JP4496585B2 - Process for producing quinolylpropenal - Google Patents

Process for producing quinolylpropenal Download PDF

Info

Publication number
JP4496585B2
JP4496585B2 JP2000014849A JP2000014849A JP4496585B2 JP 4496585 B2 JP4496585 B2 JP 4496585B2 JP 2000014849 A JP2000014849 A JP 2000014849A JP 2000014849 A JP2000014849 A JP 2000014849A JP 4496585 B2 JP4496585 B2 JP 4496585B2
Authority
JP
Japan
Prior art keywords
acid
quinolylpropenal
producing
derivative
quinolyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000014849A
Other languages
Japanese (ja)
Other versions
JP2001199964A (en
JP2001199964A5 (en
Inventor
勝正 原田
繁栄 西野
秀好 島
崇司 原田
尚子 岡田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2000014849A priority Critical patent/JP4496585B2/en
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Priority to PCT/JP2001/000452 priority patent/WO2001053265A1/en
Priority to US10/181,820 priority patent/US6630591B2/en
Priority to DE60129203T priority patent/DE60129203T2/en
Priority to CA002398138A priority patent/CA2398138C/en
Priority to CN01807062.0A priority patent/CN1222512C/en
Priority to AT01901538T priority patent/ATE366239T1/en
Priority to AU2001227100A priority patent/AU2001227100A1/en
Priority to EP01901538A priority patent/EP1251124B1/en
Publication of JP2001199964A publication Critical patent/JP2001199964A/en
Publication of JP2001199964A5 publication Critical patent/JP2001199964A5/ja
Application granted granted Critical
Publication of JP4496585B2 publication Critical patent/JP4496585B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/52Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts

Description

【0001】
【発明の属する技術分野】
本発明は、キノリルアクリロニトリル誘導体からキノリルプロペナール誘導体を製造する方法に関する。本発明の製造方法によって得られるキノリルプロペナール誘導体は、例えば、コレステロール低下剤(HMG-CoA還元酵素阻害薬)の合成中間体として有用な化合物である。
【0002】
【従来の技術】
従来、キノリルプロペナール誘導体を製造する方法としては、キノリンアクリル酸エステルを水素化ジイソブチルアルミニウムで還元してキノリルプロぺノールを得て、これをオキサリルクロライド及びジメチルスルホキシド、又は二酸化マンガンを用いて酸化してキノリルプロペナールとすることからなる、二工程で製造する方法が知られている(J.Med.Chem.,34,367(1991))。
また、アクリロニトリル化合物の二重結合を保持したまま、シアノ基のみを選択的にホルミル基に還元してプロペナール化合物を製造する方法としては、還元剤として水素化ジイソブチルアルミニウムを用いる方法が知られている(Heterocycles,29,691(1989))。
しかしながら、これらのいずれの方法も、取り扱いや後処理が煩雑となる水素化ジイソブチルアルミニウムや二酸化マンガンを用いなければならず、工業的な製造法としては不利である。
【0003】
【発明が解決しようとする課題】
本発明の課題は、上記の問題点を解決し、簡便な方法によってキノリルアクリロニトリル誘導体からキノリルプロペナール誘導体を高収率で製造することが出来る、工業的に有利なキノリルプロペナール誘導体の製造方法を提供することにある。
【0004】
【課題を解決するための手段】
本発明の課題は、式(1)
【0005】
【化3】

