JP2001199963A - Method for producing quinolylpropenal - Google Patents

Method for producing quinolylpropenal

Info

Publication number
JP2001199963A
JP2001199963A JP2000014848A JP2000014848A JP2001199963A JP 2001199963 A JP2001199963 A JP 2001199963A JP 2000014848 A JP2000014848 A JP 2000014848A JP 2000014848 A JP2000014848 A JP 2000014848A JP 2001199963 A JP2001199963 A JP 2001199963A
Authority
JP
Japan
Prior art keywords
quinolyl
derivative
formic acid
formula
fluorophenyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000014848A
Other languages
Japanese (ja)
Other versions
JP4496584B2 (en
JP2001199963A5 (en
Inventor
Katsumasa Harada
勝正 原田
Shigeyoshi Nishino
繁栄 西野
Hideyoshi Shima
秀好 島
Takashi Harada
崇司 原田
Naoko Okada
尚子 岡田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Ube Corp
Original Assignee
Nissan Chemical Corp
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2000014848A priority Critical patent/JP4496584B2/en
Application filed by Nissan Chemical Corp, Ube Industries Ltd filed Critical Nissan Chemical Corp
Priority to PCT/JP2001/000452 priority patent/WO2001053265A1/en
Priority to US10/181,820 priority patent/US6630591B2/en
Priority to CN01807062.0A priority patent/CN1222512C/en
Priority to EP01901538A priority patent/EP1251124B1/en
Priority to DE60129203T priority patent/DE60129203T2/en
Priority to AT01901538T priority patent/ATE366239T1/en
Priority to CA002398138A priority patent/CA2398138C/en
Priority to AU2001227100A priority patent/AU2001227100A1/en
Publication of JP2001199963A publication Critical patent/JP2001199963A/en
Publication of JP2001199963A5 publication Critical patent/JP2001199963A5/ja
Application granted granted Critical
Publication of JP4496584B2 publication Critical patent/JP4496584B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/52Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts

Landscapes

  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Quinoline Compounds (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method for producing 3-[2-cyclopropyl-4-fluorophenyl)-3- quinolyl]prop-2-enal in high yield from a quinolylacrylonitrile derivative by a simple means. SOLUTION: This method comprises the following process: 3-[2- cyclopropyl-4-(4-fluorophenyl)-3-quinolyl]prop-2-ene nitrite is reduced by Raney nickel in the presence of formic acid and water at 0.25-1 vol. time based on the formic acid.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、キノリルアクリロ
ニトリル誘導体からキノリルプロペナール誘導体を製造
する方法に関する。本発明の製造法によって得られるキ
ノリルプロペナール誘導体は、例えば、コレステロール
低下剤(HMG-CoA還元酵素阻害薬)の合成中間体
として有用な化合物である。
The present invention relates to a method for producing a quinolylpropenal derivative from a quinolylacrylonitrile derivative. The quinolylpropenal derivative obtained by the production method of the present invention is, for example, a compound useful as a synthetic intermediate of a cholesterol-lowering agent (HMG-CoA reductase inhibitor).

【0002】[0002]

【従来の技術】従来、キノリルプロペナール誘導体を製
造する方法としては、キノリンアクリル酸エステルを水
素化ジイソブチルアルミニウムで還元してキノリルプロ
ぺノールを得て、これをオキサリルクロライド及びジメ
チルスルホキシド、又は二酸化マンガンを用いて酸化し
てキノリルプロペナールとすることからなる、二工程で
製造する方法が知られている(J.Med.Chem.,34,367(19
91))。また、アクリロニトリル化合物の二重結合を保
持したまま、シアノ基のみを選択的にホルミル基に還元
してプロペナール化合物を製造する方法としては、還元
剤として水素化ジイソブチルアルミニウムを用いる方法
が知られている(Heterocycles,29,691(1989))。し
かしながら、これらのいずれの方法も、取り扱いや後処
理が煩雑となる水素化ジイソブチルアルミニウムや二酸
化マンガンを用いなければならず、工業的な製造法とし
ては不利である。
2. Description of the Related Art Conventionally, as a method for producing a quinolylpropenal derivative, quinoline acrylate is reduced with diisobutylaluminum hydride to obtain quinolylpropanol, which is then converted to oxalyl chloride and dimethyl sulfoxide or manganese dioxide. A two-step production method is known, which comprises oxidizing to quinolyl propenal using a compound (J. Med. Chem., 34 , 367 (19).
91)). As a method for producing a propenal compound by selectively reducing only a cyano group to a formyl group while maintaining a double bond of an acrylonitrile compound, a method using diisobutylaluminum hydride as a reducing agent is known. (Heterocycles, 29 , 691 (1989)). However, any of these methods requires the use of diisobutylaluminum hydride or manganese dioxide, which requires complicated handling and post-treatment, and is disadvantageous as an industrial production method.

