JP2001071379A - Transfer master, its production, uneven film using the same, transfer film and diffusion reflection plate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a transfer master used in the production of a diffusion reflection plate for a reflection type CD having good reflection characteristics, an uneven film and a transfer film. SOLUTION: Uneven parts wherein one or more kinds of congruent shapes are arranged side by side are formed on the surface of a molding matrix and roughening plating is further applied to the uneven parts to produce a transfer master wherein roughened shapes are provided on the uneven parts at random. The roughened shapes are transferred to a film to be transferred to obtain an uneven film and a reflecting film is provided to this uneven film to form a diffusion reflection plate. The uneven film formed by the above mentioned method is used as a temporary support and a membrane layer is laminated on the unevenness of the temporary support to form a transfer film and the surface not laminated to the temporary support of the membrane layer is pressed to a permanent substrate and the temporary support is peeled and a reflecting film is formed on the membrane layer to obtain a diffusion reflection plate hard to look iridescence due to light diffraction.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transfer film used for manufacturing a reflection type liquid crystal display device which does not require a backlight and a diffuse reflection plate of a solar cell which requires high efficiency, and a transfer film for the same. The present invention relates to a diffuse reflection plate used, an uneven film used for the production thereof, and a transfer master.

[0002]

2. Description of the Related Art Liquid crystal displays (hereinafter abbreviated as LCDs)
Utilizing features such as thinness, small size, and low power consumption, is currently used for display units such as watches, calculators, TVs, and personal computers. In recent years, color LCDs have been developed and OA / AV
It is beginning to be used for many purposes, such as navigation systems, viewfinders, and personal computer monitors, mainly for equipment, and the market is expected to expand rapidly in the future. In particular, reflective LCDs that perform display by reflecting light incident from the outside are attracting attention as portable terminal equipment because they do not require a backlight, consume less power, and can be made thinner and lighter. ing.

Conventionally, a twisted nematic system and a super twisted nematic system have been adopted for a reflection type LCD, but in these systems, a half of the incident light is not used for display by a linear polarizer, and the display becomes dark. turn into. Therefore, the number of polarizers was reduced to one, and a method combined with a retardation plate or a phase transition type guest
A host display mode has been proposed.

In order to obtain a bright display by efficiently using external light in a reflective LCD, it is necessary to further increase the intensity of light scattered in a direction perpendicular to the display screen with respect to incident light from all angles. There is. Therefore, it is necessary to control the reflection film on the reflection plate so as to obtain appropriate reflection characteristics. A method is proposed in which a photosensitive resin is applied to a substrate, patterned using a photomask to form fine irregularities of several microns, and a thin metal film is formed to form a diffuse reflection plate (Japanese Patent Laid-Open No. 4-243226). Have been.
Further, there has been proposed a method of manufacturing a matrix in which concave portions are continuously formed by pressing an indenter having a spherical tip, and a method of manufacturing a reflector by transferring the concave portion to a reflector substrate (Japanese Patent Application Laid-Open No. 11-1999).
No. 42649). In addition, a method of forming a film on a substrate in which fine particles are dispersed in a resin in order to control the diffusivity has been proposed (Japanese Patent Application Laid-Open No. Hei 7-110476).

[0005]

Problems to be Solved by the Invention
In the method disclosed in Japanese Patent Application Laid-Open No. 6-64, there is a step of exposing and developing with a photomask for each substrate in order to form irregularities. Therefore, the process is complicated, and it cannot be said that the cost is low and the productivity is high. Further, it is difficult to randomly form a large area in a process of manufacturing a photomask. In the method disclosed in Japanese Patent Application Laid-Open No. 11-42649, it is difficult to perform fine processing due to mechanical processing, and hence it is difficult to form irregularities of several microns. Also, it is difficult to form irregularities randomly on a large area. In each case, the same irregularities are continuously arranged and regularity occurs. As a result, there was a problem that a rainbow color due to light diffraction was seen and the display quality of the reflective LCD was degraded. On the other hand, Japanese Patent Application Laid-Open No. H11-38214 proposes a method of randomly forming concave portions by injecting particles into stripe-shaped grooves. JP-A-7-1
Although no rainbow color is generated by the method disclosed in Japanese Patent No. 10476, it is difficult to uniformly disperse the fine particles, and in order to obtain the required range of reflection intensity, the reflection at the regular reflection angle increases at the same time. There was a problem that intrusion occurred. The present invention provides a diffuse reflection plate, a transfer film, a concave / convex film used therefor, and a transfer master used for the production of a diffusion reflection plate for a reflection type LCD having good reflection characteristics.

