JP2001052334A - Substrate material for magnetic disk and its manufacture - Google Patents
Substrate material for magnetic disk and its manufactureInfo
- Publication number
- JP2001052334A JP2001052334A JP25206299A JP25206299A JP2001052334A JP 2001052334 A JP2001052334 A JP 2001052334A JP 25206299 A JP25206299 A JP 25206299A JP 25206299 A JP25206299 A JP 25206299A JP 2001052334 A JP2001052334 A JP 2001052334A
- Authority
- JP
- Japan
- Prior art keywords
- solid solution
- weight
- spodumene
- eucryptite
- crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0018—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents
- C03C10/0027—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents containing SiO2, Al2O3, Li2O as main constituents
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、結晶化ガラスからなる
磁気ディスク用基板素材およびその製造法に関するもの
である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic disk substrate material made of crystallized glass and a method of manufacturing the same.
【0002】[0002]
【従来の技術】コンピュータの記憶装置の一つである磁
気ディスク(いわゆるハードディスク)の基板としては
アルミニウム合金、強化ガラス、結晶化ガラス等からな
るものが使われているが、ハードディスクドライブの小
型化、高密度化、高速化が進むにつれて、表面性状や物
性面で優れた特性を有する結晶化ガラスが基板素材とし
て注目されるようになった。2. Description of the Related Art As a substrate of a magnetic disk (so-called hard disk) which is one of storage devices of a computer, a substrate made of aluminum alloy, tempered glass, crystallized glass, or the like is used. As the densification and the speed increase progress, crystallized glass having excellent properties in terms of surface properties and physical properties has attracted attention as a substrate material.
【0003】結晶化ガラスは特殊ガラスを熱処理してガ
ラス質マトリックス中に微細な結晶粒子が均一に散在す
る構造を生じさせたもので、生成させる結晶の種類、結
晶粒子の大きさ及び量等によっても異なるが、強化ガラ
スからなる基板に比べると耐熱性が良く、硬度およびヤ
ング率が高いためキズが付きにくく高速回転時の変形が
少ないなど、高密度情報基板の素材として優れている。[0003] Crystallized glass is obtained by heat-treating special glass to form a structure in which fine crystal particles are uniformly dispersed in a vitreous matrix. The crystallized glass depends on the type of crystal to be formed, the size and amount of crystal particles, and the like. However, it is excellent as a material for a high-density information substrate, such as having better heat resistance and higher hardness and Young's modulus than a substrate made of tempered glass, hardly being scratched, and being less deformed during high-speed rotation.
【0004】ガラスに結晶化のための熱処理を施して製
造される結晶化ガラスは完全な結晶質のものではなく、
一部結晶化せずに残ったガラスが連続相として存在しそ
の中に結晶粒子が散在している構造のものである。この
ため、結晶化ガラスを用いて製造された磁気ディスク用
基板の表面は、ガラス相よりも硬くて研磨されにくい結
晶粒子部分が小さな突起を形成している粗面となる(特
開平2−187922号等)。このような特徴は、磁気
ディスクに磁気ヘッドが粘着するのを防止するために有
利に利用されている。しかし、磁気ディスクに垂直磁気
記録方式を採用して記録密度を高くしようとする場合に
は基板に特に高度の平滑性が求められるので、表面粗さ
Ra(JISB0601の中心線平均粗さ)が数nm〜
100nm程度の従来の結晶化ガラス基板では対応する
ことができない。[0004] Crystallized glass produced by subjecting glass to a heat treatment for crystallization is not completely crystalline.
The glass has a structure in which glass which has not been partially crystallized and remains as a continuous phase and crystal particles are scattered therein. For this reason, the surface of the magnetic disk substrate manufactured using crystallized glass has a rough surface in which crystal grains that are harder than the glass phase and are less polished form small projections (Japanese Patent Laid-Open No. 2-187922). No.). Such a feature is advantageously used to prevent the magnetic head from sticking to the magnetic disk. However, when the recording density is to be increased by adopting the perpendicular magnetic recording method for the magnetic disk, a particularly high degree of smoothness is required for the substrate, so that the surface roughness Ra (the center line average roughness of JIS B0601) is a few. nm ~
A conventional crystallized glass substrate of about 100 nm cannot be used.
【0005】[0005]
【発明が解決しようとする課題】上述のように、結晶化
ガラスからなる磁気ディスク用基板の表面粗さは結晶粒
子径に支配されるから、表面粗さを従来の限界を超えて
小さくするには従来の基板製造用結晶化ガラスよりも結
晶粒子の径が揃って小さいものを用いることが必要にな
る。As described above, since the surface roughness of a magnetic disk substrate made of crystallized glass is governed by the crystal grain size, it is necessary to reduce the surface roughness beyond the conventional limit. It is necessary to use a crystallized glass having a uniform crystal particle diameter smaller than that of a conventional crystallized glass for manufacturing a substrate.
