JP2001004339A5 - Lighting unevenness measurement method and measuring device - Google Patents

Description

[Claims]
[Claim 1]
The measurement object is irradiated with light, and the measurement object is imaged while the imaging means having a plurality of image pickup elements arranged in a line is relatively moved with respect to the measurement object in the arrangement direction of the image pickup elements.
After saving a plurality of data obtained by the imaging,
An illumination unevenness measuring method , characterized in that the illuminance distribution in the array direction in each of the stored data is obtained, and the variation in illuminance is obtained based on each of the illuminance distributions .
2.
The object to be measured has a portion to be measured that is smaller than the size of the image pickup means in the arrangement direction of the image pickup elements.
The lighting unevenness measuring method according to claim 1, wherein the lighting unevenness is measured.
3.
The object to be measured is imaged at each distance between the centers of adjacent image sensors arranged at equal pitches in a line.
To store at least the number of image sensors in the data obtained by the image pickup.
The lighting unevenness measuring method according to claim 1 or 2, wherein the lighting unevenness is measured.
4.
Lighting equipment and
An image pickup means having an image pickup element arranged in a line and fixed to the lighting device,
A moving means for moving the image pickup means in the array direction of the image pickup element, and
An illumination unevenness measuring device including a processing means for processing data obtained by the imaging means.
5.
Lighting equipment and
An image pickup means having an image pickup element arranged in a line and fixed to the lighting device,
A moving means for moving the image pickup means in the array direction of the image pickup element, and
A defect inspection apparatus comprising: a processing means for processing data obtained by the imaging means.

[0001]
[Technical field to which the invention belongs]
The present invention is based on, for example, image data captured by a line sensor camera, such as the quality of the circuit pattern shape of a printed circuit board, the quality of the width of a transparent electrode formed on a plasma display panel, and the presence or absence of chipping. The present invention relates to a method for measuring unevenness of lighting of a lighting device and a device for measuring unevenness of lighting in an image recognition inspection system for inspection by recognition processing.

Therefore, the present invention has been made to solve the above-mentioned conventional problems, and is used to illuminate an illuminating device in an image recognition inspection system having a reflected illuminating system that captures the reflected light from an imaging target as an input image into a line sensor camera. It is an object of the present invention to provide a lighting unevenness measuring method and a lighting unevenness measuring device capable of accurately measuring unevenness.

0009
[Means for solving problems]
In order to achieve the above object, the present invention irradiates an object to be measured with light, and an imaging means having a plurality of imaging elements arranged in a line is placed in the direction of arrangement of the imaging elements with respect to the object to be measured. The object to be measured is imaged while being moved relative to each other, and after storing a plurality of data obtained by the imaging, the illuminance distribution in the array direction in each of the stored data is obtained, and the illuminance is based on each of the illuminance distributions. It is characterized by finding the variation of.

Lighting unevenness measuring method this is to be measured, while relatively moving toward the arrangement direction of the imaging device, and stores the image data obtained by capturing a reflection surface of the measurement target, a specific reflection surface in the image data It is possible to extract only the image data obtained by capturing the same location, and the reflection is reflected from a specific location in the measurement target, that is, a location with the same reflectance, and changes every moment depending on the illuminance distribution of the lighting device with the relative movement. Since only the image data obtained by capturing the light can be extracted and the illuminance distribution in the relative movement direction of the lighting device can be obtained from the brightness of the image data, the adverse effect due to the variation in the reflectance on the entire surface of the measurement target can be completely excluded. Therefore, it is possible to accurately measure the lighting unevenness of the lighting device.

Further, by applying the present invention, the reflected light from the object to be inspected of the illumination light of the illumination device having an integral positional relationship with the line sensor camera is taken into each image sensor of the line sensor camera as an input image, and the image data is obtained. It is an image recognition inspection method that inspects the quality of the shape of the object to be inspected based on the recognition process. The illuminance distribution data obtained by the above-mentioned illumination unevenness measurement method is stored in a storage means, and the line sensor camera is covered. The object to be inspected was imaged by each of the image pickup elements while being relatively moved in a direction orthogonal to the arrangement direction of the image pickup elements with respect to the inspection object, and the image data obtained by the imaging was read out from the storage means. It can be configured to be corrected by the illuminance distribution data and to inspect the object to be inspected by the corrected image data.

On SL inspection object may be a transparent electrode formed of a transparent conductive film on the substrate.

[0039]
【Effect of the invention】
According to the onset light as described above, even if there are variations in reflectivity across the reflective surface to be measured, by extracting only the image data obtained by imaging a particular same location in the reflecting surface, in the image data and may be derived from the illuminance distribution of the illumination device from the luminance, completely exclude the adverse effect of variations in the reflectance of the reflecting surface, it is possible to accurately measure the illumination unevenness of the illumination device.