JP2001079684A - BRAZING FILLER METAL FOR Al-BASED METAL, AND CERAMIC CIRCUIT BOARD USING THE SAME - Google Patents

BRAZING FILLER METAL FOR Al-BASED METAL, AND CERAMIC CIRCUIT BOARD USING THE SAME

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Publication number
JP2001079684A
JP2001079684A JP25680099A JP25680099A JP2001079684A JP 2001079684 A JP2001079684 A JP 2001079684A JP 25680099 A JP25680099 A JP 25680099A JP 25680099 A JP25680099 A JP 25680099A JP 2001079684 A JP2001079684 A JP 2001079684A
Authority
JP
Japan
Prior art keywords
circuit board
brazing material
ceramic substrate
ceramic
brazing filler
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP25680099A
Other languages
Japanese (ja)
Other versions
JP3734388B2 (en
Inventor
Yoichi Ogata
陽一 尾形
Hideyuki Emoto
秀幸 江本
Manabu Uto
学 宇都
Masahiro Ibukiyama
正浩 伊吹山
Shigeo Hiyama
茂雄 檜山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Priority to JP25680099A priority Critical patent/JP3734388B2/en
Publication of JP2001079684A publication Critical patent/JP2001079684A/en
Application granted granted Critical
Publication of JP3734388B2 publication Critical patent/JP3734388B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a brazing filler metal to join a ceramic substrate with an alloy plate mainly consisting of Al which can provide a ceramic board durable in repeated heat cycle and high in reliability by setting the quantity of Fe, Cr and Mn as impurities of Al alloy to be less than a predetermined value. SOLUTION: This brazing filler metal consists of Al-based alloy containing 1.5 wt.% or less Fe, Cr and Mn and impurities, and containing Mg and at least one kind of Cu, Si and Ge. In particular, the brazing filler metal contains 0.05-3% Mg and at least 85% Al, and the temperature at which the liquidus is generated is 500 to 630 deg.C. A ceramic circuit board ready for applications requiring high reliability in which a ceramic substrate is excellently with a circuit formed of a metal sheet mainly consisting of Al can be obtained using this brazing filler metal by joining the alloy sheet mainly consisting of Al with the ceramic substrate consisting of at least one kind of aluminum nitride, silicon nitride, silicon carbide and alumina.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、パワーモジュール
等に使用されるセラミックス基板と金属板の接合用ろう
材およびそれを用いた高信頼性のセラミックス回路基板
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a brazing material for joining a ceramic substrate and a metal plate used in a power module or the like, and a highly reliable ceramic circuit board using the same.

【0002】[0002]

【従来の技術】従来から、熱発生の大きい半導体素子等
を搭載するためのパワーモジュール等の回路基板とし
て、アルミナ(Al23)セラミックス等の絶縁性に優
れたセラミックス基板の表面に、導電性を有する回路層
を接合した回路基板が広く普及している。
2. Description of the Related Art Conventionally, as a circuit board for a power module or the like for mounting a semiconductor element or the like which generates a large amount of heat, an electrically conductive ceramic substrate such as an alumina (Al 2 O 3 ) ceramic is formed on the surface of the substrate. 2. Description of the Related Art A circuit board in which circuit layers having different properties are joined has been widely used.

【0003】しかし、近年、これら半導体素子は機器類
の小型化、高性能化に伴って熱発生量が増加する傾向に
あり、信頼性高く安定動作を得るために半導体素子の発
生する熱を放散して、素子が破壊されない温度より充分
低くすることが一層重要な課題となってきており、前記
回路基板の特性として電気絶縁性が高いことに加え、よ
り高い熱伝導性が要求されてきている。
However, in recent years, the amount of heat generated by these semiconductor elements has tended to increase with the miniaturization and high performance of equipment, and the heat generated by the semiconductor elements has been dissipated in order to obtain reliable and stable operation. Therefore, it has become more important to make the temperature sufficiently lower than the temperature at which the element is not destroyed, and in addition to high electrical insulation properties as the characteristics of the circuit board, higher thermal conductivity has been required. .

