JP2001210494A - Plasma generator - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a plasma generator, enabled to control the density distribution of plasma, with high generating efficiency, generating a plasma with good homogeneity at a big area and clean. SOLUTION: A vacuum container 20 is constructed mainly by an upper container 21 and a lower container 22. The whole part of the upper container 21 is constructed integrally by a discharging electrode 1, and formed in the shape of lid so as to put on a lid on the lower container 22. The lid-shaped discharging electrode is composed of a cylindrical part 2 and a ceiling part 3 distributing high-frequency electric power evenly to the cylindrical part 2 and neighboring area of the cylinder part. The ceiling part 3 closes the upper part of the cylindrical part 2, and distributes high-frequency power supplied from the center of the ceiling part 3 evenly to the cylindrical part 2. A plate electrode 4 is installed between the ceiling part 3 and a insulation body 5, and plasma is confined by dint of permanent magnets 12 installed at the periphery of the cylindrical part 2 and permanent magnets 13 installed at the ceiling part 3.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a modified magnetron high-frequency discharge type plasma generator, and more particularly to a plasma generator capable of generating a large-area plasma.

[0002]

2. Description of the Related Art A modified magnetron-type plasma source using a cylindrical discharge electrode as a plasma source (for example, see Japanese Unexamined Patent Publication No.
No. 201831). The plasma source described in this publication has a cylindrical discharge electrode with an open top and bottom interposed at the center of the side wall of the vacuum vessel, and supplies high-frequency power from one point on the outer periphery of the cylindrical discharge electrode,
A ring-shaped permanent magnet is arranged on the outer periphery of the side wall of the vacuum vessel including the outer periphery of the discharge electrode. A high-frequency electric field formed by the cylindrical discharge electrode and a magnetic field formed by the ring-shaped permanent magnet efficiently generate magnetron discharge to generate plasma.

[0003]

However, the deformed magnetron type plasma source using the above-mentioned cylindrical discharge electrode has the following problems.

(1) Since the supply position of the high-frequency power to the cylindrical discharge electrode is asymmetric, the electric field distribution becomes non-uniform and the uniformity of the plasma is poor. When the diameter of the cylindrical discharge electrode is larger than 1 m or more, uniformity of plasma distribution becomes a particular problem due to asymmetrical supply of high-frequency power. When the present invention is applied to a plasma generation apparatus for a liquid crystal display having a rectangular substrate whose substrate size is increasing, it is difficult to generate a rectangular plasma with good rectangular large-area plasma generation efficiency and uniformity.

(2) Since the high-frequency electric field is controlled only by the discharge electrode interposed at the center of the vacuum vessel, the plasma generation efficiency and the controllability of the plasma density distribution are poor.

(3) Plasma is mainly generated in a cylindrical discharge electrode. However, since the permanent magnet is arranged only on the outer periphery of the side wall of the vacuum vessel, the generated plasma is confined radially inward but not axially. For this reason, the plasma comes into contact with the inner wall at the axial end of the vacuum vessel, and the inner wall is shaved to generate particles, so that clean plasma cannot be obtained.

An object of the present invention is to solve the above-mentioned problems of the prior art by changing the shape of a discharge electrode in a modified magnetron type plasma generating apparatus.
It is an object of the present invention to provide a plasma generation apparatus which has good plasma uniformity even in a large area, high plasma generation efficiency, good controllability of plasma density distribution, and which can generate clean plasma.

[0008]

According to the present invention, there is provided a discharge electrode having a cylindrical portion and a distributor for uniformly distributing high-frequency power to the cylindrical portion, and a plasma is generated inside the discharge electrode. It is a plasma generation device. The distributing section only needs to be capable of distributing high-frequency power evenly over the entire circumference of the cylindrical section, and may be configured mechanically or electrically, for example. Since a uniform high-frequency power can be distributed to the cylinder by the distribution unit, uniform plasma can be generated inside the discharge electrode.

