invention of an electric resistor having a structure in which a film (resistance circuit) of Si or a Si alloy is fused to an aluminum nitride base material has been disclosed in connection with the invention of the present inventor (Japanese Patent Laid-Open Publication No. HEI 9-163873). 10-144449). A problem of the present invention is that the alloy is exuded from the patterned circuit (spread of wetness), which protrudes and spreads around the patterned circuit, and a short circuit between the circuits is likely to occur. In particular, in the case of a fine circuit in which the interval between the circuits is narrow, an electrical short circuit is likely to occur. The cause of the alloy bleeding is unknown, does not occur, or is poor in reproducibility,
The cause is still unknown and difficult to solve.

【0003】[0003]

【発明が解決しようとする課題】本発明はかかる問題に
鑑みてなされたものであり、第一の目的は、合金のしみ
だしを防止できる新しい構造の窒化アルミニウムセラミ
ックとSiあるいはSi合金の被膜の複合体を提供する
ことである。又第二の目的は新しいパターンニングの手
法による上記複合体を提供することである。又第三の目
的は、SiあるいはSi合金のしみだしを防止できる窒
化アルミニウムセラミックの新しい構造を提供すること
である。
SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and a first object of the present invention is to provide a new structure of aluminum nitride ceramic and Si or a Si alloy film having a new structure capable of preventing alloy bleeding. The purpose is to provide a complex. A second object is to provide the above composite by a new patterning technique. A third object is to provide a new structure of aluminum nitride ceramic which can prevent exudation of Si or Si alloy.

【0004】[0004]

【課題を解決するための手段】本発明者は上記問題点に
関して鋭意研究した結果、次の知見を得た。すなわち、
SiあるいはSi合金は窒化アルミセラミック基材に良
く濡れて融着するが、窒化アルミ基材の中の燒結助剤が
この濡れを拡散させる元素であることを発見した。そし
てセラミック全体の平均的な成分組成が同じであっても
被膜が融着する最表面の助剤成分のバラツキによって濡
れ性のバラツキが起こること、そして燒結したままの表
面と、表面層を除去して新生面を露呈させたものでは明
らかに濡れ性が異なり、新生面では濡れ性が極めて良好
で、しみだしも発生することもあり、これは表層部に残
留する助剤成分の量が影響していることが判った。希土
類元素化合物を焼結助剤とする窒化アルミセラミック基
材では、窒化アルミニウム表面の焼結助剤の量を希土類
元素の酸化物に換算して0.5%以下、最も好ましくは
0.3%以下にすると、濡れの広がりを防止でき、パタ
ーンニングした部分より外に濡れは拡散せず、しみだし
は発生せず、きれいなパターンニング被膜が得られるこ
とが判った。アルカリ土類金属の化合物を焼結助剤とす
る窒化アルミセラミック基材では、窒化アルミニウム表
面の焼結助剤の量をアルカリ土類金属の酸化物に換算し
て3%以下、最も好ましくは1%以下にすると、パター
ンニングした部分より外に濡れは拡散せず、しみだしは
発生せず、きれいなパターンニング被膜が得られること
が判った。又、上記上限量(希土類元素の酸化物:0.
5%、アルカリ土類金属の酸化物:3%)を越える焼結
助剤の残留成分を含有する窒化アルミ基材の新生面にS
iあるいはSi合金のパターンニング被膜を融着させる
時、濡れ性、密着性、平坦性に優れた被膜がえられる
が、パターンニングした部分から濡れの広がりが発生し
て選択的なパターンニングができなくなるので、この場
合は、いったん被膜をパターニングすることなく融着さ
せた後、不必要な部分を機械的な除去加工で除去してパ
ターンニングすれば良いことを見出した。これによって
密着性、平坦性に優れたパターニング被膜が得られるこ
とがわかった。またセラミック粒界のエッチング処理を
すると、SiあるいはSi合金の濡れの拡散によるしみ
だしが防止できることを見出した。本発明は以上の知見
を基になされたもので、下記請求項1〜8の発明よりな
る。
The present inventors have made intensive studies on the above problems, and have obtained the following findings. That is,
Although Si or Si alloy is well wetted and fused to the aluminum nitride ceramic substrate, it has been discovered that the sintering aid in the aluminum nitride substrate is an element that diffuses this wetting. Even if the average component composition of the entire ceramic is the same, the wettability varies due to the variation of the auxiliary component on the outermost surface where the coating is fused, and the as-sintered surface and the surface layer are removed. When the new surface is exposed, the wettability is clearly different, and the new surface has very good wettability, and exudation may occur, which is affected by the amount of auxiliary components remaining on the surface layer. It turns out. In an aluminum nitride ceramic base material using a rare earth element compound as a sintering aid, the amount of the sintering aid on the surface of the aluminum nitride is converted to a rare earth oxide by 0.5% or less, most preferably 0.3% or less. In the following, it was found that spreading of the wetting could be prevented, the wetting did not diffuse outside the patterned portion, no bleeding occurred, and a clear patterned film could be obtained. In an aluminum nitride ceramic substrate using a compound of an alkaline earth metal as a sintering aid, the amount of the sintering aid on the surface of the aluminum nitride is 3% or less, most preferably 1% or less, in terms of alkaline earth metal oxide. %, It was found that wetting did not diffuse outside the patterned portion, no bleeding occurred, and a clear patterned film could be obtained. In addition, the upper limit (the oxide of rare earth element: 0.1.
5%, oxide of alkaline earth metal: 3%).
When fusing an i or Si alloy patterning film, a film with excellent wettability, adhesion, and flatness can be obtained, but wetting spreads from the patterned part and selective patterning can be performed. In this case, it has been found that, in this case, after the coating is once fused without patterning, unnecessary portions may be removed by mechanical removal processing to perform patterning. As a result, it was found that a patterned film having excellent adhesion and flatness was obtained. It has also been found that when the ceramic grain boundaries are etched, bleeding due to the diffusion of wetness of Si or a Si alloy can be prevented. The present invention has been made based on the above findings, and comprises the following claims 1 to 8.

