JP2001048933A - Polymer for photoresist and resin composition for photoresist - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a polymer which comprises adamantane skeleton-having monomer units each having a specific structure and has not only good transparency, good alkali solubility, good adhesivity but also sufficient etching resistance, when used as a resin for photoresists. SOLUTION: This polymer comprises at least one kind of monomer units expressed by the formula (R1 is H or methyl; R2 and R3 are a 1 to 8C hydrocarbon; R4 to R6 are each H, hydroxyl or methyl). The polymer is obtained by polymerizing the corresponding (meth)acrylate ester [for example, 1-(1- ethyl-1-(meth)acryloyloxypropyl)adamantane]. The total content of the monomer units is preferably 50 to 100% based on the total monomer units of the polymer, and the polymer preferably has a weight-average mol.wt.(Mw) of 5,000 to 50,000 and a mol.wt. distribution (Mw/Mn) of 1.8 to 3.0. Mn is a number-average mol.wt. (converted into polystyrene).

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polymer compound useful as a resin for a photoresist used when performing fine processing of a semiconductor and a resin composition for a photoresist containing the polymer compound.

[0002]

2. Description of the Related Art Positive photoresists used in a semiconductor manufacturing process have properties such as a property that an irradiated portion changes to alkali-soluble due to light irradiation, adhesion to a silicon wafer, plasma etching resistance, and transparency to light used. Must have both. The positive type photoresist is generally used as a solution containing a polymer as a main component, a photoacid generator, and several additives for adjusting the above properties. Is
It is extremely important that the polymer as the base agent has the above-mentioned properties in a well-balanced manner.

[0003] The exposure light source for lithography used in the manufacture of semiconductors has become shorter in wavelength year by year, and an ArF excimer laser having a wavelength of 193 nm is expected as a next-generation exposure light source. It has been proposed to use a unit containing an alicyclic hydrocarbon skeleton having high transparency to the wavelength and etching resistance as a monomer unit of a resist polymer used in the ArF excimer laser exposure machine (Patent) No. 2776273). It is also known that a polymer having an adamantane skeleton which is particularly excellent in etching resistance among alicyclic hydrocarbon skeletons is used as a resist polymer. However, although the alicyclic hydrocarbon skeleton has excellent etching resistance as described above, it has high hydrophobicity,
There is a disadvantage that adhesion to a substrate is low. Therefore, the above-mentioned literature proposes a copolymer in which a highly hydrophilic monomer unit having a carboxyl group or a lactone ring (adhesion imparting monomer unit) is incorporated for the purpose of improving this. However, since these monomer units do not have etching resistance, there is a problem that if an amount satisfying the adhesiveness is incorporated into the polymer, the etching resistance of the entire polymer becomes insufficient.

[0004] On the other hand, Japanese Patent Application Laid-Open No. 11-109632 discloses an attempt to impart hydrophilicity by introducing a hydroxyl group into an adamantane skeleton. However, since t-butyl (meth) acrylate is used as a monomer unit (alkali-soluble monomer unit) that becomes alkali-soluble by an acid generated by light irradiation,
Again, there is concern about the etching resistance of the entire polymer.

Further, an attempt has been made to use a monomer unit having an adamantane skeleton itself as an alkali-soluble monomer unit (JP-A-9-73173,
JP-A-9-90637, JP-A-10-27485
No. 2, JP-A-10-319595, JP-A-10-319595
1-112326, JP-A-11-119434). However, also in these cases, a monomer having no etching resistance is used as the adhesion imparting monomer unit, and the etching resistance of the entire polymer cannot be said to be sufficient.

[0006]

SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a polymer compound having not only excellent transparency, alkali solubility and adhesion, but also high etching resistance, and a high molecular compound having such high etching resistance. An object of the present invention is to provide a photoresist resin composition containing a molecular compound.

[0007]

Means for Solving the Problems As a result of extensive studies to achieve the above object, the present inventors have found that when a polymer containing a monomer unit having an adamantane skeleton having a specific structure is used as a photoresist resin, transparency, The present invention was found to satisfy not only alkali solubility and adhesion but also etching resistance, and completed the present invention.

That is, the present invention provides the following formula (I)

Embedded image (Wherein, R ¹ represents a hydrogen atom or a methyl group, and R ² and R
³ are the same or different and each represents a hydrocarbon group having 1 to 8 carbon atoms, R ^4, R ⁵ and R ⁶ are the same or different and are each a hydrogen atom, a hydroxyl group or a methyl group. However, R ⁴ ~
When R ⁶ is either a hydrogen atom or a hydroxyl group, R ² and R ³ are not both methyl groups at the same time). I do.

The above-mentioned polymer compound comprises at least one monomer unit represented by the above formula (I) and the following formula (IIa)
And (IIb)

Embedded image (Wherein, R ¹ represents a hydrogen atom or a methyl group, and R ⁷ and R
⁸ is the same or different and represents a hydrocarbon group having 1 to 8 carbon atoms, and R ⁹ and R ¹⁰ are the same or different and represent a hydrogen atom,
A hydroxyl group, a carboxyl group or a —COOR group, R ¹¹ represents a hydroxyl group, an oxo group, a carboxyl group or a —COOR group, R represents a t-butyl group, a 2-tetrahydrofuranyl group, a 2-tetrahydropyranyl group or It represents a 2-oxepanyl group. m represents 0 or 1. R ¹²
And R ¹³ are the same or different and represent a hydrogen atom, a hydroxyl group or an oxo group).
And a monomer unit (excluding the monomer unit represented by the formula (1)).

Further, the following formula (III)

Embedded image (Wherein R ¹ and R ¹⁴ are the same or different and each represent a hydrogen atom or a methyl group), a monomer unit represented by the following formula (IV)

Embedded image (Wherein, R ¹⁵ is tricyclo [5.2.1.0 ^{2, 6]} decyl group, tetracyclo [4.4.0.1 ^2,5 .1 ^7,10] dodecyl group, norbornyl group, or an isobornyl group A 2-norbornylmethyl group; R ¹⁶ is a substituent of R ¹⁵ ; a hydrogen atom, a hydroxyl group, a hydroxymethyl group,
A carboxyl group or a -COOR ¹⁷ group, wherein R ¹⁷ is t-
A butyl group, a 2-tetrahydrofuranyl group, a 2-tetrahydropyranyl group or a 2-oxepanyl group. R ¹ is the same as defined above), a monomer unit represented by the following formula (Va):
(Vb)

Embedded image (Wherein R ¹⁸ , R ¹⁹ , R ²⁰ , R ²¹ , R ²² , R ²³ , R ²⁴ and R ²⁵ are the same or different and represent a hydrogen atom or a methyl group; R ¹ is the same as described above) Monomer unit represented by the following formula (VI)

Embedded image (In the formula, n represents an integer of ¹ to 3. R ¹ is the same as described above.)
And a monomer unit represented by the following formula (VII):

Embedded image (Wherein, R ¹ is the same as described above), and may include at least one monomer unit selected from the monomer units represented by the following formula:

[0011] In the polymer compound, the total content of the monomer units having an adamantane skeleton is, for example, 50 to 100% by weight, preferably 70 to 100% by weight, based on all the monomer units constituting the polymer. The polymer compound can be used as a photoresist resin. The present invention
Further, the present invention provides a resin composition for photoresist containing the above polymer compound and a photoacid generator. In this specification, “acryl” and “methacryl” may be collectively referred to as “(meth) acryl”.

[0012]

BEST MODE FOR CARRYING OUT THE INVENTION The polymer compound of the present invention comprises, as a structural unit constituting a polymer molecule, at least one monomer unit represented by the above formula (I) (hereinafter referred to as "monomer unit 1"). Are included). In the formula (I), examples of the hydrocarbon having 1 to 8 carbon atoms in R ² and R ³ include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, s-butyl, pentyl, isopentyl, 1-methylbutyl and 1-ethyl Propyl, hexyl, isohexyl, 1-methylpentyl, 1-ethylbutyl, heptyl, 1-methylhexyl, octyl, 1-
C _1-8 alkyl group such as methyl heptyl group; cyclopropyl, cyclopentyl, cyclohexyl, cycloheptyl, C _{3- 8} cycloalkyl group such as cyclooctyl;
And a phenyl group. Among them, C _1-3 alkyl groups such as methyl, ethyl and isopropyl groups are preferred. When none of R ^{4 to} R ⁶ is a methyl group (when R ^{4 to} R ⁶ are each a hydrogen atom or a hydroxyl group), R ² and R ³ must be methyl groups at the same time. There is no.

In the monomer unit represented by the formula (I), a site containing an adamantane skeleton is eliminated from the carboxylic acid portion bonded to the main chain by an acid to generate a free carboxyl group. Therefore, the monomer unit 1 functions as an alkali-soluble unit that is solubilized during alkali development. In addition, since the monomer unit has an adamantane skeleton, the monomer unit has characteristics of being excellent in transparency and having extremely high etching resistance. Further, in the formula (I), R ^{4 to} R ⁶
A monomer unit in which at least one (preferably 2 or 3) is a hydroxyl group has a high hydrophilicity and an adhesive function. Therefore, by appropriately incorporating such a monomer unit or another hydrophilic monomer unit, an excellent adhesive function can be exhibited. Therefore, the polymer compound of the present invention can be suitably used as a resin for a photoresist.

In a preferred embodiment of the present invention, the monomer unit 1 and at least one monomer unit selected from the formulas (IIa) and (IIb) (hereinafter may be referred to as “monomer unit 2”). Includes In the formula (IIa), examples of the hydrocarbon having 1 to ⁸ carbon atoms in R ⁷ and R ⁸ are the same as those described above. Among them, C _1-3 alkyl groups such as methyl, ethyl and isopropyl groups are preferred. R ¹¹ is a group bonded to a carbon atom constituting the adamantane ring. When this is a hydroxyl group or a carboxyl group, it is usually bonded to the bridgehead position of the adamantane ring. In the formula (IIb), R ¹² and R ¹³ are groups bonded to a carbon atom constituting the adamantane ring, and when this is a hydroxyl group, it is usually bonded to the bridgehead of the adamantane ring.

The monomer unit 2 has a highly hydrophilic group (hydroxyl group, carboxyl group,
Since the oxo group is bonded thereto, it functions as an adhesion-imparting unit that increases the adhesion to the substrate. In addition, due to the adamantane skeleton, high etching resistance is provided. In addition, in the monomer unit of the formula (IIa), m is 1 and in the monomer unit of the formula (IIa), R ¹¹ is -C
Since the monomer unit which is an OOR group and the monomer unit of the formula (IIb) generate a free carboxyl group by an acid, they also have an alkali-soluble function. In the formula (IIa), R ⁹ and R ¹⁰ are both hydrogen atoms, and R ¹¹ is —COO
The monomer unit which is an R group and the monomer unit in which both R ¹² and R ^{13 in the} formula (IIb) are hydrogen atoms do not have an adhesive function, but have an alkali-soluble function as described above. By combining a monomer unit in which at least one (preferably 2 or 3) of R ^{4 to} R ^{6 in} the formula (I) is a hydroxyl group, an alkali-soluble function and an adhesive function can be provided in a well-balanced manner. .

Monomer unit 1 and monomer unit 2
The polymer compound having both the two units has an adamantane skeleton, so that high etching resistance can be obtained, and alkali solubility, adhesion to a substrate, plasma etching resistance, and transparency properties are each satisfied. Extremely well-balanced. In such a polymer compound, monomer unit 1 and monomer unit 2
Is, for example, the former / the latter (molar ratio) = 1/99
To 99/1, preferably 5/95 to 80/20, more preferably about 15/85 to 65/35.

The polymer compound of the present invention further comprises a monomer unit having an adamantane skeleton represented by the above formula (III) (having no adhesion function and no alkali-soluble function), and an adamantane represented by the formula (IV) Monomer units having a bridged alicyclic hydrocarbon skeleton other than those represented by the formulas (Va) and (V
at least one monomer selected from a monomer unit having a lactone skeleton represented by b), an acetal monomer unit represented by the formula (VI), and a monomer unit having a carboxyl group represented by the formula (VII) It may contain a unit (hereinafter, may be referred to as “monomer unit 3”).

A polymer consisting only of a structural unit having an adamantane skeleton generally has a small entanglement of molecules and tends to have relatively brittle properties.
Such brittleness is improved by incorporating monomer units of the formula in the polymer. Formulas (III) and (IV)
Monomer units having high etching resistance, the formula (Va),
The monomer unit of (Vb) has a function of imparting adhesion, and has the formula (Vb)
Since the monomer units (b) and (VI) have an alkali-soluble function, the balance of various properties required as a resist resin can be finely adjusted according to the application by the above monomer units.

In the polymer compound containing such a monomer unit 3, the total content of the monomer unit 3 is as follows:
For example, 1 to 50 of all monomer units constituting the polymer
Mol%, preferably about 5 to 40 mol%.

