JP2001013673A - Layout pattern verifying device, its method, and medium recording its program, layout pattern correcting device, its method and medium recording its program - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a layout pattern verifying device capable of accurately recognizing and verifying a layout pattern. SOLUTION: This layout pattern verifying device includes a search reference edge selection part 23 selecting an edge in the layout pattern, an in-scope edge search part 24 searching another edge within a specified range from the edge selected by the selection part 23, a relative angle filtering part 25 filtering the edge by a relative angle between the edge selected by the selection part 23 and the edge searched by the search part 24, and a flag output part 26 verifying the edge already filtered by the filtering part 25.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for verifying and correcting a layout pattern formed on a mask used in semiconductor manufacturing, and more particularly to a layout pattern verification for verifying a layout pattern having a complicated shape formed on a mask. The present invention relates to an apparatus, a method thereof, and a medium on which a program is recorded, and a layout pattern correction apparatus for correcting a layout pattern having a complicated shape formed on a mask, a method thereof, and a medium on which the program is recorded.

[0002]

2. Description of the Related Art In recent years, with the increasing integration of semiconductor integrated circuits, the necessity of miniaturizing a layout pattern formed on a mask has increased. At present, the design rule of a semiconductor integrated circuit has reached a level of 0.15 μm, which is larger than a light source wavelength of a stepper for transferring the layout pattern on a mask (for example, 0.248 μm when an excimer laser is used). It is getting shorter. Under such circumstances, the resolution of the layout pattern formed on the mask is extremely deteriorated. Therefore, the resolution performance is improved by using a special transfer technology (super-resolution technology) such as a modified illumination technology. Let me.

[0003] However, when the resolution is improved by using these special transfer techniques, there is a problem that the layout pattern is not faithfully reproduced on the mask. Also, in other processes such as an etching process, there is a problem that a dimensional variation of a layout pattern occurs due to a difference in density of the pattern caused by miniaturization of the pattern.

In order to solve these problems, an OPC (Optical Proximid) that transforms a design layout pattern so that a desired layout pattern is formed on a mask.
tyEffect Correction) is widely used. In the following description, OPC refers to not only optics but also general correction of pattern distortion caused by a process.

FIG. 13A is a diagram showing an example of a layout pattern before correction using OPC. Also,
FIG. 13B is a diagram showing a layout pattern after the layout pattern shown in FIG. 13A is corrected by OPC. In general, a layout pattern after correction using OPC is more complicated than a layout pattern before correction using OPC.

FIG. 13B shows a layout pattern when correction is performed using simple OPC. However, when finer correction is performed using OPC, a layout pattern having a more complicated shape and a curved shape is obtained. It is known to be formed. In some cases, a pattern having a complicated shape obtained by a process simulation is processed as a layout pattern.

The layout pattern verification apparatus verifies whether the shape (pattern width, interval between adjacent patterns, and the like) of the layout pattern formed in this way satisfies specified conditions. The layout pattern correction device detects a defect in a layout pattern and corrects the pattern.

FIG. 14 is a block diagram showing a schematic configuration of a conventional layout pattern verification device (layout pattern correction device). The layout pattern verification device (layout pattern correction device) includes an input layout pattern holding unit 101 that holds a layout pattern to be verified, and a command (hereinafter, referred to as a command) for processing the layout pattern held in the input layout pattern holding unit 101. A control command holding unit 102 in which a control command is stored in a batch file format, and an edge serving as a search reference (hereinafter referred to as a search reference edge) from a straight line portion (hereinafter, referred to as an edge) of a contour portion of the layout pattern. ), An edge search unit 104 that searches for another edge from the search criterion edge selected by the search criterion edge selection unit 103 by a method described below, and a search performed by the edge search unit 104. The pattern formed by the edge A flag output unit (or a layout correction unit that corrects a layout pattern when an edge searched by the edge search unit 104 does not satisfy a predetermined condition) and a flag output unit (layout Correction unit) 1
And an output result holding unit 106 for holding the output result of the step S05.

By sequentially executing the control commands stored in the control command storage unit 102, the processing in the search reference edge selection unit 103, the edge search unit 104, and the flag output unit (layout correction unit) 105 is performed. In addition, the flag output unit 105 outputs the edge search unit 104
If the pattern formed by the edges searched for does not satisfy the predetermined condition (it may be the case that the predetermined condition is satisfied), a flag is added to the layout pattern. The output result held in the output result holding unit 106 indicates a log of a flag added to the layout pattern by the flag output unit 105, a log of layout pattern correction by the layout correction unit 105, and the like.

FIG. 15 is a flowchart for explaining the processing procedure of a conventional layout pattern verification device (layout pattern correction device). First, the layout pattern held in the input layout pattern holding unit 101 and the control command held in the control command holding unit 102 are read, and the process is started by executing the control command (S101).

Next, the search reference edge selection unit 103 determines whether or not there is an edge that has not yet been selected as a search reference edge (S102). If there is an edge that has not yet been selected as a search reference edge (S10
2, Yes), the search reference edge selection unit 103 selects the edge as a search reference edge (S103). If there is no edge that has not been selected as a search reference edge (S102, No), step S106 is performed.
The process proceeds to.

Next, the edge search unit 104 searches for another edge based on the search reference edge selected by the search reference edge selection unit 103 (S104). FIG.
FIG. 6 is a diagram showing an edge search range. As illustrated in FIG. 16, a portion between two vertically extending dotted lines starting from both ends of the search reference edge 110 is a search range. The edge search unit 104 outputs an edge included in the search range as a search result.

The flag output unit 105 is provided for the edge search unit 10
If the edge searched in step 4 does not satisfy the predetermined condition (the predetermined condition may be satisfied), a flag is added to this edge part (S105). Alternatively, when the edge searched by the edge search unit 104 does not satisfy the predetermined condition, the layout correction unit 105 corrects the pattern (S105). The flag output unit or the layout correction unit 105 can also perform different verifications or corrections depending on the relative angle of the search edge.

FIG. 17 is a flowchart for explaining an example of the processing procedure of the layout correction unit 105. First, a pattern to be corrected is extracted (S111). By this process, a pattern whose pattern shape (pattern width, interval between adjacent patterns, etc.) does not satisfy the specified condition is extracted.

