JP2001196739A - Metal base circuit board and manufacturing method therefor - Google Patents

Metal base circuit board and manufacturing method therefor

Info

Publication number
JP2001196739A
JP2001196739A JP2000004650A JP2000004650A JP2001196739A JP 2001196739 A JP2001196739 A JP 2001196739A JP 2000004650 A JP2000004650 A JP 2000004650A JP 2000004650 A JP2000004650 A JP 2000004650A JP 2001196739 A JP2001196739 A JP 2001196739A
Authority
JP
Japan
Prior art keywords
circuit
metal
circuit board
view
conductive foil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000004650A
Other languages
Japanese (ja)
Inventor
Yutaka Ogino
裕 荻野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Priority to JP2000004650A priority Critical patent/JP2001196739A/en
Publication of JP2001196739A publication Critical patent/JP2001196739A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To obtain a metal base circuit board mounting a circuit of metal foil on a metal plate through an insulation layer in which a conduction circuit can be fabricated efficiently with high quality. SOLUTION: A circuit is formed of a conductive foil by press and a half push-back conductive foil, having a partially refilled part is bonded onto a metal plate via an insulation layer at a part of the circuit other than the circuit of the conductive foil which is subsequently removed. In such a method for manufacturing a metal base circuit board, the edge of the circuit abutting on the insulation layer has a radius of curvature of 0.1 mm or large.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、電気機器、通信
機、自動車等に用いられる半導体搭載用の金属ベース回
路基板とその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a metal-based circuit board for mounting a semiconductor used in electric equipment, communication equipment, automobiles and the like, and a method of manufacturing the same.

【0002】[0002]

【従来の技術】電気機器、通信機、自動車等の幅広い分
野で半導体素子やいろいろの電気部品を搭載した回路基
板が知られているが、安価で、しかも熱放散性に優れる
という理由で金属ベース回路基板が注目され、用いられ
ている。
2. Description of the Related Art Circuit boards on which semiconductor elements and various electric components are mounted are known in a wide range of fields such as electric equipment, communication equipment, and automobiles. However, metal bases are inexpensive and have excellent heat dissipation. Circuit boards have attracted attention and are being used.

【0003】金属ベース回路基板は、熱放散性に優れる
金属板の一主面上に絶縁層を介して回路を設けた構造を
有し、該金属板には、鉄、アルミニウムが多く使用さ
れ、絶縁層は、酸化アルミニウム等の無機充填材を含有
するエポキシ樹脂等の樹脂からなり、また、回路は、い
ろいろな金属箔から形成され、通常は銅、アルミニウ
ム、或いは銅とアルミニウムとの複合材が多用されてい
る。
A metal-based circuit board has a structure in which a circuit is provided on one main surface of a metal plate excellent in heat dissipation through an insulating layer, and iron and aluminum are often used for the metal plate. The insulating layer is made of a resin such as an epoxy resin containing an inorganic filler such as aluminum oxide, and the circuit is formed of various metal foils, usually made of copper, aluminum, or a composite material of copper and aluminum. It is heavily used.

【0004】上記金属ベース回路基板において導電回路
を形成する方法として、導電箔を接合したのちに、エッ
チングでパターンを形成する方法(以下、エッチング法
と呼ぶ)が、また、金属箔を予めエッチングまたはプレ
ス金型でパターンを形成しリードフレームとしたのち
に、絶縁層を介して金属板に接合する方法(以下、リー
ドフレーム法と呼ぶ)が知られている。
[0004] As a method of forming a conductive circuit on the metal-based circuit board, there is a method of forming a pattern by etching after bonding a conductive foil (hereinafter referred to as an etching method). There has been known a method of forming a lead frame by forming a pattern with a press die and joining the lead frame to a metal plate via an insulating layer (hereinafter, referred to as a lead frame method).