【0006】本発明の目的は、Raが約0.6nm以下
の研磨面を得ることも可能で、したがって今後の目標と
されている高密度垂直磁気記録方式の磁気ディスクにも
使用できる高度の平滑性を備えた基板を製造可能な、結
晶粒子径の小さい結晶化ガラス質の基板素材およびその
製造法を提供することにある。An object of the present invention is to obtain a polished surface having a Ra of about 0.6 nm or less, and therefore, a high smoothness which can be used for a magnetic disk of a high-density perpendicular magnetic recording system which is a future target. It is an object of the present invention to provide a crystallized vitreous substrate material having a small crystal particle diameter and capable of producing a substrate having a property, and a method for producing the same.
【0007】本発明の他の目的は、単に結晶粒子径が小
さいだけでなく表面硬度、ヤング率、熱膨張係数等の物
性面でも磁気ディスク用基板として優れた性能を有する
磁気ディスク用基板素材およびその製造法を提供するこ
とにある。Another object of the present invention is to provide a magnetic disk substrate material which not only has a small crystal grain size but also has excellent properties in terms of physical properties such as surface hardness, Young's modulus and thermal expansion coefficient as a magnetic disk substrate. It is to provide a manufacturing method thereof.
【0008】[0008]
【課題を解決するための手段】本発明により提供された
磁気ディスク用基板素材は、β−ユークリプタイト固溶
体(Li2O−Al2O3−2SiO2)の結晶粒子お
よびβ−スポジュウメン固溶体(Li2O−Al2O3
−4SiO2)の結晶粒子がガラス質マトリックス中に
散在する結晶化ガラスからなり、該結晶化ガラスは平均
的な組成がSiO250〜65重量%、Al2O318
〜30重量%、Li2O3〜8重量%、TiO2+Zr
O23〜5重量%、P2O5および(または)B2O3
を合計量で8重量%以下、RO(ただしRはマグネシウ
ム、カルシウム、亜鉛、鉛、およびバナジウムからなる
群から選ばれた金属原子を表す)0.3〜7.0重量
%、R2O(ただしRはカリウム原子またはナトリウム
原子を表す)3.0重量%以下、F0.1〜0.5重量
%であり、結晶化ガラス全体に対する結晶部分の比率が
70〜85重量%であり、β−スポジュウメン固溶体の
量がβ−ユークリプタイト固溶体とβ−スポジュウメン
固溶体との合計量の60重量%以下であり、β−ユーク
リプタイト固溶体およびβ−スポジュウメン固溶体の各
結晶粒子の粒径が0.1〜0.5μmであることを特徴
とするものである。The substrate material for a magnetic disk provided by the present invention comprises a β-eucryptite solid solution (Li 2 O—Al 2 O 3 -2SiO 2 ) crystal particles and a β-spodumene solid solution ( Li 2 O-Al 2 O 3
-4 SiO 2 ) consisting of crystallized glass in which glass particles are scattered in a vitreous matrix. The crystallized glass has an average composition of 50 to 65% by weight of SiO 2 and Al 2 O 3 18
30 wt%, Li 2 O3~8 wt%, TiO 2 + Zr
O 2 3 to 5 wt%, P 2 O 5 and (or) B 2 O 3
In a total amount of 8% by weight or less, RO (where R represents a metal atom selected from the group consisting of magnesium, calcium, zinc, lead, and vanadium) 0.3 to 7.0% by weight, R 2 O ( Wherein R represents a potassium atom or a sodium atom) 3.0% by weight or less, F is 0.1 to 0.5% by weight, the ratio of the crystal part to the whole crystallized glass is 70 to 85% by weight, and β- The amount of the solid solution of spodumene is not more than 60% by weight of the total amount of the solid solution of β-eucryptite and the solid solution of β-spodumene, and the particle size of each crystal particle of the β-eucryptite solid solution and the β-spodumene solid solution is 0.1%. 0.50.5 μm.
