JP2001166495A - Both-side aligner - Google Patents

Abstract

PROBLEM TO BE SOLVED: To shorten working time and to improve work efficiency by executing carry-in, moving and carry-out independently of both-side alignment of a work. SOLUTION: An aligning machine 1 in which a surface aligning part 2a and a rear face aligning part 2b are opposed is provided so that a state is changed from a carry-in state to an off-line state, and a work chuck 9 is respectively provided at the surface aligning position and the carry-in position of a surface shuttle device 8a turning between the surface aligning position and the carry-in position, and the work chuck 9 is respectively provided at the rear face aligning position and the carry-out position of a rear face shuttle device 8b similarly turning between a rear face aligning position and the carry- out position, and the work W whose surface is aligned is moved between for instance the work chuck 9 at the carry-in position and that at the carry-out position during the alignment of the surface and rear face of the work W, so that it is prepared for next rear face alignment, and an unexposed work is carried to the carry-in position and the work whose both surfaces are aligned is carried out from the carry-out position.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a double-side exposure apparatus that uses a printed circuit board as a work and exposes the front and back surfaces of the work with an exposure machine.

[0002]

2. Description of the Related Art In an exposure apparatus having two exposure units opposed to each other, each of the exposure units can independently expose both the front and back surfaces of a printed circuit board (hereinafter also referred to as a work). In this type of exposure machine, it is difficult to directly load the work from the transfer line, or if the work is directly transferred, the tact time cannot be reduced. Therefore, in general, the transfer line of the work and the processing position of the work (here, (Offset position) is shifted off-line. In other words, the work is temporarily removed from the work transfer line, loaded into the exposing machine, and subjected to both-sided exposure, and then returned to the transfer line again.

FIG. 7 shows an example of such a double-sided exposure apparatus for a printed circuit board. This exposure machine A
Has two exposure units B facing left and right in the figure.
Each exposure unit B is provided with a light source C, a mask D, a shutter (not shown), and the like. That is, assuming that the work W is now conveyed from the left to the right in the figure, the surface is exposed in a state facing the exposure unit B on the left in the figure, and then in a state facing the exposure unit B on the right in the figure. The back surface is exposed. Further, the reference symbol E in the figure denotes the mask D and the work W
Is an imaging device used for positioning with the camera.

[0004] Reference numeral L shown in the figure is a transfer line of the work W by the roller conveyor, and the exposure position and the transfer line where the two exposure units B face each other are vertically off-line in this conventional example. . Reference symbol F in the drawing denotes a shuttle device that reciprocates between the transport line L of the work W and the exposure position in the exposure machine A.
A work chuck G for holding the work W by suction or the like is provided on the left and right surfaces in the drawing so as to hold each exposure surface of the work W in parallel with the mask D. In addition, reference numeral H in the drawing denotes a carry-in device that takes out an unexposed work W from the transport line L and attaches the work W to the work chuck G on the left side of the shuttle device F, and reference character J denotes a work chuck G from the right work chuck G in the drawing. Remove the work W that has been exposed on both sides,
This is an unloading device that returns to the transport line L. In addition, reference numeral K in the figure denotes a detaching device such as a suction method for removing the surface-exposed work W from the work chuck G on the left side of the shuttle device F in the drawing, and reference numeral M denotes a work chuck G on the right side of the shuttle device F in the drawing. This is a mounting device such as a suction system for mounting a workpiece W having a surface exposed. The work W whose surface has been exposed is transferred from the removing device K to the mounting device M.

[0005]

The one-cycle process from the exposure of the front surface of the work to the exposure of the front surface of the next work or the exposure of the back surface of the work to the exposure of the back surface of the next work by the conventional double-side exposure apparatus is described. It is shown in Table 1. Here, the numerical value in the upper column in the table indicates time, and the unit is seconds. In the table, the area called "alignment / exposure" is shown.
This does not include the exposure time. The exposure time varies depending on the individual exposure conditions.
The exposure is performed near the end of the area indicated by “exposure” (for example, one second before the end), and the actual cycle takes an extra time (for example, one second) for this exposure. In addition, other operations performed at the same time are added as the waiting time. During this one cycle, one unexposed work is carried into the exposure apparatus, and one double-exposed work is carried out from the exposure apparatus. That is, the shorter the time required for one cycle, the higher the production efficiency.
The front shuttle and the rear shuttle in the table indicate the two work chucks G of the integrated shuttle device F.

[0006]

[Table 1]

In Table 1, as shown in FIG. 7, a workpiece W is placed above a loading device H and a shuttle device F
The work W is mounted on the work chuck G on the left side of the drawing, the mounting device M holds the work W, and the unloading device J starts removing the work W. That is, first, the entire shuttle device F is raised, and then alignment (positioning of the work W and the mask D) and exposure are performed in the surface exposure portion, and at the same time, the mounting device M causes the shuttle device F to move to the work chuck G of the shuttle device F. The work W is mounted, and after the work W is completed, alignment and exposure are performed by the back surface exposure unit. Work W whose surface exposure has been completed
Is removed from the work chuck G by the removal device K, and the shuttle device F is lowered in a state where only the work W whose back surface exposure has been completed is mounted. From the shuttle device F that has completed the lowering, the work W whose back surface has been exposed (the surface exposure has also been completed) is removed by the unloading device J, and is discharged (unloaded) onto the roller conveyor of the unloading line L. During this time, a new work W is mounted (loaded) on the work chuck G of the shuttle device F by the loading device H, and at the same time, the surface-exposed work W is transferred from the removal device K to the mounting device M.