Next, the layout pattern is divided by referring to the corners of the pattern adjacent to the extracted pattern (S112). For example, when the pattern shown in FIG. 18 is extracted, the patterns 130 and 131 are each divided at a corner portion to be three patterns.

Next, the distance between the edges of the divided pattern is calculated (S113). In the case of the pattern shown in FIG. 18, three distances L between the patterns 131 and 132
1 to L4 are calculated. Then, a pattern to be corrected using OPC is extracted (S114), and the edge of the extracted pattern is shifted according to the OPC table (S115). This OPC table stores shift amounts and the like at the time of correction determined by experiments. Although one method of layout pattern correction using OPC has been described, various documents have been published regarding the correction method using OPC, so please refer to these documents for details.

FIGS. 19A and 19B are diagrams for explaining the search edge relative angle. The search edge relative angle is, as shown in FIG. 19A, a search reference edge 101 and an edge that has been searched from the search reference edge 111 in the direction of the arrow and has entered the search range (hereinafter, referred to as a search target edge). )). FIG.
(A) is a search reference edge 111 and a search target edge 112.
FIG. 17B shows a case where the relative angle between the search reference edge 111 and the search target edge 113 is a predetermined angle. The layout pattern verification unit or the layout pattern correction unit 105 can perform different verifications and perform correction based on the relative angle of the search edge.

In step S102, when there is no search reference edge (S102, No), the flag output unit or the layout correction unit 105 stores the layout pattern after the flag addition or the corrected layout pattern in the output result holding unit 106. This is stored (S106), and the process ends.

[0019]

In the conventional layout pattern verification apparatus or layout pattern correction apparatus 105 described above, it is possible to verify or correct a simple layout pattern as shown in FIG. Was. However, the layout pattern verification device or the layout pattern correction device 105 is, for example, the one shown in FIG.
When verifying or correcting a layout pattern having a complicated shape (shape having a curved portion) as shown in (1), the distance between the left end and the right end must be extracted as the pattern width. There is a problem that the distance is extracted as the pattern width.

When the layout pattern verification device or the layout pattern correction device 105 verifies or corrects the layout pattern shown in FIG. 21, an erroneous search is performed because no search target edge exists within the search range of the search reference edge 120. There was also a problem that the result was output.

Furthermore, when the layout pattern verification device or the layout pattern correction device 105 verifies or corrects the layout pattern shown in FIG. 22, when the search range is searched from the search reference edge 130 in all directions, the search reference edge There is also a problem that the edge 131 or the edge 132 which is a part of the curve including 130 is erroneously output as a search result.

SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and a first object of the present invention is to provide a layout pattern verification apparatus or layout pattern correction apparatus capable of correctly recognizing and verifying or correcting a layout pattern. It is to provide a device.

A second object is to provide a layout pattern verification device or a layout pattern correction device capable of performing high-speed recognition, verification, or correction of a layout pattern.

A third object is to provide a layout pattern verification method or a layout pattern correction method capable of correctly recognizing and verifying or correcting a layout pattern.

A fourth object of the present invention is to provide a layout pattern verification method or a layout pattern correction method capable of recognizing and verifying or correcting a layout pattern at high speed.

A fifth object is to provide a medium recording a layout pattern verification program or a medium recording a layout pattern correction program capable of correctly recognizing and verifying or correcting a layout pattern.

A sixth object of the present invention is to provide a medium on which a layout pattern verification program or a medium on which a layout pattern correction program is recorded, which can perform layout pattern recognition, verification, or correction at high speed.

[0028]

According to a first aspect of the present invention, there is provided a layout pattern verifying apparatus, comprising: an edge selecting unit for selecting an edge in a layout pattern; and a specified range from an edge selected by the edge selecting unit. Edge search means for searching for other edges within, filtering means for filtering edges by the relative angle between the edge selected by the edge selection means and the edge searched by the edge search means, filtering Verification means for verifying the edges after being filtered by the means.

Since the filtering means filters edges based on the relative angle between the edge selected by the edge selection means and the edge searched by the edge search means, erroneous recognition of a pattern due to, for example, search for an adjacent edge is performed. This can be prevented.

According to a second aspect of the present invention, there is provided the layout pattern verifying apparatus according to the first aspect, wherein the edge searching means starts at both ends of the edge selected by the edge selecting means, Means for searching for an edge in a range sandwiched by a straight line having a predetermined angle with the selected edge is included.

The edge search means searches for an edge in a range sandwiched by a straight line having a predetermined angle with the edge selected by the edge selection means, starting from both ends of the edge selected by the edge selection means. In addition to the effect of the layout pattern verification device of item 1, the processing speed can be further improved.

According to a third aspect of the present invention, there is provided the layout pattern verifying apparatus according to the first aspect, wherein the edge searching means has both ends of the edge selected by the edge selecting means extended by a predetermined distance. Means for searching for an edge in a range between a point as a starting point and a straight line perpendicular to the edge selected by the edge selecting means is included.

[0033] The edge search means starts at both points where both ends of the edge selected by the edge selection means are extended by a predetermined distance, and has an edge in a range sandwiched by a straight line perpendicular to the edge selected by the edge selection means. Is searched, so that the processing speed can be further improved in addition to the effect of the layout pattern verification device of the first aspect.

A layout pattern verification apparatus according to a fourth aspect is the layout pattern verification apparatus according to any one of the first to third aspects, wherein the layout pattern verification apparatus further includes an edge and an edge selected by the edge selection means. An edge length filtering unit for filtering the edge when the edge searched by the searching unit is a predetermined length or less is included.

When the edge selected by the edge selecting means and the edge searched by the edge searching means are shorter than a predetermined length, the edge length filtering means filters the edges, so that the number of edges to be searched can be reduced. This makes it possible to increase the processing speed.

A layout pattern verification apparatus according to a fifth aspect is the layout pattern verification apparatus according to any one of the first to fourth aspects, wherein the filtering means includes an edge vector and an edge search selected by the edge selection means. Means for filtering edges by relative angles based on a vector of edges searched by the means.

The filtering means filters edges by a relative angle based on the vector of the edge selected by the edge selecting means and the vector of the edge searched by the edge searching means, so that a pattern can be recognized with higher accuracy. .

