JP2001104807A - Method for recovering boron - Google Patents
Method for recovering boronInfo
- Publication number
- JP2001104807A JP2001104807A JP28707699A JP28707699A JP2001104807A JP 2001104807 A JP2001104807 A JP 2001104807A JP 28707699 A JP28707699 A JP 28707699A JP 28707699 A JP28707699 A JP 28707699A JP 2001104807 A JP2001104807 A JP 2001104807A
- Authority
- JP
- Japan
- Prior art keywords
- boron
- solution
- mineral acid
- resin
- adsorption tower
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、ホウ素含有水から
のホウ素の回収方法に係わり、詳しくはホウ素含有水を
処理してホウ素を吸着したホウ素選択性樹脂から溶離液
によりホウ素を脱離して得られる脱離液からホウ素を回
収し、且つ溶離液を再利用する方法に関する。[0001] The present invention relates to a method for recovering boron from boron-containing water, and more particularly to a method for removing boron from a boron-selective resin to which boron is adsorbed by treating the boron-containing water with an eluent. The present invention relates to a method for recovering boron from a desorbed solution obtained and reusing an eluent.
【０００２】[0002]
【従来の技術】ホウ素化合物は、メッキ、ガラス、医
薬、染料、合成繊維製造工程等で広く利用されており、
これらの製造工程からはホウ素含有水が排出される。従
来、これらの製造工程から排出されるホウ素含有水はホ
ウ素選択性樹脂によりホウ素を吸着処理していた。とこ
ろが、溶離液で吸着処理後のホウ素をホウ素選択性樹脂
から脱離させて得られる脱離液は、ホウ素選択性樹脂の
ホウ素吸着量が通常のイオン交換樹脂の吸着量に比して
かなり小さいために、その排出される脱離液のホウ素濃
度が比較的低く、さらには回収純度が低いこともあり回
収再利用されることは殆どなかった。その為、ホウ素選
択性樹脂からのホウ素の脱離液は濃縮して産業廃棄物と
して処理するか、或いはセメント等により固物化し埋め
立て処理する等の手段がとられている。2. Description of the Related Art Boron compounds are widely used in plating, glass, pharmaceuticals, dyes, synthetic fiber manufacturing processes, and the like.
Boron-containing water is discharged from these manufacturing steps. Conventionally, boron-containing water discharged from these manufacturing processes has been subjected to a boron adsorption treatment by a boron-selective resin. However, the desorbed solution obtained by desorbing boron from the boron-selective resin after the adsorption treatment with the eluent has a considerably smaller amount of boron-adsorbed boron-selective resin than that of a normal ion-exchange resin. Therefore, the boron concentration of the discharged desorbed liquid is relatively low, and further, the recovery purity is low. For this reason, the desorbed liquid of boron from the boron-selective resin is concentrated and treated as industrial waste, or solidified with cement or the like and landfilled.
【０００３】ホウ素はある濃度以上存在すると植物の生
長を阻害したり、また動物に対しても神経障害を起こす
おそれがあるため、より厳しい排水基準が設けられる傾
向にありホウ素含有排水に関しては効率良くホウ素を回
収・再利用し、公害間題を惹起しない処理方法が希求さ
れている。[0003] Boron, if present in a certain concentration or more, may inhibit plant growth or cause neurological damage to animals. Therefore, stricter drainage standards tend to be set, and boron-containing wastewater can be efficiently used. There is a need for a treatment method that recovers and reuses boron and does not cause pollution problems.
