JP2000356508A - Interferometer - Google Patents

Interferometer

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Publication number
JP2000356508A
JP2000356508A JP11166518A JP16651899A JP2000356508A JP 2000356508 A JP2000356508 A JP 2000356508A JP 11166518 A JP11166518 A JP 11166518A JP 16651899 A JP16651899 A JP 16651899A JP 2000356508 A JP2000356508 A JP 2000356508A
Authority
JP
Japan
Prior art keywords
light
optical system
measured
reflecting member
measurement light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11166518A
Other languages
Japanese (ja)
Inventor
Shigeo Mizoroke
茂男 御菩薩池
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP11166518A priority Critical patent/JP2000356508A/en
Publication of JP2000356508A publication Critical patent/JP2000356508A/en
Pending legal-status Critical Current

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  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an interferometer which can readily detect the amount and direction of the location deviation of an object to be measured from a reference reflecting member even when the location deviation is large. SOLUTION: An interferometer is provided with a reference wave front creating means 6 which divides light emitted from a light source 1 into reference light and measuring light and a reference reflecting member 8 provided with a reflecting surface having almost the same shape as the wave front of light emitted from an optical system 7 to be measured when the measuring light is made incident to the system 7 and obtains the optical characteristic of the system 7 by causing the measuring light reflected by the reflecting member 8 and reference light to interfere with each other. The interferometer is also provided with a reflecting member 15 which is positioned near the wave front condensing point of the measuring light emitted from the optical system 7 or its vicinity, passes at least part of the measuring light emitted from the optical system 7, and reflects at least part of the measuring light reflected by the reflecting member 8 and a detecting means 14 which detects the condensing position of the measuring light reflected by the reflecting member 15 and the measuring light passed through the reflecting member 15 from the optical conjugate relation between the condensing position and the wave front condensing point of the measuring light.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、光学素子の検査装
置等に使用出来る干渉計に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an interferometer which can be used for an optical element inspection device and the like.

【0002】[0002]

【従来の技術】近年、光学素子に対して極めて高い光学
性能が要求される事が多く、特に光ディスク原盤露光用
集光レンズは代表的な高い光学性能が必要とされる対象
の一つである。このような集光レンズの光学性能の調整
検査を行う場合、検査手段として干渉計が用いられる。
干渉計は、被計測物の波面収差を精密に計測出来る有用
な装置である。
2. Description of the Related Art In recent years, optical elements are often required to have extremely high optical performance. In particular, a condensing lens for exposing an optical disk master is one of the typical objects requiring high optical performance. . When performing the adjustment inspection of the optical performance of such a condenser lens, an interferometer is used as an inspection unit.
An interferometer is a useful device that can accurately measure the wavefront aberration of an object to be measured.

【0003】この干渉計について、図3を用いて説明す
る。光源部31から射出された光束は、ビームスプリッ
ター35を透過して、参照波面創成手段36に入射す
る。入射光の一部は、参照波面創成手段36の参照波面
創成面36aで反射され、参照光となる。残りの入射光
は、被計測光学系37を透過し、測定光として用いられ
る。測定光は、基準反射部材38で反射された後に再び
被計測光学系37を透過する。そして、基準反射部材3
8で反射された光は、参照波面創成面36aで反射され
た参照光と干渉し、干渉縞を生じる。その干渉縞は、受
光部39で観測する。
The interferometer will be described with reference to FIG. The light beam emitted from the light source unit 31 passes through the beam splitter 35 and enters the reference wavefront generation unit 36. Part of the incident light is reflected by the reference wavefront generation surface 36a of the reference wavefront generation means 36, and becomes reference light. The remaining incident light passes through the measured optical system 37 and is used as measurement light. The measurement light is transmitted through the measured optical system 37 again after being reflected by the reference reflection member 38. And the reference reflecting member 3
The light reflected at 8 interferes with the reference light reflected at the reference wavefront generation surface 36a, and generates interference fringes. The interference fringes are observed by the light receiving unit 39.

【0004】なお、参照波面創成面36aと基準反射部
材38の反射面が高精度に製造されており、かつ、被計
測光学系37の位置偏差や姿勢偏差が無ければ、干渉縞
は、被計測物による波面の乱れを表し、被計測物の光学
性能を定量的に計測出来る。ところで、被計測光学系の
位置合わせは、被計測物の交換の度毎に計測作業者が必
ず行わなければならない。特に、被計測光学系37の光
軸方向、即ち、被計測光学系37と反射部材38との相
対距離が生じることによるズレと、被計測光学系37の
光軸に垂直な面内でのズレ、即ち、横ズレの双方を行わ
なければならない。
If the reference wavefront generating surface 36a and the reflecting surface of the reference reflecting member 38 are manufactured with high precision and there is no positional deviation or attitude deviation of the optical system 37 to be measured, the interference fringe is measured. It represents the disturbance of the wavefront due to an object, and can quantitatively measure the optical performance of the object to be measured. By the way, the positioning of the optical system to be measured must be performed by the measuring operator every time the object to be measured is replaced. In particular, the displacement due to the optical axis direction of the measured optical system 37, that is, the relative distance between the measured optical system 37 and the reflecting member 38, and the displacement in a plane perpendicular to the optical axis of the measured optical system 37. That is, both lateral displacement must be performed.