【0005】[0005]

【請求項1】希土類元素化合物を焼結助剤とする窒化ア
ルミセラミック基材にSiあるいはSi合金の被膜がパ
ターン模様に選択的にパターンニングされて融着した構
造のセラミックと金属被膜の複合体において、該パター
ンニング面の該被膜を融着させないセラミック基材露出
面表層部の燒結助剤成分の量を希土類元素の酸化物に換
算して0.5%以下にしてなることを特徴とするセラミ
ックと金属被膜の複合体。
A composite of a ceramic and a metal coating having a structure in which a coating of Si or a Si alloy is selectively patterned into a pattern and fused to an aluminum nitride ceramic base material using a rare earth element compound as a sintering aid. Wherein the amount of the sintering aid component in the surface layer portion of the exposed surface of the ceramic substrate on which the coating on the patterning surface is not fused is reduced to 0.5% or less in terms of oxides of rare earth elements. Composite of ceramic and metal coating.

【請求項2】上記セラミック基材が表面を粒界エッチン
グされたセラミックである請求項1記載のセラミックと
金属被膜の複合体。
2. The composite of claim 1, wherein said ceramic substrate is a ceramic whose surface is grain boundary etched.

【請求項3】希土類元素の酸化物に換算して0.5%を
越える量焼結助剤を含有する窒化アルミニウムセラミッ
ク基材の新生面にSiあるいはSi合金の被膜がパター
ン模様に選択的にパターンニングされて融着した構造の
セラミックと金属被膜の複合体であって、該パターンニ
ング被膜は、該基材の新生面に融着させた被膜の不必要
な部分を機械的な除去加工で除去することによって形成
してなることを特徴とするセラミックと金属被膜の複合
体。
3. An aluminum nitride ceramic substrate containing a sintering aid in an amount exceeding 0.5% in terms of a rare earth element oxide is coated with a Si or Si alloy film selectively on a new pattern. A composite of a ceramic and metal coating having a textured and fused structure, wherein the patterned coating removes unnecessary portions of the coating fused to the nascent surface of the substrate by mechanical removal processing. A composite of a ceramic and a metal coating, characterized by being formed by the above method.

【請求項4】上記希土類元素がYである請求項1〜3の
いずれかに記載のセラミックと金属被膜の複合体。
4. The composite of claim 1, wherein said rare earth element is Y.

【請求項5】アルカリ土類金属化合物を焼結助剤とする
窒化アルミセラミック基材にSiあるいはSi合金の被
膜がパターン模様に選択的にパターンニングされて融着
した構造のセラミックと金属被膜の複合体において、該
パターンニング面の該被膜を融着させないセラミック基
材露出面表層部の燒結助剤成分の量をアルカリ土類金属
の酸化物に換算して3%以下にしてなることを特徴とす
るセラミックと金属被膜の複合体。
5. A ceramic and metal coating having a structure in which a coating of Si or a Si alloy is selectively patterned into a pattern and fused to an aluminum nitride ceramic base material using an alkaline earth metal compound as a sintering aid. In the composite, the amount of the sintering aid component in the surface layer portion of the exposed surface of the ceramic substrate which does not fuse the coating on the patterning surface is reduced to 3% or less in terms of alkaline earth metal oxide. Composite of ceramic and metal coating.

【請求項6】上記セラミック基材が表面を粒界エッチン
グされたセラミックである請求項5記載のセラミックと
金属被膜の複合体。
6. The composite of claim 5, wherein said ceramic substrate is a ceramic whose surface is grain boundary etched.

【請求項7】アルカリ土類金属の酸化物に換算して3%
を越える量焼結助剤を含有する窒化アルミニウムセラミ
ック基材の新生面にSiあるいはSi合金の被膜がパタ
ーン模様に選択的にパターンニングされて融着した構造
のセラミックと金属被膜の複合体であって、該パターン
ニング被膜は、該基材の新生面に融着させた被膜の不必
要な部分を機械的な除去加工で除去することによって形
成してなることを特徴とするセラミックと金属被膜の複
合体。
7. 3% in terms of alkaline earth metal oxide
A composite of a ceramic and metal coating having a structure in which a coating of Si or a Si alloy is selectively patterned and fused to a new surface of an aluminum nitride ceramic substrate containing a sintering aid in an amount exceeding A composite of a ceramic and a metal coating, wherein the patterning coating is formed by mechanically removing unnecessary portions of the coating fused to the nascent surface of the substrate. .

【請求項8】上記アルカリ土類金属がCaである請求項
5〜7のいずれかに記載のセラミックと金属被膜の複合
体。
8. The composite of a ceramic and a metal coating according to claim 5, wherein said alkaline earth metal is Ca.

【0006】[0006]

【発明の実施の形態】本発明のSi合金は下記〜の
ミクロ組織を持つ合金である。本発明のSi合金及びS
i単体は、焼結助剤の種類及び量に関係無く窒化アルミ
ニウムセラミックに濡れて融着する。また助剤成分を含
んでいない、あるいは助剤成分が残留していない窒化ア
ルミニウムセラミックにも濡れて融着する。 珪化物とSiの混在するミクロ組織、つまり珪化物と
Siの共晶組織を持つ亜共晶、共晶、過共晶組織 Siと珪化物を作らない銀、アルミニウムとSiの共
晶組織を持つ亜共晶、共晶、過共晶組織 上記、が混ざった組織 珪化物単体の組織 SiとGeは性質が酷似した元素で全率固溶体をつくる
元素であるので、上記Si合金には、必要に応じて適宜
Geを添加して良い。
BEST MODE FOR CARRYING OUT THE INVENTION The Si alloy of the present invention is an alloy having the following microstructure. Si alloy of the present invention and S
The simple substance wets and fuses with the aluminum nitride ceramic regardless of the type and amount of the sintering aid. Also, it wets and fuses with an aluminum nitride ceramic that does not contain an auxiliary component or has no auxiliary component remaining. Microstructure in which silicide and Si are mixed, that is, hypoeutectic, eutectic, and hypereutectic structures having a eutectic structure of silicide and Si, having a eutectic structure of silver, aluminum and Si that do not form silicide with Si Hypoeutectic, eutectic, hypereutectic microstructures The above mixed microstructures The structure of silicide alone Si and Ge are elements with very similar properties and form an all-solid solution. Ge may be added as appropriate.

