JP2001038220A - Photocatalyst and functional base material - Google Patents
Photocatalyst and functional base materialInfo
- Publication number
- JP2001038220A JP2001038220A JP2000149144A JP2000149144A JP2001038220A JP 2001038220 A JP2001038220 A JP 2001038220A JP 2000149144 A JP2000149144 A JP 2000149144A JP 2000149144 A JP2000149144 A JP 2000149144A JP 2001038220 A JP2001038220 A JP 2001038220A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- photocatalyst
- metal
- photocatalytic
- alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011941 photocatalyst Substances 0.000 title claims abstract description 39
- 239000000463 material Substances 0.000 title description 10
- 230000001699 photocatalysis Effects 0.000 claims abstract description 34
- 229910052751 metal Inorganic materials 0.000 claims abstract description 26
- 239000002184 metal Substances 0.000 claims abstract description 26
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 239000004745 nonwoven fabric Substances 0.000 claims abstract description 16
- 239000000835 fiber Substances 0.000 claims abstract description 12
- 239000000956 alloy Substances 0.000 claims abstract description 10
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 10
- 238000003825 pressing Methods 0.000 claims abstract description 4
- 239000002346 layers by function Substances 0.000 claims description 12
- 150000002739 metals Chemical class 0.000 claims description 4
- 230000030279 gene silencing Effects 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 abstract description 19
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract description 18
- 229910052782 aluminium Inorganic materials 0.000 abstract description 4
- 238000001035 drying Methods 0.000 abstract description 4
- 238000005096 rolling process Methods 0.000 abstract description 3
- 238000005507 spraying Methods 0.000 abstract description 3
- 238000007598 dipping method Methods 0.000 abstract description 2
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 21
- 239000007864 aqueous solution Substances 0.000 description 10
- 239000012530 fluid Substances 0.000 description 9
- 239000007789 gas Substances 0.000 description 7
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 230000005284 excitation Effects 0.000 description 5
- 150000002894 organic compounds Chemical class 0.000 description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- GNRSAWUEBMWBQH-UHFFFAOYSA-N nickel(II) oxide Inorganic materials [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 229910019899 RuO Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 241000700605 Viruses Species 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- LFYJSSARVMHQJB-QIXNEVBVSA-N bakuchiol Chemical compound CC(C)=CCC[C@@](C)(C=C)\C=C\C1=CC=C(O)C=C1 LFYJSSARVMHQJB-QIXNEVBVSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 230000000855 fungicidal effect Effects 0.000 description 1
- 239000000417 fungicide Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 229910052961 molybdenite Inorganic materials 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000006864 oxidative decomposition reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000009182 swimming Effects 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 229910000166 zirconium phosphate Inorganic materials 0.000 description 1
- LEHFSLREWWMLPU-UHFFFAOYSA-B zirconium(4+);tetraphosphate Chemical compound [Zr+4].[Zr+4].[Zr+4].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LEHFSLREWWMLPU-UHFFFAOYSA-B 0.000 description 1
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、気体や液体(流体
という)中に浮遊している有機化合物又は無機化合物を
酸化分解する光触媒体及びそれを用いた機能基材に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photocatalyst for oxidatively decomposing an organic compound or an inorganic compound suspended in a gas or a liquid (referred to as a fluid), and a functional substrate using the same.
【0002】[0002]
【従来の技術】石油化学製品が増加して居住環境内外で
有害有機化合物の複合汚染が問題となっている。これを
解決する手段として光触媒半導体による酸化分解を利用
した浄化方法がある。2. Description of the Related Art As petrochemical products increase, complex pollution of harmful organic compounds inside and outside a living environment has become a problem. As a means for solving this, there is a purification method using oxidative decomposition by a photocatalytic semiconductor.
【0003】例えば、機器や機具を構成している気体の
表面に光触媒半導体を担持させ、これらの機器や機具を
有害有機物が浮遊する流体中に置くことにより有害有機
物を光触媒半導体に接触させる方法がある。この場合に
光触媒機能を高く発揮させるには、光触媒機能層の表面
積が大きいこと、その光触媒半導体が励起波長の電磁波
によって十分に活性化される必要がある。For example, there is a method in which a photocatalytic semiconductor is carried on the surface of a gas constituting an apparatus or equipment, and the harmful organic substance is brought into contact with the photocatalytic semiconductor by placing the apparatus or equipment in a fluid in which the harmful organic substance floats. is there. In this case, in order to achieve a high photocatalytic function, it is necessary that the surface area of the photocatalytic function layer is large and that the photocatalytic semiconductor is sufficiently activated by an electromagnetic wave having an excitation wavelength.
