JP2001035815A - Dicing-oriented adhesive film - Google Patents

Dicing-oriented adhesive film

Info

Publication number
JP2001035815A
JP2001035815A JP11205536A JP20553699A JP2001035815A JP 2001035815 A JP2001035815 A JP 2001035815A JP 11205536 A JP11205536 A JP 11205536A JP 20553699 A JP20553699 A JP 20553699A JP 2001035815 A JP2001035815 A JP 2001035815A
Authority
JP
Japan
Prior art keywords
film
dicing
low
adhesive film
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11205536A
Other languages
Japanese (ja)
Inventor
Michihiro Shimane
道弘 嶋根
Osamu Yamamoto
修 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP11205536A priority Critical patent/JP2001035815A/en
Publication of JP2001035815A publication Critical patent/JP2001035815A/en
Pending legal-status Critical Current

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Landscapes

  • Dicing (AREA)
  • Laminated Bodies (AREA)
  • Adhesive Tapes (AREA)
  • Paints Or Removers (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

PROBLEM TO BE SOLVED: To prevent a chip from being destroyed by electrostatic charges in the case of its pickup and make burnable a dicing-oriented adhesive film after the use thereof, by forming on a film-form supporter having a specific tensile elastic-modulus an antistatic agent and an adhesive agent layer in this order. SOLUTION: A film-form supporter is the one having a tensile elastic-modulus of 5-20 kgf/mm2 wherein the number of its constituent layers is not smaller than three and it has the outermost layer made of a crystalline polyolefine and the inner layer made of a low crystalline polyolefine. As the crystalline polyolefine, there is used preferably a low-density polyethylene, linear low- density polyethylene, polypropylene, or the mixtures thereof. As the low crystalline polyolefine, there is used the macromolecule of a comparably low molecular weight or the like wherein an amorphous poly-α-olefine, etc., are copolymerized with each other. As an antistatic layer, there is used preferably the crosslinked copolymer having a carboxylic group and a quarternary ammonium base. As an adhesive agent layer, an acrylic adhesive agent is used preferably.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、シリコンウエハ、
化合物ウエハ等をチップに切断分離する際に、ウエハを
貼り付け保持するためのダイシング用粘着フィルムに関
する。
TECHNICAL FIELD The present invention relates to a silicon wafer,
The present invention relates to a dicing adhesive film for sticking and holding a wafer when a compound wafer or the like is cut and separated into chips.

【0002】[0002]

【従来の技術】シリコン、ガリウム砒素等の半導体ウエ
ハは、微細回路を形成した後ICチップ等の小片に切断
分離(ダイシング)され、次工程のダイボンド工程に移
される。この際、半導体ウエハは予め粘着剤が塗布され
たフィルム、シート、テープ等の粘着材料に貼り付けさ
れた状態でダイシング、エキスパンディング、ピックア
ップ、ダイボンディングの各工程が加えられる。このダ
イシング工程では、毎分数万回転の高速で回転する薄い
砥石がウエハを切断しながら移動していく結果、ウエハ
及び切断されたチップには大きな剥離力が加わるため、
これに対抗するために必要な粘着力を持つ粘着フィルム
(用途によりフィルム、シート、テープ等の材料形態が
あるが、以後フィルムで代表させて説明する)が使われ
ている。ダイシング後のダイボンディング工程では、通
常粘着フィルムに貼られていたチップを、粘着フィルム
裏面からニードルによる突上げを併用してコレットで真
空吸引しピックアップするので、その際チップが容易且
つ確実に粘着フィルムから剥がれる程度のあまり強すぎ
ない粘着力を持つフィルムが要求され、その目的に合う
粘着フィルムが供給されている。しかし、粘着フィルム
は絶縁体であるため、貼り付け時や剥離時等における静
電気の発生や、それによる半導体ウエハの帯電で回路が
破壊されることが問題となっていた。また、エキスパン
ディング工程で粘着フィルムをエキスパンドできるよ
う、基材フィルムには一般にポリ塩化ビニルが使用され
ており、廃棄処理が問題であった。
2. Description of the Related Art A semiconductor wafer made of silicon, gallium arsenide, or the like is cut and separated (diced) into small pieces such as IC chips after forming a fine circuit, and is transferred to the next die bonding step. At this time, each step of dicing, expanding, pickup, and die bonding is performed while the semiconductor wafer is pasted on an adhesive material such as a film, sheet, or tape to which an adhesive has been applied in advance. In this dicing process, a thin grindstone rotating at a high speed of tens of thousands of revolutions per minute moves while cutting the wafer, so that a large peeling force is applied to the wafer and the cut chips,
In order to counter this, an adhesive film having a necessary adhesive force (a material form such as a film, a sheet, or a tape is used depending on the use, but hereinafter, a film is used as an example) is used. In the die bonding process after dicing, the chip normally attached to the adhesive film is picked up from the back of the adhesive film by vacuum suction using a collet together with pushing up with a needle. There is a demand for a film having an adhesive strength that is not so strong that it can be peeled off, and an adhesive film suitable for the purpose has been supplied. However, since the adhesive film is an insulator, there has been a problem that static electricity is generated at the time of sticking or peeling, and the circuit is destroyed by the electrification of the semiconductor wafer. Further, polyvinyl chloride is generally used for the base film so that the adhesive film can be expanded in the expanding step, and there has been a problem of disposal treatment.