According to a sixth aspect of the present invention, there is provided a layout pattern verifying apparatus for selecting an edge in a layout pattern and searching for an edge in the same polygon as the edge selected by the edge selecting means. Edge searching means for calculating the curvature from the edges searched by the same polygon edge searching means for classifying edges, and the edges classified by the curvature calculating means Verification means for verifying the edge based on the

Since the curvature calculating means calculates the curvature from the edges searched by the same polygon inside edge searching means and classifies the edges, it is possible to make only the pattern portion close to a straight line the object of verification, and The time required for pattern verification can be reduced.

According to a seventh aspect of the present invention, there is provided a layout pattern correction device, comprising: an edge selecting means for selecting an edge in the layout pattern; and another edge within a specified range from the edge selected by the edge selecting means. An edge search means for searching for the edge, a filtering means for filtering the edge according to a relative angle between the edge selected by the edge selection means and the edge searched for by the edge search means, and after being filtered by the filtering means. Correction means for correcting the edge of

Since the filtering means filters edges according to the relative angle between the edge selected by the edge selection means and the edge searched by the edge search means, erroneous recognition of a pattern due to a search for an adjacent edge or the like is performed. This can be prevented.

According to an eighth aspect of the present invention, there is provided the layout pattern correcting apparatus according to the seventh aspect, wherein the edge searching means sets both ends of the edge selected by the edge selecting means as starting points, Means for searching for an edge in a range sandwiched by a straight line having a predetermined angle with the selected edge is included.

The edge searching means searches for an edge in a range sandwiched by a straight line having a predetermined angle with the edge selected by the edge selecting means, starting from both ends of the edge selected by the edge selecting means. In addition to the effect of the layout pattern correction device of item 7, the processing speed can be further improved.

According to a ninth aspect of the present invention, there is provided a layout pattern correcting apparatus according to the seventh aspect, wherein the edge searching means has both ends of the edge selected by the edge selecting means extended by a predetermined distance. Means for searching for an edge in a range between a point as a starting point and a straight line perpendicular to the edge selected by the edge selecting means is included.

[0045] The edge searching means starts at the two points where both ends of the edge selected by the edge selecting means are extended by a predetermined distance, and selects an edge in a range sandwiched by a straight line perpendicular to the edge selected by the edge selecting means. Is searched, so that the processing speed can be further improved in addition to the effect of the layout pattern correction device of the seventh aspect.

A layout pattern correction apparatus according to a tenth aspect is the layout pattern correction apparatus according to any one of the seventh to ninth aspects, wherein the layout pattern correction apparatus further includes an edge and an edge selected by the edge selection means. An edge length filtering unit for filtering the edge when the edge searched by the searching unit is a predetermined length or less is included.

If the edge selected by the edge selecting means and the edge searched by the edge searching means are shorter than a predetermined length, the edge length filtering means filters the edges. This makes it possible to increase the processing speed.

According to a eleventh aspect of the present invention, there is provided a layout pattern correcting apparatus according to any one of the seventh to tenth aspects, wherein the filtering means searches for an edge vector and an edge selected by the edge selecting means. Means for filtering edges by relative angles based on a vector of edges searched by the means.

The filtering means filters edges by a relative angle based on the vector of the edge selected by the edge selecting means and the vector of the edge searched by the edge searching means, so that a pattern can be recognized with higher accuracy. .

According to a twelfth aspect of the present invention, there is provided a layout pattern correcting apparatus for selecting an edge in a layout pattern and searching for an edge in the same polygon as the edge selected by the edge selecting means. Edge searching means for calculating the curvature from the edges searched by the same polygon edge searching means for classifying edges, and the edges classified by the curvature calculating means And a correction unit for correcting the edge based on the

Since the curvature calculation means calculates the curvature from the edges searched by the same polygon inside edge search means and classifies the edges, it becomes possible to correct only a pattern portion close to a straight line, and to lay out the layout. The time required for pattern correction can be reduced.

A layout pattern verification method according to a thirteenth aspect includes the steps of: selecting an edge in the layout pattern; and searching for another edge within a specified range from the selected edge. Filtering the edges according to the relative angle between the selected edges and the searched edges, and verifying the filtered edges.

Since the edges are filtered based on the relative angle between the selected edge and the searched edge, it is possible to prevent erroneous recognition of the pattern due to a search for an adjacent edge.

A layout pattern verification method according to a fourteenth aspect of the present invention provides a layout pattern verification method comprising the steps of: selecting an edge in a layout pattern; searching for an edge in the same polygon as the selected edge; Calculating the curvature to classify the edges; and verifying the edges based on the classified edges.

Since an edge within the same polygon as the selected edge is searched, and the curvature is calculated from the searched edge to classify the edge, only the pattern portion close to a straight line can be verified. Thus, the time required for verifying the layout pattern can be reduced.

In the layout pattern correcting method according to the present invention, a step of selecting an edge in the layout pattern and a step of searching for another edge within a specified range from the selected edge are selected. Filtering the edges according to the relative angle between the detected edges and the searched edges, and correcting the filtered edges.

Since edges are filtered based on the relative angle between the selected edge and the searched edge, it is possible to prevent erroneous recognition of a pattern due to a search for an adjacent edge.

In the layout pattern correcting method according to the present invention, the step of selecting an edge in the layout pattern, the step of searching for an edge in the same polygon as the selected edge, and the step of Calculating a curvature to classify the edge; and correcting the edge based on the classified edge.

Since the edges are classified by calculating the curvature from the searched edges, it is possible to correct only the pattern portion close to a straight line, and it is possible to reduce the time required for correcting the layout pattern. .

According to a seventeenth aspect of the present invention, a layout pattern verification program recorded on a medium has a step of selecting an edge in a layout pattern and searching for another edge within a specified range from the selected edge. And filtering the edges according to the relative angle between the selected edge and the searched edge, and verifying the filtered edges.

Since the edges are filtered based on the relative angle between the selected edge and the searched edge, it is possible to prevent erroneous recognition of the pattern due to a search for an adjacent edge.

A layout pattern verification program recorded on a medium according to claim 18 includes a step of selecting an edge in the layout pattern, and a step of searching for an edge in the same polygon as the selected edge. Calculating a curvature from the searched edges to classify the edges; and verifying the edges based on the classified edges.

Since an edge within the same polygon as the selected edge is searched, and the curvature is calculated from the searched edge to classify the edge, only a pattern portion close to a straight line can be verified. Thus, the time required for verifying the layout pattern can be reduced.