As described above, in the conventional double-sided exposure apparatus, the loading and unloading of the work, the delivery of the work with the surface exposed, and the like must be performed in a serial state on a time axis, that is, in a serial state. There is a problem that time is long and work efficiency is low. The present invention has been developed in view of these problems, and an object of the present invention is to provide a double-side exposure apparatus capable of shortening the processing time required for one cycle of the process and improving the working efficiency. Things.

[0009]

In order to achieve the above object, a double-side exposure apparatus according to the present invention comprises a printed circuit board as a work, and an exposure section for exposing both front and back surfaces thereof, and each of the exposure sections This is a double-sided exposure device equipped with an exposure device that can independently expose each of the front and back surfaces of the work, off-line of the work transfer line, and positions the work to be loaded from the transfer line and unloads the work to the transfer line. At least the position, the position where one of the surfaces of the work is exposed by any one of the exposure units of the exposure machine, and the position where any one of the surfaces of the work is exposed by the other one of the exposure units of the exposure machine. A shuttle device having work chucks is provided at four locations.

The shuttle device may further include a work chuck at a position where the work is carried in from a transfer line, a work chuck at a position where one of the surfaces of the work is exposed by any one of the exposure units of an exposure machine, and a work chuck. And a work chuck at a position where the workpiece is unloaded to the transport line and a work chuck where the other surface of the work is exposed at one of the other exposure units of the exposure machine, are rotated to each other. You may.

In this case, the work chuck at the position where the exposure is performed in one of the exposure units of the exposure machine exposes one surface of the unexposed work, and the exposure is performed in the other exposure unit of the exposure machine. In the position of the work chuck, one of the surfaces exposes the other surface of the exposed work, and the position of the work chuck for loading the work and the position of the work chuck for unloading the work include loading and unloading of the unexposed work. It is preferable to move the one-sided exposed work from the carry-in position to the carry-out position, and carry out the double-sided exposed work.

The shuttle device may be reciprocatingly provided with an exposing device symmetrically on both sides of the transport line. In this case, the work chuck at the position to be exposed at any one of the exposure units of the two exposure machines exposes one surface of the unexposed work and the work at the position to be exposed at the other exposure unit. In the chuck, one of the surfaces exposes the other surface of the exposed work, and the work chuck at the position where the work is loaded and the work chuck at the position where the work is unloaded are loaded with the unexposed work and one surface is exposed. It is preferable to move the exposed work from the carry-in position to the carry-out position and carry out the double-sided exposed work.

[0013]

Embodiments of the present invention will be described below with reference to the drawings. FIGS. 1 and 2 show a first embodiment of a double-sided exposure apparatus according to the present invention, in which only main constituent members of the apparatus are simplified. Exposure machine 1 in the figure
Has two exposure units 2a and 2b facing each other, similarly to the existing one, and each of the exposure units 2a and 2b is also provided with a shutter, an optical system for making light of uniform brightness, and the like. A light source 3, a mask 4, an imager E used for alignment between the mask 4 and the work W, a mask positioning device (not shown), and the like are provided. In this embodiment, the front surface of the printed circuit board (work) W is exposed by the exposure unit 2a on the left side in the drawing, and the back surface of the work W is exposed by the exposure unit 2b on the right side in the drawing. Accordingly, the exposure position by the exposure unit 2a on the left side in the drawing is the surface exposure position, the exposure unit 2a is the exposure unit 2a for the surface, and the exposure unit 2b on the right side in the back.
Is also referred to as a backside exposure position, and its exposed portion 2b is also referred to as a backside exposed portion 2b. In the processing step, the surface of the unexposed work W is exposed first by the front surface exposure unit 2a, and the back surface of the work W after the front exposure is exposed by the back surface exposure unit 2b.

On the other hand, the carry-in conveyor 5 such as a belt conveyor constituting the transfer line and the carry-out conveyor 6 are displaced from the exposure positions of the respective exposure units 2a and 2b of the exposure machine 1 as in the conventional case. It is in a so-called offline state. The left end in the illustrated left side of the carry-in conveyor 5 corresponds to the carry-in position of the work W, and the right front end in the illustrated direction of the carry-out conveyor 6 corresponds to the carry-out position of the work W.