【0003】[0003]

【発明が解決しようとする課題】本発明はかかる状況に
鑑みなされたもので、半導体ウエハをダイシングした後
のダイボンディング工程において、チップをピックアッ
プする際の静電気によるチップ破壊を防止し、使用後の
焼却処理が可能なダイシング用粘着フィルムを提供する
ことを目的とする。
SUMMARY OF THE INVENTION The present invention has been made in view of such circumstances, and in a die bonding process after dicing a semiconductor wafer, chip destruction due to static electricity when picking up chips is prevented, and An object of the present invention is to provide an adhesive film for dicing that can be incinerated.

【0004】[0004]

【課題を解決するための手段】かかる目的は本発明によ
れば、引張り弾性率が5〜20kgf/mm2 のフィル
ム状支持体の上に帯電防止層、粘着剤層をこの順に形成
してなるダイシング用粘着フィルムを用いることにより
達成される。
According to the present invention, an antistatic layer and an adhesive layer are formed in this order on a film-like support having a tensile modulus of elasticity of 5 to 20 kgf / mm 2. This is achieved by using an adhesive film for dicing.

【0005】[0005]

【発明の実施の形態】本発明で用いられるフィルム状支
持体は、5〜20kgf/mm2 の引張り弾性率がを有
するものであれば特に制限はないが、最外層を結晶性ポ
リオレフィン、内層を低結晶性ポリオレフィンとした3
層以上の支持体とすることで、塑性変形による歪みが小
さくなり、全方向に均一に伸びる支持体を得ることがで
きるので好ましい。すなわち、内層の低結晶性ポリオレ
フィン層が塑性変形しても歪みが残らないため、同じ厚
さの結晶性ポリオレフィンのみからなる支持体と比較し
た場合、歪みが発生する部分が少なくなり、伸びの差が
少ない支持体となる。このような3層以上の多層構造に
おいては、低結晶性のポリオレフィンの厚みを10〜1
80μmとし、結晶性ポリオレフィンの厚みを10〜3
0μmとするのが好ましい。更に、支持体全体の厚みと
しては、30〜200μmとするのが好ましく、更に好
ましくは60〜150μmである。
BEST MODE FOR CARRYING OUT THE INVENTION The film-like support used in the present invention is not particularly limited as long as it has a tensile modulus of 5 to 20 kgf / mm 2. Low crystalline polyolefin 3
It is preferable to use a support having more than two layers, since the strain due to plastic deformation is reduced, and a support extending uniformly in all directions can be obtained. That is, since the low-crystalline polyolefin layer of the inner layer does not remain strain even if it is plastically deformed, when compared with a support made of only crystalline polyolefin having the same thickness, the portion where the strain occurs is reduced, and the difference in elongation is reduced. Less support. In such a multilayer structure of three or more layers, the thickness of the low-crystalline polyolefin is 10 to 1
80 μm, and the thickness of the crystalline polyolefin is 10 to 3
It is preferably 0 μm. Further, the thickness of the entire support is preferably from 30 to 200 μm, more preferably from 60 to 150 μm.