In the polymer compound of the present invention, each of the above
Among the combinations of monomer units, particularly preferable combinations
The following are mentioned as a combination. (1) In formula (I), the bond to the adamantane ring
A monomer unit having 0 or 1 droxyl group;
(I) a hydroxy bonded to an adamantane ring
A monomer unit having 1 to 3, especially 2 or 3,
(2) The monomer unit of the formula (I) and m in the formula (IIa)
(3) a monomer unit of the formula (I) and m in the formula (IIa)
= 1 and R¹¹With a monomer unit in which is a hydroxyl group
Combination (4) R in formula (I)^Four~ R⁶At least one is hidden
A monomer unit which is a loxyl group, and m in the formula (IIa)
= 0 and R¹¹Is a combination with a monomer unit in which is a —COOR group.
(5) The monomer unit of the formula (I) and R in the formula (IIb)
¹²And R¹³At least one of which is a hydroxyl group
Nomer units (especially R¹²= R¹³= OH monomer
(6) R in the formula (I)^Four~ R⁶At least one is hidden
A monomer unit that is a roxyl group and a monomer of the formula (IIb)
(7) A monomer unit of the formula (I) and a monomer of the formula (Va)
Units (eg, R¹⁸~ R ^{twenty two}At least one of them
(8) a monomer unit of the formula (I) and a monomer of the formula (Vb)
Units (eg, R^{twenty three}~ R ^{twenty five}At least one of them
Monomer units which are^{twenty four}And R^{twenty five}Is a methyl group
(9) a monomer unit of the formula (I) and a monomer of the formula (IIa)
Unit (particularly, a monomer unit of m = 0) and a unit of the formula (Va)
Combination with a monomer unit (10) A monomer unit of the formula (I) and a monomer of the formula (IIa)
Unit (particularly, a monomer unit of m = 0) and a compound of the formula (Vb)
Combination with monomer unit (11) The monomer unit of the formula (I) and the monomer of the formula (IIa)
Unit (particularly, a monomer unit of m = 0) and a compound of the formula (VI)
Combination with monomer units

In the polymer compound of the present invention, a monomer unit having an adamantane skeleton [formula (I), (IIa), (II)
b) and (III), especially the compounds of formulas (I), (IIa) and (II)
b)] is, for example, 50 to 100% by weight, preferably 70 to 10% by weight of all monomer units constituting the polymer.
It is about 0% by weight. Such a polymer compound exhibits particularly excellent etching resistance.

In the present invention, the weight average molecular weight (Mw) of the high molecular compound is, for example, about 5,000 to 50,000, preferably about 7000 to 20,000, and the molecular weight distribution (Mw / Mn) is, for example, 1.8 to 3. It is about 0.
Here, Mn indicates a number average molecular weight (in terms of polystyrene).

Each of the monomer units represented by the above formulas (I) to (VII) can be formed by subjecting the corresponding (meth) acrylic ester to a (co) monomer for polymerization. The polymerization can be performed by a conventional method used for producing an acrylic polymer, such as solution polymerization or melt polymerization.

[Monomer unit of the formula (I)]
The monomer corresponding to the monomer unit of the following formula (1)

Embedded image(Where R¹, R^Two, R^Three, R^Four, R^Five, R⁶Is the same as above)
The following compounds may be mentioned as typical examples.
It is. [1-1] 1- (1-ethyl-1- (meth) acryloyl
Oxypropyl) adamantane (R¹= H or CH_Three, R
^Two= R^Three= Ethyl group, R^Four= R^Five= R⁶= H) [1-2] 1- (1-ethyl-1- (meth) acryloyl
Oxypropyl) -3-hydroxyadamantane (R¹
= H or CH_Three, R^Two= R^Three= Ethyl group, R^Four= OH, R^Five
= R⁶= H) [1-3] 1- (1- (meth) acryloyloxy-1-)
Methylpropyl) adamantane (R¹= H or CH_Three, R
^Two= CH_Three, R^Three= Ethyl group, R^Four= R^Five= R⁶= H) [1-4] 1- (1- (meth) acryloyloxy-1-)
Methylpropyl) -3-hydroxyadamantane (R¹
= H or CH_Three, R^Two= CH_Three, R^Three= Ethyl group, R^Four= O
H, R^Five= R⁶= H) [1-5] 1- (1- (meth) acryloyloxy-1,
2-dimethylpropyl) adamantane (R¹= H or C
H_Three, R^Two= CH_Three, R^Three= Isopropyl group, R^Four= R ^Five= R
⁶= H) [1-6] 1- (1- (meth) acryloyloxy-1,
2-dimethylpropyl) -3-hydroxyadamantane
(R¹= H or CH_Three, R^Two= CH_Three, R^Three= Isopropyl
Group, R^Four= OH, R^Five= R⁶= H) [1-7] 1- (1-ethyl-1- (meth) acryloyl
(Oxypropyl) -3,5-dihydroxyadamantane
(R¹= H or CH_Three, R^Two= R^Three= Ethyl group, R^Four= R^Five=
OH, R⁶= H) [1-8] 1,3-dihydroxy-5- (1- (meth) a
Acryloyloxy-1-methylpropyl) adamantane
(R¹= H or CH_Three, R^Two= CH_Three, R^Three= Ethyl group, R^Four
= R^Five= OH, R⁶= H) [1-9] 1,3-dihydroxy-5- (1- (meth) a
(Cryloyloxy-1,2-dimethylpropyl) adama
Tan (R¹= H or CH_Three, R^Two= CH_Three, R^Three= Isop
Ropyl group, R^Four= R^Five= OH, R⁶= H)

The compound represented by the above formula (1) can be obtained, for example, according to the following reaction scheme.

Embedded image (Wherein, ^X represents a halogen atom, R ^X represents a halogen atom, a hydroxyl group, an alkoxy group or an alkenyloxy group. R ¹ , R ² , R ³ , R ⁴ , R ⁵ , and R ⁶ are as defined above. the same)

In this reaction scheme, a compound of the adamantane derivative (8) used as a raw material, in which any one of R ^{4 to} R ⁶ is a hydroxyl group, can be obtained by introducing a hydroxyl group into the adamantane ring. For example, an adamantane compound is contacted with oxygen in the presence of an N-hydroxyimide catalyst such as N-hydroxyphthalimide and, if necessary, a metal promoter such as a cobalt compound (eg, cobalt acetate, cobalt acetylacetonate, etc.). By doing so, a hydroxyl group can be introduced into the adamantane ring. In this method, the amount of the N-hydroxyimide-based catalyst used is, for example, 0.0001 to 1 mol, preferably 0.01 mol, per 1 mol of the adamantane compound.
It is about 01 to 0.5 mol. The amount of the metal promoter used is, for example, 0.0001 to 0.7 mol, preferably 0.001 to 0.7 mol per mol of the adamantane compound.
It is about 0.5 mol. Oxygen is often used in excess with respect to the adamantane compound. The reaction is carried out, for example, in a solvent such as an organic acid such as acetic acid, a nitrile such as acetonitrile, or a halogenated hydrocarbon such as dichloroethane, at normal pressure or under pressure, at about 0 to 200 ° C., preferably 30 to 15 ° C.
This is performed at a temperature of about 0 ° C. By selecting the reaction conditions, a plurality of hydroxyl groups can be introduced into the adamantane ring.

The reaction of the adamantane derivative (8) with a 1,2-dicarbonyl compound (for example, biacetyl) (9) and oxygen is carried out by a metal compound such as a cobalt compound (for example, cobalt acetate, cobalt acetylacetonate or the like). And / or in the presence of an N-hydroxyimide-based catalyst such as N-hydroxyphthalimide. 1,
The amount of the 2-dicarbonyl compound (9) used is 1 mol or more (for example, 1 to 1 mol) per 1 mol of the adamantane derivative (8).
50 mol), preferably 1.5 to 20 mol, more preferably about 3 to 10 mol. The amount of the metal compound to be used is, for example, about 0.0001 to 0.1 mol per 1 mol of the adamantane derivative (8). The amount of the N-hydroxyimide-based catalyst used is determined based on the adamantane derivative (8).
The amount is, for example, about 0.001 to 0.7 mol per 1 mol. Oxygen is often used in excess with respect to the adamantane derivative (8). The reaction is usually performed in an organic solvent. Examples of the organic solvent include nitriles such as benzonitrile, an organic acid such as acetic acid, and halogenated hydrocarbons such as trifluoromethylbenzene. The reaction is carried out at normal pressure or under pressure, for example, at a temperature of about 30 to 250 ° C, preferably about 40 to 200 ° C.

The reaction between the acyladamantane derivative (10) thus obtained and the Grignard reagent (11) can be carried out according to a usual Grignard reaction. The amount of the Grignard reagent (11) to be used is, for example, about 0.7 to 3 mol, and preferably about 0.9 to 1.5 mol, per 1 mol of the acyladamantane derivative (10). When the acyl adamantane derivative (10) has a hydroxyl group on the adamantane ring, the amount of the Grignard reagent is increased according to the number thereof. The reaction is performed, for example, in ethers such as diethyl ether and tetrahydrofuran. The reaction temperature is, for example, 0 to 150 ° C, preferably 20 to 10 ° C.
It is about 0 ° C.

The reaction (esterification reaction) between the adamantane methanol derivative (12) produced by the above reaction and (meth) acrylic acid or its derivative (13) is carried out by a conventional method using an acid catalyst or a transesterification catalyst. be able to. Further, the adamantane methanol derivative (12) and an alkenyl (meth) acrylate such as vinyl (meth) acrylate and 2-propenyl (meth) acrylate are combined with a catalyst of a Group 3 element compound of the periodic table (for example, samarium acetate, trifluoromethane). Reaction (ester exchange reaction) in the presence of samarium compounds such as samarium methanesulfonate and samarium complex), the formula (1) can be efficiently obtained under mild conditions.
Can be obtained. In this case, the amount of alkenyl (meth) acrylate used is, for example, 0.8 to 1 mol of the adamantane methanol derivative (12).
It is about 5 mol, preferably about 1 to 1.5 mol. The amount of the group 3 element compound catalyst used in the periodic table is, for example, 0.001 to 1 mol of the adamantane methanol derivative (12).
It is about 1 mol, preferably about 0.01 to 0.25 mol. This reaction is carried out in a solvent inert to the reaction, for example, from 0 to 1
The reaction is performed at a temperature of 50 ° C, preferably about 25 to 120 ° C.

Further, among the compounds represented by the above formula (1), those in which R ² and R ³ are the same group can be obtained, for example, according to the following reaction scheme.

Embedded image (Wherein, R ^y represents a hydrocarbon group. X, R ¹ , R ² , R ³ ,
R ⁴ , R ⁵ , R ⁶ and ^RX are the same as described above)

Examples of the hydrocarbon group for R ^y include a C _1-6 aliphatic hydrocarbon group such as a methyl, ethyl, propyl, and isopropyl group; and a phenyl group.

In this reaction scheme, the adamantanecarboxylic acid derivative (14) used as a raw material can be produced by introducing a carboxyl group into the adamantane ring of the adamantane compound. For example, an adamantane compound may be combined with an N-hydroxyimide-based catalyst such as N-hydroxyphthalimide and, if necessary, a cobalt compound (for example,
Carboxyl groups can be introduced into the adamantane ring of the adamantane compound by contacting with carbon monoxide and oxygen in the presence of a metal-based cocatalyst such as cobalt acetate, cobalt acetylacetonate and the like. In the carboxylation reaction, the amount of the N-hydroxyimide-based catalyst used is, for example, 0.0001 to 1 mol of the adamantane compound.
To 1 mol, preferably about 0.001 to 0.5 mol. The amount of the metal promoter used is, for example, 0.0001 to 0.7 mol, per mol of the adamantane compound,
Preferably it is about 0.001-0.5 mol. The amounts of carbon monoxide and oxygen used are, for example, 1 mol or more and 0.5 mol or more, respectively, per 1 mol of the adamantane compound. The ratio of carbon monoxide and oxygen is, for example,
The latter (molar ratio) = about 1/99 to 99/1, preferably about 50/50 to 95/5. The carboxylation reaction is, for example, an organic acid such as acetic acid, a nitrile such as acetonitrile, a solvent such as a halogenated hydrocarbon such as dichloroethane, at normal pressure or under pressure, at about 0 to 200 ° C., preferably about 10 to 150 ° C. At a temperature of In addition,
By selecting the reaction conditions, a plurality of carboxyl groups can be introduced into the adamantane ring.

The reaction between the adamantanecarboxylic acid derivative (14) and the hydroxy compound (15) can be carried out, for example, according to a conventional esterification method using an acid catalyst or the like. The reaction between the adamantanecarboxylic acid ester represented by the formula (16) and the Grignard reagent (11) is usually performed in a solvent inert to the reaction, for example, ethers such as diethyl ether and tetrahydrofuran. The reaction temperature is, for example, about 0 to 100 ° C, preferably about 10 to 40 ° C. The amount of the Grignard reagent (11) used is, for example, about 2 to 4 equivalents based on the adamantanecarboxylic acid ester (16).

The reaction (esterification reaction) between the adamantane methanol derivative (12a) and (meth) acrylic acid or its derivative (13) is carried out by reacting the compound represented by the formula (12) with (meth) acrylic acid or its derivative. It can be carried out according to the reaction with (13). In this way, among the compounds represented by the formula (1), the compound (1a) in which R ² and R ³ are the same hydrocarbon group (for example, R ² = R ³ = ethyl group) can be easily prepared. Can be prepared.

