JP2000294483A - Substrate treating device and recording medium recording control program - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent erroneous input of the contents of treatments and, at the same time, to control the treatment by one side of external devices on line. SOLUTION: An in-line controller 1 receives the treatment information set to a main controller 3 and an exposing machine 30 together with recipe flow information. At the time of starting a treatment, the treatment information is displayed on the screen of an in-line panel 2, and, when a worker selects one of the displayed treatment information, the selected treatment information is inputted. The controller 1 gives the substrate treating time received from the exposing machine 20 to the main controller 3. The controller 3 decides the substrate treating time of a treating section 5 based on the given substrate treating time. The in-line controller 1 successively instructs the main controller 3 and exposing machine 20 to start the treatment based on the inputted treatment information and the recipe flow information.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a substrate processing apparatus and a recording medium on which a control program is recorded.

[0002]

2. Description of the Related Art A substrate processing apparatus is used to perform various processes on substrates such as a semiconductor wafer, a glass substrate for a liquid crystal display, a glass substrate for a photomask, and a glass substrate for an optical disk. For example, in a semiconductor device manufacturing process, a substrate processing apparatus in which each of a series of processes is unitized and a plurality of units are integrated is used to increase production efficiency.

In a photolithography process, various types of substrate processing before and after exposure processing are performed in a substrate processing apparatus.
Exposure processing is performed by an exposure machine. In this case, the substrate processing device includes a rotary coating device (spin coater) for performing a coating process of a photoresist, a rotary developing device (spin developer) for performing a developing process, and a substrate heat treatment device (a bake plate) for performing a heating process and a cooling process. ), Etc.
A substrate transfer device that transfers the substrate between the processing devices is provided.

In the photolithography process, first, substrate processing before exposure processing is performed in a substrate processing apparatus, then exposure processing is performed in an exposure machine, and thereafter, substrate processing after exposure processing is performed again in a substrate processing apparatus. Done. The start timing of the processing of the substrate processing apparatus and the exposure apparatus is centrally managed by the inline controller.

FIG. 6 is a block diagram showing a connection between a conventional substrate processing apparatus, an inline controller and an exposure machine.

As shown in FIG. 6, a substrate processing apparatus 100 and an exposure machine 200 are connected to an inline controller 300. At the start of the processing, a cassette for accommodating a plurality of substrates is carried into the substrate processing apparatus 100. An operator inputs processing information indicating processing contents of the substrate processing apparatus 100 and the exposure apparatus 200 from a screen of a main panel of the substrate processing apparatus 100.

[0007] This processing information includes a recipe number for specifying a recipe in the processing of the substrate processing apparatus 100 and the exposure machine 2.
A reticle name for specifying the reticle used in the process 00 and a job name for specifying the job are included. Here, the recipe indicates processing contents such as processing conditions and processing procedures in the substrate processing apparatus 100. The reticle is a photomask used in the exposure device 200, and the job indicates exposure conditions in the exposure device 200.

When the operator instructs the start of the processing from the main panel screen of the substrate processing apparatus 100, the input processing information is transferred to the in-line controller 300. The inline controller 300 sequentially instructs the substrate processing apparatus 100 and the exposing machine 200 to start processing based on the processing information transferred from the substrate processing apparatus 100.

In this way, the substrates in the cassette carried into the substrate processing apparatus 100 are processed by the substrate processing apparatus 100, then processed by the exposure device 200, further processed by the substrate processing apparatus 100, and processed. The substrate is stored in the cassette. Thereafter, the cassette in which the processed substrates are stored is carried out of the substrate processing apparatus 100.

[0010]

As described above, at the start of processing, an operator inputs processing information regarding the exposure apparatus 200 together with processing information regarding the substrate processing apparatus 100 from the screen of the main panel of the substrate processing apparatus 100. . When inputting processing information regarding the exposure device 200, it is necessary to input a reticle name and a job name in long character strings. In this case, if the reticle name or the job name is incorrect, the exposure apparatus 200 stops during processing.