[0009] In the above invention, it is preferable that the distributing section comprises a top plate section for closing an upper portion of the cylindrical section, and first high frequency power supply means for supplying high frequency power to the center of the top plate section. . By forming the discharge electrode as a lid-shaped discharge electrode in which the top of the cylindrical portion is integrally covered with the top plate, high-frequency power can be supplied from the center of the upper portion of the discharge electrode.
When high-frequency power is supplied to the upper center of the discharge electrode, the high-frequency power supply position becomes symmetrical, and high-frequency power can be supplied symmetrically within the discharge electrode, so that a uniform high-frequency electric field occurs.
A uniform plasma can be generated. In addition, since the top plate portion closing the cylindrical portion constituting the discharge electrode acts as an auxiliary electrode,
Since plasma can be expected to be generated not only on the inner wall of the cylinder but also on the inner wall of the top plate, the efficiency of plasma generation is increased.

In the above invention, a flat plate electrode is provided inside the top plate portion via an insulator, and second high frequency power supply means for supplying high frequency power to the flat plate electrode is provided, or the flat plate electrode is electrically connected. It may be set to a floating state or connected to a reference potential. When a plate electrode is provided in addition to the discharge electrode, the controllability of the plasma density distribution is improved as compared with the case where the magnetron discharge is caused only by the discharge electrode. That is, when the second high-frequency power supply means is provided on the flat electrode, high-frequency power independent from both the discharge electrode and the flat electrode can be supplied, and the high-frequency power can be supplied on the inner wall of the cylindrical portion of the discharge electrode and the inner wall of the top plate. Since plasma can be generated in both of the above, the plasma generation efficiency can be further enhanced. In addition, since high-frequency power to be supplied to the discharge electrode and the flat plate electrode can be supplied independently, controlling the ratio and phase of the high-frequency power improves controllability of the plasma density distribution. When the flat electrode is set at the floating or reference potential, the plasma generation contribution of the flat electrode is reduced, and the plasma generation contribution is mainly limited to the discharge electrode. Therefore, the plasma generation efficiency and the plasma density distribution can be controlled by the flat electrode. .

In the above invention, on the outer periphery of the discharge electrode,
It is preferable to arrange a permanent magnet for supplying a magnetic field to the inner periphery of the discharge electrode. For example, at least two permanent magnets are arranged on the outer periphery of the discharge electrode so as to surround the cylindrical portion.
Preferably, a plurality of ring-shaped permanent magnets are provided, the permanent magnets are magnetized in the radial direction, and the polarities are opposite to each other. When the permanent magnet is provided in this manner, the magnetron discharge is efficiently generated around the inside of the discharge electrode by the uniform high-frequency electric field and the magnetic field surrounding the periphery of the discharge electrode.

In the invention, it is preferable that a permanent magnet for supplying a magnetic field to the surface of the flat plate electrode is arranged on the top plate. When a permanent magnet is arranged above the discharge electrode so that a magnetic field can be supplied also to the flat electrode surface,
In particular, when high-frequency power is supplied to the flat electrode, the high-frequency electric field obtained by this and the magnetic field above the discharge electrode cause magnetron discharge to occur efficiently on the surface of the flat electrode. The plasma generated in the discharge electrode is
It is suppressed radially inward by the permanent magnet provided on the outer periphery of the discharge electrode, and is also suppressed axially inward by the permanent magnet provided on the top plate of the discharge electrode, and is confined in the center of the discharge electrode. Can be For this reason, the plasma is disconnected from the inner wall of the discharge electrode and does not scrape the inner wall, so that the plasma is clean without contamination. It is more effective to set the polarity so that the magnetic lines of force of the permanent magnets are connected to the periphery of the discharge electrode and the upper part of the discharge electrode.

In the above invention, the discharge electrode is an upper container, a lower container is covered with the upper container via an insulating ring to form a vacuum container, and a substrate holder is disposed in the lower container. It is preferable to use a plasma generation device. Third high-frequency power supply means for supplying high-frequency power to the substrate holder may be provided, or the substrate holder may be connected to a reference potential. Further, the plasma density distribution can be controlled by changing the interval between the permanent magnets and the magnetic field intensity, and further controlling the ratio and phase of the high-frequency power from the first and second high-frequency power supply means. By doing so, especially in a large area, uniformity is good, plasma generation efficiency is high, controllability of plasma density distribution is good, and clean plasma can be generated.