[0006]

According to the present invention, there is provided a mold for molding, wherein at least one concavo-convex portion having at least one congruent shape is formed on the surface of the molding die, and roughening plating is randomly formed on the concavo-convex portion. This is a transfer prototype having a roughened shape formed on the substrate. It is preferable that the transfer prototype has a roughened shape subjected to gloss plating before or after roughening plating. Further, it is preferable that the congruent shape is a shape in which a part of a spherical surface, a cone or a regular pyramid is pressed adjacently. The transfer prototype includes a step of forming a concavo-convex portion in which one or more congruent shapes are adjacently arranged on the surface of the molding master, and a step of performing roughening plating on the concavo-convex portion. A transfer master having a randomly formed roughened shape can be manufactured.
On the surface of the mold for molding, a step of forming uneven portions in which one or more congruent shapes are arranged side by side, and before or after the step of performing roughening plating or after the step of performing roughening plating, apply gloss plating. It is preferable that the method is a method for manufacturing a transfer mold having a roughened shape in which the surface has a randomly formed surface. The present invention is an uneven film whose shape has been transferred by pressing the above-mentioned transfer prototype against an undercoat layer applied to a transferred film or a base film. The undercoat layer applied to the transfer-receiving film or the base film can be pressed against the transfer master. Further, the present invention is a diffuse reflection plate in which a reflection film is provided on an uneven surface of the uneven film. Furthermore, the present invention uses the above-mentioned uneven film as a temporary support, and a thin film layer is laminated on the uneven surface of the temporary support, and the surface of the thin film layer that is not laminated on the temporary support is transferred to the substrate to be transferred. This is a transfer film that forms an adhesive surface. In this case, a transfer film in which a reflective film is laminated between the uneven film and the thin film layer can be used. And the present invention
A step of pressing the transfer film so that the thin film layer faces a permanent substrate, a step of peeling off the temporary support, and a step of forming a reflective film on the uneven surface of the thin film layer. . A step of pressing the uneven film against a thin film layer formed on a permanent substrate so that the uneven surface faces, a step of peeling the uneven film, and a step of forming a reflective film on the surface; It can also be a plate. Further, a step of pressing a transfer film in which a reflective film is laminated between the uneven film and the thin film layer so that the thin film layer faces a permanent substrate, and a diffuse reflection plate manufactured by a step of peeling off a temporary support. You can also. And a substantially congruent shape is a part of a spherical surface, or a cone,
Alternatively, it is preferable that the diffuse reflection plate has a shape in which regular polygonal pyramids are pressed adjacent to each other.

[0007] In order to solve the above-mentioned problems, the present invention forms an uneven portion in which one or more types of congruent shapes are adjacently arranged on the surface of a molding die, and further performs rough plating on the uneven portion. By performing the above, a transfer prototype having a randomly roughened shape on the uneven portion can be manufactured. When the shape is transferred to a film to be transferred to form a concavo-convex film, and a reflective film is provided thereon, a diffuse reflection plate can be obtained.

Further, a thin film layer is laminated on the unevenness as a temporary support using the uneven film produced by the above method as a temporary support to form a transfer film so that the surface of the thin film layer which is not stacked on the temporary support is faced to the permanent substrate. When the temporary support is peeled off by pressing to form a reflection film on the thin film layer, a diffuse reflection plate in which rainbow colors due to light diffraction are difficult to see can be obtained.

Further, the reflection at the regular reflection angle can be reduced by controlling the uneven shape and the plating conditions, so that the reflection of the light source is reduced and a diffuse reflection plate having a uniform reflection intensity over a required range can be manufactured. Using the uneven film, the shape is transferred by pressing the uneven surface to the thin film layer formed on the permanent substrate so that the shape is transferred, and when a reflective film is formed on the thin film layer, a diffusion reflector having excellent reflection characteristics is formed. Can be manufactured.

A process in which the uneven film is used as a temporary support, a reflective film is provided on the uneven surface, and a thin film layer is further laminated to form a transfer film, and the film is pressed against a permanent substrate so that the thin film layer faces; The step of peeling off the temporary support makes it possible to manufacture a diffuse reflection plate.

The diffuse reflection plate of the present invention has good reproducibility of the uneven shape having diffuse reflection characteristics and can be manufactured by a simple process.