The in-line controller 300 is
Assuming that both the substrate processing apparatus 100 and the exposure apparatus 200 perform the processing, the start of the processing is instructed to the substrate processing apparatus 100 and the exposure apparatus 200. Therefore, the recipe in the substrate processing apparatus 100 must be a process that always passes through the exposure device 200. Therefore, the substrate processing apparatus 100
In the case where only the coating process or the developing process is performed, neither the substrate processing apparatus 100 nor the exposure machine 200 can be operated by online control by the inline controller 300. Therefore, it is necessary to operate the substrate processing apparatus 100 under off-line control. In this case, it is necessary to switch between online control and offline control after all the substrates being processed by the substrate processing apparatus 100 are unloaded. Since a waiting time is required when switching between such online control and offline control, the overall throughput of substrate processing is reduced.

Further, in the substrate processing apparatus 100,
The substrate processing apparatus 1 is set so that the processing time of each substrate is the same.
Within 00, time management such as processing time, transport time, and standby time is performed for each substrate. However, the exposure machine 20
At 0, no time management is performed to make the processing time of each substrate the same. Therefore, it is difficult to perform time management so that the processing time of each substrate becomes the same as the entire processing of the substrate processing apparatus 100 and the exposure apparatus 200.

An object of the present invention is to provide a substrate processing apparatus in which an input error of processing contents is prevented and a recording medium recording a control program for the apparatus.

Another object of the present invention is to provide a substrate processing apparatus capable of performing processing by one of a substrate processing apparatus and an external device by online control, and a recording medium on which a control program is recorded.

Still another object of the present invention is to provide a substrate processing apparatus capable of performing overall time management including a substrate processing apparatus and an external device for each substrate, and a recording medium on which a control program is recorded. It is.

[0016]

Means for Solving the Problems and Effects of the Invention (1)
A first aspect of the present invention is a substrate processing apparatus connectable to an external device, the processing unit performing processing on a substrate,
A first control unit for controlling the processing by the processing unit, setting means for presetting processing information indicating processing contents of the substrate in the first control unit, and processing information set by the setting means in the first control unit. A second controller that receives processing information set in the external device from the controller and receives processing information set in the external device; and a second controller that displays processing information received from the first controller and the external device. Selecting means for selecting the selected processing information, wherein the second control unit sequentially instructs the first control unit and the external device to start processing based on the processing information selected by the selecting means. It is.

In the substrate processing apparatus according to the present invention, the setting information sets in advance the processing information indicating the processing content of the substrate in the first control unit. The second control unit receives the processing information set by the setting unit from the first control unit and receives the processing content set in the external device from the external device. The processing information received by the second control unit from the first control unit and the external device is displayed by the selection unit. When any of the processing information displayed by the selection means is selected, the second control unit sequentially instructs the first control unit and the external device to start processing based on the selected processing information. Thereby, the processing is performed on the substrate by the processing unit, and the processing is performed on the substrate by the external device.

As described above, the preset processing information is displayed on the first control unit and the external device, and the processing information can be inputted to the second control unit by selecting the displayed processing information. Therefore, an input error of the processing content is prevented.

(2) Second invention In a substrate processing apparatus according to a second invention, in the configuration of the substrate processing apparatus according to the first invention, the setting means indicates a substrate processing path to the first control unit. The route information is further set and the second
Of the route information set by the setting means
And sequentially instructs one or both of the first control unit and the external device to start processing based on the processing information selected by the selection unit and the path information received from the first control unit. is there.

In this case, the path information indicating the processing path of the substrate is further set in the first controller by the setting means. When the second control unit receives the path information set by the setting unit from the first control unit, based on the processing information selected by the selection unit and the received path information, the second control unit and the external device One or both are sequentially instructed to start processing.

If the path information indicates that the substrate passes only through the processing section, the second control section instructs only the first control section to start processing. On the other hand, if the path information indicates that the substrate passes only through the external device, the second control unit instructs only the external device to start processing. As described above, since only the processing in the processing unit or only the processing in the external device can be performed by the online control by the second control unit, the time for switching between the online control and the offline control is not required. Therefore, the throughput in the entire substrate processing is improved.