In the present embodiment, the position of the work W between the position at which the work W is loaded and the position of the front exposure by the front exposure unit 2a, and the position of the back exposure by the back exposure unit 2b.
1 is provided with a rectangular shuttle device 8a, 8b which is rotatable about a rotating shaft 7 independently by a driving device (not shown) in a direction indicated by an arrow aa in FIG. . In this embodiment, the rectangular shuttle device 8
The stop position is a position where the long sides of the a and 8b are horizontal. When the shuttle devices 8a and 8b are stopped at the stop position, the carry-in position and two exposure positions at both ends in the long side direction of the shuttle devices 8a and 8b. A work chuck 9 is provided at each of the position and the carry-out position. Each of these work chucks 9 is of the suction type, and substantially each shuttle device 8
a, 8b are provided on surfaces facing the carry-in position, the two exposure positions, and the carry-out position, which correspond to ends of the long sides in the long side direction. Therefore, the shuttle device 8a on the right side in the drawing is for supplying the unexposed work W to the surface exposure position of the front exposure unit 2a and taking out the surface exposed work W. Also referred to as a shuttle device 8a. Similarly, the shuttle device 8b on the left rear side in the figure is for supplying the work W with the front surface exposed to the back surface exposure position of the back surface exposure unit 2b, and for taking out the work W with the front and back surface exposed. , The back surface shuttle device 8b.

A loading / unloading device 10 is provided at a loading position where the workpiece W is loaded from the loading conveyor 5. The loading / unloading device 10 removes a loading device 11 that attaches the unexposed work W to the work chuck 9 of the surface shuttle device 8a and a work W whose surface has been exposed and that is attached to the work chuck 9. And a detaching device 12 for delivering the same to a mounting device described later. Among these, the loading device 11 includes a work chuck 13 such as a suction method that takes out and holds the unexposed work W on the loading conveyor 5 and a cylinder that moves the work chuck 13 in a direction perpendicular to the front and back surfaces of the work W. 14 is provided. The detaching device 12 includes a work chuck 15 of a suction type or the like that picks up and holds a surface-exposed work W attached to the work chuck 9 of the front surface shuttle device 8a and a work W And a cylinder 16 that moves forward and backward in the orthogonal direction. The cylinder 1 of the loading device 11
4 and an arm 16a extending to the cylinder 16 of the removing device 12 are rotatably connected by pins 17 so that the loading device 11 can be vertically moved by a driving device (not shown). Arrow bb in FIG.
It is made to rotate in the direction. Further, the entire loading / unloading device 10 is moved vertically by a driving device (not shown), that is, in the direction of arrow c-c in FIG.

An unloading / mounting device 18 is provided at the unloading position where the work W is unloaded to the unloading conveyor 6. The unloading / mounting device 18 is provided with the removal device 12.
And a mounting device 19 for mounting the work W on the front surface exposed to the work chuck 9 of the back surface shuttle device 8b, and the back surface exposed to the work chuck 9 (actually, the front and back surfaces are also exposed). Work W
And an unloading device 20 for unloading the unloading device onto the unloading conveyor 6 and unloading it. Among them, the mounting device 1
Reference numeral 9 denotes a work chuck 21 such as a suction method for receiving and holding the surface-exposed work W held by the removal device 12 and a cylinder 22 for moving the work chuck 21 in a direction perpendicular to the front and back surfaces of the work W. And Further, the unloading device 20 includes a work chuck 23 of a suction type or the like that picks up and holds a work W that has been exposed to the front and back surfaces and is attached to the work chuck 9 of the back surface shuttle device 8b. It has a front and back surface of W and a cylinder 24 that moves forward and backward in the orthogonal direction. The cylinder 22 of the mounting device 19
The arm 22a extending to the unloading device 20 and the arm 24a extending to the cylinder 24 of the unloading device 20 are rotatably connected by pins 25, so that the unloading device 20 is moved up and down by a driving device (not shown). It is designed to be rotated in a direction symmetrical to the loading / unloading device 10. Further, the entire carrying-out / mounting device 18 is moved vertically by a driving device (not shown), that is, in the same direction as the carrying-in / dismounting device 10.

Next, the operation of this embodiment will be described. Table 2 shows a timing chart of a one-cycle exposure step by the double-sided exposure apparatus, and FIG. 3 shows a specific operation of each step. It should be noted that in FIG.
c, e, and g are plan views, and b, d, f, and h are front views. For each process, b, a, b, c, d, and e,
f and the division diagrams g and h correspond to each other.

[0019]

[Table 2]

Table 2 shows that the loading / unloading device 10 and the loading / unloading device 18 are raised as shown in FIGS.
In the front surface shuttle device 8a, the surface-exposed work W is attached to the work chuck 9 at the front exposure position, and the unexposed work W is attached to the work chuck 9 at the carry-in position. The figure shows a case where the operation is started from a state where the work W whose surface has been exposed is attached to the work chuck 9 at the back exposure position. In addition,
The operation of aligning (aligning) the mask 4 with the workpiece W by the back surface exposure unit 2b has already been started and is continued. Also, the mounting device 19 of the carrying-out / mounting device 18
The work chuck 21 of which the surface exposure has been delivered from the removal device 12 of the carry-in / removal device 10 is held, and the work chuck 15 of the removal device 12 is empty. The work chuck 23 of the unloading device 20 from which the unloading / mounting device 18 hangs holds the double-sided exposed work W removed from the work chuck 9 at the unloading position of the back surface shuttle device 8b. The work chuck 9 at the carry-out position is empty. In addition, the work chuck 13 of the loading device 11 hanging down from the loading / unloading device 10 is empty, and the next unexposed work W is waiting at the loading position of the loading conveyor 5.