Figure 0004496585
【0006】
で表わされるキノリルアクリロニトリル誘導体{3−[2−シクロプロピル−4−(4−フルオロフェニル)−3−キノリル]プロプ−2−エンニトリル}を、ギ酸のアミン塩と有機酸との存在下にて、ラネーニッケルにより還元することを特徴とする、式(2)
【0007】
【化4】
Figure 0004496585
【0008】
で表わされるキノリルプロペナール誘導体{3−[2−シクロプロピル−4−(4−フルオロフェニル)−3−キノリル]プロプ−2−エナール}の製造方法によって解決される。
【0009】
【発明の実施の形態】
本発明の製造法の出発原料となる式(1)のキノリルアクリロニトリル誘導体は、新規化合物であるが、公知の2−シクロプロピル−4−(4−フルオロフェニル)キノリン−3−カルボアルデヒド(特開平1−279866号公報、欧州公開特許出願第304063号公報、米国特許第5011930号明細書)に、ジエチルシアノメチルホスホネートを、好ましくは水酸化ナトリウムのような塩基と芳香族炭化水素のような溶媒の存在下で反応させることによって製造することができる。
【0010】
本発明の製造法において利用される還元反応で用いるラネーニッケルとは、ニッケルとアルミニウムとを主成分とする合金であり、ニッケル含有量が、好ましくは10〜90重量%、更に好ましくは40〜80重量%のものを意味する。通常は、展開されたラネーニッケルが使用されるが、種々の方法によって、前処理されたラネーニッケルや、安定化されたラネーニッケルも使用することが出来る。更に、ラネーニッケル中に、コバルト、鉄、鉛、クロム、チタン、モリブデン、バナジウム、マンガン、スズ、タングステン等のような金属が含まれているものも使用することが出来る。
【0011】
本発明の製造法の還元反応におけるラネーニッケルの使用量は、原料のキノリルアクリロニトリル誘導体に対して、ニッケル原子換算で、好ましくは0.30〜2重量倍、更に好ましくは0.4〜1.2重量倍である。
【0012】
本発明の還元反応において使用するギ酸のアミン塩とは、ギ酸とアミンからなる塩であり、例えば、ギ酸アンモニウム;ギ酸モノメチルアンモニウム、ギ酸モノエチルアンモニウム等のギ酸と一級アミンからなる塩;ギ酸ジメチルアンモニウム、ギ酸ジエチルアンモニウム等のギ酸と二級アミンからなる塩;ギ酸トリメチルアンモニウム、ギ酸トリエチルアンモニウム等のギ酸と三級アミンからなる塩が挙げられるが、好ましくはギ酸アンモニウム、ギ酸トリエチルアンモニウム、更に好ましくはギ酸アンモニウムが使用される。
【0013】
上記のギ酸のアミン塩の使用量は、原料のキノリルアクリロニトリル誘導体の使用量に対して、好ましくは1.0〜5.0倍モルであり、更に好ましくは1.5〜3.0倍モルである。
【0014】
本発明の還元反応において使用する有機酸としては、特に炭素数2〜5の低級脂肪酸が好ましく、その例としては、酢酸、プロピオン酸、酪酸、イソ酪酸、吉草酸、イソ吉草酸、ピバル酸が挙げられるが、好ましくは酢酸が使用される。
【0015】
上記有機酸の使用量は、原料のキノリルアクリロニトリル誘導体に対して、好ましくは3〜50重量倍、更に好ましくは5〜30重量倍である。これらの有機酸は、単独又は二種以上を混合して使用しても良い。
【0016】
本発明の還元反応は、ラネーニッケルの存在下、式(1)のキノリルアクリロニトリル誘導体とギ酸のアミン塩とを有機酸中で接触させることが好ましく、例えば、不活性ガス雰囲気にて、ラネーニッケル、キノリルアクリロニトリル、ギ酸アンモニウム及び有機酸を混合して、加熱攪拌する等の方法によって、常圧下又は加圧下で行われる。その際の反応温度は、好ましくは20〜110℃、更に好ましくは40〜90℃である。
【0017】
また、必要に応じて、無機塩基、有機塩基、白金塩等を系内に添加することによって、反応性を調節しても良い(久保松照夫、小松信一郎、ラネー触媒(川研ファインケミカル株式会社発行)、123〜147頁に記載)。
【0018】
なお、最終生成物であるキノリルプロペナール誘導体は、例えば、反応終了後に濾過及び抽出し、蒸留、再結晶、カラムクロマトグラフィー等による一般的な方法によって分離・精製される。
【0019】
【実施例】
次に、実施例を挙げて本発明を具体的に説明するが、本発明の範囲はこれらに限定されるものではない。
【0020】
[参考例1] 3−[2−シクロプロピル−4−(4−フルオロフェニル)−3−キノリル]プロプ−2−エンニトリルの合成
攪拌装置、温度計及び滴下漏斗を備えた内容積100mLのガラス製フラスコに、窒素雰囲気下、2−シクロプロピル−4−(4−フルオロフェニル)キノリン−3−カルボアルデヒド4.98g(17.1ミリモル)、純度98%のジエチルシアノメチルホスホネート3.10mL(18.8ミリモル)、トリカプリルメチルアンモニウムクロライド(Aliquat 336:Aldrich社製)0.15mL(0.33ミリモル)及びトルエン35mLを加え、液温を25〜35℃に保ちながら、20重量%水酸化ナトリウム水溶液10.1g(50.5ミリモル)を50分間かけてゆるやかに滴下し、同温度で3時間反応させた。その後、純度98%のジエチルシアノメチルホスホネート0.14mL(0.85ミリモル)を加え、同温度で66時間反応させた。反応終了後、水5mLを加えて30分間攪拌した。得られた反応液にトルエン50mLを加え、有機層を分離して10重量%水酸化ナトリウム水溶液10mLで洗浄し、飽和食塩水10mLを加えた。次いで、1モル/L塩酸5.6mLを加えて中和した後、有機層を取り出し、攪拌装置を備えた内容積200mLのガラス製フラスコに移した。それに、無水硫酸ナトリウム1.60gを加えて室温で1時間攪拌させ、更に、活性炭0.14g(粉末状:和光純薬株式会社製)及びシリカゲル(ワコーゲルC−200:和光純薬株式会社製)0.62gを加えて室温で1.75時間攪拌させた後、セライトで濾過し、セライトをトルエン50mLで洗浄した。得られた反応液を減圧下で濃縮すると結晶が析出してきたので、結晶を加熱して溶解させ、次いで、ヘキサン30mLを加えて30分間加熱還流させた。その後、液温を5℃まで冷却して2時間攪拌すると結晶が析出してきたので、結晶を濾過した後、ヘキサン30mLで洗浄し、減圧下、55℃にて乾燥させて、白色結晶として3−[2−シクロプロピル−4−(4−フルオロフェニル)−3−キノリル]プロプ−2−エンニトリル4.81gを得た(収率90%)。
【0021】
得られた3−[2−シクロプロピル−4−(4−フルオロフェニル)−3−キノリル]プロプ−2−エンニトリルの物性値を次に記す。
融点:175〜176℃、EI−MS(m/e):313(M−1)、CI−MS(m/e):315(M+1)
【0022】
[実施例1] 3−[2−シクロプロピル−4−(4−フルオロフェニル)−3−キノリル]プロプ−2−エナールの製造
攪拌装置、温度計及び滴下漏斗を備えた内容積200mLのガラス製フラスコに、窒素雰囲気下、参考例1で合成した3−[2−シクロプロピル−4−(4−フルオロフェニル)−3−キノリル]プロプ−2−エンニトリル4.0g(12.7ミリモル)、ギ酸アンモニウム1.6g(25.4ミリモル)、含水展開ラネーニッケル(川研ファインケミカル(株)製:NDHT−90:ニッケル含有量50重量%品)4.4g(ニッケル原子として37.5ミリモル)及び酢酸40mLを加え、65℃で4時間反応させた。反応終了後、室温まで冷却し、エタノール20mLを加えた後、触媒をセライトで濾過した。次いで、濾液を減圧下で濃縮し、酢酸エチル40mLを加え、1モル/L塩酸5mL、水10mL、1モル/L水酸化ナトリウム水溶液20mL、DL−酒石酸のアルカリ水溶液(DL−酒石酸1.0gを1モル/L水酸化ナトリウム水溶液14mLに溶解)14mL、飽和食塩水20mLの順で洗浄した後、有機層を無水硫酸マグネシウムで乾燥した。濾過後、減圧下で濃縮し、薄黄色結晶として純度98%(高速液体クロマトグラフィーによる面積百分率)の3−[2−シクロプロピル−4−(4−フルオロフェニル)−3−キノリル]プロプ−2−エナール3.4gを得た(収率82%)。
【0023】
3−[2−シクロプロピル−4−(4−フルオロフェニル)−3−キノリル]プロプ−2−エナールの物性値を次に記す。
CI−MS(m/e):318(M+1)
1H−NMR(CDCl3、δ(ppm)):1.07〜1.13(2H,m)、1.40〜1.45(2H,m)、2.32〜2.37(1H,m)、6.43(1H,dd,J=7.8,16.2Hz)、7.22〜7.26(4H,m)、7.35〜7.38(2H,m)、7.55(1H,d,J=16.2Hz)、7.64〜7.69(1H,m)、7.97(1H,d,J=8.4Hz)、9.51(1H,d,J=7.5Hz)