(3) Third Invention A substrate processing apparatus according to a third aspect of the present invention is the substrate processing apparatus according to the first or second aspect, wherein the second control unit is configured to process the substrate from an external device. Receiving time information relating to time, and providing the received time information to the first control unit; the first control unit determines the processing time of the substrate in the processing unit based on the time information provided from the second control unit; The second control unit calculates the processing information selected by the selecting unit and the first processing information.
The first control unit and the external device are sequentially instructed to start processing based on the processing time calculated by the control unit.

In this case, when the second control unit receives the time information on the processing time of the substrate from the external device, it gives the received time information to the first control unit. Thereby, the first control unit calculates the processing time of the substrate in the processing unit based on the time information given from the second control unit. The second control unit sequentially instructs the first control unit and the external device to start processing based on the processing information selected by the selection unit and the processing time calculated by the first control unit.

As described above, the second control unit can calculate the processing time of the substrate in the processing unit in consideration of the processing time of the substrate in the external device. It is possible to manage the entire time including the time.

(4) Fourth Invention A substrate processing apparatus according to a fourth invention is a substrate processing apparatus that can be connected to an external device, and includes a processing unit for processing a substrate,
A first control unit for controlling the processing by the processing unit, setting means for setting the path information indicating the processing path of the substrate in the first control unit, and the path information set by the setting means in the first control unit.
A second control unit received from the control unit, and input means for inputting processing information indicating processing content to the second control unit, wherein the second control unit is configured to receive the processing information input by the input means. And sequentially instructs one or both of the first control unit and the external device to start processing based on the path information received from the first control unit.

In the substrate processing apparatus according to the present invention, path information indicating the processing path of the substrate is set in the first control unit by the setting means. The second control unit receives the path information set by the setting unit from the first control unit. When processing information indicating the processing content is input to the second control unit by the input unit, the second control unit performs the first processing based on the input processing information and the path information received from the first control unit. One or both of the control unit and the external device are sequentially instructed to start processing.

If the path information indicates that the substrate passes only through the processing section, the second control section instructs only the first control section to start processing. On the other hand, if the path information indicates that the substrate passes only through the external device, the second control unit instructs only the external device to start processing. As described above, since only the processing in the processing unit or only the processing in the external device can be performed by the online control by the second control unit, the time for switching between the online control and the offline control is not required. Therefore, the throughput in the entire substrate processing is improved.

(5) Fifth Invention In a substrate processing apparatus according to a fifth aspect of the present invention, in the configuration of the substrate processing apparatus according to the fourth aspect of the present invention, the second control unit may control the time related to the processing time of the substrate from an external device. Receiving the information, giving the received time information to the first control unit, the first control unit calculates the processing time of the substrate in the processing unit based on the time information given from the second control unit, The second control unit is configured to control the first control unit and the external device based on the processing information input by the input unit, the path information received from the first control unit, and the processing time calculated by the first control unit. One or both are sequentially instructed to start processing.

In this case, when the second control unit receives the time information on the processing time of the substrate from the external device, it gives the received time information to the first control unit. Thereby, the first control unit calculates the processing time of the substrate in the processing unit based on the time information given from the second control unit. The second control unit is configured to execute the processing calculated by the first control unit based on the input processing information, the path information received from the first control unit, and the processing time calculated by the first control unit. The start of processing is sequentially instructed to the first control unit and the external device based on the time.

As described above, the second control unit can calculate the processing time of the substrate in the processing unit in consideration of the processing time of the substrate in the external device. It is possible to manage the entire time including the time.

(6) Sixth Invention A substrate processing apparatus according to a sixth invention is a substrate processing apparatus that can be connected to an external device, and includes a processing unit for processing a substrate,
A first control unit that controls processing by the processing unit, a second control unit that receives time information on a processing time of the substrate from an external device, and provides the received time information to the first control unit, and a second control unit. An input unit for inputting processing information indicating processing contents to the unit, wherein the first control unit calculates a processing time of the substrate in the processing unit based on the time information given from the second control unit The second control unit sequentially instructs the first control unit and the external device to start processing based on the processing information input by the input unit and the processing time calculated by the first control unit. is there.

In the substrate processing apparatus according to the present invention, when the second control unit receives time information on the processing time of the substrate from the external device, the second control unit supplies the received time information to the first control unit. Thereby, the first control unit calculates the processing time of the substrate in the processing unit based on the time information given from the second control unit. The second control unit sequentially instructs the first control unit and the external device to start processing based on the processing information input by the input unit and the processing time calculated by the first control unit.