【0006】支持体に使用される材料としては、結晶性
ポリオレフィンとして、低密度ポリエチレン、線状低密
度ポリエチレン、ポリプロピレン又はこれらの混合物を
用いるのが好ましい。低結晶性ポリオレフィンとして
は、無定型ポリα−オレフィン(プロピレンとエチレン
やブテン−1等を共重合した分子量の比較的低い高分
子)等を用いるのが好ましく、Tダイやインフレーショ
ン用ダイをもつ押出し機により加工される。また前記支
持体には、必要に応じて一般に使用される酸化防止剤、
滑剤、老化防止剤、着色剤等の添加物を含んでもよい。
更に帯電防止層との密着力を得るために、コロナ処理、
プラズマ処理等の表面処理を行ってもよい。またブロッ
キングを防止するために、背面処理剤等の塗布を行って
も構わない。また、シート片での使用に応ずるため、粘
着剤のある側に剥離フィルム(セパレータ)をラミネー
トしてもよい。フィルム状支持体の引張り弾性率が5k
gf/mm2 未満では、チップの保持が不十分になりダ
イシングの際にチッピングが発生するという問題が発生
する。引張り弾性率が20kgf/mm2 を越えると、
エキスパンドやピックアップの際にフィルム変形が不十
分となり剥離力が大きくなる問題が発生する。
As the material used for the support, low-density polyethylene, linear low-density polyethylene, polypropylene or a mixture thereof is preferably used as the crystalline polyolefin. As the low-crystalline polyolefin, it is preferable to use an amorphous poly-α-olefin (a relatively low molecular weight polymer obtained by copolymerizing propylene with ethylene, butene-1, or the like) or the like. Extrusion with a T die or a die for inflation is preferable. Machined. In addition, the support may include an antioxidant generally used as necessary,
It may contain additives such as a lubricant, an antioxidant, and a coloring agent.
In order to further obtain the adhesion with the antistatic layer, corona treatment,
Surface treatment such as plasma treatment may be performed. In order to prevent blocking, a back surface treatment agent or the like may be applied. Further, a release film (separator) may be laminated on the side having the adhesive in order to respond to use as a sheet piece. Tensile modulus of elasticity of film support is 5k
If it is less than gf / mm 2, there is a problem that the holding of the chip becomes insufficient and chipping occurs during dicing. When the tensile modulus exceeds 20 kgf / mm 2 ,
During expansion or pick-up, there is a problem that the film is insufficiently deformed and the peeling force is increased.

【0007】粘着剤層としては、アクリル系粘着剤、天
然ゴム系粘着剤、合成ゴム系粘着剤、シリコーンゴム系
粘着剤等が用いられるが、半導体ウエハ等の被着体を汚
染することが少ないアクリル系粘着剤が好ましい。また
各種添加剤、例えば粘着付与剤、酸化防止剤、架橋剤、
分離剤、界面活性剤、乳化剤等を必要に応じ添加しても
よい。粘着剤層の厚みとしては、0.1〜25μmとす
るのが好ましい。0.1μm未満では必要な初期粘着力
が得られず、25μmを越えると、ピックアップ時にお
ける剥離力が大きくなりすぎ剥離困難になる。
As the pressure-sensitive adhesive layer, an acrylic pressure-sensitive adhesive, a natural rubber-based pressure-sensitive adhesive, a synthetic rubber-based pressure-sensitive adhesive, a silicone rubber-based pressure-sensitive adhesive or the like is used, but the adherend such as a semiconductor wafer is hardly contaminated. Acrylic adhesives are preferred. Also various additives, such as tackifiers, antioxidants, crosslinking agents,
Separating agents, surfactants, emulsifiers and the like may be added as necessary. The thickness of the pressure-sensitive adhesive layer is preferably 0.1 to 25 μm. If it is less than 0.1 μm, the required initial adhesive strength cannot be obtained, and if it exceeds 25 μm, the peeling force at the time of pickup becomes too large, and it becomes difficult to peel.

【0008】帯電防止層としては、カルボキシル基及び
4級アンモニウム塩基を有する架橋性共重合体が好まし
く、厚みは0.05〜1.0μmとするのが好ましい。
このような帯電防止剤としては、例えばボンディップP
A−100(コニシ(株)商品名)等を用いることがで
きる。帯電防止層が界面活性剤のような低分子量物の場
合には、凝集破壊による粘着剤層の剥離や表面にブリー
ドして被着体に汚染が発生する。また、樹脂層や粘着剤
に界面活性剤をブレンドした場合も同様に、表面にブリ
ードして被着体を汚染するので好ましくない。帯電防止
層が0.05μm未満では、良好な帯電防止性能が得ら
れず、1.0μmより厚い場合はコストが高くなるので
経済的でない。
The antistatic layer is preferably a crosslinkable copolymer having a carboxyl group and a quaternary ammonium base, and preferably has a thickness of 0.05 to 1.0 μm.
As such an antistatic agent, for example, Bondip P
A-100 (trade name of Konishi Co., Ltd.) or the like can be used. When the antistatic layer is a low molecular weight substance such as a surfactant, the pressure-sensitive adhesive layer peels due to cohesive failure or bleeds on the surface to cause contamination of the adherend. Similarly, when a surfactant is blended with the resin layer or the pressure-sensitive adhesive, it bleeds on the surface to contaminate the adherend, which is not preferable. If the thickness of the antistatic layer is less than 0.05 μm, good antistatic performance cannot be obtained.