【0009】本発明はまた、酸化物組成がSiO250
〜65重量%、Al2O318〜30重量%、Li2O
3〜8重量%、TiO2+ZrO23〜5重量%、P2
O5および(または)B2O3を合計量で8重量%以
下、RO(ただしRはマグネシウム、カルシウム、亜
鉛、鉛、およびバナジウムからなる群から選ばれた金属
原子を表す)0.3〜7.0重量%、R2O(ただしR
はカリウム原子またはナトリウム原子を表す)3.0重
量%以下、F0.1〜0.5重量%のガラスを磁気ディ
スク用基板素材として必要な形状に成形してなる成形物
を結晶化処理して結晶粒子径が0.1〜0.5μmのβ
−ユークリプタイト固溶体の結晶粒子およびβ−スポジ
ュウメン固溶体の結晶粒子がガラス質マトリックス中に
散在する結晶化ガラスを生成させることを特徴とする磁
気ディスク用基板の製造法を提供するものである。[0009] The present invention also relates to an oxide composition comprising SiO 2 50
65 wt%, Al 2 O 3 18~30 wt%, Li 2 O
3-8 wt%, TiO 2 + ZrO 2 3~5 wt%, P 2
O 5 and (or) B 2 O 3 8% by weight in a total amount below, RO (wherein R represents magnesium, calcium, zinc, lead, and the metal atoms selected from the group consisting of vanadium) 0.3 7.0% by weight, R 2 O (R
Represents a potassium atom or a sodium atom) 3.0% by weight or less, and 0.1 to 0.5% by weight of glass formed into a shape required for a magnetic disk substrate material by crystallization treatment. Β having a crystal particle diameter of 0.1 to 0.5 μm
A method for producing a magnetic disk substrate, wherein crystallized glass in which crystal particles of a eucryptite solid solution and crystal particles of a β-spodumene solid solution are dispersed in a vitreous matrix.
【0010】上記製造法の特に好ましい態様において
は、β−スポジュウメン固溶体の量がβ−ユークリプタ
イト固溶体とβ−スポジュウメン固溶体との合計量の6
0重量%を超えないように結晶化処理を行う。In a particularly preferred embodiment of the above-mentioned production method, the amount of β-spodumene solid solution is 6 times the total amount of β-eucryptite solid solution and β-spodumene solid solution.
The crystallization treatment is performed so as not to exceed 0% by weight.
【0011】[0011]
【発明の実施の形態】以下、磁気ディスク用基板素材の
製造法を工程順に説明しながら本発明につき詳述する。BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described below in detail while explaining a method of manufacturing a substrate material for a magnetic disk in the order of steps.
【0012】まず、SiO250〜65重量%、Al2
O318〜30重量%、Li2O3〜8重量%、TiO
2+ZrO23〜5重量%、P2O5および(または)
B2O3を合計量で8重量%以下、RO(ただしRはマ
グネシウム、カルシウム、亜鉛、鉛、およびバナジウム
からなる群から選ばれた金属原子を表す)0.3〜7.
0重量%、R2O(ただしRはカリウム原子またはナト
リウム原子を表す)3.0重量%以下、F0.1〜0.
5重量%の組成を有するガラスを得るのに必要な原料鉱
物を用意する。First, 50 to 65% by weight of SiO 2 , Al 2
O 3 18 to 30% by weight, Li 2 O 3 to 8% by weight, TiO
2 + ZrO 2 3 to 5 wt%, P 2 O 5 and (or)
B 2 O 3 in a total amount of 8% by weight or less, RO (where R represents a metal atom selected from the group consisting of magnesium, calcium, zinc, lead, and vanadium).
0% by weight, R 2 O (R represents a potassium atom or a sodium atom) 3.0% by weight or less, F 0.1 to 0.
Raw minerals necessary for obtaining a glass having a composition of 5% by weight are prepared.
【0013】SiO2は、50%未満ではガラスが成形
中に失透し易く、65%を超えると溶融が困難になる。
Al2O3は17%未満では熱膨張係数が大きくなって
耐熱衝撃性が悪くなり、30%を超えると溶融が困難に
なる。Li2Oは、3%未満では溶融が困難であり、8
%を超えると熱膨張係数が大きくなりすぎる。[0013] If the content of SiO 2 is less than 50%, the glass tends to be devitrified during molding, and if it exceeds 65%, melting becomes difficult.
If the content of Al 2 O 3 is less than 17%, the thermal expansion coefficient becomes large and the thermal shock resistance becomes poor, and if it exceeds 30%, melting becomes difficult. Li 2 O is difficult to melt at less than 3%,
%, The coefficient of thermal expansion becomes too large.
【0014】TiO2およびZrO2は結晶核形成剤と
して配合される成分である。これらは併用することが望
ましいが、一方を単独で用いてもよい。2成分の合計量
が3%未満では結晶化に時間がかかりすぎるが、5%を
超えると、ガラスが失透を起こしやすくなるほか、溶融
が困難になる。TiO 2 and ZrO 2 are components that are blended as a crystal nucleating agent. These are preferably used in combination, but one of them may be used alone. If the total amount of the two components is less than 3%, it takes too much time for crystallization, but if it exceeds 5%, the glass is liable to be devitrified, and melting becomes difficult.
