JP2001140064A - Target joined body for sputtering and producing method therefor - Google Patents

Target joined body for sputtering and producing method therefor

Info

Publication number
JP2001140064A
JP2001140064A JP35962499A JP35962499A JP2001140064A JP 2001140064 A JP2001140064 A JP 2001140064A JP 35962499 A JP35962499 A JP 35962499A JP 35962499 A JP35962499 A JP 35962499A JP 2001140064 A JP2001140064 A JP 2001140064A
Authority
JP
Japan
Prior art keywords
joined body
warpage
target material
target
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP35962499A
Other languages
Japanese (ja)
Other versions
JP3937085B2 (en
Inventor
Hideaki Suzuki
秀晃 鈴木
Takasane Shibayama
卓眞 柴山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kojundo Kagaku Kenkyusho KK
Original Assignee
Kojundo Kagaku Kenkyusho KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kojundo Kagaku Kenkyusho KK filed Critical Kojundo Kagaku Kenkyusho KK
Priority to JP35962499A priority Critical patent/JP3937085B2/en
Publication of JP2001140064A publication Critical patent/JP2001140064A/en
Application granted granted Critical
Publication of JP3937085B2 publication Critical patent/JP3937085B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To suppress the warpage of a joined body of a target material for sputtering and a backing plate material at the time of joining both materials, moreover to reduce the residual strain of the joined body generated by the application of mechanical stress to the joined body and to obtain the same joined body. SOLUTION: A joined body in which a brazing filler metal is interposed between a target material and a plate material is heated, thereafter, at the time of its cooling, the amount of warpage generated along with the cooling is discontinuously measured, and each time, reverse warpage offsetting the generated warpage is applied thereon.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、スパッタリングに
より基板上に薄膜を生成するためのターゲット材とバッ
キングプレート材の間にろう材を介して接合したスパッ
タリング用ターゲット接合体及びその製造方法に関する
ものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a target assembly for sputtering in which a brazing material is interposed between a target material for forming a thin film on a substrate by sputtering and a backing plate material, and a method of manufacturing the same. is there.

【0002】[0002]

【従来の技術】スパッタリング用ターゲット材(以下、
ターゲット材という)とターゲット材を機械的に補強す
る役割を果たすバッキングプレート材(以下、プレート
材という)を接合するときに、両材の接合体の反りを抑
制する従来の技術としては大別すると以下のように二種
類ある。すなわち、ダーゲット材とプレート材の接合体
(以下、接合体という)に発生する反りの発生を低減せ
しめ反りの矯正自体を省略する方法及び接合体に発生し
た反りを効率的な矯正によって低減する方法である。
2. Description of the Related Art A target material for sputtering (hereinafter, referred to as "target material").
When joining a backing plate material (hereinafter, referred to as a plate material) that plays a role of mechanically reinforcing the target material with a backing plate material, the conventional technology for suppressing the warpage of the joined body of the two materials can be roughly classified. There are two types as follows. That is, a method of reducing the occurrence of warpage occurring in a joined body of a target material and a plate material (hereinafter, referred to as a joined body) and omitting the warpage correction itself, and a method of reducing the warpage occurring in the joined body by efficient straightening It is.

