JP2001007020A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2001007020A5 JP2001007020A5 JP2000158941A JP2000158941A JP2001007020A5 JP 2001007020 A5 JP2001007020 A5 JP 2001007020A5 JP 2000158941 A JP2000158941 A JP 2000158941A JP 2000158941 A JP2000158941 A JP 2000158941A JP 2001007020 A5 JP2001007020 A5 JP 2001007020A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000158941A JP2001007020A (en) | 2000-01-01 | 2000-05-29 | Exposure method and aligner |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000158941A JP2001007020A (en) | 2000-01-01 | 2000-05-29 | Exposure method and aligner |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP09304232A Division JP3101594B2 (en) | 1997-11-06 | 1997-11-06 | Exposure method and exposure apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001007020A JP2001007020A (en) | 2001-01-12 |
| JP2001007020A5 true JP2001007020A5 (en) | 2005-07-07 |
Family
ID=18663340
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000158941A Pending JP2001007020A (en) | 2000-01-01 | 2000-05-29 | Exposure method and aligner |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001007020A (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7242464B2 (en) | 1999-06-24 | 2007-07-10 | Asml Holdings N.V. | Method for characterizing optical systems using holographic reticles |
| US6934038B2 (en) | 2000-02-15 | 2005-08-23 | Asml Holding N.V. | Method for optical system coherence testing |
| US7751030B2 (en) | 2005-02-01 | 2010-07-06 | Asml Holding N.V. | Interferometric lithographic projection apparatus |
| US7440078B2 (en) | 2005-12-20 | 2008-10-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units |
| US7561252B2 (en) | 2005-12-29 | 2009-07-14 | Asml Holding N.V. | Interferometric lithography system and method used to generate equal path lengths of interfering beams |
| US8264667B2 (en) | 2006-05-04 | 2012-09-11 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method using interferometric and other exposure |
| US8934084B2 (en) | 2006-05-31 | 2015-01-13 | Asml Holding N.V. | System and method for printing interference patterns having a pitch in a lithography system |
| US7443514B2 (en) | 2006-10-02 | 2008-10-28 | Asml Holding N.V. | Diffractive null corrector employing a spatial light modulator |
| KR101002156B1 (en) | 2008-03-31 | 2010-12-17 | 다이니폰 스크린 세이조우 가부시키가이샤 | Pattern drawing apparatus and pattern drawing method |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62279628A (en) * | 1986-05-28 | 1987-12-04 | Hitachi Ltd | Formation of resist film |
| JPH01134919A (en) * | 1987-11-19 | 1989-05-26 | Nec Corp | Optical stepper |
| JPH04287908A (en) * | 1990-10-03 | 1992-10-13 | Fujitsu Ltd | Aligner and exposure method |
| JPH04355910A (en) * | 1991-02-27 | 1992-12-09 | Nikon Corp | Mask and exposure method and aligner |
| JP2505952B2 (en) * | 1992-04-17 | 1996-06-12 | キヤノン株式会社 | Semiconductor manufacturing equipment |
| JP3202393B2 (en) * | 1993-03-19 | 2001-08-27 | 富士通株式会社 | Method for manufacturing semiconductor device |
| JPH07192988A (en) * | 1993-12-27 | 1995-07-28 | Nikon Corp | Illumination optical apparatus |
| JPH07226362A (en) * | 1994-02-10 | 1995-08-22 | Ricoh Co Ltd | Method of forming photoresist pattern |
| JP3050178B2 (en) * | 1997-08-20 | 2000-06-12 | 日本電気株式会社 | Exposure method and exposure mask |
-
2000
- 2000-05-29 JP JP2000158941A patent/JP2001007020A/en active Pending