【0003】[0003]

【発明が解決しようとする課題】本発明の課題は、上記
の問題点を解決し、簡便な方法によってキノリルアクリ
ロニトリル誘導体からキノリルプロペナール誘導体を高
収率で製造することが出来る、工業的に有利なキノリル
プロペナール誘導体の製造法を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned problems and to obtain a quinolylpropenal derivative from a quinolylacrylonitrile derivative in a high yield by a simple method. Another object of the present invention is to provide a method for producing a quinolylpropenal derivative which is more advantageous.

【0004】[0004]

【課題を解決するための手段】本発明の課題は、式
(1)
SUMMARY OF THE INVENTION The object of the present invention is to provide the following equation (1).

【0005】[0005]

【化3】 Embedded image

【0006】で表わされるキノリルアクリロニトリル誘
導体{3−[2−シクロプロピル−4−(4−フルオロ
フェニル)−3−キノリル]プロプ−2−エンニトライ
ト}を、ギ酸と、ギ酸に対して0.25乃至1容量倍の
水の存在下にて、ラネーニッケルにより還元することを
特徴とする、式(2)
The quinolyl acrylonitrile derivative {3- [2-cyclopropyl-4- (4-fluorophenyl) -3-quinolyl] prop-2-ennitrite} represented by the formula Formula (2) characterized in that it is reduced with Raney nickel in the presence of 25 to 1 volume of water.

【0007】[0007]

【化4】 Embedded image

【0008】で表わされるキノリルプロペナール誘導体
{3−[2−シクロプロピル−4−(4−フルオロフェ
ニル)−3−キノリル]プロプ−2−エナール}の製造
法によって解決される。
The problem is solved by a method for producing a quinolylpropenal derivative {3- [2-cyclopropyl-4- (4-fluorophenyl) -3-quinolyl] prop-2-enal} represented by the formula:

【0009】[0009]

【発明の実施の形態】本発明の製造法の出発原料となる
式(1)のキノリルアクリロニトリル誘導体は、新規化
合物であるが、公知の2−シクロプロピル−4−(4−
フルオロフェニル)キノリン−3−カルボアルデヒド
(特開平1−279866号公報、欧州公開特許出願第
304063号公報、米国特許第5011930号明細
書)に、ジエチルシアノメチルホスホネートを、好まし
くは水酸化ナトリウムのような塩基と芳香族炭化水素の
ような溶媒の存在下で反応させることによって製造する
ことができる。
BEST MODE FOR CARRYING OUT THE INVENTION The quinolylacrylonitrile derivative of the formula (1), which is a starting material for the production process of the present invention, is a novel compound, but is a known 2-cyclopropyl-4- (4-
(Fluorophenyl) quinoline-3-carbaldehyde (JP-A-1-279866, EP-A-304066, U.S. Pat. No. 5,011,930) includes diethyl cyanomethyl phosphonate, preferably sodium hydroxide. It can be produced by reacting with a suitable base in the presence of a solvent such as an aromatic hydrocarbon.

