JP2000297337A - Aluminum foil for electrolytic capacitor anode, and its manufacture - Google Patents

Aluminum foil for electrolytic capacitor anode, and its manufacture

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Publication number
JP2000297337A
JP2000297337A JP10349499A JP10349499A JP2000297337A JP 2000297337 A JP2000297337 A JP 2000297337A JP 10349499 A JP10349499 A JP 10349499A JP 10349499 A JP10349499 A JP 10349499A JP 2000297337 A JP2000297337 A JP 2000297337A
Authority
JP
Japan
Prior art keywords
content
aluminum foil
ppm
electrolytic capacitor
anode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10349499A
Other languages
Japanese (ja)
Inventor
Kaneshige Yamamoto
兼滋 山本
Tsugio Kataoka
次雄 片岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Foil Manufacturing Co Ltd
Original Assignee
Nippon Foil Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Foil Manufacturing Co Ltd filed Critical Nippon Foil Manufacturing Co Ltd
Priority to JP10349499A priority Critical patent/JP2000297337A/en
Publication of JP2000297337A publication Critical patent/JP2000297337A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide an aluminum foil for electrolytic capacitor anode, hardly causing an etched part at the time of etching. SOLUTION: This aluminum foil for electrolytic capacitor anode contains 5-50 ppm Fe, 6-70 ppm Si, 12-80 ppm Cu, and 0.1-5.0 ppm Pb and (Si content)/(Fe content) and (Cu content)/(Si content) are regulated to 1.1-3.4 and 2.0-4.8, respectively. Aluminum purity is >=99.9%. Such as aluminum foil for electrolytic capacitor anode can be obtained by subjecting the prescribed aluminum ingot to homogenizing treatment, hot rolling, cold rolling, process annealing, finish rolling, and final annealing. Particularly, it is preferable that, as final annealing conditions, holding temperature is regulated to 520-570 deg.C, the total quantity of heat supplied from the beginning of final annealing to its conclusion is regulated to 7.5×103 to 18.0×103 deg.C.h, and the total oxygen concentration in an atmosphere is regulated to <=150 ppm.h.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、エッチング時に均
一溶解しやすい電解コンデンサ陽極用アルミニウム箔及
びその製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an aluminum foil for an anode of an electrolytic capacitor which is easily uniformly dissolved at the time of etching, and a method for producing the same.

【0002】[0002]

【従来の技術】従来より、電解コンデンサ用電極箔(特
に中高圧用陽極箔)は、電解コンデンサ陽極用アルミニ
ウム箔にエッチングを施すことにより、作成されてい
る。エッチングによって、アルミニウム箔表面に多数の
トンネルピットが形成され、アルミニウム箔の表面積が
拡大し、静電容量の高い陽極箔が得られるのである。
2. Description of the Related Art Conventionally, electrode foils for electrolytic capacitors (particularly, anode foils for medium and high pressures) have been produced by etching aluminum foils for electrolytic capacitor anodes. By etching, a large number of tunnel pits are formed on the aluminum foil surface, the surface area of the aluminum foil is enlarged, and an anode foil having a high capacitance can be obtained.

【0003】しかるに、このようなエッチングして得ら
れた陽極箔には、点状光沢が生じることが多く、陽極箔
の製品価値を著しく低下させるということがあった。点
状光沢とは、電解コンデンサ陽極用アルミニウム箔にエ
ッチング処理を施した際、局部的且つ散点状に未エッチ
ング部が生じ、この未エッチング部における光の反射率
が、エッチング部における光の反射率よりも大きいため
に生じるものである。このような点状光沢は、エッチン
グ特性が良好であると言われている電解コンデンサ陽極
用アルミニウム箔についても生じる。
[0003] However, the anode foil obtained by such etching often has a spot-like luster, which sometimes significantly lowers the product value of the anode foil. The point gloss means that when an etching process is performed on an aluminum foil for an anode of an electrolytic capacitor, an unetched portion is locally and scattered, and the reflectance of light in the unetched portion is determined by the reflection of light in the etched portion. It is caused by being larger than the rate. Such dot gloss also occurs in an aluminum foil for an anode of an electrolytic capacitor, which is said to have good etching characteristics.

【0004】例えば、Cu含有量を0.004〜0.0
1%とした電解コンデンサ陽極用アルミニウム箔(特公
昭45−25978号公報)、Si含有量とFe含有量
との比を、一定範囲に規定した電解コンデンサ陽極用ア
ルミニウム箔(特開平1−104743号公報)、Cu
含有量を10〜60ppmとし、In含有量とSn含有
量を5ppm≦In+Sn/1.5≦10ppmとした
電解コンデンサ陽極用アルミニウム箔(特開平3−28
3526号公報)、アルミニウム箔表面層0.1μmに
おけるPb,In又はBiの元素濃度を、アルミニウム
箔表面層を除く他の部位におけるこれらの元素濃度より
も高くした電解コンデンサ陽極用アルミニウム箔(特開
昭57−194516号公報)は、各々、エッチング時
の溶解性が良好で、高静電容量の陽極箔を得ることので
きものである。しかし、いずれの電解コンデンサ陽極用
アルミニウム箔についても、局部的且つ散点状に未エッ
チング部が生じ、点状光沢が生じる。即ち、このような
点状光沢は、静電容量に対して悪影響を及ぼす(即ち、
静電容量が低下する)ということは少ないが、外観が不
良のため、消費者(コンデンサの製造業者)に嫌われる
ということがあったのである。
For example, when the Cu content is 0.004 to 0.0
An aluminum foil for an anode of an electrolytic capacitor having a concentration of 1% (Japanese Patent Publication No. 45-25978), an aluminum foil for an anode of an electrolytic capacitor in which the ratio between the Si content and the Fe content is regulated within a certain range (Japanese Patent Laid-Open No. 1-104743). Gazette), Cu
Aluminum foil for the anode of an electrolytic capacitor having a content of 10 to 60 ppm and an In content and a Sn content of 5 ppm ≦ In + Sn / 1.5 ≦ 10 ppm (JP-A-3-28
No. 3526), an aluminum foil for an anode of an electrolytic capacitor in which the element concentration of Pb, In or Bi in the aluminum foil surface layer 0.1 μm is higher than those in the other parts except the aluminum foil surface layer (Japanese Patent Application Laid-Open JP-A-57-194516) are capable of obtaining an anode foil having good solubility during etching and high capacitance. However, in any of the aluminum foils for the anode of an electrolytic capacitor, an unetched portion is locally and scattered, and a dot gloss is generated. That is, such dot gloss has an adverse effect on capacitance (ie,
It is rare that the capacitance (capacitance decreases), but the appearance is poor, and the consumer (capacitor manufacturer) dislikes it.