According to a nineteenth aspect of the present invention, a layout pattern correction program recorded on a medium includes a step of selecting an edge in a layout pattern and searching for another edge within a specified range from the selected edge. And filtering the edges according to the relative angle between the selected edge and the searched edge, and correcting the filtered edges.

Since edges are filtered based on the relative angle between the selected edge and the searched edge, it is possible to prevent erroneous recognition of a pattern due to a search for an adjacent edge.

A layout pattern correction program recorded on a medium according to claim 20 includes a step of selecting an edge in the layout pattern, and a step of searching for an edge in the same polygon as the selected edge. Calculating a curvature from the searched edges to classify the edges; and correcting the edges based on the classified edges.

Since the edges are classified by calculating the curvature from the searched edges, it is possible to correct only a pattern portion close to a straight line, and it is possible to reduce the time required for correcting the layout pattern. .

[0068]

FIG. 1 is a diagram showing an example of the appearance of a layout pattern verification device and a layout pattern correction device according to the present invention. The layout pattern verification device and the layout pattern correction device include a computer main body 1,
Graphic display device 2, magnetic tape device 3 on which magnetic tape 4 is mounted, keyboard 5, mouse 6, C
It includes a CD-ROM device 7 on which a D-ROM (Compact Disc-Read Only Memory) 8 is mounted, and a communication modem 9. The layout pattern verification program or the layout pattern correction program is executed by the magnetic tape 4 or C
It is supplied by a storage medium such as a D-ROM 8. The layout pattern verification program or the layout pattern correction program is executed by the computer main body 1, and the operator operates the keyboard 5 or the mouse 6 while watching the graphic display device 2 to verify or correct the layout pattern. Further, the layout pattern verification program or the layout pattern correction program may be supplied to the computer main body 1 from another computer via a communication line and a communication modem 9.

FIG. 2 is a block diagram showing a configuration example of a layout pattern verification device and a layout pattern correction device according to the present invention. The computer main body 1 shown in FIG.
CPU 10, ROM (Read Only Memory) 11, RA
An M (Random Access Memory) 12 and a hard disk 13 are included. The CPU 10 includes a graphic display device 2, a magnetic tape device 3, a keyboard 5, a mouse 6, a CD-ROM device 7, a communication modem 9, a ROM 11,
Processing is performed while inputting and outputting data to and from the RAM 12 or the hard disk 13. Magnetic tape 4 or CD-
The layout pattern verification program or the layout pattern correction program recorded in the ROM 8 is executed by the CPU.
10, a magnetic tape device 3 or a CD-ROM device 7
Via the hard disk 13 once. CPU
Reference numeral 10 verifies or corrects the layout pattern by loading the RAM 12 with a layout pattern verification program or a layout pattern correction program from the hard disk 13 as appropriate.

The layout pattern verification device and the layout pattern correction device in each embodiment will be described below. The external appearance of the layout pattern verification device and the layout correction device shown in FIG. 1 and the layout pattern verification device and the layout correction device shown in FIG. The schematic configuration with the layout pattern correction device is common in each embodiment. Note that the layout pattern verification device and the layout pattern correction device are different only in that correction is performed when a layout pattern including a searched edge does not satisfy a predetermined condition or that correction is not performed. Will be described together. Embodiment 1 FIG. 3 is a block diagram showing a schematic configuration of a layout pattern verification device and a layout pattern correction device according to Embodiment 1 of the present invention. The layout pattern verification device and the layout pattern correction device include an input layout pattern holding unit 21 for holding a layout pattern to be verified, and a command for processing the layout pattern held in the input layout pattern holding unit 21 in a batch file format. , A search reference edge selection unit 23 for selecting a search reference edge from the edges of the layout pattern, and a search reference edge selected by the search reference edge selection unit , An in-scope edge search unit 24 for searching for an edge of the search, a relative angle filtering unit 25 for filtering the edge searched by the in-scope edge search unit 24 with a search edge relative angle, and filtering by the relative angle filtering unit 25. A flag output unit (or a flag output unit that determines whether the search edge after the search satisfies a predetermined condition) (or a layout pattern when the search edge filtered by the relative angle filtering unit 25 does not satisfy the predetermined condition). A layout correction unit for correcting the data, and an output result holding unit 27 for holding the output result of the flag output unit (layout correction unit).

By sequentially executing the control commands stored in the control command storage unit 22, the search reference edge selection unit 23, the in-scope edge search unit 24, the relative angle filtering unit 25, and the flag output unit (layout correction unit) The process at 26 is performed. Further, the flag output unit 26 determines that the edge after being filtered by the relative angle filtering unit 25 does not satisfy a predetermined condition (may be a case where a predetermined condition is satisfied).
, A flag is added to the layout pattern. Further, the layout pattern correction unit 26 corrects the layout pattern when the edge after being filtered by the relative angle filtering unit 25 does not satisfy a predetermined condition. This correction method is the same as the method described in the related art, and therefore, detailed description will not be repeated. The output result held in the output result holding unit 27 indicates a log of a flag added to the layout pattern by the flag output unit 26, a log of layout pattern correction by the layout correction unit 26, and the like.

The in-scope edge search section 24 can freely set an edge search range. In the conventional layout pattern verification device and the conventional layout pattern correction device, the edge search range is within a range sandwiched by dotted lines extending vertically from both ends of the edge 110 as shown in FIG. The edge search unit 24 can freely set the angle of the dotted line extending from both ends of the edge, and the search range that can be set freely in this way is called a scope.

The relative angle filtering unit 25
This is for filtering edges whose relative angle between the search reference edge and the search target edge is outside a predetermined range. For example, even when the in-scope edge search unit 24 searches for an edge from the search reference edge 130 shown in FIG. 22 and the edges 131 and 132 are searched, the relative angle filtering unit 25 determines that the search edge relative angle is a predetermined value. Edges 131 and 132 can be excluded by filtering out-of-range edges.

FIG. 4 is a flowchart for explaining the processing procedure of the layout pattern verification device and the layout pattern correction device according to the present embodiment. First, the layout pattern held in the input layout pattern holding unit 21 and the control command held in the control command holding unit 22 are read, and the process is started by executing the control command (S1).

Next, the search reference edge selector 23 determines whether or not there is an edge that has not been selected as a search reference edge (S2). If there is an edge not yet selected as a search reference edge (S2, Ye
s) The search reference edge selection unit 23 selects the edge as a search reference edge (S3). If there is no edge not yet selected as the search reference edge (S2, No), the process proceeds to step S7.