【0010】本発明の製造法において利用される還元反
応で用いるラネーニッケルとは、ニッケルとアルミニウ
ムとを主成分とする合金であり、ニッケル含有量が、好
ましくは10〜90重量%、更に好ましくは40〜80
重量%のものを意味する。通常は、展開されたラネーニ
ッケルが使用されるが、種々の方法によって、前処理さ
れたラネーニッケルや、安定化されたラネーニッケルも
使用することが出来る。更に、ラネーニッケル中に、コ
バルト、鉄、鉛、クロム、チタン、モリブデン、バナジ
ウム、マンガン、スズ、タングステン等のような金属が
含まれているものも使用することが出来る。
The Raney nickel used in the reduction reaction used in the production method of the present invention is an alloy containing nickel and aluminum as main components, and has a nickel content of preferably 10 to 90% by weight, more preferably 40% by weight. ~ 80
% By weight. Normally, expanded Raney nickel is used, but pretreated Raney nickel or stabilized Raney nickel can be used by various methods. Further, Raney nickel containing metals such as cobalt, iron, lead, chromium, titanium, molybdenum, vanadium, manganese, tin, and tungsten can also be used.

【0011】本発明の製造法の還元反応におけるラネー
ニッケルの使用量は、原料のキノリルアクリロニトリル
誘導体に対して、ニッケル原子換算で、好ましくは0.
30〜2重量倍、更に好ましくは0.30〜1.2重量
倍である。
[0011] The amount of Raney nickel used in the reduction reaction of the production method of the present invention is preferably 0.1% in terms of nickel atom, based on the quinolylacrylonitrile derivative as the raw material.
It is 30 to 2 times by weight, more preferably 0.30 to 1.2 times by weight.

【0012】本発明の製造法におけるラネーニッケルを
用いる還元反応は、ギ酸と、ギ酸に対して0.25乃至
1容量倍の水の存在下で行なわれる。本発明者の研究に
よると、この範囲の量の水の使用により、目的の前記式
(2)のキノリルプロペナール誘導体を、高い収率で、
かつ制御が容易な反応条件にて得ることができることが
確認された。
The reduction reaction using Raney nickel in the production method of the present invention is carried out in the presence of formic acid and water in an amount of 0.25 to 1 times the volume of formic acid. According to the study of the present inventor, by using water in this range, the desired quinolylpropenal derivative of the formula (2) can be obtained in high yield.
It was also confirmed that the reaction can be obtained under a reaction condition that can be easily controlled.

【0013】ギ酸の使用量は、原料のキノリルアクリロ
ニトリルに対して、好ましくは0.25〜50重量倍、
更に好ましくは1〜40重量倍である。
The amount of formic acid used is preferably 0.25 to 50 times the weight of the raw material quinolylacrylonitrile,
More preferably, it is 1 to 40 times by weight.

【0014】本発明における還元反応の実施に際して
は、ギ酸あるいは水以外の溶媒を存在させることもでき
る。使用され得る溶媒については、反応を阻害しないも
のであれば特に制限はなく、例えば、N,N−ジメチル
ホルムアミド等のアミド類;メタノール、エタノール、
イソプロピルアルコール、t−ブチルアルコール等のア
ルコール類;アセトン、メチルエチルケトン等のケトン
類;ペンタン、シクロヘキサン等の脂肪族炭化水素類;
トルエン、キシレン等の芳香族炭化水素類が挙げられ
る。
In carrying out the reduction reaction in the present invention, a solvent other than formic acid or water may be present. The solvent that can be used is not particularly limited as long as it does not inhibit the reaction. For example, amides such as N, N-dimethylformamide; methanol, ethanol,
Alcohols such as isopropyl alcohol and t-butyl alcohol; ketones such as acetone and methyl ethyl ketone; aliphatic hydrocarbons such as pentane and cyclohexane;
And aromatic hydrocarbons such as toluene and xylene.

【0015】還元反応において、上記のような他の溶媒
を使用する場合には、原料のキノリルアクリロニトリル
誘導体に対して、好ましくは60重量倍以下、更に好ま
しくは10重量倍以下での量で用いられる。これらの溶
媒は、単独又は二種以上を混合して使用しても良い。
In the case where another solvent as described above is used in the reduction reaction, it is preferably used in an amount of not more than 60 times by weight, more preferably not more than 10 times by weight, based on the starting quinolylacrylonitrile derivative. Can be These solvents may be used alone or in combination of two or more.