【0015】P2O5およびB2O3はガラスの溶融性
を改善しさらに結晶化処理後のガラス質部分の性質を好
ましいものとする作用があるが、8%を超えると、結晶
化処理工程における結晶化を遅らせ、ガラス相の多い結
晶化ガラスを与える。[0015] P 2 O 5 and B 2 O 3 have the effect of improving the melting property of the glass and making the properties of the vitreous portion after the crystallization treatment favorable. Slows crystallization in the process and gives crystallized glass with a high glass phase.
【0016】ROおよびR2Oは溶融温度の低下と成形
性の向上に有効な成分であるが、多すぎると、失透、ガ
ラス成形体の変形等、好ましくない結果を生じる。RO and R 2 O are effective components for lowering the melting temperature and improving the moldability. However, if they are too much, undesired results such as devitrification and deformation of the glass molding are produced.
【0017】Fもガラスの溶融温度を低下させ、上記酸
化物組成の原料からのガラス製造を容易にする。さら
に、Fを配合すると結晶化度の高いβ−ユークリプタイ
ト質結晶化ガラスを容易に得られるようになるので、本
発明の目的達成のために重要な成分である。ただし、F
には中高温におけるガラスの粘度を低下させる作用もあ
って、それによるガラス粘度の低下は析出する結晶粒子
の粒径を大きくするように作用するから、Fの配合量は
必要最小限度の量にして結晶粒子の粗大化を防ぐ必要が
あり、0.5重量%を超えないようにすることが望まし
い。F also lowers the melting temperature of glass and facilitates the production of glass from raw materials of the above oxide composition. Furthermore, when F is blended, a β-eucryptite crystallized glass having a high degree of crystallinity can be easily obtained, and is an important component for achieving the object of the present invention. Where F
Also has the effect of lowering the viscosity of glass at medium and high temperatures, and the resulting decrease in glass viscosity acts to increase the size of the precipitated crystal particles. Therefore, it is necessary to prevent the crystal grains from becoming coarse, and it is desirable not to exceed 0.5% by weight.
【0018】上述の原料をガラス製造の常法に従って粉
砕、混合し、さらに加熱して溶融状態で混合することに
より、ガラス化させる。The above-mentioned raw materials are pulverized and mixed according to a conventional method of glass production, and further heated to be mixed in a molten state, thereby vitrifying the raw materials.
【0019】得られたガラスは、プレス法、ロール法、
キャスト法等、任意の方法で、円板状、円柱状等、磁気
ディスク用基板を製造するのに必要な形状に成形する。The obtained glass is pressed, rolled,
It is formed into a shape required for manufacturing a magnetic disk substrate, such as a disk or a column, by any method such as a casting method.
【0020】次いでガラス成形体を加熱炉に入れ、結晶
化のための二段の熱処理を施す。第一段の熱処理は結晶
核形成工程であって、ガラス成形体を約600〜700
℃に約1〜3時間保持する。これにより、上記組成のガ
ラス成形体中には結晶核が生成し、その周囲にβ−ユー
クリプタイト固溶体の微結晶が析出しはじめる。Next, the glass compact is placed in a heating furnace and subjected to a two-stage heat treatment for crystallization. The first heat treatment is a crystal nucleation step, in which the glass molded body is heated to about 600-700.
C. for about 1-3 hours. As a result, crystal nuclei are generated in the glass molded body having the above composition, and microcrystals of the β-eucryptite solid solution start to precipitate around the crystal nuclei.
【0021】その後、温度を約650〜850℃、望ま
しくは700〜800℃に上昇させ、この温度に約30
分〜数時間保持すると、上記微結晶を核としてβ−ユー
クリプタイト固溶体の結晶が成長し、その一部はβ−ス
ポジュウメン固溶体に変化しつつ結晶化が進み、約1〜
3時間でガラスの約70〜85%が結晶化する。生じた
結晶は直径が約0.1〜0.5μmの微細な粒子状で、
ガラス相中に分散している。結晶化温度を低めに設定す
ることによりβ−ユークリプタイト固溶体の比率が高い
結晶化ガラスを生成させることができ、結晶化温度を高
くするほど、β−スポジュウメン固溶体の比率が高くな
り、且つ結晶粒子径が大きくなる。したがって、研磨し
たとき高度の平滑表面が得られるようにするという本発
明の目的との関係では、なるべくβ−ユークリプタイト
固溶体の比率の高いものが得られるように、望ましくは
β−スポジュウメン固溶体の量がβ−ユークリプタイト
固溶体とβ−スポジュウメン固溶体との合計量の60重
量%を超えないように、結晶化処理の条件を選定するこ
とが望ましい。Thereafter, the temperature is raised to about 650-850 ° C., preferably 700-800 ° C.
When held for several minutes to several hours, crystals of a β-eucryptite solid solution grow with the above-mentioned microcrystals as nuclei, and a part of the crystals is converted into a β-spodumene solid solution, and crystallization proceeds.