[0014]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a modified magnetron type plasma generating apparatus according to the present invention will be described below. The vacuum vessel in which the plasma generation area is set,
It is divided into upper and lower parts and mainly consists of an upper container and a lower container.

FIG. 2 shows a lid-shaped discharge electrode 1 constituting an upper container.
1 shows a longitudinal sectional view of the basic configuration of FIG. The lid-shaped discharge electrode 1 as an upper container is an electrode for forming a high-frequency electric field for magnetron discharge. Its shape is a lid that covers the opening of the lower container. The lid-shaped discharge electrode 1 has a cylindrical portion 2.
Is different from the open lower part, and is integrally closed by the same conductive top plate 3 as the cylindrical part 2. The top panel 3 constitutes a circuit that guides high-frequency power from the top panel 3 to the cylinder 2. First high frequency power supply means 6 for supplying high frequency power RF is provided at the center of the top plate 3 of the lid-shaped discharge electrode 1. The first high-frequency power supply means 6 includes a first high-frequency power supply 7 for outputting high-frequency power for magnetron discharge, a blocking capacitor 8, and the like. The top plate 3
And the first high-frequency power supply means 6 constitute a distribution unit. Since the supply position of the high-frequency power RF is set at the center of the top plate 3, high-frequency power can be uniformly distributed and supplied from the top plate 3 to the entire circumference of the cylindrical portion 2.

An insulator 5 is provided on the inner wall of the top plate 3 of the lid-shaped discharge electrode 1 so as to cover the entire inner wall.
A conductive flat plate electrode 4 is provided coaxially with the lid-shaped discharge electrode 1 through the electrode. The plate electrode 4 plays an auxiliary role and controls the plasma density distribution. For this purpose, a second high-frequency power supply means 9 for supplying the high-frequency power RF to the plate electrode 4 is provided. The second high-frequency power supply means 9 includes a second high-frequency power supply 10, a blocking capacitor 11, and the like, and can supply high-frequency power into the lid-shaped discharge electrode 1.

In FIG. 2, when the plate electrode 4 is not connected to the second high-frequency power supply means 9 but is connected to a floating state or ground, only the side wall of the cylindrical portion 2 of the lid-shaped discharge electrode 1 functions as an RF electrode. . When both the insulator 5 and the plate electrode 4 are removed, the inner wall of the top plate 3 of the lid-shaped discharge electrode 1 functions as an auxiliary electrode. Therefore, plasma generation can be expected not only on the side wall of the cylindrical portion 2 but also on the inner wall of the top plate portion 3.

FIG. 3 is a longitudinal sectional view of the lid-shaped discharge electrode 1 in which two types of permanent magnets 12 and 13 are further provided in the basic structure of the lid-shaped discharge electrode 1 of FIG. The surrounding permanent magnets 12
It is installed on the peripheral surface of the lid-shaped discharge electrode 1 to generate magnetron discharge. The upper permanent magnet 13 is provided to suppress the sputtering effect of the flat electrode 4. The magnetic field strengths of the two permanent magnets 12 and 13 are set so as to have a relation of the peripheral permanent magnet 12> the upper permanent magnet 13.

The peripheral permanent magnets 12 form lines of magnetic force 14 for magnetron discharge in the inner peripheral portion of the cylindrical portion 2. The permanent magnets 12 have a ring shape, and are disposed coaxially with the cylindrical portion 2 of the lid-shaped discharge electrode 1 in a pair. The two permanent magnets 12 are arranged separately from each other so as to surround the cylindrical portion 2. The permanent magnet 12 is magnetized in the radial direction. In this case, the two permanent magnets 12 are magnetized in opposite directions. The lines of magnetic force 14 extend from one permanent magnet 12 to the cylindrical portion 2.
Then, after turning inward in the radial direction and turning halfway, it enters the adjacent permanent magnet 12 outward in the radial direction.