【0005】図2は、エッチング法で製造した金属ベー
ス回路基板と、その工程を説明する図である。図2
(a)、図2(b)はそれぞれ金属板に絶縁層を介して
金属箔を貼着した金属ベース基板の平面図と断面図、ま
た図2(c)、図2(d)はそれぞれエッチングレジス
トインクを印刷した金属ベース回路基板の平面図と断面
図、図2(e)、図2(f)はそれぞれエッチングで導
電回路を形成した平面図と断面図、更に図2(g)、図
2(h)はそれぞれエッチングレジストを剥離した後に
得られる金属ベース回路基板の平面図と断面図を示して
いる。
FIG. 2 is a view for explaining a metal-based circuit board manufactured by an etching method and its steps. FIG.
2A and 2B are a plan view and a cross-sectional view of a metal base substrate in which a metal foil is adhered to a metal plate via an insulating layer, and FIGS. 2C and 2D are etchings, respectively. FIG. 2 (e) and FIG. 2 (f) are a plan view and a sectional view, respectively, in which a conductive circuit is formed by etching, and FIG. 2 (g) and FIG. 2 (h) shows a plan view and a cross-sectional view of the metal base circuit board obtained after stripping the etching resist.

【0006】エッチング法では、その工程中に導電回路
を金属箔よりエッチングにより形成する工程を有する
が、この時、金属箔が厚い箔を用いる場合に、得られる
導電回路の上面は該導電回路の底面より細くなり、回路
の有効面積が減少するため、導電回路に流せる電流に制
限を受けるという問題がある。また、通常用いられるエ
ッチングレジストインクではエッチング液に長時間浸漬
することにより、部分的に剥れたり、ピンホールが発生
する等の問題もある。
[0006] The etching method has a step of forming a conductive circuit by etching from a metal foil during the process. At this time, when a foil having a large metal foil is used, the upper surface of the obtained conductive circuit is formed on the conductive circuit. There is a problem that the current that can flow in the conductive circuit is limited because it is thinner than the bottom surface and the effective area of the circuit is reduced. In addition, a commonly used etching resist ink has a problem that it is partially peeled off or a pinhole is generated by being immersed in an etching solution for a long time.

【0007】一方、図3は、リードフレーム法で製造し
た金属ベース回路基板とそれを得るための工程を示す図
である。図3(a)、図3(b)はそれぞれ予め回路形
成してあるリードフレームの平面図と断面図、図3
(c)、図3(d)はそれぞれ金属板に絶縁層を塗布し
た平面図と断面図、図3(e)、図3(f)はそれぞれ
金属板に絶縁層を介してリードフレームを貼り付けて得
られた金属ベース回路基板の平面図と断面図である。
FIG. 3 is a view showing a metal base circuit board manufactured by a lead frame method and steps for obtaining the same. 3A and 3B are a plan view and a cross-sectional view of a lead frame in which a circuit is formed in advance, respectively.
(C) and FIG. 3 (d) are a plan view and a sectional view, respectively, in which an insulating layer is applied to a metal plate, and FIGS. 3 (e) and 3 (f) respectively show a lead frame attached to the metal plate via the insulating layer. It is the top view and sectional drawing of the metal base circuit board obtained by attaching.

【0008】この方法においては、リードフレームに予
め形成される導体回路をプレス法で打ち抜くことも出
来、この場合には、得られる回路の側面はほぼ垂直状で
あり導体回路の有効面積を高くすることができるが、リ
ード部のない、離れ小島状の回路部を直接に形成するこ
とが出来ず、回路設計上の制約があった。
In this method, a conductor circuit formed in advance on a lead frame can be punched out by a pressing method. In this case, the side surface of the obtained circuit is substantially vertical and the effective area of the conductor circuit is increased. However, it is not possible to directly form a remote island-shaped circuit portion without a lead portion, and there is a limitation in circuit design.

【0009】[0009]

【発明が解決しようとする課題】本発明は上記事情に鑑
みてなされたものであり、その目的とするところは、金
属板に絶縁層を介して金属箔からなる回路を搭載した金
属ベース回路基板において、導電回路を効率的に、しか
も高品質に製造することを特徴とするものである。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a metal base circuit board in which a circuit made of a metal foil is mounted on a metal plate via an insulating layer. Wherein the conductive circuit is manufactured efficiently and with high quality.