[Monomer unit of the formula (IIa)]
The monomer corresponding to the monomer unit of a) is represented by the following formula (2)
a)

Embedded image(Where R¹, R⁷, R⁸, R⁹, R^Ten, R¹¹, M is as above
The same compounds are represented by the following compounds.
No. [2-1] 1-hydroxy-3- (meth) acryloylo
Kisia damantane (m = 0, R¹= H or CH_Three, R⁹=
R^Ten= H, R¹¹= OH) [2-2] 1,3-dihydroxy-5- (meth) acrylo
Iloxyadamantane (m = 0, R¹= H or CH_Three,
R⁹= R¹¹= OH, R^Ten= H) [2-3] 1-carboxy-3- (meth) acryloylo
Kisia damantane (m = 0, R¹= H or CH_Three, R⁹=
R^Ten= H, R¹¹= COOH) [2-4] 1,3-dicarboxy-5- (meth) acrylo
Iloxyadamantane (m = 0, R¹= H or CH_Three,
R⁹= R¹¹= COOH, R^Ten= H) [2-5] 1-carboxy-3-hydroxy-5- (me
T) acryloyloxy adamantane (m = 0, R¹=
H or CH_Three, R⁹= COOH, R^Ten= H, R¹¹= OH) [2-6] 1- (meth) acryloyloxy-4-oxo
Adamantane (m = 0, R¹= H or CH_Three, R⁹= R^Ten
= H, R¹¹= 4-oxo group) [2-7] 3-hydroxy-1- (meth) acryloyl
Xy-4-oxoadamantane (m = 0, R¹= H or
CH_Three, R⁹= 3-OH, R^Ten= H, R¹¹= 4-oxo
Group) [2-8] 7-hydroxy-1- (meth) acryloyl
Xy-4-oxoadamantane (m = 0, R¹= H or
CH_Three, R⁹= 7-OH, R^Ten= H, R¹¹= 4-oxo
Group) [2-9] 1,3-dihydroxy-5- (1- (meth) a
Acryloyloxy-1-methylethyl) adamantane
(M = 1, R⁷= R⁸= CH_Three, R⁹= R¹¹= OH, R ^Ten=
H) [2-10] 1-t-butoxycarbonyl-3- (meth) a
Cryloyloxyadamantane (m = 0, R¹= H or
CH_Three, R⁹= R^Ten= H, R¹¹= T-butoxycarbonyl
Group) [2-11] 1,3-bis (t-butoxycarbonyl) -5
-(Meth) acryloyloxyadamantane [m = 0,
R¹= H or CH_Three, R⁹= R¹¹= T-butoxycarboni
R group, R^Ten= H] [2-12] 1-t-butoxycarbonyl-3-hydroxy
-5- (meth) acryloyloxyadamantane (m =
0, R¹= H or CH_Three, R⁹= OH, R^Ten= H, R¹¹=
t-butoxycarbonyl group) [2-13] 1- (2-tetrahydropyranyloxycarbo
Nyl) -3- (meth) acryloyloxyadamantane
(M = 0, R¹= H or CH_Three, R⁹= R^Ten= H, R¹¹=
2-tetrahydropyranyloxycarbonyl group) [2-14] 1,3-bis (2-tetrahydropyranyloxy)
(Cicarbonyl) -5- (meth) acryloyloxyada
Mantan (m = 0, R¹= H or CH_Three, R⁹= R^{1 1}= 2
-Tetrahydropyranyloxycarbonyl group, R^Ten=
H) [2-15] 1-hydroxy-3- (2-tetrahydropyra
Nyloxycarbonyl) -5- (meth) acryloylo
Kisia damantane (m = 0, R¹= H or CH_Three, R⁹=
OH, R^Ten= H, R¹¹= 2-tetrahydropyranyloxy
Sicarbonyl group)

The compound represented by the above formula (2a) can be obtained, for example, according to the following reaction scheme.

Embedded image (Wherein, R ¹ , R ⁷ , R ⁸ , R ⁹ , R ¹⁰ , R ¹¹ and R ^X are the same as described above)

In this reaction scheme, among the compounds represented by the formula (17) used as a raw material, the compound wherein m = 1 can be produced by the same method as the above-mentioned compound (12) or (12a). Further, among the compounds represented by the formula (17) used as a raw material, the compound having m = 0 can be obtained by introducing a hydroxyl group or a carboxyl group into the adamantane ring of the adamantane compound. Examples of the method for introducing a hydroxyl group or a carboxyl group into the adamantane ring include the above-described methods. Further, among the compounds represented by the formula (17), those in which R ¹¹ is a —COOR group can be produced by subjecting the corresponding carboxylic acid and alcohol ROH to a conventional esterification reaction. The reaction (esterification reaction) between the compound (17) and (meth) acrylic acid or its derivative (13) is carried out by reacting the compound represented by the formula (12) with (meth) acrylic acid or its derivative (13). The reaction can be performed according to the reaction.

[Monomer unit of the formula (IIb)]
The monomer corresponding to the monomer unit of b) is represented by the following formula (2)
b)

Embedded image (Wherein R ¹ , R ¹² and R ¹³ are the same as described above), and typical examples thereof include the following compounds. [2-16] 1,3-dihydroxy-2- (meth) acryloyloxy-2-methyladamantane (R ¹ = H or C
^{_{H 3, R 12 = 1-}} OH, R 13 = 3-OH) [2-17] 1,5- dihydroxy-2- (meth) acryloyloxy-2-methyl-adamantane (R ¹ = H or C
H ₃ , R ¹² = 1-OH, R ¹³ = 5-OH) [2-18] 1,3-dihydroxy-6- (meth) acryloyloxy-6-methyladamantane (R ¹ = H or C
H ₃ , R ¹² = 1-OH, R ¹³ = 3-OH) [2-19] 1-hydroxy-2- (meth) acryloyloxy-2-methyladamantane (R ¹ ＨH or CH ₃ , R
^{12 = 1-OH, R 13} = H) [2-20] 5- hydroxy-2- (meth) acryloyloxy-2-methyl-adamantane (R ¹ = H or CH _3, R
^{12 = 5-OH, R 13} = H) [2-21] 2- ( meth) acryloyloxy-2-methyl-adamantane (R ¹ = H or _{^{CH 3, R 12 = R 13}} = H)

The compound represented by the above formula (2b) can be obtained, for example, according to the following reaction scheme.

Embedded image (Wherein, X, R ¹ , R ¹² , R ¹³ and R ^X are the same as described above)

In this reaction scheme, the reaction between the adamantanone derivative (18) and the Grignard reagent (19) can be carried out according to a conventional Grignard reaction. The amount of the Grignard reagent (19) used is, for example, about 0.7 to 3 mol, and preferably about 0.9 to 1.5 mol, per 1 mol of the adamantanone derivative (18). When the adamantane derivative (18) has a hydroxyl group on the adamantane ring, the amount of the Grignard reagent is increased according to the number of the hydroxyl groups. The reaction is carried out in a solvent inert to the reaction, for example, ethers such as diethyl ether and tetrahydrofuran. The reaction temperature is, for example, about 0 to 150 ° C, preferably about 20 to 100 ° C.

The 2-adamantanol derivative (20) thus obtained is converted from (meth) acrylic acid or its derivative (13)
(Esterification reaction) to give a compound represented by the above formula (2b). The esterification reaction can be carried out according to the reaction between the compound of the formula (12) and (meth) acrylic acid or its derivative (13).

The adamantane derivative (18) having a hydroxyl group on the adamantane ring of the adamantane derivative (18) used as a raw material in the above method can be obtained by converting 2-adamantanones into an N-hydroxyimide-based catalyst such as N-hydroxyphthalimide, If necessary, it can be produced by contacting with oxygen in the presence of a metal-based cocatalyst such as a cobalt compound, a manganese compound and a vanadium compound to introduce a hydroxyl group into the adamantane ring. In this method, the amount of the N-hydroxyimide-based catalyst used is, for example, 0.0001 to 1 with respect to 1 mol of the 2-adamantanones.
Mol, preferably about 0.001 to 0.5 mol.
The amount of the metal promoter used is, for example, about 0.0001 to 0.7 mol, and preferably about 0.001 to 0.5 mol, per 1 mol of the 2-adamantanones. Oxygen is 2
-Often used in excess with respect to adamantanones.
The reaction is, for example, an organic acid such as acetic acid, a nitrile such as acetonitrile, a solvent such as a halogenated hydrocarbon such as dichloroethane, at normal pressure or under pressure, at about 0 to 200 ° C.
Preferably, it is performed at a temperature of about 30 to 150 ° C.

Among the adamantane derivatives (18), compounds having a hydroxyl group on the adamantane ring include the adamantane and oxygen, the N-hydroxyimide-based catalyst and a strong acid (eg, hydrogen halide, sulfuric acid, etc.). ,
If necessary, it can be produced by reacting in the presence of the metal-based cocatalyst. The amount of the strong acid used is
For example, 0.00001 per mole of adamantane
To 1 mol, preferably about 0.0005 to 0.7 mol. Other reaction conditions are the same as the above-mentioned hydroxyl group introduction reaction.

[Monomer unit of the formula (III)]
The monomer corresponding to the monomer unit of I) is represented by the following formula (3)

Embedded image (Wherein R ¹ and R ¹⁴ are the same as described above), and specific examples thereof include the following compounds. These compounds can be produced by known or conventional methods. [3-1] 1- (meth) acryloyloxy adamantane (R ¹ = H or _{^{CH 3, R 1 4 = H}} ) [3-2] 1- ( meth) acryloyloxy-3,5-dimethyl adamantane (R ¹ ＨH or CH ₃ , R ¹⁴ ＣC
H ₃ )

[Monomer unit of the formula (IV)]
The monomer forming the monomer unit of the formula is represented by the following formula (4)

Embedded image (Wherein R ¹ , R ¹⁵ and R ¹⁶ are as defined above), and representative examples include the following compounds. These compounds can be obtained by known or conventional methods. [4-1] 8-Hydroxymethyl-4- (meth) acryloyloxymethyltricyclo [5.2.1.0 ^2,6 ] decane [4-2] 4-Hydroxymethyl-8- (meth) acryloyloxy Methyltricyclo [5.2.1.0 ^2,6 ] decane [4-3] 4- (meth) acryloyloxymethyltetracyclo [4.4.0.1 ^2,5 . 1 ^7,10 ] dodecane [4-4] 2- (meth) acryloyloxynorbornane [4-5] 2- (meth) acryloyloxyisobornane [4-6] 2- (meth) acryloyloxymethylnorbornane

Embedded image

[Monomer Unit of the Formula (Va)]
The monomer forming the monomer unit of the following formula (5a)

Embedded image(Where R¹, R¹⁸, R¹⁹, R²⁰, R^{twenty one}, R^{twenty two}Is above
The same), representative examples of which include the following compounds:
I will. [5-1] 2- (meth) acryloyloxy-γ-butyrola
Kuton (R¹= H or CH _Three, R¹⁸= R¹⁹= R²⁰= R^{twenty one}=
R^{twenty two}= H) [5-2] 2- (meth) acryloyloxy-2-methyl-
γ-butyrolactone (R¹= H or CH_Three, R¹⁸= C
H_Three, R¹⁹= R²⁰= R^{twenty one}= R^{twenty two}= H) [5-3] 2- (meth) acryloyloxy-4,4-dimethyl
Cyl-γ-butyrolactone (R¹= H or CH_Three, R¹⁸=
R¹⁹= R²⁰= H, R^{twenty one}= R^{twenty two}= CH_Three) [5-4] 2- (meth) acryloyloxy-2,4,4-
Trimethyl-γ-butyrolactone (R¹= H or CH_Three,
R¹⁸= R^{twenty one}= R^{twenty two}= CH_Three, R¹⁹= R²⁰= H) [5-5] 2- (meth) acryloyloxy-3,4,4-
Trimethyl-γ-butyrolactone (R¹= H or CH_Three,
R¹⁸= R²⁰= H, R¹⁹= R^{twenty one}= R^{twenty two}= CH_Three) [5-6] 2- (meth) acryloyloxy-2,3,4
4-tetramethyl-γ-butyrolactone (R¹= H or
CH_Three, R¹⁸= R¹⁹= R^{twenty one}= R^{twenty two}= CH_Three, R²⁰= H) [5-7] 2- (meth) acryloyloxy-3,3,4-
Trimethyl-γ-butyrolactone (R¹= H or CH_Three,
R¹⁸= R^{twenty two}= H, R¹⁹= R²⁰= R^{twenty one}= CH_Three[5-8] 2- (meth) acryloyloxy-2,3,3
4-tetramethyl-γ-butyrolactone (R¹= H or
CH_Three, R¹⁸= R¹⁹= R²⁰= R^{twenty one}= CH_Three, R^{twenty two}= H) [5-9] 2- (meth) acryloyloxy-3,3,4,
4-tetramethyl-γ-butyrolactone (R¹= H or
CH_Three, R¹⁸= H, R¹⁹= R²⁰= R^{twenty one}= R^{twenty two}= CH _Three[5-10] 2- (meth) acryloyloxy-2,3,3
4,4-pentamethyl-γ-butyrolactone (R¹= H
Or CH_Three, R¹⁸= R¹⁹= R²⁰= R^{twenty one}= R^{twenty two}= CH _Three)

The compound represented by the formula (5a) can be obtained, for example, according to the following reaction scheme.

Embedded image (Wherein, R ^z represents a hydrocarbon group. R ¹ , R ¹⁸ , R ¹⁹ , R
²⁰ , R ²¹ , R ²² and R ^X are the same as described above)

In the above reaction ^scheme, the hydrocarbon group for R ^z includes methyl, ethyl, propyl, s-butyl,
aliphatic hydrocarbon groups having about 1 to 6 carbon atoms such as t-butyl, vinyl and allyl groups (alkyl groups, alkenyl groups or alkynyl groups); aromatic hydrocarbon groups such as phenyl group and naphthyl group; cycloalkyl groups And an alicyclic hydrocarbon group.

Α, β-unsaturated carboxylic acid ester (21)
The reaction between alcohol and alcohol (22) with oxygen is carried out by an N-hydroxyimide-based catalyst such as N-hydroxyphthalimide and, if necessary, a metal-based cocatalyst such as a cobalt compound (eg, cobalt acetate, cobalt acetylacetonate, etc.). Done in the presence of The ratio between the α, β-unsaturated carboxylic acid ester (21) and the alcohol (22) can be appropriately selected depending on the types (price, reactivity, etc.) of both compounds. For example, the alcohol (22) may be used in excess (for example, about 2 to 50 times by mole) relative to the α, β-unsaturated carboxylic acid ester (21). The ester (21) may be used in excess with respect to the alcohol (22). The amount of the N-hydroxyimide-based catalyst used is α, β-
For example, 0.1 mol of the unsaturated carboxylic acid ester (21) and the alcohol (22) may be used with respect to 1 mol of the compound used in a small amount.
It is about 0001 to 1 mol, preferably about 0.001 to 0.5 mol. The amount of the metal promoter used is α, β-
For example, 0.1 mol of the unsaturated carboxylic acid ester (21) and the alcohol (22) may be used with respect to 1 mol of the compound used in a small amount.
0001-0.7 mol, preferably 0.001-0.5
It is about a mole. Oxygen is often used in excess of the α, β-unsaturated carboxylic acid ester (21) and the alcohol (22), which are used in small amounts. The reaction is, for example, in a solvent such as an organic acid such as acetic acid, a nitrile such as acetonitrile, a halogenated hydrocarbon such as trifluoromethylbenzene, or an ester such as ethyl acetate, at about 0 to 150 ° C. under normal pressure or pressure. , Preferably 30 to 10
This is performed at a temperature of about 0 ° C.