【0004】上記の要求に伴って、高熱伝導性の窒化ア
ルミニウム(AlN)などのセラミックスを基板材料と
して用いた、放熱性の高い銅回路基板が開発されてい
る。しかし、前記銅回路基板は機械的特性が不十分であ
り、回路基板として用いる場合には、半導体素子の作動
に伴う繰り返しの熱サイクルや動作環境の温度変化等
で、セラミックス部分の銅回路層の接合部付近にクラッ
クが発生しやすく、信頼性が低いという問題点があっ
た。
[0004] In response to the above demand, a copper circuit board having high heat dissipation has been developed using ceramics such as aluminum nitride (AlN) having high thermal conductivity as a substrate material. However, the copper circuit board has insufficient mechanical properties, and when used as a circuit board, the copper circuit layer of the ceramic portion may be subjected to repeated thermal cycling or temperature changes in the operating environment due to the operation of the semiconductor element. There is a problem that cracks are apt to occur near the joint and reliability is low.

【0005】この問題の解決として、例えば特開平4−
12554号公報や特開平4−18746号公報に、回
路材料として銅よりも降伏耐力の小さいアルミニウム
(Al)を用いたセラミックス回路基板が開示されてい
る。
As a solution to this problem, for example, Japanese Unexamined Patent Publication No.
JP-A No. 12554 and JP-A-4-18746 disclose ceramic circuit boards using aluminum (Al) having a lower yield strength than copper as a circuit material.

【0006】しかし、信頼性の指標となる−40℃から
125℃までの繰り返し冷却、加熱する耐ヒートサイク
ル性についは、前記回路基板であっても1000回程度
でアルミニウム回路材の剥離が起こったり、セラミック
ス基板にクラックが入る等の問題が発生し、上述のよう
に高い信頼性の要求される用途には充分対応ができな
い。
However, with regard to the heat cycle resistance of repeatedly cooling and heating from -40 ° C. to 125 ° C., which is an index of reliability, even with the above-mentioned circuit board, peeling of aluminum circuit material occurs about 1000 times. As a result, problems such as cracks in the ceramic substrate occur, and it is not possible to sufficiently cope with applications requiring high reliability as described above.

【0007】また、特開平8−208359号公報に
は、Alの溶湯を用いてAlを直接AlN基板に接合し
た回路基板が開示されている。この発明によれば、Al
回路基板単体で3000回を越える耐ヒートサイクル性
が達成されている。
Japanese Patent Application Laid-Open No. 8-208359 discloses a circuit board in which Al is directly bonded to an AlN substrate using a molten metal of Al. According to the present invention, Al
The circuit board alone has achieved heat cycle resistance of more than 3000 times.

【0008】しかし、Al溶湯を用いて直接接合してい
るために、Al回路層の厚さのバラツキが大きく、安定
して信頼性の高い回路基板が得られないだけでなく、設
備費や設備の維持管理がかかりコストアップになるとい
う問題がある。
[0008] However, the direct bonding using the molten aluminum causes a large variation in the thickness of the Al circuit layer, so that not only a stable and highly reliable circuit board cannot be obtained, but also equipment cost and equipment. There is a problem that maintenance is required and the cost is increased.

【0009】一方、ろう材接合による方法は、Al回路
層の厚さバラツキはほとんどなく、設備コストは安価で
あるが、接合用ろう材としてAlを主成分とする場合、
これまでは添加成分に重点が置かれ、Alの不純物には
あまり注意が払われなかった。しかしながら、Alは再
生品が多く使われること、合金を溶融製造する際に、撹
拌棒や治具等からの汚染があり、種々の不純物が混入し
てくる場合がある。
On the other hand, the brazing material joining method has almost no variation in the thickness of the Al circuit layer and the equipment cost is low.
Heretofore, the emphasis has been placed on additive components, and little attention has been paid to Al impurities. However, Al is often used as a recycled product, and when producing an alloy by melting, there is contamination from a stirring rod, a jig, or the like, and various impurities may be mixed.

【0010】[0010]

【発明が解決しようとする課題】本発明は、上記公知技
術の事情に鑑みてなされたものであり、例えば、電気自
動車や鉄道等の用途に適用できるパワーモジュールのよ
うな、高い信頼性が要求される用途に対応できるセラミ
ックス回路基板を提供することを目的とするものであ
る。
SUMMARY OF THE INVENTION The present invention has been made in view of the circumstances of the above-mentioned known technology, and requires high reliability such as a power module applicable to electric vehicles and railways. It is an object of the present invention to provide a ceramic circuit board that can be used for various applications.