【0003】前者の方法としては、例えば特開昭64−
62462号のように、ターゲット材とプレート材の間
にグラファイト製のサブバッキングプレートを介在さ
せ、かつサブバッキングプレートをクランプすることに
よって接合体の反りを防止するものがある。また、特開
平1−262088号には、ターゲット材とプレート材
を収縮率に合わせて加熱することによって接合体の反り
を防止する方法が開示されている。さらに、特開平2−
11759号には、ターゲット材とプレート材を加熱し
た後冷却するときに、プレート材を拘束する治具を使用
することによって接合体の反りを防止する方法が開示さ
れている。その他特開平5−25620号においては、
ターゲット材の接合面にメッキまたは蒸着の前処理を行
った上でターゲット材とプレート材の間に緩衝材を挿入
することによって接合体の反りを防止している。これら
のいずれの方法もターゲット材とプレート材が接合し冷
却されるときに熱膨張率の差によって生じる反りを通常
の接合方法に対して熱膨張率を相殺する手段を講ずるこ
とによって防止するものである。
The former method is disclosed in, for example,
As disclosed in Japanese Patent No. 62462, there is a structure in which a graphite sub-backing plate is interposed between a target material and a plate material, and the sub-backing plate is clamped to prevent warpage of the joined body. Further, Japanese Patent Application Laid-Open No. 1-262088 discloses a method for preventing warping of a joined body by heating a target material and a plate material in accordance with a shrinkage ratio. Further, Japanese Unexamined Patent Application Publication No.
No. 11759 discloses a method for preventing warpage of a joined body by using a jig for restraining a plate material when heating and cooling the target material and the plate material. In addition, in JP-A-5-25620,
Pre-treatment of plating or vapor deposition is performed on the bonding surface of the target material, and a buffer material is inserted between the target material and the plate material to prevent warpage of the bonded body. In any of these methods, the warpage caused by the difference in the coefficient of thermal expansion when the target material and the plate material are joined and cooled is prevented by taking measures to offset the coefficient of thermal expansion with respect to the ordinary joining method. is there.

【0004】一方、後者の方法としては、例えば特開平
5−214518号のように、接合されている接合体を
高融点ろう材の融点直下まで加熱し冷却することによっ
て矯正を可能とする方法が開示されている。また、特許
2573653号には、冷却過程において熱膨張率の差
から接合体に生ずる反りの方向と逆方向に反り量に応じ
た逆反りを与えて反りの矯正を効率的に行う方法が開示
されている。これらの方法は、ターゲット材とプレート
材の熱膨張率の差から生じる反りを効率的な矯正をする
ことによって低減する方法である。
[0004] On the other hand, as the latter method, for example, as disclosed in Japanese Patent Application Laid-Open No. 5-214518, a method in which a joined body is heated to just below the melting point of a high melting point brazing material and cooled to enable correction. It has been disclosed. Further, Japanese Patent No. 2573653 discloses a method for efficiently correcting a warp by giving a reverse warp in a direction opposite to a direction of a warp generated in a joined body from a difference in a coefficient of thermal expansion in a cooling process in accordance with a warp amount. ing. These methods are methods for reducing the warpage caused by the difference in the coefficient of thermal expansion between the target material and the plate material by performing an efficient correction.

【0005】[0005]

【発明が解決しようとする課題】上記の従来の技術には
以下のような問題点がある。すなわち、特開昭64−6
2462号及び特開平5−25620号のように、ター
ゲット材とプレート材の間に緩衝材を使用する方法は緩
衝材を使用することによって接合体の厚さが大きくなり
接合体の寸法設計の制約となるとともに、接合を二重に
行うために接合作業が煩雑になりやすい。また、特開平
1−262088号の場合には、ターゲット材とプレー
ト材の収縮率に合わせて加熱するとのことであるが、実
際にはターゲット材とプレート材を接合するときに接合
体の反り量に重要な影響を与えるろう材の収縮率も考慮
する必要があり適用に困難を伴う場合が多い。さらに、
特開平2−11759号の場合には、ターゲット材を接
合したプレート材を拘束する治具を使用するが、通常プ
レート材と治具を拘束するためにプレート材をスパッタ
リング装置に固定するネジ穴を使用するためプレート材
に適した治具をその都度用意する必要があり、そのため
製造コストが著しく増大する欠点がある。
The above prior art has the following problems. That is, JP-A-64-6
As described in Japanese Patent Application Laid-Open No. 2462 and JP-A-5-25620, the method of using a cushioning material between a target material and a plate material increases the thickness of the joined body due to the use of the cushioning material, and restricts the dimensional design of the joined body. In addition, the joining operation is complicated because the joining is performed twice. Also, in the case of Japanese Patent Application Laid-Open No. 1-262088, it is stated that heating is performed in accordance with the contraction rate of the target material and the plate material. It is also necessary to consider the shrinkage of the brazing material, which has an important effect on the application, and it is often difficult to apply. further,
In the case of JP-A-2-11759, a jig for restraining a plate material to which a target material is joined is used. Usually, a screw hole for fixing the plate material to a sputtering device to restrain the plate material and the jig is used. It is necessary to prepare a jig suitable for the plate material for use each time, so that there is a disadvantage that the manufacturing cost is significantly increased.