As described above, the second control unit can calculate the processing time of the substrate in the processing unit in consideration of the processing time of the substrate in the external device. It is possible to manage the entire time including the time.

(7) Seventh Invention A substrate processing apparatus according to a seventh invention is the substrate processing apparatus according to any one of the first to sixth inventions, wherein the external device is an exposure machine, Includes a coating device for applying a processing liquid to a substrate and a developing device for performing a developing process on the substrate.

In this case, after the processing liquid is applied to the substrate in the processing section, the exposure processing is performed in the exposure device, and the developing processing is performed in the processing section.

(8) Eighth Invention A recording medium on which a control program according to the eighth invention is recorded has a processing section for processing a substrate, a first control section for controlling the processing by the processing section, and a second processing section. And a control program for controlling the first control unit and the external device in the substrate processing apparatus that includes the first control unit and is connectable to the external device. Receiving the processing information indicating the processing content set in the external device and the processing information set in the external device; displaying the processing information received from the first control unit and the external device in a selectable manner; And sequentially instructing the first control unit and the external device to start processing based on the processing information selected among the above.

According to the recording medium on which the control program according to the present invention is recorded, the second control unit receives the processing information indicating the processing contents set in the first control unit from the first control unit, and The processing information set in the device is received from an external device. The second controller displays the processing information received from the first controller and the external device in a selectable manner.
When any of the displayed processing information is selected, the second control unit sequentially instructs the first control unit and the external device to start processing based on the selected processing information. Thereby, the processing is performed on the substrate by the processing unit, and the processing is performed on the substrate by the external device.

As described above, the preset processing information is displayed on the first control unit and the external device, and the processing information can be input to the second control unit by selecting the displayed processing information. Therefore, an input error of the processing content is prevented.

(9) Ninth Invention A recording medium on which a control program according to a ninth invention is recorded includes a processing section for performing processing on a substrate, a first control section for controlling processing by the processing section, and a second control section. And a control program for controlling the first control unit and the external device in the substrate processing apparatus that includes the first control unit and is connectable to the external device. Receiving the path information indicating the processing path of the substrate set in the step, inputting the processing information indicating the processing content, and performing the first processing based on the input processing information and the path information received from the first control unit. And sequentially instructing one or both of the control unit and the external device to start processing.

According to the recording medium on which the control program according to the present invention is recorded, the second control unit receives, from the first control unit, path information indicating the processing path of the substrate set in the first control unit. . Upon input of the processing information indicating the processing content, the second control unit performs processing on one or both of the first control unit and the external device based on the input processing information and the path information received from the first control unit. Command to start.

If the path information indicates that the substrate passes only through the processing unit, the second control unit instructs only the first control unit to start processing. On the other hand, if the path information indicates that the substrate passes only through the external device, the second control unit instructs only the external device to start processing. As described above, since only the processing in the processing unit or only the processing in the external device can be performed by the online control by the second control unit, the time for switching between the online control and the offline control is not required. Therefore, the throughput in the entire substrate processing is improved.

(10) Tenth invention A recording medium on which a control program according to the tenth invention is recorded comprises a processing section for performing processing on a substrate, a first control section for controlling processing by the processing section, and a second control section. And a control program for controlling the first control unit and the external device in a substrate processing apparatus that includes a control unit and is connectable to an external device. Receiving time information on the processing time, providing the received time information to the first control unit, and inputting processing information indicating processing content;
Receiving the processing time in the processing unit calculated by the first control unit based on the time information; and starting the processing in the first control unit and the external device based on the input processing information and the received processing time. Are sequentially executed by the second control unit.

According to the recording medium on which the control program according to the present invention is recorded, when the second control unit receives the time information on the processing time of the substrate from the external device, the second control unit sends the received time information to the first control unit. give. Thereby, the first control unit calculates the processing time of the substrate in the processing unit based on the time information given from the second control unit. And the second
When information indicating the processing content is input, the control unit sequentially starts the processing to the first control unit and the external device based on the input processing information and the processing time calculated by the first control unit. Command.