The reaction between the α-hydroxy-γ-butyrolactone derivative (23) thus obtained and (meth) acrylic acid or its derivative (13) is carried out by the above-mentioned 1-adamantanol derivative (12) and (meth) acrylic acid. Or its derivative (1
3) can be carried out according to the reaction.

[Monomer unit of the formula (Vb)]
The monomer forming the monomer unit of the following formula (5b)

Embedded image (Wherein R ¹ , R ²³ , R ²⁴ , and R ²⁵ are the same as described above), and typical examples thereof include the following compounds. [5-11] 3- (meth) acryloyloxy-γ-butyrolactone (R ¹ = H or CH ₃ , R ²³ = R ²⁴ = R ²⁵ = H) [5-12] 3- (meth) acryloyloxy-3 -Methyl-γ-butyrolactone (R ¹ ＨH or CH ₃ , R ²³ ＣＨCH
₃ , R ²⁴ = R ²⁵ = H) [5-13] 3- (meth) acryloyloxy-4-methyl-γ-butyrolactone (R ¹ = H or CH ₃ , R ²³ = R ²⁵
ＨH, R ²⁴ ＣＨCH ₃ ) [5-14] 3- (meth) acryloyloxy-3,4-dimethyl-γ-butyrolactone (R ¹ ＨH or CH ₃ , R ²³
= R ²⁴ = CH ₃ , R ²⁵ = H) [5-15] 3- (meth) acryloyloxy-4,4-dimethyl-γ-butyrolactone (R ¹ = H or CH ₃ , R ^{23
= H, R 24 = R 25} = CH 3) [5-16] 3- ( meth) acryloyloxy -3,4,4
-Trimethyl-γ-butyrolactone (R ¹ = H or C
_{^{H 3, R 23 = R 24}} = R 25 = CH 3)

The compound represented by the above formula (5b) can be obtained, for example, according to the following reaction scheme.

Embedded image (Wherein, R ¹ , R ²³ , R ²⁴ , R ²⁵ and R ^X are the same as described above)

In the above reaction scheme, the α-hydroxy-γ-butyrolactone represented by the formula (24) is represented by the formula (2
The conversion (isomerization) to β-hydroxy-γ-butyrolactone represented by 5) is carried out by converting the compound of the formula (24) into a solvent to which a small amount of an acid such as water or sulfuric acid or hydrochloric acid is added, if necessary. Can be performed. As the solvent,
There is no particular limitation, and for example, acetonitrile, acetic acid, ethyl acetate and the like can be used. The reaction temperature is, for example, 0 to 15
0 ° C., preferably about 20 to 100 ° C. Α-Hydroxy-γ-butyrolactones used as raw materials (24)
Can be produced in the same manner as in the compound represented by the formula (23). The compound of the formula (25) is obtained by reacting the compound of the formula (24) with phosphorus pentoxide (dehydration reaction) to obtain the corresponding α, β
-Unsaturated-γ-butyrolactone, which is reacted with hydrogen peroxide or a peracid such as m-chloroperbenzoic acid to epoxidize the double bond, and then hydrogenated in the presence of a catalyst such as Pd-C Can also be obtained. Equation (2
The compound of 5) can also be produced by a known method for obtaining β-hydroxy-γ-butyrolactones.

The reaction between β-hydroxy-γ-butyrolactones (25) and (meth) acrylic acid of the formula (13) or a derivative thereof is carried out by reacting the compound of the formula (12) with the (meth)
The reaction can be carried out according to the reaction with acrylic acid or its derivative (13).

[Monomer unit of the formula (VI)]
The monomer forming the monomer unit of the formula is represented by the following formula (6)

Embedded image Wherein R ¹ and n are the same as described above, and representative examples include the following compounds. [6-1] 2-Tetrahydropyranyl (meth) acrylate (R ¹ ＨH or CH ₃ , n = 2) [6-2] 2-Tetrahydrofuranyl (meth) acrylate (R ¹ ＨH or CH ₃ , n = 1)

[Monomer unit of the formula (VII)]
The monomer forming the monomer unit of I) is represented by the following formula (7)

Embedded image (Wherein R ¹ is the same as described above), and specific examples thereof are the following compounds. [7-1] (Meth) acrylic acid (R ¹ ＨH or CH ₃ ) The polymer compound of the present invention has all of transparency, alkali solubility, adhesion and etching resistance as described above. Therefore, it can be suitably used as a photoresist resin.

The photoresist resin composition of the present invention comprises:
It contains the polymer compound of the present invention and a photoacid generator. As the photoacid generator, a common or known compound that efficiently generates an acid upon exposure, for example, a diazonium salt,
Iodonium salts (eg, diphenyliodohexafluorophosphate, etc.), sulfonium salts (eg, triphenylsulfonium hexafluoroantimonate, triphenylsulfonium hexafluorophosphate, triphenylsulfonium methanesulfonate, etc.), sulfonic acid esters [eg, 1-phenyl -1
-(4-methylphenyl) sulfonyloxy-1-benzoylmethane, 1,2,3-trisulfonyloxymethylbenzene, 1,3-dinitro-2- (4-phenylsulfonyloxymethyl) benzene, 1-phenyl-1 −
(4-methylphenylsulfonyloxymethyl) -1-
Hydroxy-1-benzoylmethane], oxathiazole derivatives, s-triazine derivatives, disulfone derivatives (such as diphenyldisulfone), imide compounds, oxime sulfonates, diazonaphthoquinone, benzoin tosylate, and the like. These photoacid generators can be used alone or in combination of two or more.

The amount of the photoacid generator used can be appropriately selected according to the strength of the acid generated by light irradiation, the ratio of each monomer unit in the polymer compound, and the like. For example, based on 100 parts by weight of the polymer compound 0.1 to 30 parts by weight, preferably 1 to 25 parts by weight, more preferably about 2 to 20 parts by weight.

The resin composition for a photoresist includes an alkali-soluble component such as an alkali-soluble resin (for example, a novolak resin, a phenol resin, an imide resin, and a carboxyl group-containing resin), a coloring agent (for example, a dye), and an organic solvent. (For example, hydrocarbons, halogenated hydrocarbons, alcohols, esters, amides, ketones, ethers, cellosolves, carbitols, glycol ether esters, mixed solvents thereof and the like). May be.

After coating the photoresist resin composition on a substrate or substrate and drying, the coating film (resist film) is exposed to light through a predetermined mask (or further baked after exposure). The fine pattern can be formed with high precision by forming a latent image pattern and then developing.

As a substrate or a substrate, a silicon wafer,
Examples include metal, plastic, glass, and ceramic. The application of the photoresist resin composition can be performed using a conventional application means such as a spin coater, a dip coater, and a roller coater. The thickness of the coating film is, for example, about 0.1 to 20 μm, and preferably about 0.3 to 2 μm.

Light beams having various wavelengths, for example, ultraviolet rays and X-rays can be used for exposure. For semiconductor resists, g-rays, i-rays, and excimer lasers (for example, XeC
1, KrF, KrCl, ArF, ArCl, etc.) are used. Exposure energy is, for example, 1 to 1000 m
J / cm ² , preferably about 10 to 500 mJ / cm ² .

An acid is generated from the photoacid generator by light irradiation,
This acid causes the protective group (eliminable group) of the carboxyl group in the polymer compound to be quickly eliminated, thereby generating a carboxyl group contributing to solubilization. Therefore, a predetermined pattern can be accurately formed by development with water or an alkali developing solution.

[0064]

According to the present invention, since the polymer contains a monomer unit having an adamantane skeleton having a specific structure, high etching resistance can be obtained while maintaining excellent transparency, alkali solubility and adhesion. Can be.

The present invention will be described in more detail with reference to the following Examples, which should not be construed as limiting the invention thereto. In addition, "acrylate" after the compound number (monomer number) indicates a compound having an acryloyloxy group among two compounds corresponding to the compound numbers described in the specification, and "methacrylate" means And a compound having a methacryloyloxy group among the above two compounds. The number at the lower right of the parenthesis in the structural formula indicates the mol% of the monomer unit.

Production Example 1 (Production of 1- (1-acryloyloxy-1-ethylpropyl) adamantane [1-1 (acrylate)]) A flask was charged with 13% by weight of ethyl prepared beforehand from ethyl bromide and metallic magnesium. Magnesium bromide
61.51 g (0.060 mol) of a tetrahydrofuran solution was charged. To this solution, a solution of 4.76 g (0.02 mol) of 1-adamantane carboxylic acid n-butyl ester dissolved in 7.21 g of tetrahydrofuran was added dropwise while maintaining the internal temperature at 35 ° C. or lower. After the addition, the mixture was stirred at room temperature for 1 hour. The reaction mixture obtained above was added dropwise to 32.37 g of a 10% by weight aqueous sulfuric acid solution while maintaining the internal temperature at 35 ° C. or lower, and then neutralized with a 5% by weight aqueous solution of sodium hydroxide and separated. Was. The aqueous layer was extracted twice with 22.24 g of benzene. The organic layers were combined and saturated saline solution 22.24
g, followed by drying over anhydrous sodium sulfate.
After drying, the mixture was filtered, and the filtrate was concentrated under reduced pressure to obtain α, α-diethyl-1-adamantanemethanol. The yield based on 1-adamantanecarboxylic acid n-butyl ester is 4
It was 5.5%. . [Spectral data of α, α-diethyl-1-adamantanemethanol] GC-MS m / e: 204, 193, 175, 16
1,147,135,86,79,67,57,41 15 mmol of acrylic acid chloride was added to a mixture of 10 mmol of α, α-diethyl-1-adamantanemethanol, 20 mmol of triethylamine and 40 ml of tetrahydrofuran obtained by the above method. It was dropped over about 30 minutes. After completion of the dropwise addition, the mixture was stirred at room temperature for 6 hours. After water was added to the reaction mixture, the mixture was concentrated, and the concentrate was subjected to silica gel column chromatography to obtain the title compound in a yield of 72%. [Spectral data] ¹ H-NMR (500 MHz, CDCl ₃ ) δ: 1.1
5-1.55 (m, 10H), 1.59-1.76
(M, 10H), 2.03 (m, 3H), 5.72 (d
d, 1H), 6.04 (dd, 1H), 6.28 (d
d, 1H)

Production Example 2 (Production of 1- (1-ethyl-1-methacryloyloxypropyl) adamantane [1-1 (methacrylate)])
The same operation as in Production Example 1 was carried out except that methacrylic chloride was used instead of acrylic chloride to obtain the title compound. [Spectral data] ¹ H-NMR (500 MHz, CDCl ₃ ) δ: 1.1
3-1.76 (m, 20H), 2.07 (m, 3H),
5.47 (brs, 1H), 6.00 (brs, 1H)

Production Example 3 (Production of 1- (1-acryloyloxy-1-methylpropyl) adamantane [1-3 (acrylate)]) Adamantane 0.3 mol, biacetyl 1.8 mol, cobalt (II) acetate 1 A mixture of 0.5 mmol and 300 ml of acetic acid was stirred at 60 ° C. for 4 hours under an oxygen atmosphere (1 atm). The reaction mixture was concentrated to about 20% by weight, extracted with ethyl acetate, dried, and washed with hexane to obtain 1-acetyladamantane in a yield of 52%. The conversion of adamantane was 87%.
1.1 mol of metallic magnesium was placed in a flask, and after purging with nitrogen, 1.0 mol of ethyl bromide was added to 50 ml of ethyl ether.
A solution dissolved in 0 ml was charged to the extent that the metal magnesium was immersed. Next, a small amount of iodine was added to start the reaction, and the remaining ethyl ether solution of ethyl bromide was added dropwise at such a rate that the solvent was gently refluxed. To the obtained reaction mixture, a solution in which 1.0 mol of 1-acetyladamantane obtained by the above method was dissolved in 1,000 ml of ethyl ether was added dropwise at such a rate that the solvent was gently refluxed,
After the completion of the dropwise addition, the mixture was refluxed for another 2 hours. The obtained reaction mixture was cooled with ice-cooled 10% hydrochloric acid (HCl: equivalent to 1 mol).
The mixture was slowly added dropwise with stirring, and further stirred at 0 ° C. to room temperature for 2 hours. After adding 10% sodium hydroxide to the reaction mixture to adjust the liquidity to neutral, the mixture is separated into an organic layer and an aqueous layer, the aqueous layer is extracted twice with 1000 ml of ethyl ether, and the organic layers are combined and concentrated. Then, the concentrated solution was cooled and crystallized to obtain α-ethyl-α-methyl-1-adamantanemethanol in a yield of 46%. To a mixture of 10 mmol of α-ethyl-α-methyl-1-adamantanemethanol, 10 mmol of triethylamine and 40 ml of tetrahydrofuran obtained by the above method, 10 mmol of acrylic acid chloride was added dropwise over about 30 minutes. After completion of the dropwise addition, the mixture was stirred at room temperature for 6 hours. After adding water to the reaction mixture, the mixture was concentrated, and the concentrate was subjected to silica gel column chromatography to obtain the title compound in a yield of 74%. [Spectral data] ¹ H-NMR (CDCl ₃ ) δ: 1.14 to 1.37
(M, 5H), 1.48 (s, 3H), 1.55-1.
78 (m, 10H), 2.04 (m, 3H), 5.73
(Dd, 1H), 6.05 (dd, 1H), 6.29
(Dd, 1H)