【0006】その他、特開平5−214518号につい
ては高融点ろう材には適用できるが、ターゲット材とプ
レート材を接合するときに一般的に使用される低融点ろ
う材には適用困難である欠点がある。また、特許257
3653号については、冷却過程において熱膨張率の差
から接合体に生ずる反り量を必要な精度をもって予測し
なければならず所定の反り矯正ができない場合が生ずる
とともに、その実施例からも明らかなように、接合のた
め加熱したのち冷却したときの反り量は3mmと反り量
が極めて大きく、そのためその反りを矯正する逆反りの
機械的応力も大きい必要があり、したがって接合体に発
生する残留歪が大きい欠点がある。
In addition, JP-A-5-214518 can be applied to a high melting point brazing material, but is difficult to apply to a low melting point brazing material generally used when joining a target material and a plate material. There is. Patent 257
With respect to No. 3653, the amount of warpage generated in the joined body must be predicted with a required accuracy from the difference in the coefficient of thermal expansion during the cooling process, and a predetermined warp correction cannot be performed. In addition, the amount of warpage when cooling after heating for joining is extremely large at 3 mm, so that the mechanical stress of the reverse warp for correcting the warp needs to be large, and therefore, the residual strain generated in the joined body is reduced. There are major drawbacks.

【0007】そこで、本発明においては、スパッタリン
グ用のターゲット材とバッキングプレート材を接合する
ときに両材の接合体の反りを抑制し、さらに接合体に機
械的な応力を加えることによって接合体に発生する残留
歪を低減することとそのような接合体を得ることを課題
としている。
Therefore, in the present invention, when the sputtering target material and the backing plate material are joined, the warpage of the joined body of the two members is suppressed, and further, a mechanical stress is applied to the joined body, so that the joined body is formed. It is an object to reduce generated residual strain and to obtain such a joined body.

【0008】[0008]

【課題を解決するための手段】本発明のターゲット材と
プレート材の接合体では、ターゲット材とプレート材の
間にろう材を介した接合体を加熱したのち、冷却すると
きに冷却とともに発生する反り量を断続的に測定し、そ
の都度、発生した反りを相殺する逆反りを加えることに
よって反りが抑制され、さらに接合体に逆反りの機械的
な応力を加えることによって接合体に発生する残留歪を
低減したターゲット材とプレート材が形成される。
SUMMARY OF THE INVENTION In the joined body of a target material and a plate material according to the present invention, after the joined body having a brazing material interposed between the target material and the plate material is heated, the cooling occurs when cooling. The amount of warpage is measured intermittently, and in each case, the warpage is suppressed by applying a reverse warp that cancels out the generated warpage, and furthermore, the residual generated in the bonded body by applying a mechanical stress of the reverse warp to the bonded body A target material and a plate material with reduced distortion are formed.

【0009】ターゲット材とプレート材の間にろう材を
介して接合した直後は、ろう材の融点との温度差が小さ
く接合体に発生する反りは小さい。すなわち、接合体の
反りは、ターゲット材とプレート材が物理的に接合し、
その反り量は両者の熱膨張量の差によって発生するから
である。したがって、この時点で接合体に逆反りをかけ
る必要はないが、その後に接合体に発生する反りを抑制
すべく接合体が水平になるように機械的な応力で保持し
ておいた方がよい。このときに逆反りをかけることは、
反りが発生していないため効果的でないことと接合体に
機械的な応力を与えるために接合体に無用な歪を与える
ために行うべきでない。
Immediately after the brazing material is joined between the target material and the plate material, the temperature difference from the melting point of the brazing material is small, and the warpage generated in the joined body is small. That is, the warpage of the joined body is such that the target material and the plate material are physically joined,
This is because the amount of warpage is caused by the difference in the amount of thermal expansion between the two. Therefore, it is not necessary to apply a reverse warp to the joined body at this time, but it is better to hold the joined body with mechanical stress so that the joined body is horizontal so as to suppress the warp occurring in the joined body thereafter. . At this time, applying a reverse warp
It should not be performed because it is not effective because no warpage has occurred and to give unnecessary strain to the joined body in order to apply mechanical stress to the joined body.