As described above, since the second control unit can calculate the processing time of the substrate in the processing unit in consideration of the processing time of the substrate in the external device, the processing unit and the external device can be calculated for each substrate. It is possible to manage the entire time including the time.

[0045]

FIG. 1 is a block diagram showing the configuration of a control system of a substrate processing apparatus according to one embodiment of the present invention.

As shown in FIG. 1, the substrate processing apparatus 10
It includes an inline controller 1, an inline panel 2, a main controller 3, a main panel 4, and a processing unit 5.

The in-line panel 2 is connected to the in-line controller 1 and includes an input unit for inputting various information and various commands and a display unit for displaying various information. As the input unit, for example, a mouse or a keyboard is used. The main panel 4 is connected to the main controller 3 and includes an input unit for inputting various information and various commands, and a display unit for displaying various information.

The inline controller 1 includes a CPU (Central Processing Unit), a primary storage device such as a memory, and a secondary storage device such as a hard disk device. The main controller 3 and the exposure device 20 are connected to the inline controller 1. This inline controller 1
Operates according to a control program, and centrally manages the operations of the main controller 3 and the exposure device 20. The control program is stored in the secondary storage device of the in-line controller 1, read into the primary storage device, and executed.

The main controller 3 includes a CPU,
It includes a primary storage device such as a memory and a secondary storage device such as a hard disk device. This main controller 3 controls the processing unit 5.

In this embodiment, the exposure unit 20 corresponds to an external device, the processing unit 5 corresponds to a processing unit, the main controller 3 corresponds to a first control unit, and the in-line controller 1
Corresponds to the second control unit. The main panel 4 corresponds to a setting unit, and the in-line panel 2 corresponds to a selection unit and an input unit.

FIG. 2 shows the processing section 5 of the substrate processing apparatus 10 of FIG.
It is a top view which shows the structure of. As shown in FIG. 2, the processing unit 5 of the substrate processing apparatus 10 includes processing areas A and B and a transport area C. In the processing area A, a rotary coating device (spin coater) SC for performing a coating process of a resist liquid on the substrate W and a rotary developing device (spin developer) SD for performing a developing process on the substrate W are arranged. Processing area B
Are provided with a substrate heating device (hot plate) HP for performing a heating process on the substrate W, a substrate cooling device (cooling plate) CP for performing a cooling process on the substrate W, and an adhesion strengthening device AH for performing an adhesion strengthening process on the substrate W. ing.

In the transfer area C, there is provided a substrate transfer device 53 for transferring the substrate W in the direction of the arrow X and for loading and unloading the substrate W to and from each device in the processing areas A and B.

At one end of the substrate processing section 5, a substrate loading / unloading device (indexer) ID for accommodating the substrate W and loading / unloading the substrate W is disposed. The substrate loading / unloading device ID includes a cassette mounting portion 51 on which a plurality of cassettes 50 are mounted and a transfer robot 52. Each cassette 50 stores a plurality of substrates W. The transfer robot 52 moves in the direction of arrow Y, and
Substrate W is taken out from the substrate transfer device 53 in the transfer area C.
And the substrate W subjected to the series of processes is received from the substrate transport device 53 in the transport area C and returned to the cassette 50.

The other end of the substrate processing section 5 is provided with an intermediate transfer device (interface) IF for transferring the substrate W to and from the exposure device 20. Intermediate delivery device IF
Includes a substrate transfer device 55. The substrate transfer device 55
The substrate W received from the substrate transport device 53 in the transport area C is transferred to the exposure device 20 and the substrate W that has been subjected to the exposure processing is
Is transferred from the exposure device 20 to the substrate transfer device 53 in the transfer area C.

Next, the operation of the substrate processing apparatus 10 of FIG. 1 will be described with reference to the flowcharts of FIGS. 3, 4 and 5.

In the main controller 3, recipe information and flow recipe information are set in advance by the main panel 4 as processing information. Here, the recipe information indicates processing contents such as processing conditions and processing procedures in the processing unit 5 of the substrate processing apparatus 10, and includes a recipe number and a content of the recipe.
The flow recipe information is information indicating a processing route of the substrate in each recipe, that is, a moving route. On the other hand, the exposure machine 2
In 0, reticle information and a job are set in advance as processing information. Here, the reticle information refers to the exposure device 20
Is information for specifying the photomask used in the, and includes the reticle name. The job indicates exposure conditions in the exposure device 20, and includes a job name and job contents.