【0007】本発明のSi合金で、Siと珪化物の混ざ
ったミクロ組織では珪化物の量が増えると線膨張係数は
大きくなる。珪化物単体で線膨張係数は最も大きくな
る。Si単体の場合線膨張係数が最小になる。また銀、
アルミニウムとSiの混ざったミクロ組織では銀、アル
ミニウムの量が増えると線膨張係数は大きくなる。
In the Si alloy of the present invention, in the microstructure in which Si and silicide are mixed, the linear expansion coefficient increases as the amount of silicide increases. The linear expansion coefficient is the largest with silicide alone. In the case of Si alone, the coefficient of linear expansion is minimized. Also silver,
In a microstructure in which aluminum and Si are mixed, the linear expansion coefficient increases as the amount of silver and aluminum increases.

【0008】したがって被膜を融着させる時、基材の窒
化アルミニウムセラミックと線膨張係数を適合させる必
要があるときは、融着被膜のミクロ組織の中の珪化物相
の量を調整することにより、また銀、アルミニウム相の
量を調整することにより線膨張係数を調整できる。
Therefore, when it is necessary to match the coefficient of linear expansion with the aluminum nitride ceramic of the substrate when fusing the coating, by adjusting the amount of silicide phase in the microstructure of the fusing coating, The linear expansion coefficient can be adjusted by adjusting the amounts of the silver and aluminum phases.

【0009】本発明合金は窒化物、炭化物等の粉末、繊
維に濡れて融着する性質を利用して、被膜の中に窒化珪
素、窒化アルミニウム、窒化クロム、炭化珪素等の線膨
張係数の小さな窒化物、炭化物の粉末、繊維、ウイスカ
ー等を混合し、同時にこれらを被膜の合金に濡らして融
着させることによって被膜の線膨張係数を適宜調整する
こともできる。
The alloy of the present invention has a small linear expansion coefficient such as silicon nitride, aluminum nitride, chromium nitride, and silicon carbide in a coating film by utilizing the property of being wetted and fused to powders such as nitrides and carbides and fibers. The linear expansion coefficient of the coating can also be appropriately adjusted by mixing nitride, carbide powder, fibers, whiskers, etc., and simultaneously wetting and fusing them to the coating alloy.

【0010】窒化アルミニウム焼結体は、通常希土類元
素化合物、アルカリ土類金属化合物を焼結助剤として使
用している。本発明の希土類元素化合物を焼結助剤とす
る窒化アルミニウムセラミックとは、Y,La、Ce,
Pr,Nd,Pm,Sm,Eu,Gd,Tb,Dy,H
o,Er,Tm,Yb,Lu等の希土類元素の酸化物、
フッ化物、水酸化物、炭酸塩、硝酸塩あるいはその他の
化合物を窒化アルミニウムの焼結原料に添加して燒結
し、添加した助剤が焼結体の粒界に希土類元素の化合物
(主にアルミネート等の酸化物)の形で残留する窒化ア
ルミニウムセラミック焼結体を意味するものである。ま
た助剤なしで燒結された窒化アルミニウムセラミックあ
るいは焼結過程で助剤成分が気散して残留してない窒化
アルミニウムセラミック焼結体も包含する。
The aluminum nitride sintered body usually uses a rare earth element compound or an alkaline earth metal compound as a sintering aid. The aluminum nitride ceramics containing the rare earth element compound of the present invention as a sintering aid include Y, La, Ce,
Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, H
oxides of rare earth elements such as o, Er, Tm, Yb and Lu;
Fluoride, hydroxide, carbonate, nitrate or other compounds are added to the sintering material of aluminum nitride for sintering, and the added auxiliary compound is a compound of a rare earth element (mainly aluminate) at the grain boundaries of the sintered body. Aluminum oxide ceramic sintered body which remains in the form of an oxide (e.g., oxide). Also included are aluminum nitride ceramics sintered without auxiliaries or aluminum nitride ceramic sinters in which auxiliaries are not dispersed and remain in the sintering process.

【0011】本発明合金被膜を融着させるパターニング
面の被膜を融着させない部分のセラミック表層部に残留
するこれら希土類成分の量は、酸化物換算で0.5%以
下、最も好ましくは0.3%以下に規定することが好ま
しい。0.5%を越えると、溶融したSi、Si合金は
セラミックに対して濡れが良すぎて、パターニングした
被膜の融着区域よりも外に濡れが広がってしみ出し、選
択的なパターンの形成が不可能になるので好ましくな
い。被膜の幅の広がり、被膜と被膜の短絡、被膜のパタ
ーン形状の崩壊等が発生してくる。とりわけ微細パター
ンの形成は不可能になる。被膜をセラミックヒーターの
ヒーター回路に使用する場合、回路の短絡が起こる。
[0011] The amount of these rare earth components remaining on the ceramic surface layer in the portion of the patterning surface where the alloy film of the present invention is not fused is 0.5% or less, most preferably 0.3%, in terms of oxide. %. If it exceeds 0.5%, the molten Si or Si alloy is too wet to the ceramic, so that it spreads out from the fused area of the patterned film and exudes, so that selective pattern formation is not achieved. It is not preferable because it becomes impossible. Widening of the film, short-circuit between the films, collapse of the pattern shape of the film, and the like occur. In particular, it becomes impossible to form a fine pattern. When the coating is used in a heater circuit of a ceramic heater, a short circuit occurs in the circuit.

【0012】尚、ここで酸化物換算とは、焼結体の中の
各希土類元素がその元素の酸化物として存在するとし
て、その量(重量%)に換算して表示するということで
ある。例えばY,La、Ce,Pr,Nd,Sm,G
d,Dy等の元素がY,La,CeO
PrO,Nd,Sm,Gd,Dy
等の化学式の酸化物で存在するとして、その量
(重量%)に換算して表示するということである。
Here, the term "oxide conversion" means that each rare earth element in the sintered body is present as an oxide of the element and is expressed in terms of its amount (% by weight). For example, Y, La, Ce, Pr, Nd, Sm, G
Elements such as d and Dy are Y 2 O 3 , La 2 O 3 , CeO 2 ,
PrO 2 , Nd 2 O 3 , Sm 2 O 3 , Gd 2 O 3 , Dy
Assuming that it exists as an oxide of a chemical formula such as 2 O 3 , it is expressed in terms of its amount (% by weight).