【0010】[0010]

【課題を解決するための手段】即ち、本発明は、導電箔
より回路をプレス法で形成し、該回路を前記導電箔の回
路でない部分に、少なくとも一部を埋め戻してなるハー
フプッシュバック導電箔を、金属板上に、絶縁層を介し
て接合し、しかる後に、前記回路でない部分を除去する
ことを特徴とする金属ベース回路基板の製造方法であ
り、好ましくは、前記絶縁層が無機フィラーを含有する
樹脂からなることを特徴とする前記の金属ベース回路基
板の製造方法であり、更に好ましくは、導電箔の厚みが
0.2〜2.0mmであることを特徴とする前記の金属
ベース回路基板の製造方法である。更に、本発明は、金
属板の少なくとも一主面上に、無機フィラーを含有する
樹脂からなる絶縁層を介して、導電箔からなる回路を設
けてなる金属ベース回路基板であって、前記回路の絶縁
層と接する部分の縁が0.1mm以上の曲率半径を有し
ていることを特徴とする金属ベース回路基板である。
That is, the present invention provides a half-push-back conductive circuit in which a circuit is formed from a conductive foil by a press method, and the circuit is at least partially backfilled in a non-circuit portion of the conductive foil. A method of manufacturing a metal-based circuit board, comprising bonding a foil onto a metal plate via an insulating layer, and then removing the non-circuit portion. The method for producing a metal-based circuit board according to claim 1, wherein the conductive foil has a thickness of 0.2 to 2.0 mm. This is a method for manufacturing a circuit board. Further, the present invention is a metal-based circuit board provided with a circuit made of a conductive foil on at least one main surface of a metal plate via an insulating layer made of a resin containing an inorganic filler, A metal-based circuit board, wherein an edge of a portion in contact with the insulating layer has a radius of curvature of 0.1 mm or more.

【0011】[0011]

【発明の実施の形態】以下、本発明について、図に基づ
いて、詳細に説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to the drawings.

【0012】図1は、本発明の金属ベース回路基板の製
造方法の一例を示す図である。図1(a)、図1(b)
はそれぞれ、導電箔より回路3をプレス法で形成し、該
回路を前記導電箔の回路でない部分4に、少なくとも一
部を埋め戻してなるハーフプッシュバック導電箔の平面
図と断面図である。また、図1(c)、図1(d)はそ
れぞれ金属板1上に絶縁層2を設けた金属ベース基板で
ある。図1(e)、図1(f)はそれぞれ金属ベース基
板の絶縁層2上に前記ハーフプッシュバック導電箔を搭
載した状況を示す平面図と断面図である。図1(g)、
図1(h)はそれぞれ前記図1(e)、図1(f)の状
態の後、前記ハーフプッシュバック導電箔の回路でない
部分4を機械的、物理的に除去して得られる、本発明の
金属ベース回路基板の平面図と断面図である。
FIG. 1 is a diagram showing an example of a method for manufacturing a metal-based circuit board according to the present invention. FIG. 1 (a), FIG. 1 (b)
Are a plan view and a cross-sectional view of a half push-back conductive foil in which a circuit 3 is formed from a conductive foil by a pressing method, and the circuit is at least partially backfilled in a non-circuit portion 4 of the conductive foil. FIGS. 1C and 1D show metal base substrates each having an insulating layer 2 provided on a metal plate 1. FIGS. 1E and 1F are a plan view and a cross-sectional view, respectively, showing a state where the half push-back conductive foil is mounted on the insulating layer 2 of the metal base substrate. FIG. 1 (g),
FIG. 1H shows the present invention obtained by mechanically and physically removing the non-circuit portion 4 of the half pushback conductive foil after the states of FIGS. 1E and 1F, respectively. 1 is a plan view and a cross-sectional view of a metal base circuit board of FIG.