Next, the in-scope edge search unit 24 searches for other edges in the scope based on the search reference edge selected by the search reference edge selection unit 23 (S4). The in-scope edge search unit 24 outputs an edge included in the scope as a search result.

Next, the relative angle filtering unit 25
By filtering edges whose search edge relative angle between the edge search reference edge and the edge searched by the in-scope edge search unit 24 is out of a predetermined range,
The edges searched by the in-scope edge search unit 24 are classified (S5).

If the search edge after being filtered by the relative angle filtering unit 25 does not satisfy the predetermined condition, the flag output unit 26 adds a flag to this edge portion (S6). Alternatively, the layout correction unit 26
If the search edge filtered by the relative angle filtering unit 25 does not satisfy the predetermined condition, the pattern is corrected (S6), and step S2 is performed.
Return to

In step S2, when there is no search reference edge (S2, No), the flag output unit or the layout correction unit 26 stores the layout pattern after the flag addition or the corrected layout pattern in the output result holding unit 27. Then, the processing ends. Note that the order of the processing shown in step S4 and the processing shown in step S5 may be changed.

As described above, according to the layout pattern verification device and the layout pattern correction device of the present embodiment, the edge within the scope is searched, and the search edge between the edge search reference edge and the searched edge is searched. Since the edge whose relative angle is out of the predetermined range is filtered, it is possible to prevent problems such as a search for an adjacent edge and an erroneous recognition of a pattern width. (Embodiment 2) A layout pattern verification device and a layout pattern correction device according to a second embodiment of the present invention are similar to the layout pattern verification device and the layout pattern correction device according to the first embodiment shown in FIG. The only difference is that the functions of. Therefore, detailed description of the same configurations and functions will not be repeated. The description will be made assuming that the reference numeral of the in-scope edge search unit in this embodiment is 24 '.

FIG. 5 is a diagram for explaining the search range of the in-scope edge search unit 24 '. As shown in FIG. 5, a range sandwiched between two line segments 32 and 33 whose starting point is the both ends of the search reference edge 31 and whose angle with the search reference edge 31 is θ, and the search reference edge 31. Is specified as the scope.

The processing procedure of the layout pattern verification device and the layout pattern correction device according to the present embodiment is the same as that of FIG. 4 except that step S4 of the processing procedure of the layout pattern verification device and the layout pattern correction device according to the first embodiment is different. Are different. Therefore, detailed description of the overlapping processing procedure will not be repeated. Step S4 in the present embodiment is replaced with step S4.
4 '.

In step S4 ', the in-scope edge search unit 24' searches for an edge in the scope shown in FIG. 5 from the edge selected by the search reference edge selection unit 23. Then, the processing from step S5 is performed on the searched edge.

As described above, according to the layout pattern verification device and the layout pattern correction device in the present embodiment, the angle between the search reference edge and the search reference edge is θ.
In the first embodiment, the search is made for an edge in a range sandwiched between the two line segments, which is, and the search reference edge.
In addition to the effects described in the above, since the time required for calculating the angle is reduced, the processing speed can be increased. (Embodiment 3) A layout pattern verification device and a layout pattern correction device according to a third embodiment of the present invention are similar to the layout pattern verification device and the layout pattern correction device according to the first embodiment shown in FIG. The only difference is that the functions of. Therefore, detailed description of the same configurations and functions will not be repeated. The description will be made assuming that the reference number of the in-scope edge search unit in this embodiment is 24 ″.

FIG. 6 is a diagram for explaining the search range of the in-scope edge search unit 24 ″. As shown in FIG. 6, a point separated from the search reference edge 41 by the specified amount L is set as a starting point. The range sandwiched between the two line segments 42 and 43 perpendicular to the reference edge 41 and the search reference edge 41 is designated as a scope.

The processing procedure of the layout pattern verification device and the layout pattern correction device according to the present embodiment is the same as that of the first embodiment shown in FIG. Are different. Therefore, detailed description of the overlapping processing procedure will not be repeated. Step S4 in the present embodiment is replaced with step S4.
4 ".

In step S 4 ″, the in-scope edge search unit 24 ″ searches for an edge in the scope shown in FIG. 6 from the edge selected by the search reference edge selection unit 23. Then, the processing from step S5 is performed on the searched edge.

As described above, according to the layout pattern verification apparatus and the layout pattern correction apparatus of the present embodiment, a point separated by a specified amount L from both ends of a search reference edge is set as a start point, and is perpendicular to the search reference edge. 2
Since the edge in the range between the line segment and the search reference edge is searched, in addition to the effect described in the first embodiment, the calculation of the angle is not required, so that the processing speed is high. It has become possible to achieve. (Embodiment 4) FIG. 7 is a block diagram showing a schematic configuration of a layout pattern verification apparatus and a layout pattern correction apparatus according to Embodiment 4 of the present invention. The layout pattern correction device and the layout pattern correction device are different from the layout pattern verification device and the layout pattern correction device in the first embodiment shown in FIG. The only difference is that a long filtering unit 51 is added. Therefore, detailed description of the same configurations and functions will not be repeated.

The edge length filtering section 51 detects the lengths of the search reference edge and the search target edge, and changes the subsequent processing according to the lengths. For example, in the case of the layout pattern shown in FIG. 20, the pattern width is the interval between two edges located in the vertical direction. However, since the upper edge and the lower edge of this pattern are parallel, the distance between them may be erroneously recognized as the pattern width. The edge length filtering unit 25 searches only patterns having a certain length, and prevents erroneous recognition by filtering edges having a predetermined length or less, such as edges at the top or bottom of the pattern shown in FIG. It is.

FIG. 8 is a flowchart for explaining the processing procedure of the layout pattern verification device and the layout pattern correction device according to the present embodiment. FIG.
Compared to the flowchart of the first embodiment shown in FIG. 19, the only difference is that step S11 is added between steps S5 and S6. Therefore, detailed description of the overlapping processing procedure will not be repeated.

In step S11, the length of the search target edge is detected, and if this length is equal to or longer than the predetermined length, the flow advances to step S6. If the length of the search target edge is equal to or less than the predetermined length, the search target edge is excluded from the search target (filtering), and the process returns to step S2.

