JP2000284106A - Light diffusion member, its production and transfer film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a light diffusion member with a light diffusion face which improves the light diffusion characteristics of a diffusion reflection plate for reflection type LCD with high production efficiency by providing a light diffusion face that is a face obtained by transferring the rugged shape of a sandblasted surface. SOLUTION: The top of a glass substrate 1 is spin-coated with a solution for forming a thin film layer to form a thin film layer 4. A PET film with a sandblasted surface is laminated in such a way that the sandblasted surface comes in contact with the thin film layer 4 to obtain a substrate with the thin film layer 4 and the PET film laminated on the substrate 1. The PET film is then peeled and the thin film layer 4 with a fine rugged surface is obtained. After heat curing, a thin aluminum film is laminated by vacuum deposition to form a reflection film 3. The solution for forming a thin film layer contains a polymer of styrene, methyl methacrylate or the like. The rugged shape of the sandblasted surface preferably has 0.7-150 μm average pitch.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is used for a reflection type liquid crystal display device which does not require a backlight, an anti-glare film which is disposed in front of the display device to prevent transfer, and a solar cell which requires a high efficiency. The present invention relates to a light diffusion member, a method for manufacturing the light diffusion member, and a transfer film used for manufacturing the light diffusion member.

[0002]

2. Description of the Related Art Liquid crystal displays (hereinafter abbreviated as LCDs)
Utilizing features such as thinness, small size, and low power consumption, is currently used for display units such as watches, calculators, TVs, and personal computers. In recent years, color LCDs have been developed and OA / AV
It is beginning to be used for many purposes, such as navigation systems, viewfinders, and personal computer monitors, mainly for equipment, and the market is expected to expand rapidly in the future. In particular, reflective LCDs that perform display by reflecting light incident from the outside are attracting attention as portable terminal equipment because they do not require a backlight, consume less power, and can be made thinner and lighter. ing.

Conventionally, a reflection type LCD employs a twisted nematic system and a super twisted nematic system. In these systems, however, half of the incident light is not used for display by a linear polarizer, and the display becomes dark. turn into. Therefore, the number of polarizers was reduced to one, and a method combined with a retardation plate or a phase transition type guest
A host display mode has been proposed. FIG. 2 is a cross-sectional view of a reflective LCD, wherein 1 is a glass substrate,
Is a thin film layer, 3 is a reflection film, 11 is a color filter, 12 is a black matrix, 13 is a transparent electrode, 14 is a flattening film, 15 is an alignment film, 16 is a liquid crystal layer, 17 is a spacer, 1
8 is a retardation film, 19 is a polarizing plate.

In order to obtain a bright display by efficiently using external light in a reflective LCD, it is necessary to further increase the intensity of light scattered in a direction perpendicular to the display screen with respect to incident light from all angles. There is. Therefore, it is necessary to control the reflection film on the reflection plate so as to obtain appropriate reflection characteristics. A method in which a photosensitive resin is applied to a substrate and patterned using a photomask to form irregularities, and a metal thin film is formed to form a diffuse reflection plate (Japanese Patent Laid-Open No. 4-2432).
No. 26) has been proposed.

[0005]

In the above-mentioned method, in order to form irregularities, each substrate is exposed with a photomask,
Since there is a developing step, the step is complicated, and it cannot be said that the cost is low and the productivity is high. Further, in the case of a photomask, the uneven shape is easily changed by processes such as development and post-baking, and it is difficult to stably produce a diffuse reflection plate having a constant reflection characteristic. In order to further improve the reflection characteristics,
When it is desired to obtain a diffuse reflection plate having a plurality of uneven heights, the above method requires a plurality of times of application, exposure, and development of a photosensitive resin, which makes the process more complicated. The present invention provides a light diffusing member having a light diffusing surface, which has a high production efficiency and improves light diffusing characteristics, such as a diffuse reflection plate for a reflective LCD, and a transfer film used for the production thereof.