【0004】そのため、従来から基体の表面積を増大す
る技術や光触媒機能層を形成する造膜技術に関して種々
の提案がされている(例えば特開平5−309267号
公報、特開平8−196903号公報参照)。Therefore, various proposals have conventionally been made with respect to a technique for increasing the surface area of the substrate and a technique for forming a photocatalytic layer (see, for example, JP-A-5-309267 and JP-A-8-196903). ).
【0005】[0005]
【発明が解決しようとする課題】しかし、これらは単に
表面積を増大するだけで光触媒機能層の面積は増えても
励起波長の電磁波によって活性化される率が低かった
り、あるいは流体と光触媒半導体との接触効率が悪いな
どの難点がある。また、機器や器具を形成するには、光
触媒半導体を担持する基体がプレス加工など成形加工が
可能であったり、丸めたり、折り曲げたりの操作が可能
な可撓性を有することが好ましいが、従来の、特に素材
が無機質の基体ではこのような条件を備えるものがな
く、光触媒体を利用できる範囲が狭い。However, these methods merely increase the surface area and increase the area of the photocatalyst functional layer, but the activation rate by the electromagnetic wave of the excitation wavelength is low, or the fluid and the photocatalyst semiconductor cannot be separated. There are disadvantages such as poor contact efficiency. In addition, in order to form a device or an appliance, it is preferable that the substrate supporting the photocatalytic semiconductor can be formed by pressing such as press working, or has flexibility that can be rounded or bent. In particular, no inorganic base material has such a condition, and the range in which the photocatalyst can be used is narrow.
【0006】したがって本発明の目的は、基体の表面積
を拡大すると共にその表面に形成した光触媒機能層をほ
ぼ均等に活性化することができ、かつ、流体と光触媒半
導体との接触効率を高くした光触媒体及びそれを用いた
機能基材を提供することである。Accordingly, it is an object of the present invention to provide a photocatalyst which can increase the surface area of a substrate, activate a photocatalytic functional layer formed on the surface thereof almost uniformly, and increase the contact efficiency between a fluid and a photocatalytic semiconductor. An object of the present invention is to provide a body and a functional base material using the same.
【0007】[0007]
【課題を解決するための手段】上記目的を達成するため
に、本発明においては、Al又はその合金からなる一対
の網目状部材とその間に保持されたAl又はその合金か
らなる不織布を有する基体を使用し、この基体の表面に
光触媒機能層を形成する、という技術的手段を採用し
た。本発明において、網目状部材として、例えばエクス
パンドメタルを用い、不織布は一対のエクスパンドメタ
ル間にAl繊維が圧着され形成されていることができ
る。また、本発明の光触媒体は、光触媒機能と消音機能
を併せ持つ機能基材として使用することができる。In order to achieve the above-mentioned object, the present invention provides a method for producing a substrate comprising a pair of mesh members made of Al or an alloy thereof and a non-woven fabric made of Al or an alloy thereof held therebetween. And a technical means of forming a photocatalytic functional layer on the surface of the substrate. In the present invention, for example, expanded metal is used as the mesh member, and the nonwoven fabric can be formed by pressing Al fibers between a pair of expanded metals. Further, the photocatalyst of the present invention can be used as a functional base material having both a photocatalytic function and a silencing function.