Approximately 70-85% of the glass crystallizes in 3 hours. The resulting crystals are in the form of fine particles with a diameter of about 0.1-0.5 μm,
It is dispersed in the glass phase. By setting the crystallization temperature lower, a crystallized glass having a higher β-eucryptite solid solution ratio can be produced.The higher the crystallization temperature, the higher the β-spodumene solid solution ratio and the higher the crystallization temperature. The particle size increases. Therefore, in relation to the object of the present invention that a high smooth surface can be obtained when polished, a β-spodumene solid solution is desirably used so that a high ratio of β-eucryptite solid solution is obtained as much as possible. It is desirable to select the conditions for the crystallization treatment so that the amount does not exceed 60% by weight of the total amount of the β-eucryptite solid solution and β-spodumene solid solution.
【0022】結晶化処理を終わって得られる結晶化ガラ
スは、通常、表面から約1.2μmまでの部分がやや粗
大な結晶粒子からなり、その下には微細な結晶粒子を含
むがガラス相の多い薄層があり、これらの薄層によっ
て、前述のようなβ−ユークリプタイト固溶体、β−ス
ポジュウメン固溶体およびガラス相からなる均一な結晶
化ガラスが覆われている。磁気ディスク用基板の素材と
して利用することができるのは芯層部分だけであるか
ら、結晶化させたガラス成形体が基板1枚を製造するた
めの円板状のものであった場合は、上記表面の不均質層
を研磨工程の最初の段階で完全に除去することが必要で
ある。The crystallized glass obtained after the crystallization treatment is usually composed of slightly coarse crystal grains in a portion from the surface to about 1.2 μm, and contains fine crystal grains under the crystal grains. There are many thin layers, which cover a uniform crystallized glass consisting of a β-eucryptite solid solution, a β-spodumene solid solution and a glass phase as described above. Since only the core layer can be used as the material of the magnetic disk substrate, when the crystallized glass molded body is a disk-shaped one for manufacturing one substrate, It is necessary to completely remove the heterogeneous layer on the surface in the first stage of the polishing process.
【0023】結晶化させたガラス成形体が複数の基板を
製造するための円柱状のものであった場合は、1枚の基
板を製造するのに必要な厚さの円板状にそれをスライス
し、その後に表面研磨を行う。In the case where the crystallized glass molded article has a columnar shape for producing a plurality of substrates, it is sliced into a disk having a thickness necessary for producing one substrate. Then, the surface is polished.
【0024】平滑表面を得るための研磨は、この種の磁
気ディスク用基板を製造する場合と同様にして行うこと
ができ、研磨材の種類、粒径、研磨条件等を適宜選ぶこ
とにより目的とする平滑度の表面を得ることができる。Polishing for obtaining a smooth surface can be carried out in the same manner as in the case of manufacturing this type of magnetic disk substrate. A surface having a smoothness can be obtained.
【0025】[0025]
【実施例】実施例1 SiO257.4%、Al2O322.8%、Li2O
5.2%、TiO22.6%、ZrO21.7%、P2
O51.9%、B2O32.7%、ZnO1.7%、M
gO2.2%、K2O+Na2O1.5%、F0.4%
の組成になるように原料を調合し、1450℃に加熱し
て溶融させ、得られたガラスをプレス成形により円板状
に成形した。EXAMPLES Example 1 57.4% of SiO 2 , 22.8% of Al 2 O 3 , Li 2 O
5.2%, TiO 2 2.6%, ZrO 2 1.7%, P 2
O 5 1.9%, B 2 O 3 2.7%, ZnO 1.7%, M
gO2.2%, K 2 O + Na 2 O1.5%, F0.4%
The raw materials were prepared so as to have the composition described above, heated to 1450 ° C. and melted, and the obtained glass was formed into a disk shape by press molding.
【0026】次に、このガラス成形体を600℃に2時
間保持して結晶核を形成させたのち700℃に昇温し、
この温度で1時間保持して結晶を成長させた。Next, the glass compact is kept at 600 ° C. for 2 hours to form crystal nuclei, and then heated to 700 ° C.
The temperature was maintained for one hour to grow crystals.