[0006]

The light diffusing member of the present invention comprises:
It has a light diffusing surface to which the uneven shape of the sandblasted surface is transferred. Further, the light diffusion member of the present invention has a light diffusion surface on which the surface on which the uneven shape of the sandblasted surface is transferred is transferred. A reflection film can be formed on the light diffusion surface. In the light diffusing member of the present invention, the ratio (R / R0) of the reflected light intensity (R) of the light diffusing surface when the reflecting film is formed to the reflected light intensity (R0) of the perfect diffusing surface is 60 in the diffusion direction. It becomes less than 1 in the region of not less than 1 degree, and becomes 1 or more in the diffusion direction of 15 degrees. The unevenness of the sandblasted surface preferably has an average pitch of 0.7 to 150 μm. The method for producing a light diffusing member of the present invention includes a step of transferring an uneven shape of a sandblasted surface coated on at least a part of a roll core material surface, a belt surface, or a roll surface. After the sandblasting step, it is preferable to include at least one of (1) a copper etching step and (2) a lamination step of a chemically stable thin film. The chemically stable thin film is preferably nickel, chromium, or a laminated plating thin film of nickel and chromium. A thin film layer is laminated on the temporary support on which the light diffusion surface is formed, and a surface of the thin film layer that is not laminated on the temporary support can be a transfer film that constitutes an adhesive surface to the transferred substrate. . According to the present invention, a diffuse reflector for a reflective liquid crystal display having the light diffusing surface formed thereon,
An anti-glare film and a light diffusion plate for a solar cell are provided. .

[0007]

DESCRIPTION OF THE PREFERRED EMBODIMENTS According to the method of forming a light diffusion surface such as a diffuse reflection plate for a reflection type LCD of the present invention, a thin film layer is formed on a surface of a substrate where unevenness is to be formed, and the thin film layer is formed on the surface. By pressing the sandblasted surface, it is possible to form a light diffusion surface having a large number of fine irregularities on the surface with a simpler process and at lower cost than the method of patterning with a photomask. If a reflective film such as a metal thin film is further formed thereon, a desired diffuse reflector can be obtained. Also, if a refractive index difference is provided between the media forming the light diffusing surface instead of the reflection film, a desired light diffusing plate can be obtained.

Further, the step of laminating a thin film layer on the surface of the sandblasted surface and the step of transferring the thin film layer to the surface of the substrate on which the unevenness is to be formed are simpler than the method of patterning with a photomask, and a large number of steps can be performed at low cost. A thin film layer having fine irregularities can be formed. If a reflective film such as a metal thin film is further formed thereon, a desired diffuse reflector can be obtained. Also,
If a refractive index difference is provided between the media forming the light diffusing surface instead of the reflective film, a desired light diffusing plate can be obtained.

Further, a cover film is formed using a transfer film in which a base film, a thin film layer, and a cover film, which are processed to have a large number of fine irregularities on the surface by pressing the sandblasted surface, are sequentially laminated. Laminating so that the thin film layer is in contact with the substrate while peeling, laminating the thin film layer and the base film on the substrate, and peeling the base film can form a thin film layer having a large number of fine irregularities on the surface of the substrate on the substrate. . If a reflective film such as a metal thin film is further formed thereon, a desired diffuse reflector can be obtained. Also, if a refractive index difference is provided between the media forming the light diffusing surface instead of the reflection film, a desired light diffusing plate can be obtained. In addition, using a transfer film in which a reflective film is laminated between a thin film layer and a base film in advance, laminating so that the thin film layer is in contact with the substrate while peeling off the cover film, and forming the thin film layer, reflective film, and base film on the substrate By laminating and peeling only the base film, a desired diffuse reflection plate is obtained.

A base film may be provided with a deformable undercoat layer, and a layer formed by a step of pressing a sandblasted surface against this layer and a step of curing the undercoat layer may be used in place of the base film. Since the sandblasted surface is used to use the uneven shape of the surface, it can be used a plurality of times by transfer. This makes it possible to manufacture the light diffusing surface at a lower cost than when using the sandblasted surface itself.

