JP2001127400A - Rack for surface treatment - Google Patents

Rack for surface treatment

Info

Publication number
JP2001127400A
JP2001127400A JP30545899A JP30545899A JP2001127400A JP 2001127400 A JP2001127400 A JP 2001127400A JP 30545899 A JP30545899 A JP 30545899A JP 30545899 A JP30545899 A JP 30545899A JP 2001127400 A JP2001127400 A JP 2001127400A
Authority
JP
Japan
Prior art keywords
bar
rack
outer box
substrate
surface treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30545899A
Other languages
Japanese (ja)
Inventor
Masami Negishi
正実 根岸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP30545899A priority Critical patent/JP2001127400A/en
Publication of JP2001127400A publication Critical patent/JP2001127400A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a rack with an improve property for preventing treatment irregularity due to the contact of a substrate. SOLUTION: The rack for surface treatment consists of a cage-type rack outer box, a bar that is provided at the upper and lower sides of the rack outer box for separating a substrate, a spring of a separation bar being provided between the upper-side and lower-side bars and being mounted to the upper-side and lower-side bars so that it can travel, a round rod for connecting both the springs, and a separation bar that is made of a disk-shaped pivot block with a longer diameter than that of the round rod being provided at the round rod at a fixed interval.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、プリント配線板の
製造工程に用いる表面処理ラックに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment rack used in a manufacturing process of a printed wiring board.

【0002】[0002]

【従来の技術】従来、両面プリント配線板は、銅張り積
層板に穴をあけ、穴内壁を金属化して、不要な銅箔をエ
ッチング除去して回路を形成し、製造されている。この
製造工程においては、穴内壁を金属化するときに、最初
に無電解めっきして、その上に電解めっきすることが行
われている。最初に無電解めっきするのは、銅張り積層
板にあけた穴の内壁は絶縁物であるため、電気が伝わら
ないので、電解めっきしても金属が析出しないので、め
っき触媒を付着させる無電解めっきを行っている。この
無電解めっきでは、単に、無電解めっき液に浸漬すれば
形成されるものではなく、その前に、無電解めっきに適
した表面状態にしなければならず、一般には、表面粗化
と呼ばれ、濃硫酸、クロム酸、アルカリ過マンガン酸塩
あるいはそれらの混酸のような強烈な酸性溶液で穴内壁
の樹脂表面を酸化し、凹凸を形成した後に、めっき用触
媒を付着させ、その触媒を核にしてめっき金属を析出さ
せている。酸性溶液を用いずに、アミド系、アルコール
系、ケトン系、エーテル系、エステル系などの溶媒を接
触させ、樹脂を膨潤して凹凸を形成する方法も知られて
いる。このように、穴内壁の絶縁性表面を粗化した後
に、無電解めっきの前処理と呼ばれる、プリディップ処
理、増感処理、密着促進処理などの処理を経て行われ
る。プリディップ処理は、絶縁製の表面の汚れと電気的
に接続する銅表面のさびなどを洗浄・除去する工程で、
専用の溶液に浸漬することによって行われ、増感処理
は、めっきを行う表面にパラジウムなどのめっき用触媒
を付着させるものであり、塩化パラジウムなどの化合物
を混入した溶液に浸漬し、溶液注に含まれる還元剤で金
属パラジウムに還元される。次の密着促進処理は、めっ
き液が濡れやすい状態にする処理で表面活性剤などを含
む溶液に浸漬処理される。このようにプリント配線板に
おいては、表面処理の工程が多く、しかも回路形成には
重要な工程が多い。
2. Description of the Related Art Conventionally, a double-sided printed wiring board has been manufactured by forming a circuit by drilling holes in a copper-clad laminate, metalizing the inner walls of the holes, and etching away unnecessary copper foil. In this manufacturing process, when the inner wall of the hole is metallized, electroless plating is first performed, and then electrolytic plating is performed thereon. First, electroless plating is carried out because the inner wall of the hole drilled in the copper-clad laminate is an insulator, so that electricity does not conduct, so the metal does not precipitate even if electrolytic plating is performed. We are plating. In this electroless plating, it is not simply formed by immersion in an electroless plating solution, but before that, the surface must be brought into a state suitable for electroless plating, and is generally called surface roughening. After oxidizing the resin surface of the inner wall of the hole with a strong acidic solution such as concentrated sulfuric acid, chromic acid, alkali permanganate or a mixed acid thereof to form irregularities, a plating catalyst is attached and the catalyst is nucleated. To deposit the plating metal. There is also known a method in which a solvent such as an amide-based, alcohol-based, ketone-based, ether-based, or ester-based solvent is contacted without using an acidic solution to swell the resin to form irregularities. As described above, after roughening the insulating surface of the inner wall of the hole, it is performed through a process such as a pre-dip process, a sensitizing process, and an adhesion promoting process which is called a pre-process of electroless plating. Pre-dip processing is a process of cleaning and removing rust on the copper surface that is electrically connected to the dirt on the insulating surface.
The sensitization treatment is performed by attaching a plating catalyst such as palladium to the surface to be plated, and immersed in a solution mixed with a compound such as palladium chloride. It is reduced to metallic palladium by the contained reducing agent. The next adhesion promoting treatment is a treatment for making the plating solution wet easily, and is immersed in a solution containing a surfactant or the like. As described above, in the printed wiring board, there are many steps for surface treatment, and many steps are important for circuit formation.