【0027】熱処理前は透明であった成形体は結晶化に
より半透明になっていた。X線回折により調べたとこ
ろ、結晶化度は約70%、主結晶はβ−ユークリプタイ
ト固溶体でほかに少量のβ−スポジュウメン固溶体が形
成されており、β−ユークリプタイト固溶体とβ−スポ
ジュウメン固溶体との合計量に対するβ−ユークリプタ
イト固溶体の割合は約70%であった。結晶粒径は平均
0.15μm、熱膨張係数は4×10−7/k、ヤング
率は8.7×105kg/cm2、ビッカース硬度は6
57であった。The molded body that was transparent before the heat treatment was translucent due to crystallization. According to X-ray diffraction analysis, the crystallinity was about 70%, the main crystal was a β-eucryptite solid solution and a small amount of a β-spodumene solid solution was formed, and the β-eucryptite solid solution and β-spodumene solid solution were formed. The ratio of the β-eucryptite solid solution to the total amount with the solid solution was about 70%. The average crystal grain size is 0.15 μm, the coefficient of thermal expansion is 4 × 10 −7 / k, the Young's modulus is 8.7 × 10 5 kg / cm 2 , and the Vickers hardness is 6
57.
【0028】この結晶化ガラスの表面を常法によりラッ
ピング、次いでポリッシングして得られた厚さ約1mm
の円板の研磨面の表面粗さRaは0.25nmであっ
た。The surface of the crystallized glass is wrapped by a conventional method and then polished to a thickness of about 1 mm.
The surface roughness Ra of the polished surface of the disk was 0.25 nm.
【0029】実施例2 実施例1の場合と同様にして調製した円板状ガラス成形
体を660℃に2時間保持して結晶核を形成させたのち
740℃に昇温し、この温度で1時間保持して結晶を成
長させた。Example 2 A disk-shaped glass compact prepared in the same manner as in Example 1 was kept at 660 ° C. for 2 hours to form crystal nuclei, and then heated to 740 ° C. The crystals were grown by holding for a time.
【0030】熱処理前は透明であった成形体は結晶化に
より乳白色になっており、X線回折により調べたところ
β−ユークリプタイト固溶体とβ−スポジュウメン固溶
体が混在し、後者のほうがやや多く、両者の合計量の約
55%を占めた。結晶粒径は平均約0.2μm、熱膨張
係数は15×10−7/k、ヤング率は8.7×105
kg/cm2、ビッカース硬度は616であった。The molded body that was transparent before the heat treatment became milky white due to crystallization, and when examined by X-ray diffraction, a β-eucryptite solid solution and a β-spodumene solid solution were mixed. They accounted for about 55% of the total amount of both. The average crystal grain size is about 0.2 μm, the coefficient of thermal expansion is 15 × 10 −7 / k, and the Young's modulus is 8.7 × 10 5.
kg / cm 2 and Vickers hardness was 616.
【0031】この結晶化ガラスの表面を常法によりラッ
ピング、次いでポリッシングしたところ、表面粗さRa
が0.41nmの研磨面が得られた。When the surface of the crystallized glass was wrapped and polished by a conventional method, the surface roughness was Ra.
Of 0.41 nm was obtained.
【0032】実施例3 SiO260%、Al2O321%、Li2O5.5
%、TiO2+ZrO24%、P2O5+B2O37.
5%、ZnO+MgO4%、K2O+Na2O1.5
%、F0.9%の組成になるよう原料を調合し、143
0℃に加熱して溶融させ、得られたガラスをプレス成形
により円板状に成形した。Example 3 SiO 2 60%, Al 2 O 3 21%, Li 2 O 5.5
%, TiO 2 + ZrO 2 4%, P 2 O 5 + B 2 O 3 7.
5%, ZnO + MgO4%, K 2 O + Na 2 O1.5
% And a composition of 0.9% F, and 143
It was heated to 0 ° C. and melted, and the obtained glass was formed into a disk shape by press molding.
【0033】次に、このガラス成形体を600℃に1時
間保持したのち750℃に昇温し、この温度で1時間保
持してから冷却した。Next, the glass molded body was kept at 600 ° C. for 1 hour, heated to 750 ° C., kept at this temperature for 1 hour, and cooled.
【0034】熱処理前は透明であった成形体は結晶化し
たことにより半透明乳白色になっていた。X線回折図か
ら、主結晶はβ−スポジュウメン固溶体で、β−ユーク
リプタイト固溶体とβ−スポジュウメン固溶体との合計
量の約85%を占めていた。結晶粒径は平均約0.4μ
m、熱膨張係数は14×10−7/k、ヤング率は8.
7×105kg/cm2、ビッカース硬度は610であ
った。The molded product that was transparent before the heat treatment turned into a translucent milky white due to crystallization. From the X-ray diffraction pattern, the main crystal was β-spodumene solid solution, which accounted for about 85% of the total amount of β-eucryptite solid solution and β-spodumene solid solution. The average grain size is about 0.4μ
m, coefficient of thermal expansion is 14 × 10 −7 / k, Young's modulus is 8.
7 × 10 5 kg / cm 2 and Vickers hardness was 610.