The sandblasted surface should be a sheet, belt, roll, roll, or part of a curved surface having a large number of fine irregularities formed on the entire surface or on required portions of the surface of the substrate. It may be attached to a pressing device or sandwiched between a surface on which unevenness is formed and the pressing device. Heat, light, or the like may be given in the pressing step. Further, by seamlessly forming the belt-shaped, roll-shaped, and roll-shaped sandblasted surfaces, the light diffusion surface can be easily made seamless. It is usually necessary to design the degree of unevenness of the sandblasted surface in consideration of deformation due to curing of the thin film layer. Assuming that the deformation rate due to the curing of the thin film layer is a, the difference in height between the concave portion and the convex portion is 0.1 μm to 15 μm as the cured shape of the thin film layer.
m, more preferably 0.1 μm to 5 μm, and the pitch of the projections is preferably 0.7 μm or more and 150 μm or the smaller of the pixel pitch, and more preferably 2 μm or more and 150 μm or the smaller of the pixel pitch. .

FIG. 1 is a sectional view of a diffuse reflection plate having a light diffusing surface of the present invention, FIG. 3 is a sectional view of a metal plating film used for forming the light diffusing surface of the present invention, and FIG. FIG. 5 is a cross-sectional view of a metal plating film used for forming a light diffusion surface of the present invention. FIG. 5 is a cross-sectional view of a metal plating film used for forming a light diffusion surface of the present invention. Base material,
3 is a reflective film, 4 is a thin film layer, 5 is a chemically stable thin film, 6
Is a core material.

FIG. 8 shows an apparatus for measuring the reflection characteristics of a diffuse reflection plate according to the present invention. Assuming that the angle between the reflected light beam 21 and the incident light beam 22 is θ, a diffuse reflector having excellent reflection characteristics can be obtained by increasing the luminance observed in the normal direction of the diffuse reflector, that is, the reflection intensity within the required θ range. can get. When the required range of θ is −60 ° to 60 °, the diffuse reflection plate in which the concave and convex portions are formed with the concave curved surface as shown in FIG. 9 has the concave and convex portions as shown in FIG. If the relationship between the height H and the pitch P of the projections is near a straight line represented by the relational expression of P = 7 × H, a diffuse reflector having excellent reflection characteristics can be obtained. When θ is −15 ° to 15 °, a diffuse reflector having excellent reflection characteristics can be obtained near a straight line represented by the relational expression of P = 30 × H. This means that if one seeks to obtain diffuse reflection with respect to the normal with a light source within a range of 60 degrees and further obtains a strong reflection within a range of 15 degrees, the relational expression of P = 7 × H and P
= 30 × H indicates that the area near the two straight lines represented by the relational expression can be formed into a composite shape. Of course, it is not limited that all the irregularities are included in the range near the above-mentioned two straight lines. This is because a plurality of shapes are naturally formed in the uneven shape forming process. In addition, it is necessary to consider the uniformity of the gap of the liquid crystal layer and the influence of light interference.

Therefore, the degree of unevenness of the sandblasted surface is such that the difference between the height of the concave portion and the height of the convex portion on the convex curved surface is 0.1 ×.
a μm to 15 × a μm, further 0.1 × a μm to 5
× a μm, the pitch of the projections is 0.7 μm or more and 150 μm or the smaller of the pixel pitch, and 2
It is preferable that the distance be equal to or larger than 150 μm or the smaller of the pixel pitch. The value of a differs depending on the material of the thin film layer, and may be, for example, 2 or 1 or 0.7. The above is an example of the case where the unevenness of the diffuse reflection plate is formed by the concave curved surface as shown in FIG. 9. However, when the unevenness of the diffuse reflection plate is formed by the concave and convex composite surface as shown in FIG. On the other hand, the diffuse reflection from the light source within 60 degrees is a straight line in which the relationship between the height H of the concave portion and the convex portion and the pitch P of the convex portion as shown in FIG. In the vicinity, the reflection characteristics are excellent. The uneven shape does not need to be periodically arranged in the plane, and may be irregular. In the case of LCDs, moiré occurs when the periodicity different from the pixel pitch is uneven, so that the periodicity of the unevenness is the same as the pixel pitch or a period divided by an integer, or the unevenness is arranged in an irregular arrangement. Is preferred.
In addition, the irregularities on the sandblasted surface are arranged in an irregular array.
Moire does not occur when used for D.