【０００４】[0004]
【発明が解決しようとする謀題】本発明者等は、ホウ素
含有排水から効率的に高純度のホウ素を分離・回収する
方法を提供することを目的とし、ホウ素化合物を使用す
る製造工程から排出されるホウ素を含有する排水のホウ
素選択性樹脂による処理方法について鋭意検討した結
果、ホウ素を吸着したホウ素選択性樹脂からホウ素を脱
離する際に得られるホウ素含有脱離液を、特定の方法で
処理すれば高純度のホウ素含有液を分離することが出
来、この分離したホウ素は製造工程で再利用出来るとの
知見を得、本発明に到達した。SUMMARY OF THE INVENTION An object of the present invention is to provide a method for efficiently separating and recovering high-purity boron from a boron-containing wastewater. As a result of intensive studies on the treatment method of the wastewater containing boron to be treated with the boron-selective resin, the boron-containing desorbing solution obtained when desorbing boron from the boron-selective resin that has adsorbed boron, by a specific method By the treatment, a high-purity boron-containing liquid can be separated, and it has been found that the separated boron can be reused in the production process, and the present invention has been achieved.
【０００５】[0005]
【課題を解決するための手段】本発明は、上記課題を解
決するためのものであり、その要旨は、ホウ素を吸着し
たホウ素選択性樹脂から溶離液として鉱酸溶液を用い、
吸着したホウ素を脱離させて得た脱離液を、ＯＨ形弱塩
基性陰イオン交換樹脂に通液してホウ素溶液と鉱酸溶液
とに分画し、分画した該ホウ素溶液を回収することより
なるホウ素の回収方法に存する。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and the gist of the present invention is to use a mineral acid solution as an eluent from a boron-selective resin to which boron is adsorbed.
The desorbed solution obtained by desorbing the adsorbed boron is passed through an OH-type weakly basic anion exchange resin to be fractionated into a boron solution and a mineral acid solution, and the fractionated boron solution is recovered. And a method for recovering boron.
【０００６】本発明方法の好適な態様としては、上記ホ
ウ素の回収方法において、分画した鉱酸溶液を溶離液と
してホウ素を吸着したホウ素選択性樹脂のホウ素の脱離
に再利用すること、鉱酸が硫酸であること、弱塩基性陰
イオン交換樹脂は、スチレン系架橋共重合体を母体とす
るポーラス型イオン交換樹脂であることを挙げることが
できる。As a preferred embodiment of the method of the present invention, in the above-mentioned method for recovering boron, the fractionated mineral acid solution is reused as an eluent for the elimination of boron from the boron-selective boron-adsorbing resin. The acid may be sulfuric acid, and the weakly basic anion exchange resin may be a porous ion exchange resin having a styrene-based crosslinked copolymer as a base.
【０００７】[0007]
【発明の実施の形態】次に本発明によるホウ素の回収方
法ついて図−１に従って更に詳細に説明する。図−１
は、本発明の実施態様を説明するための工程概略図であ
る。図中、１は原水槽、２はホウ素選択性樹脂が充填さ
れたホウ素吸着塔、３は弱塩基性陰イオン交換樹脂が充
填された酸吸着塔、４はホウ素溶液回収槽、５は鉱酸溶
液回収槽、６は処理水放流管である。DETAILED DESCRIPTION OF THE INVENTION Next, the method for recovering boron according to the present invention will be described in more detail with reference to FIG. Figure-1
FIG. 2 is a process schematic diagram for explaining an embodiment of the present invention. In the figure, 1 is a raw water tank, 2 is a boron adsorption tower filled with a boron selective resin, 3 is an acid adsorption tower filled with a weakly basic anion exchange resin, 4 is a boron solution recovery tank, and 5 is a mineral acid. A solution recovery tank 6 is a treated water discharge pipe.
【０００８】ホウ素選択性樹脂で処理されるホウ素含有
水は、各種の製造工程から排出されるもので、水中のホ
ウ素は、通常、ホウ酸又はホウ酸塩として含まれている
（尚、本明細書中、ホウ素はホウ酸及びホウ酸塩の総称
を意味する）。これらの製造工程から排出されるホウ素
含有水は、通常10〜200ppm程度のホウ素を含有してお
り、一且原水槽１に貯槽される。その際、ホウ素含有水
は予め濾過器等により水中に含まれる不溶解性の不純物
を除去しておくとよい。原水槽に貯槽されたホウ素含有
水はカセイソーダ等のアルカリ剤によりｐＨ４〜１０、
好ましくは７〜１０に調整される。ここでのｐＨ調整は
次工程でのホウ素選択性樹脂によるホウ素吸着を効果的
に行うためのものである。[0008] The boron-containing water treated with the boron-selective resin is discharged from various production steps, and the boron in the water is usually contained as boric acid or borate (see the present specification). In this document, boron means a generic term for boric acid and borate). The boron-containing water discharged from these manufacturing steps usually contains about 10 to 200 ppm of boron, and is stored in the raw water tank 1. At this time, the boron-containing water is preferably removed of insoluble impurities contained in the water in advance by a filter or the like. The boron-containing water stored in the raw water tank has a pH of 4 to 10 with an alkaline agent such as caustic soda.
