JP2001099159A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2001099159A5 JP2001099159A5 JP1999276248A JP27624899A JP2001099159A5 JP 2001099159 A5 JP2001099159 A5 JP 2001099159A5 JP 1999276248 A JP1999276248 A JP 1999276248A JP 27624899 A JP27624899 A JP 27624899A JP 2001099159 A5 JP2001099159 A5 JP 2001099159A5
- Authority
- JP
- Japan
- Prior art keywords
- dynamic
- forming
- groove
- dynamic pressure
- bearing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005530 etching Methods 0.000 description 9
- 239000011810 insulating material Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000004070 electrodeposition Methods 0.000 description 2
- 238000000866 electrolytic etching Methods 0.000 description 1
Description
【特許請求の範囲】
【請求項１】 動圧軸受に動圧溝を形成する、動圧軸受の動圧溝の形成方法において、
加工を施す前記動圧軸受に予め絶縁物質を印刷する工程と、前記絶縁物質が印刷された前記動圧軸受にレジストを電着で形成する工程と、前記動圧軸受に印刷された前記絶縁物質を除去することにより前記レジストにエッチングパターンを形成する工程と、前記エッチングパターンを用いてエッチングすることにより前記動圧溝を形成するエッチング工程と、を有することを特徴とする動圧軸受の動圧溝の形成方法。
【請求項２】 前記レジストがフォトレジストであることを特徴とする請求項１記載の動圧軸受の動圧溝の形成方法。
【請求項３】 前記エッチング工程に電解エッチングを用いることを特徴とする請求項１記載の動圧軸受の動圧溝の形成方法。
【請求項４】 動圧軸受に動圧溝を形成する、動圧軸受の動圧溝の形成装置において、
加工を施す前記動圧軸受に絶縁物質を印刷する手段と、電着によりレジストを形成する手段と、形成された前記レジストにエッチングパターンを形成する手段と、前記エッチングパターンを用いてエッチングすることにより前記動圧溝を形成するエッチング手段と、を備えることを特徴とする動圧軸受の動圧溝の形成装置。
[Claims]
[Claim 1] In the method of forming a dynamic groove of a dynamic bearing, which forms a dynamic groove in the dynamic bearing,
The process of printing an insulating material on the dynamic pressure bearing to be processed in advance and the dynamic pressure bearing on which the insulating material is printed.The process of forming a resist by electrodeposition andBy removing the insulating material printed on the dynamic bearingThe step of forming an etching pattern on the resist andThe dynamic groove is formed by etching using the etching pattern.Etching process andToA method for forming a dynamic pressure groove of a dynamic pressure bearing, which comprises having.
2. The resist is a photoresistThe method for forming a dynamic pressure groove of a dynamic pressure bearing according to claim 1.
3. Electrolytic etching is used in the etching process.The method for forming a dynamic pressure groove of a dynamic pressure bearing according to claim 1.
4. In a device for forming a dynamic groove of a dynamic bearing, which forms a dynamic groove in the dynamic bearing,
By printing an insulating material on the dynamic pressure bearing to be processed, a means for forming a resist by electrodeposition, a means for forming an etching pattern on the formed resist, and etching using the etching pattern. An apparatus for forming a dynamic pressure groove of a dynamic pressure bearing, comprising: an etching means for forming the dynamic pressure groove.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27624899A JP4245748B2 (en) | 1999-09-29 | 1999-09-29 | Method and apparatus for forming hydrodynamic groove of hydrodynamic bearing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27624899A JP4245748B2 (en) | 1999-09-29 | 1999-09-29 | Method and apparatus for forming hydrodynamic groove of hydrodynamic bearing |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001099159A JP2001099159A (en) | 2001-04-10 |
| JP2001099159A5 true JP2001099159A5 (en) | 2005-10-27 |
| JP4245748B2 JP4245748B2 (en) | 2009-04-02 |
Family
ID=17566783
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27624899A Expired - Fee Related JP4245748B2 (en) | 1999-09-29 | 1999-09-29 | Method and apparatus for forming hydrodynamic groove of hydrodynamic bearing |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4245748B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002333711A (en) * | 2001-05-08 | 2002-11-22 | Taiyo Denshi Kogyo Kk | Method for laminating photoresist film |
| JP2003097543A (en) | 2001-09-25 | 2003-04-03 | Koyo Seiko Co Ltd | Dynamic pressure bearing and its manufacturing method |
| JP2007040536A (en) * | 2006-10-16 | 2007-02-15 | Jtekt Corp | Dynamic pressure bearing and its manufacturing method |
-
1999
- 1999-09-29 JP JP27624899A patent/JP4245748B2/en not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2002037183A3 (en) | Inverse resist coating process | |
| TW200507951A (en) | Unitary dual damascene process using imprint lithography | |
| EP0962962A3 (en) | Patterning technique using a template, and a ink jet system | |
| EP2264522A3 (en) | Method of forming a pattern on a substrate | |
| WO2002003142A3 (en) | Electric microcontact printing method and apparatus | |
| WO2002045113A1 (en) | Pattern forming method for carbon nanotube, and field emission cold cathode and method of manufacturing the cold cathode | |
| EP1489463A3 (en) | Method for reducing pattern dimension in a photoresist layer | |
| MXPA06002714A (en) | Apparatus and method for producing two-sided patterned webs in registration. | |
| TW200744831A (en) | Self-aligned process for fabricating imprint templates containing variously etched features | |
| WO2004105046A3 (en) | Scanning probe microscopy probe and method for scanning probe contact printing | |
| EP1180919A3 (en) | Method for producing a conductive pattern and method for producing a greensheet lamination body including the same | |
| HK1059417A1 (en) | Data carrier with line intaglio image and method for converting picture motifs | |
| EP1149698A3 (en) | Screen printing method and screen printing apparatus | |
| PL1648597T3 (en) | Filter element and method for the production thereof | |
| WO2006036433A3 (en) | Imprint lithography apparatus and method employing an effective pressure | |
| WO2008060266A3 (en) | Nanotemplate arbitrary-imprint lithography | |
| WO2000048808A3 (en) | A method for creating a patterned concrete surface | |
| EP1906229A3 (en) | Process for forming a feature by undercutting a printed mask | |
| SG103894A1 (en) | Method of removing assist features utilized to improve process latitude | |
| TW349241B (en) | Method for producing semiconductor device | |
| JP2001099159A5 (en) | ||
| WO2002011193A3 (en) | Process for photoresist descumming and stripping in semiconductor applications by nh3 plasma | |
| TW200504830A (en) | Method providing an improved bi-layer photoresist pattern | |
| EP0986094A3 (en) | Exposure method and device manufacturing method using the same | |
| WO2005024623A3 (en) | Printing digital documents |