【0008】[0008]
【発明の実施の形態】以下本発明の詳細を図面により説
明する。図1は本発明の一実施例に係る光触媒体の断面
図である。同図において、1は光触媒体、2は基体、3
0は網目状部材、40は金属製不織布、5は光触媒機能
層(一点鎖線で示す)である。光触媒体1は、一対の網
目状部材30、30の間に金属製不織布40を保持した
基体2の表面(両面)に光触媒機能層5を有する。基体
2は、Al又はその合金で形成された網目状部材30、
30の間に、上記と同様の金属材料からなる繊維(積層
体)を介装し、次いで両面から圧着(圧延)することに
より金属繊維が絡みあって形成された金属製不織布40
が保持される構造を有する。網目状部材としては、図2
に示すように例えばエクスパンドメタル(金属製薄板に
多数の切込みを入れ、切込みを略直角方向に引張って全
体を網状にしたもの)を用い得るが、その厚さは0.1
〜3mmが好ましい。孔(菱形)の寸法は、長孔側が3
〜20mmで短孔側が2〜10mmの範囲が好ましい。
一対の網目状部材の網目は同一でもあるいは異なってい
てもよい。Al又はその合金からなる繊維としては、線
径が10〜200μmで、長さは数mm〜数10mm程
度の短繊維を使用できるし、又数10cm以上の長繊維
も使用できる。このようにして形成された光触媒体の厚
さは、消音効果の点から1mm以上あればよいが、軽量
化のために10mm以下が好ましく、より好ましくは1
〜5mmである。DESCRIPTION OF THE PREFERRED EMBODIMENTS The details of the present invention will be described below with reference to the drawings. FIG. 1 is a sectional view of a photocatalyst according to one embodiment of the present invention. In the figure, 1 is a photocatalyst, 2 is a substrate, 3
Reference numeral 0 denotes a mesh member, reference numeral 40 denotes a metal nonwoven fabric, and reference numeral 5 denotes a photocatalytic functional layer (indicated by a chain line). The photocatalyst 1 has a photocatalyst functional layer 5 on the surface (both surfaces) of a base 2 holding a metal nonwoven fabric 40 between a pair of mesh members 30, 30. The base 2 is made of a mesh member 30 formed of Al or an alloy thereof.
A fiber (laminate) made of the same metal material as described above is interposed between the metal fibers 30 and then pressed (rolled) from both sides to form a metal nonwoven fabric 40 formed by entanglement of metal fibers.
Is held. As the mesh member, FIG.
As shown in (1), for example, an expanded metal (a metal sheet having a large number of cuts, and the cuts are pulled in a substantially perpendicular direction to form a net) can be used.
33 mm is preferred. The size of the hole (diamond) is 3 on the long hole side.
It is preferable that the short hole side has a range of 2 to 10 mm.
The mesh of the pair of mesh members may be the same or different. As the fiber made of Al or its alloy, a short fiber having a wire diameter of 10 to 200 μm and a length of several mm to several tens mm can be used, and a long fiber of several tens cm or more can also be used. The thickness of the photocatalyst formed in this way may be 1 mm or more from the viewpoint of the noise reduction effect, but is preferably 10 mm or less, more preferably 1 mm or less for weight reduction.
55 mm.
【0009】光触媒機能層5は、例えばTiO2などの
光触半導体を混入しているゾル液を、基体の表面にスプ
レーやディッピングで付着させ、乾燥させたのち、50
℃〜500℃未満の温度で焼き付けて形成することがで
きる。なお、ゾル中に光触媒半導体の他にアモルファス
型過酸化チタンまたは酸化チタンをチタン重量比(乾
量)で1:1あるいは1:5の範囲で混合しておくと比
較的低い温度で光触媒半導体の粒子を強固に担持させる
ことができる。The photocatalytic function layer 5 is formed by applying a sol solution mixed with a photoconductive semiconductor such as TiO 2 to the surface of the substrate by spraying or dipping and drying the sol solution.
It can be formed by baking at a temperature of less than 500C to less than 500C. If amorphous titanium peroxide or titanium oxide is mixed in the sol in a titanium weight ratio (dry amount) of 1: 1 or 1: 5 in addition to the photocatalyst semiconductor, the photocatalyst semiconductor is produced at a relatively low temperature. The particles can be firmly supported.
【0010】さらに、防黴殺菌などの機能補完用にP
t、Ag、Rh、RuO2、Nb、Cu、Sn、NiO
の粒子を微量混入したり、吸着機能を付加して酸化還元
による分解性能を向上させるためにゼオライト、シリカ
(二酸化ケイ素)、アルミナ、酸化亜鉛、酸化マグネシ
ウム、ルチル型酸化チタン、リン酸ジルコニウムなどの
無機材料、あるいは各種の活性炭、多孔質のフェノール
樹脂やメラミン樹脂を一種または二種以上混入すること
ができる。[0010] Further, P for supplementing functions such as fungicide sterilization.
t, Ag, Rh, RuO 2 , Nb, Cu, Sn, NiO
Of zeolite, silica (silicon dioxide), alumina, zinc oxide, magnesium oxide, rutile type titanium oxide, zirconium phosphate, etc. One or more kinds of inorganic materials, various types of activated carbon, porous phenol resins and melamine resins can be mixed.