【0011】[0011]

【課題を解決するための手段】本発明者は、上記目的を
達成するために鋭意検討した結果、前記不純物、特にF
e、Cr、Mnが接合用ろう材に多量に含まれると、そ
れらが或いは主成分のAl等と金属間化合物を形成し、
このためにセラミックス基板と回路板との接合状態が不
良となる場合があるだけでなく、得られる回路基板の信
頼性が充分確保できないという知見を得て、本発明に至
ったものである。そして、前記不純物量を低減し、回路
材料であるアルミニウム(Al)材とセラミックス基板
の接合温度を低下させることで、接合時に発生する熱応
力を低減でき、金属間化合物発生に原因する接合不良を
抑制でき、耐ヒートサイクル等の信頼性が著しく向上す
ることを見出し、本発明に至ったものである。
Means for Solving the Problems The present inventors have made intensive studies to achieve the above object, and as a result, have found that the impurities, especially F
When a large amount of e, Cr, Mn is contained in the brazing filler metal, they form an intermetallic compound with Al or the main component,
For this reason, the inventors have found that not only the bonding state between the ceramic substrate and the circuit board may be defective, but also that the reliability of the obtained circuit board cannot be sufficiently secured. By reducing the amount of the impurities and lowering the bonding temperature between the aluminum (Al) material as the circuit material and the ceramic substrate, the thermal stress generated at the time of bonding can be reduced, and bonding defects due to the generation of intermetallic compounds can be reduced. The present invention has been found to be able to suppress the heat cycle and to significantly improve the reliability such as heat cycle resistance, and the present invention has been accomplished.

【0012】即ち、本発明は、セラミックス基板とAl
を主成分とする金属板とを接合するろう材であって、不
純物としてFe、Cr、Mnがいずれも1.5重量%以
下であり、また、Mgと、Cu、Si、Geのうちの少
なくとも一種以上とを含むAl合金である。特に、好ま
しい実施態様として、Mgを0.05重量%以上3重量
%以下、Alが85重量%以上含まれ、さらには、液相
を生じる温度が500℃〜630℃であることを特徴と
するろう材である。また、本発明は、前記ろう材を用い
て、Alを主成分とする金属板を、窒化アルミニウム、
窒化珪素、炭化珪素、アルミナからなる群より選ばれた
一種以上からなるセラミックス基板に接合してなること
を特徴とするセラミックス回路基板である。
That is, the present invention provides a ceramic substrate and Al
Is a brazing material for joining to a metal plate whose main component is Fe, Cr, and Mn as impurities, each of which is 1.5% by weight or less, and at least one of Mg, Cu, Si, and Ge. Al alloy containing one or more kinds. In a particularly preferred embodiment, Mg is contained in an amount of 0.05% by weight or more and 3% by weight or less, Al is contained in an amount of 85% by weight or more, and the temperature at which a liquid phase is formed is 500 ° C to 630 ° C. It is brazing material. The present invention also provides a metal plate containing Al as a main component using the brazing material, aluminum nitride,
A ceramic circuit board characterized by being bonded to a ceramic substrate made of at least one selected from the group consisting of silicon nitride, silicon carbide, and alumina.

【0013】[0013]

【発明の実施の形態】本発明に於いては、不純物元素と
してのFe、Cr、Mnがいずれも1.5重量%以下で
あることが本質的である。ろう材中に、不純物元素とし
てFe、Cr、Mnが多い場合、金属間化合物を生成
し、セラミックス基板とアルミニウムを主成分とする金
属板とをろう接した際に接合状態が悪くなるとともに、
得られるセラミックス回路基板の信頼性も低下する。そ
して、金属間化合物の生成は、接合時の昇温速度および
降温速度にもよるが、前記元素についていずれかが1.
5重量%を越えると顕著になり、その結果、セラミック
ス回路基板とした場合の信頼性の低下が著しくなり、一
般的な信頼性評価であるヒートサイクル試験(−40℃
←→125℃)において、1000回以下で基板にクラ
ックやAl回路剥離等が発生してしまう。前記不純物元
素の好ましく許容される量はいずれもが0.5重量%以
下である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS In the present invention, it is essential that Fe, Cr and Mn as impurity elements are all 1.5% by weight or less. In the brazing material, when there are many Fe, Cr, and Mn as impurity elements, an intermetallic compound is generated, and when the ceramic substrate and the metal plate containing aluminum as a main component are brazed, the bonding state is deteriorated.
The reliability of the obtained ceramic circuit board also decreases. The formation of the intermetallic compound depends on the temperature rising rate and the temperature decreasing rate during the bonding, but any one of the above-mentioned elements is 1.
If it exceeds 5% by weight, it becomes remarkable. As a result, the reliability of a ceramic circuit board is significantly reduced, and a heat cycle test (−40 ° C.) which is a general reliability evaluation is performed.
(← → 125 ° C.), cracks, Al circuit peeling, etc. occur on the substrate after 1000 times or less. The preferable amount of each of the impurity elements is 0.5% by weight or less.