The surface shape of the irregularities is not particularly limited, but is not limited to a composite plane, but may be a concave or convex curved surface, a concave / convex composite curved surface, a concave or convex curved surface approximating a spherical surface or a parabolic surface, or a concave / convex curved surface. It is preferably a curved surface. This is because, by making the surface curved, diffused light from a wider range of light source positions can be expected.

Particularly, in the case of a diffuse reflection plate for a reflection type LCD, L
Since the light diffusion surface needs to be formed in the CD cell, the average height difference H is preferably as small as possible in consideration of the cell gap and Δnd. However, since the pitch P of the convex portions cannot be made small enough to cause light interference, from the above-described relational expression between P and H,
The lower limit of the average height difference H is obtained. In the following, θ will be discussed as an absolute value for easy understanding. The refractive index n of the LCD cell is
Depending on the structure, for example, the required diffusion direction θ when n = 1.3 is a region of less than 50.3 degrees. 5
A diffusion direction of 0.3 degrees or more causes total reflection at the interface between the LCD cell and the atmosphere. Therefore, it is necessary to keep the reflection intensity R in the diffusion direction of 50.3 degrees or more low and increase the reflection intensity R of less than 50.3 degrees. For example, when n = 1.5, the required diffusion direction θ is a region of less than 41.8 degrees. 4
A diffusion direction of 1.8 degrees or more causes total reflection at the interface between the LCD cell and the atmosphere. Therefore, it is necessary to keep the reflection intensity R in the diffusion direction of 41.8 degrees or more low and increase the reflection intensity R of less than 41.8 degrees. Generally, when people look at LCD,
View from the front of the LCD. In this case, light incident on the LCD from a certain direction of the human eyes is small, and incident light from a direction forming an angle of 10 degrees or more from the certain direction of the human eyes is large. For example, when n = 1.5, the incident light from the atmosphere at 22.8 degrees becomes 15 degrees at the interface between the LCD cell and the atmosphere. Therefore, it is necessary to particularly increase the reflection intensity R near the direction of θ = 15 degrees of the diffuse reflection plate formed in the LCD cell. For example, when n = 1.3, incident light from the air at 19.7 degrees is 15 degrees at the interface between the LCD cell and the air. Therefore, it is necessary to particularly increase the reflection intensity R near the direction of θ = 15 degrees of the diffuse reflection plate formed in the LCD cell. In order to manufacture a light diffusing surface used for a diffuse reflection plate for a reflective LCD,
In view of the above-described reflection intensity characteristics, it is necessary to design the average height difference H and the pitch P based on a relational expression.

The sandblasted surface of the present invention is made of PET
Formed on plastics, metals, metal oxide films, etc.
The control of the unevenness of the sandblasted surface is usually controlled by the sand particle size, the blast condition, or both the sand particle size and the blast condition. A commercially available sandblasted PET film may be purchased from Teijin, Toyobo, or the like to obtain a sandblasted surface.