【0003】このような表面処理を行うためには、ラッ
クと呼ばれるカゴ状の箱の中に、処理される基板を複数
枚、基板同士が接触しないように、離して、なおかつ直
立させた状態に保って、各溶液を蓄えた槽に沈めて浸漬
処理している。このラックは、通常、カゴ状のラック外
箱と、そのラック外箱の内部の上辺と下辺に、基板を分
離するために設けられたバーによって構成されている。
In order to perform such a surface treatment, a plurality of substrates to be processed are placed in a cage-shaped box called a rack, separated from each other so as not to come into contact with each other, and placed in an upright state. While keeping it, it is immersed in a tank storing each solution. This rack is usually composed of a basket-shaped rack outer box and bars provided on the upper and lower sides of the rack outer box for separating substrates.

【0004】[0004]

【発明が解決しようとする課題】しかし、電子機器の発
達に伴って、回路基板も薄型・小型。軽量化されてきつ
つあり、基板の厚さが薄いものが増えているので、今ま
でのようなラックに基板を入れて処理を行おうとする
と、基板が自分自身の重みで曲がって、バーにかから
ず、隣の基板に接触してしまい、処理が十分に行われな
いことがあるという課題がある。
However, with the development of electronic devices, circuit boards have become thinner and smaller. As the weight is becoming lighter and the thickness of the board is becoming thinner, if you try to put the board in a rack like before and perform the processing, the board will bend under its own weight, However, there is a problem that the processing may not be performed sufficiently due to contact with an adjacent substrate.

【0005】本発明は、基板の接触による処理ムラの防
止に優れたラックを提供することを目的とする。
An object of the present invention is to provide a rack excellent in preventing processing unevenness due to contact of a substrate.

【0006】[0006]

【課題を解決するための手段】本発明の表面処理用ラッ
クは、カゴ状のラック外箱と、そのラック外箱の内部の
上辺と下辺に、基板を分離するために設けられたバー
と、上辺のバーと下辺のバーの間に設けられた分離バー
あって、上辺のバーと下辺のバーのそれぞれに移動可能
に取り付けられたバネと、その両方のバネを連結する丸
棒と、丸棒に一定の間隔で設けられたその丸棒より大き
い直径の円盤状のコマとからなる分離バーとを有するこ
とを特徴とする。
According to the present invention, there is provided a surface treatment rack comprising: a cage-shaped rack outer box; and bars provided on upper and lower sides of the rack outer box for separating substrates. There is a separation bar provided between the upper bar and the lower bar, a spring movably attached to each of the upper bar and the lower bar, a round bar connecting both springs, and a round bar. And a separation bar composed of a disc-shaped piece having a diameter larger than that of the round bar and provided at regular intervals.

【0007】[0007]

【発明の実施の形態】カゴ状のラック外箱1は、通常の
ラックに用いるものをそのまま用いることができ、導線
や鋼線に耐熱ビニルを被服したものあるいはゴム引きし
たもの、あるいは、剛性の高いプラスチックで構成した
ものなどを用いることができる。
BEST MODE FOR CARRYING OUT THE INVENTION A cage-shaped rack outer box 1 can be used as it is for a normal rack, and can be made of a wire or steel wire coated with heat-resistant vinyl, rubberized, or rigid. Those made of high plastic can be used.

【0008】そのラック外箱1の内部の上辺と下辺に、
基板を分離するために設けられたバー2は、ラック外箱
と同様に、通常のラックに用いるものをそのまま用いる
ことができ、導線や鋼線に耐熱ビニルを被服したものあ
るいはゴム引きしたもの、あるいは、剛性の高いプラス
チックで構成したものなどを用いることができる。
In the upper and lower sides of the rack outer box 1,
As the bar 2 provided for separating the substrate, the same as that used for the outer box of the rack, the one used for a normal rack can be used as it is, and a wire or steel wire coated with heat-resistant vinyl or rubberized, Alternatively, a member made of highly rigid plastic or the like can be used.