【0013】助剤なしで燒結されたセラミックあるいは
焼結過程で助剤成分が気散して助剤成分が残留しない窒
化アルミニウムセラミックは、当然表層部の助剤もない
ので、濡れの拡散はなく、短絡のない微細なパターンが
形成できる。パターンニング面の被膜を融着させない部
分は当然0.5%以下の本発明の範疇に含まれるので、
これらのセラミックも本発明のセラミックの範疇に包含
されることとなる。
A ceramic sintered without an auxiliary agent or an aluminum nitride ceramic in which the auxiliary component is diffused during the sintering process and the auxiliary component does not remain, naturally, there is no auxiliary in the surface layer portion, so that there is no diffusion of wetting. A fine pattern without short circuit can be formed. Since the portion of the patterned surface where the coating is not fused is naturally included in the category of 0.5% or less of the present invention,
These ceramics are also included in the category of the ceramic of the present invention.

【0014】本発明で助剤成分の残留量を0.5%以下
に規定するのは、セラミック全体である必要はない。少
なくともパターンニング面の被膜を融着させない部分の
表層部だけで良い。つまり被膜が融着する部分は0.5
%を越えても良い。
In the present invention, it is not necessary for the entire ceramic to determine the residual amount of the auxiliary component to be 0.5% or less. At least the surface layer portion of the portion where the coating on the patterning surface is not fused may be used. That is, the portion where the coating is fused is 0.5
% May be exceeded.

【0015】0.5%を越える助剤成分が残留するセラ
ミック基材では、表層部のセラミック粒界のエッチング
処理をすると本発明合金のしみだし拡散を防止できる。
ここでセラミック粒界のエッチング処理とは、セラミッ
ク粒界の助剤成分化合物をミクロ的にエッチングして除
去することを意味する。本発明のしみだし防止のための
エッチング処理の方法としては、乾式方法として熱処理
による方法、プラズマエッチングによる方法、湿式方法
としては、酸浸漬による方法、溶融塩浸漬による方法等
が有効であるが、もちろん本発明はこれのみに限定され
るものではなく、少なくとも粒界がエッチングできる方
法であれば、乾式、湿式を問わずいかなる方法でも有効
である。
In the case of a ceramic base material in which an auxiliary component exceeding 0.5% remains, the alloy of the present invention can be prevented from seepage and diffusion by etching the ceramic grain boundaries in the surface layer.
Here, the etching treatment of the ceramic grain boundary means that the auxiliary component compound at the ceramic grain boundary is micro-etched and removed. As a method of etching treatment for preventing bleeding of the present invention, a method by heat treatment as a dry method, a method by plasma etching, and a wet method by a method by acid immersion, a method by molten salt immersion, and the like are effective. Of course, the present invention is not limited to this, and any method is effective regardless of a dry method or a wet method as long as at least grain boundaries can be etched.

【0016】熱処理による方法は、助剤成分は減圧雰囲
気、窒素雰囲気で概ね1400℃以上に加熱すると表層
面の助剤成分が気化する性質を利用する方法である。し
たがって燒結したままのセラミックは焼成、冷却途中で
粒界の助剤成分は消散気化してエッチングされており、
本発明のセラミックの範疇に含まれ、そのまま使用でき
る。助剤の気化は最表層だけであるが、実用的には、こ
の程度の深さで十分であり、本発明合金のしみだし拡散
は阻止される。一方、プラズマエッチングでは、助剤成
分は窒化アルミ成分よりもエッチング速度が速いので、
この速度の差を利用して、助剤成分のみを選択的にエッ
チング除去できる。
The heat treatment method utilizes the property that the auxiliary component on the surface layer is vaporized when the auxiliary component is heated to about 1400 ° C. or more in a reduced-pressure atmosphere or a nitrogen atmosphere. Therefore, the as-sintered ceramic is etched during sintering and cooling, and the auxiliary components at the grain boundaries are vaporized and evaporated.
It is included in the category of the ceramic of the present invention and can be used as it is. Although the auxiliary is vaporized only in the outermost layer, in practice, this depth is sufficient and the exudation and diffusion of the alloy of the present invention is prevented. On the other hand, in plasma etching, the auxiliary component has a higher etching rate than the aluminum nitride component,
By utilizing this difference in speed, only the auxiliary component can be selectively removed by etching.

【0017】加熱した燐酸浴に浸漬することによっても
助剤層を選択的にエッチングして除去できる。また溶融
アルカリや溶融塩浴に浸漬しても助剤層は選択的にエッ
チングして除去できる。
The auxiliary layer can also be selectively etched and removed by immersion in a heated phosphoric acid bath. The auxiliary layer can be selectively etched and removed even when immersed in a molten alkali or molten salt bath.

【0018】又PVD、CVD,スパッタリング等で窒
化アルミニウム表層部の被膜を融着させない部分に助剤
のない窒化アルミニウム被膜を被覆するのもしみだし防
止に効果がある。これも本発明のセラミックに包含され
る。
Coating a portion of the aluminum nitride surface layer where the coating is not fused by PVD, CVD, sputtering or the like with an aluminum nitride coating having no auxiliary agent is effective in preventing exudation. This is also included in the ceramic of the present invention.

【0019】助剤成分の量が0.5%を越える窒化アル
ミニウムセラミックでも焼結後の表層部の助剤成分は気
散しており、この表面に本発明合金を融着させると濡
れ、しみだしは無く、合金ペーストを塗布した表面だけ
に融着するが、助剤が気散した表層を除去して助剤成分
を実質0.5%を越える量含む新生面にすると、融着被
膜の濡れの広がりが激しくなり、合金ペーストを塗布し
た表面以外にも濡れが広がるほど濡れ性が良くなり、し
みだしが起こり、印刷、描画、塗布等の従来手法で被膜
のパターニングができなくなる。かかる場合、新生面を
いったん全面濡らして融着させた後、皮膜の不必要な部
分をブラスト、研磨、ホーニング、ラッピング等で機械
的に除去加工してパターニングする方法も有効である。
Even in an aluminum nitride ceramic in which the amount of the auxiliary component exceeds 0.5%, the auxiliary component in the surface layer portion after sintering is diffused, and when the alloy of the present invention is fused to this surface, it becomes wet. There is no protruding, and only the surface to which the alloy paste is applied is fused. As the wetting spreads beyond the surface to which the alloy paste is applied, the wettability is improved and bleeding occurs, and the film cannot be patterned by conventional methods such as printing, drawing, and coating. In such a case, it is also effective to once wet the entire surface of the newly-formed surface and fuse it, and then mechanically remove unnecessary portions of the film by blasting, polishing, honing, lapping, or the like to perform patterning.