【0005】前者の場合、基準反射部材38で反射され
た測定光は、被計測光学系37を透過して集光する平面
と異なる平面に集光する。又、後者の場合、基準反射部
材38で反射された測定光は、被計測光学系7を透過し
て、先に述べた集光する平面内に集光するものの、被計
測光学系37を透過して集光した集光位置と基準反射部
材38で反射された測定光の集光位置との偏差は、被計
測物37と反射部材38の相対位置偏差の2倍の位置偏
差を生じてしまう。
In the former case, the measuring light reflected by the reference reflecting member 38 is condensed on a plane different from the plane that transmits and condenses the measured optical system 37. In the latter case, the measuring light reflected by the reference reflecting member 38 passes through the measured optical system 7 and is condensed in the above-described condensing plane, but passes through the measured optical system 37. The deviation between the condensing position where the light is condensed and the condensing position of the measurement light reflected by the reference reflecting member 38 causes a position deviation twice as large as the relative position deviation between the object 37 and the reflecting member 38. .

【0006】[0006]

【発明が解決しようとする課題】このように従来の干渉
計では、被計測光学系37の位置偏差や姿勢偏差が著し
く大きいと、基準反射部材38で反射された測定光の集
光位置が被計測光学系37の視野外に形成される場合が
あり、このような場合は干渉縞を観察する事が出来な
い。
As described above, in the conventional interferometer, when the position deviation and the posture deviation of the measured optical system 37 are extremely large, the condensing position of the measuring light reflected by the reference reflecting member 38 is not reflected. In some cases, the interference fringes cannot be observed outside the field of view of the measurement optical system 37.

【0007】例えば、光ディスク原盤露光用集光レンズ
を従来の干渉計で測定する場合には、そのレンズの開口
数を0.9とした場合、その光学系の視野は直径で高々
0.05mm程度である。従って、被計測光学系37と
基準反射部材38との光軸直交方向の相対位置偏差(光
軸に垂直な面内でのズレ)が0.025mmを超える
と、被計測光学系37を透過することが無いので、受光
部39に基準反射部材38で反射された光が到達出来な
い。したがって受光部39上で位置偏差を計測する事が
出来ない。
For example, when a condensing lens for exposing an optical disk master is measured by a conventional interferometer, when the numerical aperture of the lens is 0.9, the field of view of the optical system is at most about 0.05 mm in diameter. It is. Therefore, when the relative position deviation (deviation in a plane perpendicular to the optical axis) between the measured optical system 37 and the reference reflecting member 38 in the direction perpendicular to the optical axis exceeds 0.025 mm, the light passes through the measured optical system 37. Therefore, the light reflected by the reference reflecting member 38 cannot reach the light receiving section 39. Therefore, the position deviation cannot be measured on the light receiving section 39.

【0008】したがって、例えば光ディスク原盤露光用
集光レンズの様な視野の狭いレンズの場合には、被計測
光学系の位置偏差が大きい状態では、被計測光が基準反
射部材38で反射した後に、再び被計測物を透過する事
が出来ず、集光点検出手段で位置偏差を検出する事が出
来ない。本発明は、上記課題を解消し、被計測物と基準
反射部材の位置偏差が大きい状態でも容易に位置偏差量
と方向を検出可能な干渉計を得る事を目的とする。
Therefore, for example, in the case of a lens having a narrow field of view, such as a condenser lens for exposing an optical disk master, if the measured optical system has a large positional deviation, the measured light is reflected by the reference reflecting member 38, The light cannot pass through the object to be measured again, and the position deviation cannot be detected by the focal point detecting means. SUMMARY OF THE INVENTION It is an object of the present invention to solve the above-described problems and to provide an interferometer capable of easily detecting a position deviation amount and a direction even when a position deviation between an object to be measured and a reference reflection member is large.

【0009】[0009]

【課題を解決するための手段】上記課題を解決するため
に本発明では、光源から発せられた光を参照光と測定光
とに分離する参照波面創成手段と、測定光が被計測光学
系に入射した際に被計測光学系から射出される光の波面
と略同形状の反射面を有する基準反射部材とを備え、基
準反射部材を反射した測定光と参照光とを干渉させて、
被計測光学系の光学特性を得る干渉計において、被計測
光学系から射出された測定光の波面集光点またはその近
傍に備え、被計測光学系から射出された測定光の少なく
とも一部を通過させ、基準反射部材から反射された測定
光の少なくとも一部を反射する反射部材と、反射部材で
反射された測定光及び反射部材を通過した測定光の集光
位置を、測定光の波面集光点と光学的に共役な関係を有
するところで検出する検出手段とを具備する事とした。
According to the present invention, there is provided a reference wavefront generating means for separating light emitted from a light source into reference light and measurement light, and the measurement light is transmitted to an optical system to be measured. A reference reflection member having a reflection surface of substantially the same shape as the wavefront of light emitted from the optical system to be measured when the light enters, causing the measurement light and the reference light reflected by the reference reflection member to interfere with each other,
In the interferometer for obtaining the optical characteristics of the optical system to be measured, the interferometer is provided at or near the wavefront condensing point of the measuring light emitted from the optical system to be measured, and passes at least a part of the measuring light emitted from the optical system to be measured A reflection member that reflects at least a portion of the measurement light reflected from the reference reflection member, and a light-condensing position of the measurement light reflected by the reflection member and the measurement light that has passed through the reflection member. A detecting means for detecting a point having an optically conjugate relationship with the point is provided.

【0010】このように、被計測光学系からの測定光と
被計測光学系から射出され基準反射部材で反射された測
定光のそれぞれを、干渉計本体の光学系から取り出し
て、それぞれを被計測光学系の集光点と光学的に共役な
関係を有するところで検出することで、被計測光学系に
大きな位置偏差や姿勢偏差が有る状態でも、被計測光学
系と計測装置との位置偏差や姿勢偏差が検出出来る。
As described above, the measurement light from the optical system to be measured and the measurement light emitted from the optical system to be measured and reflected by the reference reflecting member are taken out from the optical system of the interferometer main body, and each is measured. By detecting where there is an optically conjugate relationship with the focal point of the optical system, even if the measured optical system has a large positional deviation or posture deviation, the position deviation or posture between the measured optical system and the measuring device Deviation can be detected.

【0011】また、本発明の第2の形態では、光源から
発せられた光を参照光と測定光とに分離する参照波面創
成手段と、測定光が被計測光学系に入射した際に被計測
光学系から射出される光の波面と略同形状の反射面を有
する基準反射部材とを備え、基準反射部材を反射した測
定光と参照光とを干渉させて、被計測光学系の光学特性
を得る干渉計において、被計測光学系から射出された測
定光の波面集光点またはその近傍に備え、被計測光学系
から射出された測定光が照射されて得られる光スポット
と、反射部材から反射された前記測定光が照らされて得
られる光スポットを形成する形成部材と、その形成部材
で形成された前記光スポットからの光を集光して結像
し、被計測光学系から射出された測定光が照射されて得
られる光スポットの像と、反射部材から反射された測定
光が照らされて得られる光スポットの像との位置を検出
する検出手段とを具備する事とした。
According to a second aspect of the present invention, a reference wavefront generating means for separating light emitted from a light source into a reference light and a measurement light, and a measurement wavefront when the measurement light enters an optical system to be measured. A reference reflection member having a reflection surface having substantially the same shape as the wavefront of light emitted from the optical system, and causing the measurement light and the reference light reflected by the reference reflection member to interfere with each other, thereby reducing the optical characteristics of the optical system to be measured. In the interferometer to be obtained, a light spot obtained by irradiating the measurement light emitted from the optical system to be measured is provided at or near the wavefront focal point of the measurement light emitted from the optical system to be measured, and reflected from the reflecting member. And a forming member that forms a light spot obtained by illuminating the measured light, and condenses light from the light spot formed by the forming member to form an image, and is emitted from the optical system to be measured. Of the light spot obtained by irradiating the measurement light When, it was it comprises a detection means for detecting the position of the image of the light spot obtained by illuminated measurement light reflected from the reflective member.

【0012】このように、反射部材の代わりに、例え
ば、検出手段で検出可能な光を放射する蛍光塗料を塗布
した形成部材を被計測光学系から射出された測定光の波
面集光点またはその近傍に備えておき、その形成部材に
被計測光学系から射出された測定光が照射されて得られ
る光スポットと、反射部材から反射された前記測定光が
照らされて得られる光スポットを形成しておく。そし
て、形成部材に形成された光スポットを集光し結像さ
せ、それぞれの光スポットの像の位置を検出する検出手
段を備えることでも、同様に行える。
As described above, instead of the reflecting member, for example, a forming member coated with a fluorescent paint that emits light that can be detected by the detecting means is applied to the wavefront condensing point of the measuring light emitted from the optical system to be measured or to the wavefront condensing point. A light spot obtained by irradiating the forming member with the measuring light emitted from the optical system to be measured and a light spot obtained by illuminating the measuring light reflected from the reflecting member are formed in the vicinity. Keep it. The light spots formed on the forming member are condensed to form an image, and the light spots can be similarly formed by providing detection means for detecting the position of the image of each light spot.

【0013】次に、本発明について、実施の形態を例示
して、更に本発明を詳しく説明する。なお、本発明は、
以下に挙げる実施の形態に限られるものではない。
Next, the present invention will be described in more detail with reference to embodiments. In addition, the present invention
The present invention is not limited to the embodiments described below.