【0013】本発明では、上記した通りに、導電回路3
をプレス加工で金属箔から打ち抜いた後、ハーフプッシ
ュバックして金属箔に埋め戻した状態で貼着し、その後
導電回路部分以外の部分を除去することを特徴としてい
る。このため、回路の有効面積が高く、しかも、従来の
方法では一回の操作では得ることの出来なかった、離れ
小島状の回路部分を有する回路を直接的に得ることがで
きる特徴がある。
In the present invention, as described above, the conductive circuit 3
Is stamped out of a metal foil by press working, and then half-pushed back and adhered in a state of being embedded in the metal foil, and thereafter, portions other than the conductive circuit portion are removed. For this reason, there is a feature that the effective area of the circuit is large, and a circuit having a separated small island-shaped circuit portion, which cannot be obtained by a single operation in the conventional method, can be directly obtained.

【0014】また、金属ベース基板にハーフプッシュバ
ック導電箔を接合する際に、一般的に金型を用いてプレ
スしたりやロールを用いて加圧するが、この時回路表面
が前記プレス金型やロールと直接接することがないの
で、回路表面に傷の無い金属ベース回路基板を得ること
ができる。前記の回路表面に傷がないことは、本発明の
金属ベース回路基板を用いて電子部品モジュールを形成
するの際の超音波ワイヤ−ボンデイングの接続不良等を
防止できるので、信頼性が高い電子部品モジュールを得
られると期待される。
When a half-push-back conductive foil is bonded to a metal base substrate, the metal foil is generally pressed by using a mold or pressed by using a roll. Since there is no direct contact with the substrate, it is possible to obtain a metal-based circuit board having no scratch on the circuit surface. Since there is no scratch on the circuit surface, it is possible to prevent a defective connection of an ultrasonic wire-bonding when an electronic component module is formed using the metal-based circuit board of the present invention. It is expected that a module will be obtained.

【0015】更に、本発明者は、本方法に於いて、ハー
フプッシュバック条件を制御するとき、得られる金属ベ
ース回路基板の導体回路の絶縁層に接する側の縁部が特
定範囲の曲率半径を有することができ、前記特定範囲の
ものの耐絶縁性が著しく改善されることを見いだし本発
明に至ったものである。
Further, in the present method, when controlling the half pushback condition in the present method, the edge of the obtained metal base circuit board on the side in contact with the insulating layer of the conductor circuit has a radius of curvature in a specific range. The present invention has been found that the insulation resistance of the above-mentioned specific range is significantly improved.

【0016】即ち、本発明の金属ベース回路基板は、回
路の絶縁層と接する部分の縁が0.1mm以上の曲率半
径を有していることを特徴としている。0.1mm以上
の曲率半径を有しているので、高く、安定した耐電圧特
性が達成される。前記数値範囲の上限に関しては、特に
定めるべき理由はないが、ハーフプッシュバック操作上
導電箔の厚さの2/3を超えるものは得にくい。即ち、
0.1mm以上でしかも導電箔の厚さの2/3以下の曲
率半径であることが好ましい。そして、本発明の金属ベ
ース回路基板は、前記構成を有することから、絶縁層に
電界集中が生じ難く、また熱膨張伸縮による絶縁層の損
傷が発生し辛い為に耐電圧に優れた高信頼性を有してい
る。
That is, the metal-based circuit board of the present invention is characterized in that the edge of the portion in contact with the insulating layer of the circuit has a radius of curvature of 0.1 mm or more. Since it has a radius of curvature of 0.1 mm or more, high and stable withstand voltage characteristics are achieved. There is no particular reason for the upper limit of the above numerical range, but it is difficult to obtain a conductive foil having a thickness exceeding 2/3 of the thickness of the conductive foil in a half pushback operation. That is,
It is preferable that the radius of curvature is not less than 0.1 mm and not more than 2/3 of the thickness of the conductive foil. The metal-based circuit board of the present invention has the above-described structure, so that electric field concentration hardly occurs on the insulating layer, and the insulating layer is hardly damaged by thermal expansion and contraction. have.

【0017】本発明において、金属板1は、アルミニウ
ム、鉄、銅等或いはこれらの合金、複合材のいずれでも
構わないが、熱放散性が良く、安価で、軽量であること
から純アルミニウム、アルミニウム合金が好ましく用い
られる。通常の板厚は1.0〜5.0mmの範囲であ
る。
In the present invention, the metal plate 1 may be made of aluminum, iron, copper or the like, or any of alloys and composite materials thereof. Alloys are preferably used. Normal plate thickness is in the range of 1.0 to 5.0 mm.