【0020】本発明のアルカリ土類金属化合物を焼結助
剤とする窒化アルミニウムセラミックとは、Ca,B
a,Sr等のアルカリ土類金属の酸化物、フッ化物、水
酸化物、炭酸塩、硝酸塩あるいはその他の化合物を窒化
アルミニウムの焼結原料に添加して燒結し、添加した助
剤が焼結体の粒界にアルカリ土類金属の化合物(主にア
ルミネート等の酸化物)の形で残留する窒化アルミニウ
ムセラミック焼結体を意味するものである。
The aluminum nitride ceramic containing the alkaline earth metal compound of the present invention as a sintering aid is Ca, B
a, Sr and other alkaline earth metal oxides, fluorides, hydroxides, carbonates, nitrates or other compounds are added to the aluminum nitride sintering raw material and sintered, and the added auxiliary is a sintered body. Means an aluminum earth ceramic sintered body remaining in the form of a compound of an alkaline earth metal (mainly an oxide such as aluminate) at the grain boundary of the above.

【0021】本発明合金被膜を融着させないセラミック
表層部に残留するこれらアルカリ土類金属の化合物の量
は、酸化物換算で3%以下、最も好ましくは1%以下に
規定することが好ましい。3%を越えると、溶融したS
i、Si合金はセラミックに対して濡れが良すぎて、パ
ターニングした被膜の融着区域よりも外に濡れが広がっ
てしみ出し、本来被膜を融着させない被膜と被膜の間に
しみだしが発生するので好ましくない。被膜をセラミッ
クヒーターのヒーター回路に使用する場合、回路の短絡
が起こる。
The amount of the alkaline earth metal compound remaining on the ceramic surface layer portion where the alloy coating of the present invention is not fused is preferably 3% or less, more preferably 1% or less in terms of oxide. If it exceeds 3%, molten S
i, Si alloy is too wet to the ceramic, so that the wet spreads out from the fused area of the patterned coating and oozes out, and oozing occurs between the coating which does not originally fuse the coating. Not preferred. When the coating is used in a heater circuit of a ceramic heater, a short circuit occurs in the circuit.

【0022】本発明でアルカリ土類金属化合物の助剤成
分の残留量を3%以下に規定するのは、希土類元素の場
合と同じく、セラミック全体である必要はない。少なく
とも被膜を融着させない被膜と被膜の隙間の部分だけで
良い。
In the present invention, the remaining amount of the auxiliary component of the alkaline earth metal compound is specified to be 3% or less, as in the case of the rare earth element, and need not be the whole ceramic. At least a portion of a gap between the coating and the coating that does not fuse the coating may be used.

【0023】3%を越える助剤成分が残留するセラミッ
ク基材では、希土類元素の場合と同じく、表層部だけ助
剤成分をエッチングすれば良い。
In the case of a ceramic substrate in which an auxiliary component exceeding 3% remains, the auxiliary component may be etched only in the surface layer, as in the case of the rare earth element.

【0024】尚、ここで酸化物換算とは、焼結体の中の
各アルカリ土類元素がCaO,BaO,SrO等の化学
式の酸化物で存在するとして、その量(重量%)に換算
して表示するということである。
Here, the oxide conversion means that each alkaline earth element in the sintered body is present as an oxide of a chemical formula such as CaO, BaO, SrO or the like, and is converted to the amount (% by weight). Means to display.

【0025】なお助剤として希土類元素化合物とアルカ
リ土類元素化合物が併用され、両方が残留する場合、こ
の場合、しみだしを防ぐためには、希土類元素化合物の
上限値(0.5%)以下、及びアルカリ土類元素化合物
の上限値(3%)以下で、両方の上限値以下でなければ
ならない。
When a rare earth element compound and an alkaline earth element compound are used in combination as auxiliary agents and both remain, in this case, in order to prevent bleeding, the upper limit of the rare earth element compound (0.5%) or less is set. And the upper limit of the alkaline earth element compound (3%) or less, and the upper limit of both.

【0026】本発明でいう窒化アルミセラミックとは、
前記した助剤の有り無しに係らず、電気的、機械的、熱
的特性の改善の為に、誘電特性の改善の為に、機械加工
性の改善の為に、セラミックの色を変えたりするため
に、あるいはその他の特性を改善するために、本来の窒
化アルミニウムセラミックの特性を損ねない範囲で、他
のセラミック成分(アルミナ、ジルコニア、チタニア、
クロミア、BN、SiC等)を少量添加された窒化アル
ミセラミック全般をさす。
The aluminum nitride ceramic referred to in the present invention is:
Regardless of the presence or absence of the above-mentioned auxiliaries, the color of the ceramic is changed for improving the electrical, mechanical and thermal properties, for improving the dielectric properties, and for improving the machinability. Other ceramic components (alumina, zirconia, titania,
Chromia, BN, SiC, etc.) are all aluminum nitride ceramics to which a small amount is added.

【0027】本発明の融着被膜は高抵抗で、耐熱、耐酸
化性に優れているので、パターニングした被膜に通電し
て発熱させる用途(ヒーター)及び電気機器の抵抗器と
して好適に使用できる。
Since the fused film of the present invention has high resistance, excellent heat resistance and oxidation resistance, it can be suitably used as an application (heater) for applying heat to a patterned film to generate heat and a resistor for electric equipment.