From this state, as shown in FIGS.
While rotating the loading device 11 and the loading device 20 upward, the loading / unloading device 10 and the loading / unloading device 1
8 descend. During this time, the positioning (alignment) of the mask 4 with respect to the surface-exposed work W of the work chuck 9 at the back surface exposure position is continued or completed in the back surface exposure unit 2b (in the table, alignment / alignment).
exposure). Further, only the front surface shuttle device 8a is turned to rotate the two work chucks 9. As a result, the surface-exposed work W is moved to the work chuck 9 at the carry-in position, and the unexposed work W is moved to the work chuck 9 at the surface exposure position.

The loading / unloading device 10 and the loading / unloading
When the mounting device 18 moves to the lower end, as shown in FIGS. 3C and 3D, the unloading device 20 extends the cylinder 24 so that the double-sided exposed work W held by the work chuck 23 is placed on the unloading conveyor 6. Pay out and carry out. The mounting device 19 also extends the cylinder 22, and mounts the surface-exposed work W held on the work chuck 21 to the work chuck 9 of the back surface shuttle device 8b at the carry-out position. On the other hand, the carry-in device 11 extends the cylinder 14 and receives the unexposed work W on the carry-in conveyor 5 to the work chuck 13. In addition, the removal device 12 is also used for the cylinder 1
6, the surface shuttle device 8a at the loading position
The work W whose surface has been exposed and held by the work chuck 9 is removed and held by the work chuck 15. In the meantime, during the back exposure position, the back exposure unit 2b
Is performed on the back surface of the work W whose surface has been exposed by
The process is completed before the next loading / unloading device 10 and unloading / mounting device 18 start to be lifted (for example, one second before). Simultaneously with the stop of the rotation of the surface shuttle device 8a, the positioning (alignment) of the mask 4 with respect to the unexposed work W by the surface exposure unit 2a is started and continued at the surface exposure position. When these series of steps are completed, the loading / unloading device 10 and the loading / unloading device 18 are raised as shown in Table 2. Further, the transport conveyor 6 is driven, and the placed double-sided exposed work W is discharged.

As the loading / unloading device 10 and the loading / unloading device 18 are raised, the loading device 11 and the loading device 20 are both rotated downward as shown in FIGS. At this time, the unexposed work W is held by the work chuck 13 of the loading device 11, and the work W whose surface has been exposed is held by the work chuck 15 of the removal device 12. The work chuck 21 of the mounting device 19 and the work chuck 23 of the unloading device 20 are empty. Simultaneously, the shuttle device 8b for the back surface on which the exposure is completed is turned,
The two work chucks 9 are rotationally moved. As a result, the work W having been exposed to the front surface is moved to the work chuck 9 at the back surface exposure position, and the work W having been subjected to both surface exposure is moved to the work chuck 9 at the unloading position.

Eventually, the loading / unloading device 10 and the loading / unloading device
When the mounting device 18 moves to the rising end, the loading device 11 extends the cylinder 14 to remove the unexposed work W held by the work chuck 13 as shown in FIGS.
It is attached to the work chuck 9 of the surface shuttle device 8a at the carry-in position, and the carry-in is completed. Then, the cylinder 14
3a and 3b as shown in FIG.
In addition, the removal device 12 attaches the cylinder 16 to the attachment device 1.
9 extends the cylinder 22 so that the work chucks 1
Work chuck 1 of removal device 12 approaching 5, 21
The work W having been subjected to the surface exposure held at 5 is delivered to the work chuck 21 of the mounting device 19. Then, by contracting each of the cylinders 16 and 19, the aforementioned FIGS.
State. The unloading device 20 also extends the cylinder 24, and the double-sided exposed work W held by the work chuck 9 of the back surface shuttle device 8b at the unloading position.
Is removed and held on the work chuck 23. Thereafter, by contracting the cylinder 24, the state shown in FIGS. In the meantime, at the surface exposure position, the surface exposure of the unexposed work W is performed by the surface exposure unit 2a, but the process is completed before the next carry-in / removal device 10 and carry-out / mounting device 18 starts to descend. Simultaneously with the stop of the rotation of the back surface shuttle device 8b, the positioning of the mask 4 with respect to the front surface exposed work W by the back surface exposure unit 2b is started and continued at the back surface exposure position. Further, the carry-in conveyor 5 is driven, and the next unexposed work W is moved to the carry-in position. Then, when these series of steps are completed, the procedure returns to the beginning of Table 2 and the loading / unloading device 1
The next cycle is started, which starts with lowering the 0 and unloading and mounting device 18 and pivoting the surface shuttle device 8a. Hereinafter, the above-described cycle is repeated.