When the power of the substrate processing apparatus 10 is turned on or when processing information is set, the inline controller 1 requests all recipe information from the main controller 3 (step S1). Thereby, the main controller 3 reports all preset recipe information to the inline controller 1 (step S2). Inline controller 1
Stores all recipe information reported from the main controller 3 in the secondary storage device (step S3).

The inline controller 1 requests the main controller 3 for all recipe flow information (step S4). Thereby, the main controller 3
The entire recipe flow information is reported to the inline controller 1 (step S5). The inline controller 1
All recipe flow information reported from the main controller 3 is stored in the secondary storage device (step S6).

Further, the inline controller 1 requests all the reticle information from the exposure device 20 (step S).
7). Thereby, exposure apparatus 20 reports all reticle information to inline controller 1 (step S8).
The inline controller 1 stores all reticle information reported from the exposure device 20 in the secondary storage device (Step S9).

The inline controller 1 checks all the jobs with the exposure device 20 (step S10). Accordingly, the exposure device 20 sends a confirmation response of the job to the inline controller 1 (step S11). The inline controller 1 stores all jobs given from the exposure device 20 in the secondary storage device (Step S12).

In this way, all the recipe information and all the recipe flow information set in the main controller 3 and all the reticle information and all the jobs set in the exposure device 20 are stored in the inline controller 1.

At the start of the process, the cassette 50 storing the substrates W is loaded into the cassette mounting portion 51 of the substrate loading / unloading device ID in FIG. 2 in units of lots (step S20).
Then, the operator inputs a recipe number, a reticle name, and a job name as processing information from the screen of the inline panel 2 connected to the inline controller 1 (step S21).

In this case, the inline controller 1
All recipe numbers included in all recipe information stored in the next storage device, all reticle names included in all reticle information, and all job names included in all jobs are displayed on the screen of the inline panel 2 in the form of a pull-down menu. You. The operator selects one of the plurality of recipe numbers, the plurality of reticle names, and the plurality of job names displayed on the screen using the mouse or the keyboard. Thereby,
The selected recipe number, reticle name, and job name are input to the inline controller 1.

The inline controller 1 determines the processing contents based on the recipe number, reticle name and job name input from the inline panel 2 (step S2).
2).

Further, based on the input job name, the inline controller 1 confirms the substrate processing time of the corresponding job in the exposing machine 20 with the exposing machine 20 (step S23). Thereby, the exposure device 20 gives a confirmation response of the substrate processing time for the job concerned to the inline controller 1 (step S24).

The in-line controller 1 includes an exposure device 20
Is reported to the main controller 3 (step S25). Main controller 3
Determines the substrate processing time in the processing unit 5 based on the substrate processing time reported from the inline controller 1 (step S26). And the main controller 3
Gives the determined substrate processing time to the in-line controller 1.

Thereafter, the inline controller 1 determines the recipe number, the reticle name and the job name inputted from the inline panel 2, the recipe flow information corresponding to the inputted recipe number, and the substrate processing time given from the main controller 3. Then, the main controller 3 and the exposing machine 20 are sequentially instructed to start processing as follows.

First, the inline controller 1 instructs the exposure device 20 to move the reticle (step S27).
Thereby, exposure apparatus 20 moves the reticle from the library to the standby stage (step S28).

Next, the inline controller 1 instructs the main controller 3 to start processing the substrate in lot units (step S29). Thereby, the main controller 3 starts the processing by the processing unit 5.

Thereafter, the inline controller 1 instructs the exposing machine 20 to move the reticle (step S3).
0). Thereby, exposure machine 20 moves the reticle from the standby stage to the exposure stage (step S3).
1).

Next, the inline controller 1 instructs the exposing machine 20 to start processing the substrate in lot units (step S32). Thereby, the exposure machine 20 starts the exposure processing.