As described above, according to the layout pattern verification device and the layout pattern correction device of the present embodiment, the edge having a predetermined length or less is excluded from the search target. In addition to the effect described above, the processing speed can be increased by reducing the number of search target edges. In addition,
If the above-described processing is performed after performing the smoothing processing (processing in which the angle between adjacent edges is small and combining them into one edge to approximate with a straight line) on the layout pattern, further prevention and processing of erroneous recognition can be achieved. This is effective in increasing the speed. (Fifth Embodiment) FIG. 9 is a block diagram showing a schematic configuration of a layout pattern verification device and a layout pattern correction device according to a fifth embodiment of the present invention. Compared with the layout pattern verification device and the layout pattern correction device according to the first embodiment shown in FIG. 3, the in-scope edge search unit 24 and the relative angle filtering unit 25 include the same polygon edge search unit 61 and the curvature calculation unit. Only the point replaced by 62 is different. Therefore, detailed description of the same configurations and functions will not be repeated.

The same polygon inside edge search section 61 searches for another edge from the search reference edge selected by the search reference edge selection section 23 to find an edge in the same polygon as the search reference edge. To detect. Further, the curvature calculation unit 62 calculates the curvature from the edge searched by the same polygon edge search unit 61 and classifies the edge into a concave portion, a convex portion, a portion close to a straight line, or the like.

FIG. 10 is a flowchart for explaining the processing procedure of the layout pattern verification device and the layout pattern correction device according to the present embodiment. Compared to the processing procedure of the layout pattern verification device and the layout pattern correction device in the first embodiment shown in FIG. 4, only the difference is that steps S4 and S5 are replaced with steps S21 and S22. Therefore, detailed description of the overlapping processing procedure will not be repeated.

In step S21, the same polygon inside edge search unit 61 searches the search reference edge selected by the search reference edge selection unit 23 for another edge.
An edge within the same polygon as the search reference edge is detected (S21). Then, the same polygon inside edge search unit 61
The curvature is calculated from the edge detected by the above, and the edge is classified into a concave portion, a convex portion, a portion close to a straight line, or the like (S22). Of the edges classified in this way, only a pattern portion close to a straight line is subjected to pattern verification or pattern correction.

As described above, according to the layout pattern verifying apparatus and the layout pattern correcting apparatus of the present embodiment, only the pattern portion close to a straight line is to be verified or corrected, whereby the fourth embodiment is performed. It is possible to recognize pattern widths and the like with higher accuracy than the layout pattern verification device and the layout pattern correction device in the above. (Embodiment 6) The layout pattern verification apparatus and the layout pattern correction apparatus according to the sixth embodiment of the present invention function as a relative angle filtering unit of the layout pattern verification apparatus and the layout pattern correction apparatus according to the first embodiment shown in FIG. Are different only in that they differ.
Therefore, detailed description of the same configurations and functions will not be repeated. Note that the description will be made assuming that the reference numeral of the relative angle filtering unit is 25 '.

The relative angle filtering unit 25 'treats the edges of the layout pattern as vectors, not as line segments, and filters the edges to be searched.
The edge of the layout pattern is represented as a vector in which the layout pattern is clockwise (the same applies to a counterclockwise rotation), and the information is stored in the input layout pattern storage unit 21. For example, when there is a layout pattern as shown in FIG. 11, in the layout pattern verification device and the layout pattern correction device according to the first embodiment, edges 72 and 73 searched from search reference edge 71 are treated as line segments. . FIG. 12A is a diagram in which only the edges 72 and 73 are extracted and drawn.

As can be seen from FIG. 12A, since the relative angles of the search reference edge 71 and the edges 72 and 73 are the same, it is determined whether the line segments 72 and 73 are on the same curve as the search edge 71. Is difficult to determine. However, as shown in FIG.
Is represented by a vector, the relative angle (the direction of the edge) can be accurately determined by comparison with the vector of the search reference edge 71.
1 is on the same curve as that of the search reference edge 7
1 can easily be recognized as not being on the same curve.

The processing procedure of the layout pattern verification device and the layout pattern correction device according to the present embodiment is the same as that of the layout pattern verification device and the layout pattern correction device shown in FIG.
The only difference is that the processing of No. 5 is different. Therefore, detailed description of the overlapping processing procedure will not be repeated. The processing procedure of step S5 will be described as step S5 '.

In step S5 ', the relative angle filtering section 25' filters the edge whose search angle relative angle between the search reference edge and the edge searched by the in-scope edge search section 24 is out of the predetermined range. The edges searched by the in-scope edge searching unit 24 are classified (S5). Then, based on the edge classification result, the processing after step S6 is performed.

As described above, according to the layout pattern verification device and the layout pattern correction device of the present embodiment, the edges of the layout pattern are represented by vectors, so that the relative angle between the edges can be more accurately determined. This makes it possible to detect the pattern width more accurately, and to improve the processing speed.

The embodiments disclosed this time are to be considered in all respects as illustrative and not restrictive. The scope of the present invention is defined by the terms of the claims, rather than the description above, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims.

[0103]

According to the layout pattern verifying apparatus of the first aspect, the filtering means filters edges according to a relative angle between the edge selected by the edge selecting means and the edge searched by the edge searching means. Therefore, it is possible to prevent a pattern from being erroneously recognized due to a search for an adjacent edge.

According to the layout pattern verifying device of the present invention, the edge searching means starts at both ends of the edge selected by the edge selecting means and has a predetermined angle with the edge selected by the edge selecting means. Since the edge in the range sandwiched by the straight lines is searched, it is possible to further improve the processing speed in addition to the effect of the layout pattern verification device of the first aspect.

According to the layout pattern verifying apparatus of the third aspect, the edge searching means starts at the two points where both ends of the edge selected by the edge selecting means are extended by a predetermined distance, and selects the two points by the edge selecting means. Since an edge in a range sandwiched by a straight line perpendicular to the selected edge is searched, it is possible to further improve the processing speed in addition to the effect of the layout pattern verification device of the first aspect.

According to the layout pattern verifying device of the fourth aspect, the edge length filtering means determines whether the edge selected by the edge selecting means and the edge searched by the edge searching means are equal to or less than a predetermined length. Since the edges are filtered, the number of edges to be searched can be reduced, and the processing speed can be increased.