【0010】接合体を水平になるように暫時保持した後
には接合体に反りが発生する。その際には、接合体を水
平になるように保持していた機械的な応力を解放し発生
した反り量を測定し、その反り量を相殺する逆反りがか
かるように機械的な応力をかける。この場合、発生した
反り量より大きな又は小さな逆反りをかけることも考え
られる。
After temporarily holding the joined body so as to be horizontal, the joined body is warped. At that time, measure the amount of warpage that occurred by releasing the mechanical stress that held the joined body so that it was horizontal, and apply mechanical stress so that reverse warpage that offsets the amount of warpage was applied . In this case, it is conceivable to apply a reverse warpage larger or smaller than the generated warpage amount.

【0011】発生した反り量より大きな逆反り量をかけ
た場合は、その後に発生する反り量を低減できるが、接
合体に必要以上の機械的な応力をかけるためにその応力
に応じた歪が接合体にかかることになり、ターゲット材
の許容歪より大きな歪がかかった場合には、ターゲット
材が破壊に至る場合が生ずる。とくに、セラミックス製
ターゲット材の場合には許容歪が小さく注意を要する。
When a larger amount of warpage is applied than the amount of warpage generated, the amount of warpage generated thereafter can be reduced. However, since a mechanical stress more than necessary is applied to the joined body, a strain corresponding to the stress is reduced. If the target material is subjected to a strain larger than the allowable strain of the target material, the target material may be broken. In particular, in the case of a ceramic target material, the allowable distortion is small and attention is required.

【0012】また、発生した反り量より小さな逆反り量
をかけた場合は、相殺する逆反り量をかけた場合に比較
してターゲット材及びプレート材にかかる機械的な歪は
小さくなり、とくに許容歪の小さなターゲット材がその
限度を越えて破壊に至る可能性は小さくなるが、反面反
りの矯正量が小さくなり目的とする反り量が最終的に得
られなくなる可能性が生ずる。
Also, when a reverse warpage amount smaller than the generated warpage amount is applied, the mechanical strain applied to the target material and the plate material becomes smaller than when a counteracting reverse warpage amount is applied, and the tolerance is particularly large. Although the possibility that the target material having a small distortion exceeds the limit and causes the breakage is reduced, there is a possibility that the correction amount of the warpage becomes small and the desired warpage amount cannot be finally obtained.

【0013】さらに時間の経過後には接合体にはより大
きな反りが発生する。この場合にも接合体にかけていた
機械的な応力を解放した後、接合体の反り量を測定し、
その反り量を相殺する逆反りがかかるように機械的な応
力をかける。この場合にも相殺する逆反りに対して大ま
たは小の逆反り量をかけたときは、接合直後に同様に逆
反りをかけたときと同様な結果が生ずる。ただし、この
場合には接合直後より相対的に大きな反りが発生するた
め、発生した反り量に相殺する反り量より大きな逆反り
をかけたときは、ターゲット材により大きな歪が生ずる
ことになり、また発生した反り量に相殺する反り量より
小さな逆反りをかけたときは、接合体の最終的な反り量
が大きくなる可能性が生ずる。以後、断続的に必要に応
じて同様な作業の繰り返しを行い、最終的に接合体が常
温になるまで冷却する。
Further, after a lapse of time, a larger warp occurs in the joined body. Also in this case, after releasing the mechanical stress applied to the joined body, measure the amount of warpage of the joined body,
A mechanical stress is applied so that a reverse warp that offsets the warpage is applied. Also in this case, when a large or small amount of reverse warpage is applied to the canceling reverse warpage, the same result as when the same reverse warpage is applied immediately after joining is produced. However, in this case, since a relatively large warpage occurs immediately after joining, when a reverse warp larger than the amount of warpage offsetting the generated warpage is applied, a larger distortion is generated in the target material, and When a reverse warpage smaller than the warpage offsetting the generated warpage is applied, there is a possibility that the final warpage of the joined body increases. Thereafter, the same operation is intermittently repeated as necessary, and finally, the joined body is cooled until it reaches room temperature.