As described above, in the double-side exposure apparatus of this embodiment, the shuttle devices 8a and 8b are rotated and moved between the carry-in position and the front-side exposure position, and the back-side exposure position and the carry-out position, respectively. Then, the front and back surfaces of the work W are respectively exposed, and the work chucks 9 of the shuttle devices 8a and 8b provided at the carry-in position and the carry-out position are used to carry in the unexposed work W and carry in the surface-exposed work W, respectively. Since the movement from the position to the unloading position and the unloading of the double-sided exposed work W can be performed independently, these steps and the exposing step can be performed in parallel on the time axis. As can be understood from the comparison, the required time for one cycle, that is, the processing time, can be greatly reduced as compared with the related art, and the working efficiency can be improved (in this example, 10 seconds).

In this embodiment, since it is not necessary to simultaneously perform the exposure of the front surface and the exposure of the back surface, for example, the light sources 3 of the two exposure units 2a and 2b can be shared, thereby saving space.
Cost reduction may be achieved. However, in that case, means for moving the light source 3 is required. Next, a second embodiment of the double-sided exposure apparatus of the present invention will be described with reference to FIG. The main configuration of this embodiment is the same as that of the first embodiment. The difference from the first embodiment is that the shuttle devices 8a and 8b of the first embodiment are independent for the front surface and the back surface, respectively. In contrast to the above, the shuttle chuck 8 is formed as an integral shuttle device 8 so that the work chucks 9 on both sides can be simultaneously rotated. Along with this, a relay shuttle 2 is located on the opposite side of the transport line from the exposure machine 1.
6 were provided.

As shown in FIG. 5, the relay shuttle 26 rotates a ball screw 28 by, for example, a step motor 27, restricts the rotation of a nut (not shown) screwed to the ball screw 28, and sets a screw acting on the nut. Is configured to move in a direction in which the support table 29 moves closer to or away from the transfer line,
A step motor 30 whose rotation axis is oriented vertically is mounted on the support base 29, and a cylinder 31 whose rod is oriented horizontally is attached to the tip of the rotation axis of the step motor 30.
A work chuck 32 of a suction type or the like is provided at the tip of the rod of the cylinder 31. Therefore, the relay shuttle 26 can rotate the work chuck 32 between the carry-in position and the carry-out position, and can move the work chuck 32 closer to or away from the removing device 12 and the mounting device 19, and It can be moved back and forth from the carry-in position and the carry-out position in a direction away from the exposure machine 1.

Next, the operation of this embodiment will be described. Table 3 shows a timing chart of an exposure process in one cycle by this double-sided exposure apparatus.

[0029]

[Table 3]

Table 3 shows that the loading / unloading device 10 is lifted,
The unloading / mounting device 18 is lowered, and of the shuttle device 8, the work W whose surface has been exposed is mounted on the work chuck 9 at the surface exposure position, and the unexposed work W is mounted on the work chuck 9 at the carry-in position. , The work W having been subjected to double-sided exposure is attached to the work chuck 9 at the back exposure position, and the work W having been exposed to the front surface is attached to the work chuck 9 at the carry-out position. ing. At this time, any of the exposure units 2
Exposure is completed also in a and 2b. In addition, the work chuck 13 of the loading device 11 and the work chuck 15 of the removal device 12 which the loading / unloading device 10 is hanging,
Work chuck 21 of mounting device 19 of mounting device 18
The work chuck 23 of the horizontal carry-out device 20 is empty. Also, the work W whose surface has been exposed is held by the work chuck 32 of the relay shuttle 26,
Waiting at a position off the transfer line. The next unexposed work W is waiting at the carry-in position of the carry-in conveyor 5. Note that when the relay shuttle 26 is at a position off the transport line, it is retracted, and when it is on the transport line, it is forward.

From this state, the entire loading / unloading device 10 is lowered while rotating the loading device 11 upward, and at the same time, the entire loading / unloading device 18 is raised while rotating the unloading device 20 downward. 8, the four work chucks 9 are simultaneously rotated and moved. As a result, the surface-exposed work W is moved to the work chuck 9 at the carry-in position, the unexposed work W is moved to the work chuck 9 at the front-surface exposure position, and the surface-exposed work W is moved to the work chuck 9 at the back-surface exposure position. The work W, which has been exposed on both sides, is moved to the work chuck 9 at the carry-out position.