【0014】また、セラミックス基板とAlを主成分と
する金属板とを接合する際、接合温度が高いと、接合後
の残留応力が大きくなるため、ろう材を低融点化するこ
とが重要である。そのためには、Mgと、Cu、Si、
Geからなる群の少なくとも1種以上の元素とを含むこ
とが好ましい。Mgは接合の妨害となる界面に存在する
酸化物を除去してくれるだけではなく、ろう材の低融点
化にも寄与するものと考えられる。また、Mgと組み合
わせて使用した場合、Cu、Si、Geはいずれも単独
であってもろう材合金の低融点化に寄与するが、これら
を複数組み合わせて用いることもできる。
When a ceramic substrate and a metal plate containing Al as a main component are joined together, if the joining temperature is high, the residual stress after joining increases, so it is important to lower the melting point of the brazing material. . For that purpose, Mg, Cu, Si,
It is preferable to include at least one element in the group consisting of Ge. It is considered that Mg not only removes oxides present at the interface that hinders joining, but also contributes to lowering the melting point of the brazing material. When used in combination with Mg, Cu, Si, and Ge alone can contribute to lowering the melting point of the brazing alloy even if used alone, but a plurality of these can also be used.

【0015】一方、Mgとしては0.05重量%〜3重
量%が好ましい。Mgの含有量が0.05重量%より少
ないと、酸化物除去の効果が低く、逆に3重量%を越え
ると理由は明らかではないが、接合性が悪化することが
ある。また、ろう材中のアルミニウム(Al)は85重
量%以上であることが好ましい。85重量%未満の場合
には、Alを主成分とする合金と接合できても、Alを
主成分とする合金とろう材との熱膨張率の差異が大きく
なったり、ろう材の降伏耐力が大きくなる等の理由か
ら、回路基板とした場合に耐ヒートサイクル性が低くな
ることがある。ろう材中のAl含有量が90重量%以上
であることが一層好ましい。上記理由から、Mgが0.
05重量%〜3重量%であり、Alが85重量%以上で
あり、残部がCu、Si、Geからなる群の少なくとも
1種以上の元素からなるAl合金は、セラミックス基板
とAlを主成分とする金属板とを接合するに好適であ
る。
On the other hand, Mg is preferably 0.05% by weight to 3% by weight. When the content of Mg is less than 0.05% by weight, the effect of removing oxides is low. On the contrary, when the content exceeds 3% by weight, the reason is not clear, but the joining property may be deteriorated. Further, the aluminum (Al) in the brazing material is preferably at least 85% by weight. When the content is less than 85% by weight, even if the alloy containing Al as the main component can be joined, the difference in the coefficient of thermal expansion between the alloy containing Al as the main component and the brazing material becomes large, or the yield strength of the brazing material decreases. For reasons such as an increase in size, the heat cycle resistance may be reduced when a circuit board is used. More preferably, the Al content in the brazing material is 90% by weight or more. For the above-mentioned reasons, Mg is not more than 0.
An Al alloy comprising at least one element selected from the group consisting of Cu, Si, and Ge, in which the content of Al is at least 85% by weight, and the balance is at least one of a ceramic substrate and Al. It is suitable for joining with a metal plate to be formed.