Production Example 4 (Production of 1- (1-methacryloyloxy-1-methylpropyl) adamantane [1-3 (methacrylate)])
The same operation as in Production Example 3 was performed except that methacrylic acid chloride was used instead of acrylic acid chloride, to obtain the title compound. [Spectral data] ¹ H-NMR (CDCl ₃ ) δ: 1.18-1.43
(M, 5H), 1.50 (s, 3H), 1.53-1.
80 (m, 10H), 2.10 (m, 3H), 5.52
(Brs, 1H), 6.02 (brs, 1H)

Production Example 5 (Production of 1- (1-acryloyloxy-1,2-dimethylpropyl) adamantane [1-6 (acrylate)]) Instead of adamantane, 1-adamantanol was replaced with 0.3.
The same operation as in Production Example 3 was carried out except that the molar amount was used, and the conversion of 1-adamantanol was 82%, and 1-acetyl-3-
Adamantanol was obtained in a yield of 20%. [Spectral data of 1-acetyl-3-adamantanol] IR (cm ^-1 ): 3401, 2897, 2854, 16
83, 1430, 1019, 605 ¹³ C-NMR (CDCl ₃ ) δ: 24.3, 29.9,
34.8, 36.8, 43.9, 45.4, 49.6,
67.9, 212.4 1.1 mol of metallic magnesium was placed in a flask, and after purging with nitrogen, a solution of 1.0 mol of 2-bromopropane dissolved in 500 ml of ethyl ether was charged to the extent that the metallic magnesium was immersed. . Next, a small amount of iodine was added to start the reaction, and the remaining ethyl ether solution of 2-bromopropane was added dropwise at such a rate that the solvent was gently refluxed. After the completion of the dropwise addition, the mixture was further refluxed for 2 hours. To the obtained reaction mixture, 0.5 mol of 1-acetyl-3-adamantanol obtained by the above method was added to 1000 m
The solution dissolved in 1 l of ethyl ether was added dropwise at such a rate that the solvent was gently refluxed. After the completion of the dropwise addition, the solution was further refluxed for 2 hours. The obtained reaction mixture was cooled to 10% with ice.
The mixture was slowly dropped into hydrochloric acid (HCl: equivalent to 1 mol) with stirring, and further stirred at 0 ° C. to room temperature for 2 hours. The reaction mixture was adjusted to neutrality by adding 10% sodium hydroxide, and then separated into an organic layer and an aqueous layer. The aqueous layer was extracted twice with 1,000 ml of ethyl ether, and the organic layers were combined and concentrated. Then, the concentrated solution was cooled and crystallized to obtain 3-hydroxy-α-isopropyl-α-methyl-1-adamantanemethanol in a yield of 67%. [3-hydroxy-α-isopropyl-α-methyl-1
-Spectrum data of adamantane methanol] MS m / e: 238 ([M ⁺ ]), 220, 202,
187, 172, 157, 144 To a mixture of 10 mmol of 3-hydroxy-α-isopropyl-α-methyl-1-adamantanemethanol, 10 mmol of triethylamine and 40 ml of tetrahydrofuran obtained by the above method, 10 mmol of acrylic acid chloride was added for about 30 minutes. Dropped over minutes. After the completion of dropping, add
Stirred for hours. After adding water to the reaction mixture, it was concentrated,
The concentrate was subjected to silica gel column chromatography to give the title compound in 67% yield. [Spectral data] ¹ H-NMR (CDCl ₃ ) δ: 1.21 (m, 1
H), 1.41 (d, 6H), 1.42-1.80.
(M, 13H), 2.28 (m, 2H), 5.76 (d
d, 1H), 6.02 (dd, 1H), 6.30 (d
d, 1H)

Production Example 6 (Production of 1- (1-methacryloyloxy-1,2-dimethylpropyl) adamantane [1-6 (methacrylate)]) A production example except that methacrylic acid chloride was used in place of acrylic acid chloride. The same operation as in Step 5 was performed to obtain the title compound. [Spectral data] MS m / e: 294 ([M ⁺ ]), 276, 222,
204, 151, 133, 73, 55

Production Example 7 (Production of 1,3-dihydroxy-5- (1-methacryloyloxy-1-methylethyl) adamantane [2-9 (methacrylate)]) 1 mol of 1-adamantanecarboxylic acid, N-hydroxyphthalimide 0.1 mol, 1 mmol of cobalt acetylacetonate (II), and 2.5 acetic acid
L at a temperature of 75 ° C. under an oxygen atmosphere (1 atm) for 12 hours.
Stirred for hours. After concentration of the reaction mixture, the mixture was subjected to silica gel column chromatography to give 3,5-dihydroxy-1
-Adamantanecarboxylic acid was obtained. 300 mmol of 3,5-dihydroxy-1-adamantanecarboxylic acid obtained by the above method, 450 mmol of n-butanol,
A mixture of 15 mmol of sulfuric acid and 900 ml of toluene was stirred under reflux of toluene for 5 hours. The reaction mixture was concentrated and then subjected to silica gel column chromatography to obtain n-butyl 3,5-dihydroxy-1-adamantanecarboxylate. 3, obtained by the above method
A mixture of 200 mmol of n-butyl 5-dihydroxy-1-adamantanecarboxylate, 440 mmol of 2-methoxyethoxymethyl chloride, 440 mmol of triethylamine and 400 ml of tetrahydrofuran (THF) was refluxed for 3 hours. The reaction mixture was concentrated and then subjected to silica gel column chromatography to give 3,5-
There was obtained n-butyl bis (2-methoxyethoxymethoxy) -1-adamantanecarboxylate. 0.55 mol of metallic magnesium was placed in the flask, and after purging with nitrogen, a solution of 0.5 mol of bromomethane dissolved in 250 ml of THF was charged to the extent that the metallic magnesium was immersed. Next, a small amount of iodine was added to start the reaction, and the remaining THF solution of bromomethane was added dropwise at such a rate that the solvent was gently refluxed. After the completion of the addition, the mixture was refluxed for another 2 hours to obtain a methylmagnesium bromide solution. I got N-butyl 3,5-bis (2-methoxyethoxymethoxy) -1-adamantanecarboxylate obtained by the above method
A solution prepared by dissolving 00 mmol in 150 ml of THF is
The solvent was added dropwise to the above-mentioned methylmagnesium bromide solution at such a rate that the solvent was gently refluxed. After the addition was completed, the mixture was further refluxed for 2 hours. The resulting reaction mixture was cooled on ice.
The mixture was added dropwise to 0% by weight hydrochloric acid with stirring, and further stirred at 0 ° C. to room temperature for 2 hours. After adding 10% by weight aqueous sodium hydroxide solution to the reaction mixture to adjust the liquidity to neutral, the mixture is separated into an organic layer and an aqueous layer, the aqueous layer is extracted with toluene, and the organic layer is concentrated and concentrated. The solution was subjected to silica gel column chromatography to obtain α, α-dimethyl-3,5-bis (2-methoxyethoxymethoxy) -1-adamantanemethanol. Α, α- obtained by the above method
To a mixture of 20 mmol of dimethyl-3,5-bis (2-methoxyethoxymethoxy) -1-adamantanemethanol, 40 mmol of triethylamine and 80 ml of THF, 30 mmol of methacrylic acid chloride was added dropwise over about 30 minutes. After completion of the dropwise addition, the mixture was stirred at room temperature for 6 hours. After adding water to the reaction mixture, the mixture was extracted with ethyl acetate, the organic layer was concentrated, and the concentrate was subjected to silica gel column chromatography to give 1- (1-methacryloyloxy-1-methylethyl) -3,3. 5-Bis (2-methoxyethoxymethoxy) adamantane was obtained. 10 mmol of 1- (1-methacryloyloxy-1-methylethyl) -3,5-bis (2-methoxyethoxymethoxy) adamantane obtained by the above method, 1 mmol of 6N HCl (as HCl), and 40 ml of acetone Was stirred at room temperature for 5 hours. An aqueous ammonium chloride solution was added to the reaction mixture, extracted with ethyl acetate, the organic layer was concentrated, and the concentrate was subjected to silica gel column chromatography to obtain the title compound. [Spectral data] ¹ H-NMR (500 MHz, DMSO-d ₆ ) δ:
1.33-1.97 (m, 21H), 2.22 (m, 1
H), 4.68 (brs, 2H), 5.74 (brs,
1H), 5.91 (brs, 1H)

Production Example 8 (Production of 1-acryloyloxy-3-hydroxyadamantane [2-1 (acrylate)]) A mixture of 10 mmol of 1,3-adamantanediol, 15 mmol of triethylamine and 100 ml of tetrahydrofuran was added to acrylic acid chloride. 13 mmol was added dropwise over about 30 minutes. After completion of the dropwise addition, the mixture was stirred at 50 ° C. for 1.5 hours. After water was added to the reaction mixture, the mixture was extracted with ethyl acetate, the organic layer was concentrated, and the concentrate was subjected to silica gel column chromatography to obtain the title compound in a yield of 63%. [Spectral data] ¹ H-NMR (CDCl ₃ ) δ: 1.47-1.61
(M, 2H), 1.62-1.80 (m, 5H), 2.
00-2.17 (m, 6H), 2.34 (m, 2H),
5.75 (dd, 1H), 6.03 (dd, 1H),
6.30 (dd, 1H)

Production Example 9 (Production of 1-hydroxy-3-methacryloyloxyadamantane [2-1 (methacrylate)]) A method similar to that of Production Example 8 was used except that methacrylic acid chloride was used instead of acrylic acid chloride. The title compound was obtained. [Spectral data] ¹ H-NMR (CDCl ₃ ) δ: 1.48-1.61
(M, 6H), 1.89 (s, 3H), 2.00-2.
16 (m, 7H), 2.34 (m, 2H), 5.49
(Brs, 1H), 6.01 (brs, 1H)

Production Example 10 (Production of 1-acryloyloxy-3,5-dihydroxyadamantane [2-2 (acrylate)]) Except that 1,3,5-adamantanetriol was used in place of 1,3-adamantanediol Is according to the method of Production Example 8,
The title compound was obtained. [Spectral data] ¹ H-NMR (CDCl ₃ ) δ: 1.54-1.87
(M, 6H), 1.90-2.80 (m, 9H), 5.
78 (dd, 1H), 6.04 (dd, 1H), 6.3
1 (dd, 1H)

Production Example 11 (Production of 1,3-dihydroxy-5-methacryloyloxyadamantane [2-2 (methacrylate)])
-The title compound was obtained according to the method of Production Example 8, except that 1,3,5-adamantanetriol was used instead of adamantanediol and methacrylic acid chloride was used instead of acrylic acid chloride. [Spectral data] ¹ H-NMR (DMSO-d ₆ ) δ: 1.35-1.9
5 (m, 13H), 2.23 (m, 1H), 4.73
(S, 2H), 5.59 (brs, 1H), 5.92
(Brs, 1H)

Production Example 12 (Production of 2-acryloyloxy-4,4-dimethyl-γ-butyrolactone [5-3 (acrylate)]) Ethyl acrylate 3 mmol, 2-propanol 3 ml, N-
0.6 mmol of hydroxyphthalimide, 0.003 mmol of cobalt (II) acetate, 0.015 mmol of cobalt acetylacetonate (III), and acetonitrile 1
ml of the mixture at 60 ° C. under an oxygen atmosphere (1 atm).
Stir for 2 hours. The reaction mixture is concentrated, and the concentrate is subjected to silica gel chromatography to give 2-hydroxy-4,4-dimethyl-γ-butyrolactone in a yield of 7%.
Obtained at 5%. [Spectral data of 2-hydroxy-4,4-dimethyl-γ-butyrolactone] ¹ H-NMR (CDCl ₃ ) δ: 1.42 (s, 3)
H), 1.51 (s, 3H), 2.06 (dd, 1
H), 2.52 (dd, 1H), 3.03 (brs, 1
H), 4.63 (t, 1H) A mixture of 100 mmol of 2-hydroxy-4,4-dimethyl-γ-butyrolactone, 150 mmol of acrylic acid chloride, 150 mmol of triethylamine and 300 ml of toluene obtained by the above method was added at 25 ° C. For 4 hours. After adding water to the reaction mixture, the organic layer was concentrated,
The concentrated solution was subjected to silica gel column chromatography to obtain 2-acryloyloxy-4,4-dimethyl-γ-butyrolactone in a yield of 85%. [Spectral data of 2-acryloyloxy-4,4-dimethyl-γ-butyrolactone] ¹ H-NMR (CDCl ₃ ) δ: 1.42 (s, 3
H), 1.52 (s, 3H), 2.06 (dd, 1
H), 2.52 (dd, 1H), 5.65 (dd, 1
H), 5.77 (dd, 1H), 6.03 (dd, 1
H), 6.32 (dd, 1H)

Production Example 13 (2-methacryloyloxy-4,4-dimethyl-γ-
Production of butyrolactone [5-3 (methacrylate)] The same operation as in Production Example 12 was carried out except that methacrylic acid chloride was used instead of acrylic acid chloride, to obtain the title compound. [Spectral data] ¹ H-NMR (CDCl ₃ ) δ: 1.42 (s, 3)
H), 1.48 (s, 3H), 1.90 (s, 3H),
2.15 (dd, 1H), 2.62 (dd, 1H),
5.66 (brs, 1H), 6.18 (brs, 1H)