Eventually, the loading / unloading device 10 and the loading / unloading device
When the mounting device 18 moves to the lower end and the upper end, respectively, the relay shuttle 26 moves forward above the carry-out position with the surface-exposed work W facing the work chuck 21 of the mounting device 19. In this state, the unloading device 20 extends the cylinder 24 to remove the double-sided exposed work W held by the work chuck 9 at the unloading position.
It is held on the work chuck 23. Also, the mounting device 19
The cylinder 22 is also extended to accept the surface-exposed work W held by the work chuck 32 of the relay shuttle 26 and hold the work W on the work chuck 21. on the other hand,
The carry-in device 11 extends the cylinder 14 and receives the unexposed work W on the carry-in conveyor 5 by the work chuck 13. Also, the removal device 12 extends the cylinder 16,
The surface-exposed work W of the work chuck 9 of the shuttle device 8 at the carry-in position is removed and held on the work chuck 15. At the same time as the shuttle device 8 stops turning,
At the front exposure position, positioning of the mask 4 with respect to the unexposed work W by the front exposure unit 2a is started, and at the back exposure position, positioning of the mask 4 with respect to the front exposed work W by the back exposure unit 2b is started. . When these series of steps are completed, the loading / unloading device 10 is raised and the loading / unloading device 18 is lowered as shown in Table 3. When the delivery of the surface-exposed work W to the mounting device 19 is completed, the relay shuttle 26 moves back to the off-line position.

The carry-in device 11 is rotated downward as the carry-in / remove device 10 is raised, and the carry-out device 20 is rotated upward as the carry-out / mounting device 18 is lowered. At this time, the unexposed work W is placed on the work chuck 13 of the loading device 11.
The work W whose surface has been exposed is held by the work chuck 15 of the removing device 12. The work chuck 21 of the mounting device 19 holds the work W whose surface has been exposed, and the work chuck 23 of the unloading device 20 holds the work W whose surface has been exposed on both sides.

Eventually, the loading / unloading device 10 and the loading / unloading device
When the mounting device 18 moves to the rising end and the falling end, respectively, the relay shuttle 26 moves the empty work chuck 32.
In a state facing the work chuck 15 of the removing device 12, it is advanced above the carry-in position. In this state, the carry-in device 11 extends the cylinder 14, attaches the unexposed work W held by the work chuck 13 to the work chuck 9 of the shuttle device 8 at the carry-in position, and completes carry-in. Also, the removal device 12 extends the cylinder 16,
The surface-exposed work W held by the work chuck 15 is delivered to the work chuck 32 of the relay shuttle 26. The mounting device 19 extends the cylinder 22,
The surface-exposed work W held by the work chuck 21 is attached to the work chuck 9 of the shuttle device 8 at the carry-out position. The unloading device 20 also extends the cylinder 24 to unload the double-sided exposed work W held by the work chuck 23 onto the unloading conveyor 6 and unload it.
When the delivery of the surface-exposed work W to the mounting device 19 is completed, the relay shuttle 26 retreats to the off-line position. Meanwhile, at both exposure positions, the front exposure of the unexposed work W by the front exposure unit 2a and the back exposure of the front exposed work W by the back exposure unit 2b are performed. It is completed by the start of lowering and the start of raising of the carry-out / mounting device 18. Thereafter, the transport conveyor 6 is driven, the placed work W having been exposed on both sides is discharged, and the carry-in conveyor 5 is driven to move the next unexposed work W to the carry-in position. When these series of steps are completed, 1
At the end of the cycle, go back to the beginning of Table 3
When the removal device 10 is lowered, the unloading / mounting device 1
Ascends 8.

As described above, in the double-side exposure apparatus of this embodiment, the shuttle device 8 is simultaneously rotated and moved between the carry-in position and the front-side exposure position, and the back-side exposure position and the carry-out position. Exposure of the front and back surfaces of W is performed at the same time, and the work chuck 9 of the shuttle device 8 and the work chuck 32 of the relay shuttle 26 provided at the carry-in position and the carry-out position are used to carry in the unexposed work W and to expose the front exposed work W From the carry-in position to the carry-out position, and the carry-out of the double-sided exposed work W can be performed independently.
These steps and the exposure step can be performed in parallel on the time axis, and the time required for one cycle, that is, the processing time can be reduced to the same level as in the first embodiment, and the working efficiency can be improved.

Next, a third embodiment of the double exposure apparatus according to the present invention will be described with reference to FIG. The main configuration of this embodiment is the same as that of the first embodiment. The difference from the first embodiment is that the revolving shuttle device 8a, 8b of the first embodiment is different from the reciprocating shuttle device 33.
a, 33b, and another exposure machine 1 is provided on the opposite side of the transport line. Work chucks 9 are provided at both ends of the reciprocating shuttle devices 33a and 33b, respectively. Among them, the work chuck 9 in the upper part of the drawing is the one of the exposing machine 1 in the upper part in the drawing. The work chuck 9 is moved back and forth between the front exposure position and the carry-in position and between the back exposure position and the carry-out position. And the carry-out position. Therefore, also in this case, the shuttle device 33a that reciprocates between the front exposure position and the carry-in position is the front shuttle device 33a, and the shuttle device 33b that reciprocates between the back exposure position and the unload position is the back shuttle device 33b.

Next, the operation of this embodiment will be described. Table 4 shows a timing chart of an exposure process in one cycle by this double-sided exposure apparatus.