[0012]

DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows an example of a method for manufacturing a transfer prototype according to the present invention. FIG. 2 is a sectional view showing an example of the transfer film of the present invention. FIG. 3 is a cross-sectional view illustrating an example of a diffuse reflection plate manufactured using the transfer film of the present invention. FIG. 4 is a cross-sectional view showing an example of manufacturing a diffuse reflection plate using the transfer film of the present invention. FIG. 5 shows a cross-sectional view of a reflective LCD. Reflective LCD shown in FIG.
Among them, 1 is a glass substrate, 2 is a thin film layer, 3 is a reflection film, 11 is a color filter, 12 is a black matrix, 13 is a transparent electrode, 14 is a flattening film, 15 is an alignment film, 16 is a liquid crystal layer, 17 is A spacer, 18 indicates a retardation film, and 19 indicates a polarizing plate.

The material of the transfer mold is a metal, a resin, or the like, and is not particularly limited. Preferably, an iron alloy such as stainless steel having excellent dimensional stability and conductivity is used. . The surface is made uniform by mechanical polishing, etching, washing and the like. The shape is not limited, such as a plate, a sheet, and a roll. However, a roll is more preferable because the work can be performed while rotating.

As an example of the method for producing a transfer mold of the present invention, the diamond indenter is moved while rotating the roll-shaped substrate, or the indenter is pressed while moving the roll, so that they are substantially combined. An irregular shape is formed in which various shapes are adjacently arranged. The indenter may be in close contact with the indenter, or may have an arbitrary distance. Further, a plurality of indenters having different shapes can be pressed, or the same indenter can be pressed at different positions. The reflection characteristics can be optimized by selecting the shape of the diamond indenter. The shape after pressing, as shown in the example in FIG. 6, a part of a spherical surface or a paraboloid,
A shape in which a cone or a regular polygonal pyramid is pressed and closely adjacent to each other is preferable. By doing so, the reflection intensity in the regular reflection direction can be reduced.

In the above description, mechanical processing using an indenter has been described as an example, but processing using laser, processing using etching, or the like may be used, or a combination thereof may be used.

After the pressing, it is preferable to perform leveling plating or gloss plating for the purpose of filling the processing flaws or optimizing the depth of the unevenness. This is not limited to plating, but may be vacuum deposition or sputtering, or may be applied with a resin or the like.

Next, if the material of the transfer master is conductive, if it is non-conductive, a conductive treatment is performed and roughening plating is performed. Roughening plating may be performed by the method shown in the document "Practical plating for field engineers (1) (published in 1978, Maki Shoten, edited by the Japan Plating Association).
It can be performed by a known method such as electroplating such as copper plating, nickel plating, and chromium plating, electroless plating, fine particle eutectoid plating, and electrodeposition coating. By performing rough plating while rotating the roll, a transfer master without unevenness or seams can be produced.

After roughening plating, gloss plating can be performed again to optimize the shape. Further, the shape can be optimized by performing gloss plating before roughening plating. Further, protective plating may be performed for the purpose of increasing the hardness of the surface or preventing oxidation. For these reasons, it is preferable to perform plating of chromium, nickel, zinc, or the like.

The concavo-convex film can be manufactured by pressing a transfer prototype against a deformable transfer-receiving film (base film). Also, for the base film,
A deformable undercoat layer is provided, and a layer formed by a step of pressing a transfer mold against this layer and a step of curing the undercoat layer as necessary can be used. Heat, light, or the like can be given in the pressing step.

The undercoat layer of the present invention is preferably harder than the thin film layer after the formation of the unevenness. For example, polyolefins such as polyethylene and polypropylene, ethylene and vinyl acetate, ethylene and acrylate, ethylene copolymers such as ethylene and vinyl alcohol, polyvinyl chloride, copolymers of vinyl chloride and vinyl acetate, vinyl chloride and vinyl alcohol Copolymers, polyvinylidene chloride, polystyrene, styrene copolymers such as styrene and (meth) acrylate, polyvinyl toluene,
Vinyl toluene copolymer such as vinyl toluene and (meth) acrylate, poly (meth) acrylate, copolymer of (meth) acrylate such as butyl (meth) acrylate and vinyl acetate, cellulose At least one organic polymer selected from cellulose derivatives such as acetate, nitrocellulose and cellophane, polyamide, polystyrene, polycarbonate, polyimide, polyester, synthetic rubber, cellulose derivatives and the like can be used.

A photoinitiator, a monomer having an ethylenic double bond, or the like can be added in advance, if necessary, for curing after forming the unevenness. There is no problem even if the photosensitive type is used as a negative type material or a positive type material.

FIG. 7 shows an apparatus for measuring the reflection characteristics of the diffuse reflection plate of the present invention. Assuming that the angle between the reflected light beam 21 and the incident light beam 22 is θ, a diffuse reflector having excellent reflection characteristics can be obtained by increasing the luminance observed in the normal direction of the diffuse reflector, that is, the reflection intensity within the required θ range. can get.