In particular, a PET film having a sandblasted surface is inexpensive, and the light diffusion direction distribution by the light diffusion surface after transfer is controlled by controlling the average pitch and the average height difference according to the sand particle size, blast conditions and the like. It has features that can be easily controlled and optimized. In addition, a metal having a sandblasted surface has a feature that the distribution of the light diffusion direction by the light diffusion surface after transfer can be easily controlled and optimized by controlling the average height difference by etching or the like. The etching method can be easily performed by using an etching solution containing sulfuric acid, hydrochloric acid, citric acid, ammonium persulfate, sulfuric acid, hydrogen peroxide or the like as a main component. Further, it is also possible by dry etching such as ion milling and RIE. For the purpose of protecting the surface of the sandblasted surface, a chemically stable thin film can be laminated on the sandblasted surface.
In this case, the purpose may be to improve the wear resistance. When the sandblasted surface is a metal that is easily oxidized, a chemically stable thin film is necessary because the sandblasted surface is easily oxidized in the air atmosphere. Examples of the chemically stable thin film include a metal film such as a nickel film and a chromium film, and a metal oxide film. Methods for forming a chemically stable thin film include plating, vacuum deposition, sputtering, CVD, and anodic oxidation.

The reflection type LCD display device has been described above.
The light diffusing surface of the present invention can be used for devices that need to diffuse external light. For example, there is a light diffusion surface of a diffuse reflection plate for the purpose of improving the efficiency of a solar cell. For example, there is an anti-glare treated surface for the purpose of preventing reflection on the display surface. In addition, there is a light diffusing surface of the transfer film used in their manufacture. FIG.
Is a cross-sectional view of the solar cell, 30 is a semiconductor layer, and 31 is a transparent electrode.

[0020]

EXAMPLE 1 Example 1 will be described with reference to FIG. The following thin film layer forming solution is spin-coated on a glass substrate 1 to form a thin film layer 4 having a thickness of 2 μm. Next, Teijin Tetron film mat PS1
The substrate temperature was 90 ° C., the roll temperature was 80 ° C., the roll pressure was 7 kg / cm 2, and the speed was 0.
Lamination was performed at 5 m / min to obtain a substrate in which a thin film layer and a tetron film were laminated on a glass substrate. Next, the tetron film was peeled off to obtain a thin film layer 4 having a surface with irregular irregularities on the glass substrate. Next, in an oven at 230 ° C, 3
After heat curing for 0 min, a reflective layer was formed by laminating an aluminum thin film to a thickness of 0.2 μm by vacuum evaporation. FIG. 13 shows the incident angle dependence of the reflection intensity (relative intensity with respect to the standard white plate) when the azimuth (φ) is fixed. It was found that a sufficient reflection intensity was obtained in the range of the incident angle of −60 ° to 60 °, and that a diffuse reflection plate having excellent reflection characteristics could be obtained. Thin film layer forming solution: Styrene, methyl methacrylate, ethyl acrylate, acrylic acid, glycidyl methacrylate copolymer resin was used as a polymer (polymer A). The molecular weight is about 35,000 and the acid value is 110. Parts are parts by weight (the same applies hereinafter). (Polymer) 70 parts of polymer A (monomer) 30 parts of pentaerythritol tetraacrylate (photoinitiator) 2.2 parts of Irgacure 369 (Chiba Specialty Chemicals) 2.2 parts of N, N-tetraethyl-4,4'-diaminobenzophenone 2.2 Parts (solvent) Propylene glycol monomethyl ether 492 parts (polymerization inhibitor) p-methoxyphenol 0.1 part (surfactant) Perfluoroalkyl alkoxylate 0.01 part

Embodiment 2 This will be described with reference to FIG. The copper tube was sand-blasted with 5 μm silica, and then soft-etched with 1 wt% of dilute sulfuric acid for 20 sec.
Rust prevention treatment was carried out with a solution obtained by diluting 5A to 5 times to obtain a roll master having a fine shape. Next, a thickness of 1
Using a 00 μm polyethylene terephthalate film, a photosensitive resin composition having the following composition was dissolved on this base film with a solvent (propylene glycol monoethyl ether acetate), and coated and dried with a comma coater to a thickness of 20 μm to form an undercoat layer. It was set to 9. Next, the roll master was pressed and irradiated with ultraviolet rays to cure the photocurable resin, the roll master was separated, and irregular irregularities were formed on the surface of the photocurable resin layer (undercoat layer). Next, a solution for forming a thin film layer described below is applied to the photocurable resin layer (undercoat layer) with a comma coater to a thickness of 2 μm and dried to form a thin film layer 4, and a polyethylene film is coated as a cover film 8. A transfer film was obtained.