【0016】また、前記ろう材は500℃〜630℃の
温度範囲で少なくとも一部が液相を形成するものが良
い。即ち、500℃未満では接合性の面で充分でないこ
とがあるし、630℃を越える温度ではアルミニウム板
やセラミックス基板に残留する熱応力が大きくなるし、
アルミニウム材の融点に近くなるためロウ接欠陥が生じ
やすくなるからである。尚、前記ろう材を用いてアルミ
ニウムを主成分とする金属板とセラミックス基板とを接
合(ろう接)する場合、接合する面に1〜50kgf/
cm2の垂直力を付加することが望ましい。
It is preferable that the brazing material forms a liquid phase at least partially in a temperature range of 500 ° C. to 630 ° C. That is, if the temperature is lower than 500 ° C., the bonding property may not be sufficient, and if the temperature exceeds 630 ° C., the thermal stress remaining on the aluminum plate or the ceramic substrate increases,
This is because the temperature is close to the melting point of the aluminum material, so that a brazing defect is likely to occur. When joining (brazing) a metal plate containing aluminum as a main component and a ceramic substrate using the brazing material, 1 to 50 kgf /
It is desirable to apply a normal force of cm 2 .

【0017】本発明のろう材の作り方については、例え
ば、黒鉛-炭化ケイ素複合材のルツボにアルミニウムだ
けを溶融させ、そこに所定量の金属を添加し、充分撹拌
溶解する。続いてフラックスを添加、充分撹拌して鉱滓
等を除去後、溶解したろう材合金を型に流し込み冷却固
化させる。その後、圧延機を通して徐々に箔化するか、
粉体化すればよい。また、所望の組成となるように金属
粉末を秤量し、有機溶媒に分散してスラリーとする方法
でも構わない。
With regard to the method of producing the brazing material of the present invention, for example, only aluminum is melted in a crucible of a graphite-silicon carbide composite material, a predetermined amount of metal is added thereto, and sufficiently stirred and dissolved. Subsequently, after adding a flux and sufficiently stirring to remove slag and the like, the molten brazing alloy is poured into a mold and solidified by cooling. Then, gradually rolled through a rolling mill,
What is necessary is just to pulverize. Alternatively, a method in which a metal powder is weighed so as to have a desired composition and dispersed in an organic solvent to form a slurry may be used.

【0018】また、セラミックス基板としては、電気絶
縁性で熱伝導性に富むものならばどの様なものでも構わ
ず、例えば、アルミナ(Al23)やベリリア(Be
O)を添加した炭化珪素(SiC)、窒化珪素、窒化ア
ルミニウム等を挙げることができる。これらの内では、
電力が大きなパワーデバイスで熱の発生が大きいことを
考慮すると絶縁耐圧が高く、熱伝導性の高いことから窒
化アルミニウム(AlN)基板、窒化珪素(Si34
が好適である。
As the ceramic substrate, any substrate may be used as long as it is electrically insulating and has high thermal conductivity. For example, alumina (Al 2 O 3 ) or beryllia (Be)
Silicon carbide (SiC) to which O) is added, silicon nitride, aluminum nitride, and the like can be given. Of these,
Considering that a large power device generates a large amount of heat and has high withstand voltage and high thermal conductivity, an aluminum nitride (AlN) substrate, silicon nitride (Si 3 N 4 )
Is preferred.

【0019】本発明の回路基板は、アルミニウムを主成
分とする金属板と窒化アルミニウム基板等のセラミック
ス基板とを前記ろう材を用いて加熱接合した後、エッチ
ングする方法、或いは、金属板から打ち抜き法等により
予め回路パターンを形成し、これをセラミックス基板に
前記ろう材を用いて接合する方法等によって製造するこ
とができる。
The circuit board of the present invention may be formed by heating a metal plate containing aluminum as a main component and a ceramic substrate such as an aluminum nitride substrate using the brazing material and then etching the metal plate, or by punching the metal plate. For example, a circuit pattern can be formed in advance by, for example, a method in which the circuit pattern is joined to a ceramic substrate using the brazing material.

【0020】[0020]

【実施例】以下、実施例と比較例とをあげて、本発明を
詳細に説明するが、本発明はこれらに限定されるもので
はない。
EXAMPLES Hereinafter, the present invention will be described in detail with reference to Examples and Comparative Examples, but the present invention is not limited thereto.

