JP2001117232A5 - - Google Patents
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- Publication number
- JP2001117232A5 JP2001117232A5 JP1999297145A JP29714599A JP2001117232A5 JP 2001117232 A5 JP2001117232 A5 JP 2001117232A5 JP 1999297145 A JP1999297145 A JP 1999297145A JP 29714599 A JP29714599 A JP 29714599A JP 2001117232 A5 JP2001117232 A5 JP 2001117232A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- alkyl group
- hydrogen atom
- divalent
- alkylene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000000217 alkyl group Chemical group 0.000 claims 7
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims 6
- 125000002947 alkylene group Chemical group 0.000 claims 5
- 239000002253 acid Substances 0.000 claims 4
- 125000001424 substituent group Chemical group 0.000 claims 4
- 125000003710 aryl alkyl group Chemical group 0.000 claims 3
- 125000003118 aryl group Chemical group 0.000 claims 3
- 125000000732 arylene group Chemical group 0.000 claims 3
- 125000004432 carbon atoms Chemical group C* 0.000 claims 3
- 125000006165 cyclic alkyl group Chemical group 0.000 claims 3
- 125000004185 ester group Chemical group 0.000 claims 3
- 125000001033 ether group Chemical group 0.000 claims 3
- 239000011347 resin Substances 0.000 claims 3
- 229920005989 resin Polymers 0.000 claims 3
- 125000003368 amide group Chemical group 0.000 claims 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 2
- 238000004090 dissolution Methods 0.000 claims 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 2
- 125000000101 thioether group Chemical group 0.000 claims 2
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- 125000000524 functional group Chemical group 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 125000005156 substituted alkylene group Chemical group 0.000 claims 1
- 125000000565 sulfonamide group Chemical group 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29714599A JP3934291B2 (ja) | 1999-10-19 | 1999-10-19 | 遠紫外線露光用ポジ型レジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29714599A JP3934291B2 (ja) | 1999-10-19 | 1999-10-19 | 遠紫外線露光用ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001117232A JP2001117232A (ja) | 2001-04-27 |
| JP2001117232A5 true JP2001117232A5 (US07494231-20090224-C00006.png) | 2005-07-14 |
| JP3934291B2 JP3934291B2 (ja) | 2007-06-20 |
Family
ID=17842795
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29714599A Expired - Lifetime JP3934291B2 (ja) | 1999-10-19 | 1999-10-19 | 遠紫外線露光用ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3934291B2 (US07494231-20090224-C00006.png) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003342306A (ja) * | 2002-03-18 | 2003-12-03 | Toray Ind Inc | レジスト用ポリマーの製造方法、およびポジ型感放射線性組成物 |
| JP4512340B2 (ja) * | 2003-10-20 | 2010-07-28 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| JP4693149B2 (ja) * | 2004-04-12 | 2011-06-01 | 三菱レイヨン株式会社 | レジスト用重合体 |
| US8476401B2 (en) | 2004-09-10 | 2013-07-02 | Mitsubishi Rayon Co., Ltd. | Resist polymer, process for production thereof, resist composition, and process for production of substrated with patterns thereon |
| JP4645153B2 (ja) * | 2004-10-27 | 2011-03-09 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| JP4513501B2 (ja) * | 2004-10-27 | 2010-07-28 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| JP4796811B2 (ja) * | 2005-09-22 | 2011-10-19 | 富士フイルム株式会社 | ポジ型レジスト組成物およびそれを用いたパターン形成方法 |
| US8735044B2 (en) | 2009-05-28 | 2014-05-27 | Sumitomo Chemical Company, Limited | Salt and photoresist composition containing the same |
-
1999
- 1999-10-19 JP JP29714599A patent/JP3934291B2/ja not_active Expired - Lifetime