【0018】また、絶縁層2としては、絶縁性を有する
材質であればいずれも採用でき、例えばエポキシ樹脂、
フェノール樹脂、不飽和ポリエステル樹脂、ポリイミド
樹脂等の樹脂が用いられる。このうち、エポキシ樹脂は
金属板1、導電回路3との接着性に優れることから好ま
しく選択される。また、樹脂は、樹脂単独で用いる他、
ガラス布、粉末状或いは繊維状のいろいろな無機フイラ
ーを充填したもの、或いは、これらを組み合わせた形態
で用いることができる。
The insulating layer 2 can be made of any material having an insulating property, for example, epoxy resin,
A resin such as a phenol resin, an unsaturated polyester resin, and a polyimide resin is used. Among them, the epoxy resin is preferably selected because of its excellent adhesion to the metal plate 1 and the conductive circuit 3. In addition to using the resin alone,
It can be used in the form of a glass cloth, one filled with various inorganic fillers in the form of powder or fiber, or a combination thereof.

【0019】絶縁層2の作り方については、金属板1上
に塗布してもよいし、一旦フィルム状として、貼着する
ことで設けることもできる。尚、前記無機フィラーに関
しては、酸化アルミニウム、酸化珪素、窒化アルミニウ
ム、窒化珪素、窒化硼素等の高い電気絶縁性を有し、し
かも熱伝導率の高いものが好ましい。
Regarding the method of forming the insulating layer 2, the insulating layer 2 may be applied on the metal plate 1 or may be provided by sticking it once as a film. The inorganic filler is preferably one having high electric insulation and high thermal conductivity, such as aluminum oxide, silicon oxide, aluminum nitride, silicon nitride, and boron nitride.

【0020】導電回路3となる金属箔は、銅箔、銅箔に
NiめっきあるいAuめっきを施したもの、アルミニウ
ム箔、或いはアルミニウム箔に銅箔を接合したもの等の
いずれも採用できる。
The metal foil to be the conductive circuit 3 may be any one of copper foil, copper foil plated with Ni or Au, aluminum foil, or aluminum foil joined with copper foil.

【0021】本発明に於いて、前記金属箔の厚さは0.
2〜2.0mmであることが好ましい。然るに、0.2
mm以下のハーフプッシュバック導電箔は産業上得るこ
とが容易でないし、得られたとしても高価である。ま
た、2.0mmを超えるものは、ハーフプッシュバック
したものを得ることができるとしても、得られる回路の
厚みも2.0mmを超えてしまうので実用上用途を見い
だしがたい。
In the present invention, the thickness of the metal foil is set to 0.1.
It is preferably from 2 to 2.0 mm. However, 0.2
The half-pushback conductive foil having a thickness of not more than mm is not industrially easy to obtain, and even if obtained, it is expensive. If the thickness exceeds 2.0 mm, a half-push-backed one can be obtained, but the thickness of the obtained circuit also exceeds 2.0 mm, so that it is difficult to find a practical application.

【0022】[0022]

【実施例】〔実施例1〕厚さ0.3mmの銅箔を所望回
路形状の刃を有する金型を用いてプレス法により打ち抜
いて、枠部分(前記操作で打ち抜かれていない、回路と
ならない部分)に対して0.1mmの深さまで埋め戻す
ことで、ハーフプッシュバック導電箔作製した。
Example 1 A copper foil having a thickness of 0.3 mm was punched out by a press method using a mold having a blade having a desired circuit shape, and a frame portion (a circuit was not punched out by the above-described operation, and a circuit was not formed) A half-push-back conductive foil was prepared by back-filling to a depth of 0.1 mm with respect to (part).