[0038]

[Table 4]

Table 4 shows the loading / unloading device 10 and the loading / unloading device 10.
The case where the mounting device 18 is started from a raised state is shown. Hereinafter, as shown by the solid line in FIG. 6 in particular, the front surface shuttle device 33a exists between the carry-in position and the front surface exposure position of one of the exposing machines 1, and the back surface shuttle device 33b is connected to the one of the one exposing machine 1. A case in which the device exists between the back surface exposure position and the carry-out position will be described. In the front surface shuttle device 33a, a work W having been subjected to surface exposure is attached to the work chuck 9 at the surface exposure position of one of the exposing machines, and an unexposed work W is attached to the work chuck 9 at the carry-in position. One of the exposing devices 1 in the device 33b
The process starts from a state in which the work W whose surface has been exposed is attached to the work chuck 9 at the back surface exposure position. The alignment (alignment) of the mask 4 with respect to the work W by the back surface exposure unit 2b has already been started on the work W of the work chuck 9 at the back surface exposure position of one of the exposing machines 1 and has been continued. The work chuck 21 of the mounting device 19 of the carrying-out / mounting device 18 holds the surface-exposed work W delivered from the removing device 12 of the carrying-in / removing device 10, and the work chuck 15 of the removing device 12 is It is empty. The work chuck 23 of the unloading device 20 from which the unloading / mounting device 18 hangs holds the double-sided exposed work W removed from the work chuck 9 at the unloading position of the back surface shuttle device 33b. The work chuck 9 at the carry-out position is empty. Further, the loading / unloading device 10
The work chuck 13 of the carry-in device 11 which is hanging is empty, and the next unexposed work W is waiting at the carry-in position of the carry-in conveyor 5.

In this state, the entire loading / unloading device 10 and the unloading / mounting device 18 are lowered while rotating the loading device 11 and the unloading device 20 upward, and
In the back surface exposure section 2b of the one exposure machine 1, the front surface exposed work W of the work chuck 9 at the back surface exposure position.
Is continued or completed (alignment / exposure in the table). In addition, as the loading / unloading device 10 and the loading / unloading device 18 are lowered, only the surface shuttle device 33a is moved, and the two work chucks 9 are moved. As a result, the work W whose surface has been exposed is moved to the work chuck 9 at the carry-in position, and the unexposed work W is moved to the work chuck 9 at the surface exposure position of the other exposing machine 1.

Eventually, the loading / unloading device 10 and the loading / unloading device
When the mounting device 18 moves to the descending end, the unloading device 20 extends the cylinder 24, discharges the double-sided exposed work W held by the work chuck 23 onto the unloading conveyor 6 and unloads it. The mounting device 19 is also a cylinder 22
Is stretched, and the surface-exposed work W held by the work chuck 21 is attached to the work chuck 9 of the back surface shuttle device 33b at the carry-out position. On the other hand, the carry-in device 11 extends the cylinder 14 and receives the unexposed work W on the carry-in conveyor 5 to the work chuck 13. The removal device 12 also extends the cylinder 16 so that the work chuck 9 of the front surface shuttle device 33a at the carry-in position is located.
The work W having been exposed to the surface is removed from the work W and held on the work chuck 15. In the meantime, at the back surface exposure position of the one exposing machine 1, the back surface exposure of the front-surface exposed work W is performed by the back surface exposing unit 2b, and the next loading / unloading device 10 and unloading / mounting device 18 start rising. Complete by Simultaneously with the stop of the movement of the surface shuttle device 33a, the positioning of the mask 4 with respect to the unexposed work W by the surface exposure unit 2a is started at the surface exposure position of the other exposure machine 1. In addition, the conveyor 6
Is driven, and the placed double-sided exposed work W is discharged. When these series of steps are completed, as shown in Table 4, the loading / unloading device 10 and the loading / unloading device 1
Ascends 8.

As the loading / unloading device 10 and the loading / unloading device 18 rise, the loading device 11 and the loading device 2
Rotate 0 down together. At this time, the unexposed work W is placed on the work chuck 13 of the loading device 11, and the surface exposed work W is placed on the work chuck 15 of the removal device 12.
Is held. The work chuck 21 of the mounting device 19 and the work chuck 23 of the unloading device 20 are empty. At the same time, the shuttle device 33b for the back surface on which the exposure is completed is moved, and the two work chucks 9 are moved.
To move. As a result, the work W having been exposed to the front surface is placed on the work chuck 9 at the back exposure position of the other exposing machine 1, and the work W having undergone the double-side exposure is placed at the work chuck 9 at the unloading position.
Is moved.