As the base film used in the present invention, a film that is chemically and thermally stable and can be formed into a sheet or plate can be used. Specifically, polyethylene, polyolefins such as polypropylene, polyvinyl chloride, polyvinyl halides such as polyvinylidene chloride, cellulose acetate, nitrocellulose, cellulose derivatives such as cellophane, polyamide, polystyrene, polycarbonate, polyimide, polyester, or Metals such as aluminum and copper. Among them, particularly preferred is biaxially stretched polyethylene terephthalate having excellent dimensional stability.

As the thin film layer, a composition containing a deformable organic polymer, an inorganic compound, or a metal can be used. Preferably, an organic polymer composition which can be coated on a support and wound into a film. Use things. If necessary, dyes, organic pigments, inorganic pigments, powders, and composites thereof may be used alone or in combination.

For the thin film layer, a photosensitive resin composition or a thermosetting resin composition can be used. The dielectric constant, hardness, refractive index, and spectral transmittance of these thin film layers are not particularly limited.

Among these, it is preferable to use one having good adhesion to the substrate to be transferred and good releasability from the base film. For example, acrylic resins, polyethylene, polyolefins such as polypropylene, polyvinyl chloride, polyvinyl halides such as polyvinylidene chloride, cellulose acetate, nitrocellulose, cellulose derivatives such as cellophane, polyamide, polystyrene, polycarbonate, polyimide, polyester and the like are used. be able to. Further, a photosensitive material can be used. In some cases, a photosensitive resin that can be developed with an alkali or the like may be used so that only the portions where the unevenness of the substrate is necessary are left and unnecessary portions can be removed. Heat-resistant,
In order to improve the solvent resistance and the shape stability, a resin composition curable by heat or light after forming the unevenness may be used. Further, by adding a coupling agent and an adhesion-imparting agent, the adhesion to the substrate can be improved. This includes applying an adhesion-imparting agent to the adhesion surface of the substrate or the thin film layer for the purpose of improving the adhesion.

The resin developable with an alkali has an acid value of 20 to 300 and a weight average molecular weight of 1,500 to 20.
Those having a carboxyl group such as a copolymer of a styrene monomer and maleic acid or a derivative thereof (hereinafter, referred to as an SM polymer), acrylic acid or methacrylic acid are preferred. A copolymer of an unsaturated monomer having the same and a monomer such as a styrene monomer, an alkyl methacrylate such as methyl methacrylate, t-butyl methacrylate, or hydroxyethyl methacrylate, or an alkyl acrylate having the same alkyl group is preferable.

The SM copolymer is styrene such as styrene, α-methylstyrene, m or p-methoxystyrene, p-methylstyrene, p-hydroxystyrene, 3-hydroxymethyl-4-hydroxy-styrene or a derivative thereof. (Styrene monomer) and maleic anhydride, maleic acid, monomethyl maleate, monoethyl maleate, mono-n-propyl maleate, mono-isomaleate
There are copolymers of maleic acid derivatives such as -propyl, n-butyl maleate, mono-iso-butyl maleate and mono-tert-butyl maleate (hereinafter referred to as copolymer (I)). Examples of the copolymer (I) include those obtained by modifying the above-mentioned copolymer (I) with a compound having a reactive double bond, such as an alkyl methacrylate such as methyl methacrylate or t-butyl methacrylate (copolymer (II)).

The copolymer (II) is a copolymer (I)
The acid anhydride group or the carboxyl group contained therein is unsaturated alcohol, for example, allyl alcohol, 2-bran-1,2-olfurfuryl alcohol, oleyl alcohol, cinnamyl alcohol, 2-hydroxyethyl acrylate, hydroxyethyl methacrylate, N- An unsaturated alcohol such as methylol acrylamide, glycidyl acrylate, glycidyl methacrylate, allyl glycidyl ether, α-ethyl glycidyl acrylate, an epoxy compound having one oxirane ring and one reactive double bond such as monoalkyl monoglycidyl itaconate; It can be produced by reacting.
In this case, it is necessary that a carboxyl group necessary for performing alkali development remains in the copolymer. SM
In the case of a polymer having a carboxyl group other than the system polymer, it is preferable to impart a reactive double bond in the same manner as described above from the viewpoint of photosensitivity.

The synthesis of these copolymers is described in JP-B-47-2.
No. 5,470, JP-B-48-85679, JP-B-51-21572, and the like. When the thickness of the thin film layer is formed to be larger than the height difference of the unevenness of the temporary support having the unevenness, the uneven shape can be easily reproduced. If the film thicknesses are equal or thin, the uneven shape is deformed. In the case of forming unevenness, a problem described later may occur.