【0024】
【発明の効果】
本発明の製造方法により、簡便な方法によって前記式(1)のキノリルアクリロニトリル誘導体から前記式(2)のキノリルプロペナール誘導体を高収率で製造することが出来る。従って、工業的に有利なキノリルアクロレインの製造法を提供することが出来る。[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a method for producing a quinolylpropenal derivative from a quinolylacrylonitrile derivative. The quinolylpropenal derivative obtained by the production method of the present invention is a useful compound, for example, as a synthetic intermediate for a cholesterol-lowering agent (HMG-CoA reductase inhibitor).
[0002]
[Prior art]
Conventionally, as a method for producing a quinolylpropenal derivative, quinoline acrylate is reduced with diisobutylaluminum hydride to obtain quinolylpropenol, which is oxidized using oxalyl chloride and dimethyl sulfoxide, or manganese dioxide. There is known a method of producing in two steps consisting of quinolylpropenal (J. Med. Chem., 34 , 367 (1991)).
Further, as a method for producing a propenal compound by selectively reducing only a cyano group to a formyl group while retaining the double bond of the acrylonitrile compound, a method using diisobutylaluminum hydride as a reducing agent is known. (Heterocycles, 29 , 691 (1989)).
However, any of these methods must use diisobutylaluminum hydride or manganese dioxide, which is complicated in handling and after-treatment, and is disadvantageous as an industrial production method.
[0003]
[Problems to be solved by the invention]
An object of the present invention is to solve the above-mentioned problems and to produce an industrially advantageous quinolylpropenal derivative capable of producing a quinolylpropenal derivative from a quinolylacrylonitrile derivative in a high yield by a simple method. It is to provide a manufacturing method.
[0004]
[Means for Solving the Problems]
The subject of this invention is Formula (1).
[0005]
[Chemical 3]
Figure 0004496585
[0006]
In represented by quinolylacrylonitrile derivative {3- [2-cyclopropyl-4- (4-fluorophenyl) -3-quinolyl] prop-2-ene nitrile}, in the presence of an amine salt with the organic acids formic acid (2), characterized by reduction with Raney nickel
[0007]
[Formula 4]
Figure 0004496585
[0008]
The quinolylpropenal derivative {3- [2-cyclopropyl-4- (4-fluorophenyl) -3-quinolyl] prop-2-enal} represented by
[0009]
DETAILED DESCRIPTION OF THE INVENTION
The quinolylacrylonitrile derivative of the formula (1) which is a starting material for the production method of the present invention is a novel compound, but is a known 2-cyclopropyl-4- (4-fluorophenyl) quinoline-3-carbaldehyde (special No. 1-279866, European Published Patent Application No. 304063, US Pat. No. 5,011,930), diethyl cyanomethylphosphonate, preferably a base such as sodium hydroxide and a solvent such as aromatic hydrocarbon. It can manufacture by making it react in presence of.
[0010]
Raney nickel used in the reduction reaction used in the production method of the present invention is an alloy mainly composed of nickel and aluminum, and the nickel content is preferably 10 to 90% by weight, more preferably 40 to 80% by weight. % Means something. Normally, developed Raney nickel is used, but pre-treated Raney nickel or stabilized Raney nickel can also be used by various methods. Furthermore, Raney nickel containing metals such as cobalt, iron, lead, chromium, titanium, molybdenum, vanadium, manganese, tin, tungsten, etc. can be used.
[0011]
The amount of Raney nickel used in the reduction reaction of the production method of the present invention is preferably 0.30 to 2 times by weight, more preferably 0.4 to 1.2, in terms of nickel atoms, relative to the raw material quinolylacrylonitrile derivative. Weight times.
[0012]