【0005】そこで、本件出願人は、特願平11−15
424号において、エッチングしても点状光沢の生じに
くい電解コンデンサ電極用アルミニウムに関する提案を
行った。即ち、この提案内容は、エッチング時にアルミ
ニウム箔表面の特定箇所(例えば、γ−Al23が存在
する箇所)で生じる、Al→Al3+ +3eなる反応
(アノード反応)と、他の特定箇所(例えば、露出Pb
が存在する箇所)で生じる、2H++2e→H2なる反応
(カソード反応)を緩やかに起こさせることによって、
アルミニウム箔表面で均一にエッチングが生じるように
し、もって、未エッチング部が生じにくいようにすると
いうものである。なお、アノード反応とカソード反応と
が過激になると、隣り合う両特定箇所同士でのみ反応が
進行し、隣り合わずに距離を隔てた両特定箇所同士では
反応が進行しにくくなり、この反応が進行しない部分が
未エッチング部になると考えられるのである。
Accordingly, the applicant of the present application has filed Japanese Patent Application No. 11-15 / 1997.
No. 424, a proposal was made on aluminum for an electrolytic capacitor electrode, which is unlikely to produce a dot-like luster even when etched. That is, this proposal includes a reaction (anode reaction) of Al → Al 3+ + 3e (anode reaction) that occurs at a specific location (for example, a location where γ-Al 2 O 3 exists) on the aluminum foil surface during etching, and another specific location. (For example, exposure Pb
), The reaction (cathode reaction) of 2H + + 2e → H 2 , which occurs at
That is, etching is uniformly generated on the surface of the aluminum foil so that an unetched portion is hardly generated. When the anodic reaction and the cathodic reaction are extreme, the reaction proceeds only between the two specific places adjacent to each other, and the reaction hardly progresses between the two specific places that are not adjacent to each other and are separated from each other. It is considered that the part that does not become an unetched part.

【0006】[0006]

【発明が解決しようとする課題】そこで、本発明者等
は、上記した特願平11−15424号に係る提案に関
連するもので、アノード反応を生じさせる特定箇所と、
カソード反応を生じさせる特定箇所とを、バランスよ
く、電解コンデンサ陽極用アルミニウム箔表面に存在さ
せ、もって、エッチングしても未エッチング部(点状光
沢)が生じにくいようにした発明を、特願平11−47
151号として提案した。本発明は、この発明の更に改
良発明に係るもので、電解コンデンサ陽極用アルミニウ
ム箔中における、Si含有量とFe含有量の比、及びC
u含有量とSi含有量の比とを一定範囲に規定すること
により、アノード反応を生じさせる特定箇所と、カソー
ド反応を生じさせる特定箇所とを、バランスよく、電解
コンデンサ陽極用アルミニウム箔表面に存在させるよう
にしたものである。
Therefore, the present inventors relate to the above-mentioned proposal of Japanese Patent Application No. 11-15424, which relates to a specific portion that causes an anode reaction,
The invention of Japanese Patent Application No. Hei 10-284,641 discloses an invention in which a specific portion where a cathode reaction is caused is present in a well-balanced manner on the surface of the aluminum foil for the anode of an electrolytic capacitor so that an unetched portion (dot-like luster) hardly occurs even when etched. 11-47
No. 151 was proposed. The present invention relates to a further improved invention of the present invention, wherein the ratio of the Si content to the Fe content in the aluminum foil for the anode of an electrolytic capacitor, and C
By defining the ratio between the u content and the Si content within a certain range, the specific portion causing the anodic reaction and the specific portion causing the cathodic reaction are well-balanced on the aluminum foil surface for the electrolytic capacitor anode. It is intended to be.

【0007】[0007]

【課題を解決するための手段】即ち、本発明は、アルミ
ニウム純度が99.9%以上で、Fe含有量:5〜50
ppm,Si含有量:6〜70ppm,Cu含有量:1
2〜80ppm,Pb含有量:0.1〜5.0ppmで
あり、Si含有量/Fe含有量が1.1〜3.4で、且
つ、Cu含有量/Si含有量が2.0〜4.8であるこ
とを特徴とする電解コンデンサ陽極用アルミニウム箔及
びその製造方法に関するものである。
That is, according to the present invention, there is provided an aluminum alloy having an aluminum purity of 99.9% or more and an Fe content of 5 to 50%.
ppm, Si content: 6 to 70 ppm, Cu content: 1
2-80 ppm, Pb content: 0.1-5.0 ppm, Si content / Fe content is 1.1-3.4, and Cu content / Si content is 2.0-4. The present invention relates to an aluminum foil for an anode of an electrolytic capacitor and a method for producing the same.