Production Example 14 (2-acryloyloxy-2,4,4-trimethyl-
Production of γ-butyrolactone [5-4 (acrylate)]
The title compound was obtained in the same manner as in Production Example 12 except that ethyl methacrylate was used instead of ethyl acrylate. [Spectral data] ¹ H-NMR (CDCl ₃ ) δ: 1.45 (s, 3
H), 1.57 (s, 3H), 2.16 (dd, 1
H), 2.63 (dd, 1H), 5.74 (dd, 1
H), 6.03 (dd, 1H), 6.32 (dd, 1
H)

Production Example 15 (Production of 2-methacryloyloxy-2,4,4-trimethyl-γ-butyrolactone [5-4 (methacrylate)]) Ethyl methacrylate was used in place of ethyl acrylate, and The title compound was obtained in the same manner as in Production Example 12 except that methacrylic acid chloride was used instead. [Spectral data] ¹ H-NMR (CDCl ₃ ) δ: 1.47 (s, 3
H), 1.59 (s, 3H), 1.68 (d, 3H),
1.94 (dd, 3H), 2.20 (d, 1H), 2.
60 (d, 1H), 5.64 (t, 1H), 6.17
(S, 1H)

Production Example 16 (Production of 3-acryloyloxy-4,4-dimethyl-γ-butyrolactone [5-15 (acrylate)]) 2-Hydroxy-4,4-dimethyl obtained by the method of Production Example 12. -Γ-butyrolactone in dioxane at room temperature,
Reaction with an equivalent amount of P ₂ O ₅ (dehydration reaction) gave the corresponding α, β-unsaturated-γ-butyrolactone (30% yield). This is then reacted with m-chloroperbenzoic acid (MCPBA) in methylene chloride at room temperature,
2,3-Epoxy-4,4-dimethyl-γ-butyrolactone was obtained (85% yield). 10 g of the obtained 2,3-epoxy-4,4-dimethyl-γ-butyrolactone, 1 g of 5% by weight Pd—C and 20 g of tetrahydrofuran
Hydrogen was bubbled through the mixture of ml at room temperature for 11 hours. The reaction mixture was filtered and concentrated, and the concentrate was subjected to silica gel column chromatography to obtain 3-hydroxy-4,4-dimethyl-γ-butyrolactone in a yield of 63%. The obtained 3-hydroxy-4,4-dimethyl-γ-butyrolactone was reacted with acrylic acid chloride in the same manner as in Production Example 12 to obtain the title compound (yield 87%). [Spectral data] MS m / e: 185 (M ⁺ ) IR (cm ⁻¹ ): 3040, 1770, 1650, 11
50

Production Example 17 (3-methacryloyloxy-4,4-dimethyl-γ-
Production of butyrolactone [5-15 (methacrylate)] The same operation as in Production Example 16 was carried out except that methacrylic acid chloride was used instead of acrylic acid chloride, to obtain the title compound. [Spectral data] MS m / e: 199 (M ⁺ ) IR (cm ⁻¹ ): 3045, 1772, 1190

Production Example 18 (3-acryloyloxy-3,4,4-trimethyl-
Production of γ-butyrolactone [5-16 (acrylate)]
In the same manner as in Production Example 12 except that ethyl crotonate was used instead of ethyl acrylate, 2-hydroxy-3,
4,4-trimethyl-γ-butyrolactone in a yield of 15%
I got it. By reacting the obtained 2-hydroxy-3,4,4-trimethyl-γ-butyrolactone with an equivalent amount of P ₂ O ₅ in dioxane at room temperature (dehydration reaction), the corresponding α, β-unsaturated- γ-butyrolactone was obtained (yield 34%). This is then methylene chloride in methylene chloride at room temperature.
-Reacted with chloroperbenzoic acid (MCPBA) to give 2,
3-Epoxy-3,4,4-trimethyl-γ-butyrolactone was obtained (yield 75%). The resulting 2,3-epoxy-3,4,4-trimethyl-γ-butyrolactone 10
Hydrogen was bubbled through a mixture of 1 g of Pd-C, 5 mmol%, and 20 ml of tetrahydrofuran at room temperature for 11 hours. The reaction mixture was filtered and concentrated, and the concentrate was subjected to silica gel column chromatography to give 3
-Hydroxy-3,4,4-trimethyl-γ-butyrolactone was obtained in a yield of 82%. The resulting 3-hydroxy-
The title compound was obtained by reacting 3,4,4-trimethyl-γ-butyrolactone with acrylic acid chloride in the same manner as in Production Example 12 (yield: 85%). [Spectral data] MS m / e: 199 (M ⁺ ) IR (cm ⁻¹ ): 3020, 1768, 1210

Production Example 19 (Production of 3-methacryloyloxy-3,4,4-trimethyl-γ-butyrolactone [5-16 (methacrylate)]) The same operation as in Example 18 was performed to obtain the title compound. [Spectral data] MS m / e: 211 (M ⁺ ) IR (cm ⁻¹ ): 3010, 1765, 1200

Example 1 Synthesis of resin having the following structure

Embedded image In a Erlenmeyer flask, monomer [1-1] (acrylate) 2.2
6. 2 g (7.7 mmole), monomer [2-1] (acrylate)
25 g (30.7 mmole) and 0.95 g of an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and dissolved in 25 g of THF (tetrahydrofuran) to obtain a monomer solution.
On the other hand, 15 g of THF was charged into a 100 ml flask equipped with a reflux tube and a three-way cock, and the monomer solution prepared above was introduced into the flask over 90 minutes under a nitrogen atmosphere using a liquid sending pump. After completion of the liquid transfer, maintain the temperature at
After stirring for 0 hours, the reaction solution was dropped into 500 ml of hexane, and the resulting precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 7.15 g of a target resin. GPC analysis of the recovered polymer revealed a Mw
(Weight average molecular weight) is 7500, and the degree of dispersion (Mw / Mn) is
2.05. ^{In the 1} H-NMR (in DMSO-d6) spectrum, signals were observed at 0.8 to 2.4 (broad), 1.5, 1.9, 2.1, and 4.6 ppm.

Example 2 Synthesis of resin having the following structure

Embedded image 2. Monomer [1-1] (methacrylate) in an Erlenmeyer flask
53 g (12.2 mmole), 7.17 g (28.4 mmole) of monomer [2-2] (methacrylate) and 1.07 g of an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and THF2 was added.
It was dissolved in 5 g to obtain a monomer solution. On the other hand, THF was added to a 100 ml flask equipped with a reflux tube and a three-way cock.
5 g was charged, and the monomer solution prepared above was introduced therein under a nitrogen atmosphere over 90 minutes using a liquid sending pump.
After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 7.82 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 8,100 and a degree of dispersion (Mw / Mn) of 2.32. ¹ H-NMR (in DMSO-d6)
In the spectrum, 0.8-2.4 (broad), 1.6, 1.9, 2.1,
A signal was observed at 4.6 ppm.

Example 3 Synthesis of a resin having the following structure

Embedded image 4. Monomer [1-1] (methacrylate) in an Erlenmeyer flask.
20 g (18.0 mmole), 5.27 g (18.0 mmole) of monomer [2-9] (methacrylate) and 1.05 g of an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and THF2 was added.
It was dissolved in 5 g to obtain a monomer solution. On the other hand, THF was added to a 100 ml flask equipped with a reflux tube and a three-way cock.
5 g was charged, and the monomer solution prepared above was introduced therein under a nitrogen atmosphere over 90 minutes using a liquid sending pump.
After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 6.82 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 8,300 and a degree of dispersion (Mw / Mn) of 2.18. ¹ H-NMR (in DMSO-d6)
In the spectrum, 0.8-2.4 (broad), 1.6, 1.9, 2.1,
A signal was observed at 4.6 ppm.

Example 4 Synthesis of a resin having the structure shown below

Embedded image Monomer [1-1] (acrylate) 4.0 in an Erlenmeyer flask
9 g (15.5 mmole), monomer [2-1] (acrylate)
5.55 g (25.0 mmole), 1.86 g (10.1 mmole) of the monomer [5-3] (acrylate), and 1.15 g of an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and 25 g of THF was added.
To give a monomer solution. Meanwhile, the reflux tube and 3
15 g of THF in a 100 ml flask equipped with a side cock
The monomer solution prepared above was introduced into the mixture over 90 minutes under a nitrogen atmosphere using a liquid sending pump. After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 7.87 g of the target resin. GPC analysis of the recovered polymer showed a Mw of 7800 and a degree of dispersion (Mw /
Mn) was 1.97. ^{In 1} H-NMR (in DMSO-d6) spectrum, 0.8-2.9 (broad), 1.6, 1.9, 2.1, 4.6,
A signal was observed at 5.3 ppm.

Example 5 Synthesis of a resin having the following structure

Embedded image 2. Monomer [1-1] (methacrylate) in an Erlenmeyer flask
90 g (13.4 mmole), monomer [2-1] (methacrylate) 5.28 g (22.4 mmole), monomer [5-4] (methacrylate) 1.90 g (9.0 mmole) and an initiator (Wako Pure Chemical Industries, Ltd.) V-65) (1.10 g) and THF2
It was dissolved in 5 g to obtain a monomer solution. On the other hand, THF was added to a 100 ml flask equipped with a reflux tube and a three-way cock.
5 g was charged, and the monomer solution prepared above was introduced therein under a nitrogen atmosphere over 90 minutes using a liquid sending pump.
After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. Further, the reprecipitation purification operation was performed once again to obtain 8.26 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 7,900 and a degree of dispersion (Mw / Mn) of 1.97. ¹ H-NMR (in DMSO-d6)
In the spectrum, 0.8-2.4 (broad), 1.6, 1.9, 2.
A signal was observed at 1, 4.6 ppm.

Example 6 Synthesis of a resin having the following structure

Embedded image 2. Monomer [1-1] (methacrylate) in an Erlenmeyer flask
50 g (12.1 mmole), 4.75 g (20.1 mmole) of monomer [2-1] (methacrylate), 1.59 g (8.0 mmole) of monomer [5-15] (methacrylate) and an initiator (Wako Pure Chemical Industries, Ltd.) 0.98 g of V-65), TH
F25g to obtain a monomer solution. On the other hand, THF was added to a 100 ml flask equipped with a reflux tube and a three-way cock.
And the monomer solution prepared above was introduced therein over a period of 90 minutes under a nitrogen atmosphere using a liquid sending pump. After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 8.18 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 7,600 and a degree of dispersion (Mw / Mn) of 1.95. ¹ H-NMR (DMSO-d6
Medium) 0.8-2.4 (broad), 1.6, 1.
Signals were observed at 9, 2.1, 4.3, 4.6, and 5.3 ppm.

Example 7 Synthesis of a resin having the following structure

Embedded image In a Erlenmeyer flask, monomer [1-1] (acrylate) 3.5
0 g (12.7 mmole), monomer [2-1] (acrylate)
4.75 g (21.4 mmole), 1.70 g (8.6 mmole) of the monomer [5-16] (acrylate) and 0.99 g of an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and THF25 was added.
g to give a monomer solution. On the other hand, THF was added to a 100 ml flask equipped with a reflux tube and a three-way cock.
g, and the previously prepared monomer solution was introduced therein over a period of 90 minutes under a nitrogen atmosphere using a liquid sending pump. After completion of the liquid transfer, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours.
The reaction solution was dropped into 500 ml of hexane, and the resulting precipitate was separated by filtration. Further, the reprecipitation purification operation was performed once again to obtain 7.35 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 8000 and a dispersity (M
w / Mn) was 2.05. ^{In 1} H-NMR (in DMSO-d6) spectrum, 0.8-2.5 (broad), 1.6, 1.9, 2.1, 4.
A signal was observed at 3, 4.6 ppm.

Example 8 Synthesis of a resin having the following structure

Embedded image 2. Monomer [1-1] (methacrylate) in an Erlenmeyer flask
99 g (13.8 mmole), monomer [2-1] (methacrylate) 6.50 g (27.5 mmole), monomer [6-1] (methacrylate) 0.84 g (4.6 mmole) and initiator (Wako Pure Chemical Industries, Ltd.) 0.99g of V-65)
It was dissolved in 25 g of THF to obtain a monomer solution. On the other hand, a 100 ml flask equipped with a reflux tube and a three-way cock
HF (15 g) was charged, and the monomer solution prepared above was introduced therein over a period of 90 minutes under a nitrogen atmosphere using a liquid sending pump. After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 7.61 g of a target resin. GPC analysis of the recovered polymer revealed that Mw was 800.
0 and the degree of dispersion (Mw / Mn) was 2.05. ¹ H-NMR (DMS
O-d6) spectrum, 0.8-2.4 (broad), 1.6,
Signals were observed at 1.9, 2.1, 3.8, 3.9, 4.3, 4.6, and 5.9 ppm.

Example 9 Synthesis of a resin having the following structure

Embedded image Monomer [1-3] (acrylate) 2.1 in Erlenmeyer flask
2 g (8.1 mmole), monomer [2-1] (acrylate)
7.25 g (32.7 mmole) and 0.94 g of an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and 25 g of THF was added.
To give a monomer solution. Meanwhile, the reflux tube and 3
15 g of THF in a 100 ml flask equipped with a side cock
The monomer solution prepared above was introduced into the mixture over 90 minutes under a nitrogen atmosphere using a liquid sending pump. After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 7.44 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 7,500 and a degree of dispersion (Mw /
Mn) was 1.93. ¹ H-NMR (in DMSO-d6) spectrum 0.8-2.5 (broad), 1.6, 1.9, 2.1, 4.6 pp
A signal was observed at m.

Example 10 Synthesis of a resin having the following structure

Embedded image 2. Monomer [1-3] (methacrylate) in an Erlenmeyer flask
38 g (12.2 mmole), 7.20 g (28.6 mmole) of monomer [2-2] (methacrylate) and 1.06 g of an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and THF2 was added.
It was dissolved in 5 g to obtain a monomer solution. On the other hand, THF was added to a 100 ml flask equipped with a reflux tube and a three-way cock.
5 g was charged, and the monomer solution prepared above was introduced therein under a nitrogen atmosphere over 90 minutes using a liquid sending pump.
After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. Further, the reprecipitation purification operation was performed once again to obtain 7.84 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 9,100 and a degree of dispersion (Mw / Mn) of 2.34. ¹ H-NMR (in DMSO-d6)
In the spectrum, 0.8-2.5 (broad) 1.5, 1. 9, 2.
A signal was observed at 1,4.6 ppm.