【0014】以上のように、本発明のターゲット材とプ
レート材の接合体では、ターゲット材とプレート材の間
にろう材を介した接合体を加熱したのち、冷却するとき
に冷却とともに発生する反り量を断続的に測定し、その
都度、発生した反りを相殺する逆反りを加えることによ
って反りが抑制され、さらに接合体に逆反りの機械的な
応力を加えることによって接合体に発生する残留歪を低
減したスパッタリング用ターゲット接合体が形成され
る。
As described above, in the joined body of the target material and the plate material according to the present invention, after the joined body with the brazing material interposed between the target material and the plate material is heated, the warpage generated upon cooling is accompanied by cooling. The amount is measured intermittently, and in each case, the warpage is suppressed by applying a reverse warp that cancels out the generated warpage, and the residual strain generated in the bonded body by applying a mechanical stress of the reverse warp to the bonded body Thus, a sputtering target joined body having a reduced value is formed.

【0015】[0015]

【発明の実施の形態】本発明の実施の形態を図面にした
がって説明する。図1は、接合直後の接合体の状況を示
す。上記したように、接合体にはほとんど反りが発生し
ない。図2は、接合体を暫時冷却したのちの接合体の状
況を示す。ターゲット材とプレート材が接合した温度、
すなわちろう材の融点からの温度差が大きくないため接
合体のそり量は大きくない。図3は、接合体を相当時間
冷却したのちの接合体の状況を示す。ターゲット材とプ
レート材の接合温度との差が大きいため接合体の反り量
は大きくなる。したがって、その反り量を相殺する逆反
り量も大きくなる。図4は、その反り量を相殺する逆反
りをかけた状況を示す。図5は、最終的に得られる接合
体の状況を示す。本発明になる製造作業の繰り返しによ
り反り量が小さく残留歪の小さな接合体を得ることがで
きる。
Embodiments of the present invention will be described with reference to the drawings. FIG. 1 shows the state of the joined body immediately after joining. As described above, the bonded body hardly warps. FIG. 2 shows the state of the joined body after the joined body has been temporarily cooled. The temperature at which the target material and plate material are joined,
That is, since the temperature difference from the melting point of the brazing material is not large, the warpage of the joined body is not large. FIG. 3 shows the state of the joined body after cooling the joined body for a considerable time. Since the difference between the joining temperature of the target material and the joining temperature of the plate material is large, the amount of warpage of the joined body increases. Therefore, the amount of reverse warpage that offsets the amount of warpage also increases. FIG. 4 shows a situation where a reverse warp is applied to offset the warp amount. FIG. 5 shows the situation of the finally obtained joined body. By repeating the manufacturing operation according to the present invention, a joined body having a small amount of warpage and a small residual strain can be obtained.

【0016】本発明において、ターゲット材はニッケ
ル、コバルトその他の金属、あるいはアルミナ、シリ
カ、カーボン、シリコンその他のセラミックスを使用で
き、プレート材は無酸素銅、ステンレス鋼その他の金属
を使用できる。ろう材は錫、インジウム、錫−鉛半田等
の金属及び金属の合金あるいは熱硬化性樹脂、導電性樹
脂等の樹脂を使用できる。
In the present invention, the target material can be nickel, cobalt or another metal, or alumina, silica, carbon, silicon or other ceramics, and the plate material can be oxygen-free copper, stainless steel or other metals. As the brazing material, metals such as tin, indium, and tin-lead solder, and alloys of the metals, or resins such as a thermosetting resin and a conductive resin can be used.