Preferably, it is adjusted to 7 to 10. The pH adjustment here is for effectively performing the boron adsorption by the boron selective resin in the next step.
【０００９】ｐＨ調整されたホウ素含有水はホウ素選択
性樹脂が充填されたホウ素吸着塔２に通液せしめホウ素
の吸着除去を行う。その際、ｐＨ調整されたホウ素含有
水は、ホウ素吸着塔２に空間速度（ＳＶ）５〜１０ｈ-1
で供給されホウ素が樹脂に吸着除去される。ホウ素吸着
塔２に充填されるホウ素選択性樹脂はホウ素吸着能力を
有し、かつホウ素を選択的に吸着するイオン交換樹脂で
あれば特に限定されるものではないが、交換基としてＮ
−メチルグルカミン基を有するホウ素選択性樹脂が最も
好ましい。このＮ−メチルグルカミン基を有するホウ素
選択性樹脂としては、ダイヤイオン（登録商標：三菱化
学）ＣＲＢ０１、ＣＲＢ０２、アンバーライト（登録商
標：ローム＆ハース）ＩＲＡ７４３、デユオライト（登
録商標）ＥＳ−３７１、ユニセレック（登録商標）ＵＲ
−３５００等の市販品から適宜選ぶことができる。[0009] The pH-adjusted boron-containing water is passed through a boron adsorption tower 2 filled with a boron-selective resin to adsorb and remove boron. At that time, the pH-adjusted boron-containing water is supplied to the boron adsorption tower 2 at a space velocity (SV) of 5 to 10 h -1.
And boron is adsorbed and removed by the resin. The boron selective resin filled in the boron adsorption tower 2 is not particularly limited as long as it is an ion exchange resin having a boron adsorption ability and capable of selectively adsorbing boron.
Most preferred are boron-selective resins having -methylglucamine groups. Examples of the boron-selective resin having an N-methylglucamine group include Diaion (registered trademark: Mitsubishi Chemical) CRB01, CRB02, Amberlite (registered trademark: Rohm & Haas) IRA743, Deuolite (registered trademark) ES-371, Unicelec (registered trademark) UR
-3500 and the like.
【００１０】ホウ素吸着塔２から流出する処理水はホウ
素を含まないので処理水放流管６より放出する。その
際、必要に応じ、ホウ素吸着塔の流出液出口と処理水放
流管６との間にｐＨ調整槽を設けｐＨ調整後放流する。
また処理水に重金属等が含まれているおそれがある場合
には、さらにキレート樹脂による処理、或いはカセイソ
ーダ、消石灰等のアルカリ剤により金属水酸化物を形成
させて固液分離処理する等の後処理工程に付した後放流
するのが好ましい。Since the treated water flowing out of the boron adsorption tower 2 does not contain boron, it is discharged from the treated water discharge pipe 6. At that time, if necessary, a pH adjusting tank is provided between the effluent outlet of the boron adsorption tower and the treated water discharge pipe 6, and the water is discharged after pH adjustment.
If there is a possibility that the treated water may contain heavy metals, etc., post-treatment such as treatment with a chelating resin or solid-liquid separation treatment by forming a metal hydroxide with an alkaline agent such as caustic soda or slaked lime. It is preferable to discharge after the step.