The coating method of the thin film layer and the undercoat layer used in the present invention includes a roll coater coating, a spin coater coating, a spray coating, a wool coater coating, a dip coater coating, a curtain flow coater coating, a wire bar coater coating, a gravure coater coating, and an air knife. Coater coating and the like. The thin film layer or the undercoat layer composition is applied on a temporary support or the like by the above method.

As the reflection film, a material may be appropriately selected according to a wavelength region to be reflected.
In the display device, the visible light wavelength range from 300 nm to 8 nm
A metal having a high reflectance at 00 nm, such as aluminum, gold, or silver, is formed by a vacuum evaporation method, a sputtering method, or the like. In addition, a reflection increasing film (described in Optical Introduction 2 (Junhei Tsujiuchi, Asakura Shoten, published in 1976)) may be laminated by the above method. The thickness of the reflection film is 0.01 μm to 5 μm.
0 μm is preferred. The reflection film may be formed in a pattern only by a photolithography method, a mask evaporation method, or the like at a necessary portion.

It is desirable that the cover film of the transfer film of the present invention is chemically and thermally stable and easily peelable from the thin film layer. Specifically, polyethylene,
It is preferable to use a thin sheet made of polypropylene, polyethylene terephthalate, polyvinyl alcohol or the like and having a high surface smoothness. It also includes those whose surface has been subjected to release treatment to impart releasability.

The peeled surface of each transfer film after transfer to the substrate may be between the thin film layer and the base film, between the thin film layer and the undercoat layer, or, if there is a reflective film, between the reflective film and the base film. Or it is between the reflective film and the undercoat layer.

However, depending on the purpose, in the case of a film structure having an undercoat layer and a reflective film, since the undercoat layer is laminated on the substrate, the separation surface between the undercoat layer and the base film can be set. For the purpose of laminating the undercoat layer on the substrate, when the undercoat layer has a function as an electrical insulating layer when the reflection film is used as an electrode, or when the undercoat layer has a role as a flattening layer of the reflection film unevenness. In some cases, a photosensitive resin is used for the undercoat layer to serve as an etching resist for the reflective film, and the undercoat layer is further colored to have a role as a partial light-shielding layer of the reflective film.

As a method of transferring the thin film layer and the reflective film on the temporary support to the substrate, there is a method in which the cover film is peeled off and heated and pressed on the substrate. When further adhesiveness is required, a method of cleaning the substrate with a necessary chemical solution, applying an adhesion-imparting agent to the substrate, or irradiating the substrate with ultraviolet rays or the like may be used. As a device for laminating the transfer film of the present invention, a roll laminator that sandwiches a substrate between a rubber roll that can be heated and pressurized and a base film, rotates the roll, and feeds the substrate while pressing the transfer film against the substrate is used. Is preferred.

The thickness of the thin film layer thus formed on the substrate surface is preferably in the range of 0.1 μm to 50 μm. At this time, when the thickness of the thin film layer is thicker than the maximum height difference of the uneven shape, the uneven shape is easily reproduced. When the film thickness is equal or thin, the thin film layer is broken through by the original convex portion, and a flat portion is generated, so that it is difficult to efficiently obtain diffuse reflection.

When a negative photosensitive resin is used for the thin film layer, exposure is performed by an exposing machine to impart stability to the shape, and the exposed portion is cured. The exposure machine applicable to the present invention includes a carbon arc lamp, an ultra-high pressure mercury lamp, a high pressure mercury lamp, a xenon lamp, a metal halide lamp, a fluorescent lamp, a tungsten lamp and the like.
This exposure apparatus may be a parallel exposure apparatus for forming patterns of pixels and BMs, but in the present invention, it is only necessary to be able to cure previously formed irregularities. It is sufficient that the light amount is given. Therefore, a UV irradiation device using scattered light that can be incorporated into a line generally used as a substrate cleaning device can be used. By using these apparatuses, the device can be manufactured at a lower cost as compared with a method using a photomask, and the tolerance for the exposure amount is larger than that in a case where a photomask is used.
Also, the photosensitive type was shown by using a negative mold material,
There is no problem even if it is a positive type.

The exposure is performed before or after the support (base film) is peeled off. A cushion layer may be provided on the base film for the purpose of improving the adhesion to the substrate and the followability.

In the above, the display device of the reflection type LCD has been shown and described, but the diffuse reflection plate made of the transfer film of the present invention can be used for a device which needs to diffusely reflect an external light beam. For example, there is a diffuse reflector for improving the efficiency of a solar cell. Further, the transfer film of the present invention can be used for manufacturing a light-shielding plate, a decorative plate, a ground glass, a white plate for a projection screen, an optical filter, a light-collecting plate, a light-attenuating plate, and the like. As described above, the transfer film of the present invention can be transferred to any glass plate, synthetic resin plate, synthetic resin film, metal plate, or metal foil. It can also be.