【0017】[0017]

【実施例】ターゲット材として125mm×425mm
×5mmtのアルミナ、プレート材としてターゲット材
と同一形状の無酸素銅及びろう材として錫−鉛半田を使
用した。ターゲット材とプレート材は予めヒータにより
加熱しておく。錫−鉛半田には通常共晶点の合金が使用
され、その融点は183℃である。したがって、ターゲ
ット材とプレート材はその融点又はそれ以上の温度に加
熱することによってターゲット材又はプレート材上で錫
−鉛半田を溶かすことができる。錫−鉛半田をターゲッ
ト材上に適量溶かした後、プレート材を載せ加熱を停止
してある時間が経過すると、ろう材が融点以下に達し固
化することによってターゲット材とプレート材が接着し
た状態となる。この接合体の下面の両端に水平になるよ
うに支点を置き接合体を保持する。錫−鉛半田が固化し
てからあまり時間が経過していないときは接合体はほぼ
水平となる。この状態で上方からターゲット材上面にプ
レスを保持することによって接合体全体を保持する。
[Example] 125 mm x 425 mm as target material
X5 mmt alumina, oxygen-free copper having the same shape as the target material as the plate material, and tin-lead solder as the brazing material were used. The target material and the plate material are previously heated by a heater. A eutectic alloy is usually used for the tin-lead solder, and its melting point is 183 ° C. Therefore, the tin-lead solder can be melted on the target material or the plate material by heating the target material and the plate material to the melting point or higher. After a suitable amount of tin-lead solder is melted on the target material, the plate material is placed and heating is stopped, and after a certain period of time, the brazing material reaches the melting point or below and solidifies, and the target material and the plate material adhere to each other. Become. A fulcrum is placed horizontally at both ends of the lower surface of the joined body to hold the joined body. When not much time has passed since the tin-lead solder has solidified, the joined body is substantially horizontal. In this state, the entire joined body is held by holding the press on the upper surface of the target material from above.

【0018】この状態で10分経過した時点で反り量は
0.2mmに達した。したがって、反り量の測定後、タ
ーゲット材上面にあるプレスにより0.2mmの逆反り
をかけた。さらに、5分経過した後に反り量を測定する
と0.3mmに達したので、プレスを利用することによ
って0.3mmの逆反りをかけた。さらに、5分経過し
た後に反り量を測定すると0.4mmに達したので、プ
レスを利用することによって0.4mmの逆反りをかけ
た。この10分後に反り測定を行ったところ反り量は
0.2mmになっていた。以上で逆反りをかける工程を
終了した。以上のように、本発明においては、接合体の
冷却過程で発生する反り量は特許2573653号に開
示されている反り量に比較し極めて小さい。したがっ
て、反りの矯正に必要な逆反り量も小さいので接合体に
残留する歪も極めて小さい。
When 10 minutes have passed in this state, the amount of warpage has reached 0.2 mm. Therefore, after measuring the amount of warpage, a reverse warp of 0.2 mm was applied by a press on the upper surface of the target material. Furthermore, when the amount of warpage was measured after elapse of 5 minutes, the warpage reached 0.3 mm. Therefore, a reverse warp of 0.3 mm was applied by using a press. Further, when the amount of warpage was measured after elapse of 5 minutes, the warpage reached 0.4 mm. Therefore, a reverse warp of 0.4 mm was applied by using a press. Ten minutes later, when the warpage was measured, the amount of warpage was 0.2 mm. Thus, the step of applying the reverse warp is completed. As described above, in the present invention, the amount of warpage generated in the process of cooling the joined body is extremely smaller than the amount of warpage disclosed in Japanese Patent No. 2573653. Therefore, since the amount of reverse warpage necessary for correcting the warp is small, the distortion remaining in the joined body is extremely small.

【0019】次に、この接合体をマグネトロンスパッタ
リング装置の装着部に装着し、スパッタした。出力6K
W、スパッタレイト30Å/sec、300KWHでス
パッタしたが、アルミナターゲット材に異常は観察され
なかった。
Next, the joined body was mounted on a mounting portion of a magnetron sputtering apparatus and sputtered. Output 6K
W was sputtered at a sputter rate of 30 ° / sec and 300 KWH, but no abnormality was observed in the alumina target material.

