JP2001110798A5 - - Google Patents
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- JP2001110798A5 JP2001110798A5 JP1999283098A JP28309899A JP2001110798A5 JP 2001110798 A5 JP2001110798 A5 JP 2001110798A5 JP 1999283098 A JP1999283098 A JP 1999283098A JP 28309899 A JP28309899 A JP 28309899A JP 2001110798 A5 JP2001110798 A5 JP 2001110798A5
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28309899A JP2001110798A (ja) | 1999-10-04 | 1999-10-04 | プラズマｃｖｄ装置及び薄膜製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28309899A JP2001110798A (ja) | 1999-10-04 | 1999-10-04 | プラズマｃｖｄ装置及び薄膜製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001110798A JP2001110798A (ja) | 2001-04-20 |
| JP2001110798A5 true JP2001110798A5 (https=) | 2005-11-04 |
Family
ID=17661200
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28309899A Pending JP2001110798A (ja) | 1999-10-04 | 1999-10-04 | プラズマｃｖｄ装置及び薄膜製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001110798A (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7976673B2 (en) * | 2003-05-06 | 2011-07-12 | Lam Research Corporation | RF pulsing of a narrow gap capacitively coupled reactor |
| JP2007287890A (ja) * | 2006-04-14 | 2007-11-01 | Kochi Univ Of Technology | 絶縁膜の成膜方法、半導体装置の製法、プラズマｃｖｄ装置 |
| US9689068B2 (en) | 2014-05-16 | 2017-06-27 | Nanoedit, Llc | Deposition and patterning using emitted electrons |
| CN114203527A (zh) * | 2021-12-15 | 2022-03-18 | 浙江大学杭州国际科创中心 | 一种碳化硅晶片热氧化的方法及装置 |
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1999
- 1999-10-04 JP JP28309899A patent/JP2001110798A/ja active Pending