【0021】〔実施例1〜11および比較例1〜3〕セ
ラミックス基板としては、50mm×50mm×0.6
35mmの窒化アルミニウム基板および窒化珪素基板
で、レーザーフラッシュ法による熱伝導率はそれぞれ1
75W/mKおよび75W/mKで、3点曲げ強さの平
均値は420MPaおよび560MPaであるものを用
意した。また、アルミニウムを主成分とする金属板とし
ては厚さ0.4mmのJIS呼称1085材を用いた。
[Examples 1 to 11 and Comparative Examples 1 to 3] A ceramic substrate was 50 mm × 50 mm × 0.6.
A 35 mm aluminum nitride substrate and a silicon nitride substrate each have a thermal conductivity of 1
Those having 75 W / mK and 75 W / mK and average values of the three-point bending strengths of 420 MPa and 560 MPa were prepared. In addition, as a metal plate containing aluminum as a main component, a JIS designation 1085 material having a thickness of 0.4 mm was used.

【0022】また、ろう材の製造方法に関しては、5重
量%Cu−1.5量%Mg−1.5重量%Fe−残Al
の箔の場合について、以下例示する。黒鉛-炭化ケイ素
複合材のルツボにAlだけを750℃で溶融させ、そこ
に5重量%相当のCuを添加し、さらに1.5重量%相
当のFeを添加し、1000℃にして充分撹拌溶解し
た。次に、溶湯を750℃にし、合金用フラックス(例
えば日本金属化学社製N406)を添加、充分撹拌して
鉱滓等を除去後、1.5重量%相当のMgを添加、溶解
したろう材合金を型に流し込み冷却固化させた。その
後、圧延機を通して薄化と350℃アニールを繰り返
し、最終的に20μm厚さの箔にした。他のろう材も上
記に準じて合金箔を作製した。作製した合金箔は、蛍光
X線法(化学分析で校正した)にて分析し、目的とする
組成であることを確認した。
As for the method of producing the brazing material, 5% by weight of Cu-1.5% by weight of Mg-1.5% by weight of Fe-remaining Al
The case of the foil described above is exemplified below. Only Al is melted at 750 ° C. in a graphite-silicon carbide composite crucible, 5% by weight of Cu is added thereto, and 1.5% by weight of Fe is further added. did. Next, the molten metal was heated to 750 ° C., a flux for alloy (for example, N406 manufactured by Nippon Metal Chemical Co., Ltd.) was added, and the mixture was sufficiently stirred to remove slag and the like. Was poured into a mold and cooled and solidified. Thereafter, thinning and annealing at 350 ° C. were repeated through a rolling mill to finally form a foil having a thickness of 20 μm. Alloy foils were prepared for other brazing materials in accordance with the above. The prepared alloy foil was analyzed by a fluorescent X-ray method (calibrated by chemical analysis), and it was confirmed that the alloy had a desired composition.

【0023】前記セラミックス基板の表裏両面に、表1
に示す各種組成の20μmろう材合金箔を介して、前記
アルミニウム板を重ね、垂直方向に35kgf/cm2
で加圧した。そして、10-4Torrの真空中、温度5
00℃〜650℃の条件下で加圧しながらアルミニウム
板と窒化アルミニウム基板とをろう接して、接合体を得
た。実施例、比較例の各々の接合条件を表2に示す。
On both sides of the ceramic substrate, Table 1
Through 20μm braze alloy foils having various compositions shown in overlaid the aluminum plate, 35 kgf / cm 2 in the vertical direction
And pressurized. Then, at a temperature of 5 in a vacuum of 10 -4 Torr.
The aluminum plate and the aluminum nitride substrate were soldered while pressing under the conditions of 00 ° C to 650 ° C to obtain a joined body. Table 2 shows the joining conditions of the examples and the comparative examples.

【0024】[0024]

【表1】 [Table 1]

【0025】[0025]

【表2】 [Table 2]

【0026】前記接合体については、目視及び超音波探
傷による接合状態の確認を行った。さらに、異常の認め
られなかった接合体について、アルミニウム板表面の所
望部分にエッチングレジストをスクリーン印刷して、塩
化第二鉄溶液にてエッチング処理し、回路パターンを形
成した。次いで、レジストを剥離した後、無電解Ni−
Pメッキを3μm行って回路基板とした。得られた回路
基板について、以下に示すように信頼性の評価を行っ
た。
With respect to the joined body, the joined state was confirmed visually and by ultrasonic flaw detection. Further, with respect to the joined body in which no abnormality was observed, an etching resist was screen-printed on a desired portion of the aluminum plate surface and etched with a ferric chloride solution to form a circuit pattern. Next, after removing the resist, the electroless Ni-
P plating was performed at 3 μm to obtain a circuit board. The reliability of the obtained circuit board was evaluated as described below.