【0023】次に、酸化アルミニウム76質量%を含有
するエポキシ樹脂を、加熱硬化後に150μmの厚みと
なるようにアルミニウム板(厚さ3.0mm)上に塗布
して金属ベース基板を作製し、前記ハーフプッシュバッ
ク導電箔を貼着し、加熱硬化した後、前記ハーフプッシ
ュバック導電箔の枠部分を取り外して金属ベース回路基
板を作製した。前記操作を繰り返し、10個の金属ベー
ス回路基板を得て、耐電圧特性、回路表面の観察、回路
の上面と低面との寸法差を評価した。これらの結果を表
1に示した。
Next, an epoxy resin containing 76% by mass of aluminum oxide was applied on an aluminum plate (thickness: 3.0 mm) so as to have a thickness of 150 μm after heating and curing to prepare a metal base substrate. After sticking a half push-back conductive foil and curing by heating, a frame portion of the half push-back conductive foil was removed to prepare a metal-based circuit board. The above operation was repeated to obtain ten metal-based circuit boards, and withstand voltage characteristics, observation of the circuit surface, and dimensional difference between the upper surface and the lower surface of the circuit were evaluated. The results are shown in Table 1.

【0024】[0024]

【表1】 [Table 1]

【0025】〔比較例1〕エッチング法で金属ベース回
路基板を作製し、実施例1と同じ評価を行い、結果を表
1に示した。
Comparative Example 1 A metal-based circuit board was manufactured by the etching method, and the same evaluation as in Example 1 was performed. The results are shown in Table 1.

【0026】〔比較例2〕リードフレーム法で金属ベー
ス回路基板を作製し、実施例1と同じ評価を行い、結果
を表1に示した。
Comparative Example 2 A metal-based circuit board was manufactured by a lead frame method, and the same evaluations as in Example 1 were performed. The results are shown in Table 1.

【0027】[0027]

【発明の効果】本発明によれば、従来得られなかった離
れ小島状の回路部分を含む回路を一回の操作で得ること
ができ、しかも、上面と下面の寸法差のない有効面積の
大きい、表面に傷の少ない回路を有する金属ベース回路
基板を安定して得ることができるし、更に製造条件を調
整することで前記回路の低部縁部に特定の大きさの曲率
半径を有し、耐電圧特性に優れる金属ベース回路基板を
得ることができるので、産業上非常に有用である。
According to the present invention, it is possible to obtain a circuit including a remote island-shaped circuit portion, which has not been obtained conventionally, by a single operation, and has a large effective area without a dimensional difference between the upper surface and the lower surface. It is possible to stably obtain a metal-based circuit board having a circuit with a small number of scratches on the surface, and further have a specific radius of curvature at the lower edge of the circuit by adjusting manufacturing conditions, Since a metal-based circuit board having excellent withstand voltage characteristics can be obtained, it is industrially very useful.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例に係る金属ベース回路基板と、
それを得るための工程を示す図。(a)、(b)はそれ
ぞれハーフプッシュバックした導電箔の平面図と断面図
であり、(c)、(d)はそれぞれ金属ベース基板の平
面図と断面図であり、(e)、(f)はハーフプッシュ
バック導電箔を絶縁層を介して金属ベース基板に貼着し
た状態の平面図と断面図であり、また(g)、(h)は
それぞれ本発明の金属ベース回路基板の平面図と断面図
である。
FIG. 1 shows a metal-based circuit board according to an embodiment of the present invention;
The figure which shows the process for obtaining it. (A) and (b) are a plan view and a sectional view of a conductive foil that has been half-pushed back, respectively, and (c) and (d) are a plan view and a sectional view of a metal base substrate, respectively. (f) is a plan view and a cross-sectional view showing a state in which a half push-back conductive foil is adhered to a metal base substrate via an insulating layer, and (g) and (h) are plan views of the metal base circuit board of the present invention, respectively. It is a figure and sectional drawing.