The amine salt of formic acid used in the reduction reaction of the present invention is a salt composed of formic acid and an amine, such as ammonium formate; a salt composed of formic acid such as monomethylammonium formate and monoethylammonium formate and a primary amine; dimethylammonium formate. A salt composed of formic acid and a secondary amine such as diethylammonium formate; a salt composed of formic acid and a tertiary amine such as trimethylammonium formate and triethylammonium formate, preferably ammonium formate, triethylammonium formate, more preferably formic acid Ammonium is used.
[0013]
The amount of amine salt of formic acid used is preferably 1.0 to 5.0 times mol, more preferably 1.5 to 3.0 times mol, based on the amount of raw material quinolylacrylonitrile derivative used. It is.
[0014]
The organic acid used in the reduction reaction of the present invention is particularly preferably a lower fatty acid having 2 to 5 carbon atoms. Examples thereof include acetic acid, propionic acid, butyric acid, isobutyric acid, valeric acid, isovaleric acid, and pivalic acid. Although acetic acid is mentioned, preferably acetic acid is used.
[0015]
The amount of the organic acid used is preferably 3 to 50 times by weight, more preferably 5 to 30 times by weight with respect to the raw material quinolylacrylonitrile derivative. These organic acids may be used alone or in combination of two or more.
[0016]
In the reduction reaction of the present invention, the quinolylacrylonitrile derivative of formula (1) and the amine salt of formic acid are preferably contacted in an organic acid in the presence of Raney nickel. For example, in an inert gas atmosphere, Raney nickel, quino The reaction is carried out under normal pressure or under pressure by a method such as mixing rylacrylonitrile, ammonium formate and an organic acid, and stirring under heating. The reaction temperature in that case becomes like this. Preferably it is 20-110 degreeC, More preferably, it is 40-90 degreeC.
[0017]
If necessary, the reactivity may be adjusted by adding inorganic base, organic base, platinum salt, etc. into the system (Teruo Kubo, Shinichiro Komatsu, Raney Catalyst (published by Kawaken Fine Chemical Co., Ltd.) ), Pages 123-147).
[0018]
The final product, quinolylpropenal derivative, is filtered and extracted after completion of the reaction, and separated and purified by a general method such as distillation, recrystallization, or column chromatography.
[0019]
【Example】
Next, the present invention will be specifically described with reference to examples, but the scope of the present invention is not limited thereto.
[0020]
[Reference Example 1] 3- [2-cyclopropyl-4- (4-fluorophenyl) -3-quinolyl] prop-2-ene nitrile synthesis stirring device, a glass having an inner volume of 100mL equipped with a thermometer and a dropping funnel Under a nitrogen atmosphere, a flask made of 4-cyclopropyl-4- (4-fluorophenyl) quinoline-3- carbaldehyde (4.98 g, 17.1 mmol), 98% pure diethylcyanomethylphosphonate (3.10 mL, 18 0.8 mmol), tricaprylmethylammonium chloride (Aliquat 336: manufactured by Aldrich) 0.15 mL (0.33 mmol) and toluene 35 mL were added, and the liquid temperature was kept at 25 to 35 ° C., while maintaining 20 wt% sodium hydroxide. 10.1 g (50.5 mmol) of an aqueous solution was slowly added dropwise over 50 minutes and reacted at the same temperature for 3 hours. Thereafter, 0.14 mL (0.85 mmol) of 98% pure diethyl cyanomethylphosphonate was added and reacted at the same temperature for 66 hours. After completion of the reaction, 5 mL of water was added and stirred for 30 minutes. To the resulting reaction solution, 50 mL of toluene was added, the organic layer was separated, washed with 10 mL of a 10 wt% aqueous sodium hydroxide solution, and 10 mL of saturated brine was added. Subsequently, 5.6 mL of 1 mol / L hydrochloric acid was added for neutralization, and then the organic layer was taken out and transferred to a glass flask having an internal volume of 200 mL equipped with a stirrer. 