【0016】本発明の還元反応は、ラネーニッケルの存
在下、キノリルアクリロニトリル誘導体にギ酸と水とを
液相で接触させて行なうことが好ましく、例えば、不活
性ガス雰囲気にて、ラネーニッケル、キノリルアクリロ
ニトリル誘導体、ギ酸、そして水を混合して、加熱攪拌
する等の方法によって、常圧下または加圧下で行われ
る。その際の反応温度は、好ましくは20〜110℃、
更に好ましくは30〜80℃である。
The reduction reaction of the present invention is preferably carried out by bringing formic acid and water into contact with a quinolyl acrylonitrile derivative in the presence of Raney nickel in a liquid phase. For example, Raney nickel, quinolyl acrylonitrile are prepared in an inert gas atmosphere. Derivatives, formic acid, and water are mixed, and the mixture is heated and stirred, for example, under normal pressure or under pressure. The reaction temperature at that time is preferably 20 to 110 ° C,
More preferably, it is 30 to 80 ° C.

【0017】また、必要に応じて、無機塩基、有機塩
基、白金塩等を系内に添加することによって、反応性を
調節しても良い(久保松照夫、小松信一郎、ラネー触媒
(川研ファインケミカル株式会社発行)、123〜14
7頁に記載)。
If necessary, the reactivity may be adjusted by adding an inorganic base, an organic base, a platinum salt, etc. to the system (Teruo Kubo, Shinichiro Komatsu, Raney Catalyst (Kawaken Fine Chemicals) Published by Co., Ltd.), 123-14
On page 7).

【0018】なお、最終生成物である前記式(2)のキ
ノリルプロペナール誘導体は、例えば、反応終了後に濾
過及び抽出し、蒸留、再結晶、カラムクロマトグラフィ
ー等による一般的な方法によって分離・精製される。
The final product, the quinolylpropenal derivative of the formula (2), is filtered and extracted after completion of the reaction, and separated and separated by a general method such as distillation, recrystallization, column chromatography and the like. Purified.

【0019】[0019]

【実施例】次に、実施例を挙げて本発明を具体的に説明
するが、本発明の範囲はこれらに限定されるものではな
い。
EXAMPLES Next, the present invention will be described specifically with reference to examples, but the scope of the present invention is not limited to these examples.

【0020】[参考例1] 3−[2−シクロプロピル
−4−(4−フルオロフェニル)−3−キノリル]プロ
プ−2−エンニトライトの合成 攪拌装置、温度計及び滴下漏斗を備えた内容積100m
Lのガラス製フラスコに、窒素雰囲気下、2−シクロプ
ロピル−4−(4−フルオロフェニル)キノリン−3−
カルボキシアルデヒド4.98g(17.1ミリモ
ル)、純度98%のジエチルシアノメチルホスホネート
3.10mL(18.8ミリモル)、トリカプリルメチ
ルアンモニウムクロライド(Aliquat 336:Aldrich社
製)0.15mL(0.33ミリモル)及びトルエン3
5mLを加え、液温を25〜35℃に保ちながら、20
重量%水酸化ナトリウム水溶液10.1g(50.5ミ
リモル)を50分間かけてゆるやかに滴下し、同温度で
3時間反応させた。その後、純度98%のジエチルシア
ノメチルホスホネート0.14mL(0.85ミリモ
ル)を加え、同温度で66時間反応させた。反応終了
後、水5mLを加えて30分間攪拌した。得られた反応
液にトルエン50mLを加え、有機層を分離して10重
量%水酸化ナトリウム水溶液10mLで洗浄し、飽和食
塩水10mLを加えた。次いで、1モル/L塩酸5.6
mLを加えて中和した後、有機層を取り出し、攪拌装置
を備えた内容積200mLのガラス製フラスコに移し
た。それに、無水硫酸ナトリウム1.60gを加えて室
温で1時間攪拌させ、更に、活性炭0.14g(粉末
状:和光純薬株式会社製)及びシリカゲル(ワコーゲル
C−200:和光純薬株式会社製)0.62gを加えて
室温で1.75時間攪拌させた後、セライトで濾過し、
セライトをトルエン50mLで洗浄した。得られた反応
液を減圧下で濃縮すると結晶が析出してきたので、結晶
を加熱して溶解させ、次いで、ヘキサン30mLを加え
て30分間加熱還流させた。その後、液温を5℃まで冷
却して2時間攪拌すると結晶が析出してきたので、結晶
を濾過した後、ヘキサン30mLで洗浄し、減圧下、5
5℃にて乾燥させて、白色結晶として3−[2−シクロ
プロピル−4−(4−フルオロフェニル)−3−キノリ
ル]プロプ−2−エンニトライト4.81gを得た(収
率90%)。
Reference Example 1 Synthesis of 3- [2-cyclopropyl-4- (4-fluorophenyl) -3-quinolyl] prop-2-ennitrite Internal volume equipped with a stirrer, thermometer and dropping funnel 100m
L in a glass flask under a nitrogen atmosphere under a atmosphere of 2-cyclopropyl-4- (4-fluorophenyl) quinoline-3-.
4.98 g (17.1 mmol) of carboxaldehyde, 3.10 mL (18.8 mmol) of 98% pure diethylcyanomethylphosphonate, 0.15 mL (0.33 mL) of tricaprylmethylammonium chloride (Aliquat 336: manufactured by Aldrich) Mmol) and toluene 3
5 mL was added, and the solution temperature was maintained at 25 to 35 ° C.
A 10.1 g (50.5 mmol) weight% aqueous sodium hydroxide solution was slowly added dropwise over 50 minutes, and the mixture was reacted at the same temperature for 3 hours. Thereafter, 0.14 mL (0.85 mmol) of 98% pure diethylcyanomethylphosphonate was added and reacted at the same temperature for 66 hours. After completion of the reaction, 5 mL of water was added, and the mixture was stirred for 30 minutes. 50 mL of toluene was added to the obtained reaction solution, the organic layer was separated, washed with 10 mL of a 10% by weight aqueous sodium hydroxide solution, and 10 mL of saturated saline was added. Then, 1 mol / L hydrochloric acid 5.6
After neutralization by adding mL, the organic layer was taken out and transferred to a 200-mL glass flask equipped with a stirrer. Then, 1.60 g of anhydrous sodium sulfate was added and stirred at room temperature for 1 hour. Further, activated carbon 0.14 g (powder type: manufactured by Wako Pure Chemical Industries, Ltd.) and silica gel (Wakogel C-200: manufactured by Wako Pure Chemical Industries, Ltd.) After adding 0.62 g and stirring at room temperature for 1.75 hours, the mixture was filtered through Celite,
Celite was washed with 50 mL of toluene. The obtained reaction solution was concentrated under reduced pressure to precipitate crystals. The crystals were dissolved by heating, and then 30 mL of hexane was added and the mixture was heated under reflux for 30 minutes. Thereafter, the solution was cooled to 5 ° C. and stirred for 2 hours. Crystals were precipitated. The crystals were filtered, washed with 30 mL of hexane, and dried under reduced pressure.
After drying at 5 ° C., 4.81 g of 3- [2-cyclopropyl-4- (4-fluorophenyl) -3-quinolyl] prop-2-ennitrite was obtained as white crystals (yield 90%). .

【0021】得られた3−[2−シクロプロピル−4−
(4−フルオロフェニル)−3−キノリル]プロプ−2
−エンニトライトの物性値を次に記す。 融点:175〜176℃、EI−MS(m/e):31
3(M−1)、CI−MS(m/e):315(M+
1)
The obtained 3- [2-cyclopropyl-4-
(4-Fluorophenyl) -3-quinolyl] prop-2
-The physical property values of ennitrite are described below. Melting point: 175-176 ° C, EI-MS (m / e): 31
3 (M-1), CI-MS (m / e): 315 (M +
1)

【0022】[実施例1] 3−[2−シクロプロピル
−4−(4−フルオロフェニル)−3−キノリル]プロ
プ−2−エナールの製造 攪拌装置、温度計及び滴下漏斗を備えた内容積5mLの
ガラス製フラスコに、窒素雰囲気下、参考例1で合成し
た3−[2−シクロプロピル−4−(4−フルオロフェ
ニル)−3−キノリル]プロプ−2−エンニトライト3
14mg(1.0ミリモル)、ギ酸2.25mL(10
0%ギ酸換算、60ミリモル)、水0.75mL、およ
び含水展開ラネーニッケル(川研ファインケミカル
(株)製:NDHT−90:ニッケル含有量50重量%
品)620mg(ニッケル原子として5.3ミリモル)
を加え、80℃で1.5時間反応させた。反応終了後、
室温まで冷却し、水9mLと1モル/L塩酸9mLを加
えた後、触媒をセライトで濾過した。次いで、セライト
を、2−ブタノール1mLで2回、トルエン9mLで2
回洗浄した後、有機層を無水硫酸マグネシウムで乾燥し
た。濾過後、減圧下で濃縮し、黄色固体として純度97
%(高速液体クロマトグラフィーによる面積百分率)の
3−[2−シクロプロピル−4−(4−フルオロフェニ
ル)−3−キノリル]プロプ-2−エナール307mg
を得た(収率91%)。
Example 1 Production of 3- [2-cyclopropyl-4- (4-fluorophenyl) -3-quinolyl] prop-2-enal 5 mL of internal volume equipped with a stirrer, thermometer and dropping funnel 3- [2-cyclopropyl-4- (4-fluorophenyl) -3-quinolyl] prop-2-ennitrite 3 synthesized in Reference Example 1 in a nitrogen atmosphere under a nitrogen atmosphere.
14 mg (1.0 mmol), 2.25 mL formic acid (10
0% formic acid conversion, 60 mmol), water 0.75 mL, and water-containing developed Raney nickel (manufactured by Kawaken Fine Chemical Co., Ltd .: NDHT-90: nickel content 50% by weight)
Product) 620 mg (5.3 mmol as nickel atom)
Was added and reacted at 80 ° C. for 1.5 hours. After the reaction,
After cooling to room temperature and adding 9 mL of water and 9 mL of 1 mol / L hydrochloric acid, the catalyst was filtered through celite. The celite was then washed twice with 1 mL of 2-butanol and twice with 9 mL of toluene.
After washing twice, the organic layer was dried over anhydrous magnesium sulfate. After filtration, the mixture was concentrated under reduced pressure to yield a yellow solid having a purity of 97%.
307 mg of 3- [2-cyclopropyl-4- (4-fluorophenyl) -3-quinolyl] prop-2-enal in% (area percentage by high performance liquid chromatography)
Was obtained (91% yield).

【0023】3−[2−シクロプロピル−4−(4−フ
ルオロフェニル)−3−キノリル]プロプ−2−エナー
ルの物性値を次に記す。 CI−MS(m/e);318(M+1)1 H−NMR(CDCl3、δ(ppm)):1.07〜
1.13(2H,m)、1.40〜1.45(2H,
m)、2.32〜2.37(1H,m)、6.43(1
H,dd,J=7.8,16.2Hz)、7.22〜
7.26(4H,m)、7.35〜7.38(2H,
m)、7.55(1H,d,J=16.2Hz)、7.
64〜7.69(1H,m)、7.97(1H,d,J
=8.4Hz)、9.51(1H,d,J=7.5H
z)
The physical properties of 3- [2-cyclopropyl-4- (4-fluorophenyl) -3-quinolyl] prop-2-enal are described below. CI-MS (m / e); 318 (M + 1) 1 H-NMR (CDCl 3 , δ (ppm)): 1.07 to
1.13 (2H, m), 1.40-1.45 (2H,
m), 2.32 to 2.37 (1H, m), 6.43 (1
H, dd, J = 7.8, 16.2 Hz), 7.22-
7.26 (4H, m), 7.35 to 7.38 (2H,
m), 7.55 (1H, d, J = 16.2 Hz), 7.
64 to 7.69 (1H, m), 7.97 (1H, d, J
= 8.4 Hz), 9.51 (1H, d, J = 7.5H)
z)

【0024】[実施例2]反応条件を65℃で5時間に
変えた以外は、実施例1と同じ操作を行なって、収率8
3%にて、3−[2−シクロプロピル−4−(4−フル
オロフェニル)−3−キノリル]プロプ-2−エナール
を得た。
Example 2 The same operation as in Example 1 was carried out except that the reaction conditions were changed to 65 ° C. for 5 hours to obtain a yield of 8
At 3%, 3- [2-cyclopropyl-4- (4-fluorophenyl) -3-quinolyl] prop-2-enal was obtained.