The upper permanent magnet 13 supplies a magnetic field 15 to the surface of the plate electrode 4. The permanent magnets 13 have a substantially ring shape in plan view, and are arranged, for example, concentrically. These permanent magnets 13 are disposed on the top plate 3 of the lid-shaped discharge electrode 1. The permanent magnet 13 is magnetized in the radial direction of the cylindrical portion 2 in the axial direction. In this case, the plurality of permanent magnets 13 are magnetized in opposite directions between the magnets 13 adjacent to each other when viewed from a longitudinal section. The lines of magnetic force 15 are one permanent magnet 1
From 3, it goes inward in the axial direction of the cylindrical portion 2, and after being turned back halfway, enters the adjacent permanent magnet 13 outward in the axial direction.
The permanent magnet 12 provided on the cylindrical portion 2 which is adjacent to the corner portion 16 of the lid-shaped discharge electrode 1 and the permanent magnet 13 provided on the top plate portion 3 have a magnetic field line between these permanent magnets 12 and 13. The polarities are set so that 14 and 15 are connected.

When a high-frequency electric power is supplied from the second high-frequency power supply means 9 to the flat plate electrode 4 provided on the top plate portion 3 of the lid-shaped discharge electrode 1, a high-frequency electric field is generated. Due to the magnetic field of the top plate 3 of the electrode 1, magnetron discharge occurs efficiently on the surface of the plate electrode 4. In particular, if control means for controlling the ratio and the phase of the high-frequency power supplied to the lid-shaped discharge electrode 1 and the flat plate electrode 4 is provided, the magnetron discharge can be more efficiently generated on the surface of the flat plate electrode 4.

FIG. 1 is a schematic longitudinal sectional view of a plasma generating apparatus constituted by using the above-described lid-shaped discharge electrode 1. As shown in FIG. That is, the lid-shaped discharge electrode 1 is used as the upper container 21, and the lower container 22 is covered with the upper container 21 via the ring-shaped insulator 23 to form the vacuum container 20. A substrate holder 17 that supports a substrate is disposed at the bottom of the vacuum container 20 in the lower container 22. The substrate holder 17 is normally set in a floating state. However, the substrate holder 17 may be connected to a third high-frequency power supply unit 18 for supplying high-frequency power if necessary, or the substrate holder 17 may be connected to a reference potential (earth). You may. In addition,
The lower container 22 is grounded.

A control unit 25 is provided in the first and second high-frequency power supply units 6 and 9. The control unit 25 includes the high-frequency power sources 7, 1
The magnitude of the high frequency power output from 0 is electrically controlled. The control unit 25 controls the ratio and the phase of the two high-frequency powers to predetermined values. As the predetermined value, for example, a value that can obtain plasma having a uniform density distribution in the radial direction of the discharge electrode 1 is used. Although not shown, the space between the two permanent magnets 12, 12 and between the plurality of permanent magnets 13, 13 and the magnetic field strength are made variable.

In the plasma generating apparatus shown in FIG. 1, the top plate 3 of the lid-shaped discharge electrode 1 is not dropped to the ground.
Used as an RF electrode for applying high frequency power.
Therefore, when high-frequency power is supplied from the first high-frequency power supply means 6 to the lid-shaped discharge electrode 1, the high-frequency power is symmetrically supplied to the cylindrical portion 2 from the center of the top plate 3, and the high-frequency power is supplied to the lid-shaped discharge electrode 1. Applied evenly. Thereby, a uniform high-frequency electric field is generated in the discharge electrode 1, and uniform plasma can be generated. Further, the magnetron discharge is efficiently generated around the discharge electrode 1 by the uniform high-frequency electric field and the magnetic field 14 surrounding the periphery of the lid-shaped discharge electrode 1. Further, by disposing the insulator 5 and the flat plate electrode 4 in the upper part inside the lid-shaped discharge electrode 1, only the periphery of the lid-shaped discharge electrode 1 becomes a substantial electrode surface, and the area with respect to the ground is reduced. As a result, plasma can be intensively generated only around the lid-shaped discharge electrode 1. Here, the plate electrode 4 plays an auxiliary role,
Control the plasma density distribution.