1.60 g of anhydrous sodium sulfate was added thereto and stirred at room temperature for 1 hour. Further, 0.14 g of activated carbon (powder: Wako Pure Chemical Industries, Ltd.) and silica gel (Wakogel C-200: Wako Pure Chemical Industries, Ltd.) After adding 0.62 g and stirring at room temperature for 1.75 hours, the mixture was filtered through celite, and the celite was washed with 50 mL of toluene. When the obtained reaction solution was concentrated under reduced pressure, crystals were precipitated. The crystals were heated and dissolved, and then 30 mL of hexane was added and heated to reflux for 30 minutes. Thereafter, when the liquid temperature was cooled to 5 ° C. and stirred for 2 hours, crystals were precipitated. After filtering the crystals, the crystals were washed with 30 mL of hexane and dried at 55 ° C. under reduced pressure to give 3- [2-cyclopropyl-4- (4-fluorophenyl) -3-quinolyl] to give prop-2-ene nitrile 4.81 g (90% yield).
[0021]
The resulting 3- [2-cyclopropyl-4- (4-fluorophenyl) -3-quinolyl] then marks the physical properties of the prop-2-ene nitrile.
Melting point: 175-176 ° C., EI-MS (m / e): 313 (M−1), CI-MS (m / e): 315 (M + 1)
[0022]
[Example 1] Production of 3- [2-cyclopropyl-4- (4-fluorophenyl) -3-quinolyl] prop-2-enal 200 g of glass with a stirrer, a thermometer and a dropping funnel the flask under a nitrogen atmosphere, the synthesized 3 in reference example 1 [2-cyclopropyl-4- (4-fluorophenyl) -3-quinolyl] prop-2-ene nitrile 4.0 g (12.7 mmol), 1.6 g (25.4 mmol) of ammonium formate, 4.4 g (37.5 mmol as nickel atom) and acetic acid with water-containing developed Raney nickel (manufactured by Kawaken Fine Chemical Co., Ltd .: NDHT-90: nickel content 50% by weight) 40 mL was added and reacted at 65 ° C. for 4 hours. After completion of the reaction, the reaction mixture was cooled to room temperature, 20 mL of ethanol was added, and the catalyst was filtered through celite. Next, the filtrate was concentrated under reduced pressure, 40 mL of ethyl acetate was added, 1 mol / L hydrochloric acid 5 mL, water 10 mL, 1 mol / L sodium hydroxide aqueous solution 20 mL, DL-tartaric acid alkaline aqueous solution (DL-tartaric acid 1.0 g After washing with 14 mL of a 1 mol / L aqueous sodium hydroxide solution and 20 mL of saturated brine in that order, the organic layer was dried over anhydrous magnesium sulfate. After filtration, the filtrate was concentrated under reduced pressure and 3- [2-cyclopropyl-4- (4-fluorophenyl) -3-quinolyl] prop-2 having a purity of 98% (area percentage by high performance liquid chromatography) as pale yellow crystals. -3.4 g of enal was obtained (82% yield).
[0023]
The physical properties of 3- [2-cyclopropyl-4- (4-fluorophenyl) -3-quinolyl] prop-2-enal are described below.
CI-MS (m / e): 318 (M + 1)
1 H-NMR (CDCl 3 , δ (ppm)): 1.07 to 1.13 (2H, m), 1.40 to 1.45 (2H, m), 2.32 to 2.37 (1H, m), 6.43 (1H, dd, J = 7.8, 16.2 Hz), 7.22 to 7.26 (4H, m), 7.35 to 7.38 (2H, m), 7. 55 (1H, d, J = 16.2 Hz), 7.64-7.69 (1 H, m), 7.97 (1 H, d, J = 8.4 Hz), 9.51 (1 H, d, J = 7.5Hz)
[0024]
【The invention's effect】
According to the production method of the present invention, the quinolylpropenal derivative of the formula (2) can be produced in a high yield from the quinolylacrylonitrile derivative of the formula (1) by a simple method. Accordingly, it is possible to provide an industrially advantageous method for producing quinolyl acrolein.