【0014】[0014]

【発明の実施の形態】本発明の第1の実施の形態である
干渉計を図1を用いて説明する。なお、図1は、本発明
の第1の実施の形態である干渉計の概略構成を示した図
である。本第1の実施の形態の干渉計は次の構成からな
る。本干渉計は、可干渉光源1と、折り返しミラー2
と、レンズ3及びレンズ4からなるビームエキスパンダ
ー光学系と、ビームスプリッタ5と参照波面創成手段6
と、基準反射部材8と、レンズ9及びレンズ10からな
る受光光学系と、受光素子11とからなる。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An interferometer according to a first embodiment of the present invention will be described with reference to FIG. FIG. 1 is a diagram showing a schematic configuration of an interferometer according to a first embodiment of the present invention. The interferometer according to the first embodiment has the following configuration. This interferometer comprises a coherent light source 1 and a folding mirror 2
A beam expander optical system including a lens 3 and a lens 4, a beam splitter 5, and a reference wavefront generating means 6.
, A reference reflection member 8, a light receiving optical system including a lens 9 and a lens 10, and a light receiving element 11.

【0015】また、更に、本第1の実施の形態である干
渉計では、被計測光学系7の焦点位置またはその焦点位
置の近傍には反射部材15が設けられ、更に被計測光学
系7を通過した測定光と基準反射部材8を反射して更に
反射部材15で反射した測定光とを集光するレンズ16
と、受光素子14に被計測光学系7を通過した測定光と
基準反射部材8を反射して更に反射部材15で反射した
測定光を導くミラー17、18と、被計測光学系7を通
過した測定光と基準反射部材8を反射して更に反射部材
15で反射した測定光との集光位置を検出する受光素子
14とを備えている。
Further, in the interferometer according to the first embodiment, a reflection member 15 is provided at or near the focal position of the optical system 7 to be measured. A lens 16 for reflecting the passed measurement light and the measurement light reflected by the reference reflection member 8 and further reflected by the reflection member 15
And mirrors 17 and 18 that reflect the measurement light passing through the measured optical system 7 and the reference reflecting member 8 to the light receiving element 14 and further guide the measuring light reflected by the reflecting member 15, and passed through the measured optical system 7. A light receiving element 14 is provided for detecting the condensing position of the measurement light and the measurement light reflected by the reference reflection member 8 and further reflected by the reflection member 15.

【0016】ところで、可干渉光源1は、可干渉距離の
長いレーザー光を放射する光源である。そして、参照波
面創成手段6は可干渉光源1から放射された光を透過す
る物質から構成されている。そして、参照波面創成面6
aでは、可干渉光源1からの光を一部反射し、かつその
面形状は、入射してきた測定光の波面とほぼ同じ形状を
有している。
The coherent light source 1 is a light source that emits laser light having a long coherent distance. The reference wavefront generating means 6 is made of a material that transmits light emitted from the coherent light source 1. Then, the reference wavefront generation surface 6
In (a), the light from the coherent light source 1 is partially reflected, and its surface shape is substantially the same as the wavefront of the incident measurement light.

【0017】また、基準反射部材8は、被計測光学系7
が理想的な光学特性を有している場合、参照波面創成手
段6を透過した光が被計測光学系7を通過した時に得ら
れる波面とほぼ同形状の反射面を有している。このよう
な干渉計では、可干渉光源1から放射された光は、折り
返しミラー2によって射出方向を変えられ、ビームエキ
スパンダー光学系を構成するレンズ3及びレンズ4を通
過する。そして、所定の大きさを有する平行光束になっ
て、ビームスプリッタ5に入射し、通過して、参照波面
創成手段6に入射する。参照波面創成手段6には、参照
波面創成面6aを有しており、この参照波面創成面6a
により可干渉光源1からの平行光束を参照光と測定光に
分離する。なお、このとき、参照光と測定光のそれぞれ
の波面は平面である。
The reference reflecting member 8 is provided on the optical system 7 to be measured.
Has ideal optical characteristics, it has a reflecting surface having substantially the same shape as the wavefront obtained when the light transmitted through the reference wavefront generating means 6 passes through the optical system 7 to be measured. In such an interferometer, the light emitted from the coherent light source 1 has its exit direction changed by the turning mirror 2 and passes through the lenses 3 and 4 constituting the beam expander optical system. Then, a parallel light beam having a predetermined size is incident on the beam splitter 5, passes therethrough, and is incident on the reference wavefront generating means 6. The reference wavefront generating means 6 has a reference wavefront generating surface 6a.
Thereby, the parallel light beam from the coherent light source 1 is separated into reference light and measurement light. At this time, each of the wavefronts of the reference light and the measurement light is a plane.

【0018】次に、測定光は次に被計測光学系7に入射
する。そして、測定光は、この被計測光学系7の焦点位
置で集光し、再び発散して基準反射部材8に入射する。
ところで、基準反射部材8は、参照波面創成面6と同じ
反射率を有しており、測定光の一部はこの基準反射部材
8を透過する。したがって、一部の測定光はこの基準反
射部材8を透過し、その他の測定光は反射するようにし
て、干渉縞の鮮鋭度を向上している。
Next, the measuring light then enters the optical system 7 to be measured. Then, the measurement light is condensed at the focal position of the measured optical system 7, diverges again, and enters the reference reflecting member 8.
By the way, the reference reflection member 8 has the same reflectance as the reference wavefront generation surface 6, and a part of the measurement light passes through the reference reflection member 8. Therefore, a part of the measuring light is transmitted through the reference reflecting member 8 and the other measuring light is reflected, thereby improving the sharpness of the interference fringes.