【0028】また本発明の融着被膜は窒化アルミと金属
を接合するときの中間メタライズ層としても有効であ
る。またセラミックに電圧を印可するときの電極皮膜と
しても有効である。また特に助剤を前記上限を越える量
含む窒化アルミ基材では、濡れの拡散が激しい融着皮膜
が得られ、これは逆に極めて薄い平滑なメタライズ膜を
形成できることになるので、電極被膜として極めて好適
である。また表面に、本発明合金被膜を形成後、融着皮
膜を所定の模様形状にパターニングし、この上に必要に
応じてニッケル、金等をメッキして、あるいは直接、所
定の金属材、例えば銅板等をロー付け、半田付けするこ
とにより熱応力の小さなヒートシンク等の接合体ができ
る。
The fusion coating of the present invention is also effective as an intermediate metallization layer when joining aluminum nitride and metal. It is also effective as an electrode coating when applying a voltage to the ceramic. In particular, in the case of an aluminum nitride substrate containing an auxiliary agent in an amount exceeding the above upper limit, a fused film in which the diffusion of wetness is intense is obtained, and conversely, a very thin smooth metallized film can be formed. It is suitable. Further, after forming the alloy film of the present invention on the surface, the fusion film is patterned into a predetermined pattern shape, and nickel, gold or the like is plated thereon as necessary, or directly, a predetermined metal material, for example, a copper plate. By soldering and soldering, a joined body such as a heat sink having small thermal stress can be obtained.

【0029】[0029]

【実施例】実施例によって本発明を説明する。 実施例1 セラミック基材:表面を研磨加工して新生面を露呈させ
た窒化アルミ板(燒結助剤としてイツトリア5wt%含
む) 寸法 :50×50×厚さ1mm 回路の印刷 セラミック基材にSi−7%Ti−5%Mo合金組成
(wt%)の金属粉末とPVPのアルコール溶液を混ぜ
て作ったペーストを300μmの厚さで図1の形状にス
クリーン印刷し、乾燥した後、真空中、1350℃で加
熱した。 回路の幅 : 2mm 回路間距離 : 1mm 回路は基板に融着したが、回路間に濡れの広がりによる
しみだしが発生し回路と回路の間で一部に短絡が起こっ
た。一方、上記表面加工したセラミック基材を窒素中、
1650℃で30分熱処理加工して表層部の助剤の消散
をしたものについても同じ工程でテストした。回路は基
板に融着し、回路間にしみだしはなく、シャープな回路
が形成され、短絡も起こらなかった。電気抵抗は13オ
ームであった。 通電テスト 回路の端末に交流電圧を印可して通電した。5分で70
0℃まで加熱できた。表層部の助剤の消散はしみだし、
短絡の防止に著効があることを確認できた。
The present invention will be described by way of examples. Example 1 Ceramic substrate: Aluminum nitride plate whose surface was polished to expose a new surface (containing 5 wt% of itria as a sintering aid) Dimensions: 50 × 50 × 1 mm Thickness of circuit Printed circuit substrate with Si-7 % Ti-5% Mo alloy composition (wt%) is mixed with a metal powder and a PVP alcohol solution, and the paste is screen-printed in a shape of FIG. 1 in a thickness of 300 μm in a shape of FIG. And heated. Circuit width: 2 mm Distance between circuits: 1 mm Although the circuit was fused to the substrate, bleeding occurred due to the spread of wetness between the circuits, and a short circuit occurred partially between the circuits. On the other hand, the surface-treated ceramic substrate is placed in nitrogen,
The same process was performed on the material which had been subjected to heat treatment at 1650 ° C. for 30 minutes to dissipate the auxiliary agent in the surface layer. The circuit was fused to the substrate, there was no bleeding between the circuits, a sharp circuit was formed, and no short circuit occurred. The electrical resistance was 13 ohm. Energization test An AC voltage was applied to the terminals of the circuit and energized. 70 in 5 minutes
It could be heated to 0 ° C. Dissipation of auxiliary materials on the surface layer begins to seep out,
It was confirmed that there was a significant effect in preventing short circuits.

【0030】実施例2 セラミック基材:表面を研磨加工した実質燒結助剤の入
ってない窒化アルミ使用 寸法 :50×50×厚さ1mm 回路の印刷 セラミック基材にSi−10%Ni合金組成(wt%)
の金属粉末とPVPのアルコール溶液を混ぜて作ったペ
ーストを150μmの厚さで図1の形状にスクリーン印
刷し、乾燥した後、真空中、1350℃で加熱した。 回路の幅 : 2mm 回路間距離 : 1mm 回路は基板に融着し、回路間にしみだしはなく、シャー
プな回路が形成され、短絡も起こらなかった。回路の抵
抗は25オームであった。
Example 2 Ceramic substrate: Use of aluminum nitride with a polished surface and substantially no sintering aid Dimensions: 50 × 50 × 1 mm Thickness Circuit printing A 10% Ni alloy composition on the ceramic substrate ( wt%)
1 was screen-printed in a 150 μm-thick shape into the shape shown in FIG. 1 and dried, and then heated at 1350 ° C. in a vacuum. Circuit width: 2 mm Distance between circuits: 1 mm The circuit was fused to the substrate, no bleeding between circuits, a sharp circuit was formed, and no short circuit occurred. The circuit resistance was 25 ohms.

【0031】実施例3 焼結助剤成分と濡れの拡散についてテストした。 セラミック基材:酸化物換算で表1、表2の組成の希土
類元素の酸化物(助剤成分)を含む窒化アルミ板を使用
焼結後、表面層を1mm研磨して新生面を露呈させた。 板の寸法 :20×20×厚さ5mm 回路の印刷 セラミック基材表面に、表1、表2の組成の合金粉末と
PVPのアルコール溶液を混ぜて作ったペーストを30
0μmの厚さ図1の形状にスクリーン印刷し乾燥後、真
空中、表1、表2の各温度に加熱、溶融した。 回路の幅 : 2mm 回路間距離 : 1mm 結果 本テストより、希土類元素の助剤成分の量が0.5%以
下では融着合金のしみだしが無くなることが確認でき
た。
Example 3 Sintering aid components and wetting diffusion were tested. Ceramic substrate: After sintering using an aluminum nitride plate containing a rare earth element oxide (auxiliary component) having the composition shown in Tables 1 and 2 in terms of oxide, the surface layer was polished by 1 mm to expose a new surface. Board dimensions: 20 × 20 × 5 mm thickness Circuit printing A paste made by mixing an alloy powder of the composition shown in Tables 1 and 2 and an alcoholic solution of PVP on the surface of the ceramic base material is 30 times.
Screen printing was performed in a shape of FIG. 1 having a thickness of 0 μm, and after drying, it was heated and melted in vacuum at each temperature shown in Tables 1 and 2. Circuit width: 2 mm Distance between circuits: 1 mm Results From this test, it was confirmed that when the amount of the auxiliary component of the rare earth element was 0.5% or less, exudation of the fusion alloy was eliminated.

【0032】実施例4 上記実施例3のしみだし有りのセラミックについて下記
表3に記載したエッチング処理をして濡れ、しみだしの
テストをした。 結果 セラミック基材の粒界はエッチングされており、Si合
金のしみだしは防止できることが確認できた。
Example 4 The exuded ceramic of Example 3 was subjected to the etching treatment shown in Table 3 below to test for wetness and exudation. Result The grain boundary of the ceramic substrate was etched, and it was confirmed that the exudation of the Si alloy could be prevented.

【0033】実施例5 焼結助剤成分と濡れの拡散についてテストした。 セラミック基材:酸化物換算で表4の組成のアルカリ土
類金属の酸化物(助剤成分)を含む窒化アルミ板を使用
し、焼結後、表面層を1mm研磨して新生面を露呈させ
た。 板の寸法 :20×20×厚さ5mm 回路の印刷 セラミック基材表面に、表4の組成の合金粉末とPVP
のアルコール溶液を混ぜて作ったペーストを300μm
の厚さ図1の形状にスクリーン印刷し乾燥後、真空中、
表4の各温度に加熱、溶融した。 回路の幅 : 2mm 回路間距離 : 1m
本テストより、アルカリ土類金属の助剤成分の量が3%
以下では、融着合金のしみだしが無くなることが確認で
きた。
Example 5 Sintering aid components and wetting diffusion were tested. Ceramic substrate: An aluminum nitride plate containing an oxide (auxiliary component) of an alkaline earth metal having the composition shown in Table 4 in terms of oxide was used. After sintering, the surface layer was polished by 1 mm to expose a new surface. . Board dimensions: 20 x 20 x 5 mm thickness Circuit printing On a ceramic substrate surface, an alloy powder having the composition shown in Table 4 and PVP
300μm paste made by mixing alcohol solution
After screen printing and drying in the shape of Figure 1, in vacuum,
It heated and melted to each temperature of Table 4. Circuit width: 2 mm Distance between circuits: 1 m
m From this test, the amount of the alkaline earth metal auxiliary component was 3%
In the following, it was confirmed that exudation of the fusion alloy disappeared.

【0034】実施例6 セラミック基材:表面を研磨加工して新生面を露呈させ
た窒化アルミ板(燒結助剤としてイツトリア5%含む) 寸法 :50×50×厚さ1mm 被膜の印刷 セラミック基材にSi−7%Cr合金組成(wt%)の
金属粉末とPVPのアルコール溶液を混ぜて作ったペー
ストを100μmの厚さで片面に印刷し、乾燥した後、
真空中、1380℃で加熱した。印刷被膜は基板片面に
完全融着した。被膜は薄く平滑で、濡れの広がりが激し
く、しみだしが基板の裏面まで広がった。次に図1の回
路模様の厚さ0.5mm、回路被膜の幅が2mm、回路
被膜の間隔が15mmの樹脂マスクを作り、融着被膜に
貼り付けてマスキングして、アルミナ粉末をブラストし
てマスクされていない被膜部分を除去した。マスクを除
去すると、輪郭が極めてシャープにパターニングされた
図1の回路模様の融着皮膜が得られた。回路被膜は短絡
も無く、電気抵抗は89オームであった。 通電テスト 回路の端末に交流電圧を印可して通電した。10分で5
00℃まで加熱できた。
Example 6 Ceramic substrate: Aluminum nitride plate whose surface was polished to expose a new surface (containing 5% of yttria as a sintering aid) Dimensions: 50 × 50 × 1 mm Thickness Printing of coating Film on ceramic substrate A paste made by mixing a metal powder of a Si-7% Cr alloy composition (wt%) and an alcohol solution of PVP is printed on one side with a thickness of 100 μm and dried,
Heated at 1380 ° C. in vacuum. The printed coating was completely fused to one side of the substrate. The film was thin and smooth, and the spread of wetness was intense, and oozing spread to the back surface of the substrate. Next, a resin mask having a circuit pattern thickness of 0.5 mm, a circuit coating width of 2 mm, and a circuit coating interval of 15 mm in FIG. 1 was prepared, attached to the fusion coating, masked, and blasted with alumina powder. The unmasked coating was removed. When the mask was removed, a fused film having the circuit pattern shown in FIG. 1 having an extremely sharply patterned outline was obtained. The circuit coating had no short circuit and had an electrical resistance of 89 ohms. Energization test An AC voltage was applied to the terminals of the circuit and energized. 5 in 10 minutes
It could be heated to 00 ° C.

【0035】実施例7 上記実施例5のしみだし有りのセラミックについて下記
表4に記載したエッチング処理をして濡れ、しみだしの
テストをした。 結果 セラミック基材の粒界はエッチングされており、Si合
金のしみだしは防止できることが確認できた。
Example 7 The exuded ceramics of Example 5 were subjected to the etching treatment shown in Table 4 below to test for wetness and exudation. Result The grain boundary of the ceramic substrate was etched, and it was confirmed that the exudation of the Si alloy could be prevented.

【0036】[0036]

【発明の効果】以上詳記したように、本発明は、合金の
濡れによるパターン部分からのしみだしを防止できる構
造であり、窒化アルミニウム基材の表面に耐熱、耐酸化
性、密着強度に優れ、短絡のない精密な被膜を形成でき
るものであり、窒化アルミニウムセラミックと金属膜の
複合体の新しい用途の創生と性能向上に多大の貢献をな
すものである。
As described in detail above, the present invention has a structure capable of preventing seepage from the pattern portion due to the wetting of the alloy, and is excellent in heat resistance, oxidation resistance and adhesion strength on the surface of the aluminum nitride substrate. It can form a precise film without short-circuit, and greatly contributes to the creation of new applications and the improvement of performance of the composite of the aluminum nitride ceramic and the metal film.

【図面の簡単な説明】[Brief description of the drawings]

【図1】図1は実施例の回路の模様を説明した図であ
る。
FIG. 1 is a diagram for explaining a circuit pattern of an embodiment.