If the processing content determined in step S22 includes only the processing in the processing section 5, the inline controller 1 executes steps S27, S30, S30
No instruction is given to the 32 exposure device 20. Thereby, the processing of the substrate only by the processing unit 5 is executed.

As described above, the substrate processing apparatus 1 of this embodiment
0, a recipe number as processing information to be executed;
Reticle name and job name are inline controller 1
Is input from the screen of the in-line panel 2 connected to. When inputting this processing information, the inline panel 2
The executable processing information set in advance in the main controller 3 and the exposure device 20 is displayed on the screen of. And the selected processing information is input by selecting any of the displayed processing information. Therefore, no input error of the processing information occurs.

Further, the inline controller 1 recognizes the processing path of the substrate based on the recipe flow information set in the main controller 3. The start of the process is instructed only to the main controller 3 without instructing the start of the process. Therefore, it is possible to execute the processing only by the processing unit 5 by the online control by the inline controller 1. Therefore, there is no need to wait for lot processing when switching between online control and offline control, thereby improving the overall substrate processing throughput.

Further, the inline controller 1 gives the substrate processing time in the exposure device 20 received from the exposure device 20 to the main controller 3, and the main controller 3 controls the processing unit 5 in consideration of the substrate processing time in the exposure device 20. Can be determined. Thereby, the entire time management including the processing unit 5 and the exposure machine 20 can be performed for each substrate. Therefore, the entire processing time of each substrate can be made uniform.

In the above embodiment, a secondary storage device such as a hard disk is used as a recording medium on which the control program is recorded. However, the control program is stored in another recording medium such as a floppy disk, CDROM, optical disk, or semiconductor memory. It may be recorded.

In the above embodiment, the inline panel 2 and the main panel 4 are provided separately, but the inline panel 2 and the main panel 4 may be common.

[Brief description of the drawings]

FIG. 1 is a block diagram illustrating a configuration of a substrate processing apparatus according to an embodiment of the present invention.

FIG. 2 is a plan view illustrating a configuration of a processing unit of the substrate processing apparatus of FIG.

FIG. 3 is a flowchart illustrating an operation of the substrate processing apparatus of FIG. 1;

FIG. 4 is a flowchart illustrating an operation of the substrate processing apparatus of FIG. 1;

FIG. 5 is a flowchart illustrating an operation of the substrate processing apparatus of FIG. 1;

FIG. 6 is a block diagram showing connections between a conventional substrate processing apparatus, an inline controller, and an exposure machine.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 In-line controller 2 In-line panel 3 Main controller 4 Main panel 5 Processing part 10 Substrate processing apparatus 20 Exposure machine SC Rotary coating apparatus SD Rotary developing apparatus ID Substrate loading / unloading apparatus IF Substrate intermediate transfer apparatus 50 Cassette 51 Placement part 52 Transfer Loading robot 53, 55 Substrate transfer device

Continued on the front page. (72) Inventor Hidekazu Inoue 4-chome Tenjin Kitamachi 1-chome, Horikawa-dori-Terauchi, Kamigyo-ku, Kyoto Dainippon Screen Mfg. Co., Ltd. (72) Inventor Takuji Yoshida Horikawa, Kamigyo-ku, Kyoto (1) Dainippon Screen Manufacturing Co., Ltd. (72) Inventor Kenji Kamei Kenji Kamei 4-chome Tenjin Kitamachi 1-1-1 Kitamachi, Kamimachi-ku, Kyoto-shi F term within the company (reference) 5F031 CA02 CA05 CA07 FA11 FA12 MA27 PA03 5F046 AA17 AA28 DA29 DA30 DD02 JA22 LA18

Claims (10)