【0008】本発明に係る電解コンデンサ陽極用アルミ
ニウム箔のアルミニウム純度は、99.9%以上であ
る。アルミニウム純度が99.9%未満になると、Fe
含有量及びSi含有量が多くなり、その結果、析出Fe
量及び析出Si量も多くなって、エッチング時に過溶解
を生じやすくなり、アルミニウム箔表面積の拡大が図ら
れないため、好ましくない。なお、本明細書において、
アルミニウム箔中の元素の含有量の%表示は、全て重量
%である。
The aluminum purity of the aluminum foil for an anode of an electrolytic capacitor according to the present invention is 99.9% or more. When the aluminum purity is less than 99.9%, Fe
Content and Si content are increased, and as a result,
The amount of Si and the amount of precipitated Si also increase, which tends to cause overdissolution during etching, and it is not preferable because the surface area of the aluminum foil cannot be increased. In this specification,
All percentages of the contents of the elements in the aluminum foil are% by weight.

【0009】本発明に係る電解コンデンサ陽極用アルミ
ニウム箔において、Fe含有量は5〜50ppmであ
り、特に、7〜25ppmであるのが好ましい。Fe含
有量が5ppm未満となると、Fe析出物の絶対量が少
なくなり、エッチング時における溶解開始点(エッチン
グ開始点)が少なくなって、アルミニウム箔の表面積の
拡大を図りにくくなる。また、Fe含有量が少ないと、
アルミニウム箔自体の強度も弱くなる。一方、Fe含有
量が50ppmを超えると、析出Fe量が多くなって、
エッチング時に過溶解を生じやすくなり、アルミニウム
箔表面積の拡大が図られないため、好ましくない。
In the aluminum foil for an anode of an electrolytic capacitor according to the present invention, the Fe content is 5 to 50 ppm, particularly preferably 7 to 25 ppm. When the Fe content is less than 5 ppm, the absolute amount of Fe precipitates decreases, the melting start point (etching start point) during etching decreases, and it becomes difficult to increase the surface area of the aluminum foil. When the Fe content is small,
The strength of the aluminum foil itself also decreases. On the other hand, when the Fe content exceeds 50 ppm, the amount of precipitated Fe increases,
This is not preferred because overdissolution is likely to occur during etching and the surface area of the aluminum foil cannot be increased.

【0010】Si含有量は6〜70ppmであり、特に
7〜25ppmであるのが好ましい。Si含有量が6p
pm未満となると、Si析出物の絶対量が少なくなり、
エッチング時における溶解開始点(エッチング開始点)
が少なくなって、アルミニウム箔の表面積の拡大を図り
にくくなる。また、Si含有量が少ないと、アルミニウ
ム箔自体の強度も弱くなる。一方、Si含有量が70p
pmを超えると、析出Si量が多くなって、エッチング
時に過溶解を生じやすくなり、アルミニウム箔表面積の
拡大が図られないため、好ましくない。
[0010] The Si content is 6 to 70 ppm, particularly preferably 7 to 25 ppm. 6p Si content
pm, the absolute amount of Si precipitates decreases,
Dissolution start point during etching (etching start point)
And it becomes difficult to increase the surface area of the aluminum foil. Further, when the Si content is small, the strength of the aluminum foil itself is also weakened. On the other hand, when the Si content is 70 p
If it exceeds pm, the amount of precipitated Si increases, and overdissolution is apt to occur during etching, and the surface area of the aluminum foil cannot be increased.

【0011】Cu含有量は12〜80ppmであり、特
に20〜60ppmであるのが好ましい。Cu含有量が
12ppm未満となると、アルミニウム箔表面において
アノード反応が十分に促進されず、エッチング性が不良
となり、アルミニウム箔表面積の拡大が図られないた
め、好ましくない。一方、Cu含有量が80ppmを超
えると、孔食電位が高くなり、アルミニウム箔全体を均
一にエッチング処理しにくくなり、未エッチング部が生
じる恐れがある。
[0011] The Cu content is 12 to 80 ppm, particularly preferably 20 to 60 ppm. If the Cu content is less than 12 ppm, the anodic reaction on the surface of the aluminum foil is not sufficiently promoted, the etching property becomes poor, and the surface area of the aluminum foil cannot be increased. On the other hand, when the Cu content exceeds 80 ppm, the pitting corrosion potential becomes high, making it difficult to uniformly etch the entire aluminum foil, and may cause an unetched portion.

【0012】Pb含有量は0.1〜5.0ppmであ
り、特に0.3〜1.2ppmであるのが好ましい。P
b含有量が0.1ppm未満であると、アルミニウム箔
表面に濃縮するPb量も少なくなり、アルミニウム箔表
面においてカソード反応が十分に促進されず(従って、
カソード反応に対応するアノード反応も促進されず)、
エッチング性不良となり、アルミニウム箔表面積の拡大
が図られないため、好ましくない。Pb含有量が5.0
ppmを超えると、カソード反応が過激となり(従っ
て、カソード反応に対応するアノード反応を過激とな
り)、アルミニウム箔全体を均一にエッチング処理しに
くくなり、未エッチング部が生じる恐れがある。
The Pb content is from 0.1 to 5.0 ppm, particularly preferably from 0.3 to 1.2 ppm. P
When the b content is less than 0.1 ppm, the amount of Pb concentrated on the surface of the aluminum foil also decreases, and the cathode reaction on the surface of the aluminum foil is not sufficiently promoted (accordingly,
The anodic reaction corresponding to the cathodic reaction is not promoted),
This is not preferable because the etching property becomes poor and the surface area of the aluminum foil cannot be increased. Pb content is 5.0
If the content exceeds ppm, the cathodic reaction becomes severe (accordingly, the anodic reaction corresponding to the cathodic reaction becomes severe), and it becomes difficult to uniformly etch the entire aluminum foil, which may cause an unetched portion.