【００１１】次に、ホウ素含有水の通液によりホウ素を
吸着して機能が低下したホウ素吸着塔２には硫酸、塩酸
等の鉱酸の溶離液を通液し吸着したホウ素を樹脂から脱
離する。その際の溶離液は濃度１〜１０ｗ／ｗ％の鉱酸
溶液であり、ホウ素吸着塔２には空間速度（ＳＶ）１〜
５ｈ-1で通液して脱離処理する。ホウ素の脱離処理した
後のホウ素吸着塔２にはカセイソーダ等のアルカリ溶液
を濃度２〜５ｗ／ｗ％、空間速度（ＳＶ）１〜５ｈ-1で
通液して樹脂を再生する。再生された樹脂を有するホウ
素吸着塔２はホウ素を吸着させるために再びホウ素含有
水の通液に供される。Next, the eluent of a mineral acid such as sulfuric acid or hydrochloric acid is passed through the boron adsorption tower 2 whose function has been reduced by adsorbing boron by passing boron-containing water, and the adsorbed boron is desorbed from the resin. I do. The eluent at that time is a mineral acid solution having a concentration of 1 to 10 w / w%, and the boron adsorption tower 2 has a space velocity (SV) of 1 to 10 w / w%.
The solution is passed through at 5 h -1 for desorption treatment. After the boron desorption treatment, an alkaline solution such as caustic soda is passed through the boron adsorption tower 2 at a concentration of 2 to 5 w / w% at a space velocity (SV) of 1 to 5 h -1 to regenerate the resin. The boron adsorption tower 2 having the regenerated resin is again supplied with boron-containing water to adsorb boron.
【００１２】一方、ホウ素吸着塔２から流出した脱離液
はホウ素と鉱酸との混合溶液である。この脱離液を、Ｏ
Ｈ形の弱塩基性陰イオン交換樹脂が充填された酸吸着塔
３に通液することにより、ホウ素溶液と鉱酸溶液とに分
画分離する。酸吸着塔３には脱離液を空間速度（ＳＶ）
１〜５ｈ-1で供給する。酸吸着塔３からは先ずホウ素溶
液が流出し、次いで鉱酸溶液が流出するのでそれぞれを
分画採取する。分画採取方法は酸吸着塔３の流出液出口
にｐＨ計を設置し流出液のｐＨを検知しながら行う。そ
の際ホウ素含有流出液のｐＨは６〜７であり、鉱酸含有
流出液のｐＨは１〜６である。On the other hand, the desorbed liquid flowing out of the boron adsorption tower 2 is a mixed solution of boron and a mineral acid. This desorbed liquid is
By passing the solution through an acid adsorption tower 3 filled with an H-form weakly basic anion exchange resin, the solution is fractionated and separated into a boron solution and a mineral acid solution. The desorbed liquid is supplied to the acid adsorption tower 3 at a space velocity (SV).
Supplied at 1-5 h -1 . From the acid adsorption tower 3, a boron solution first flows out, and then a mineral acid solution flows out. The fraction collection method is performed by installing a pH meter at the outlet of the effluent of the acid adsorption tower 3 and detecting the pH of the effluent. The pH of the boron-containing effluent is between 6 and 7, and the pH of the mineral acid-containing effluent is between 1 and 6.
【００１３】所定量の脱離液の通液により分画能力の低
下した酸吸着塔３の弱塩基性陰イオン交換樹脂は再生し
ＯＨ形にするのであるが、これらの樹脂をＯＨ形にする
再生条件及び再生方法は、鉱酸、アルカリを用いる従来
から行われている常法により行うことができる。酸吸着
塔３に充填される弱塩基性陰イオン交換樹脂としては、
ダイヤイオン（登録商標：三菱化学社）ＷＡ２１Ｊ、Ｗ
Ａ３０、アンバーライト（登録商標：ローム＆ハース
社）ＩＲＡ−９３、ダウエックス（登録商標：ダウ社）
６６、デュオライト（登録商標）Ａ３６８等の市販品か
ら適宜選ばれるが、これらの弱塩基性陰イオン交換樹脂
のうちスチレン系架橋共重合体を母体とするポーラス型
イオン交換樹脂が好ましい。The weakly basic anion exchange resin of the acid adsorption column 3 whose fractionation ability has been reduced by passing a predetermined amount of the desorbing liquid is regenerated to an OH form. Regeneration conditions and a regeneration method can be performed by a conventional method using a mineral acid and an alkali. Examples of the weakly basic anion exchange resin packed in the acid adsorption tower 3 include:
Diaion (registered trademark: Mitsubishi Chemical Corporation) WA21J, W
A30, Amberlite (registered trademark: Rohm & Haas) IRA-93, Dowex (registered trademark: Dow)
66, Duolite (registered trademark) A368, and the like, but are suitably selected from these, and among these weakly basic anion exchange resins, a porous ion exchange resin having a styrene-based crosslinked copolymer as a base is preferred.
