JP2001092103A5 - - Google Patents

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Publication number
JP2001092103A5
JP2001092103A5 JP1997356679A JP35667997A JP2001092103A5 JP 2001092103 A5 JP2001092103 A5 JP 2001092103A5 JP 1997356679 A JP1997356679 A JP 1997356679A JP 35667997 A JP35667997 A JP 35667997A JP 2001092103 A5 JP2001092103 A5 JP 2001092103A5
Authority
JP
Japan
Prior art keywords
photomask
pattern
manufacturing
substrate
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP1997356679A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001092103A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP35667997A priority Critical patent/JP2001092103A/ja
Priority claimed from JP35667997A external-priority patent/JP2001092103A/ja
Priority to TW087121685A priority patent/TW449672B/zh
Priority to PCT/JP1998/005912 priority patent/WO1999034255A1/ja
Priority to AU16893/99A priority patent/AU1689399A/en
Priority to EP98961560A priority patent/EP1043625A4/en
Priority to KR10-2000-7007029A priority patent/KR100536781B1/ko
Publication of JP2001092103A publication Critical patent/JP2001092103A/ja
Priority to US10/195,425 priority patent/US6677088B2/en
Publication of JP2001092103A5 publication Critical patent/JP2001092103A5/ja
Withdrawn legal-status Critical Current

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JP35667997A 1997-12-25 1997-12-25 フォトマスクの製造方法及び装置、並びにデバイスの製造方法 Withdrawn JP2001092103A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP35667997A JP2001092103A (ja) 1997-12-25 1997-12-25 フォトマスクの製造方法及び装置、並びにデバイスの製造方法
TW087121685A TW449672B (en) 1997-12-25 1998-12-24 Process and apparatus for manufacturing photomask and method of manufacturing the same
PCT/JP1998/005912 WO1999034255A1 (en) 1997-12-25 1998-12-25 Method and apparatus for manufacturing photomask and method of fabricating device
AU16893/99A AU1689399A (en) 1997-12-25 1998-12-25 Method and apparatus for manufacturing photomask and method of fabricating device
EP98961560A EP1043625A4 (en) 1997-12-25 1998-12-25 METHOD AND APPARATUS FOR MANUFACTURING PHOTOMASK AND METHOD FOR MANUFACTURING THE APPARATUS
KR10-2000-7007029A KR100536781B1 (ko) 1997-12-25 1998-12-25 포토마스크의 제조방법과 장치 및 디바이스의 제조방법
US10/195,425 US6677088B2 (en) 1997-12-25 2002-07-16 Photomask producing method and apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35667997A JP2001092103A (ja) 1997-12-25 1997-12-25 フォトマスクの製造方法及び装置、並びにデバイスの製造方法

Publications (2)

Publication Number Publication Date
JP2001092103A JP2001092103A (ja) 2001-04-06
JP2001092103A5 true JP2001092103A5 (enExample) 2005-07-28

Family

ID=18450248

Family Applications (1)

Application Number Title Priority Date Filing Date
JP35667997A Withdrawn JP2001092103A (ja) 1997-12-25 1997-12-25 フォトマスクの製造方法及び装置、並びにデバイスの製造方法

Country Status (1)

Country Link
JP (1) JP2001092103A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112578638B (zh) * 2019-09-29 2022-07-01 芯恩（青岛）集成电路有限公司 一种光刻方法、光刻装置及计算机可读存储介质

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