[Claims] 1. A substrate processing apparatus connectable to an external device, comprising: a processing unit that performs processing on a substrate; a first control unit that controls processing by the processing unit; and a substrate that is provided in the first control unit. Setting means for setting in advance processing information indicating the processing content of the external device; and receiving the processing information set by the setting means from the first control unit and processing information set in the external device from the external device. A second control unit for receiving; and a selection unit for displaying the processing information received by the second control unit from the first control unit and the external device, and for selecting the displayed processing information. The substrate processing apparatus, wherein the second control unit sequentially instructs the first control unit and the external device to start processing based on the processing information selected by the selection unit. 2. The method according to claim 1, wherein the setting unit further sets path information indicating a processing path of the substrate in the first control unit, and the second control unit sets the path information set by the setting unit in the first control unit. The first control unit and / or the external device start processing based on the processing information received from the first control unit and the path information received from the first control unit and the processing information selected by the selection unit. 2. The substrate processing apparatus according to claim 1, wherein the instructions are issued sequentially. 3. The second control unit receives time information on a processing time of the substrate from the external device, and provides the received time information to the first control unit. Calculating a processing time of the substrate in the processing unit based on the time information given from the second control unit; and the second control unit calculates the processing information selected by the selection unit and the first control. 3. The substrate processing apparatus according to claim 1, wherein a start of processing is sequentially instructed to the first control unit and the external device based on the processing time calculated by the unit. 4. A substrate processing apparatus connectable to an external device, comprising: a processing unit that performs processing on a substrate; a first control unit that controls processing performed by the processing unit; and a substrate that is provided in the first control unit. Setting means for setting path information indicating the processing path of the second processing section; a second control section for receiving the path information set by the setting section from the first control section; and processing information for the second control section. And an input unit for inputting the first control unit, based on the processing information input by the input unit and the path information received from the first control unit. A substrate processing apparatus for sequentially instructing one or both of the external devices to start processing. 5. The second control unit receives time information on a processing time of a substrate from the external device, and provides the received time information to the first control unit. Calculating a processing time of the substrate in the processing unit based on the time information given from the second control unit; the second control unit calculates the processing information input by the input unit; And sequentially instructing one or both of the first control unit and the external device to start processing based on the path information received from the unit and the processing time calculated by the first control unit. Item 5. A substrate processing apparatus according to item 4. 6. A substrate processing apparatus connectable to an external device, comprising: a processing unit for performing processing on a substrate; a first control unit for controlling processing by the processing unit; and a processing time for processing the substrate from the external device. A second control unit for receiving time information about the received time information to the first control unit, and input means for inputting processing information indicating processing content to the second control unit, The first control unit calculates a processing time of the substrate in the processing unit based on the time information given from the second control unit, and the second control unit is input by the input unit. A substrate processing apparatus for sequentially instructing the first control unit and the external device to start processing based on the processed information and the processing time calculated by the first control unit. 7. The apparatus according to claim 1, wherein the external device is an exposure machine, and the processing unit includes a coating device for performing a coating process on the substrate and a developing device for performing a development process on the substrate. 7. The substrate processing apparatus according to any one of 6. 8. A substrate processing apparatus comprising a processing unit for performing processing on a substrate, a first control unit for controlling the processing by the processing unit, and a second control unit and being connectable to an external device. A control program for controlling the first control unit and the external device, the control program comprising: a process information indicating a process content set in the first control unit; Receiving the set processing information; displaying the processing information received from the first control unit and the external device in a selectable manner; based on the processing information selected from the displayed processing information, Causing the second control unit to execute a first control unit and a step of sequentially instructing the external device to start processing. . 9. A substrate processing apparatus comprising: a processing unit that performs processing on a substrate; a first control unit that controls processing performed by the processing unit; and a second control unit, and the first processing unit can be connected to an external device. 1. A recording medium recording a control unit and a program for controlling an external device, wherein the control program receives path information indicating a processing path of a substrate set in the first control unit; Inputting processing information indicating processing contents; and performing processing on one or both of the first control unit and the external device based on the input processing information and the path information received from the first control unit. A step of sequentially instructing the second control unit to execute a command to sequentially start the recording medium. 10. A substrate processing apparatus comprising: a processing unit that performs processing on a substrate; a first control unit that controls processing performed by the processing unit; and a second control unit; A recording medium recording a control program for controlling the control unit and the external device, wherein the control program receives time information on a processing time of a substrate from the external device; Providing to the first control unit; inputting processing information indicating processing content; receiving a processing time in the processing unit calculated by the first control unit based on the time information; Sequentially instructing the first control unit and the external device to start processing based on the input processing information and the received processing time. A recording medium storing a control program, wherein the control program is executed by the second control unit.