【００１４】次いで、上記操作により分画採取されたホ
ウ素流出液をホウ素溶液回収槽に貯留し、また鉱酸流出
液は鉱酸溶液回収槽に貯留する。ホウ素流出液のホウ素
の純度は極めて高いので貯留されたホウ素溶液はそのま
ま、あるいは必要に応じ濃縮した後再利用することがで
きる。再利用は、ホウ素含有水の源由である製造工程に
戻しても良く、又別のプロセスで実施することも出来
る。一方、鉱酸溶液はホウ素吸着塔２のホウ素選択性樹
脂に吸着したホウ素の脱離に溶離液として再利用され
る。その際、鉱酸溶液はそのままでも使用できるが、適
度な酸濃度に調整するのが望ましく、ホウ素の脱離を効
果的に行うためには、回収した鉱酸溶液に濃厚な鉱酸を
加えるか、あるいは一部を濃縮して、少なくとも２ｗｔ
％程度に高濃度化した後再利用するのが効果的である。Next, the boron effluent fractionated and collected by the above operation is stored in a boron solution recovery tank, and the mineral acid effluent is stored in a mineral acid solution recovery tank. Since the purity of boron in the boron effluent is extremely high, the stored boron solution can be reused as it is or after being concentrated if necessary. Recycling can be returned to the manufacturing process that is the source of the boron-containing water, or can be performed in a separate process. On the other hand, the mineral acid solution is reused as an eluent for desorbing boron adsorbed on the boron selective resin of the boron adsorption tower 2. At this time, the mineral acid solution can be used as it is, but it is desirable to adjust the acid concentration to an appropriate level. To effectively remove boron, add a concentrated mineral acid to the recovered mineral acid solution. Or at least partially concentrated to at least 2wt
It is effective to re-use after increasing the concentration to about%.
【００１５】以上説明したように、本発明方法はホウ素
化合物を使用する製造工程から排出されるホウ素含有水
からホウ素を効率的、且つ高純度で回収・分離すること
ができ、そのまま製造工程での循環再使用を可能にする
クローズド化したプロセスを構築することができる。加
えて、ホウ素選択性樹脂からホウ素の脱離に使用する鉱
酸溶液も再循環使用する事が出来るので、本発明方法
は、経済的で、外部への廃棄物投棄による公害間題を生
起する恐れもない優れた方法である。As described above, the method of the present invention enables efficient and high-purity recovery and separation of boron from boron-containing water discharged from a production process using a boron compound. Closed processes can be built that allow for cyclical reuse. In addition, the mineral acid solution used to desorb boron from the boron-selective resin can be recycled, so that the method of the present invention is economical and creates pollution problems due to external waste dumping. It is an excellent method without fear.
【００１６】本発明を実施例により更に詳細に説明する
が、本発明はその要旨を越えない限りこれらの実施例に
よりなんら限定されるものではない。The present invention will be described in more detail by way of examples, which should not be construed as limiting the scope of the invention.