Eventually, the loading / unloading device 10 and the loading / unloading device
When the mounting device 18 moves to the rising end, the loading device 11 extends the cylinder 14 to transfer the unexposed work W held by the work chuck 13 to the work chuck 9 of the surface shuttle device 33a at the loading position. Complete installation and loading. Further, the removing device 12 extends the cylinder 16 and the mounting device 19 extends the cylinder 22 so that the work chucks 15 and 21 approach each other, and the surface-exposed work W held by the work chuck 15 of the removing device 12 is moved. It is delivered to the work chuck 21 of the mounting device 19. Also,
The unloading device 20 also extends the cylinder 24, removes the double-sided exposed work W held by the work chuck 9 of the back surface shuttle device 33b at the unloading position, and holds the work W by the work chuck 23. In the meantime, at the surface exposure position of the other exposure machine 1, the surface exposure of the unexposed work W is performed by the surface exposure unit 2a until the next loading / unloading device 10 and unloading / mounting device 18 start to descend. To be completed. Simultaneously with the stop of the movement of the back surface shuttle device 33b, at the back surface exposure position of the other exposing machine 1, the mask 4 for the surface-exposed work W by the back surface exposure unit 2b.
Is started. Further, the carry-in conveyor 5 is driven, and the next unexposed work W is moved to the carry-in position. When these series of steps are completed, the process returns to the beginning of Table 4 and the next cycle is started.

However, at this time, the shuttle device 33a,
Reference numeral 33b denotes a position indicated by a two-dot chain line in FIG. 6, that is, a state in which the exposing machine 1 in which the work chuck 9 is opposed to the front and back surfaces is the "other exposing machine". Therefore, one from here
In the cycle, the direction of “movement” in Table 4 is opposite to that in the previous cycle, and the “surface exposure unit 2a” is “one exposure machine”.
The exposed portion 2a for the front surface of FIG.
"b" is different from the above-described one cycle in that it becomes the back surface exposure section 2b of the "other exposure machine". However, the work performed on the work and the required time do not change at all. When this cycle ends, the state returns to the state shown by the solid line in FIG. Hereinafter, the above two cycles are repeated.

As described above, in the double-sided exposure apparatus of this embodiment, the shuttle devices 33a and 33b reciprocate between the carry-in position and the front-side exposure position, and the back-side exposure position and the carry-out position, respectively.
The four exposure units 2a and 2b of the two exposure machines 1 respectively perform exposure of the front and back surfaces of the work W, and use the work chucks 9 of the shuttle devices 33a and 33b provided at the carry-in position and the carry-out position, respectively. It is possible to independently carry in the unexposed work W, move the surface-exposed work W from the carry-in position to the carry-out position, and carry out the double-sided exposed work W. It can be performed in parallel on the shaft, and the time required for one cycle can be reduced to the same extent as in the first and second embodiments, and the working efficiency can be improved.

The shuttle device which reciprocates as in the third embodiment may be integrated, but in this case, a relay shuttle as in the second embodiment is added, and the time chart for one cycle is as follows. It is based on Table 3.

[0047]

As is apparent from the above description, according to the double-sided exposure apparatus of the present invention, the exposure section of each exposure machine independently performs exposure of the front and back surfaces of the work, and performs the loading position and the unloading position. By using the work chuck of the shuttle device installed at the position, it is possible to independently carry in the unexposed work, move the surface-exposed work from the loading position to the unloading position, and unload the double-sided exposed work. These steps and the exposure step can be performed in parallel on the time axis, and the time required for one step, that is, the processing time can be shortened, and the working efficiency can be improved.

[Brief description of the drawings]

FIG. 1 is a perspective view showing a first embodiment of a double-sided exposure apparatus of the present invention.

FIG. 2 is a detailed explanatory view of the double-sided exposure apparatus of FIG. 1;
(A) is a plan view, (b) is a front view, (c) is a side view,
(D) is a rear view.

FIG. 3 is an operation explanatory view of the double-sided exposure apparatus of FIG. 1;

4A and 4B show a second embodiment of the double-sided exposure apparatus of the present invention, wherein FIG. 4A is a plan view and FIG. 4B is a front view.

5A and 5B are explanatory views of a relay shuttle used in the double-sided exposure apparatus of FIG. 4, wherein FIG. 5A is a plan view and FIG. 5B is a side view.

FIG. 6 is a plan view showing a third embodiment of the double-sided exposure apparatus of the present invention.

FIG. 7 is a front view showing a conventional double-sided exposure apparatus.

[Explanation of symbols]

 1 is an exposing machine 2a, 2b is an exposing unit 3 is a light source 4 is a mask 5 is a carry-in conveyor (transfer line) 6 is a carry-out conveyor (transfer line) 7 is a rotating shaft 8a, 8b, 8 is a rotary shuttle device 9 is a work chuck 10 is a loading / unloading device 11 is a loading device 12 is a removing device 18 is a loading / unloading device 19 is a mounting device 20 is a loading device 26 is a relay shuttle 32 is a work chuck 33a, 33b is a mobile shuttle device W is a work

Claims (1)

[Claims] 1. An exposure apparatus comprising a printed circuit board as a work, and exposing units for exposing both the front and back surfaces of the work, and exposing both the front and back surfaces of the work independently at each exposure unit.
A double-sided exposure apparatus provided offline for a work transfer line, wherein a position for loading a work from a transfer line, a position for unloading a work to a transfer line, and one of an exposure machine on one surface of the work. A shuttle device provided with a work chuck at at least four positions: a position to be exposed at the exposure unit, and a position to be exposed at any other surface of the exposure machine on any other surface of the work. Double-sided exposure device.