【0027】信頼性評価;回路基板に−40℃×30分
→室温×10分→125℃×30分→室温×10分を1
サイクルとするヒートサイクルを3000回負荷した。
その後、回路基板について、目視及び超音波探傷による
回路の剥離やセラミックス基板におけるクラック発生状
況等の異常の有無を観察した。結果を表3に示す。
Reliability evaluation: -40 ° C. × 30 minutes → room temperature × 10 minutes → 125 ° C. × 30 minutes → room temperature × 10 minutes
The heat cycle was applied 3000 times.
Thereafter, the circuit board was visually and visually inspected for abnormalities such as peeling of the circuit by ultrasonic flaw detection and crack occurrence on the ceramic substrate. Table 3 shows the results.

【0028】[0028]

【表3】 [Table 3]

【0029】表3から、本発明の回路基板は、いずれも
回路とセラミックス基板とが良好な接合状態であり、ヒ
ートサイクル3000回負荷後であっても回路の剥離や
ハンダクラック等の異常は認められず、高信頼性の回路
基板であることが明らかである。
From Table 3, all the circuit boards of the present invention are in a good bonding state between the circuit and the ceramic substrate, and abnormalities such as peeling of the circuit and solder cracks are recognized even after the heat cycle of 3000 times. Therefore, it is clear that the circuit board has high reliability.

【0030】[0030]

【発明の効果】本発明のろう材は、不純物金属元素とし
てのFe、Cr、Mnがいずれも1.5重量%以下と制
御されているので、ろう接の際に金属間化合物が生成す
ることを抑制することができ、その結果、セラミックス
基板とアルミニウムを主成分とする金属板とを良好に接
合することができる特徴を有する。また、本発明のろう
材は、Alが85重量%以上であり、Mgと、Cu、S
i、Geのうちの少なくとも一種以上を含むことから、
セラミックス基板とアルミニウムを主成分とする金属板
とを一層良好に接合することができる特徴を有する。加
えて、本発明のろう材は、液相を生じる温度が500℃
〜630℃であるので、低い接合温度でセラミックス回
路基板を製造できるので、得られるセラミックス回路基
板に残留する熱応力を低くでき、その結果、熱サイクル
にも耐久性のある高信頼性のセラミックス回路基板を容
易に得ることができる。
According to the brazing material of the present invention, Fe, Cr and Mn as impurity metal elements are all controlled to 1.5% by weight or less, so that an intermetallic compound is formed during brazing. Therefore, the ceramic substrate and the metal plate containing aluminum as a main component can be satisfactorily joined. In the brazing material of the present invention, Al is 85% by weight or more, and Mg, Cu, S
from at least one of i and Ge,
It is characterized in that a ceramic substrate and a metal plate containing aluminum as a main component can be more preferably bonded. In addition, the brazing material of the present invention has a temperature at which a liquid phase is generated at 500 ° C.
Since the ceramic circuit board can be manufactured at a low joining temperature since the temperature is up to 630 ° C., the thermal stress remaining on the obtained ceramic circuit board can be reduced, and as a result, a highly reliable ceramic circuit that is durable to thermal cycles. A substrate can be easily obtained.

【0031】本発明のセラミックス回路基板は、前記ろ
う材を用いて、セラミックス基板とアルミニウムを主成
分とする金属板からなる回路とが良好に接合していて、
残留している熱応力も低いので、繰り返しの熱サイクル
に耐久性のある高信頼性のセラミックス回路基板であ
り、産業上非常に有用である。
In the ceramic circuit board of the present invention, the ceramic substrate and the circuit composed of a metal plate containing aluminum as a main component are satisfactorily joined using the brazing material.
Since the residual thermal stress is low, it is a highly reliable ceramic circuit board that is durable to repeated thermal cycles, and is very useful in industry.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 伊吹山 正浩 東京都町田市旭町3丁目5番1号 電気化 学工業株式会社中央研究所内 (72)発明者 檜山 茂雄 東京都町田市旭町3丁目5番1号 電気化 学工業株式会社中央研究所内 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Masahiro Ibukiyama 3-5-1 Asahicho, Machida-shi, Tokyo Denka Kagaku Kogyo Co., Ltd. (72) Inventor Shigeo Hiyama 3 Asahicho, Machida-shi, Tokyo No.5-1, Denka Kagaku Kogyo Co., Ltd., Central Research Laboratory