【００１７】実施例１ 合成繊維製造工程から排出される表−１に示す組成を有
するホウ素含有水を原水とし、この原水をカセイソーダ
により約ｐＨ８に調整した。内径３０ｍｍのガラス製カ
ラムに、カセイソーダ溶液の通液による再生済みのホウ
素選択性樹脂［ダイヤイオン（登録商標）ＣＲＢ−０
２］５００ｍ１を充填したホウ素吸着塔に、ｐＨ調整後
の原水を空間速度（ＳＶ）２．５ｈ-1で３５Ｌ(リットル)通
液し、ホウ素を吸着させた。ホウ素吸着塔からの流出水
の組成は表−１のようであった。Example 1 Boron-containing water having the composition shown in Table 1 discharged from the synthetic fiber production process was used as raw water, and the raw water was adjusted to about pH 8 with caustic soda. Boron-selective resin [Diaion (registered trademark) CRB-0] regenerated by passing a sodium hydroxide solution through a glass column having an inner diameter of 30 mm
2] 35 L (liter) of the pH-adjusted raw water was passed through a boron adsorption tower filled with 500 ml at a space velocity (SV) of 2.5 h -1 to adsorb boron. The composition of the effluent from the boron adsorption tower was as shown in Table 1.
【００１８】[0018]
【表１】 [Table 1]
【００１９】次いで、ホウ素を吸着したホウ素吸着塔
に、濃度２ｗ／ｗ％の硫酸溶液２，０００ｍ１を空間速
度（ＳＶ）２．５ｈ-1で通液し、ホウ素を脱離させてホ
ウ素含有脱離液を得た。内径９．６ｍｍのガラス製カラ
ムにＯＨ形の弱塩基性陰イオン交換樹脂［ダイヤイオン
（登録商標）ＷＡ２１Ｊ］２５ｍｌを充填した酸吸着塔
に、得られたホウ素含有脱離液の中の一部１，０００ｍ
１を空間速度（ＳＶ）２．０ｈ-1で通液した。その際、
酸吸着塔からの流出液のｐＨを測定しながらホウ素溶液
と硫酸溶液とに分画した。得られたホウ素溶液と硫酸溶
液の流出曲線を図−２に示す。回収したホウ素溶液と硫
酸溶液の量はそれぞれ８５０ｍｌと１００ｍ１であり、
ホウ素溶液のホウ酸濃度、純度及び回収率は表−２のよ
うであった。Next, 2,000 ml of a sulfuric acid solution having a concentration of 2 w / w% was passed through the boron adsorption tower adsorbing boron at a space velocity (SV) of 2.5 h -1 to desorb the boron and remove the boron-containing gas. Syneresis was obtained. A part of the obtained boron-containing desorption solution was placed in an acid adsorption tower in which a glass column having an inner diameter of 9.6 mm was filled with 25 ml of an OH form weakly basic anion exchange resin [Diaion (registered trademark) WA21J]. 1,000m
1 was passed at a space velocity (SV) of 2.0 h -1 . that time,
While measuring the pH of the effluent from the acid adsorption tower, it was fractionated into a boron solution and a sulfuric acid solution. The outflow curves of the obtained boron solution and sulfuric acid solution are shown in FIG. The amounts of the collected boron solution and sulfuric acid solution are 850 ml and 100 ml, respectively.
Table 2 shows the boric acid concentration, purity and recovery rate of the boron solution.
【００２０】[0020]
【表２】 [Table 2]
【００２１】実施例２ 実施例１で得られた硫酸溶液に濃硫酸を加えて濃度２ｗ
／ｗ％に調整した鉱酸溶液を１００ｍｌ用意した。実施
例ｌと同一の条件及び操作方法によりホウ素吸着塔のホ
ウ素選択性樹脂にホウ素を吸着させた。ついで、このホ
ウ素を吸着したホウ素吸着塔に、調整した鉱酸溶液を実
施例１と同一の条件で通液操作を行いホウ素溶液を回収
した。回収したホウ素溶液の組成は表−３のようであっ
た。Example 2 Concentrated sulfuric acid was added to the sulfuric acid solution obtained in Example 1 to give a concentration of 2 w
/ W% of a mineral acid solution adjusted to 100% was prepared. Boron was adsorbed on the boron selective resin of the boron adsorption tower under the same conditions and operating method as in Example 1. Next, the prepared mineral acid solution was passed through the boron adsorption tower having absorbed boron under the same conditions as in Example 1 to recover the boron solution. The composition of the recovered boron solution was as shown in Table-3.