【0011】また、基体の表面に過酸化チタン水溶液な
どの保護材をスプレーして保護被膜を形成する下地処理
を施してから光触媒機能層を形成することもできる。い
ずれの場合も過酸化チタン水溶液で事前に被膜を形成し
ておくとTiO2ゾル液の付着、展延性が改善されて濡
れ易く、基体の表面に光触機能層を均一に、かつ、広く
形成することができる。過酸化チタン水溶液は基体がス
テンレス鋼のような金属の場合でも展延性に優れTiO
2ゾル液を広く均一に塗布するのに有効である。過酸化
チタン水溶液はバインダーとしても機能するが、組成的
にセラミック系統のものを含まず、金属との相性が良い
ので基体の表面に形成しした光触媒機能層が、基体が撓
んだり振動しても剥離することが少ない。The photocatalyst layer may be formed after the surface of the substrate is sprayed with a protective material such as an aqueous solution of titanium peroxide to perform a base treatment for forming a protective film. In any case, if the film is formed in advance with an aqueous solution of titanium peroxide, the adhesion and spreadability of the TiO 2 sol solution are improved, so that it is easy to get wet, and the photo functional layer is uniformly and widely formed on the surface of the substrate. can do. Titanium peroxide aqueous solution has excellent spreadability even when the substrate is metal such as stainless steel.
It is effective to apply the two sol liquids widely and uniformly. Although the aqueous solution of titanium peroxide also functions as a binder, it does not include a ceramic-based composition and has good compatibility with metals, so the photocatalytic functional layer formed on the surface of the substrate may cause the substrate to flex or vibrate. Is less likely to peel off.
【0012】光触媒半導体としては他にZnO、SrT
iO3、CdS、CdO、CaP、InP、In
2O3、CaAs、BaTiO3、K2NbO3、Fe
2O3、Ta2O5、WO3、SaO2、Bi2O3、
NiO、Cu2O、SiC、SiO 2、MoS2、Mo
S3、InPb、RuO2、CeO2などがある。この
中で酸化チタンTiO2(アナターゼ型)が安価で特性
が安定しており、かつ、人体に無害であり、光触媒とし
て最も優れている。Other photocatalytic semiconductors include ZnO, SrT
iO3, CdS, CdO, CaP, InP, In
2O3, CaAs, BaTiO3, K2NbO3, Fe
2O3, Ta2O5, WO3, SaO2, Bi2O3,
NiO, Cu2O, SiC, SiO 2, MoS2, Mo
S3, InPb, RuO2, CeO2and so on. this
Titanium oxide TiO22(Anatase type) is inexpensive and characteristic
Is stable and harmless to the human body.
Best.
【0013】光触媒半導体の触媒機能は酸化金属などの
半導体が持つバンドギャップ以上の励起波長(励起波長
の電磁波、TiO2の場合は紫外線領域)を照射するこ
とによって半導体内に電子開裂が生じ、その表面にOH
−やO2−の活性ラジカル水酸基や活性酸素を発生させ
て、これらに接触した有機化合物を酸化あるいは還元作
用で分解するものである。これによって悪臭や油汚れを
清浄化することができる。また、同じ機能によって細菌
やビールスを殺すこと(殺菌)ができる。The catalytic function of the photocatalytic semiconductor is such that when the semiconductor is irradiated with an excitation wavelength (electromagnetic wave of excitation wavelength, ultraviolet region in the case of TiO 2 ) of a band gap equal to or greater than that of a semiconductor such as a metal oxide, electron cleavage occurs in the semiconductor. OH on the surface
It generates active radical hydroxyl groups and active oxygen of-and O 2- and decomposes organic compounds in contact with them by oxidation or reduction. Thereby, a bad smell and oil stain can be cleaned. In addition, bacteria and viruses can be killed (sterilized) by the same function.
【0014】本発明の構造であると、光触媒機能層の表
面積が大きく、また、外部から照射される励起波長の電
磁波が光触媒機能層の深部にある粒子にまで届き易く、
光触媒機能層が広い範囲で活性化される。また、このよ
うな積層構造箇所を通過する流体は積層構造の壁に当た
って反射されたり、凹部に入り込んで一時滞留したりす
るので、流体中に浮遊している有機物が光触媒半導体と
接触する機会が多い。このため、光触媒体は高性能なも
のとなる。According to the structure of the present invention, the surface area of the photocatalytic functional layer is large, and the electromagnetic wave of the excitation wavelength irradiated from the outside easily reaches the particles deep in the photocatalytic functional layer.