【図2】エッチング法の比較例1に係る金属ベース回路
基板と、それを得るための工程を示す図。(a)、
(b)はそれぞれ金属ベース基板の平面図と断面図、
(c)、(d)はそれぞれエッチングレジストインクを
印刷した金属ベース基板の平面図と断面図、(e)、
(f)はそれぞれエッチングで導電回路を形成した状態
の平面図と断面図、更に(g)、(h)はそれぞれ金属
ベース回路基板の平面図と断面図である。
FIG. 2 is a view showing a metal-based circuit board according to Comparative Example 1 of the etching method and steps for obtaining the same. (A),
(B) is a plan view and a cross-sectional view of the metal base substrate, respectively.
(C) and (d) are a plan view and a cross-sectional view of a metal base substrate on which an etching resist ink is printed, respectively.
(F) is a plan view and a cross-sectional view of a state where a conductive circuit is formed by etching, respectively, and (g) and (h) are a plan view and a cross-sectional view of a metal-based circuit board, respectively.

【図3】リードフレーム法で形成した比較例2に係る金
属ベース回路基板と、それを得るための工程を示す図。
(a)、(b)はそれぞれリードフレームの平面図と断
面図、(c)、(d)はそれぞれ金属ベース基板の平面
図と断面図、(e)、(f)はそれぞれ金属ベース回路
基板の平面図と断面図。
FIG. 3 is a view showing a metal-based circuit board according to a comparative example 2 formed by a lead frame method and steps for obtaining the same.
(A) and (b) are a plan view and a sectional view of a lead frame, respectively, (c) and (d) are a plan view and a sectional view of a metal base substrate, respectively, and (e) and (f) are metal base circuit boards, respectively. FIG.

【符号の説明】[Explanation of symbols]

1 :金属板 2 :絶縁層 3 :回路部分 4 :枠部分 7 :エッチングレジスト 8 :リードフレーム 1: metal plate 2: insulating layer 3: circuit portion 4: frame portion 7: etching resist 8: lead frame

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】導電箔より回路をプレス法で形成し、該回
路を前記導電箔の回路でない部分に、少なくとも一部を
埋め戻してなるハーフプッシュバック導電箔を、金属板
上に、絶縁層を介して接合し、しかる後に、前記回路で
ない部分を除去することを特徴とする金属ベース回路基
板の製造方法。
1. A half-push-back conductive foil in which a circuit is formed from a conductive foil by a press method, and the circuit is at least partially backfilled in a non-circuit portion of the conductive foil. And then removing the non-circuit portion.
【請求項2】前記絶縁層が無機フィラーを含有する樹脂
からなることを特徴とする請求項1記載の金属ベース回
路基板の製造方法。
2. The method according to claim 1, wherein the insulating layer is made of a resin containing an inorganic filler.
【請求項3】導電箔の厚みが0.2〜2.0mmである
ことを特徴とする請求項1又は請求項2記載の金属ベー
ス回路基板の製造方法。
3. The method for manufacturing a metal-based circuit board according to claim 1, wherein the thickness of the conductive foil is 0.2 to 2.0 mm.
【請求項4】金属板の少なくとも一主面上に、無機フィ
ラーを含有する樹脂からなる絶縁層を介して、導電箔か
らなる回路を設けてなる金属ベース回路基板であって、
前記回路の絶縁層と接する部分の縁が0.1mm以上の
曲率半径を有していることを特徴とする金属ベース回路
基板。
4. A metal base circuit board comprising a circuit made of a conductive foil provided on at least one main surface of a metal plate via an insulating layer made of a resin containing an inorganic filler,
A metal-based circuit board, wherein an edge of a portion of the circuit in contact with the insulating layer has a radius of curvature of 0.1 mm or more.
JP2000004650A 2000-01-13 2000-01-13 Metal base circuit board and manufacturing method therefor Pending JP2001196739A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000004650A JP2001196739A (en) 2000-01-13 2000-01-13 Metal base circuit board and manufacturing method therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000004650A JP2001196739A (en) 2000-01-13 2000-01-13 Metal base circuit board and manufacturing method therefor

Publications (1)

Publication Number Publication Date
JP2001196739A true JP2001196739A (en) 2001-07-19

Family

ID=18533410

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000004650A Pending JP2001196739A (en) 2000-01-13 2000-01-13 Metal base circuit board and manufacturing method therefor

Country Status (1)

Country Link
JP (1) JP2001196739A (en)

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