【００２２】[0022]
【表３】 [Table 3]
【００２３】一方、本実施例で回収されたホウ素溶液
は、合成繊維製造工程で十分再利用可能であることが確
認された。また本実施例から明らかなように溶離液とし
ての硫酸溶液はホウ素吸着塔のホウ素の脱離に十分再利
用可能である。On the other hand, it was confirmed that the boron solution recovered in this example could be sufficiently reused in the synthetic fiber production process. Further, as is clear from this embodiment, the sulfuric acid solution as the eluent can be sufficiently reused for desorbing boron in the boron adsorption tower.
【００２４】[0024]
【発明の効果】本発明方法によれば、ホウ素化合物を使
用する製造工程から排出されるホウ素含有水からホウ素
を高い純度で効率的に回収・再利用できるので、ホウ素
はクローズド化され外部への投棄が回避されるので公害
間題を惹起することもない利点を有する。According to the method of the present invention, boron can be efficiently recovered and reused with high purity from boron-containing water discharged from a production process using a boron compound. This has the advantage that no dumping is avoided and no pollution problems are caused.
【図１】図−１は本発明の実施態様を説明するための工
程概略図である。FIG. 1 is a schematic process diagram for explaining an embodiment of the present invention.
【図２】図−２は酸吸着塔からのホウ素溶液と硫酸溶液
の流出状態の一例を示す流出曲線である。FIG. 2 is an outflow curve showing an example of an outflow state of a boron solution and a sulfuric acid solution from an acid adsorption tower.
１． 原水槽 ２． ホウ素吸着塔 ３． 酸吸着塔 ４． ホウ素溶液回収槽 ５． 鉱酸溶液回収槽 ６． 処理水放流管 ７． ホウ素溶液流出曲線 ８． 硫酸溶液流出曲線 ９． ホウ素溶液分画範囲 1. Raw water tank 2. 2. Boron adsorption tower Acid adsorption tower 4. 4. Boron solution recovery tank Mineral acid solution recovery tank 6. 6. Treated water discharge pipe 7. Boron solution outflow curve 8. Sulfuric acid solution outflow curve Boron solution fractionation range
フロントページの続き (72)発明者 栗原 一郎 神奈川県横浜市青葉区鴨志田町1000番地 日本錬水株式会社研究所内 (72)発明者 古田 裕一郎 岡山県岡山市海岸通１丁目２番１号 株式 会社クラレ内 (72)発明者 川上 竜司 岡山県岡山市海岸通１丁目２番１号 株式 会社クラレ内 (72)発明者 美甘 浩 岡山県岡山市海岸通１丁目２番１号 株式 会社クラレ内 Ｆターム(参考） 4D017 AA01 BA11 CA13 CA17 CB01 DA01 DB10 EB10 4F071 AA22 AA22C AA78 AA78C AH02 FB02 FC12 Continuing from the front page (72) Inventor Ichiro Kurihara 1000 Kamoshita-cho, Aoba-ku, Yokohama-shi, Kanagawa Prefecture Inside the Japan Refined Water Research Laboratory (72) Inventor Yuichiro Furuta 1-2-1, Kaigandori, Okayama-shi, Okayama Kuraray Co., Ltd. (72) Inventor Ryuji Kawakami 1-2-1, Kaigandori, Okayama City, Okayama Pref. Kuraray Co., Ltd. (72) Inventor Hiroshi Mika 1-2-1, Kaigandori, Okayama City, Okayama Pref. Reference) 4D017 AA01 BA11 CA13 CA17 CB01 DA01 DB10 EB10 4F071 AA22 AA22C AA78 AA78C AH02 FB02 FC12
Claims (4)
離液として鉱酸溶液を用い吸着したホウ素を脱離させて
得た脱離液を、ＯＨ形弱塩基性陰イオン交換樹脂に通液
してホウ素溶液と鉱酸溶液とに分画し、分画した該ホウ
素溶液を回収することを特徴とするホウ素の回収方法。1. A desorbing solution obtained by desorbing boron adsorbed from a boron-selective resin adsorbing boron using a mineral acid solution as an eluent is passed through an OH type weakly basic anion exchange resin. A boron solution and a mineral acid solution, and collecting the fractionated boron solution.