【0009】[0009]

【実施例】以下、本発明を実施例に基づき説明する。
尚、本発明はこれら実施例によって何等限定されるもの
ではない。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below based on embodiments.
It should be noted that the present invention is not limited by these examples.

【0010】実施例1 [支持体の作成]結晶性ポリオレフィンとしてポリプロ
ピレン(ショウアロマーFA432、MFR9.0g/
10分:昭和電工(株)商品名)を用い、低結晶性ポリ
オレフィン(CAP350、MFR14.0g/10
分:宇部興産(株)商品名)を用い、低結晶性ポリオレ
フィン層の両面に結晶性ポリオレフィンを積層してなる
3層構造の支持体を多層Tダイ法により、全体厚さが1
00μm(結晶性ポリオレフィン10μm、低結晶性ポ
リオレフィン80μm)になるように作成した。 [帯電防止層の作成]カルボニル基及び4級アンモニウ
ム塩基を有する架橋性共重合体高分子してアクリル系共
重合体(ボンディップPA−100:コニシ(株)商品
名)を用い、上記で得られた支持体の一方の面に塗布
し、乾燥厚さが0.3μmになるよう作成した。 [粘着層の作成]ブチルアクリレート87重量部、アク
リロニトリル10重量部、ヒドロキシエチルアクリレー
ト3重量部からなる共重合体100重量部に、トリレン
ジジイソシアネートを3重量部添加してアクリル系粘着
剤を得た。次に、該粘着剤を上記で得られた帯電防止層
の上に塗布し、乾燥厚さが5μmになるようにして本発
明のダイシング用粘着フィルムを得た。
Example 1 [Preparation of Support] Polypropylene (shawomer FA432, MFR 9.0 g /
10 minutes: low-crystalline polyolefin (CAP350, MFR 14.0 g / 10) using Showa Denko KK
Using Ube Industries, Ltd. (trade name), a support having a three-layer structure in which crystalline polyolefin is laminated on both sides of a low-crystalline polyolefin layer, and having a total thickness of 1 by a multilayer T-die method.
It was prepared so as to be 00 μm (crystalline polyolefin 10 μm, low crystalline polyolefin 80 μm). [Preparation of antistatic layer] A crosslinkable copolymer having a carbonyl group and a quaternary ammonium salt group was obtained using an acrylic copolymer (Bondip PA-100: trade name of Konishi Co., Ltd.) as a polymer. It was applied to one surface of the support thus prepared, and was prepared so that the dry thickness was 0.3 μm. [Formation of Adhesive Layer] To 100 parts by weight of a copolymer consisting of 87 parts by weight of butyl acrylate, 10 parts by weight of acrylonitrile and 3 parts by weight of hydroxyethyl acrylate, 3 parts by weight of tolylene diisocyanate was added to obtain an acrylic pressure-sensitive adhesive. . Next, the pressure-sensitive adhesive was applied on the antistatic layer obtained above, and the dry thickness was 5 μm to obtain a dicing pressure-sensitive adhesive film of the present invention.

【0011】実施例2 結晶性ポリオレフィンとしてポリエチレン(ショウレッ
クスF141、MFR4.0g/10分:昭和電工
(株)商品名)を使用した以外は、実施例1と同様にし
て本発明のダイシング用粘着フィルムを得た。 実施例3 支持体をインフレーション法により厚さ100μmに作
成したポリエチレン(ショウレックスF141:昭和電
工製)とした以外は、実施例1と同様にして本発明のダ
イシング用粘着フィルムを得た。
Example 2 An adhesive for dicing of the present invention was prepared in the same manner as in Example 1 except that polyethylene (SHOLEX F141, MFR 4.0 g / 10 min: trade name of Showa Denko KK) was used as the crystalline polyolefin. A film was obtained. Example 3 An adhesive film for dicing of the present invention was obtained in the same manner as in Example 1 except that the support was made of polyethylene (Showrex F141: manufactured by Showa Denko) having a thickness of 100 μm by an inflation method.