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】セラミックス基板とAlを主成分とする金
属板とを接合するろう材であって、不純物としてFe、
Cr、Mnがいずれも1.5重量%以下であるAl系合
金からなることを特徴とするろう材。
A brazing material for joining a ceramic substrate and a metal plate containing Al as a main component, wherein the brazing material is Fe,
A brazing material comprising an Al-based alloy in which Cr and Mn are each 1.5% by weight or less.
【請求項2】Al系合金が、Mgと、Cu、Si、Ge
のうちの少なくとも一種以上とを含むAl合金であるこ
と特徴とする請求項1記載のろう材。
2. An Al-based alloy comprising Mg, Cu, Si, Ge
The brazing material according to claim 1, wherein the brazing material is an Al alloy containing at least one of the following.
【請求項3】Mgを0.05重量%以上3重量%以下、
Alが85重量%以上含まれることを特徴とする請求項
2記載のろう材。
(3) Mg is contained in an amount of 0.05 to 3% by weight;
The brazing material according to claim 2, wherein Al is contained in an amount of 85% by weight or more.
【請求項4】液相を生じる温度が500℃〜630℃で
あることを特徴とする請求項1、請求項2又は請求項3
記載のろう材。
4. The method according to claim 1, wherein the temperature at which the liquid phase is formed is 500 ° C. to 630 ° C.
The brazing material described.
【請求項5】Alを主成分とする金属板を、請求項1、
請求項2、請求項3、又は請求項4記載のろう材を介し
て、窒化アルミニウム、窒化珪素、炭化珪素、アルミナ
からなる群より選ばれた一種以上からなるセラミックス
基板に接合してなることを特徴とするセラミックス回路
基板。
5. A metal plate containing Al as a main component,
Claims 1. A semiconductor device comprising a brazing material according to claim 2, 3, or 4, which is joined to a ceramic substrate made of at least one selected from the group consisting of aluminum nitride, silicon nitride, silicon carbide, and alumina. Characteristic ceramic circuit board.
JP25680099A 1999-09-10 1999-09-10 Al-based metal brazing material and ceramic circuit board using the same Expired - Lifetime JP3734388B2 (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006081923A1 (en) * 2005-02-04 2006-08-10 Aleris Aluminum Koblenz Gmbh Aluminium alloy brazing material
WO2017077761A1 (en) * 2015-11-06 2017-05-11 三菱マテリアル株式会社 Ceramic-aluminum conjugate, power module substrate, and power module
CN116021102A (en) * 2022-12-13 2023-04-28 郑州机械研究所有限公司 Large-thickness high-strength aluminum alloy honeycomb plate and preparation method thereof

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006081923A1 (en) * 2005-02-04 2006-08-10 Aleris Aluminum Koblenz Gmbh Aluminium alloy brazing material
WO2017077761A1 (en) * 2015-11-06 2017-05-11 三菱マテリアル株式会社 Ceramic-aluminum conjugate, power module substrate, and power module
KR20180077170A (en) * 2015-11-06 2018-07-06 미쓰비시 마테리알 가부시키가이샤 Ceramics / aluminum junction body, substrate for power module, and power module
US10607907B2 (en) 2015-11-06 2020-03-31 Mitsubishi Materials Corporation Ceramic-aluminum conjugate, power module substrate, and power module
KR102462273B1 (en) 2015-11-06 2022-11-01 미쓰비시 마테리알 가부시키가이샤 Ceramics/aluminum assembly, substrate for power module, and power module
CN116021102A (en) * 2022-12-13 2023-04-28 郑州机械研究所有限公司 Large-thickness high-strength aluminum alloy honeycomb plate and preparation method thereof
CN116021102B (en) * 2022-12-13 2023-10-17 郑州机械研究所有限公司 Large-thickness high-strength aluminum alloy honeycomb plate and preparation method thereof

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