吸着したホウ素選択性樹脂のホウ素の脱離に再利用する
ことを特徴とする請求項１記載のホウ素の回収方法。2. The method for recovering boron according to claim 1, wherein the fractionated mineral acid solution is reused as an eluent for desorbing boron from the boron-selective resin to which boron has been adsorbed.
１又は２記載のホウ素の回収方法。3. The method for recovering boron according to claim 1, wherein the mineral acid is sulfuric acid.
架橋共重合体を母体とするポーラス型イオン交換樹脂で
あることを特徴とする請求項１〜３のいずれか一項記載
のホウ素の回収方法。4. The boron-based anion exchange resin according to claim 1, wherein the weakly basic anion exchange resin is a porous ion exchange resin having a styrenic crosslinked copolymer as a base. Collection method.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28707699A JP3913939B2 (en) | 1999-10-07 | 1999-10-07 | Boron recovery method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28707699A JP3913939B2 (en) | 1999-10-07 | 1999-10-07 | Boron recovery method |
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| Publication Number | Publication Date |
|---|---|
| JP2001104807A true JP2001104807A (en) | 2001-04-17 |
| JP3913939B2 JP3913939B2 (en) | 2007-05-09 |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001316108A (en) * | 2000-04-28 | 2001-11-13 | Nippon Denko Kk | Boron eluate refining equipment and refining method |
| JP2003010845A (en) * | 2001-07-05 | 2003-01-14 | Nippon Denko Kk | Method for recovering high purity boron solution and apparatus therefor |
| JP2003071457A (en) * | 2001-09-04 | 2003-03-11 | Maezawa Ind Inc | Method for recovering mineral acid from mixed acid of boric acid and mineral acid |
| JP2006326488A (en) * | 2005-05-26 | 2006-12-07 | Nippon Rensui Co Ltd | Method for recovering boron |
| JP2007275817A (en) * | 2006-04-10 | 2007-10-25 | Mitsubishi Electric Corp | Water treatment method |
| JP2015107454A (en) * | 2013-12-04 | 2015-06-11 | 栗田工業株式会社 | Method for recycling boron adsorbent |
| WO2017212625A1 (en) * | 2016-06-10 | 2017-12-14 | 日本電気硝子株式会社 | Method for producing glass fiber |
-
1999
- 1999-10-07 JP JP28707699A patent/JP3913939B2/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001316108A (en) * | 2000-04-28 | 2001-11-13 | Nippon Denko Kk | Boron eluate refining equipment and refining method |
| JP2003010845A (en) * | 2001-07-05 | 2003-01-14 | Nippon Denko Kk | Method for recovering high purity boron solution and apparatus therefor |
| JP4691276B2 (en) * | 2001-07-05 | 2011-06-01 | 日本電工株式会社 | Method and apparatus for recovering high purity boron-containing water |
| JP2003071457A (en) * | 2001-09-04 | 2003-03-11 | Maezawa Ind Inc | Method for recovering mineral acid from mixed acid of boric acid and mineral acid |
| JP2006326488A (en) * | 2005-05-26 | 2006-12-07 | Nippon Rensui Co Ltd | Method for recovering boron |
| JP2007275817A (en) * | 2006-04-10 | 2007-10-25 | Mitsubishi Electric Corp | Water treatment method |
| JP2015107454A (en) * | 2013-12-04 | 2015-06-11 | 栗田工業株式会社 | Method for recycling boron adsorbent |
| WO2017212625A1 (en) * | 2016-06-10 | 2017-12-14 | 日本電気硝子株式会社 | Method for producing glass fiber |
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| Publication number | Publication date |
|---|---|
| JP3913939B2 (en) | 2007-05-09 |
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