By supplying high-frequency power from the second high-frequency power supply means 9 to the flat plate electrode 4 provided on the inner wall of the top plate 3 of the lid-shaped discharge electrode 1, a high-frequency electric field is generated in the lid-shaped discharge electrode 1. Occurs. This high-frequency electric field and the lid-shaped discharge electrode 1
The magnetron discharge is efficiently generated on the surface of the plate electrode 4 by the magnetic field of the permanent magnet 13 on the upper part of the flat electrode. Therefore, providing the plate electrode 4 further improves the plasma generation efficiency.

The plasma generated in the lid-shaped discharge electrode 1 is supplied to a permanent magnet 12 provided on the outer periphery of the discharge electrode 1.
Thus, it is suppressed inward in the radial direction, and is also suppressed inward in the axial direction by the permanent magnet 13 provided on the top plate 3 of the discharge electrode 1, and is confined in the center of the discharge electrode 1. For this reason, the plasma is disconnected from the inner wall of the discharge electrode 1, and the plasma can be cleaned without cutting the inner wall. Permanent magnet 1 on the periphery of discharge electrode 1 and on top of discharge electrode 1
It is more effective to set the polarity so that the magnetic lines of force 14 and 15 are connected to each other. In addition, permanent magnets 12 and 13
The plasma density distribution can be controlled by varying the interval and magnetic field strength of each and controlling the ratio and phase of each high-frequency power.

In the plasma generating apparatus shown in FIG. 1, a gas exhaust section for exhausting the atmosphere inside the vacuum vessel 20 and a gas introducing section for introducing a discharge gas into the vacuum vessel 20 are omitted. A flat plate electrode 4 which communicates with a gas inlet provided on a top plate 3 of the lid-shaped discharge electrode 1;
It is preferable to provide a gas shower for uniformly blowing gas.

Further, in the embodiment, the vacuum vessel in which the plasma generation region is set is divided into upper and lower parts, but it may be divided horizontally by 90 ° and divided into two parts.

Next, various embodiments of (1) a lid-shaped discharge electrode, (2) a plate electrode, and (3) an upper permanent magnet of the above-described embodiment will be described.

(1) Cross-sectional shape of cylindrical lid-shaped discharge electrode 1 (FIGS. 4 to 7) The flat cross-section is rectangular (FIG. 4), and a rectangular corner is rounded (FIG. 5). , A circular one (FIG. 6) and a substantially elliptical one (FIG. 7). In particular, those having a rectangular cross section are suitable for plasma processing of a large-area rectangular substrate.

(2) Planar shape of flat electrode (FIGS. 8 to 1)
5) Rectangular (FIG. 8), rectangular corners with R (FIG. 9), rectangular ring (FIG. 10), and rectangular ring with R (FIG. 11) ), Circular (FIG. 12), substantially elliptical (FIG. 13), circular ring (FIG. 14), substantially elliptical ring (FIG. 1).
5).

(3) Planar shape of upper permanent magnet (FIG. 16)
To FIG. 23) A triple rectangular ring shape in which similar rectangular rings 161 to 163 are arranged coaxially and in the same direction (FIG. 16), a rectangular ring 170 is divided into a plurality, and each divided rectangular ring 17 is formed.
There is a parallel double rectangular ring (FIG. 17) in which rectangular rings 174 to 176 similar to 1 to 173 are arranged coaxially and in the same direction. Further, the rectangular ring 180 is divided into a plurality of parts, and bar-shaped magnets 185 to 188 are arranged in the center of the divided rectangular rings 181 to 184 in alignment with the orientations of the rectangular rings 181 to 184.
Drill holes in adjacent walls at 88 and insert straight magnets 1 into these holes.
There is a double-sided comb-toothed rod (see FIG. 18) through which the rod-shaped magnet 89 is inserted and connected to the bar-shaped magnets 185 to 188 arranged in the respective rectangular rings 181 to 184. In addition, similar circular ring 1
A triple circular ring shape (FIG. 19) in which 91 to 193 are coaxially arranged, a cross-shaped magnet 202 is arranged in the center of the circular ring 201, and the circular ring 201 is provided between the arms of the cross magnet 202.
Star with arms 203 extending radially inward from FIG. 20 (FIG. 20), and triple elliptical rings with similar substantially elliptical rings 211-213 coaxially and in the same direction (FIG. 21). , A first focal point and a second focal point in the substantially elliptical ring 221.
A plurality of concentric rings 222, 223,
20 and FIG. 22, which is a modified example of FIG.
The two cross-shaped magnets 232 and 233 connected to the first and second focal points are disposed between the arms of the cross-shaped magnets 232 and 233, and the arms 23 radially inward from the substantially elliptical ring 231.
For example, there is a parallel star type (FIG. 23) obtained by extending the number 4. As shown in these figures, the polarities N and S between the facing magnets are opposite to each other.

[0033]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A case where the present invention is applied to a rectangular large-area plasma processing apparatus for processing a rectangular substrate will be described. The size of the rectangular substrate is 830 mm long × 650 mm wide. In the vacuum container, the outer diameter of the lid-type discharge electrode as the upper container has a length (x) of 1080 mm and a width (y).
850 mm, height (z) 100 mm.

A type in which a flat electrode 4 having a length of 870 mm and a width of 690 mm is attached to the inside of the lid-shaped discharge electrode 1 via an insulator 3 is referred to as type A. In the case where both the plate electrode 4 and the insulator 3 are removed, the type in which the top wall inside the lid-shaped discharge electrode 1 acts as an auxiliary electrode is referred to as type B. Both types of plasma density distribution will be described.

FIG. 24 shows a profile of the ion saturation current I _is generated by the above-described rectangular large-area plasma processing apparatus corresponding to a rectangular substrate of 830 × 650 mm ² . FIG. 24 shows an incident RF power of 500 W and z = 100.
It is plotted along the x direction measured at the center (y = 0 mm) and on both sides (y = ± 415 mm) of a rectangular substrate placed in mm. In FIG. 24, the horizontal axis is x (m
m), the vertical axis is the ion saturation current I _is (arbitrary unit).
Since the ion saturation current indicates the plasma density distribution, it is set to an arbitrary unit.

When the upper wall of the rectangular lid-shaped discharge electrode 1 is covered with the plate electrode 4 (type A), the ion saturation current profile in the x direction is 5.0 in FIG.
As the pressure of the argon gas is reduced from Pa to 0.1 Pa in FIG. 24B, the shape changes from a concave shape (a concave shape) to a flat profile.

On the other hand, when the upper wall of the rectangular lid-shaped discharge electrode is used as an auxiliary electrode (type B), the ion saturation current profile in the x direction is shown in FIG. As shown, it became convex (convex) at an argon pressure of 0.1 Pa.

When the incident RF power becomes 1 kW, z = −
The plasma density ( _ne ) measured at 100 mm and x = y = 0 mm is １1 × 10 ¹⁰ cm ⁻³ for type A.
The electron temperature (T _e ) was kept almost constant for both A and B types. Plasma space potential (V _S) is slightly decreased with pressure.

As described above, under low pressure, a uniform plasma profile can be obtained without using an auxiliary electrode (type A). On the other hand, under high pressure, the use of a lid-shaped discharge electrode as an auxiliary electrode proves to be effective for uniform plasma generation (type B).

[0040]

According to the present invention, since the distributor for distributing high-frequency power to the discharge electrode is provided, the electric field distribution in the discharge electrode can be made uniform, and the uniformity of plasma can be improved. it can.

[Brief description of the drawings]

FIG. 1 is a schematic view of a lid-shaped discharge electrode and a flat electrode according to an embodiment.

FIG. 2 is a schematic view of a peripheral portion of a lid-shaped discharge electrode and an arrangement of permanent magnets and lines of magnetic force according to an embodiment.

FIG. 3 is a schematic diagram of a plasma generation device according to an embodiment.

FIG. 4 is a schematic plan sectional view of a lid-shaped discharge electrode according to a rectangular embodiment.