Example 11 Synthesis of a resin having the following structure

Embedded image 3. Monomer [1-3] (methacrylate) in an Erlenmeyer flask
80 g (17.4 mmole), 5.11 g (17.4 mmole) of monomer [2-9] (methacrylate) and 0.99 g of an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and THF25 was added.
g to give a monomer solution. On the other hand, THF was added to a 100 ml flask equipped with a reflux tube and a three-way cock.
g, and the previously prepared monomer solution was introduced therein over a period of 90 minutes under a nitrogen atmosphere using a liquid sending pump. After completion of the liquid transfer, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours.
The reaction solution was dropped into 500 ml of hexane, and the resulting precipitate was separated by filtration. Further, the reprecipitation purification operation was performed once again to obtain 8.29 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 8700 and a dispersity (M
w / Mn) was 2.19. ¹ H-NMR (in DMSO-d6) spectrum 0.8-2.5 (broad) 1.5, 1.9, 2.1, 4.
A signal was observed at 6 ppm.

Example 12 Synthesis of a resin having the following structure

Embedded image 3. Monomer [1-3] (methacrylate) in an Erlenmeyer flask
50 g (16.3 mmole), 4.11 g (16.3 mmole) of monomer [2-2] (methacrylate), 1.61 g (8.2 mmole) of monomer [5-3] (methacrylate) and an initiator (Wako Pure Chemical Industries, Ltd.) 1.02 g of V-65), THF
It was dissolved in 25 g to obtain a monomer solution. On the other hand, 15 g of THF was charged into a 100 ml flask equipped with a reflux tube and a three-way cock, and the monomer solution prepared above was introduced into the flask over 90 minutes under a nitrogen atmosphere using a liquid sending pump. After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 8.23 g of the target resin. GPC analysis of the recovered polymer showed a Mw of 7,800 and a degree of dispersion (Mw / Mn) of 1.97. ¹ H-NMR (DMSO-d6
Medium) 0.8-2.5 (broad), 1.6, 1.9,
Signals were observed at 2.1, 4.6, and 5.3 ppm.

Example 13 Synthesis of a resin having the following structure

Embedded image In a Erlenmeyer flask, monomer [1-3] (acrylate) 4.5
0 g (17.2 mmole), monomer [2-2] (acrylate)
4.11 g (17.2 mmole), 1.74 g (8.6 mmole) of monomer [5-4] (acrylate) and 1.03 g of an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and 25 g of THF was added.
To give a monomer solution. Meanwhile, the reflux tube and 3
15 g of THF in a 100 ml flask equipped with a side cock
The monomer solution prepared above was introduced into the mixture over 90 minutes under a nitrogen atmosphere using a liquid sending pump. After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 7.94 g of the target resin. GPC analysis of the recovered polymer showed a Mw of 7600 and a degree of dispersion (Mw /
Mn) was 1.95. ^{In 1} H-NMR (in DMSO-d6) spectrum, 0.8-2.5 (broad), 1.6, 1.9, 2.1, 4.6 p
A signal was observed at pm.

Example 14 Synthesis of a resin having the following structure

Embedded image 3. Monomer [1-3] (methacrylate) in an Erlenmeyer flask
63 g (16.8 mmole), monomer [2-2] (methacrylate) 4.23 g (16.8 mmole), monomer [5-15] (methacrylate) 1.66 g (8.4 mmole) and an initiator (Wako Pure Chemical Industries, Ltd.) 1.05 g of V-65), and THF
It was dissolved in 25 g to obtain a monomer solution. On the other hand, 15 g of THF was charged into a 100 ml flask equipped with a reflux tube and a three-way cock, and the monomer solution prepared above was introduced into the flask over 90 minutes under a nitrogen atmosphere using a liquid sending pump. After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 8.11 g of the target resin. GPC analysis of the recovered polymer showed a Mw of 7,600 and a degree of dispersion (Mw / Mn) of 1.95. ¹ H-NMR (DMSO-d6
Medium) 0.8-2.4 (broad), 1.6, 1.
Signals were observed at 9, 2.1, 4.3, 4.6, and 5.3 ppm.

Example 15 Synthesis of a resin having the following structure

Embedded image In a Erlenmeyer flask, monomer [1-3] (acrylate) 4.2
5 g (16.2 mmole), monomer [2-2] (acrylate)
3.86 g (16.2 mmoles), 1.60 g (8.1 mmole) of monomer [5-16] (acrylate) and 0.97 g of an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and THF25 was added.
g to give a monomer solution. On the other hand, THF was added to a 100 ml flask equipped with a reflux tube and a three-way cock.
g, and the previously prepared monomer solution was introduced therein over a period of 90 minutes under a nitrogen atmosphere using a liquid sending pump. After completion of the liquid transfer, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours.
The reaction solution was dropped into 500 ml of hexane, and the resulting precipitate was separated by filtration. Further, the reprecipitation purification operation was performed once again to obtain 8.21 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 7600 and a dispersity (M
w / Mn) was 1.95. ^{In 1} H-NMR (in DMSO-d6) spectrum, 0.8-2.5 (broad), 1.6, 1.9, 2.1, 4.
A signal was observed at 3, 4.6 ppm.

Example 16 Synthesis of a resin having the following structure

Embedded image 2. Monomer [1-3] (methacrylate) in an Erlenmeyer flask
99 g (13.8 mmole), monomer [2-2] (methacrylate) 6.50 g (27.5 mmole), monomer [6-1] (methacrylate) 0.84 g (4.6 mmole) and initiator (Wako Pure Chemical Industries, Ltd.) 0.99 g of V-65), THF
It was dissolved in 25 g to obtain a monomer solution. On the other hand, 15 g of THF was charged into a 100 ml flask equipped with a reflux tube and a three-way cock, and the monomer solution prepared above was introduced into the flask over 90 minutes under a nitrogen atmosphere using a liquid sending pump. After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 8.35 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 8,200 and a degree of dispersion (Mw / Mn) of 2.21. ¹ H-NMR (DMSO-d6
Medium) 0.8-2.4 (broad), 1.6, 1.9,
Signals were observed at 2.2, 3.8, 3.9, 4.3, 4.6, and 5.9 ppm.

Example 17 Synthesis of a resin having the following structure

Embedded image In a Erlenmeyer flask, monomer [1-6] (methacrylate) 8.
32 g (27.2 mmole), 1.35 g (6.8 mmole) of the monomer [5-3] (methacrylate) and 0.97 g of an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and THF25 was added.
g to give a monomer solution. On the other hand, THF was added to a 100 ml flask equipped with a reflux tube and a three-way cock.
g, and the previously prepared monomer solution was introduced therein over a period of 90 minutes under a nitrogen atmosphere using a liquid sending pump. After completion of the liquid transfer, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours.
The reaction solution was dropped into 500 ml of hexane, and the resulting precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 7.26 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 8000 and a dispersity (M
w / Mn) was 2.26. ^{In 1} H-NMR (in DMSO-d6) spectrum, 0.8-2.5 (broad), 1.6, 1.9, 2.1, 4.
A signal was observed at 6, 5.3 ppm.

Example 18 Synthesis of a resin having the following structure

Embedded image 8.3 Monomer [1-6] (acrylate) in Erlenmeyer flask
5 g (28.6 mmole), monomer [5-4] (acrylate)
0.98 g of 1.42 g (7.1 mmole) and an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and dissolved in 25 g of THF to obtain a monomer solution. On the other hand, 15 g of THF was charged into a 100 ml flask equipped with a reflux tube and a three-way cock, and the monomer solution prepared above was introduced into the flask over 90 minutes under a nitrogen atmosphere using a liquid sending pump. After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 7.82 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 8400 and a degree of dispersion (Mw / M
n) was 2.32. ^{In 1} H-NMR (in DMSO-d6) spectrum, 0.8-2.5 (broad), 1.6, 1.9, 2.1, 4.6 p
A signal was observed at pm.

Example 19 Synthesis of a resin having the following structure

Embedded image In a Erlenmeyer flask, monomer [1-6] (methacrylate) 8.
38 g (27.4 mmole), 1.36 g (6.8 mmole) of the monomer [5-15] (methacrylate) and 0.97 g of an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and THF25 was added.
g to give a monomer solution. On the other hand, THF was added to a 100 ml flask equipped with a reflux tube and a three-way cock.
g, and the previously prepared monomer solution was introduced therein over a period of 90 minutes under a nitrogen atmosphere using a liquid sending pump. After completion of the liquid transfer, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours.
The reaction solution was dropped into 500 ml of hexane, and the resulting precipitate was separated by filtration. Further, the reprecipitation purification operation was performed once again to obtain 7.84 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 8,500 and a dispersity (M
w / Mn) was 2.33. ^{In 1} H-NMR (in DMSO-d6) spectrum, 0.8-2.5 (broad), 1.6, 1.9, 2.1, 4.
A signal was observed at 6, 5.3 ppm.

Example 20 Synthesis of a resin having the following structure

Embedded image In a Erlenmeyer flask, monomer [1-6] (methacrylate) 8.
22 g (26.9 mmoles), 1.42 g (6.7 mmole) of monomer [5-16] (methacrylate) and 0.96 g of an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and THF25 was added.
g to give a monomer solution. On the other hand, THF was added to a 100 ml flask equipped with a reflux tube and a three-way cock.
g, and the previously prepared monomer solution was introduced therein over a period of 90 minutes under a nitrogen atmosphere using a liquid sending pump. After completion of the liquid transfer, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours.
The reaction solution was dropped into 500 ml of hexane, and the resulting precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 7.41 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 7900 and a dispersity (M
w / Mn) was 2.26. ^{In 1} H-NMR (in DMSO-d6) spectrum, 0.8-2.4 (broad), 1.6, 1.9, 2.1, 4.
A signal was observed at 3, 4.6 ppm.

Example 21 Synthesis of a resin having the following structure

Embedded image In a Erlenmeyer flask, monomer [1-6] (acrylate) 4.4
9g (15.4mmole), monomer [2-1] (acrylate)
5.20 g (23.4 mmole) and 0.97 g of an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and dissolved in 25 g of THF to obtain a monomer solution. On the other hand, 15 g of THF was charged into a 100 ml flask equipped with a reflux tube and a three-way cock, and the monomer solution prepared above was introduced into the flask over 90 minutes under a nitrogen atmosphere using a liquid sending pump. After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 7.46 g of the target resin. GPC analysis of the recovered polymer showed a Mw of 7,500 and a dispersity (Mw / M
n) was 2.13. ¹ H-NMR (in DMSO-d6) spectrum 0.8-2.5 (broad), 1.6, 1.9, 2.1, 4.6 pp
A signal was observed at m.

Example 22 Synthesis of a resin having the following structure

Embedded image 3. Monomer [1-6] (methacrylate) in an Erlenmeyer flask
55 g (14.9 mmol), 5.58 g (22.1 mmol) of monomer [2-1] (methacrylate) and 1.01 g of an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and THF25 was added.
g to give a monomer solution. On the other hand, THF was added to a 100 ml flask equipped with a reflux tube and a three-way cock.
g, and the previously prepared monomer solution was introduced therein over a period of 90 minutes under a nitrogen atmosphere using a liquid sending pump. After completion of the liquid transfer, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours.
The reaction solution was dropped into 500 ml of hexane, and the resulting precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 7.74 g of the target resin. GPC analysis of the recovered polymer showed a Mw of 7,800 and a degree of dispersion (M
w / Mn) was 2.13. ^{In 1} H-NMR (in DMSO-d6) spectrum, 0.8-2.4 (broad), 1.5, 1.9, 2.1, 4.6
A signal was observed at ppm.

Example 23 Synthesis of a resin having the following structure

Embedded image 4. In a Erlenmeyer flask, monomer [1-6] (methacrylate)
48 g (17.9 mmole), 4.51 g (17.9 mmole) of monomer [2-9] (methacrylate) and 0.99 g of an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and THF25 was added.
g to give a monomer solution. On the other hand, THF was added to a 100 ml flask equipped with a reflux tube and a three-way cock.
g, and the previously prepared monomer solution was introduced therein over a period of 90 minutes under a nitrogen atmosphere using a liquid sending pump. After completion of the liquid transfer, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours.
The reaction solution was dropped into 500 ml of hexane, and the resulting precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 7.49 g of the target resin. GPC analysis of the recovered polymer showed a Mw of 8100 and a dispersity (M
w / Mn) was 2.16. ^{In the 1} H-NMR (in DMSO-d6) spectrum, 0.8-2.5 (broad), 1.6, 1.9, 2.1, 4.6
A signal was observed at ppm.

Example 24 Synthesis of a resin having the following structure

Embedded image In a Erlenmeyer flask, monomer [1-6] (acrylate) 4.4
5 g (15.2 mmole), monomer [2-1] (acrylate)
3.38 g (15.2 mmole), 1.40 g (7.6 mmole) of monomer [5-3] (acrylate) and 0.92 g of an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and 25 g of THF was added.
To give a monomer solution. Meanwhile, the reflux tube and 3
15 g of THF in a 100 ml flask equipped with a side cock
The monomer solution prepared above was introduced into the mixture over 90 minutes under a nitrogen atmosphere using a liquid sending pump. After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 7.25 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 7900 and a dispersity (Mw /
Mn) was 1.95. ^{In 1} H-NMR (in DMSO-d6) spectrum, 0.8-2.9 (broad), 1.6, 1.9, 2.1, 4.6,
A signal was observed at 5.3 ppm.