【0009】分離バーは、図1に示すように、上辺のバ
ーと下辺のバーのそれぞれに移動可能に取り付けられた
バネ7と、その両方のバネ7を連結する丸棒5と、丸棒
5に一定の間隔で設けられたその丸棒5より大きい直径
の円盤状のコマ6とからなるものである。このバネ7
は、バー2に移動可能に取り付けることが必要で、例え
ば、バネ7に連結されている丸棒5を緊張させた状態で
取り付け、バネ7は、バー2に架けるように取り付けれ
ばよい。こうすることによって、基板のうちの製品とな
らない箇所に分離バーを移動し、分離バーが接触して処
理されないでもかまわないようにすることができる。
As shown in FIG. 1, the separation bar includes a spring 7 movably attached to each of an upper bar and a lower bar, a round bar 5 connecting both springs 7, and a round bar 5. And a disc-shaped top 6 having a larger diameter than the round bar 5 provided at regular intervals. This spring 7
Need to be movably attached to the bar 2. For example, the bar 7 may be attached in a state where the round bar 5 connected to the spring 7 is tensioned. In this manner, the separation bar can be moved to a portion of the substrate that does not become a product, and the separation bar can be prevented from being contacted and processed.

【0010】丸棒5は、処理液に耐えるものであればど
のようなものでもよく、ステンレス、プラスチックなど
を用いることができ、その丸棒5に一定の間隔で設けら
れたその丸棒5より大きい直径の円盤状のコマ6は、丸
棒5と同じ素材であるか、あるいは、基板材料よりも柔
らかい塩化ビニルやポリプロピレンのような素材を用い
るのが、基板に傷を付けず好ましい。
The round bar 5 may be any material that can withstand the processing liquid, and may be made of stainless steel, plastic, or the like. The disk-shaped top 6 having a large diameter is preferably made of the same material as the round bar 5 or a material softer than the substrate material, such as vinyl chloride or polypropylene, without damaging the substrate.

【0011】[0011]

【発明の効果】以上に説明したとおり、本発明によっ
て、基板の接触による処理ムラの防止に優れたラックを
提供することができる。
As described above, according to the present invention, it is possible to provide a rack excellent in preventing processing unevenness due to contact of a substrate.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(a)は本発明の一実施例を示す正面及び側面
図であり、(b)はその側面図である。
FIG. 1A is a front view and a side view showing one embodiment of the present invention, and FIG. 1B is a side view thereof.

【符号の説明】[Explanation of symbols]

1.ラック外箱 2.バー 3.基板 5.丸棒 6.コマ 7.バネ 1. Rack outer box 2. Bar 3. Substrate 5. Round bar 6. Top 7 Spring

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】カゴ状のラック外箱と、そのラック外箱の
内部の上辺と下辺に、基板を分離するために設けられた
バーと、上辺のバーと下辺のバーの間に設けられた分離
バーあって、上辺のバーと下辺のバーのそれぞれに移動
可能に取り付けられたバネと、その両方のバネを連結す
る丸棒と、丸棒に一定の間隔で設けられたその丸棒より
大きい直径の円盤状のコマとからなる分離バーとを有す
る表面処理用ラック。
1. A basket-shaped rack outer box, bars provided on upper and lower sides of the rack outer box for separating substrates, and a bar provided between an upper bar and a lower bar. There is a separation bar, a spring movably attached to each of the upper bar and the lower bar, a round bar connecting both springs, and a larger bar than the round bar provided at regular intervals on the round bar. A surface treatment rack having a separation bar composed of a disc-shaped piece having a diameter.
JP30545899A 1999-10-27 1999-10-27 Rack for surface treatment Pending JP2001127400A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30545899A JP2001127400A (en) 1999-10-27 1999-10-27 Rack for surface treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30545899A JP2001127400A (en) 1999-10-27 1999-10-27 Rack for surface treatment

Publications (1)

Publication Number Publication Date
JP2001127400A true JP2001127400A (en) 2001-05-11

Family

ID=17945397

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30545899A Pending JP2001127400A (en) 1999-10-27 1999-10-27 Rack for surface treatment

Country Status (1)

Country Link
JP (1) JP2001127400A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102259495A (en) * 2010-05-31 2011-11-30 佳能株式会社 Liquid discharge head and ink jet recording apparatus including liquid discharge head

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102259495A (en) * 2010-05-31 2011-11-30 佳能株式会社 Liquid discharge head and ink jet recording apparatus including liquid discharge head
US8608276B2 (en) 2010-05-31 2013-12-17 Canon Kabushiki Kaisha Liquid discharge head and ink jet recording apparatus including liquid discharge head

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