【0035】この結晶化ガラスの表面を常法によりラッ
ピング、次いでポリッシングしたところ、表面粗さRa
が0.8nmの研磨面が得られた。When the surface of the crystallized glass was wrapped and polished by a conventional method, the surface roughness Ra was changed.
Of 0.8 nm was obtained.
【0036】[0036]
【発明の効果】本発明による磁気ディスク用基板素材は
表面粗さが約0.2〜0.6nmの高度に平滑な表面を
形成させることができ、記録密度の高い次世代磁気ディ
スク用基板として好適なものである。また、物性面でも
磁気ディスク用基板として必要とされる性能をすべて具
備する優れたものである。The substrate material for a magnetic disk according to the present invention can form a highly smooth surface having a surface roughness of about 0.2 to 0.6 nm and is used as a substrate for a next-generation magnetic disk having a high recording density. It is suitable. In addition, it is an excellent material having all the properties required for a magnetic disk substrate in terms of physical properties.
フロントページの続き (72)発明者 湯 浩 千葉県柏市十余二380番地 岡本硝子株式 会社内 Fターム(参考) 4G062 AA11 BB01 CC09 DA06 DB04 DC01 DC02 DC03 DD01 DD02 DD03 DE01 DE02 DE03 DF01 DF02 DF03 EA03 EB01 EB02 EB03 EC01 EC02 EC03 ED02 ED03 EE02 EE03 EF01 EG01 FA01 FB03 FC03 FD01 FE01 FF02 FF03 FG01 FH01 FJ01 FK01 FL01 GA01 GA10 GB01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM27 NN30 NN33 QQ10 QQ11 5D112 AA02 BA03 BA09 Continued on the front page (72) Inventor Hiroshi Yuko 380 Juyo, Kashiwa-shi, Chiba Prefecture F-term in Okamoto Glass Co., Ltd. 4G062 AA11 BB01 CC09 DA06 DB04 DC01 DC02 DC03 DD01 DD02 DD03 DE01 DE02 DE03 DF01 DF02 DF03 EA03 EB01 EB02 EB03 EC01 EC02 EC03 ED02 ED03 EE02 EE03 EF01 EG01 FA01 FB03 FC03 FD01 FE01 FF02 FF03 FG01 FH01 FJ01 FK01 FL01 GA01 GA10 GB01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 KK03 HH09 HH11 KK QQ10 QQ11 5D112 AA02 BA03 BA09
Claims (3)
およびβ−スポジュウメン固溶体の結晶粒子がガラス質
マトリックス中に散在する結晶化ガラスからなり、該結
晶化ガラスは平均的な組成がSiO250〜65重量
%、Al2O318〜30重量%、Li2O3〜8重量
%、TiO2+ZrO23〜5重量%、P2O5および
(または)B2O3を合計量で8重量%以下、RO(た
だしRはマグネシウム、カルシウム、亜鉛、鉛、及びバ
ナジウムからなる群から選ばれた金属原子を表す)0.
3〜7.0重量%、R2O(ただしRはカリウム原子ま
たはナトリウム原子を表す)3.0重量%以下、F0.
1〜0.5重量%であり、結晶化ガラス全体に対する結
晶部分の比率が70〜85重量%であり、β−スポジュ
ウメン固溶体の量がβ−ユークリプタイト固溶体とβ−
スポジュウメン固溶体との合計量の60重量%以下であ
り、β−ユークリプタイト固溶体およびβ−スポジュウ
メン固溶体の各結晶粒子の粒径が0.1〜0.5μmで
あることを特徴とする、磁気ディスク用基板素材。1. A β- eucryptite solid solution crystal grains and β- Supojuumen solid solution crystal grains of consists crystallized glass interspersed in glassy matrix, the crystallized glass is average composition SiO 2 50 to 65 wt%, Al 2 O 3 18 to 30 wt%, Li 2 O3~8 wt%, TiO 2 + ZrO 2 3~5 wt%, 8 wt in P 2 O 5 and (or) the total amount of B 2 O 3 %, RO (where R represents a metal atom selected from the group consisting of magnesium, calcium, zinc, lead, and vanadium).
3 to 7.0% by weight, R 2 O (R represents a potassium atom or a sodium atom) 3.0% by weight or less, F0.
1 to 0.5% by weight, the ratio of the crystal part to the whole crystallized glass is 70 to 85% by weight, and the amount of the β-spodumene solid solution is β-eucryptite solid solution and β-eucryptite solid solution.
A magnetic disk comprising not more than 60% by weight of the total amount of the solid solution of spodumene and the crystal grains of the solid solution of β-eucryptite and the solid solution of β-spodumene having a particle size of 0.1 to 0.5 μm; Substrate material.