【0012】比較例1 支持体をTダイ法により厚さ100μmに作成したポリ
プロピレン(ショウアロマーFA432:昭和電工
(株)商品名)とした以外は、実施例1と同様にしてサ
ンプルを作成した。 比較例2 帯電防止層を設けないこと以外は、実施例と同様にして
サンプルを作成した。 比較例3 帯電防止層をカチオン系界面活性剤(エレガン264W
AX:日本油脂(株)商品名)とした以外は、実施例1
と同様にしてサンプルを作成した。
Comparative Example 1 A sample was prepared in the same manner as in Example 1 except that the support was made of polypropylene (Showaromer FA432: trade name of Showa Denko KK) having a thickness of 100 μm by the T-die method. Comparative Example 2 A sample was prepared in the same manner as in Example except that the antistatic layer was not provided. Comparative Example 3 A cationic surfactant (Elegan 264W) was used for the antistatic layer.
AX: Nippon Oil & Fats Co., Ltd.)
A sample was prepared in the same manner as described above.

【0013】測定方法 [引張り弾性率の測定]測定方法は、JIS K711
3(プラスチックの引張り試験方法)に準じ、テープ状
の試験片(幅10mm)をつかみ治具間距離50mm、
速度500mm/分で延伸して測定した。 [エキスパンド性の評価]作成したダイシング用粘着フ
ィルムサンプルに半導体ウエハを貼り付け、ダイシング
を行った。その後エキスパンティング工程においてエキ
スパンドし、均一にエキスパンドできるか評価した。均
一にエキスパンドできたものを○、不均一になったもの
を×とした。 [チップ帯電量、チップ破壊の評価]ダイシング後の半
導体チップをピックアップし、剥離直後のチップ帯電量
を測定した。また、チップ帯電量測定後、チップの静電
気破壊状況を評価した。破壊されていない場合を○、破
壊された場合を×とした。 [チップ汚染の評価]作製したダイシング用粘着フィル
ムを半導体ウエハに貼りつけ、80℃で1時間処理をお
こなった。その後粘着フィルムを剥離し、半導体ウエハ
の表面状態を観察した。表面が汚染されてないものを
○、曇等で汚染されているものを×とした。
Measurement Method [Measurement of Tensile Modulus] The measurement method is based on JIS K711.
According to 3 (Plastic tensile test method), a tape-shaped test piece (10 mm in width) was gripped, and the jig distance was 50 mm.
It was measured by stretching at a speed of 500 mm / min. [Evaluation of Expandability] A semiconductor wafer was attached to the prepared dicing adhesive film sample, and dicing was performed. Thereafter, expansion was performed in an expanding step, and it was evaluated whether or not expansion was possible uniformly. A sample that could be uniformly expanded was evaluated as ○, and a sample that was unevenly expanded was evaluated as ×. [Evaluation of chip charge amount and chip destruction] The semiconductor chip after dicing was picked up, and the chip charge amount immediately after peeling was measured. After the measurement of the charge amount of the chip, the electrostatic damage of the chip was evaluated.場合 indicates that it was not destroyed, and x indicates that it was destroyed. [Evaluation of Chip Contamination] The prepared dicing adhesive film was adhered to a semiconductor wafer and treated at 80 ° C. for 1 hour. Thereafter, the adhesive film was peeled off, and the surface state of the semiconductor wafer was observed.も の indicates that the surface was not contaminated, and X indicates that the surface was contaminated by cloudiness or the like.

【0014】[0014]

【表1】 [Table 1]

【0015】[0015]

【発明の効果】本発明のダイシング用粘着フィルムは、
支持体の上に帯電防止剤及び粘着剤層を形成しているた
め、貼り付け時や剥離時における静電気の発生により半
導体チップが帯電して回路が破壊されるのを防止するこ
とができる。また、支持体として最外層に結晶性ポリオ
レフィンを、内側に低結晶性ポリオレフィンを使用した
3層以上の積層体としているため、エキスパンドしたと
きの塑性変形による歪みが少なく、良好な特性が得られ
る。更に、支持体がポリオレフィンであるため焼却処理
が可能であり、従来の塩ビ系ダイシング用粘着フィルム
と比較して廃棄処理が容易になる。
The pressure-sensitive adhesive film for dicing of the present invention comprises:
Since the antistatic agent and the pressure-sensitive adhesive layer are formed on the support, it is possible to prevent the semiconductor chip from being charged due to the generation of static electricity at the time of sticking or peeling, thereby preventing the circuit from being broken. In addition, since the support is a laminate of three or more layers using a crystalline polyolefin for the outermost layer and a low-crystalline polyolefin for the inner side, distortion due to plastic deformation upon expansion is small, and good characteristics are obtained. Furthermore, since the support is a polyolefin, it can be incinerated, and the disposal can be facilitated as compared with a conventional PVC-based dicing adhesive film.