According to the layout pattern verification apparatus of the fifth aspect, the filtering means filters the edges by a relative angle based on the edge vector selected by the edge selection means and the edge vector searched by the edge search means. This makes it possible to recognize patterns with higher accuracy.

According to the layout pattern verifying device of the present invention, the curvature calculating means calculates the curvature from the edges searched by the edge within the same polygon and classifies the edges, so that the curvature is close to a straight line. Only the pattern portion can be targeted for verification, and the time required for layout pattern verification can be reduced.

According to the layout pattern correcting apparatus of the present invention, the filtering means filters the edges based on the relative angle between the edge selected by the edge selecting means and the edge searched by the edge searching means. This makes it possible to prevent erroneous recognition of a pattern due to a search for an adjacent edge.

According to the layout pattern correcting apparatus of the present invention, the edge searching means starts at both ends of the edge selected by the edge selecting means and has a predetermined angle with the edge selected by the edge selecting means. Since the edge in the range sandwiched by the straight lines is searched, it is possible to further improve the processing speed in addition to the effect of the layout pattern correction device according to the seventh aspect.

According to the layout pattern correcting apparatus of the ninth aspect, the edge search means starts at both points where both ends of the edge selected by the edge selection means are extended by a predetermined distance, and the edge selection means selects the two points. Since an edge in a range sandwiched by a straight line perpendicular to the selected edge is searched for, the processing speed can be further improved in addition to the effect of the layout pattern correction device of the seventh aspect.

According to the layout pattern correction apparatus of the tenth aspect, the edge length filtering means determines whether the edge selected by the edge selection means and the edge searched by the edge search means are equal to or less than a predetermined length. Since the edges are filtered, the number of edges to be searched can be reduced, and the processing speed can be increased.

According to the layout pattern correcting apparatus of the eleventh aspect, the filtering means filters the edge by a relative angle based on the edge vector selected by the edge selecting means and the edge vector searched by the edge searching means. This makes it possible to recognize patterns with higher accuracy.

According to the layout pattern correcting apparatus of the twelfth aspect, since the curvature calculating means calculates the curvature from the edges searched by the edge searching means within the same polygon and classifies the edges, it is close to a straight line. Only the pattern portion can be targeted for correction, and the time required for correcting the layout pattern can be reduced.

According to the layout pattern verifying method of the thirteenth aspect, the edges are filtered based on the relative angle between the selected edge and the searched edge. It has become possible to prevent recognition.

According to the layout pattern verification method of the present invention, an edge within the same polygon as the selected edge is searched, and the edge is classified by calculating a curvature from the searched edge. Only a pattern portion close to a straight line can be targeted for verification, and the time required for layout pattern verification can be reduced.

According to the layout pattern correcting method of the present invention, the edges are filtered based on the relative angle between the selected edge and the searched edge. It has become possible to prevent recognition.

According to the layout pattern correcting method of the present invention, since the curvature is calculated from the searched edges to classify the edges, it is possible to correct only a pattern portion close to a straight line, and The time required for pattern correction can be reduced.

According to the layout pattern verification program recorded on the medium according to the seventeenth aspect, the edges are filtered by the relative angle between the selected edge and the searched edge, so that the adjacent edge is searched. This makes it possible to prevent erroneous recognition of the pattern due to the above-mentioned factors.

According to the layout pattern verification program recorded on the medium according to the eighteenth aspect, an edge within the same polygon as the selected edge is searched, and a curvature is calculated from the searched edge. Therefore, only the pattern portion close to a straight line can be targeted for verification, and the time required for layout pattern verification can be reduced.

According to the layout pattern correction program recorded on the medium according to the nineteenth aspect, an edge is filtered by a relative angle between the selected edge and the searched edge, so that an adjacent edge is searched. This makes it possible to prevent erroneous recognition of the pattern due to the above-mentioned factors.

According to the layout pattern correction program recorded on the medium according to the twentieth aspect, since the curvature is calculated from the searched edge to classify the edge, only the pattern portion close to a straight line is to be corrected. And the time required for correcting the layout pattern can be reduced.

[Brief description of the drawings]

FIG. 1 is a diagram showing an example of the appearance of a layout pattern verification device and a layout pattern correction device according to the present invention.

FIG. 2 is a block diagram illustrating a configuration example of a layout pattern verification device and a layout pattern correction device according to the present invention.

FIG. 3 is a block diagram illustrating a schematic configuration of a layout pattern verification device and a layout pattern correction device according to the first embodiment of the present invention.

FIG. 4 is a flowchart illustrating a processing procedure of a layout pattern verification device and a layout pattern correction device according to the first embodiment of the present invention.

FIG. 5 is a diagram for explaining a search range of an in-scope edge search unit 24 ′.

FIG. 6 is a diagram for explaining a search range of an in-scope edge search unit 24 ″.

FIG. 7 is a block diagram illustrating a schematic configuration of a layout pattern verification device and a layout pattern correction device according to a fourth embodiment of the present invention.

FIG. 8 is a flowchart illustrating a processing procedure of a layout pattern verification device and a layout pattern correction device according to a fourth embodiment of the present invention.

FIG. 9 is a block diagram illustrating a schematic configuration of a layout pattern verification device and a layout pattern correction device according to a fifth embodiment of the present invention.

FIG. 10 is a flowchart illustrating a processing procedure of a layout pattern verification device and a layout pattern correction device according to a fifth embodiment of the present invention.

FIG. 11 is a diagram illustrating an example of a layout pattern.

FIG. 12 is a diagram in which edges of the layout pattern shown in FIG. 11 are extracted and drawn.

FIG. 13 is a diagram showing a layout pattern before correction by OPC and a layout pattern after correction by OPC.

FIG. 14 is a block diagram showing a schematic configuration of a conventional layout pattern verification device (layout pattern correction device).

FIG. 15 is a flowchart illustrating a processing procedure of a conventional layout pattern verification device (layout pattern correction device).

FIG. 16 is a diagram for explaining a conventional edge search range.

17 is a flowchart illustrating a processing procedure of a layout correction unit 105. FIG.

FIG. 18 is a diagram for explaining a conventional layout pattern correction.

FIG. 19 is a diagram for describing a search edge relative angle.

FIG. 20 is a diagram illustrating an example of a complicated layout pattern.