【0019】そして、基準反射部材8から反射してきた
光は、被計測光学系7の位置や姿勢の偏差があまり大き
くない場合には、被計測光学系7の焦点位置とほぼ同じ
位置で再び集光する。その後、被計測光学系7及び参照
波面創成手段6を通過し、ハーフミラー5により反射さ
れて、レンズ9、10を通過し受光素子11に到達す
る。また、参照光もハーフミラー5により反射されて、
レンズ9、10を通過し受光素子11に到達する。参照
光及び測定光の二つの光による干渉像を受光素子11で
観察して、被計測光学系7の光学的特性を観察してい
る。
The light reflected from the reference reflecting member 8 is collected again at a position substantially the same as the focal position of the measured optical system 7 when the deviation of the position and orientation of the measured optical system 7 is not so large. Light. Thereafter, the light passes through the optical system to be measured 7 and the reference wavefront generating means 6, is reflected by the half mirror 5, passes through the lenses 9 and 10, and reaches the light receiving element 11. The reference light is also reflected by the half mirror 5,
The light passes through the lenses 9 and 10 and reaches the light receiving element 11. The optical characteristics of the optical system 7 to be measured are observed by observing the interference image by the two lights of the reference light and the measurement light with the light receiving element 11.

【0020】ところで、本第1の発明の実施の形態の干
渉計では、被計測光学系7から射出された測定光の集光
位置に反射部材15を設置している。この反射部材15
には中央部に開口が設けられており、被計測光学系7で
集光された測定光はこの開口を通過して、基準反射部材
8に到達する。また、この反射部材15の基準反射部材
8側の面には反射膜が形成されており、被計測光学系7
に対する基準反射部材8の位置がずれている場合は、基
準反射部材8で反射された測定光がこの反射部材15で
反射される。
By the way, in the interferometer according to the first embodiment of the present invention, the reflection member 15 is provided at the position where the measurement light emitted from the optical system 7 to be measured is focused. This reflection member 15
Is provided with an opening at the center, and the measurement light collected by the measured optical system 7 passes through this opening and reaches the reference reflecting member 8. A reflection film is formed on the surface of the reflection member 15 on the side of the reference reflection member 8, and the optical system 7 to be measured is
When the position of the reference reflection member 8 is shifted with respect to the measurement light, the measurement light reflected by the reference reflection member 8 is reflected by the reflection member 15.

【0021】そこで、レンズ16では、反射部材15の
開口を通過した被計測光学系7からの測定光の一部と、
基準反射部材8で反射され、かつ反射部材15で反射さ
れた測定光の一部とを集光し、ミラー17、18を経
て、受光素子14の受光面上にそれぞれの光スポットを
形成している。なお、レンズ16の視野は、被計測光学
系7の視野よりも広いものを用いた方が、更に大きなず
れ量に対しても検出できる。
Therefore, in the lens 16, a part of the measurement light from the measured optical system 7 that has passed through the opening of the reflection member 15 is
A part of the measurement light reflected by the reference reflection member 8 and a part of the measurement light reflected by the reflection member 15 is condensed, and the respective light spots are formed on the light receiving surface of the light receiving element 14 via the mirrors 17 and 18. I have. It is to be noted that a wider field of view of the lens 16 than the field of view of the optical system 7 to be measured can detect even a larger displacement amount.

【0022】ところで、被計測光学系7と基準反射部材
8との相対的な位置偏差や姿勢偏差が無い状態では、受
光素子14に形成される光スポットは、反射部材15の
開口を通過した被計測光学系7からの測定光になる。
又、被計測光学系7と基準反射部材8との相対的な位置
偏差や姿勢偏差が有る場合には、反射部材15の開口を
通過した被計測光学系7からの測定光の光スポットと、
基準反射部材8で反射され、かつ反射部材15で反射さ
れた測定光の光スポットとは、一致せず集光位置がズレ
ていたり、一点に集光していなかったりする。これを検
出する事で、被計測光学系7と基準反射部材8との位置
偏差や姿勢偏差を知る事が出来る。
By the way, when there is no relative position deviation or posture deviation between the measured optical system 7 and the reference reflecting member 8, the light spot formed on the light receiving element 14 passes through the opening of the reflecting member 15. It becomes the measurement light from the measurement optical system 7.
When there is a relative positional deviation or a posture deviation between the measured optical system 7 and the reference reflecting member 8, a light spot of the measuring light from the measured optical system 7 that has passed through the opening of the reflecting member 15,
The light spot of the measurement light reflected by the reference reflection member 8 and reflected by the reflection member 15 does not coincide with the light spot, and the light condensing position is shifted or not converged at one point. By detecting this, the position deviation and the posture deviation between the measured optical system 7 and the reference reflecting member 8 can be known.