Claims (3)

式(1)
Figure 0004496585
で表わされるキノリルアクリロニトリル誘導体を、ギ酸のアミン塩と有機酸との存在下にて、ラネーニッケルにより還元することを特徴とする、式(2)
Figure 0004496585
で表わされるキノリルプロペナール誘導体の製造方法。
Formula (1)
Figure 0004496585
A quinolylacrylonitrile derivative represented by the formula (2) is reduced with Raney nickel in the presence of an amine salt of formic acid and an organic acid:
Figure 0004496585
The manufacturing method of the quinolyl propenal derivative represented by these.
ギ酸のアミン塩がギ酸アンモニウムであることを特徴とする請求項1に記載のキノリルプロペナール誘導体の製造方法。The method for producing a quinolylpropenal derivative according to claim 1, wherein the amine salt of formic acid is ammonium formate. 有機酸が炭素原子数2〜5の低級脂肪酸であることを特徴とする請求項1もしくは2に記載のキノリルプロペナール誘導体の製造方法。The method for producing a quinolylpropenal derivative according to claim 1 or 2, wherein the organic acid is a lower fatty acid having 2 to 5 carbon atoms.
JP2000014849A 2000-01-24 2000-01-24 Process for producing quinolylpropenal Expired - Fee Related JP4496585B2 (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP2000014849A JP4496585B2 (en) 2000-01-24 2000-01-24 Process for producing quinolylpropenal
EP01901538A EP1251124B1 (en) 2000-01-24 2001-01-24 Process for the preparation of quinolylpropenal
DE60129203T DE60129203T2 (en) 2000-01-24 2001-01-24 PROCESS FOR THE PREPARATION OF QUINOLYLPROPENAL
CA002398138A CA2398138C (en) 2000-01-24 2001-01-24 Process for the preparation of quinolylpropenal
CN01807062.0A CN1222512C (en) 2000-01-24 2001-01-24 Process for the preparation of quinolylpropenal
AT01901538T ATE366239T1 (en) 2000-01-24 2001-01-24 METHOD FOR PRODUCING QUINOLYL PROPENAL
PCT/JP2001/000452 WO2001053265A1 (en) 2000-01-24 2001-01-24 Process for the preparation of quinolylpropenal
US10/181,820 US6630591B2 (en) 2000-01-24 2001-01-24 Process for the preparation of quinolylpropenal
AU2001227100A AU2001227100A1 (en) 2000-01-24 2001-01-24 Process for the preparation of quinolylpropenal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000014849A JP4496585B2 (en) 2000-01-24 2000-01-24 Process for producing quinolylpropenal