FIG. 5 is a schematic plan sectional view of a lid-shaped discharge electrode according to the embodiment having a substantially rectangular shape.

FIG. 6 is a schematic plan cross-sectional view of a lid-shaped discharge electrode according to an embodiment having a circular shape.

FIG. 7 is a schematic plan sectional view of a lid-shaped discharge electrode according to an embodiment having a substantially elliptical shape.

FIG. 8 is a schematic plan view of a rectangular plate electrode according to the embodiment.

FIG. 9 is a schematic plan view of a substantially rectangular plate electrode according to the embodiment.

FIG. 10 is a schematic plan view of a plate electrode according to an embodiment having a rectangular ring shape.

FIG. 11 is a schematic plan view of a plate electrode according to an embodiment having a substantially rectangular ring shape.

FIG. 12 is a schematic plan view of a flat plate electrode according to an embodiment having a circular shape.

FIG. 13 is a schematic plan view of a substantially elliptical plate electrode according to the embodiment.

FIG. 14 is a schematic plan view of a plate electrode according to an embodiment having a circular ring shape.

FIG. 15 is a schematic plan view of a plate electrode according to an embodiment having a substantially elliptical ring shape.

FIG. 16 is a layout diagram of an upper permanent magnet according to the embodiment having a rectangular triple ring shape.

FIG. 17 is an arrangement diagram of upper permanent magnets according to the embodiment having a parallel rectangular double ring shape.

FIG. 18 is a layout view of an upper permanent magnet according to the embodiment having a double-sided comb shape.

FIG. 19 is a layout diagram of an upper permanent magnet according to the embodiment having a circular triple ring shape.

FIG. 20 is a layout diagram of an upper permanent magnet according to an embodiment having a circular star shape.

FIG. 21 is a layout diagram of an upper permanent magnet according to an embodiment having a substantially elliptical ring shape.

FIG. 22 is a layout diagram of an upper permanent magnet according to the embodiment having a double eyeball ring shape.

FIG. 23 is a layout diagram of an upper permanent magnet according to an embodiment having a substantially elliptical star shape.

FIG. 24 is a characteristic diagram of an ion saturation current profile according to the embodiment.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Lid-shaped discharge electrode 2 Cylindrical part 3 Top plate part 4 Plate electrode 5 Insulator 6 First high frequency power supply means 9 Second high frequency power supply means

 ──────────────────────────────────────────────────の Continuing on the front page (72) Inventor Li Unryu 3--14-20 Higashinakano, Nakano-ku, Tokyo Inside Kokusai Electric Co., Ltd. (72) Inventor Shishio Tominaga 3-14-20 Higashinakano, Nakano-ku, Tokyo Kokusai Denki Co., Ltd. (72) Inventor Tokuyoshi Sato 4-17-113 Kadan, Aoba-ku, Sendai City, Miyagi Prefecture (72) Inventor Tetsu Iizuka 6-5-10-201, Koriyama, Taihaku-ku, Sendai City, Miyagi Prefecture

Claims (5)

[Claims] 1. A plasma generating apparatus comprising: a discharge electrode having a cylindrical portion; and a distribution portion for uniformly distributing high-frequency power to the cylindrical portion, wherein a plasma is generated inside the discharge electrode. 2. The apparatus according to claim 1, wherein the distribution unit includes a top plate for closing an upper portion of the cylindrical portion, and first high-frequency power supply means for supplying high-frequency power to a center of the top plate. The plasma generation apparatus according to any one of the preceding claims. 3. A flat plate electrode is provided inside the top plate portion via an insulator, and second high frequency power supply means for supplying high frequency power to the flat plate electrode is provided, or the flat plate electrode is electrically floated. 3. The plasma generating apparatus according to claim 2, wherein the plasma generating apparatus is set to a state or connected to a reference potential. 4. The plasma generating apparatus according to claim 1, wherein a permanent magnet that supplies a magnetic field to an inner periphery of the discharge electrode is arranged on an outer periphery of the discharge electrode. 5. The plasma generating apparatus according to claim 2, wherein a permanent magnet that supplies a magnetic field to the surface of the plate electrode is disposed on the top plate.