【0020】[0020]

【比較例】ターゲット、バッキングプレート、ろう材と
もに実施例と同一の材質、寸法のものを用い、実施例と
同一の製造方法により接合体を製造し、その反り量を測
定した結果、発生した反り量は3mmであり極めて大き
い反り量であった。この接合体に実施例と同一のプレス
を用いて3mmの逆反りを1回加えたのち、反り測定を
行ったところ反り量は0.5mmであった。次に、この
接合体を実施例と同一のスパッタリング装置、同一のス
パッタ条件でスパッタした結果、アルミナターゲットは
スパッタによる熱歪のため数条のクラックの発生が観察
された。この結果は、この接合体の方が本発明になる接
合体より接合体に残留する歪が大きいからであると考え
られる。
[Comparative example] A target, a backing plate, and a brazing filler metal were used with the same material and dimensions as those of the embodiment, and a joined body was manufactured by the same manufacturing method as that of the embodiment. The amount was 3 mm, which was an extremely large amount of warpage. After applying a reverse warp of 3 mm to the joined body once using the same press as in the example, the warpage was measured, and the amount of warp was 0.5 mm. Next, the joined body was sputtered under the same sputtering apparatus and under the same sputtering conditions as those of the example. As a result, several cracks were observed in the alumina target due to thermal distortion caused by sputtering. This result is considered to be due to the fact that this joint has a larger strain remaining in the joint than the joint according to the present invention.

【0021】[0021]

【発明の効果】本発明は、以上説明したようなものであ
るから、以下に記載されるような効果を奏する。本発明
の接合体では、最終的に発生する反り量を小さくするこ
とができる。また、反りを矯正するために必要な機械的
な応力が小さく接合体にかかる残留歪が小さいので、接
合体製造時にターゲット材を破壊することがない。さら
に、接合体にかける応力が小さいため接合体に残留する
歪も小さくなり、スパッタ時に加熱されることによって
ターゲット材表面に加算される熱歪がかかってもターゲ
ット材が破壊に至る可能性が少なくなる。
Since the present invention has been described above, it has the following effects. In the joined body of the present invention, the amount of warpage finally generated can be reduced. In addition, since the mechanical stress required to correct the warp is small and the residual strain applied to the joined body is small, the target material is not broken at the time of manufacturing the joined body. Furthermore, since the stress applied to the joined body is small, the strain remaining in the joined body is also small, and the possibility that the target material will be broken even if thermal strain added to the surface of the target material due to heating during sputtering is reduced. Become.

【図面の簡単な説明】[Brief description of the drawings]

【図1】接合直後の接合体の状況を示す図である。FIG. 1 is a diagram showing a state of a joined body immediately after joining.

【図2】接合体を暫時冷却したのちの接合体の状況を示
す図である。
FIG. 2 is a view showing a state of the joined body after the joined body has been temporarily cooled.

【図3】接合体を相当時間冷却したのちの接合体の状況
を示す図である。
FIG. 3 is a view showing a state of the joined body after the joined body has been cooled for a considerable time.

【図4】図3で発生した反り量を相殺する逆反りをかけ
た状況を示す図である。
FIG. 4 is a diagram illustrating a situation in which a reverse warpage is applied to cancel the warpage amount generated in FIG. 3;

【図5】最終的に得られた接合体の状況を示す図であ
る。
FIG. 5 is a view showing a situation of a finally obtained joined body.

【符号の説明】[Explanation of symbols]

1. ターゲット材 2. プレート材 3. ろう材 1. 1. Target material Plate material 3. Brazing material

