JP2000347217A - Method for correcting defect in active matrix substrate and production of liquid crystal panel - Google Patents

Method for correcting defect in active matrix substrate and production of liquid crystal panel

Info

Publication number
JP2000347217A
JP2000347217A JP16023999A JP16023999A JP2000347217A JP 2000347217 A JP2000347217 A JP 2000347217A JP 16023999 A JP16023999 A JP 16023999A JP 16023999 A JP16023999 A JP 16023999A JP 2000347217 A JP2000347217 A JP 2000347217A
Authority
JP
Japan
Prior art keywords
electrode
defect
active matrix
short
matrix substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16023999A
Other languages
Japanese (ja)
Other versions
JP3778407B2 (en
Inventor
Tetsuya Doi
徹也 土肥
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP16023999A priority Critical patent/JP3778407B2/en
Publication of JP2000347217A publication Critical patent/JP2000347217A/en
Application granted granted Critical
Publication of JP3778407B2 publication Critical patent/JP3778407B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To correct a short circuit defect between an upper electrode and a lower electrode due to a pinhole defect in an auxiliary capacitor part while the state of an active matrix substrate is present. SOLUTION: When a short circuit is produced between a lower electrode and an upper electrode due to a pinhole 12 of an insulating film 7 in an auxiliary capacitor part consisting of a common signal wiring 3 or a scanning wiring (lower electrode), and an insulating film 7 and a pixel electrode 5 (upper electrode), a part of the upper electrode 13 near the short circuit defect 12 is removed by irradiation of light energy. Since the defect is corrected in the state of the active matrix substrate before lamination with counter substrate, no influence is added to the refractive index or transmittance of a glass substrate or a color filter forming part or on the alignment of a liquid crystal, or defective products are not sent to the succeeding processes. By using a short wavelength laser of UV rays at <=360 nm wavelength, for example, by using the fourth order harmonic waves of a YAG laser, only the upper electrode near the short circuit defect can be removed with good accuracy without adding influences on the lower films.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、テレビジョンセッ
ト等のAV(Audio Visual)機器やワード
プロセッサ等のOA(Office Automati
on)機器、ノートブック型パーソナルコンピュータ等
の情報端末表示機器に用いられるアクティブマトリクス
基板において、補助容量部に短絡欠陥が生じている場合
の欠陥修正方法および液晶パネルの製造方法に関する。
The present invention relates to an audio visual (AV) device such as a television set and an office automation (OA) such as a word processor.
on) The present invention relates to a method for repairing a defect when a short-circuit defect occurs in an auxiliary capacitance portion and a method for manufacturing a liquid crystal panel in an active matrix substrate used for an information terminal display device such as a device and a notebook personal computer.

【0002】[0002]

【従来の技術】液晶の電気光学効果を表示装置に利用し
た液晶表示装置は、現在、ノートブック型パーソナルコ
ンピュータ等の情報端末表示機器をはじめとして、OA
機器やAV機器等、様々な分野に利用されている。
2. Description of the Related Art At present, liquid crystal display devices utilizing the electro-optical effect of liquid crystal for display devices include information terminal display devices such as notebook personal computers and OA.
It is used in various fields such as devices and AV devices.

【0003】この液晶表示装置は、互いに交差するゲー
ト信号線(走査配線)およびソース信号線(信号配
線)、マトリクス状に形成された多数の絵素電極、およ
び絵素電極を制御するためにスイッチング素子等を備え
たアクティブマトリクス基板を有している。そして、こ
のアクティブマトリクス基板とカラーフィルタや対向電
極等を備えた対向基板とが、所定の隙間を保って互いの
電極形成面が向かい合うように貼り合わせられ、両基板
の隙間に液晶層が挟持された構成を有している。
This liquid crystal display device has a gate signal line (scanning line) and a source signal line (signal line) crossing each other, a large number of picture element electrodes formed in a matrix, and switching for controlling the picture element electrodes. It has an active matrix substrate provided with elements and the like. Then, the active matrix substrate and a counter substrate provided with a color filter, a counter electrode, and the like are bonded to each other so that their electrode forming surfaces face each other with a predetermined gap therebetween. Configuration.

【0004】このアクティブマトリクス基板の製造工程
は複雑であり、多くの製造プロセスを経ることが余儀な
くされる。このため、異物の混入や絵素電極と走査配線
や信号配線との短絡等の欠陥が生じ易く、これを完全に
無くすことは非常に困難である。従って、これらの欠陥
を早期に検出し、必要に応じて修正を行うことは、生産
歩留りを向上させるために非常に重要な課題となってい
る。
[0004] The manufacturing process of this active matrix substrate is complicated and must go through many manufacturing processes. For this reason, defects such as mixing of foreign matter and short-circuiting between the pixel electrode and the scanning wiring or signal wiring are likely to occur, and it is very difficult to completely eliminate them. Therefore, detecting these defects at an early stage and making corrections as necessary is a very important task for improving the production yield.

【0005】従来では、上記アクティブマトリクス基板
と対向基板とを貼り合わせ、涼気板の間に液晶を注入し
て液晶パネルを作製した後で点灯検査を行って線欠陥や
点欠陥の有無を検出し、冗長構造等を用いてその欠陥部
分が修正可能なものであれば修正するという方法が提案
されてきた。
Conventionally, the active matrix substrate and the opposing substrate are bonded to each other, a liquid crystal is injected between the cooling air plates to produce a liquid crystal panel, and then a lighting inspection is performed to detect the presence of a line defect or a point defect. A method has been proposed in which, if the defect can be corrected using a structure or the like, the defect can be corrected.

【0006】しかしながら、アクティブマトリクス基板
と対向基板とを貼り合わせて両基板の間に液晶を注入
し、液晶パネルを作製した後で欠陥を検出する場合、重
度な欠陥を有し、その欠陥が修正不可能な液晶パネルは
廃棄せざるを得ない。従って、後工程において生産歩留
りが低下して製造コストが高くなるという問題があっ
た。
However, when an active matrix substrate and an opposing substrate are bonded to each other and a liquid crystal is injected between the two substrates to detect a defect after a liquid crystal panel is manufactured, the defect has a serious defect and the defect is corrected. Impossible liquid crystal panels must be discarded. Therefore, there is a problem that the production yield is reduced in the post-process and the manufacturing cost is increased.

【0007】そこで、近年では、対向基板と貼り合わせ
る前のアクティブマトリクス基板の状態で重度な欠陥を
検出し、また、短絡欠陥等の修正可能なものは前工程で
修正することが望まれるようになってきた。そして、こ
れらの欠陥は基板状態で、画像処理や抵抗検査等の手法
によって検出できるようになり、それに伴って基板状態
で欠陥を修正して後工程に不良品を流さないような工程
システム作りがなされてきている。
Therefore, in recent years, it has been desired that a serious defect is detected in the state of the active matrix substrate before being bonded to the counter substrate, and that a correctable one such as a short-circuit defect is corrected in a previous step. It has become. Then, these defects can be detected in the substrate state by techniques such as image processing and resistance inspection, so that a process system can be created that corrects the defects in the substrate state and does not send defective products to the subsequent process. Is being done.

【0008】[0008]

【発明が解決しようとする課題】ところで、上述の液晶
表示装置においては、表示品位を向上させるために、絵
素電極と共通信号配線や隣接する走査配線を絶縁膜を介
して一部重畳させ、重畳部を補助容量部とした構成が知
られている。
By the way, in the above-mentioned liquid crystal display device, in order to improve the display quality, the picture element electrode is partially overlapped with a common signal wiring or an adjacent scanning wiring via an insulating film. There is known a configuration in which the superimposing unit is used as an auxiliary capacitance unit.

【0009】上記構成において、補助容量の上部電極
(絵素電極)と下部電極(共通信号配線や走査配線)に
短絡欠陥が生じた場合、共通信号配線と短絡した絵素電
極には対向電極と同じ位相の電位が印加されるので、現
在主流となっているノーマリホワイトモードでは常に輝
点となり、表示品位が低下する。一方、走査配線と短絡
した絵素電極には対向電極に対してマイナスの一定電位
がほぼ常に印加されているので、現在主流となっている
ノーマリホワイトモードではほぼ常に黒点となり、表示
品位が低下する。
In the above structure, when a short-circuit defect occurs in the upper electrode (picture element electrode) and the lower electrode (common signal wiring or scanning wiring) of the auxiliary capacitor, the picture element electrode short-circuited with the common signal wiring has an opposing electrode. Since potentials of the same phase are applied, in the normally white mode, which is currently the mainstream, the spot always becomes a luminescent spot, and the display quality deteriorates. On the other hand, a negative constant potential is almost always applied to the pixel electrode that is short-circuited with the scanning wiring with respect to the counter electrode. I do.

【0010】このような欠陥が生じた場合、従来のよう
に液晶パネルの作製後に修正しようとすると、ガラス基
板やカラーフィルタ形成部の屈折率や透過率の影響、液
晶配向への影響等のために利用できるレーザーが限定さ
れ、正常絵素に修正することができなかった。
When such a defect occurs, it is difficult to correct the defect after the fabrication of the liquid crystal panel as in the prior art because of the influence of the refractive index and transmittance of the glass substrate and the color filter forming portion, the influence on the liquid crystal alignment, and the like. The available lasers were limited and could not be corrected to normal picture elements.

【0011】本発明はこのような従来技術の課題を解決
すべくなされたものであり、対向基板との貼り合わせ前
のアクティブマトリクス基板の状態で補助容量部の上部
電極と下部電極との短絡欠陥を修正することが可能なア
クティブマトリクス基板の欠陥修正方法および液晶パネ
ルの製造方法を提供することを目的とする。
SUMMARY OF THE INVENTION The present invention has been made to solve such problems of the prior art, and a short-circuit defect between an upper electrode and a lower electrode of an auxiliary capacitor in a state of an active matrix substrate before bonding to an opposing substrate. It is an object of the present invention to provide a method for repairing a defect of an active matrix substrate and a method for manufacturing a liquid crystal panel, which can correct the defect.

【0012】[0012]

【課題を解決するための手段】本発明のアクティブマト
リクス基板の欠陥修正方法は、複数の走査配線および複
数の信号配線が互いに交差するように設けられていると
共に、両配線の交差部近傍に設けられたスイッチング素
子を介して両配線と接続された絵素電極が設けられ、さ
らに、該絵素電極の下層に絶縁膜を介して該絵素電極と
一部重畳するように複数の共通信号配線が設けられて、
重畳部の共通信号配線部分を下部電極とし、該重畳部の
絵素電極部分を上部電極とする補助容量部が構成されて
いるアクティブマトリクス基板において、該上部電極と
該下部電極との短絡欠陥が生じている場合に欠陥を修正
する方法であって、短絡欠陥部に任意の光エネルギーを
照射して該短絡欠陥部周辺の上部電極を除去し、そのこ
とにより上記目的が達成される。
According to the present invention, there is provided a method of repairing a defect in an active matrix substrate, wherein a plurality of scanning wirings and a plurality of signal wirings are provided so as to intersect with each other, and are provided in the vicinity of the intersection of the two wirings. A pixel electrode connected to both wirings via the switching element provided, and a plurality of common signal wirings are provided below the pixel electrode so as to partially overlap the pixel electrode via an insulating film. Is provided,
In an active matrix substrate in which an auxiliary capacitance portion in which a common signal wiring portion of a superimposed portion is a lower electrode and a pixel electrode portion of the superposed portion is an upper electrode, a short-circuit defect between the upper electrode and the lower electrode is reduced. A method for correcting a defect when it occurs, and irradiating the short-circuit defect with arbitrary light energy to remove an upper electrode around the short-circuit defect, thereby achieving the above object.

【0013】本発明のアクティブマトリクス基板の欠陥
修正方法は、複数の走査配線および複数の信号配線が互
いに交差するように設けられていると共に、両配線の交
差部近傍に設けられたスイッチング素子を介して両配線
と接続された絵素電極が設けられ、さらに、該絵素電極
に接続された走査配線に隣接する走査配線と該絵素電極
とが絶縁膜を介して一部重畳されて、重畳部の走査配線
部分を下部電極とし、該重畳部の絵素電極部分を上部電
極とする補助容量部が構成されているアクティブマトリ
クス基板において、該上部電極と該下部電極との短絡欠
陥が生じている場合に欠陥を修正する方法であって、短
絡欠陥部に任意の光エネルギーを照射して該短絡欠陥部
周辺の上部電極を除去し、そのことにより上記目的が達
成される。
In the method of repairing defects of an active matrix substrate according to the present invention, a plurality of scanning wirings and a plurality of signal wirings are provided so as to intersect with each other, and a switching element provided near an intersection of the two wirings. A scanning electrode adjacent to the scanning electrode connected to the pixel electrode is partially overlapped with the pixel electrode via an insulating film. In the active matrix substrate in which the auxiliary capacitance portion is configured such that the scanning wiring portion of the portion is a lower electrode and the pixel electrode portion of the overlapping portion is an upper electrode, a short-circuit defect between the upper electrode and the lower electrode occurs. A method of correcting a defect in a case where the short-circuit defect is irradiated with arbitrary light energy to remove an upper electrode around the short-circuit defect, thereby achieving the above object.

【0014】前記光エネルギーとしてレーザー光を照射
するのが好ましい。
Preferably, laser light is irradiated as the light energy.

【0015】前記光エネルギーを照射するために発振波
長が360nm以下の紫外線であるレーザーを用いるの
が好ましい。
In order to irradiate the light energy, it is preferable to use a laser which is an ultraviolet ray having an oscillation wavelength of 360 nm or less.

【0016】前記光エネルギーとしてYAGレーザーの
第4高調波を照射するのが好ましい。
It is preferable to irradiate the fourth harmonic of a YAG laser as the light energy.

【0017】本発明の液晶パネルの製造方法は、本発明
のアクティブマトリクス基板の欠陥修正方法により欠陥
を修正した後で、アクティブマトリクス基板と対向基板
とを貼り合わせて両基板の間に液晶を注入する工程を含
み、そのことにより上記目的が達成される。
According to the method of manufacturing a liquid crystal panel of the present invention, after the defect is corrected by the method of correcting a defect of the active matrix substrate of the present invention, the active matrix substrate and the opposing substrate are bonded to inject liquid crystal between the two substrates. And the above object is achieved.

【0018】以下、本発明の作用について説明する。Hereinafter, the operation of the present invention will be described.

【0019】本発明にあっては、共通信号配線または走
査配線(下部電極)と絶縁膜と絵素電極(上部電極)と
で構成される補助容量部において、下部電極と上部電極
との短絡欠陥が生じている場合に、光エネルギーを照射
して短絡欠陥部周辺の上部電極を除去する。これによ
り、短絡欠陥部と絵素電極が隔離され、下部電極と上部
電極との短絡が解消される。対向基板との貼り合わせ前
のアクティブマトリクス基板の状態で欠陥修正を行うの
で、液晶パネル状態で欠陥修正を行った場合のようにガ
ラス基板やカラーフィルタ形成部の屈折率や透過率の影
響、液晶配向への影響等がなく、修正の信頼性が向上す
る。後工程に不良品が流れず、欠陥修正のために予め冗
長構造を設けておく必要もないので、製造歩留りが向上
する。
According to the present invention, a short-circuit defect between the lower electrode and the upper electrode in the auxiliary capacitance section composed of the common signal wiring or the scanning wiring (lower electrode), the insulating film and the pixel electrode (upper electrode). In the case where the short-circuit defect occurs, the upper electrode around the short-circuit defect is removed by irradiating light energy. Thereby, the short-circuit defect portion and the pixel electrode are isolated, and the short circuit between the lower electrode and the upper electrode is eliminated. Since defect repair is performed in the state of the active matrix substrate before bonding with the opposing substrate, the effect of the refractive index and transmittance of the glass substrate and color filter formation part, There is no influence on the orientation and the like, and the reliability of correction is improved. Defective products do not flow in the subsequent process, and there is no need to provide a redundant structure in advance for defect correction, so that the production yield is improved.

【0020】この光エネルギーとしてレーザー光を用い
れば、非接触で加工可能であるので素早く容易に修正す
ることができる。
If a laser beam is used as the light energy, the laser beam can be processed in a non-contact manner and can be corrected quickly and easily.

【0021】発振波長が360nm以下の紫外線である
短波長レーザー、例えばYAGレーザーの第4高調波を
用いれば、下層膜に影響を与えずに短絡欠陥周辺部の上
部電極のみを精度良く除去することができる。
If a short-wavelength laser having an oscillation wavelength of 360 nm or less, such as the fourth harmonic of a YAG laser, is used, it is possible to remove only the upper electrode around the short-circuit defect without affecting the underlying film. Can be.

【0022】[0022]

【発明の実施の形態】以下、本発明の実施形態につい
て、図面を参照しながら説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0023】(実施形態1)本実施形態ではCs on
Common構造のアクティブマトリクス液晶パネル
について説明する。
(Embodiment 1) In this embodiment, Cs on
An active matrix liquid crystal panel having a Common structure will be described.

【0024】図1は実施形態1の液晶パネルの平面図で
あり、図2はそのI−I’線部分の断面図である。
FIG. 1 is a plan view of the liquid crystal panel of the first embodiment, and FIG. 2 is a cross-sectional view taken along the line II ′.

【0025】この液晶パネルにおいて、アクティブマト
リクス基板は、ガラス基板11上に走査配線2および信
号配線4が互いに交差して設けられ、両配線の交差部近
傍にスイッチング素子6としてTFT(薄膜トランジス
タ)が設けられている。両配線で区切られた矩形状の領
域には絵素電極5がマトリクス状に配置され、スイッチ
ング素子6を介して両配線と接続されている。
In this liquid crystal panel, in the active matrix substrate, a scanning wiring 2 and a signal wiring 4 are provided on a glass substrate 11 so as to intersect each other, and a TFT (thin film transistor) is provided as a switching element 6 near an intersection of both wirings. Have been. Pixel electrodes 5 are arranged in a matrix in a rectangular area separated by both wirings, and are connected to both wirings via switching elements 6.

【0026】さらに、隣接する走査配線2の間には走査
配線2と平行な方向に共通信号配線3が設けられ、その
上に絶縁膜7を介して絵素電極5が一部重畳している。
この重畳部の共通信号配線3、絶縁膜7および絵素電極
5から補助容量部1が構成されている。共通信号配線3
は厚み300nm〜500nm程度の金属薄膜、例えば
TaやAl等からなり、絵素電極5は厚み100nm〜
200nm程度の透明導電膜、例えばITO(Indi
um Tin Oxide)等からなり、絶縁膜7は厚
み300nm〜500nm程度の絶縁膜(ゲート絶縁
膜)、例えばSiNxやSiOx等からなる。
Further, a common signal wiring 3 is provided between the adjacent scanning wirings 2 in a direction parallel to the scanning wirings 2, and a picture element electrode 5 partially overlaps thereover via an insulating film 7. .
The auxiliary capacitance unit 1 is composed of the common signal wiring 3, the insulating film 7, and the picture element electrode 5 of the superposed unit. Common signal wiring 3
Is made of a metal thin film having a thickness of about 300 nm to 500 nm, for example, Ta, Al, or the like.
A transparent conductive film of about 200 nm, for example, ITO (Indi
um Tin Oxide), and the insulating film 7 is formed of an insulating film (gate insulating film) having a thickness of about 300 nm to 500 nm, for example, SiN x or SiO x .

【0027】このアクティブマトリクス基板は、ガラス
基板10上に対向電極9が設けられた対向基板と貼り合
わせられ、両基板の間に液晶層8が挟持されている。
This active matrix substrate is bonded to a counter substrate provided with a counter electrode 9 on a glass substrate 10, and a liquid crystal layer 8 is sandwiched between both substrates.

【0028】この液晶パネルにおいて、図2に示すよう
に、絶縁膜7にピンホール12が発生して補助容量部の
共通信号配線3と絵素電極5とが短絡している場合、対
向電極9と共通信号配線3には同じ位相の電位が印加さ
れているため、共通信号配線3に短絡した絵素電極5と
対向電極9との間には電位が印加されない。よって、現
在主流となっているノーマリホワイトモード液晶では常
に輝点として表示され、表示品位を低下させる非常に目
立った欠陥になってしまう。
In this liquid crystal panel, as shown in FIG. 2, when a pinhole 12 is generated in the insulating film 7 to short-circuit the common signal line 3 of the auxiliary capacitance section and the picture element electrode 5, the counter electrode 9 Since the same potential is applied to the common signal wiring 3 and the common signal wiring 3, no potential is applied between the pixel electrode 5 and the counter electrode 9 short-circuited to the common signal wiring 3. Therefore, the currently mainstream normally white mode liquid crystal is always displayed as a luminescent spot, which is a very conspicuous defect that degrades the display quality.

【0029】このような補助容量部1の短絡欠陥を従来
のように液晶パネル状態で修正すると、ガラス基板やカ
ラーフィルタ形成部の屈折率や透過率の影響、液晶配向
への影響等のため修正が困難である。また、液晶層に修
正により飛散した破片や異物等が残留して表示不良が生
じるおそれもある。
When such a short-circuit defect of the auxiliary capacitance portion 1 is corrected in the state of the liquid crystal panel as in the prior art, it is corrected due to the influence of the refractive index and transmittance of the glass substrate and the color filter forming portion, the influence on the liquid crystal alignment, and the like. Is difficult. In addition, there is a possibility that fragments or foreign matter scattered due to the correction remain in the liquid crystal layer and display defects occur.

【0030】そこで、本実施形態では、図3に示すよう
に、対向基板との貼り合わせ前のアクティブマトリクス
基板状態で、短絡欠陥部12に光エネルギーを照射して
欠陥修正を行う。欠陥の検出は、画像処理や抵抗検査等
の手法によって検出することができる。
Therefore, in the present embodiment, as shown in FIG. 3, defect correction is performed by irradiating the short-circuit defect portion 12 with light energy in the active matrix substrate state before bonding to the counter substrate. The defect can be detected by a technique such as image processing or resistance test.

【0031】ここで、YAGレーザーの基本波等を照射
すると、下層膜に影響を与えて共通信号配線3が切断さ
れるおそれがあるため、本実施形態ではYAGレーザー
の第4高調波(266nm)等の短波長レーザーを用い
る。
Here, the irradiation of the fundamental wave of the YAG laser or the like may affect the lower layer film and cut the common signal wiring 3. Therefore, in this embodiment, the fourth harmonic (266 nm) of the YAG laser is used. Use a short wavelength laser such as

【0032】これにより、図4に示すように、短絡欠陥
部周辺の絵素電極部分13を除去してピンホール12を
絵素電極5から隔離し、補助容量部の上部電極と下部電
極の短絡を解消することができる。
As a result, as shown in FIG. 4, the pixel electrode portion 13 around the short-circuit defect is removed to isolate the pinhole 12 from the pixel electrode 5, and the upper electrode and the lower electrode of the auxiliary capacitance portion are short-circuited. Can be eliminated.

【0033】なお、補助容量部1の減少は絵素の表示状
態に影響を与えるため、光エネルギーを照射して除去す
る面積は、設計マージン(例えば±5%以下等)を考慮
して、例えば2μm□〜5μm□以内等に調整する必要
がある。
Since the reduction of the auxiliary capacitance unit 1 affects the display state of the picture element, the area to be removed by irradiating light energy is, for example, in consideration of a design margin (for example, ± 5% or less). It is necessary to adjust it to within 2 μm □ to 5 μm □.

【0034】絵素電極5が除去された部分では、対向電
極との間に電位が印加されないので光漏れが発生する
が、共通信号配線3が例えばAlやTi、Ta等の遮光
性のある金属薄膜で形成されるので、問題は生じない。
In the portion where the picture element electrode 5 is removed, light leakage occurs because no potential is applied between the picture element electrode 5 and the counter electrode, but the common signal wiring 3 is made of a light-shielding metal such as Al, Ti, Ta or the like. Since it is formed of a thin film, no problem occurs.

【0035】このように欠陥修正されたアクティブマト
リクス基板と対向基板とを貼り合わせて両基板の隙間に
液晶を注入することにより、本実施形態の液晶パネルが
得られる。
The liquid crystal panel of the present embodiment can be obtained by bonding the active matrix substrate having the defect corrected as described above and the opposing substrate and injecting liquid crystal into a gap between both substrates.

【0036】(実施形態2)本実施形態ではCs on
Gate構造のアクティブマトリクス液晶パネルにつ
いて説明する。
(Embodiment 2) In this embodiment, Cs on
An active matrix liquid crystal panel having a Gate structure will be described.

【0037】図5は実施形態2の液晶パネルの平面図で
あり、図6はそのII−II’線部分の断面図である。
FIG. 5 is a plan view of the liquid crystal panel of the second embodiment, and FIG. 6 is a sectional view taken along the line II-II '.

【0038】この液晶パネルにおいて、アクティブマト
リクス基板は、ガラス基板11上に走査配線2および信
号配線4が互いに交差して設けられ、両配線の交差部近
傍にスイッチング素子6としてTFT(薄膜トランジス
タ)が設けられている。両配線で区切られた矩形状の領
域には絵素電極5がマトリクス状に配置され、スイッチ
ング素子6を介して両配線と接続されている。
In this liquid crystal panel, in the active matrix substrate, a scanning wiring 2 and a signal wiring 4 are provided on a glass substrate 11 so as to intersect with each other, and a TFT (thin film transistor) is provided as a switching element 6 near an intersection of both wirings. Have been. Pixel electrodes 5 are arranged in a matrix in a rectangular area separated by both wirings, and are connected to both wirings via switching elements 6.

【0039】さらに、絵素電極5は、その絵素電極5に
接続された走査配線2と隣接する走査配線2上まで延在
し、絶縁膜7を介してその走査配線2と一部重畳してい
る。この重畳部の走査配線2、絶縁膜7および絵素電極
5から補助容量部1が構成されている。走査配線2は厚
み300nm〜500nm程度の金属薄膜、例えばTa
やAl等からなり、絵素電極5は厚み100nm〜20
0nm程度の透明導電膜、例えばITO等からなり、絶
縁膜7は厚み300nm〜500nm程度の絶縁膜(ゲ
ート絶縁膜)、例えばSiNxやSiOx等からなる。
Further, the pixel electrode 5 extends over the scanning line 2 adjacent to the scanning line 2 connected to the pixel electrode 5 and partially overlaps with the scanning line 2 via the insulating film 7. ing. The scanning line 2, the insulating film 7, and the picture element electrode 5 in the overlapping portion constitute the auxiliary capacitance unit 1. The scanning wiring 2 is a metal thin film having a thickness of about 300 nm to 500 nm, for example, Ta.
, Al or the like, and the pixel electrode 5 has a thickness of 100 nm to 20 nm.
The transparent conductive film of about 0 nm, made of, for example, ITO or the like, the insulating film 7 has a thickness 300nm~500nm about insulating film (gate insulating film) made of, for example, SiN x or SiO x or the like.

【0040】このアクティブマトリクス基板は、ガラス
基板10上に対向電極9が設けられた対向基板と貼り合
わせられ、両基板の間に液晶層8が挟持されている。
This active matrix substrate is bonded to a counter substrate provided with a counter electrode 9 on a glass substrate 10, and a liquid crystal layer 8 is sandwiched between both substrates.

【0041】この液晶パネルにおいて、図6に示すよう
に、絶縁膜7にピンホール12が発生して補助容量部の
走査配線2と絵素電極5とが短絡している場合、走査配
線2には対向電極9に対してマイナスの一定の電位がほ
ぼ常に印加されているため、共通信号配線3に短絡した
絵素電極5と対向電極9との間にはほぼ常に電位が印加
される。よって、現在主流となっているノーマリホワイ
トモード液晶ではほぼ常に黒点として表示され、表示品
位を低下させる欠陥になってしまう。
In this liquid crystal panel, as shown in FIG. 6, when a pinhole 12 is generated in the insulating film 7 to short-circuit the scanning wiring 2 of the auxiliary capacitance portion and the picture element electrode 5, the scanning wiring 2 Since a constant negative potential is almost always applied to the counter electrode 9, a potential is almost always applied between the pixel electrode 5 short-circuited to the common signal wiring 3 and the counter electrode 9. Therefore, the currently mainstream normally white mode liquid crystal is almost always displayed as a black point, which is a defect that degrades the display quality.

【0042】このような補助容量部1の短絡欠陥を従来
のように液晶パネル状態で修正すると、ガラス基板やカ
ラーフィルタ形成部の屈折率や透過率の影響、液晶配向
への影響等のため修正が困難である。また、液晶層に修
正により飛散した破片や異物等が残留して表示不良が生
じるおそれもある。
When such a short-circuit defect of the auxiliary capacitance section 1 is corrected in the state of the liquid crystal panel as in the prior art, it is corrected due to the influence of the refractive index and transmittance of the glass substrate and the color filter forming section, the influence on the liquid crystal alignment, and the like. Is difficult. In addition, there is a possibility that fragments or foreign matter scattered due to the correction remain in the liquid crystal layer and display defects occur.

【0043】そこで、本実施形態では、図7に示すよう
に、対向基板との貼り合わせ前のアクティブマトリクス
基板状態で、短絡欠陥部12に光エネルギーを照射して
欠陥修正を行う。欠陥の検出は、画像処理や抵抗検査等
の手法によって検出することができる。
Therefore, in the present embodiment, as shown in FIG. 7, defect repair is performed by irradiating the short-circuit defect portion 12 with light energy in the state of the active matrix substrate before bonding to the counter substrate. The defect can be detected by a technique such as image processing or resistance test.

【0044】ここで、YAGレーザーの基本波等を照射
すると、下層膜に影響を与えて走査配線2が切断される
おそれがあるため、本実施形態ではYAGレーザーの第
4高調波(266nm)等の短波長レーザーを用いる。
Here, the irradiation of the fundamental wave of the YAG laser or the like may affect the lower layer film and cut the scanning wiring 2. Therefore, in this embodiment, the fourth harmonic (266 nm) of the YAG laser or the like is used. Using a short wavelength laser.

【0045】これにより、図8に示すように、短絡欠陥
部周辺の絵素電極部分13を除去してピンホール12を
絵素電極5から隔離し、補助容量部の上部電極と下部電
極の短絡を解消することができる。
As a result, as shown in FIG. 8, the pixel electrode portion 13 around the short-circuit defect portion is removed to isolate the pinhole 12 from the pixel electrode 5, and the upper electrode and the lower electrode of the auxiliary capacitance portion are short-circuited. Can be eliminated.

【0046】なお、補助容量部1の減少は絵素の表示状
態に影響を与えるため、光エネルギーを照射して除去す
る面積は、設計マージン(例えば±5%以下等)を考慮
して、例えば2μm□〜5μm□以内等に調整する必要
がある。
Since the reduction of the auxiliary capacitance unit 1 affects the display state of the picture element, the area to be removed by irradiating light energy is, for example, in consideration of a design margin (eg, ± 5% or less). It is necessary to adjust it to within 2 μm □ to 5 μm □.

【0047】絵素電極5が除去された部分では、対向電
極との間に電位が印加されないので光漏れが発生する
が、走査配線2が例えばAlやTi、Ta等の遮光性の
ある金属薄膜で形成されるので、問題は生じない。
In the portion where the picture element electrode 5 is removed, light leakage occurs because no potential is applied between the pixel electrode 5 and the counter electrode, but the scanning wiring 2 is made of a light-shielding metal thin film such as Al, Ti or Ta. Therefore, no problem occurs.

【0048】このように欠陥修正されたアクティブマト
リクス基板と対向基板とを貼り合わせて両基板の隙間に
液晶を注入することにより、本実施形態の液晶パネルが
得られる。
The liquid crystal panel of the present embodiment can be obtained by bonding the active matrix substrate having the defect corrected as described above and the opposing substrate and injecting liquid crystal into a gap between both substrates.

【0049】なお、上記実施形態1および実施形態2に
おいて、短絡欠陥部周辺の上部電極を除去して短絡欠陥
部と絵素電極とを隔離する際に、(1)補助容量部1の
減少が表示品位に影響を与えない程度であり、(2)光
漏れが生じないようであれば、短絡部は残してその周囲
部分だけを除去することも可能である。
In the first and second embodiments, when the upper electrode around the short-circuit defect is removed to isolate the short-circuit defect from the pixel electrode, (1) the storage capacitor 1 is reduced. (2) If light leakage does not occur, it is also possible to remove the short-circuited portion and remove only the surrounding portion.

【0050】上記実施形態1及び実施形態2においては
光エネルギーとしてYAGレーザーの第4高調波を用い
たが、下層膜に影響を与えないように条件を設定できる
のであれば他のレーザーを用いてもよい。
Although the fourth harmonic of the YAG laser is used as the light energy in the first and second embodiments, other lasers may be used if conditions can be set so as not to affect the underlying film. Is also good.

【0051】さらに、放射線やプラズマ等、レーザー光
以外の光エネルギーを利用する方法も可能である。
Further, a method utilizing light energy other than laser light, such as radiation or plasma, is also possible.

【0052】[0052]

【発明の効果】以上詳述したように、本発明による場合
には、対向基板と貼り合わせて液晶を注入する前のアク
ティブマトリクス基板の状態で、従来では修正が困難で
あった補助容量部の上部電極と下部電極との短絡欠陥を
解消して正常絵素に修正することができる。よって、修
正不良を後工程に流さないようにして製造ロスを最低限
に抑えることができ、製造歩留りを向上させて大幅なコ
ストダウンを図ることができる。さらに、アクティブマ
トリクス基板の状態で欠陥修正を行うため、修正後の洗
浄が可能であり、液晶層に異物が残留することが無いの
で修正の信頼性を向上することができる。
As described above in detail, according to the present invention, in the state of the active matrix substrate before the liquid crystal is injected by being bonded to the counter substrate, the auxiliary capacitance portion which has been difficult to correct in the prior art is obtained. The short-circuit defect between the upper electrode and the lower electrode can be eliminated and corrected to a normal pixel. Therefore, it is possible to minimize the manufacturing loss by preventing the correction failure from being transmitted to the post-process, thereby improving the manufacturing yield and greatly reducing the cost. Furthermore, since the defect is repaired in the state of the active matrix substrate, cleaning after the repair is possible, and there is no foreign matter remaining in the liquid crystal layer, so that the reliability of the repair can be improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】実施形態1の液晶パネルにおける絵素部の概略
構成を示す平面図である。
FIG. 1 is a plan view illustrating a schematic configuration of a picture element portion in a liquid crystal panel according to a first embodiment.

【図2】実施形態1の液晶パネルにおける補助容量部の
短絡欠陥を説明するための断面図である。
FIG. 2 is a cross-sectional view for explaining a short-circuit defect of an auxiliary capacitance section in the liquid crystal panel of the first embodiment.

【図3】実施形態1のアクティブマトリクス基板の欠陥
修正方法を説明するための断面図である。
FIG. 3 is a cross-sectional view illustrating a method for correcting a defect of the active matrix substrate according to the first embodiment.

【図4】実施形態1のアクティブマトリクス基板の欠陥
修正方法を説明するための断面図である。
FIG. 4 is a cross-sectional view for explaining a defect repair method for the active matrix substrate according to the first embodiment.

【図5】実施形態2の液晶パネルにおける絵素部の概略
構成を示す平面図である。
FIG. 5 is a plan view illustrating a schematic configuration of a picture element portion in a liquid crystal panel according to a second embodiment.

【図6】実施形態2の液晶パネルにおける補助容量部の
短絡欠陥を説明するための断面図である。
FIG. 6 is a cross-sectional view for explaining a short-circuit defect of an auxiliary capacitance section in the liquid crystal panel of the second embodiment.

【図7】実施形態2のアクティブマトリクス基板の欠陥
修正方法を説明するための断面図である。
FIG. 7 is a cross-sectional view illustrating a method for correcting a defect of an active matrix substrate according to a second embodiment.

【図8】実施形態2のアクティブマトリクス基板の欠陥
修正方法を説明するための断面図である。
FIG. 8 is a cross-sectional view illustrating a method for correcting a defect of an active matrix substrate according to the second embodiment.

【符号の説明】[Explanation of symbols]

1 補助容量部 2 走査配線 3 共通信号配線 4 信号配線 5 絵素電極 6 スイッチング素子 7 絶縁膜(ゲート絶縁膜) 8 液晶層 9 対向電極 10、11 ガラス基板 12 短絡欠陥部(ピンホール) 13 レーザー照射により除去される絵素電極部分 DESCRIPTION OF SYMBOLS 1 Auxiliary capacitance part 2 Scanning wiring 3 Common signal wiring 4 Signal wiring 5 Pixel electrode 6 Switching element 7 Insulating film (Gate insulating film) 8 Liquid crystal layer 9 Counter electrode 10, 11 Glass substrate 12 Short circuit defect part (pinhole) 13 Laser Pixel electrode part removed by irradiation

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 2H092 JA26 JA29 JA35 JA42 JA44 JB13 JB23 JB32 JB33 JB38 JB58 JB63 JB64 JB72 KA16 KA18 MA47 NA18 NA25 NA29 NA30 PA06 QA07 5F110 AA27 BB01 DD02 FF02 FF03 HK03 HK04 HL03 HL04 NN73 QQ30 5G435 AA00 AA14 AA17 BB12 CC09 EE33 EE41 HH12 KK05 KK09 KK10  ──────────────────────────────────────────────────続 き Continued on the front page F-term (reference) AA14 AA17 BB12 CC09 EE33 EE41 HH12 KK05 KK09 KK10

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 複数の走査配線および複数の信号配線が
互いに交差するように設けられていると共に、両配線の
交差部近傍に設けられたスイッチング素子を介して両配
線と接続された絵素電極が設けられ、さらに、該絵素電
極の下層に絶縁膜を介して該絵素電極と一部重畳するよ
うに複数の共通信号配線が設けられて、重畳部の共通信
号配線部分を下部電極とし、該重畳部の絵素電極部分を
上部電極とする補助容量部が構成されているアクティブ
マトリクス基板において、該上部電極と該下部電極との
短絡欠陥が生じている場合に欠陥を修正する方法であっ
て、 短絡欠陥部に任意の光エネルギーを照射して該短絡欠陥
部周辺の上部電極を除去するアクティブマトリクス基板
の欠陥修正方法。
A picture element electrode provided with a plurality of scanning lines and a plurality of signal lines intersecting each other, and connected to both lines via a switching element provided near an intersection of the two lines. Further, a plurality of common signal lines are provided below the pixel electrode so as to partially overlap the pixel electrode via an insulating film via an insulating film, and the common signal wiring portion of the overlapping portion is defined as a lower electrode. A method of correcting a short-circuit defect between the upper electrode and the lower electrode in an active matrix substrate in which an auxiliary capacitance portion having the pixel electrode portion of the overlapping portion as an upper electrode is formed. A defect repair method for an active matrix substrate, wherein the short-circuit defect is irradiated with arbitrary light energy to remove an upper electrode around the short-circuit defect.
【請求項2】 複数の走査配線および複数の信号配線が
互いに交差するように設けられていると共に、両配線の
交差部近傍に設けられたスイッチング素子を介して両配
線と接続された絵素電極が設けられ、さらに、該絵素電
極に接続された走査配線に隣接する走査配線と該絵素電
極とが絶縁膜を介して一部重畳されて、重畳部の走査配
線部分を下部電極とし、該重畳部の絵素電極部分を上部
電極とする補助容量部が構成されているアクティブマト
リクス基板において、該上部電極と該下部電極との短絡
欠陥が生じている場合に欠陥を修正する方法であって、 短絡欠陥部に任意の光エネルギーを照射して該短絡欠陥
部周辺の上部電極を除去するアクティブマトリクス基板
の欠陥修正方法。
2. A picture element electrode in which a plurality of scanning lines and a plurality of signal lines are provided so as to intersect with each other, and which are connected to both lines via a switching element provided near an intersection of the two lines. Is provided, further, the scanning wiring adjacent to the scanning wiring connected to the picture element electrode and the picture element electrode are partially overlapped via an insulating film, and the scanning wiring part of the overlapping portion is a lower electrode, In an active matrix substrate in which an auxiliary capacitance portion having the picture element electrode portion of the superposed portion as an upper electrode is formed, if a short-circuit defect occurs between the upper electrode and the lower electrode, the defect is corrected. And irradiating the short-circuit defect with arbitrary light energy to remove an upper electrode around the short-circuit defect.
【請求項3】 前記光エネルギーとしてレーザー光を照
射する請求項1または請求項2に記載のアクティブマト
リクス基板の欠陥修正方法。
3. The method according to claim 1, wherein a laser beam is irradiated as the light energy.
【請求項4】 前記光エネルギーを照射するために発振
波長が360nm以下の紫外線であるレーザーを用いる
請求項3に記載のアクティブマトリクス基板の欠陥修正
方法。
4. The method according to claim 3, wherein a laser having an oscillation wavelength of 360 nm or less is used to irradiate the light energy.
【請求項5】 前記光エネルギーとしてYAGレーザー
の第4高調波を照射する請求項4に記載のアクティブマ
トリクス基板の欠陥修正方法。
5. The method according to claim 4, wherein a fourth harmonic of a YAG laser is applied as the light energy.
【請求項6】 請求項1乃至請求項5のいずれかに記載
のアクティブマトリクス基板の欠陥修正方法により欠陥
を修正した後で、アクティブマトリクス基板と対向基板
とを貼り合わせて両基板の間に液晶を注入する工程を含
む液晶パネルの製造方法。
6. An active matrix substrate and a counter substrate are attached to each other by correcting a defect by the defect repair method for an active matrix substrate according to claim 1. A method for manufacturing a liquid crystal panel including a step of injecting a liquid crystal.
JP16023999A 1999-06-07 1999-06-07 Method for correcting defects in active matrix substrate and method for manufacturing liquid crystal panel Expired - Lifetime JP3778407B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16023999A JP3778407B2 (en) 1999-06-07 1999-06-07 Method for correcting defects in active matrix substrate and method for manufacturing liquid crystal panel

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8013947B2 (en) 2003-03-14 2011-09-06 Hitachi Displays, Ltd. Display device and manufacturing method of the same
US8411215B2 (en) 2007-09-20 2013-04-02 Sharp Kabushiki Kaisha Active matrix substrate, liquid crystal panel, liquid crystal display unit, liquid crystal display device, television receiver, and method for producing active matrix substrate
CN112334824A (en) * 2018-06-18 2021-02-05 凸版印刷株式会社 Light modulation sheet and method for manufacturing light modulation sheet

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8013947B2 (en) 2003-03-14 2011-09-06 Hitachi Displays, Ltd. Display device and manufacturing method of the same
US8411215B2 (en) 2007-09-20 2013-04-02 Sharp Kabushiki Kaisha Active matrix substrate, liquid crystal panel, liquid crystal display unit, liquid crystal display device, television receiver, and method for producing active matrix substrate
CN112334824A (en) * 2018-06-18 2021-02-05 凸版印刷株式会社 Light modulation sheet and method for manufacturing light modulation sheet
CN112334824B (en) * 2018-06-18 2024-05-03 凸版印刷株式会社 Light modulation sheet and manufacturing method thereof

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