【0013】本発明に係る電解コンデンサ陽極用アルミ
ニウム中において、Si含有量とFe含有量との比、即
ち、Si含有量/Fe含有量は、1.1〜3.4であ
る。Fe含有量に対するSi含有量の比が1.1未満に
なると、エッチング時における開始点が少なくなり、エ
ッチング特性が不良になる恐れがある。即ち、Si含有
量が少ないと、アルミニウム箔の表面皮膜に欠陥を生じ
させ、エッチング開始点となる析出Siが少なくなり、
エッチング特性が不良となる恐れがある。また、Si含
有量が少ないと、Fe含有量が多くてもFeが析出しに
くくなり、このためアノード反応を促進させる析出Fe
が少なくなって、エッチング性不良となり、アルミニウ
ム箔表面積の拡大が図られないため、好ましくない。一
方、Fe含有量に対するSi含有量の比が3.4を超え
ると、アルミニウム箔の表面皮膜中で欠陥部となる析出
Siが多くなると共に、析出Feも相対的に多くなり、
アノード反応が過激となって、アルミニウム箔全体を均
一にエッチング処理しにくくなり、未エッチング部が生
じる恐れがある。
In the aluminum for an anode of an electrolytic capacitor according to the present invention, the ratio of the Si content to the Fe content, that is, the Si content / Fe content is 1.1 to 3.4. If the ratio of the Si content to the Fe content is less than 1.1, the starting point at the time of etching is reduced, and the etching characteristics may be poor. That is, when the Si content is small, a defect occurs in the surface film of the aluminum foil, and the amount of precipitated Si serving as an etching start point decreases,
Etching characteristics may be poor. On the other hand, when the Si content is small, even if the Fe content is large, it is difficult for Fe to precipitate, and therefore, the precipitated Fe that promotes the anode reaction is reduced.
And the etching property is poor, and the surface area of the aluminum foil cannot be increased. On the other hand, when the ratio of the Si content to the Fe content exceeds 3.4, the amount of precipitated Si that becomes a defect in the surface film of the aluminum foil increases, and the amount of precipitated Fe relatively increases.
The anodic reaction becomes excessive, making it difficult to uniformly etch the entire aluminum foil, and may cause an unetched portion.

【0014】Cu含有量とSi含有量との比、即ち、C
u含有量/Si含有量は、2.0〜4.8である。Si
含有量に対するCu含有量の比が2.0未満になると、
Si含有量に対して相対的にCu含有量が少なくなるた
め、エッチング開始点は形成されるものの、アノード反
応が進行しにくくなり、深さの深いエッチングピットが
形成されにくくなり、表面積の拡大を十分に図れない恐
れがある。一方、Si含有量に対するCu含有量の比が
4.8を超えると、Cuがアルミニウム箔表面に過剰に
濃縮しやすくなる。そして、過剰に濃縮した部分は、エ
ッチング時に反応しない複合酸化皮膜となり、この箇所
が未エッチング部として残る恐れがある。
The ratio of the Cu content to the Si content, ie, C
u content / Si content is 2.0 to 4.8. Si
When the ratio of the Cu content to the content is less than 2.0,
Since the Cu content is relatively small with respect to the Si content, an etching start point is formed, but the anodic reaction does not easily proceed, and it becomes difficult for deep etching pits to be formed, thereby increasing the surface area. There is a possibility that it cannot be achieved enough. On the other hand, if the ratio of the Cu content to the Si content exceeds 4.8, Cu tends to be excessively concentrated on the aluminum foil surface. An excessively concentrated portion becomes a composite oxide film that does not react during etching, and this portion may remain as an unetched portion.

【0015】本発明に係る電解コンデンサ陽極用アルミ
ニウム箔は、例えば、以下のようにして製造することが
できる。まず、アルミニウム純度が99.9%以上で、
Fe含有量:5〜50ppm,Si含有量:6〜70p
pm,Cu含有量:12〜80ppm,Pb含有量:
0.1〜5.0ppmであり、Si含有量/Fe含有量
が1.1〜3.4で、且つ、Cu含有量/Si含有量が
2.0〜4.8であるアルミニウム鋳塊を準備する。そ
して、このアルミニウム鋳塊に、通常の圧延アルミニウ
ム箔を製造する要領で、均質化処理,熱間圧延,冷間圧
延,中間焼鈍,仕上圧延及び最終焼鈍を施せばよい。
The aluminum foil for an anode of an electrolytic capacitor according to the present invention can be manufactured, for example, as follows. First, if the aluminum purity is 99.9% or more,
Fe content: 5 to 50 ppm, Si content: 6 to 70 p
pm, Cu content: 12 to 80 ppm, Pb content:
0.1 to 5.0 ppm, an Si ingot having an Si content / Fe content of 1.1 to 3.4, and a Cu content / Si content of 2.0 to 4.8. prepare. Then, this aluminum ingot may be subjected to homogenization treatment, hot rolling, cold rolling, intermediate annealing, finish rolling, and final annealing in the manner of producing a normal rolled aluminum foil.

【0016】この際、最終焼鈍の条件を、以下のように
設定して行うと、最も点状光沢の発生しにくい電解コン
デンサ陽極用アルミニウム箔を得ることができるので好
ましい。即ち、まず、保持温度を520〜570℃とす
ることである。保持温度が520℃未満であると、Pb
がアルミニウム箔表面に濃縮しにくくなり、エッチング
時におけるカソード反応が十分に進行せず、未エッチン
グ部が残る傾向が生じる。一方、保持温度が570℃を
超えると、PbやCuが、アルミニウム箔表面に過剰に
濃縮して、複合酸化皮膜となり、この箇所が未エッチン
グ部として残る傾向が生じる。
At this time, it is preferable to set the conditions of the final annealing as follows, since it is possible to obtain an aluminum foil for an anode of an electrolytic capacitor which is most unlikely to have a spot-like luster. That is, first, the holding temperature is set to 520 to 570 ° C. If the holding temperature is lower than 520 ° C., Pb
Is difficult to concentrate on the surface of the aluminum foil, the cathode reaction during etching does not sufficiently proceed, and an unetched portion tends to remain. On the other hand, if the holding temperature exceeds 570 ° C., Pb and Cu excessively concentrate on the aluminum foil surface to form a composite oxide film, and this portion tends to remain as an unetched portion.

【0017】また、最終焼鈍の開始から終了までの総供
給熱量を7.5×103〜18.0×103℃・h.とす
ることである。ここで、総供給熱量とは、以下のような
意味である。即ち、最終焼鈍は、図1に示す如き、アル
ミニウム箔を常温から所定の温度(保持温度)まで昇温
する昇温過程と、アルミニウム箔を所定の温度に保持す
る保持過程と、アルミニウム箔を所定の温度から常温ま
で冷却する冷却過程とよりなるものである。このとき、
アルミニウム箔に熱が与えられるのは、各過程で与えら
れる。従って、与えられる総熱量は、図1の台形で囲ま
れた斜線部の面積ということになり、これを本発明では
総供給熱量と表現している。つまり、総供給熱量は、保
持温度と保持時間だけで決定されるものではなく、昇温
速度,昇温時間,冷却速度及び冷却時間も含めて決定さ
れるものである。なお、図1に示した台形以外に、二
段,三段の昇温過程及び/又は冷却過程を経るパターン
で最終焼鈍を行っても良いことは、言うまでもない。総
供給熱量が7.5×103℃・h.未満であると、Pb
がアルミニウム箔表面に濃縮しにくくなり、エッチング
時におけるカソード反応が十分に進行せず、未エッチン
グ部が残る傾向が生じる。一方、総供給熱量が18.0
×103℃・h.を超えると、PbやCuが、アルミニ
ウム箔表面に過剰に濃縮して、複合酸化皮膜となり、こ
の箇所が未エッチング部として残る傾向が生じる。
The total amount of heat supplied from the start to the end of the final annealing is 7.5 × 10 3 to 18.0 × 10 3 ° C. · h. It is to be. Here, the total amount of heat supplied has the following meaning. That is, in the final annealing, as shown in FIG. 1, a temperature raising process of raising the temperature of the aluminum foil from room temperature to a predetermined temperature (holding temperature), a holding process of holding the aluminum foil at a predetermined temperature, and a process of holding the aluminum foil at a predetermined temperature. And a cooling process of cooling from the temperature of the above to normal temperature. At this time,
Heat is applied to the aluminum foil in each step. Therefore, the given total amount of heat is the area of the hatched portion surrounded by the trapezoid in FIG. 1, and this is expressed as the total amount of supplied heat in the present invention. That is, the total amount of supplied heat is determined not only by the holding temperature and the holding time but also by the heating rate, the heating time, the cooling rate, and the cooling time. Needless to say, the final annealing may be performed in a pattern that goes through a two-step or three-step heating process and / or a cooling process other than the trapezoid shown in FIG. The total heat supply is 7.5 × 10 3 ° C. · h. If less than Pb
Is difficult to concentrate on the surface of the aluminum foil, the cathode reaction during etching does not sufficiently proceed, and an unetched portion tends to remain. On the other hand, the total heat supply is 18.0.
× 10 3 ° C · h. If Pb or Cu exceeds Pb or Cu, it excessively concentrates on the surface of the aluminum foil to form a composite oxide film, and this portion tends to remain as an unetched portion.

【0018】また、最終焼鈍の開始から終了までの雰囲
気中の総酸素濃度を、150ppm・h.以下とするこ
とである。ここで、雰囲気中の総酸素濃度とは、焼鈍雰
囲気の平均酸素濃度に、焼鈍時間を乗じたものを意味し
ている。また、焼鈍時間とは、昇温時間,保持時間及び
冷却時間を加えたものである。雰囲気中の総酸素濃度が
150ppm・h.を超えると、表面に濃縮するPbや
Cu、或いは析出Feや析出Siが酸化されやすくな
り、エッチング性に悪影響を与え、未エッチング部が残
る傾向が生じる。
The total oxygen concentration in the atmosphere from the start to the end of the final annealing is 150 ppm · h. It is as follows. Here, the total oxygen concentration in the atmosphere means the average oxygen concentration in the annealing atmosphere multiplied by the annealing time. The annealing time is the sum of the temperature raising time, the holding time, and the cooling time. When the total oxygen concentration in the atmosphere is 150 ppm · h. If it exceeds, Pb or Cu concentrated on the surface, or precipitated Fe or Si is likely to be oxidized, adversely affecting the etching property, and the unetched portion tends to remain.

【0019】[0019]

【実施例】実施例1〜12、参考例及び比較例1〜9 厚さ500mmで、表1に示す含有量のFe,Si,C
u,Pbを含むアルミニウム純度99.99%のアルミ
ニウム鋳塊を準備した。この鋳塊に、560℃×5h.
で均質化処理を施した後、熱間圧延を直ちに行い、厚さ
6mmのアルミニウム板を得た。このアルミニウム板
に、冷間圧延、中間焼鈍(220℃×15h.)、仕上
圧延を施し、アルカリ洗浄を行った。この後、最終焼鈍
を、アルゴンガス雰囲気下において、以下の条件で行っ
た。即ち、平均昇温速度30℃/h.で、保持温度55
0℃,保持時間5時間とし、平均冷却速度30℃/h.
とした。従って、最終焼鈍における総供給熱量は、1
2.0×103℃・h.であった。また、最終焼鈍の雰
囲気中における平均酸素濃度は2.98ppmであり、
焼鈍時間は40.3時間であった。従って、雰囲気中の
総酸素濃度は120ppm・h.であった。以上のよう
にして、厚さ0.1mmの電解コンデンサ陽極用アルミ
ニウム箔を得た。
EXAMPLES Examples 1 to 12, Reference Examples and Comparative Examples 1 to 9 Fe, Si, and C having a thickness of 500 mm and the contents shown in Table 1.
An aluminum ingot having an aluminum purity of 99.99% containing u and Pb was prepared. The ingot was added at 560 ° C. × 5 h.
After hot-rolling, hot rolling was immediately performed to obtain an aluminum plate having a thickness of 6 mm. This aluminum plate was subjected to cold rolling, intermediate annealing (220 ° C. × 15 h.), Finish rolling, and alkali cleaning. Thereafter, final annealing was performed under an argon gas atmosphere under the following conditions. That is, the average heating rate is 30 ° C./h. And the holding temperature 55
0 ° C., holding time 5 hours, average cooling rate 30 ° C./h.
And Therefore, the total heat supply in the final annealing is 1
2.0 × 10 3 ° C. · h. Met. The average oxygen concentration in the final annealing atmosphere was 2.98 ppm,
The annealing time was 40.3 hours. Therefore, the total oxygen concentration in the atmosphere is 120 ppm · h. Met. Thus, an aluminum foil for an anode of an electrolytic capacitor having a thickness of 0.1 mm was obtained.

【0020】以上の方法で得られた各電解コンデンサ陽
極用アルミニウム箔について、以下の条件でエッチング
処理及び化成処理を施した。 〔エッチング処理〕:50℃の0.1%NaOH水溶液
中に、各電解コンデンサ陽極用アルミニウム箔を、60
秒間浸漬して前処理した。その後、85℃の1モル濃度
HCl+3モル濃度H2SO4水溶液中に、アルミニウム
箔を浸漬して、DC0.2A/cm2の電流密度で4分
間、電解エッチングを行った。次いで、前記1モル濃度
HCl+3モル濃度H2SO4水溶液中に、電解エッチン
グ後のアルミニウム箔を10分間浸漬して、エッチング
処理を終えた。なお、水溶液中におけるモル濃度は、m
ol/lのことを意味している。 〔化成処理〕:上記エッチング処理を施した後の各アル
ミニウム箔を、EIAJ法に則って、対向電極をSUS
304として、化成処理を375Vf.で行った。
The aluminum foil for the anode of each electrolytic capacitor obtained by the above method was subjected to an etching treatment and a chemical treatment under the following conditions. [Etching treatment]: The aluminum foil for the anode of each electrolytic capacitor was placed in a 0.1% NaOH aqueous solution at 50 ° C. for 60 hours.
It was immersed for 2 seconds for pretreatment. Thereafter, the aluminum foil was immersed in a 1 molar HCl + 3 molar H 2 SO 4 aqueous solution at 85 ° C., and electrolytic etching was performed at a current density of DC 0.2 A / cm 2 for 4 minutes. Next, the aluminum foil after electrolytic etching was immersed in the above-mentioned 1 molar HCl + 3 molar concentration H 2 SO 4 aqueous solution for 10 minutes to complete the etching treatment. The molar concentration in the aqueous solution is m
ol / l. [Chemical conversion treatment]: Each aluminum foil after the above-mentioned etching treatment was treated with a counter electrode of SUS according to the EIAJ method.
304, the chemical conversion treatment was performed at 375 Vf. I went in.

【0021】そして、エッチング処理した後の各箔につ
いて、以下の方法で未エッチング部の面積率を測定し、
表1に示した。未エッチング部の面積率が小さい方が、
表面が均一にエッチングされていることを意味し、点状
光沢が起きにくいものである。 〔未エッチング部の面積率〕:エッチング処理を終えた
箔を、光学顕微鏡にて37.5倍で、10視野撮影し
た。そして、各写真を画像解析装置を用いて、画像を二
値化し、各々の未エッチング部の面積率を求め、その平
均値を未エッチング部の面積率として表2に示した。
Then, for each foil after the etching treatment, the area ratio of the unetched portion was measured by the following method.
The results are shown in Table 1. The smaller the area ratio of the unetched part,
This means that the surface is uniformly etched, and it is difficult for spot gloss to occur. [Area ratio of unetched portion]: The foil after the etching treatment was photographed with an optical microscope at 37.5 times in 10 visual fields. Each photograph was binarized into an image using an image analyzer, the area ratio of each unetched portion was determined, and the average value was shown in Table 2 as the area ratio of the unetched portion.

【0022】エッチング処理及び化成処理を終えた、各
電解コンデンサ陽極用アルミニウム箔について、以下の
条件で静電容量(μF/cm2)を測定した。そして、
参考例に係る方法で得られた電解コンデンサ陽極用アル
ミニウム箔の静電容量を基準(100%)として、これ
との相対比較で、各電解コンデンサ陽極用アルミニウム
箔の静電容量を%表示し、これを表1に示した。 〔静電容量〕:上記エッチング処理及び化成処理を終え
た各箔から、巾10mm×長さ50mmの大きさの試料
箔を、各々1枚採取した。そして、この試料箔を、30
℃の13%五硼酸アンモニウム水溶液中に浸漬し、対向
電極を静電容量が40000μF以上のエッチドアルミ
ニウム箔として、120Hzの直列等価回路でLCRメ
ーターを用いて、静電容量(μF/cm2)を測定し
た。
The capacitance (μF / cm 2 ) of the aluminum foil for the anode of each electrolytic capacitor after the etching and chemical conversion treatments was measured under the following conditions. And
On the basis of the capacitance of the aluminum foil for an electrolytic capacitor anode obtained by the method according to the reference example as a reference (100%), the capacitance of each aluminum foil for an anode of an electrolytic capacitor is expressed in% by relative comparison, This is shown in Table 1. [Capacitance]: One sample foil having a size of 10 mm in width and 50 mm in length was sampled from each of the foils after the above-mentioned etching and chemical conversion treatments. Then, this sample foil is
The electrode was immersed in a 13% aqueous solution of ammonium pentaborate at 13 ° C., and the counter electrode was an etched aluminum foil having a capacitance of 40,000 μF or more, and a capacitance (μF / cm 2 ) using an LCR meter in a 120 Hz series equivalent circuit Was measured.

【0023】[0023]

【表1】 [Table 1]

【0024】表1に示した結果から明らかなように、実
施例1〜12に係る電解コンデンサ陽極用アルミニウム
箔を用いれば、比較例1〜9に係る電解コンデンサ陽極
用アルミニウム箔の場合に比べて、Fe含有量,Si含
有量,Cu含有量,Pb含有量が特定の範囲内にあり、
且つ、Si含有量/Fe含有量,Cu含有量/Si含有
量が特定の範囲内にあるので、高静電容量で未エッチン
グ部が少ない陽極箔を得ることができる。
As is evident from the results shown in Table 1, the use of the aluminum foil for the anode of electrolytic capacitors according to Examples 1 to 12 is more effective than the case of the aluminum foil for the anode of electrolytic capacitors according to Comparative Examples 1 to 9. , Fe content, Si content, Cu content, Pb content are within specific ranges,
In addition, since the Si content / Fe content and the Cu content / Si content are within specific ranges, it is possible to obtain an anode foil having high capacitance and few unetched portions.

【0025】実施例13〜24 実施例1で用いたアルミニウム鋳塊に、実施例1と同一
の条件で、均質化処理,熱間圧延,冷間圧延,中間焼
鈍,仕上圧延及びアルカリ洗浄を施した。この後、最終
焼鈍を、アルゴンガス雰囲気下において、表2の条件で
行い、厚さ0.1mmの電解コンデンサ陽極用アルミニ
ウム箔を得た。
Examples 13 to 24 The aluminum ingot used in Example 1 was subjected to homogenization, hot rolling, cold rolling, intermediate annealing, finish rolling, and alkali washing under the same conditions as in Example 1. did. Thereafter, the final annealing was performed under an argon gas atmosphere under the conditions shown in Table 2 to obtain an aluminum foil for an anode of an electrolytic capacitor having a thickness of 0.1 mm.

【0026】そして、実施例1と同一の条件で、エッチ
ング処理及び化成処理を施し、実施例1と同様の方法
で、未エッチングの面積率及び静電容量(μF/c
2)を測定し、その結果を表2に示した。なお、静電
容量については、実施例19に係るものの静電容量を基
準(100%)として、これとの相対比較で、各電解コ
ンデンサ陽極用アルミニウム箔の静電容量を%表示し、
これを表2に示した。
Then, an etching treatment and a chemical conversion treatment are performed under the same conditions as in the first embodiment, and the unetched area ratio and the capacitance (μF / c) are obtained in the same manner as in the first embodiment.
m 2 ) was measured, and the results are shown in Table 2. With respect to the capacitance, the capacitance of the aluminum foil for the anode of each electrolytic capacitor is expressed in% by relative comparison with the capacitance of Example 19 as a reference (100%),
This is shown in Table 2.

【0027】[0027]

【表2】 [Table 2]

【0028】表2に示した結果から明らかなように、実
施例13〜18に係る方法で得られた電解コンデンサ陽
極用アルミニウム箔を用いれば、実施例19〜24に係
る方法で得られた電解コンデンサ陽極用アルミニウム箔
の場合に比べて、最終焼鈍条件が好適範囲に設定されて
いるので、高静電容量で未エッチング部が少ない陽極箔
を得ることができる。
As is evident from the results shown in Table 2, when the aluminum foil for an anode of an electrolytic capacitor obtained by the method of Examples 13 to 18 was used, the electrolytic solution obtained by the method of Examples 19 to 24 was used. Since the final annealing conditions are set in a preferable range as compared with the case of the aluminum foil for a capacitor anode, it is possible to obtain an anode foil having a high capacitance and a small number of unetched portions.

【0029】[0029]

【作用】本発明に係る電解コンデンサ陽極用アルミニウ
ム箔を、エッチング処理して陽極箔を作成した場合、未
エッチング部の面積率が少なくなる確定的な作用は、不
明である。しかしながら、アルミニウム箔中のFe含有
量,Si含有量,Cu含有量,Pb含有量を特定範囲内
にすると共に、Si含有量/Fe含有量,Cu含有量/
Si含有量を特定範囲内にすることによって、エッチン
グ時において、アノード反応を生じさせる特定箇所と、
カソード反応を生じさせる特定箇所とを、バランスよ
く、電解コンデンサ陽極用アルミニウム箔表面に存在さ
せることができ、この結果、未エッチング部が生じにく
くなると、本発明者等は推定している。
When the aluminum foil for an anode of an electrolytic capacitor according to the present invention is etched to form an anode foil, the definite effect of reducing the area ratio of the unetched portion is unknown. However, the Fe content, the Si content, the Cu content, and the Pb content in the aluminum foil are kept within specific ranges, and the Si content / Fe content, Cu content /
By setting the Si content within a specific range, at the time of etching, a specific portion causing an anodic reaction,
The present inventors presume that a specific location where a cathode reaction occurs can be present in a well-balanced manner on the surface of the aluminum foil for the anode of an electrolytic capacitor, and as a result, an unetched portion hardly occurs.

【0030】[0030]

【発明の効果】以上のとおり、本発明に係る電解コンデ
ンサ陽極用アルミニウム箔を用いれば、未エッチング部
の面積率が少なくなり、全体に均一にエッチングされる
ため、点状光沢の少ない陽極箔が得られ、陽極箔の商品
価値が高められるという効果を奏する。
As described above, when the aluminum foil for an anode of an electrolytic capacitor according to the present invention is used, the area ratio of the unetched portion is reduced and the entire surface is uniformly etched. This has the effect of increasing the commercial value of the anode foil.

【図面の簡単な説明】[Brief description of the drawings]

【図1】最終焼鈍における温度変化を示す図の一例であ
る。
FIG. 1 is an example of a diagram showing a temperature change in final annealing.

フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C22F 1/00 685 C22F 1/00 685Z 686 686B 691 691Z 691B 1/02 1/02 1/04 1/04 K H01G 9/055 H01G 9/04 337 Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat II (reference) C22F 1/00 685 C22F 1/00 685Z 686 686B 691 691Z 691B 1/02 1/02 1/04 1/04 K H01G 9 / 055 H01G 9/04 337

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 アルミニウム純度が99.9%以上で、
Fe含有量:5〜50ppm,Si含有量:6〜70p
pm,Cu含有量:12〜80ppm,Pb含有量:
0.1〜5.0ppmであり、Si含有量/Fe含有量
が1.1〜3.4で、且つ、Cu含有量/Si含有量が
2.0〜4.8であることを特徴とする電解コンデンサ
陽極用アルミニウム箔。
(1) an aluminum purity of 99.9% or more;
Fe content: 5 to 50 ppm, Si content: 6 to 70 p
pm, Cu content: 12 to 80 ppm, Pb content:
0.1-5.0 ppm, and Si content / Fe content is 1.1-3.4, and Cu content / Si content is 2.0-4.8. Aluminum foil for the anode of electrolytic capacitors.
【請求項2】 アルミニウム純度が99.9%以上で、
Fe含有量:5〜50ppm,Si含有量:6〜70p
pm,Cu含有量:12〜80ppm,Pb含有量:
0.1〜5.0ppmであり、Si含有量/Fe含有量
が1.1〜3.4で、且つ、Cu含有量/Si含有量が
2.0〜4.8であるアルミニウム鋳塊に、均質化処
理,熱間圧延,冷間圧延,中間焼鈍,仕上圧延及び最終
焼鈍を施して、電解コンデンサ陽極用アルミニウム箔を
製造する方法であって、該最終焼鈍の保持温度は520
〜570℃の範囲であると共に、該最終焼鈍の開始から
終了までの総供給熱量が7.5×103〜18.0×1
3℃・h.であり、雰囲気中の総酸素濃度が150p
pm・h.以下であることを特徴とする電解コンデンサ
陽極用アルミニウム箔の製造方法。
2. The method according to claim 1, wherein the aluminum purity is 99.9% or more.
Fe content: 5 to 50 ppm, Si content: 6 to 70 p
pm, Cu content: 12 to 80 ppm, Pb content:
0.1 to 5.0 ppm, and an aluminum ingot having a Si content / Fe content of 1.1 to 3.4 and a Cu content / Si content of 2.0 to 4.8. A homogenizing treatment, hot rolling, cold rolling, intermediate annealing, finish rolling and final annealing to produce an aluminum foil for an anode of an electrolytic capacitor, wherein the final annealing has a holding temperature of 520.
570 ° C., and the total heat supply from the start to the end of the final annealing is 7.5 × 10 3 to 18.0 × 1.
0 3 ℃ · h. And the total oxygen concentration in the atmosphere is 150p
pm · h. A method for producing an aluminum foil for an anode of an electrolytic capacitor, characterized by the following.
JP10349499A 1999-04-12 1999-04-12 Aluminum foil for electrolytic capacitor anode, and its manufacture Pending JP2000297337A (en)

Priority Applications (1)

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Publication Number Publication Date
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ID=14355557

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Country Link
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006152437A (en) * 2004-10-29 2006-06-15 Showa Denko Kk Method of manufacturing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, anode material for aluminum electrolytic capacitor, and aluminum electrolytic capacitor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006152437A (en) * 2004-10-29 2006-06-15 Showa Denko Kk Method of manufacturing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, anode material for aluminum electrolytic capacitor, and aluminum electrolytic capacitor

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