Example 25 Synthesis of a resin having the following structure

Embedded image In a Erlenmeyer flask, monomer [1-6] (acrylate) 4.5
6 g (15.6 mmole), monomer [2-1] (acrylate)
3.46 g (15.6 mmole), 1.54 g (7.8 mmole) of monomer [5-4] (acrylate) and 0.95 g of an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and 25 g of THF was added.
To give a monomer solution. Meanwhile, the reflux tube and 3
15 g of THF in a 100 ml flask equipped with a side cock
The monomer solution prepared above was introduced into the mixture over 90 minutes under a nitrogen atmosphere using a liquid sending pump. After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 7.25 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 8200 and a degree of dispersion (Mw /
Mn) was 2.12. ^{In the 1} H-NMR (in DMSO-d6) spectrum, 0.8-2.4 (broad), 1.6, 1.9, 2.1, 4.6 p
A signal was observed at pm.

Example 26 Synthesis of resin having the following structure

Embedded image 3. Monomer [1-6] (methacrylate) in an Erlenmeyer flask
60 g (15.0 mmole), monomer [2-1] (methacrylate) 3.55 g (15.0 mmole), monomer [5-15] (methacrylate) 1.49 g (7.5 mmole) and initiator (Wako Pure Chemical Industries, Ltd.) 0.96 g of V-65), THF2
It was dissolved in 5 g to obtain a monomer solution. On the other hand, THF was added to a 100 ml flask equipped with a reflux tube and a three-way cock.
5 g was charged, and the monomer solution prepared above was introduced therein under a nitrogen atmosphere over 90 minutes using a liquid sending pump.
After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. By performing the reprecipitation purification operation again, 7.31 g of the target resin was obtained. GPC analysis of the recovered polymer showed a Mw of 8,200 and a degree of dispersion (Mw / Mn) of 2.23. ¹ H-NMR (in DMSO-d6)
In the spectrum, 0.8-2.5 (broad), 1.6, 1.9, 2.
Signals were observed at 1, 4.3, 4.6, and 5.3 ppm.

Example 27 Synthesis of resin having the following structure

Embedded image 3. Monomer [1-6] (methacrylate) in an Erlenmeyer flask
65 g (15.2 mmole), monomer [2-1] (methacrylate) 3.55 g (15.2 mmole), monomer [5-16] (methacrylate) 1.61 g (7.6 mmole) and initiator (Wako Pure Chemical Industries, Ltd.) 0.96 g of V-65), THF
It was dissolved in 25 g to obtain a monomer solution. On the other hand, 15 g of THF was charged into a 100 ml flask equipped with a reflux tube and a three-way cock, and the monomer solution prepared above was introduced into the flask over 90 minutes under a nitrogen atmosphere using a liquid sending pump. After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 7.64 g of the target resin. GPC analysis of the recovered polymer showed a Mw of 8,500 and a degree of dispersion (Mw / Mn) of 2.29. ¹ H-NMR (DMSO-d6
Medium) 0.8-2.4 (broad), 1.6, 1.9,
Signals were observed at 2.1, 4.3 and 4.6 ppm.

Example 28 Synthesis of resin having the following structure

Embedded image 2. In a Erlenmeyer flask, monomer [1-6] (methacrylate)
99 g (13.8 mmole), monomer [2-1] (methacrylate) 6.50 g (27.5 mmole), monomer [6-1] (methacrylate) 0.84 g (4.6 mmole) and initiator (Wako Pure Chemical Industries, Ltd.) 0.99g of V-65), THF
It was dissolved in 25 g to obtain a monomer solution. On the other hand, 15 g of THF was charged into a 100 ml flask equipped with a reflux tube and a three-way cock, and the monomer solution prepared above was introduced into the flask over 90 minutes under a nitrogen atmosphere using a liquid sending pump. After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 7.34 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 8,100 and a degree of dispersion (Mw / Mn) of 2.10. ¹ H-NMR (DMSO-d6
Medium) 0.8-2.4 (broad), 1.5, 1.9,
Signals were observed at 2.1, 3.8, 3.9, 4.3, 4.6, and 5.9 ppm.

Example 29 Synthesis of resin having the following structure

Embedded image 3. Monomer [1-6] (methacrylate) in an Erlenmeyer flask
50 g (16.3 mmole), 4.11 g (16.3 mmole) of monomer [2-2] (methacrylate), 1.61 g (8.2 mmole) of monomer [5-3] (methacrylate) and an initiator (Wako Pure Chemical Industries, Ltd.) 1.02 g of V-65), THF
It was dissolved in 25 g to obtain a monomer solution. On the other hand, 15 g of THF was charged into a 100 ml flask equipped with a reflux tube and a three-way cock, and the monomer solution prepared above was introduced into the flask over 90 minutes under a nitrogen atmosphere using a liquid sending pump. After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 8.23 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 8000,
The dispersity (Mw / Mn) was 1.99. ¹ H-NMR (DMSO-d6
Medium) 0.8-2.5 (broad), 1.6, 1.9,
Signals were observed at 2.1, 4.6, and 5.3 ppm.

Example 30 Synthesis of resin having the following structure

Embedded image In a Erlenmeyer flask, monomer [1-6] (acrylate) 4.5
3 g (15.5 mmole), monomer [2-2] (acrylate)
0.96 g of 3.69 g (15.5 mmole), 1.54 g (7.8 mmole) of monomer [5-4] (acrylate) and an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and dissolved in 25 g of THF. A monomer solution was prepared. On the other hand, 15 g of THF was charged into a 100 ml flask equipped with a reflux tube and a three-way cock, and the monomer solution prepared above was introduced into the flask over 90 minutes under a nitrogen atmosphere using a liquid sending pump. After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 8.23 g of the target resin. GPC analysis of the recovered polymer showed a Mw of 8300 and a degree of dispersion (Mw / M
n) was 2.20. ¹ H-NMR (in DMSO-d6) spectrum 0.8-2.5 (broad), 1.6, 1., 2.2, 4.6 pp
A signal was observed at m.

Example 31 Synthesis of a resin having the following structure

Embedded image In a Erlenmeyer flask, monomer [1-6] (acrylate) 4.5
0g (15.4mmole), monomer [2-2] (acrylate)
3.67 g (15.4 mmole), 0.95 g of monomer [5-15] (acrylate) 1.42 g (7.2 mmole) and an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and 25 g of THF was added.
To give a monomer solution. Meanwhile, the reflux tube and 3
15 g of THF in a 100 ml flask equipped with a side cock
The monomer solution prepared above was introduced into the mixture over 90 minutes under a nitrogen atmosphere using a liquid sending pump. After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. Further, the reprecipitation purification operation was performed once again to obtain 7.23 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 8300 and a degree of dispersion (Mw /
Mn) was 2.06. ^{In the 1} H-NMR (in DMSO-d6) spectrum, 0.8-2.4 (broad), 1.6, 1.9, 2.1, 4.3,
Signals were observed at 4.6 and 5.3 ppm.

Example 32 Synthesis of resin having the following structure

Embedded image 3. Monomer [1-6] (methacrylate) in an Erlenmeyer flask
50 g (15.4 mmole), 3.67 g (15.4 mmole) of monomer [2-2] (methacrylate), 1.42 g (7.2 mmole) of monomer [5-15] (methacrylate) and an initiator (Wako Pure Chemical Industries, Ltd.) 0.95 g of V-65), THF2
It was dissolved in 5 g to obtain a monomer solution. On the other hand, THF was added to a 100 ml flask equipped with a reflux tube and a three-way cock.
5 g was charged, and the monomer solution prepared above was introduced therein under a nitrogen atmosphere over 90 minutes using a liquid sending pump.
After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. Further re-precipitation purification operation was carried out to obtain 7.23 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 8,300 and a degree of dispersion (Mw / Mn) of 2.06. ¹ H-NMR (DMSO-d6
Medium) 0.8-2.4 (broad), 1.6, 1.9,
Signals were observed at 2.2, 4.3 and 4.6 ppm.

Example 33 Synthesis of a resin having the following structure

Embedded image 3.7 Erlenmeyer flask with monomer [1-6] (acrylate)
5 g (12.8 mmole), monomer [2-2] (acrylate)
6.11 g (25.7 mmole), 0.73 g (4.3 mmole) of the monomer [6-1] (acrylate) and 1.05 g of an initiator (V-65 manufactured by Wako Pure Chemical Industries, Ltd.) were added, and THF25 was added.
g to give a monomer solution. On the other hand, THF was added to a 100 ml flask equipped with a reflux tube and a three-way cock.
g, and the previously prepared monomer solution was introduced therein over a period of 90 minutes using a liquid sending pump under a nitrogen atmosphere.
After the completion of the liquid feeding, the temperature was maintained at 60 ° C., and the mixture was stirred for 10 hours. Then, the reaction solution was dropped into 500 ml of hexane, and the generated precipitate was separated by filtration. The reprecipitation purification operation was performed once again to obtain 8.35 g of a target resin. GPC analysis of the recovered polymer showed a Mw of 8,200 and a degree of dispersion (Mw / Mn) of 2.21. ¹ H-NMR (in DMSO-d6)
In the spectrum, 0.8-2.5 (broad), 1.6, 1.9, 2.
Signals were observed at 1, 3.8, 3.9, 4.3, 4.6, and 5.9 ppm.

Test Example 100 parts by weight of the polymer obtained in the example and 10 parts by weight of triphenylsulfonium hexafluoroantimonate were mixed with ethyl lactate as a solvent to give a polymer concentration of 17%.
A weight percent of a photoresist resin composition was prepared. The photoresist resin composition was applied to a silicon wafer by spin coating to form a photosensitive layer having a thickness of 1.0 μm. 15 on a hot plate at 100 ° C
After pre-baking for 0 second, using a KrF excimer laser having a wavelength of 247 nm, a dose of 30 mJ was applied through a mask.
/ Cm ² , and post-baked at a temperature of 100 ° C. for 60 seconds. Then, the film was developed with a 0.3 M tetramethylammonium hydroxide aqueous solution for 60 seconds and rinsed with pure water. In each case, a 0.25 μm line and space pattern was obtained.

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H025 AA09 AA14 AB16 AC01 AC04 AC05 AC08 AD03 BE00 CB14 4J100 AL08P AL08Q AL08R BA03Q BC09P BC09Q BC53R BC60R CA04 CA05 DA36 DA62 JA38

Claims (7)

[Claims] 1. A compound represented by the following formula (I): (Wherein, R ¹ represents a hydrogen atom or a methyl group, and R ² and R
³ are the same or different and each represents a hydrocarbon group having 1 to 8 carbon atoms, R ^4, R ⁵ and R ⁶ are the same or different and are each a hydrogen atom, a hydroxyl group or a methyl group. However, R ⁴ ~
When R ⁶ is either a hydrogen atom or a hydroxyl group, R ² and R ³ are not both methyl groups at the same time). 2. At least one monomer unit represented by the formula (I) and the following formulas (IIa) and (IIb): (Wherein, R ¹ represents a hydrogen atom or a methyl group, and R ⁷ and R
⁸ is the same or different and represents a hydrocarbon group having 1 to 8 carbon atoms, and R ⁹ and R ¹⁰ are the same or different and represent a hydrogen atom,
A hydroxyl group, a carboxyl group or a —COOR group, R ¹¹ represents a hydroxyl group, an oxo group, a carboxyl group or a —COOR group, R represents a t-butyl group, a 2-tetrahydrofuranyl group, a 2-tetrahydropyranyl group or It represents a 2-oxepanyl group. m represents 0 or 1. R ¹²
And R ¹³ are the same or different and represent a hydrogen atom, a hydroxyl group or an oxo group).
The polymer compound according to claim 1, comprising a kind of monomer unit (excluding the monomer unit represented by the formula (1)). 3. The compound of the following formula (III): (Wherein R ¹ and R ¹⁴ are the same or different and each represent a hydrogen atom or a methyl group), a monomer unit represented by the following formula (IV): (Wherein, R ¹⁵ is tricyclo [5.2.1.0 ^{2, 6]} decyl group, tetracyclo [4.4.0.1 ^2,5 .1 ^7,10] dodecyl group, norbornyl group, or an isobornyl group A 2-norbornylmethyl group; R ¹⁶ is a substituent of R ¹⁵ ; a hydrogen atom, a hydroxyl group, a hydroxymethyl group,
A carboxyl group or a -COOR ¹⁷ group, wherein R ¹⁷ is t-
A butyl group, a 2-tetrahydrofuranyl group, a 2-tetrahydropyranyl group or a 2-oxepanyl group. R ¹ is the same as defined above), a monomer unit represented by the following formula (Va):
(Vb) (Wherein R ¹⁸ , R ¹⁹ , R ²⁰ , R ²¹ , R ²² , R ²³ , R ²⁴ and R ²⁵ are the same or different and represent a hydrogen atom or a methyl group; R ¹ is the same as described above) A monomer unit represented by the following formula (VI): (In the formula, n represents an integer of ¹ to 3. R ¹ is the same as described above.)
And a monomer unit represented by the following formula (VII): The polymer compound according to claim 1, comprising at least one monomer unit selected from the monomer units represented by the formula: wherein R ¹ is the same as described above. 4. The total content of the monomer units having an adamantane skeleton is 50% of the total monomer units constituting the polymer.
The polymer compound according to any one of claims 1 to 3, wherein the amount is from 100 to 100% by weight. 5. The total content of monomer units having an adamantane skeleton is 70% of the total monomer units constituting the polymer.
The polymer compound according to any one of claims 1 to 3, wherein the amount is from 100 to 100% by weight. 6. The polymer compound according to claim 1, which is used as a resin for a photoresist. 7. A photoresist resin composition comprising the polymer compound according to claim 1 and a photoacid generator.