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 スパッタリングターゲットのターゲット
材とバッキングプレート材の間にろう材を介した接合体
を加熱したのち、冷却するときに冷却とともに発生する
反りを断続的に測定し、その都度発生した反りを相殺す
る逆反りを加えて両材の接合体の反りを抑制するととも
に接合体に逆反りの機械的な応力を加えることによって
発生する接合体の残留歪を低減したことを特徴とするス
パッタリング用ターゲット接合体。
1. After heating a joined body between a target material of a sputtering target and a backing plate material with a brazing material interposed therebetween, when cooling, intermittently measuring the warpage generated with cooling, the warpage generated each time is measured. A sputtering method characterized by suppressing the warpage of the joined body of both materials by adding a reverse warp that cancels out and reducing the residual strain of the joined body caused by applying the mechanical stress of the reverse warp to the joined body. Target zygote.
【請求項2】 スパッタリングターゲットのターゲット
材とバッキングプレート材の間にろう材を介した接合体
を加熱したのち、冷却するときに冷却とともに発生する
反りを断続的に測定し、その都度発生した反りを相殺す
る逆反りを加えて両材の接合体の反りを抑制するととも
に接合体に逆反りの機械的な応力を加えることによって
発生する接合体の残留歪を低減することを特徴とするス
パッタリング用ターゲット接合体の製造方法。
2. After heating a joined body between a target material of a sputtering target and a backing plate material with a brazing material interposed therebetween, when cooling, the warpage generated with cooling is intermittently measured, and the warpage generated each time is measured. For the sputtering, characterized in that the warpage of the joined body of both materials is suppressed by adding a reverse warp that cancels, and the residual strain of the joined body generated by applying the mechanical stress of the reverse warp to the joined body is reduced. A method for manufacturing a target joined body.
JP35962499A 1999-11-12 1999-11-12 Method for producing sputtering target assembly Expired - Fee Related JP3937085B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP35962499A JP3937085B2 (en) 1999-11-12 1999-11-12 Method for producing sputtering target assembly

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35962499A JP3937085B2 (en) 1999-11-12 1999-11-12 Method for producing sputtering target assembly

Publications (2)

Publication Number Publication Date
JP2001140064A true JP2001140064A (en) 2001-05-22
JP3937085B2 JP3937085B2 (en) 2007-06-27

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ID=18465455

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Country Link
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014169473A (en) * 2013-03-01 2014-09-18 Tanaka Kikinzoku Kogyo Kk Warpage straightening method of sputtering target with backing plate
WO2015037546A1 (en) * 2013-09-12 2015-03-19 田中貴金属工業株式会社 Warp correction method for sputtering target with backing plate
CN111455335A (en) * 2020-04-24 2020-07-28 河北恒博新材料科技股份有限公司 Binding method of planar target material
JPWO2021100233A1 (en) * 2019-11-21 2021-11-25 三井金属鉱業株式会社 Sputtering target and its manufacturing method

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0211759A (en) * 1988-06-30 1990-01-16 Hitachi Metals Ltd Method of joying backing plate for target material
JPH02122071A (en) * 1988-10-28 1990-05-09 Tanaka Kikinzoku Kogyo Kk Manufacture of sputtering target
JPH05214518A (en) * 1992-02-04 1993-08-24 Hitachi Metals Ltd Method for straightening joined body of sputtering target and backing plate and sputtering target material
JPH0693424A (en) * 1992-07-27 1994-04-05 Mitsubishi Materials Corp Production of solder material and soldering material

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0211759A (en) * 1988-06-30 1990-01-16 Hitachi Metals Ltd Method of joying backing plate for target material
JPH02122071A (en) * 1988-10-28 1990-05-09 Tanaka Kikinzoku Kogyo Kk Manufacture of sputtering target
JPH05214518A (en) * 1992-02-04 1993-08-24 Hitachi Metals Ltd Method for straightening joined body of sputtering target and backing plate and sputtering target material
JPH0693424A (en) * 1992-07-27 1994-04-05 Mitsubishi Materials Corp Production of solder material and soldering material

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014169473A (en) * 2013-03-01 2014-09-18 Tanaka Kikinzoku Kogyo Kk Warpage straightening method of sputtering target with backing plate
WO2015037546A1 (en) * 2013-09-12 2015-03-19 田中貴金属工業株式会社 Warp correction method for sputtering target with backing plate
JPWO2015037546A1 (en) * 2013-09-12 2017-03-02 田中貴金属工業株式会社 Warping correction method for sputtering target with backing plate
JPWO2021100233A1 (en) * 2019-11-21 2021-11-25 三井金属鉱業株式会社 Sputtering target and its manufacturing method
CN111455335A (en) * 2020-04-24 2020-07-28 河北恒博新材料科技股份有限公司 Binding method of planar target material

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