【0023】なお、基準反射部材8と被計測光学系7と
の位置関係を修正する際には、基準反射部材8を載置し
ている図示されていないXYZステージを駆動して、基
準反射部材8を動かすか、又は被計測光学系7の本実施
の形態の干渉計に対する取り付け位置を移動して、受光
素子14に形成された光スポットが1点に集光し、それ
ぞれ近づき合うようにすることで、位置調整を行うこと
ができる。
When correcting the positional relationship between the reference reflecting member 8 and the optical system 7 to be measured, an XYZ stage (not shown) on which the reference reflecting member 8 is mounted is driven to By moving the optical system 8 or moving the mounting position of the optical system 7 to be measured with respect to the interferometer of the present embodiment, the light spot formed on the light receiving element 14 is condensed at one point and approaches each other. Thus, the position can be adjusted.

【0024】次に、本発明の第2の実施の形態における
干渉計について図2を用いて説明する。なお、図2に示
した構成のうち、図1と同一符号のものは、本発明の第
1の実施の形態と同じものなので、ここでの説明は省略
する。ところで、本発明の第2の実施の形態における干
渉計では、受光素子14で受光する測定光は、反射部材
15を通過した測定光の一部や反射部材15を反射した
測定光の一部を反射するミラー20とを備えた。また更
に、反射部材15を通過した測定光及び反射部材15で
反射された測定光を集光するレンズ19を備え、ミラー
18を介して受光素子14に入射している。
Next, an interferometer according to a second embodiment of the present invention will be described with reference to FIG. In addition, among the configurations shown in FIG. 2, those having the same reference numerals as those in FIG. 1 are the same as those in the first embodiment of the present invention, and a description thereof will be omitted. By the way, in the interferometer according to the second embodiment of the present invention, the measuring light received by the light receiving element 14 is a part of the measuring light passing through the reflecting member 15 or a part of the measuring light reflected by the reflecting member 15. And a reflecting mirror 20. Further, a lens 19 is provided for condensing the measurement light passing through the reflection member 15 and the measurement light reflected by the reflection member 15, and is incident on the light receiving element 14 via the mirror 18.

【0025】このようにすることで、基準反射部材8
は、測定光を透過させる必要が無いので、基準反射部材
8の材質や素材の均質性に関して、注意する必要は無く
なる。特に、本発明の第1の実施の形態における干渉計
では可干渉光源1が可視光ではなく、紫外光や赤外光の
場合には、それぞれの波長での透過率等に注意する必要
が有る。また更に、可干渉光源1の波長に応じて、基準
反射部材8を構成する物質が限定されるという欠点があ
る。しかしながら、本発明の第2の実施の形態における
干渉計のように、基準反射部材8を通過した測定光を用
いないことで、基準反射部材8の材質や均質性にこだわ
らなくても使用できるという利点がある。
By doing so, the reference reflecting member 8
Since there is no need to transmit the measuring light, there is no need to pay attention to the material of the reference reflecting member 8 and the homogeneity of the material. In particular, in the interferometer according to the first embodiment of the present invention, when the coherent light source 1 is not visible light but ultraviolet light or infrared light, it is necessary to pay attention to the transmittance at each wavelength. . Further, there is a disadvantage that the material constituting the reference reflecting member 8 is limited according to the wavelength of the coherent light source 1. However, unlike the interferometer according to the second embodiment of the present invention, by not using the measurement light passing through the reference reflecting member 8, it can be used without being concerned with the material and homogeneity of the reference reflecting member 8. There are advantages.

【0026】ところで、本発明の各実施の形態では、反
射部材15は、被計測光学系7から射出される測定光の
集光径とほぼ同程度の孔を有するものを使用している
が、本発明はこれだけには限られず、部分反射ミラーか
らなる反射部材を用いることでも構わない。なお、この
ような反射部材15を用いる場合には、反射部材15の
材質や厚みや内部均質性に注意しなければならない。こ
のようにして、被計測光学系7から射出された測定光の
一部からなる光スポットの位置と、基準反射部材8から
射出された測定光の一部からなる光スポットの位置とを
計測して、基準反射部材8と被計測光学系7との位置を
調整することが可能となる。
In each of the embodiments of the present invention, the reflecting member 15 has a hole having substantially the same diameter as the converging diameter of the measuring light emitted from the optical system 7 to be measured. The present invention is not limited to this, and a reflective member formed of a partially reflecting mirror may be used. When using such a reflecting member 15, attention must be paid to the material, thickness and internal homogeneity of the reflecting member 15. In this way, the position of the light spot composed of a part of the measurement light emitted from the measured optical system 7 and the position of the light spot composed of a part of the measurement light emitted from the reference reflecting member 8 are measured. Thus, the positions of the reference reflecting member 8 and the measured optical system 7 can be adjusted.

【0027】また、本発明の各実施の形態における干渉
計は、被計測光学系7を透過した測定光は1点に集光
し、基準反射部材8は、球面である事を前提に説明して
きたが、本発明はこれだけに限られない。たとえば、被
計測光学系7を通過した測定光が1点に集光しない光学
系を計測したものでもよく、又、基準反射部材8が球面
で無くても、本発明の効果はなんら変わるものではな
い。
The interferometer according to each embodiment of the present invention has been described on the assumption that the measurement light transmitted through the optical system to be measured 7 is condensed at one point, and the reference reflecting member 8 is spherical. However, the present invention is not limited to this. For example, an optical system in which the measurement light passing through the optical system to be measured 7 does not converge at one point may be measured. Even if the reference reflecting member 8 is not spherical, the effect of the present invention is not changed at all. Absent.