Next, while peeling off the cover film of the transfer film, a laminator (roll laminator HLM1500, trade name of Hitachi Chemical Technoplant Co., Ltd.) is used to set the substrate temperature to 90 so that the thin film layer 4 contacts the glass substrate 1.
° C, roll temperature 80 ° C, roll pressure 7 kg / square cm,
Lamination was performed at a speed of 0.5 m / min to obtain a substrate in which a thin film layer, a photocurable resin layer (undercoat layer), and a base film were laminated on a glass substrate. Next, the photocurable resin layer (undercoat layer) and the base film were peeled off to obtain a thin film layer having a surface with irregular irregularities on a glass substrate. Then, in the oven 2
The film was thermally cured at 30 ° C. for 30 minutes, and an aluminum thin film was laminated to a thickness of 0.2 μm by a vacuum evaporation method to form a reflective layer. FIG. 14 shows the incident angle dependence of the reflection intensity (relative intensity with respect to the standard white plate) when the azimuth (φ) is fixed. It was found that a sufficient reflection intensity was obtained in the range of the incident angle of −60 ° to 60 °, and that a diffuse reflection plate having excellent reflection characteristics could be obtained. Photosensitive resin solution (% is% by weight): butyl acrylate-vinyl acetate copolymer resin 33% butyl acrylate (monomer) 53% vinyl acetate (monomer) 8% acrylic acid (monomer) 2% hexinediol acrylate (Monomer) 1% Benzoin isobutyl ether (photoinitiator) 3% Thin film layer forming solution: Styrene, methyl methacrylate, ethyl acrylate, acrylic acid, glycidyl methacrylate copolymer resin was used as a polymer (polymer A). The molecular weight is about 35,000 and the acid value is 110. Parts are parts by weight (the same applies hereinafter). (Polymer) 70 parts of polymer A (monomer) 30 parts of pentaerythritol tetraacrylate (photoinitiator) 2.2 parts of Irgacure 369 (Chiba Specialty Chemicals) 2.2 parts of N, N-tetraethyl-4,4'-diaminobenzophenone 2.2 Parts (solvent) Propylene glycol monomethyl ether 492 parts (polymerization inhibitor) p-methoxyphenol 0.1 part (surfactant) Perfluoroalkyl alkoxylate 0.01 part

[0023]

According to the light diffusing member of the present invention such as a reflection type liquid crystal display device, a light diffusing member such as a diffuse reflection plate having good reflection characteristics can be manufactured efficiently, and fine irregularities are formed in advance. By appropriately setting the reflection characteristics, the reflection characteristics can be freely controlled and the reflection characteristics with good reproducibility can be obtained.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view of a diffuse reflection plate using a light diffusion surface according to the present invention.

FIG. 2 is a cross-sectional view of a reflective LCD.

FIG. 3 is a cross-sectional view of a metal plating film used for forming a light diffusion surface according to the present invention.

FIG. 4 is a cross-sectional view of a metal plating film used for forming a light diffusing surface according to the present invention.

FIG. 5 is a cross-sectional view of a metal plating film used for forming a light diffusion surface according to the present invention.

FIG. 6 is a cross-sectional view of a thin film layer on which a light diffusion surface is formed according to the first embodiment of the present invention.

FIG. 7 is a cross-sectional view illustrating a manufacturing process of a transfer film having a light diffusing surface and a diffuse reflection plate formed of the transfer film according to the second embodiment of the present invention.

FIG. 8 is a perspective view of an apparatus for measuring a reflected light characteristic of a light diffusing surface according to the present invention.

FIG. 9 is a sectional view of a diffuse reflection plate according to the present invention.

