JP2001201860A5 - - Google Patents

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Publication number
JP2001201860A5
JP2001201860A5 JP2000008042A JP2000008042A JP2001201860A5 JP 2001201860 A5 JP2001201860 A5 JP 2001201860A5 JP 2000008042 A JP2000008042 A JP 2000008042A JP 2000008042 A JP2000008042 A JP 2000008042A JP 2001201860 A5 JP2001201860 A5 JP 2001201860A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000008042A
Other languages
Japanese (ja)
Other versions
JP2001201860A (ja
JP4105354B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2000008042A priority Critical patent/JP4105354B2/ja
Priority claimed from JP2000008042A external-priority patent/JP4105354B2/ja
Priority to TW090100838A priority patent/TW567398B/zh
Priority to KR1020010002584A priority patent/KR100733855B1/ko
Publication of JP2001201860A publication Critical patent/JP2001201860A/ja
Publication of JP2001201860A5 publication Critical patent/JP2001201860A5/ja
Application granted granted Critical
Publication of JP4105354B2 publication Critical patent/JP4105354B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000008042A 2000-01-17 2000-01-17 ポジ型フォトレジスト組成物 Expired - Fee Related JP4105354B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2000008042A JP4105354B2 (ja) 2000-01-17 2000-01-17 ポジ型フォトレジスト組成物
TW090100838A TW567398B (en) 2000-01-17 2001-01-15 The positive resist composition
KR1020010002584A KR100733855B1 (ko) 2000-01-17 2001-01-17 포지티브 포토레지스트 조성물

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000008042A JP4105354B2 (ja) 2000-01-17 2000-01-17 ポジ型フォトレジスト組成物

Publications (3)

Publication Number Publication Date
JP2001201860A JP2001201860A (ja) 2001-07-27
JP2001201860A5 true JP2001201860A5 (US20040097461A1-20040520-C00035.png) 2005-12-02
JP4105354B2 JP4105354B2 (ja) 2008-06-25

Family

ID=18536379

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000008042A Expired - Fee Related JP4105354B2 (ja) 2000-01-17 2000-01-17 ポジ型フォトレジスト組成物

Country Status (3)

Country Link
JP (1) JP4105354B2 (US20040097461A1-20040520-C00035.png)
KR (1) KR100733855B1 (US20040097461A1-20040520-C00035.png)
TW (1) TW567398B (US20040097461A1-20040520-C00035.png)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4911456B2 (ja) * 2006-11-21 2012-04-04 富士フイルム株式会社 ポジ型感光性組成物、該ポジ型感光性組成物に用いられる高分子化合物、該高分子化合物の製造方法及びポジ型感光性組成物を用いたパターン形成方法
JP6883954B2 (ja) * 2015-06-26 2021-06-09 住友化学株式会社 レジスト組成物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3804138B2 (ja) * 1996-02-09 2006-08-02 Ｊｓｒ株式会社 ＡｒＦエキシマレーザー照射用感放射線性樹脂組成物
JP3865919B2 (ja) * 1998-02-03 2007-01-10 富士フイルムホールディングス株式会社 ネガ型フォトレジスト組成物
US6238842B1 (en) * 1998-03-12 2001-05-29 Fuji Photo Film Co., Ltd. Positive photosensitive composition

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