[0041]

(Example 1) Copper plating was carried out while rotating a cylindrical iron base material having a diameter of 130 mm, so that iron contained 20% of copper.
A prototype substrate having a thickness of 0 μm was obtained. This was polished and processed so that the surface became a mirror surface. Next, while rotating this, it is continuously pressed with a diamond needle with a tip angle of 145 degrees, and a roll type in which a square pyramid with a bottom side of 36.3 μm and a depth of 8.1 μm is pressed side by side is lined up. I got Next, this is dipped in a copper plating solution shown below while rotating, and the current is adjusted so that the current density (current value per 10 cm ^{2 of} plating area) becomes 8 (A / 10 cm ² ), and bright plating is performed. Was. Subsequently, the current was adjusted so that the current density became 2 in the same plating solution, and roughening plating was performed. Then, the substrate was washed with pure water to remove the plating solution. Next, in order to suppress oxidation of copper, bright nickel plating was performed while adjusting the current so as to have a current density of 2 while being immersed in a nickel plating solution described below to obtain a transfer master.

Copper plating solution: copper sulfate 210 g / liter sulfuric acid 60 g / liter thiourea 0.01 g / liter dextrin 0.01 g / liter hydrochloric acid 0.01 g / liter solution temperature 30 ° C.

Nickel plating solution: Nickel sulfate 240 g / L Nickel chloride 45 g / L Boric acid 30 g / L Bath temperature 50 ° C.

A 100 μm-thick polyethylene terephthalate film was used as a base film, and a photocurable resin solution having the following composition was applied on the base film by a comma coater and dried to a thickness of 20 μm. Then, the transfer master was pressed and irradiated with ultraviolet rays to cure the photocurable resin and separated from the transfer master, thereby obtaining an uneven film having uneven shapes formed on the surface of the photocurable resin layer (undercoat layer).

Photocurable resin (undercoat layer) solution: Acrylic acid / butyl acrylate / vinyl acetate copolymer 5 parts by weight butyl acetate (monomer) 8 parts by weight Vinyl acetate (monomer) 2 parts by weight Acrylic acid (monomer) 3 parts by weight Hexanediol acrylate (monomer) 0.2 parts by weight Benzoin isobutyl ether (initiator) 2.5% by weight

Next, a solution for forming a thin film layer described below is applied on a photocurable resin layer (undercoat layer) on which the irregularities are formed by a comma coater so as to have an average thickness of 8 μm, and dried.
A transfer film was obtained by coating a polyethylene film as a cover film. Thin film layer forming solution: Styrene, methyl methacrylate, ethyl acrylate, acrylic acid, glycidyl methacrylate copolymer resin was used as a polymer (polymer A). The molecular weight is about 35,000 and the acid value is 110. Parts are parts by weight (the same applies hereinafter). Polymer A 70 parts by weight Pentaerythritol tetraacrylate (monomer) 30 parts by weight Irgacure 369 (trade name of Ciba Specialty Chemicals Co., Ltd.) (Initiator) 2.2 parts by weight N, N-tetraethyl-4,4 ' -Diaminobenzophenone (Initiator) 2.2 parts by weight Propylene glycol monomethyl ether (solvent) 492 parts by weight p-methoxyphenol (polymerization inhibitor) 0.1 part by weight Perfluoroalkyl alkoxylate (surfactant) 0.01 part by weight Department

While peeling off the cover film of the transfer film, a substrate temperature of 90 ° C. was applied using a laminator (roll laminator HLM 1500, trade name of Hitachi Chemical Technoplant Co., Ltd.) so that the thin film layer was in contact with the glass substrate.
Laminate at a roll temperature of 80 ° C., a roll pressure of 7 kg / cm ² and a speed of 0.5 m / min, and form a thin film layer on a glass substrate.
A substrate on which a photocurable resin layer (undercoat layer) and a base film were laminated was obtained. Next, a photocurable resin layer (undercoat layer),
The base film was peeled off to obtain a thin film layer on the glass substrate having the same shape as that of the transfer mold. This is 23 in the oven
Thermal curing was performed at 0 ° C. for 30 minutes, and an aluminum thin film was laminated to a thickness of 0.2 μm by a vacuum evaporation method to form a reflective layer.