The photocatalytic function layer is activated in a wide range. In addition, since the fluid passing through such a laminated structure portion is reflected on the wall of the laminated structure, or enters the concave portion and temporarily stays, there are many chances that the organic matter floating in the fluid comes into contact with the photocatalytic semiconductor. . Therefore, the photocatalyst has high performance.
【0015】また、このような光触媒体は使用の態様に
よって清浄化機能と共に消音(吸音、遮音)機能や視覚
遮蔽機能あるいは流体が液相の場合には消波や消泡の機
能を持たせることができる。消音とは、例えば、光触媒
体を道路において車道と人道を区画する界壁板として使
用する場合であり、光触媒機能層によってNOx、SO
xを分解除去すると同時に、基体を金属製不織布とする
ことで、音波を金属繊維が絡みあって形成された金属製
不織布の複雑な内部空間に導きその伝播エネルギーを吸
収してしまうことである。視覚遮蔽機能は光の通過を阻
止する機能であって、これにより光触媒体を間仕切りな
どと使用することが可能となる。さらに、消波は音波の
吸収に似る。液体の波動は液体中に浮遊する有機化合物
と光触媒半導体との接触機会を不均一にするが、前記の
金属製不織布によって流体は一時的に金属製不織布の内
部空間に止まり、光触半導体との接触機会がほぼ均一に
なる。[0015] In addition, such a photocatalyst may have a sound-absorbing (sound-absorbing, sound-insulating) function, a visual shielding function, or a wave-eliminating or foam-eliminating function when the fluid is in a liquid phase, as well as a cleaning function, depending on the usage. Can be. The silencing is, for example, a case where the photocatalyst is used as a partition wall that separates a roadway and a human road on a road.
When the substrate is made of a metal non-woven fabric at the same time as x is decomposed and removed, sound waves are guided to a complicated internal space of the metal non-woven fabric formed by entanglement of metal fibers, and the transmitted energy is absorbed. The visual blocking function is a function of blocking the passage of light, so that the photocatalyst can be used as a partition or the like. Furthermore, wave extinction is analogous to the absorption of sound waves. The wave of the liquid makes the opportunity of contact between the organic compound floating in the liquid and the photocatalytic semiconductor non-uniform, but the fluid temporarily stops in the internal space of the metal non-woven fabric due to the above-mentioned metal non-woven fabric, and the contact with the photo-semiconductor is caused. The contact chance becomes almost uniform.
【0016】その他、本発明の光触媒体は空調機や排ガ
ス処理装置の基体あるいはフィルター、便所や建築用の
屋内壁板、防藻観賞用水槽壁、水泳用プール壁などに利
用が可能である。In addition, the photocatalyst of the present invention can be used for a base or a filter of an air conditioner or an exhaust gas treatment device, an indoor wall plate for a toilet or a building, an algae-proof aquarium wall, a swimming pool wall, and the like.
【0017】[0017]
【実施例】光触媒体製造の実施例 (実施例1)基体としては、直径90〜140μm、長
さ10mm〜150mm、面密度が1650g/m2の
Al繊維を、網目のサイズが3mm×4mmで厚さが
0.4mm及び網目のサイズが4mm×8mmで厚さが
0.6mmのAl製エキスパンドメタルにローラー圧延
加工を施して凹凸をならすことにより表面をフラット化
した2枚のエキスパンドメタルで挟持し、これらをロー
ラー圧延して厚さ1.6mmにしたものを使用した。EXAMPLES Example of Production of Photocatalyst (Example 1) As a substrate, an Al fiber having a diameter of 90 to 140 μm, a length of 10 mm to 150 mm, and a surface density of 1650 g / m 2 was used. Rolled aluminum rolling metal with a thickness of 0.4mm and a mesh size of 4mm x 8mm and a thickness of 0.6mm by roller rolling to smooth out irregularities and sandwich it between two expanded metals with a flat surface. These were rolled and rolled to a thickness of 1.6 mm.
