JP2001208708A - 斜出射電子線プローブマイクロｘ線分析による異物の分析方法およびその装置 - Google Patents

斜出射電子線プローブマイクロｘ線分析による異物の分析方法およびその装置

Info

Publication number
JP2001208708A
JP2001208708A JP2000022205A JP2000022205A JP2001208708A JP 2001208708 A JP2001208708 A JP 2001208708A JP 2000022205 A JP2000022205 A JP 2000022205A JP 2000022205 A JP2000022205 A JP 2000022205A JP 2001208708 A JP2001208708 A JP 2001208708A
Authority
JP
Japan
Prior art keywords
sample
characteristic
ray
electron beam
angle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000022205A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001208708A5 (OSRAM
Inventor
Koichi Tsuji
幸一 辻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Science and Technology Agency
Original Assignee
Japan Science and Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Science and Technology Corp filed Critical Japan Science and Technology Corp
Priority to JP2000022205A priority Critical patent/JP2001208708A/ja
Publication of JP2001208708A publication Critical patent/JP2001208708A/ja
Publication of JP2001208708A5 publication Critical patent/JP2001208708A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)
JP2000022205A 2000-01-31 2000-01-31 斜出射電子線プローブマイクロｘ線分析による異物の分析方法およびその装置 Pending JP2001208708A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000022205A JP2001208708A (ja) 2000-01-31 2000-01-31 斜出射電子線プローブマイクロｘ線分析による異物の分析方法およびその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000022205A JP2001208708A (ja) 2000-01-31 2000-01-31 斜出射電子線プローブマイクロｘ線分析による異物の分析方法およびその装置

Publications (2)

Publication Number Publication Date
JP2001208708A true JP2001208708A (ja) 2001-08-03
JP2001208708A5 JP2001208708A5 (OSRAM) 2005-10-20

Family

ID=18548533

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000022205A Pending JP2001208708A (ja) 2000-01-31 2000-01-31 斜出射電子線プローブマイクロｘ線分析による異物の分析方法およびその装置

Country Status (1)

Country Link
JP (1) JP2001208708A (OSRAM)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001235436A (ja) * 2000-02-23 2001-08-31 Japan Science & Technology Corp 斜出射プロトンビーム誘起特性ｘ線分析による試料表面の観察・分析方法およびそのための装置
JP2003098132A (ja) * 2001-09-25 2003-04-03 Sony Corp 試料ホルダ及び試料分析装置
JP2006118940A (ja) * 2004-10-20 2006-05-11 Jeol Ltd 斜出射ｘ線の検出方法及び装置
JP2009042174A (ja) * 2007-08-10 2009-02-26 Sharp Corp 斜出射電子線プローブマイクロｘ線分析方法およびそれに用いられるプログラム、並びに、斜出射電子線プローブマイクロｘ線分析装置
JPWO2023145235A1 (OSRAM) * 2022-01-31 2023-08-03
JP7457607B2 (ja) 2020-02-26 2024-03-28 日本電子株式会社 軟ｘ線分光装置および分析方法

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001235436A (ja) * 2000-02-23 2001-08-31 Japan Science & Technology Corp 斜出射プロトンビーム誘起特性ｘ線分析による試料表面の観察・分析方法およびそのための装置
JP2003098132A (ja) * 2001-09-25 2003-04-03 Sony Corp 試料ホルダ及び試料分析装置
JP2006118940A (ja) * 2004-10-20 2006-05-11 Jeol Ltd 斜出射ｘ線の検出方法及び装置
JP2009042174A (ja) * 2007-08-10 2009-02-26 Sharp Corp 斜出射電子線プローブマイクロｘ線分析方法およびそれに用いられるプログラム、並びに、斜出射電子線プローブマイクロｘ線分析装置
JP7457607B2 (ja) 2020-02-26 2024-03-28 日本電子株式会社 軟ｘ線分光装置および分析方法
JPWO2023145236A1 (OSRAM) * 2022-01-31 2023-08-03
JPWO2023145238A1 (OSRAM) * 2022-01-31 2023-08-03
JPWO2023145237A1 (OSRAM) * 2022-01-31 2023-08-03
JPWO2023145235A1 (OSRAM) * 2022-01-31 2023-08-03
JP7615183B2 (ja) 2022-01-31 2025-01-16 キヤノンアネルバ株式会社 検査装置および検査方法
US12241848B2 (en) 2022-01-31 2025-03-04 Canon Anelva Corporation Inspection apparatus and inspection method
JP7667322B2 (ja) 2022-01-31 2025-04-22 キヤノンアネルバ株式会社 検査装置および検査方法
JP7667321B2 (ja) 2022-01-31 2025-04-22 キヤノンアネルバ株式会社 検査装置および検査方法
JP7667882B2 (ja) 2022-01-31 2025-04-23 キヤノンアネルバ株式会社 検査装置および検査方法
JP7667883B2 (ja) 2022-01-31 2025-04-23 キヤノンアネルバ株式会社 検査装置および検査方法

Similar Documents

Publication Publication Date Title
Palmberg et al. Auger electron spectroscopy of fcc metal surfaces
US7680243B2 (en) X-ray measurement of properties of nano-particles
Rosasco et al. The analysis of discrete fine particles by Raman spectroscopy
Newbury X-ray microanalysis in the variable pressure (environmental) scanning electron microscope
Klockenkāmper et al. Total reflection X-ray fluorescence—an efficient method for micro-, trace and surface layer analysis. Invited lecture
Müllejans et al. Improvements in detection sensitivity by spatial difference electron energy-loss spectroscopy at interfaces in ceramics
Streli et al. Total reflection X-ray fluorescence analysis of light elements with synchrotron radiation and special X-ray tubes
JP2001208708A (ja) 斜出射電子線プローブマイクロｘ線分析による異物の分析方法およびその装置
Roomans Introduction to X‐ray microanalysis in biology
JPH04270953A (ja) 元素分析方法および元素分析装置ならびに薄膜形成装置
Goldstein et al. Special topics in electron beam x-ray microanalysis
Tsuji et al. Enhancement of electron-induced X-ray intensity for single particles under grazing-exit conditions
Zhu et al. Experimental challenges for approaching local strain determination in silicon by nano-Raman spectroscopy
Bauch et al. A comparison of the KOSSEL and the X‐ray Rotation‐Tilt Technique
Spolnik et al. Grazing-exit electron probe X-ray microanalysis of ultra-thin films and single particles with high-angle resolution
JPS62222150A (ja) 試料の表面層を破壊することなしに該表面層の元素組成を分析する方法
JPH03202760A (ja) 全反射螢光ｘ線分折装置
Nakano et al. Improvement of detection limits for particle contamination by confocal configuration in X-ray fluorescence microscope
JP3755034B2 (ja) 全反射蛍光ｘ線分析法およびその装置
JP2001235436A (ja) 斜出射プロトンビーム誘起特性ｘ線分析による試料表面の観察・分析方法およびそのための装置
Spolnik et al. Grazing‐exit electron probe x‐ray microanalysis of light elements in particles
Tsuji et al. Detection limits of grazing-exit EPMA for particle analysis
JP3946643B2 (ja) 光粒子装置のｘ線分析方法
Tsuji et al. Comparison of grazing-exit particle-induced X-ray emission with other related methods
JP2001289802A (ja) 蛍光ｘ線分析装置及びそれに使用するｘ線検出器

Legal Events

Date Code Title Description
A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A712

Effective date: 20031031

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20040129

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050701

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050701

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20070604

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20070612

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20071016