FIG. 8 shows the incident angle dependence of the reflection intensity (relative intensity with respect to the standard white plate) when the azimuth (φ) is fixed. Sufficient reflection intensity was obtained in the range of the incident angle of −40 ° to 40 °, and a diffuse reflection plate having excellent reflection characteristics was obtained.

Example 2 An aluminum thin film was laminated on the uneven surface of the uneven film of Example 1 by a vacuum evaporation method to a thickness of 0.2 μm to form a reflective layer. It was found that a uniform and sufficient reflection intensity was obtained in the range of the incident angle of −40 ° to 40 °, and that a diffuse reflection plate having excellent reflection characteristics was obtained.

(Example 3) The same thin film layer forming solution as in Example 1 was applied to a glass substrate as a permanent substrate, spin-coated at 2,000 rotations for 15 seconds, and heated on a hot plate for 90 seconds.
C. for 2 minutes to obtain an 8 .mu.m thin film layer. Next, the substrate temperature was set to 9 using a laminator (roll laminator HLM1500, trade name of Hitachi Chemical Technoplant Co., Ltd.) so that the uneven surface of the uneven film of Example 1 faces the thin film layer.
0 ° C., roll temperature 80 ° C., roll pressure 7 kg / cm ² ,
Lamination was performed at a speed of 0.5 m / min to obtain a substrate in which a thin film layer, a photocurable resin layer (undercoat layer), and a base film were laminated on a glass substrate. This was irradiated with ultraviolet rays by an exposure device, and then the photocurable resin layer (undercoat layer) and the base film were peeled off, to obtain a thin film layer having the same irregularities as the original transfer pattern on the glass substrate. Next, heat curing was performed in an oven at 230 ° C. for 30 minutes.
A reflective layer was formed by laminating the layers so as to have a thickness of μm to prepare a diffuse reflector. As a result, a uniform and sufficient reflection intensity was obtained in the range of the incident angle of −40 ° to 40 °, and a diffuse reflection plate having excellent reflection characteristics was obtained.

(Comparative Example 1) As in Example 1, the diameter was 130
While rotating the cylindrical iron base material of mm, copper plating was performed to obtain a prototype base material in which 200 μm of copper was laminated on iron. This was polished and the surface was mirror-finished. Next, while rotating this, it is continuously pressed with a diamond needle with a tip angle of 145 degrees, and a roll type in which a square pyramid with a bottom side of 36.3 μm and a depth of 8.1 μm is pressed side by side is lined up. I got This was directly subjected to bright nickel plating to obtain a transfer prototype. A 100 μm-thick polyethylene terephthalate film was used as a base film, and a photocurable resin solution (same as in Example 1) was applied on the base film by a comma coater and dried to a thickness of 20 μm. Next, the transfer mold was pressed and irradiated with ultraviolet rays to cure the photocurable resin and separated from the transfer mold, thereby obtaining a concavo-convex film in which the concavo-convex shape was formed on the surface of the photocurable resin layer (undercoat layer).
The same thin film layer forming solution as in Example 1 was applied to a glass substrate to be a permanent substrate, spin-coated at 2,000 rpm for 15 seconds, and heated at 90 ° C. for 2 minutes on a hot plate to 8 μm
Was obtained. Next, a laminator (roll laminator HLM15) is used so that the uneven surface of the uneven film faces the thin film layer.
Substrate temperature 90 ° C., roll temperature 80 ° C., roll pressure 7 using Hitachi Chemical Technoplant Co., Ltd.
Lamination was performed at a rate of 0.5 m / min at a rate of Kg / cm ² to obtain a substrate in which a thin film layer, a photocurable resin layer (undercoat layer), and a base film were laminated on a glass substrate. This was irradiated with ultraviolet rays by an exposure device, and then the photocurable resin layer (undercoat layer) and the base film were peeled off, to obtain a thin film layer having the same irregularities as the original transfer pattern on the glass substrate. Next, in the oven 230
After heat curing at 30 ° C. for 30 minutes, a reflective layer was formed by laminating an aluminum thin film to a thickness of 0.2 μm by vacuum evaporation. This reflector produced an iridescent color. Further, as shown in FIG. 9, the reflection characteristics had peaks at -40 degrees and +40 degrees, and a diffuse reflection plate having uniform brightness from -40 to +40 was not obtained.

[0052]

According to the present invention, it is possible to efficiently manufacture a diffuse reflection plate having good reflection characteristics for use in a reflection type liquid crystal display device or the like by using the uneven film and the transfer film of the present invention. By doing so, the reflection characteristics of the diffuse reflection plate can be freely controlled, and the reflection characteristics with good reproducibility can be obtained. As described above, the transfer film of the present invention can easily impart a surface shape having a predetermined function to an appropriate substrate.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view illustrating an example of a process of manufacturing a transfer prototype according to the present invention.