Publications (3)

Publication Number Publication Date
JP2001199964A JP2001199964A (en) 2001-07-24
JP2001199964A5 JP2001199964A5 (en) 2006-11-30
JP4496585B2 true JP4496585B2 (en) 2010-07-07

Family

ID=18542242

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000014849A Expired - Fee Related JP4496585B2 (en) 2000-01-24 2000-01-24 Process for producing quinolylpropenal

Country Status (1)

Country Link
JP (1) JP4496585B2 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01279866A (en) * 1987-08-20 1989-11-10 Nissan Chem Ind Ltd Quinoline-based mevalonolactones
JPH06329540A (en) * 1991-10-04 1994-11-29 Nissan Chem Ind Ltd Suppressor for arteriosclerotic intravascular membrane hyperplasia
JP4281248B2 (en) * 1998-07-23 2009-06-17 日産化学工業株式会社 Process for producing quinoline derivative and intermediate

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01279866A (en) * 1987-08-20 1989-11-10 Nissan Chem Ind Ltd Quinoline-based mevalonolactones
JPH06329540A (en) * 1991-10-04 1994-11-29 Nissan Chem Ind Ltd Suppressor for arteriosclerotic intravascular membrane hyperplasia
JP4281248B2 (en) * 1998-07-23 2009-06-17 日産化学工業株式会社 Process for producing quinoline derivative and intermediate

Also Published As

Publication number Publication date
JP2001199964A (en) 2001-07-24

Similar Documents

Publication Publication Date Title
CA1333802C (en) Substituted 4-(quinolin-2-yl-methoxy)phenyl-acetic acid derivatives
JP4281248B2 (en) Process for producing quinoline derivative and intermediate
JP2004518737A (en) Method for producing 2- (4-chlorobenzoylamino) -3- [2 (1H) -quinollinon-4-yl] propionic acid
TWI243165B (en) Process for producing optically active oxoheptenoic acid ester
JP4496586B2 (en) Process for producing quinolylacrylonitrile and its intermediate
JP4496585B2 (en) Process for producing quinolylpropenal
JP4496584B2 (en) Process for producing quinolylpropenal
JP2001199962A5 (en)
AU2002308986B2 (en) Process for preparation of a quinolinecarbaldehyde
EP1251124B1 (en) Process for the preparation of quinolylpropenal
JP4321065B2 (en) Process for producing quinolinecarboxaldehyde derivative and its intermediate
JP3481325B2 (en) Method for producing optically active 3-oxy-5-oxo-6-heptenoic acid derivative
WO2015012271A1 (en) Method for producing heterocyclic compound
JP2561500B2 (en) Process for producing pyridine-2,3-dicarboxylic acid derivative
JP3022908B2 (en) Process for producing 8-hydroxyquinolone carboxylic acid esters
JP2001199963A5 (en)
JP2001199964A5 (en)
JP2001253877A (en) Method for producing 4-tetrahydropyranylalkylamine derivative

Legal Events

Date Code Title Description
A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20040316

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20040316

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20040317

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20061017

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20061017

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100323

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100405

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130423

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees