JP2000301006A5 - - Google Patents

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Publication number
JP2000301006A5
JP2000301006A5 JP1999116477A JP11647799A JP2000301006A5 JP 2000301006 A5 JP2000301006 A5 JP 2000301006A5 JP 1999116477 A JP1999116477 A JP 1999116477A JP 11647799 A JP11647799 A JP 11647799A JP 2000301006 A5 JP2000301006 A5 JP 2000301006A5
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JP
Japan
Prior art keywords
exchange resin
anion exchange
acid
basic anion
weakly basic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999116477A
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Japanese (ja)
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JP2000301006A (en
JP3955162B2 (en
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Publication date
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Priority to JP11647799A priority Critical patent/JP3955162B2/en
Priority claimed from JP11647799A external-priority patent/JP3955162B2/en
Publication of JP2000301006A publication Critical patent/JP2000301006A/en
Publication of JP2000301006A5 publication Critical patent/JP2000301006A5/ja
Application granted granted Critical
Publication of JP3955162B2 publication Critical patent/JP3955162B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【０００２】
【従来の技術】
半導体製造工程やめっき工程等から排出される酸を含む排水から酸を除去するために、再生効率のよいスチレン系共重合体を母体とする弱塩基性陰イオン交換樹脂をアルカリ再生したものが用いられている。特に半導体工場では、酸を含む排水を効率的に処理するために、弱塩基性陰イオン交換樹脂で酸を除去した後、さらに強酸性陽イオン交換樹脂、強塩基性陰イオン交換樹脂で処理し、排水中に含まれるカチオンや弱塩基性陰イオン交換樹脂で除去しきれなかったアニオンとシリカ、炭酸などの弱酸成分を除去処理している。 [0002]
[Prior Art]
In order to remove the acid from the waste water containing the acid discharged from the semiconductor manufacturing process, the plating process, etc., the one obtained by alkali-regenerating the weak base anion exchange resin based on the styrenic copolymer with high regeneration efficiency is used It is done. In particular, in a semiconductor factory, in order to efficiently treat waste water containing acid, after removing the acid with a weak base anion exchange resin, it is further treated with a strongly acidic cation exchange resin and a strongly basic anion exchange resin. A cation contained in the waste water, anions which can not be removed by the weak base anion exchange resin, and weak acid components such as silica and carbonic acid are removed.

Claims (1)

弱塩基性陰イオン交換樹脂が、請求項２ないし６のいずれか１項に記載した調整方法で調整した弱塩基性陰イオン交換樹脂であることを特徴とする請求項９に記載した酸除去装置。The acid removing apparatus according to claim 9 , wherein the weakly basic anion exchange resin is a weakly basic anion exchange resin prepared by the adjustment method according to any one of claims 2 to 6. .
JP11647799A 1999-04-23 1999-04-23 Method and apparatus for removing acid from acid solution Expired - Fee Related JP3955162B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11647799A JP3955162B2 (en) 1999-04-23 1999-04-23 Method and apparatus for removing acid from acid solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11647799A JP3955162B2 (en) 1999-04-23 1999-04-23 Method and apparatus for removing acid from acid solution

Publications (3)

Publication Number Publication Date
JP2000301006A JP2000301006A (en) 2000-10-31
JP2000301006A5 true JP2000301006A5 (en) 2005-06-02
JP3955162B2 JP3955162B2 (en) 2007-08-08

Family

ID=14688085

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11647799A Expired - Fee Related JP3955162B2 (en) 1999-04-23 1999-04-23 Method and apparatus for removing acid from acid solution

Country Status (1)

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JP (1) JP3955162B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4264689B2 (en) * 2001-06-05 2009-05-20 ダイキン工業株式会社 Acid separation method
JP5096907B2 (en) * 2007-12-25 2012-12-12 オルガノ株式会社 Ester purification method

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