【符号の説明】[Explanation of symbols]

1…抵抗回路 2…セラミック基材 1: Resistive circuit 2: Ceramic substrate

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H05B 3/20 328 H05B 3/20 328 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) H05B 3/20 328 H05B 3/20 328

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】希土類元素化合物を焼結助剤とする窒化ア
ルミセラミック基材にSiあるいはSi合金の被膜がパ
ターン模様に選択的にパターンニングされて融着した構
造のセラミックと金属被膜の複合体において、該パター
ンニング面の該被膜を融着させないセラミック基材露出
面表層部の燒結助剤成分の量を希土類元素の酸化物に換
算して0.5%以下にしてなることを特徴とするセラミ
ックと金属被膜の複合体。
A composite of a ceramic and a metal coating having a structure in which a coating of Si or a Si alloy is selectively patterned into a pattern and fused to an aluminum nitride ceramic base material using a rare earth element compound as a sintering aid. Wherein the amount of the sintering aid component in the surface layer portion of the exposed surface of the ceramic substrate on which the coating on the patterning surface is not fused is reduced to 0.5% or less in terms of oxides of rare earth elements. Composite of ceramic and metal coating.
【請求項2】上記セラミック基材が表面を粒界エッチン
グされたセラミックである請求項1記載のセラミックと
金属被膜の複合体。
2. The composite of claim 1, wherein said ceramic substrate is a ceramic whose surface is grain boundary etched.
【請求項3】希土類元素の酸化物に換算して0.5%を
越える量焼結助剤を含有する窒化アルミニウムセラミッ
ク基材の新生面にSiあるいはSi合金の被膜がパター
ン模様に選択的にパターンニングされて融着した構造の
セラミックと金属被膜の複合体であって、該パターンニ
ング被膜は、該基材の新生面に融着させた被膜の不必要
な部分を機械的な除去加工で除去することによって形成
してなることを特徴とするセラミックと金属被膜の複合
体。
3. An aluminum nitride ceramic substrate containing a sintering aid in an amount exceeding 0.5% in terms of a rare earth element oxide is coated with a Si or Si alloy film selectively on a new pattern. A composite of a ceramic and metal coating having a textured and fused structure, wherein the patterned coating removes unnecessary portions of the coating fused to the nascent surface of the substrate by mechanical removal processing. A composite of a ceramic and a metal coating, characterized by being formed by the above method.
【請求項4】上記希土類元素がYである請求項1〜3の
いずれかに記載のセラミックと金属被膜の複合体。
4. The composite of claim 1, wherein said rare earth element is Y.
【請求項5】アルカリ土類金属化合物を焼結助剤とする
窒化アルミセラミック基材にSiあるいはSi合金の被
膜がパターン模様に選択的にパターンニングされて融着
した構造のセラミックと金属被膜の複合体において、該
パターンニング面の該被膜を融着させないセラミック基
材露出面表層部の燒結助剤成分の量をアルカリ土類金属
の酸化物に換算して3%以下にしてなることを特徴とす
るセラミックと金属被膜の複合体。
5. A ceramic and metal coating having a structure in which a coating of Si or a Si alloy is selectively patterned into a pattern and fused to an aluminum nitride ceramic base material using an alkaline earth metal compound as a sintering aid. In the composite, the amount of the sintering aid component in the surface layer portion of the exposed surface of the ceramic substrate which does not fuse the coating on the patterning surface is reduced to 3% or less in terms of alkaline earth metal oxide. Composite of ceramic and metal coating.
【請求項6】上記セラミック基材が表面を粒界エッチン
グされたセラミックである請求項5記載のセラミックと
金属被膜の複合体。
6. The composite of claim 5, wherein said ceramic substrate is a ceramic whose surface is grain boundary etched.
【請求項7】アルカリ土類金属の酸化物に換算して3%
を越える量焼結助剤を含有する窒化アルミニウムセラミ
ック基材の新生面にSiあるいはSi合金の被膜がパタ
ーン模様に選択的にパターンニングされて融着した構造
のセラミックと金属被膜の複合体であって、該パターン
ニング被膜は、該基材の新生面に融着させた被膜の不必
要な部分を機械的な除去加工で除去することによって形
成してなることを特徴とするセラミックと金属被膜の複
合体。
7. 3% in terms of alkaline earth metal oxide
A composite of a ceramic and metal coating having a structure in which a coating of Si or a Si alloy is selectively patterned and fused to a new surface of an aluminum nitride ceramic substrate containing a sintering aid in an amount exceeding A composite of a ceramic and a metal coating, wherein the patterning coating is formed by mechanically removing unnecessary portions of the coating fused to the nascent surface of the substrate. .
【請求項8】上記アルカリ土類金属がCaである請求項
5〜7のいずれかに記載のセラミックと金属被膜の複合
体。
8. The composite of a ceramic and a metal coating according to claim 5, wherein said alkaline earth metal is Ca.
JP2000372155A 1999-11-07 2000-10-30 Method for preventing oozing of Si or Si alloy Expired - Fee Related JP4031615B2 (en)

Priority Applications (1)

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Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP35347199 1999-11-07
JP11-353471 1999-11-07
JP2000372155A JP4031615B2 (en) 1999-11-07 2000-10-30 Method for preventing oozing of Si or Si alloy

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JP4031615B2 JP4031615B2 (en) 2008-01-09

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Country Link
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005076666A1 (en) * 2004-02-04 2005-08-18 The Doshisha Heat porducing material in thin film form and method for manufacture thereof
JP2007112687A (en) * 2005-10-24 2007-05-10 Noritake Co Ltd Metallic silicon based cementing material, bonded product and its manufacturing method
JP2011148554A (en) * 2010-01-22 2011-08-04 C & Tech Corp Dual chamber pouch having pressure-openable non-sealing surface and preferable heat sealing mould for manufacturing the same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005076666A1 (en) * 2004-02-04 2005-08-18 The Doshisha Heat porducing material in thin film form and method for manufacture thereof
JP2007112687A (en) * 2005-10-24 2007-05-10 Noritake Co Ltd Metallic silicon based cementing material, bonded product and its manufacturing method
JP4571059B2 (en) * 2005-10-24 2010-10-27 株式会社ノリタケカンパニーリミテド Method for manufacturing porous cylindrical module
JP2011148554A (en) * 2010-01-22 2011-08-04 C & Tech Corp Dual chamber pouch having pressure-openable non-sealing surface and preferable heat sealing mould for manufacturing the same

Also Published As

Publication number Publication date
JP4031615B2 (en) 2008-01-09

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