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4F100 AK03A AK03D AK03E AK07 AK25 AK25G AK27G AK51G AL01B BA05 BA07 BA10A BA10C BA13 BA26 CB05G EJ05B GB43 JA11A JA11D JA11E JG03B JK07A JL04 JL13C YY00A 4J004 AA05 AA10 AA11 AB01 CA04 CC03 FA05 4J038 EA011 GA06 GA08 KA09 NA20  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 4F100 AK03A AK03D AK03E AK07 AK25 AK25G AK27G AK51G AL01B BA05 BA07 BA10A BA10C BA13 BA26 CB05G EJ05B GB43 JA11A JA11D JA11E JG03B JK07A JL04 JA01 A04A03A04 GA08 KA09 NA20

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】引張り弾性率が5〜20kgf/mm2
フィルム状支持体の上に帯電防止層、粘着剤層をこの順
に形成してなることを特徴とするダイシング用粘着フィ
ルム。
1. An adhesive film for dicing, comprising an antistatic layer and an adhesive layer formed in this order on a film support having a tensile modulus of 5 to 20 kgf / mm 2 .
【請求項2】支持体が少なくとも3層で構成され、最外
層の2層が結晶性ポリオレフィンであり、内層が1層以
上の低結晶性ポリオレフィンである請求項1記載のダイ
シング用粘着フィルム。
2. The pressure-sensitive adhesive film for dicing according to claim 1, wherein the support comprises at least three layers, two outermost layers are crystalline polyolefins, and the inner layer is one or more low-crystalline polyolefins.
【請求項3】帯電防止層がカルボキシル基及び4級アン
モニウム塩基を有する架橋性共重合高分子である請求項
1又は2に記載のダイシング用粘着フィルム。
3. The pressure-sensitive adhesive film for dicing according to claim 1, wherein the antistatic layer is a crosslinkable copolymer having a carboxyl group and a quaternary ammonium group.
JP11205536A 1999-07-21 1999-07-21 Dicing-oriented adhesive film Pending JP2001035815A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11205536A JP2001035815A (en) 1999-07-21 1999-07-21 Dicing-oriented adhesive film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11205536A JP2001035815A (en) 1999-07-21 1999-07-21 Dicing-oriented adhesive film

Publications (1)

Publication Number Publication Date
JP2001035815A true JP2001035815A (en) 2001-02-09

Family

ID=16508526

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11205536A Pending JP2001035815A (en) 1999-07-21 1999-07-21 Dicing-oriented adhesive film

Country Status (1)

Country Link
JP (1) JP2001035815A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002302656A (en) * 2001-04-05 2002-10-18 Nitto Denko Corp Surface protective film and its releasing method
JP2005280211A (en) * 2004-03-30 2005-10-13 Gunze Ltd Base film for dicing
JP2006245353A (en) * 2005-03-04 2006-09-14 Nitta Ind Corp Fastening adhesive tape, and method of manufacturing laminated ceramic capacitor
CN101768415B (en) * 2008-12-30 2013-03-27 第一毛织株式会社 Antistatic adhesive composition, adhesive film using the same, method for producing the adhesive film, and method of fabricating liquid crystal display
CN110699000A (en) * 2019-10-11 2020-01-17 上海固柯胶带科技有限公司 Film material for grinding and packaging semiconductor

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002302656A (en) * 2001-04-05 2002-10-18 Nitto Denko Corp Surface protective film and its releasing method
JP2005280211A (en) * 2004-03-30 2005-10-13 Gunze Ltd Base film for dicing
JP4563711B2 (en) * 2004-03-30 2010-10-13 グンゼ株式会社 Substrate film for dicing
JP2006245353A (en) * 2005-03-04 2006-09-14 Nitta Ind Corp Fastening adhesive tape, and method of manufacturing laminated ceramic capacitor
CN101768415B (en) * 2008-12-30 2013-03-27 第一毛织株式会社 Antistatic adhesive composition, adhesive film using the same, method for producing the adhesive film, and method of fabricating liquid crystal display
CN110699000A (en) * 2019-10-11 2020-01-17 上海固柯胶带科技有限公司 Film material for grinding and packaging semiconductor

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