JP2000338524A5 - - Google Patents
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- Publication number
- JP2000338524A5 JP2000338524A5 JP1999152047A JP15204799A JP2000338524A5 JP 2000338524 A5 JP2000338524 A5 JP 2000338524A5 JP 1999152047 A JP1999152047 A JP 1999152047A JP 15204799 A JP15204799 A JP 15204799A JP 2000338524 A5 JP2000338524 A5 JP 2000338524A5
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- film
- substrate
- insulating film
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010408 film Substances 0.000 description 271
- 239000000758 substrate Substances 0.000 description 179
- 239000011229 interlayer Substances 0.000 description 86
- 239000004065 semiconductor Substances 0.000 description 86
- 239000010410 layer Substances 0.000 description 83
- 238000000034 method Methods 0.000 description 66
- 239000004973 liquid crystal related substance Substances 0.000 description 64
- 239000011347 resin Substances 0.000 description 42
- 229920005989 resin Polymers 0.000 description 42
- 239000013078 crystal Substances 0.000 description 34
- 239000007788 liquid Substances 0.000 description 34
- 238000004519 manufacturing process Methods 0.000 description 33
- 229910021417 amorphous silicon Inorganic materials 0.000 description 30
- 239000000463 material Substances 0.000 description 23
- 229910052751 metal Inorganic materials 0.000 description 21
- 239000002184 metal Substances 0.000 description 21
- 239000011521 glass Substances 0.000 description 14
- 238000002161 passivation Methods 0.000 description 12
- 238000000206 photolithography Methods 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 5
- 230000031700 light absorption Effects 0.000 description 5
- 238000000059 patterning Methods 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000009125 cardiac resynchronization therapy Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15204799A JP4034470B2 (ja) | 1999-05-31 | 1999-05-31 | 液晶表示装置およびその製造方法 |
| KR1020000008734A KR100723599B1 (ko) | 1999-02-25 | 2000-02-23 | 반사형 액정표시장치 및 그 제조방법과 반사형액정표시장치의 제조용 마스크 |
| TW089103197A TW477904B (en) | 1999-02-25 | 2000-02-24 | Reflection type liquid display device, its manufacturing process, and mask for making such reflection type liquid display device |
| US09/512,107 US6985195B1 (en) | 1999-02-25 | 2000-02-24 | Reflection type liquid crystal display and method for manufacturing the same and mask for manufacturing reflection type liquid crystal display |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15204799A JP4034470B2 (ja) | 1999-05-31 | 1999-05-31 | 液晶表示装置およびその製造方法 |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007042134A Division JP4558752B2 (ja) | 2007-02-22 | 2007-02-22 | 液晶表示装置の製造方法 |
| JP2007194437A Division JP4668247B2 (ja) | 2007-07-26 | 2007-07-26 | 液晶表示装置の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000338524A JP2000338524A (ja) | 2000-12-08 |
| JP2000338524A5 true JP2000338524A5 (enrdf_load_stackoverflow) | 2006-12-14 |
| JP4034470B2 JP4034470B2 (ja) | 2008-01-16 |
Family
ID=15531903
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15204799A Expired - Fee Related JP4034470B2 (ja) | 1999-02-25 | 1999-05-31 | 液晶表示装置およびその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4034470B2 (enrdf_load_stackoverflow) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003057640A (ja) | 2001-06-05 | 2003-02-26 | Seiko Epson Corp | 電気光学装置、電子機器、および電気光学装置の製造方法 |
| KR100483979B1 (ko) | 2001-06-22 | 2005-04-18 | 엔이씨 엘씨디 테크놀로지스, 엘티디. | 반사판, 그 제조방법, 액정표시장치 및 그 제조방법 |
| KR100494703B1 (ko) * | 2001-12-31 | 2005-06-13 | 비오이 하이디스 테크놀로지 주식회사 | 박막트랜지스터 액정표시장치의 제조방법 |
| KR100507283B1 (ko) * | 2002-03-12 | 2005-08-09 | 비오이 하이디스 테크놀로지 주식회사 | 박막트랜지스터 액정표시장치의 제조방법 |
| TW594230B (en) * | 2002-11-12 | 2004-06-21 | Prime View Int Co Ltd | Reflective plate of reflective-type liquid crystal display and method for producing the same |
| US7072012B2 (en) | 2003-05-12 | 2006-07-04 | Lg.Philips Lcd Co., Ltd. | Liquid crystal display device including data line divided into first and second branch lines and method of fabricating the same |
| JP4610992B2 (ja) * | 2004-10-27 | 2011-01-12 | シャープ株式会社 | 液晶表示装置の製造方法 |
| JP2007133442A (ja) * | 2007-02-20 | 2007-05-31 | Mitsubishi Electric Corp | 半透過型表示装置の製造方法 |
-
1999
- 1999-05-31 JP JP15204799A patent/JP4034470B2/ja not_active Expired - Fee Related
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