【0028】又、可干渉光源1に可視光以外の光を用い
る場合には、反射部材15の代わりに透明な板材に蛍光
物質を塗布したりする事で、基準反射部材8やレンズ1
6、ミラー17,18は、可視光域における透過や反射
を考慮すれば良いと同時に、検出器14も可視光のみを
検出する検出器を使用することが出来る。更に本発明の
第2の実施の形態に示す干渉系の場合、ミラー20に平
面反射鏡を用いたが、放物面鏡等の曲面鏡を用いても良
い。放物面反射鏡などの曲面鏡を用いた場合、レンズ1
9を小型化したり、省略しても良い。又、本発明の第1
の実施の形態に示す干渉計の場合においても、基準反射
部材8の底面を曲面にすることで、レンズ作用を積極的
に付加する事が出来、レンズ16を小型化したり、省略
しても良い。
When light other than visible light is used for the coherent light source 1, a fluorescent material is applied to a transparent plate instead of the reflecting member 15 so that the reference reflecting member 8 and the lens 1 can be used.
6. The mirrors 17 and 18 need only consider transmission and reflection in the visible light range, and the detector 14 can use a detector that detects only visible light. Further, in the case of the interference system shown in the second embodiment of the present invention, a plane reflecting mirror is used as the mirror 20, but a curved mirror such as a parabolic mirror may be used. When using a curved mirror such as a parabolic reflector, the lens 1
9 may be downsized or omitted. Also, the first of the present invention
Also in the case of the interferometer described in the embodiment, the lens function can be positively added by making the bottom surface of the reference reflecting member 8 a curved surface, and the lens 16 may be downsized or omitted. .

【0029】また、本発明の各実施の形態における干渉
計を、光ディスク原盤露光用集光レンズの光学特性の計
測として利用した場合、その光学系の光源として紫外光
を使用する事が一般的で、使用波長の1/20程度の波
面収差が代表的である。このような光学系の計測でも、
被測定光学系7と基準反射部材8との位置合わせが容易
になり、計測時間が短縮された。
When the interferometer according to each embodiment of the present invention is used for measuring the optical characteristics of a condensing lens for exposing an optical disk master, it is common to use ultraviolet light as a light source for the optical system. The wavefront aberration of about 1/20 of the used wavelength is typical. Even in the measurement of such an optical system,
The alignment between the measured optical system 7 and the reference reflecting member 8 was facilitated, and the measurement time was shortened.

【0030】なお、このように紫外光を干渉計に使用す
る場合は、反射部材15には、製造が容易である事と透
過波面収差を小さくする狙いから、薄い石英硝子の平行
平面板を採用することが好ましい。また受光素子14に
は、安価な蛍光フィルムが好適であり、目視監察が簡便
であるが、2次元アレイ状撮像素子を用いて精密な位置
合わせを行っても良い。
In the case where the ultraviolet light is used for the interferometer as described above, a thin quartz glass parallel flat plate is used for the reflecting member 15 in order to facilitate manufacture and reduce transmitted wavefront aberration. Is preferred. In addition, an inexpensive fluorescent film is preferable for the light receiving element 14 and visual inspection is easy, but precise alignment may be performed using a two-dimensional array imaging element.

【0031】[0031]

【発明の効果】以上説明したように、本発明に係る干渉
計では、被計測物である光学系と干渉計との位置偏差や
姿勢偏差が大きい状態でも容易に位置偏差及び姿勢偏差
のそれぞれの量と方向が検出可能となり、検査の省力化
と検査時間の短縮が可能となった。したがって、容易に
短時間で被計測物と干渉計との位置合わせが可能となっ
た。
As described above, in the interferometer according to the present invention, even if the position deviation and the posture deviation between the optical system to be measured and the interferometer are large, each of the position deviation and the posture deviation can be easily obtained. The amount and direction can be detected, which can save labor and shorten the inspection time. Therefore, it is possible to easily position the object to be measured and the interferometer in a short time.

【図面の簡単な説明】[Brief description of the drawings]

【図1】:本発明の第1の実施の形態に係る干渉計の構
成を示す図。
FIG. 1 is a diagram showing a configuration of an interferometer according to a first embodiment of the present invention.

【図2】:本発明の第2の実施の形態に係る干渉計の構
成を示す図。
FIG. 2 is a diagram showing a configuration of an interferometer according to a second embodiment of the present invention.

【図3】:従来の干渉計の構成を示す図。FIG. 3 is a diagram showing a configuration of a conventional interferometer.