【0018】次に光触媒機能材として、アルモファス型
過酸化チタン水溶液(0.84w%):アナターゼ型酸
化チタン水溶液(0.84w%)を3:7の割合で混合
して基板の表面に2.9g/25cm2(wet状態)
の吹付けをする。そして、常温乾燥の後、加熱乾燥(3
00℃×1hr)をして光触媒体とした。Next, as a photocatalyst functional material, an aqueous solution of amorphous titanium oxide (0.84 w%): aqueous solution of anatase titanium oxide (0.84 w%) is mixed at a ratio of 3: 7, and the mixture is added to the surface of the substrate. 9g / 25cm 2 (wet state)
Spray. After drying at room temperature, heating and drying (3
(00 ° C. × 1 hr) to obtain a photocatalyst.
【0019】(実施例2)光触媒機能材の塗布量を3.
8g/25cm2に変更した以外は、実施例1と同様の
条件で光触媒体を作成した。(Example 2) The coating amount of the photocatalytic functional material was set to 3.
A photocatalyst was prepared under the same conditions as in Example 1 except that the photocatalyst was changed to 8 g / 25 cm 2 .
【0020】(比較例1)光触媒機能材として、アナタ
ーゼ型酸化チタン水溶液(0.84%):コロイダルシ
リカ水溶液(0.84%)を3:1の重量比で混合し
て、実施例1の基板の表面に吹付け(塗布量2.9g/
25cm2)も常温乾燥後加熱乾燥(300℃×1h)
を行って、光触媒体とした。Comparative Example 1 An anatase type titanium oxide aqueous solution (0.84%): colloidal silica aqueous solution (0.84%) was mixed at a weight ratio of 3: 1 as a photocatalytic functional material. Spraying onto the surface of the substrate (application amount 2.9 g /
25cm 2 ) also dried at room temperature and then dried by heating (300 ℃ × 1h)
To obtain a photocatalyst.
【0021】(比較例2)光触媒機能材として、アナタ
ーゼ型酸化チタン水溶液(0.84wt/%):コロイ
ダルシリカ水溶液(0.84wt%)を2:1の重量比
で混合して、実施例1の基板の表面に吹付け(塗布量
2.9g/25cm2)、常温乾燥後加熱乾燥(300
℃×1h)を行って、光触媒体とした。Comparative Example 2 An anatase-type titanium oxide aqueous solution (0.84 wt /%): colloidal silica aqueous solution (0.84 wt%) was mixed at a weight ratio of 2: 1 as a photocatalytic functional material. (2.9 g / 25 cm 2 ), dried at room temperature, and then dried by heating (300 g).
C. x 1 h) to obtain a photocatalyst.
【0022】次に上記実施例及び比較例の光触媒体につ
いて、窒素酸化物(NOx)の除去能力を次の方法で測
定し、その結果を表1に示す。上記光触媒体をガラス容
器内にセットし、このガラス容器内に0.5リットル/
分の流量でNOxガスを導入し、波長485nm、出力
1.0mW/cm2の紫外線を照射し、導入したNOx
ガスの濃度(A)、紫外線照射時のNOxガスの濃度
(B)及び紫外線照射後5分経過後のNOxガスの濃度
(C)を測定し、NOx除去率{A−B/A×100
(%)又はA−C/A×100(%)}を算出した。Next, the photocatalysts of the above Examples and Comparative Examples were measured for their ability to remove nitrogen oxides (NOx) by the following method, and the results are shown in Table 1. The photocatalyst was set in a glass container, and 0.5 liter /
NOx gas was introduced at a flow rate of 1 minute, and ultraviolet light having a wavelength of 485 nm and an output of 1.0 mW / cm 2 was irradiated.
The gas concentration (A), the concentration of NOx gas at the time of ultraviolet irradiation (B), and the concentration of NOx gas after 5 minutes from the irradiation of ultraviolet light (C) were measured, and the NOx removal rate {AB / A × 100
(%) Or AC / A × 100 (%)} was calculated.
【0023】[0023]
【表1】 [Table 1]
【0024】表1より、比較例1、2では、紫外線照射
時のNOx除去率は約71%、約82%にとどまり、特
に比較例1では、紫外線を照射してから5分後のNOx
除去率は約59%に低下していることがわかる。これら
比較例1、2に対して実施例1、2では、紫外線照射時
のNOx除去率は90%を越える値を示し、紫外線を照
射してから5分後も約86%の高いNOx除去率を維持
していることが確認された。From Table 1, it can be seen that in Comparative Examples 1 and 2, the NOx removal rate during ultraviolet irradiation was only about 71% and about 82%, and in Comparative Example 1 in particular, NOx was removed 5 minutes after the ultraviolet irradiation.