10 is a diagram showing a relationship between an angle formed by the light source and the front surface of the diffuse reflection plate shown in FIG. 9 of the present invention, a difference in height of the concave and convex portions, and a pitch of the convex portions.

FIG. 11 is a sectional view of a diffuse reflection plate according to the present invention.

FIG. 12 is a diagram showing the relationship between the angle formed by the light source and the front surface of the diffuse reflection plate shown in FIG. 11 of the present invention, the difference between the heights of the concave and convex portions, and the pitch of the convex portions.

FIG. 13 is a graph showing the incident angle dependence of the reflection characteristics of the diffuse reflection plate according to the first embodiment of the present invention.

FIG. 14 is a graph showing the incident angle dependence of the reflection characteristics of the diffuse reflection plate of Example 2 of the present invention.

FIG. 15 is a cross-sectional view of a solar cell.

[Explanation of symbols]

 1. Glass substrate 2. 2. Sandblasted surface base material Reflective film 4. 4. Thin film layer 5. Chemically stable thin film Core material 7. Base film 8. 8. cover film Undercoat layer 12. Anti-glare film 13. Pixel electrode 14. Thin film transistor 15. Alignment film 16. Liquid crystal layer 17. Spacer 18. Retardation film 19. Polarizing plate 20. Sample 21. Reflected light 22. Incident light ray 23. Luminance meter 30. Semiconductor layer 31. Transparent electrode

Continued on the front page (72) Inventor Nobuaki Takane 48 Wadai, Tsukuba, Ibaraki Prefecture, Hitachi Chemical Co., Ltd.Tsukuba Development Laboratories (72) Inventor Keiko Kizawa 48 Wadai, Tsukuba, Ibaraki Pref. F-term (reference) 2H042 BA03 BA14 BA15 BA20 2H091 FA08X FA11X FA14X FA14Y FA31X FA31Y FA37X FB08 FC01 FC06 FC25 FC26 FD06 FD14 GA12

Claims (12)

[Claims] 1. A light diffusing member having a light diffusing surface to which the uneven shape of a sandblasted surface is transferred. 2. A light diffusing member having a light diffusing surface on which a surface on which a concavo-convex shape of a sandblasted surface is transferred is transferred. 3. The light diffusion member according to claim 1, wherein a reflection film is formed on the light diffusion surface. 4. The ratio (R / R0) of the reflected light intensity (R) of the light diffusing surface when the reflecting film is formed to the reflected light intensity (R0) of the perfect diffusing surface is 60 degrees or more in the diffusion direction. The light diffusion member according to claim 1, wherein the light diffusion member is less than 1 in a region and is 1 or more in a diffusion direction of 15 degrees. 5. The unevenness of the sandblasted surface is as follows:
The light diffusing member according to any one of claims 1 to 4, wherein the average pitch is 0.7 to 150 m. 6. The method according to claim 1, further comprising the step of transferring the uneven shape of the sandblasted surface coated on at least a part of the roll core material surface, the belt surface or the roll surface.
A method for producing the light diffusing member according to any one of the above items. 7. The method for manufacturing a light diffusing member according to claim 6, further comprising at least one of (1) an etching step and (2) a lamination step of a chemically stable thin film after the sandblasting step. 8. The method for manufacturing a light diffusing member according to claim 7, wherein the chemically stable thin film is nickel, chromium, or a laminated plating thin film of nickel and chromium. 9. A thin film layer is laminated on the temporary support on which the light diffusion surface according to claim 1 is formed, and a surface of the thin film layer which is not laminated on the temporary support is a transferred substrate. Transfer film that constitutes the surface to be adhered to. 10. A diffuse reflection plate for a reflection type liquid crystal display, wherein the light diffusion surface according to claim 1 is formed. 11. An anti-glare film on which the light diffusing surface according to claim 1 is formed. 12. A light diffusing plate for a solar cell, wherein the light diffusing surface according to claim 1 is formed.