FIG. 2 is a sectional view showing an example of the transfer film of the present invention.

FIG. 3 is a cross-sectional view showing an example of a diffuse reflection plate manufactured using the transfer film of the present invention.

FIG. 4 is a cross-sectional view showing a production example of a diffuse reflection plate using the transfer film of the present invention.

FIG. 5 is a sectional view of a reflective LCD.

FIG. 6 is a perspective view showing an example of a congruent shape of the transfer prototype of the present invention.

FIG. 7 is a perspective view showing an apparatus for measuring the reflection characteristics of a diffuse reflection plate.

FIG. 8 is a diagram showing the incident angle dependence of the reflection characteristics of the diffuse reflection plate of Example 1.

FIG. 9 is a diagram showing the incident angle dependence of the reflection characteristics of the diffuse reflection plate of Comparative Example 1.

[Explanation of symbols]

 1. Glass substrate 2. 2. Thin film layer Reflective film 4. Base film 5. Cover film 6. Undercoat layer 11. Color filter 12. Black matrix 13. Transparent electrode 14. Flattening film 15. Alignment film 16. Liquid crystal layer 17. Spacer 18. Retardation film 19. Polarizing plate 20. Sample 21. Reflected light 22. Incident light ray 23. Luminance meter

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[Procedure amendment]

[Submission date] September 10, 1999 (1999.9.1
0)

[Procedure amendment 1]

[Document name to be amended] Drawing

[Correction target item name] Fig. 4

[Correction method] Change

[Correction contents]

FIG. 4

 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Yasuo Tsuruoka 48 Wadai, Tsukuba, Ibaraki Prefecture Within Hitachi Chemical Co., Ltd. In-house (72) Inventor Keiko Kizawa 48 Wadai, Tsukuba-shi, Ibaraki F-term in Hitachi Chemical Co., Ltd. Research Laboratories F-term (reference) AD19 AD32 AH78 AJ02 AJ09 PA03 PB02 PC05 PG05 PG14 PH02 PH27 PN09 PQ03 PW06 PW37 PW43

Claims (13)

[Claims] 1. A roughened shape in which one or more congruent shapes are adjacently formed on the surface of a molding die, and roughening plating is randomly formed on the unevenness. Transcription prototype. 2. The transfer prototype according to claim 1, which has a roughened shape subjected to gloss plating before or after roughening plating. 3. The transfer prototype according to claim 1, wherein the congruent shape is a shape in which a part of a spherical surface, a cone or a regular polygonal pyramid is pressed adjacently. 4. A step of forming a concavo-convex portion in which one or more congruent shapes are adjacently arranged on a surface of a molding die, and a step of performing roughening plating on the concavo-convex portion. For producing a transfer prototype having a roughened shape. 5. A step of forming a concavo-convex portion in which one or more types of congruent shapes are adjacently arranged on the surface of a molding die, and a step of performing a roughening plating before or a subsequent roughening plating 5. The method for producing a transfer master according to claim 4, wherein the surface having a step of performing bright plating after the step has a roughened shape formed randomly. 6. An uneven film whose shape has been transferred by pressing the transfer prototype according to any one of claims 1 to 3 against an undercoat layer applied to a transferred film or a base film. 7. A diffuse reflection plate, wherein a reflection film is provided on an uneven surface of the uneven film according to claim 6. 8. The uneven film according to claim 6, wherein the thin film layer is laminated on the irregular surface of the temporary support, and the surface of the thin film layer which is not laminated on the temporary support is transferred. Transfer film that constitutes the adhesive surface to the substrate. 9. The transfer film according to claim 8, wherein a reflection film is laminated between the uneven film and the thin film layer. 10. A step of pressing the transfer film according to claim 8 so that the thin film layer faces a permanent substrate, a step of peeling off the temporary support, and a step of forming a reflective film on the uneven surface of the thin film layer. Diffuse reflector manufactured by. 11. A step of pressing the uneven film according to claim 6 against a thin film layer formed on a permanent substrate so that the uneven surface faces, a step of peeling the uneven film, and forming a reflective film on the surface. A diffuse reflection plate manufactured by a forming process. 12. A diffuse reflection plate manufactured by a step of pressing the transfer film according to claim 9 against a permanent substrate so that the thin film layer faces the same, and a step of peeling off the temporary support. 13. The substantially congruent shape is a portion of a spherical surface,
13. The diffuse reflection plate according to claim 7, wherein the diffuse reflection plate has a shape in which a cone or a regular polygonal pyramid is pressed adjacently.