18〜30重量%、Li2O3〜8重量%、TiO2+
ZrO23〜5重量%、P2O5および(または)B2
O3を合計量で8重量%以下、RO(ただしRはマグネ
シウム、カルシウム、亜鉛、鉛、及びバナジウムからな
る群から選ばれた金属原子を表す)0.3〜7.0重量
%、R2O(ただしRはカリウム原子またはナトリウム
原子を表す)3.0重量%以下、F0.1〜0.5重量
%のガラスを磁気ディスク用基板素材として必要な形状
に成形してなる成形物を結晶化処理して結晶粒子径が
0.1〜0.5μmのβ−ユークリプタイト固溶体の結
晶粒子およびβ−スポジュウメン固溶体の結晶粒子がガ
ラス質マトリックス中に散在する結晶化ガラスを生成さ
せることを特徴とする磁気ディスク用基板素材の製造
法。 2. 50 to 65% by weight of SiO 2 , Al 2 O 3
18-30 wt%, Li 2 O3~8 wt%, TiO 2 +
ZrO 2 3 to 5 wt%, P 2 O 5 and (or) B 2
O 3 8% by weight in a total amount below, RO (wherein R represents magnesium, calcium, zinc, lead, and a metal atom selected from the group consisting of vanadium) from 0.3 to 7.0 wt%, R 2 O (where R represents a potassium atom or a sodium atom) 3.0% by weight or less and F-0.1 to 0.5% by weight of glass formed into a required shape as a substrate material for a magnetic disk. Forming a crystallized glass in which crystal particles of a β-eucryptite solid solution and crystal particles of a β-spodumene solid solution having a crystal particle diameter of 0.1 to 0.5 μm are scattered in a vitreous matrix. Manufacturing method of a magnetic disk substrate material.
ウメン固溶体の量がβ−ユークリプタイト固溶体とβ−
スポジュウメン固溶体との合計量の60重量%を超えな
いように結晶化処理を行う請求項2に記載の製造法。3. The amount of the β-spodumene solid solution produced by the crystallization treatment is between β-eucryptite solid solution and β-eucryptite solid solution.
The production method according to claim 2, wherein the crystallization treatment is performed so as not to exceed 60% by weight of the total amount with the solid solution of spodumene.
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JP25206299A JP2001052334A (en) | 1999-08-04 | 1999-08-04 | Substrate material for magnetic disk and its manufacture |
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JP25206299A JP2001052334A (en) | 1999-08-04 | 1999-08-04 | Substrate material for magnetic disk and its manufacture |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2857659A1 (en) * | 2003-07-16 | 2005-01-21 | Schott Glas | OPTICAL GLASS |
JP2011040122A (en) * | 2009-08-07 | 2011-02-24 | Asahi Glass Co Ltd | Glass for information recording medium substrate, glass substrate for information recording medium, and magnetic disk |
US7943539B2 (en) * | 2005-01-31 | 2011-05-17 | Kabushiki Kaisha Ohara | Glass-ceramics and method for manufacturing the same |
DE102016211065A1 (en) | 2016-06-21 | 2017-12-21 | Schott Ag | Transparent, preferably colored glass ceramic article with low scattered light content and high strength, as well as processes for its preparation and its use |
WO2020189115A1 (en) * | 2019-03-15 | 2020-09-24 | 日本電気硝子株式会社 | Composite substrate, electronic device, method for manufacturing composite substrate, and method for manufacturing electronic device |
-
1999
- 1999-08-04 JP JP25206299A patent/JP2001052334A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2857659A1 (en) * | 2003-07-16 | 2005-01-21 | Schott Glas | OPTICAL GLASS |
US7524782B2 (en) | 2003-07-16 | 2009-04-28 | Schott Ag | Large transmissive optical component |
US7754630B2 (en) | 2003-07-16 | 2010-07-13 | Schott Ag | Large transmissive optical component |
US7943539B2 (en) * | 2005-01-31 | 2011-05-17 | Kabushiki Kaisha Ohara | Glass-ceramics and method for manufacturing the same |
JP2011040122A (en) * | 2009-08-07 | 2011-02-24 | Asahi Glass Co Ltd | Glass for information recording medium substrate, glass substrate for information recording medium, and magnetic disk |
DE102016211065A1 (en) | 2016-06-21 | 2017-12-21 | Schott Ag | Transparent, preferably colored glass ceramic article with low scattered light content and high strength, as well as processes for its preparation and its use |
DE102016211065B4 (en) | 2016-06-21 | 2019-09-05 | Schott Ag | Transparent, preferably colored glass ceramic article with low scattered light content and high strength, as well as processes for its preparation and its use |
WO2020189115A1 (en) * | 2019-03-15 | 2020-09-24 | 日本電気硝子株式会社 | Composite substrate, electronic device, method for manufacturing composite substrate, and method for manufacturing electronic device |
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