FIG. 21 is a diagram (part 1) illustrating an example of a layout pattern that is not correctly searched;

FIG. 22 is a diagram (part 2) illustrating an example of a layout pattern that is not correctly searched;

[Explanation of symbols]

1 Computer main body, 2 Graphic display device, 3 Magnetic tape device, 4 Magnetic tape, 5 Keyboard, 6 Mouse, 7 CD-ROM device, 8 CD
-ROM, 9 communication modem, 10 CPU, 11 RO
M, 12 RAM, 13 hard disk, 21, 10
1 input layout pattern storage unit, 22, 102 control command storage unit, 23, 104 search reference edge selection unit, 24 in-scope edge search unit, 25 relative angle filtering unit, 26, 105 flag output unit / layout correction unit, 27 output Result holding unit, 51 Edge length filtering unit, 61 Edge search unit within the same polygon, 62
Curvature calculation unit, 104 edge search unit.

Claims (20)

[Claims] 1. An edge selecting means for selecting an edge in a layout pattern, and an edge searching means for searching for another edge within a specified range from the edge selected by the edge selecting means. Filtering means for filtering an edge according to a relative angle between the edge selected by the edge selecting means and the edge searched by the edge searching means; and verifying the edge after being filtered by the filtering means. Layout pattern verification apparatus including a verification means. 2. The method according to claim 1, wherein the edge searching unit sets a start point at both ends of the edge selected by the edge selecting unit, and determines an edge in a range sandwiched by a straight line having a predetermined angle with the edge selected by the edge selecting unit. The layout pattern verification apparatus according to claim 1, further comprising a search unit. 3. The edge search means starts at both points where both ends of the edge selected by the edge selection means are extended by a predetermined distance, and is sandwiched between straight lines perpendicular to the edges selected by the edge selection means. 2. The layout pattern verification apparatus according to claim 1, further comprising: means for searching for an edge in a specified range. 4. The layout pattern verification apparatus further comprises: an edge for filtering the edge selected by the edge selection means and the edge searched by the edge search means when the length is equal to or less than a predetermined length. 2. The method of claim 1, further comprising a long filtering means.
4. The layout pattern verification device according to any one of claims 3 to 3. 5. The apparatus according to claim 1, wherein the filtering means includes means for filtering edges by a relative angle based on a vector of the edge selected by the edge selecting means and a vector of the edge searched by the edge searching means. A layout pattern verification apparatus according to any one of claims 1 to 4. 6. An edge selecting means for selecting an edge in the layout pattern, and an edge search in the same polygon for searching for an edge in the same polygon as the edge selected by the edge selecting means. Means, a curvature calculating means for calculating a curvature from the edges searched by the same polygon inside edge searching means and classifying the edges, and verifying the edge based on the edges classified by the curvature calculating means. And a verification means for verifying the layout pattern. 7. An edge selection means for selecting an edge in a layout pattern, and an edge search means for searching for another edge within a specified range from the edge selected by the edge selection means. Filtering means for filtering an edge according to a relative angle between the edge selected by the edge selecting means and the edge searched by the edge searching means; and correcting the edge after being filtered by the filtering means. A layout pattern correction apparatus including a correction unit. 8. The edge search means starts from both ends of the edge selected by the edge selection means, and determines an edge in a range sandwiched by a straight line having a predetermined angle with the edge selected by the edge selection means. The layout pattern correction apparatus according to claim 7, further comprising a search unit. 9. The edge searching means starts from both points where both ends of the edge selected by the edge selecting means are extended by a predetermined distance, and is sandwiched by a straight line perpendicular to the edge selected by the edge selecting means. 8. The layout pattern correction apparatus according to claim 7, further comprising means for searching for an edge in a specified range. 10. The layout pattern correction apparatus further comprises: an edge for filtering the edge selected by the edge selection means and the edge searched by the edge search means when the length is equal to or less than a predetermined length. The layout pattern correction device according to claim 7, further comprising a long filtering unit. 11. The filtering means includes means for filtering edges by a relative angle based on a vector of the edge selected by the edge selecting means and an edge vector searched by the edge searching means. The layout pattern correction device according to any one of 7 to 10. 12. An edge selecting means for selecting an edge in a layout pattern, and an edge search in the same polygon for searching for an edge in the same polygon as the edge selected by the edge selecting means. Means, a curvature calculating means for calculating a curvature from the edges searched by the same polygon inside edge searching means and classifying the edges, and correcting the edges based on the edges classified by the curvature calculating means. A layout pattern correction apparatus including a correction unit for performing the correction. 13. A step of selecting an edge in a layout pattern; a step of searching for another edge within a specified range from the selected edge; and selecting the selected edge and the searched edge. A layout pattern verification method, comprising: filtering an edge according to a relative angle between; and verifying the edge after the filtering. 14. A step of selecting an edge in the layout pattern, a step of searching for an edge in the same polygon as the selected edge, and calculating a curvature from the searched edge to classify the edge. And a step of verifying the edge based on the classified edge. 15. A step of selecting an edge in a layout pattern; a step of searching for another edge within a specified range from the selected edge; and a step of selecting the selected edge and the searched edge. A layout pattern correction method, comprising: filtering edges according to a relative angle between; and correcting the edges after the filtering. 16. A step of selecting an edge in the layout pattern, a step of searching for an edge in the same polygon as the selected edge, and calculating a curvature from the searched edge to classify the edge. And a step of correcting an edge based on the classified edge. 17. Selecting an edge in a layout pattern; searching for another edge within a specified range from the selected edge; and selecting the selected edge and the searched edge. A computer-readable recording medium recording a layout pattern verification program, comprising: a step of filtering edges according to a relative angle between; and a step of verifying the edges after the filtering. 18. A step of selecting an edge in a layout pattern, a step of searching for an edge in the same polygon as the selected edge, and calculating a curvature from the searched edge to classify the edge. And a computer-readable recording medium storing a layout pattern verification program, the method including: verifying an edge based on the classified edge. 19. A step of selecting an edge in a layout pattern; a step of searching for another edge within a specified range from the selected edge; and selecting the selected edge and the searched edge. A computer-readable recording medium recording a layout pattern correction program, comprising: a step of filtering an edge according to a relative angle between; and a step of correcting the edge after the filtering. 20. selecting an edge in the layout pattern; searching for an edge in the same polygon as the selected edge; calculating a curvature from the searched edge to classify the edge; And a computer-readable recording medium that records a layout pattern correction program, the method including: correcting the edge based on the classified edge.