【0025】[実施例3]ギ酸の使用量を1.8mLに
変え、水の使用量を1.2mLに変えた以外は、実施例
2と同じ操作を行なって、収率91%にて、3−[2−
シクロプロピル−4−(4−フルオロフェニル)−3−
キノリル]プロプ-2−エナールを得た。
Example 3 The same operation as in Example 2 was carried out except that the used amount of formic acid was changed to 1.8 mL and the used amount of water was changed to 1.2 mL. 3- [2-
Cyclopropyl-4- (4-fluorophenyl) -3-
[Quinolyl] prop-2-enal was obtained.

【0026】[実施例4]ギ酸の使用量を2.55mL
に変え、水の使用量を0.45mLに変えた以外は、実
施例2と同じ操作を行なって、収率85%にて、3−
[2−シクロプロピル−4−(4−フルオロフェニル)
−3−キノリル]プロプ−2−エナールを得た。
Example 4 The amount of formic acid used was 2.55 mL
And the same operation as in Example 2 was carried out except that the amount of water used was changed to 0.45 mL.
[2-cyclopropyl-4- (4-fluorophenyl)
-3-quinolyl] prop-2-enal was obtained.

【0027】[比較例1]ギ酸の使用量を1.2mLに
変え、水の使用量を1.8mLに変えた以外は、実施例
2と同じ操作を行なって、3−[2−シクロプロピル−
4−(4−フルオロフェニル)−3−キノリル]プロプ
−2−エナールを得たが、その収率は70%であった。
Comparative Example 1 The same operation as in Example 2 was carried out except that the used amount of formic acid was changed to 1.2 mL and the used amount of water was changed to 1.8 mL, to give 3- [2-cyclopropyl. −
4- (4-Fluorophenyl) -3-quinolyl] prop-2-enal was obtained with a yield of 70%.

【0028】[0028]

【発明の効果】本発明の製造法により、簡便な方法によ
って前記式(1)のキノリルアクリロニトリル誘導体か
ら前記式(2)のキノリルプロペナール誘導体を高収率
で製造することが出来る。従って、工業的に有利なキノ
リルアクロレインの製造法を提供することが出来る。
According to the production method of the present invention, the quinolylpropenal derivative of the formula (2) can be produced in a high yield from the quinolylacrylonitrile derivative of the formula (1) by a simple method. Therefore, it is possible to provide an industrially advantageous method for producing quinolyl acrolein.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 西野 繁栄 山口県宇部市大字小串1978番地の5 宇部 興産株式会社宇部研究所内 (72)発明者 島 秀好 山口県宇部市大字小串1978番地の5 宇部 興産株式会社宇部研究所内 (72)発明者 原田 崇司 山口県宇部市大字小串1978番地の5 宇部 興産株式会社宇部研究所内 (72)発明者 岡田 尚子 山口県宇部市大字小串1978番地の5 宇部 興産株式会社宇部研究所内 Fターム(参考) 4C031 BA07 BA08 BA09 4H039 CA62 CB30  ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Shigeei Nishino 5 in 1978 Kogushi, Oji, Ube City, Yamaguchi Prefecture Inside Ube Research Institute, Ltd. (72) Inventor Hideyoshi Shima 5 Ube in 1978, Kogushi, Obe City, Ube City, Yamaguchi Prefecture Inside Ube Research Institute, Kosan Co., Ltd. (72) Inventor Takashi Harada 5 at 1978 Kogushi, Oji, Ube City, Yamaguchi Prefecture Inside Ube Research Laboratories (72) Inventor Naoko Okada 5 Ube, 1978 Kogushi Oaza, Ube City, Yamaguchi Prefecture Ube Industries, Ltd. F-term in the Ube Research Laboratories (reference) 4C031 BA07 BA08 BA09 4H039 CA62 CB30