It can be seen that the removal rate has dropped to about 59%. In contrast to Comparative Examples 1 and 2, in Examples 1 and 2, the NOx removal rate at the time of irradiation with ultraviolet light exceeded 90%, and a high NOx removal rate of about 86% even 5 minutes after irradiation with ultraviolet light. It was confirmed that it maintained.
【0025】[0025]
【発明の効果】本発明によれば、光触媒体は表層部に多
くの空隙と凹凸を備え、光触媒機能層の面積が大きくて
酸化・還元力が大きいと共に流体中を浮遊する有機化合
物と光触媒機能層との接触機会が多く、性能の高い光触
媒体を得ることが出来る。特に一対の網目状部材間に金
属製不織布が保持された構造を有するので、消音効果が
大きくかつ汚染物質の除去性能が高い光触媒体が得られ
る。According to the present invention, the photocatalyst body has many voids and irregularities in the surface layer, the photocatalytic functional layer has a large area, a large oxidizing / reducing power, and the organic compound floating in the fluid and the photocatalytic function. The photocatalyst with high performance has many opportunities to contact with the layer. In particular, since it has a structure in which a metal nonwoven fabric is held between a pair of mesh members, a photocatalyst having a large noise reduction effect and high contaminant removal performance can be obtained.
【図1】本発明の他の実施例に係る光触媒体の断面図で
ある。FIG. 1 is a cross-sectional view of a photocatalyst according to another embodiment of the present invention.
【図2】基体の表面を示す模式図である。FIG. 2 is a schematic diagram showing a surface of a base.
1 光触媒体、2 基体、30 網目状部材、40 金
属製不織布、5 光触媒機能層DESCRIPTION OF SYMBOLS 1 Photocatalyst body, 2 base materials, 30 mesh members, 40 nonwoven fabric made of metal, 5 photocatalytic functional layer
───────────────────────────────────────────────────── フロントページの続き (72)発明者 緒方 四郎 東京都渋谷区幡ヶ谷1−1−1 小林ビル 6階 (72)発明者 森本 徹 千葉県市川市若宮3−58−2 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Shiro Ogata 1-1-1 Hatagaya, Shibuya-ku, Tokyo Kobayashi Building 6F (72) Inventor Toru Morimoto 3-58-2 Wakamiya, Ichikawa-shi, Chiba
Claims (3)
部材とその間に保持されたAl又はその合金からなる不
織布を有する基体と、基体の表面に形成された光触媒機
能層を有することを特徴とする光触媒体。1. A substrate having a pair of mesh members made of Al or an alloy thereof, a non-woven fabric made of Al or an alloy thereof held between the members, and a photocatalytic functional layer formed on the surface of the substrate. Photocatalyst.
り、不織布はAl繊維が一対のエクスパンドメタル間に
圧着されて形成されていることを特徴とする請求項1に
記載の光触媒体。2. The photocatalyst according to claim 1, wherein the mesh member is an expanded metal, and the nonwoven fabric is formed by pressing Al fibers between a pair of expanded metals.
媒体を備え、光触媒機能と消音機能を合せもつ機能基
材。3. A functional substrate comprising the photocatalyst according to claim 1 and having both a photocatalytic function and a silencing function.
Priority Applications (1)
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JP11-142979 | 1999-05-24 | ||
JP14297999 | 1999-05-24 | ||
JP2000149144A JP2001038220A (en) | 1999-05-24 | 2000-05-22 | Photocatalyst and functional base material |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006115939A (en) * | 2004-10-19 | 2006-05-11 | Hiroshige Fukuhara | Purifying apparatus |
CN109174204A (en) * | 2018-08-06 | 2019-01-11 | 安徽工程大学 | A kind of preparation method of high efficiency photocatalysis composite material |
-
2000
- 2000-05-22 JP JP2000149144A patent/JP2001038220A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006115939A (en) * | 2004-10-19 | 2006-05-11 | Hiroshige Fukuhara | Purifying apparatus |
CN109174204A (en) * | 2018-08-06 | 2019-01-11 | 安徽工程大学 | A kind of preparation method of high efficiency photocatalysis composite material |
CN109174204B (en) * | 2018-08-06 | 2021-06-18 | 安徽工程大学 | Preparation method of efficient photocatalytic composite material |
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