【符号の説明】[Explanation of symbols]

1:光源 2,17,18,20:反射鏡 3,4,9,10、16、19:レンズ 5,35:ビームスプリッタ 6,36:参照波面創成手段 6a,36a:参照面 7,37:被計測光学系 8,38:基準反射部材 11、14:受光素子 15:反射部材 31:光源部 39:受光部 1: Light source 2, 17, 18, 20: Reflecting mirror 3, 4, 9, 10, 16, 19: Lens 5, 35: Beam splitter 6, 36: Reference wavefront generating means 6a, 36a: Reference surface 7, 37: Optical system to be measured 8, 38: Reference reflecting member 11, 14: Light receiving element 15: Reflecting member 31: Light source unit 39: Light receiving unit

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 光源から発せられた光を参照光と測定光
とに分離する参照波面創成手段と、前記測定光が被計測
光学系に入射した際に前記被計測光学系から射出される
光の波面と略同形状の反射面を有する基準反射部材とを
備え、前記基準反射部材を反射した測定光と前記参照光
とを干渉させて、前記被計測光学系の光学特性を得る干
渉計において、 前記被計測光学系から射出された前記測定光の波面集光
点またはその近傍に備え、前記被計測光学系から射出さ
れた前記測定光の少なくとも一部を通過させ、前記基準
反射部材から反射された前記測定光の少なくとも一部を
反射する反射部材と、 前記反射部材で反射された測定光及び前記反射部材を通
過した測定光の集光位置を、前記測定光の波面集光点と
光学的に共役な関係を有するところで検出する検出手段
とを具備する事を特徴とする干渉計。
1. A reference wavefront generating means for separating light emitted from a light source into reference light and measurement light, and light emitted from the measured optical system when the measurement light enters the measured optical system. A reference reflection member having a reflection surface of substantially the same shape as the wavefront of the reference light, the interference between the measurement light and the reference light reflected by the reference reflection member, to obtain an optical characteristic of the measured optical system in an interferometer Provided at or near the wavefront condensing point of the measurement light emitted from the measured optical system, allowing at least a part of the measurement light emitted from the measured optical system to pass therethrough and reflected from the reference reflecting member. A reflection member that reflects at least a part of the measurement light that has been reflected; and a light-condensing position of the measurement light reflected by the reflection member and the measurement light that has passed through the reflection member. Have a conjugate relationship Interferometer characterized by comprising a detecting means for detecting for.
【請求項2】 光源から発せられた光を参照光と測定光
とに分離する参照波面創成手段と、前記測定光が被計測
光学系に入射した際に前記被計測光学系から射出される
光の波面と略同形状の反射面を有する基準反射部材とを
備え、前記基準反射部材を反射した測定光と前記参照光
とを干渉させて、前記被計測光学系の光学特性を得る干
渉計において、 前記被計測光学系から射出された前記測定光の波面集光
点またはその近傍に備え、前記被計測光学系から射出さ
れた前記測定光が照射されて得られる光スポットと、前
記反射部材から反射された前記測定光が照らされて得ら
れる光スポットを形成する形成部材と、 前記形成部材で形成された前記光スポットからの光を集
光して結像し、前記被計測光学系から射出された前記測
定光が照射されて得られる光スポットの像と、前記反射
部材から反射された前記測定光が照らされて得られる光
スポットの像との位置を検出する検出手段とを具備する
事を特徴とする干渉計。
2. A reference wavefront generating means for separating light emitted from a light source into reference light and measurement light, and light emitted from the measured optical system when the measurement light enters the measured optical system. A reference reflection member having a reflection surface of substantially the same shape as the wavefront of the reference light, the interference between the measurement light and the reference light reflected by the reference reflection member, to obtain an optical characteristic of the measured optical system in an interferometer A light spot obtained by irradiating the measurement light emitted from the measured optical system, provided at or near the wavefront focal point of the measurement light emitted from the measured optical system, and A forming member that forms a light spot obtained by illuminating the reflected measurement light; condensing light from the light spot formed by the forming member to form an image, and emitting the light from the optical system to be measured Is irradiated with the measurement light The image of the light spot is, the interferometer characterized by comprising detecting means for detecting the position of the image of the light spot obtained illuminated is reflected the measurement light from said reflecting member.
JP11166518A 1999-06-14 1999-06-14 Interferometer Pending JP2000356508A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11166518A JP2000356508A (en) 1999-06-14 1999-06-14 Interferometer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11166518A JP2000356508A (en) 1999-06-14 1999-06-14 Interferometer

Publications (1)

Publication Number Publication Date
JP2000356508A true JP2000356508A (en) 2000-12-26

Family

ID=15832816

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11166518A Pending JP2000356508A (en) 1999-06-14 1999-06-14 Interferometer

Country Status (1)

Country Link
JP (1) JP2000356508A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005114400A (en) * 2003-10-03 2005-04-28 Nikon Corp Method for measuring optical characteristic, antireflection film, optical system, and projection aligner
JP2013504762A (en) * 2009-09-18 2013-02-07 カール・ツァイス・エスエムティー・ゲーエムベーハー Method for measuring shape of optical surface and interference measuring device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005114400A (en) * 2003-10-03 2005-04-28 Nikon Corp Method for measuring optical characteristic, antireflection film, optical system, and projection aligner
JP2013504762A (en) * 2009-09-18 2013-02-07 カール・ツァイス・エスエムティー・ゲーエムベーハー Method for measuring shape of optical surface and interference measuring device

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