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 式(1) 【化1】 で表わされるキノリルアクリロニトリル誘導体を、ギ酸
と、ギ酸に対して0.25乃至1容量倍の水の存在下に
て、ラネーニッケルにより還元することを特徴とする、
式(2) 【化2】 で表わされるキノリルプロペナール誘導体の製造法。
(1) Formula (1) Wherein the quinolylacrylonitrile derivative represented by the formula is reduced with Raney nickel in the presence of formic acid and 0.25 to 1 times by volume of water with respect to formic acid,
Formula (2) A method for producing a quinolylpropenal derivative represented by the formula:
【請求項2】 式(1)のキノリルアクリロニトリル誘
導体に対して、ラネーニッケルをニッケル原子換算で
0.30乃至2重量倍の量にて使用することを特徴とす
る請求項1に記載のキノリルプロペナール誘導体の製造
法。
2. The quinolyl according to claim 1, wherein Raney nickel is used in an amount of 0.30 to 2 times by weight in terms of nickel atom with respect to the quinolyl acrylonitrile derivative of the formula (1). A method for producing a propenal derivative.
【請求項3】 式(1)のキノリルアクリロニトリル誘
導体に対してギ酸を0.25乃至50重量倍の量にて使
用することを特徴とする請求項1もしくは2に記載のキ
ノリルプロペナール誘導体の製造法。
3. The quinolylpropenal derivative according to claim 1, wherein formic acid is used in an amount of 0.25 to 50 times by weight based on the quinolylacrylonitrile derivative of the formula (1). Manufacturing method.
JP2000014848A 2000-01-24 2000-01-24 Process for producing quinolylpropenal Expired - Fee Related JP4496584B2 (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP2000014848A JP4496584B2 (en) 2000-01-24 2000-01-24 Process for producing quinolylpropenal
AU2001227100A AU2001227100A1 (en) 2000-01-24 2001-01-24 Process for the preparation of quinolylpropenal
CN01807062.0A CN1222512C (en) 2000-01-24 2001-01-24 Process for the preparation of quinolylpropenal
EP01901538A EP1251124B1 (en) 2000-01-24 2001-01-24 Process for the preparation of quinolylpropenal
DE60129203T DE60129203T2 (en) 2000-01-24 2001-01-24 PROCESS FOR THE PREPARATION OF QUINOLYLPROPENAL
AT01901538T ATE366239T1 (en) 2000-01-24 2001-01-24 METHOD FOR PRODUCING QUINOLYL PROPENAL
PCT/JP2001/000452 WO2001053265A1 (en) 2000-01-24 2001-01-24 Process for the preparation of quinolylpropenal
US10/181,820 US6630591B2 (en) 2000-01-24 2001-01-24 Process for the preparation of quinolylpropenal
CA002398138A CA2398138C (en) 2000-01-24 2001-01-24 Process for the preparation of quinolylpropenal

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006213674A (en) * 2005-02-07 2006-08-17 Ube Ind Ltd Method for preparing 4-formyltetrahydropyran compound

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01279866A (en) * 1987-08-20 1989-11-10 Nissan Chem Ind Ltd Quinoline-based mevalonolactones
JPH06329540A (en) * 1991-10-04 1994-11-29 Nissan Chem Ind Ltd Suppressor for arteriosclerotic intravascular membrane hyperplasia
JP4281248B2 (en) * 1998-07-23 2009-06-17 日産化学工業株式会社 Process for producing quinoline derivative and intermediate

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01279866A (en) * 1987-08-20 1989-11-10 Nissan Chem Ind Ltd Quinoline-based mevalonolactones
JPH06329540A (en) * 1991-10-04 1994-11-29 Nissan Chem Ind Ltd Suppressor for arteriosclerotic intravascular membrane hyperplasia
JP4281248B2 (en) * 1998-07-23 2009-06-17 日産化学工業株式会社 Process for producing quinoline derivative and intermediate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006213674A (en) * 2005-02-07 2006-08-17 Ube Ind Ltd Method for preparing 4-formyltetrahydropyran compound

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